KR20090007009U - A cap had embo-pattern - Google Patents

A cap had embo-pattern Download PDF

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Publication number
KR20090007009U
KR20090007009U KR2020080000234U KR20080000234U KR20090007009U KR 20090007009 U KR20090007009 U KR 20090007009U KR 2020080000234 U KR2020080000234 U KR 2020080000234U KR 20080000234 U KR20080000234 U KR 20080000234U KR 20090007009 U KR20090007009 U KR 20090007009U
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KR
South Korea
Prior art keywords
hat
embossed
pattern
support layer
embossed pattern
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KR2020080000234U
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Korean (ko)
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KR200445525Y1 (en
Inventor
이수
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임경석
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Priority to KR2020080000234U priority Critical patent/KR200445525Y1/en
Publication of KR20090007009U publication Critical patent/KR20090007009U/en
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Publication of KR200445525Y1 publication Critical patent/KR200445525Y1/en

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    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/24—Hats; Caps; Hoods with means for attaching articles thereto, e.g. memorandum tablets or mirrors
    • A42B1/248—Insignia, logos, emblems or the like
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/018—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings
    • A42B1/0181—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings with means for protecting the eyes
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42C—MANUFACTURING OR TRIMMING HEAD COVERINGS, e.g. HATS
    • A42C1/00—Manufacturing hats
    • A42C1/04—Blocking; Pressing; Steaming; Stretching
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42C—MANUFACTURING OR TRIMMING HEAD COVERINGS, e.g. HATS
    • A42C5/00—Fittings or trimmings for hats, e.g. hat-bands
    • A42C5/04—Ventilating arrangements for head coverings

Abstract

본 고안은 양각 무늬를 갖는 모자에 관한 것으로, 모자의 제조에 있어서 무늬부를 양각 무늬로 형성하고 이의 형성을 용이하게 하고 생산원가를 절감할 수 있도록 한 것이다.The present invention relates to a hat having an embossed pattern, in the manufacture of the hat is to form a pattern portion in the embossed pattern to facilitate the formation thereof and to reduce the production cost.

즉, 본 고안은 모자에 있어서, 프레스 성형 형성되는 양각 무늬의 형이 유지되게 모자원단의 배면에 양각 지지층을 형성한 것이다.That is, in the present invention, in the cap, the embossed support layer is formed on the back of the hat fabric so that the shape of the embossed pattern formed by press molding is maintained.

따라서, 본 고안은 모자원단의 배면에 양각 지지층을 형성함으로써 프레스 성형에 의하여 양각무늬를 형성할 수 있어 그 양각무늬의 형성이 용이하고 저렴하게 이루어지는 것이다.Therefore, the present invention can form an embossed pattern by press molding by forming an embossed support layer on the back surface of the hat fabric is easy and inexpensive to form the embossed pattern.

모자 hat

Description

양각 무늬를 갖는 모자{A cap had embo-pattern}Hat with embossed pattern {A cap had embo-pattern}

본 고안은 양각 무늬를 갖는 모자에 관한 것으로서, 더욱 상세하게는 모자에 있어서, 프레스 성형되어 형성되는 양각 무늬의 형이 유지되게 모자원단의 배면에 양각 지지층을 형성하여서 프레스 성형된 양각 무늬가 그 무늬를 유지하고 자유롭게 양각무늬를 표현할 수 있도록 함을 목적으로 한 것이다.The present invention relates to a hat having an embossed pattern, and more particularly, in a hat, an embossed pattern press-molded by forming an embossed support layer on the back surface of the hat fabric to maintain the shape of the embossed pattern formed by press molding. It is aimed at maintaining and freely expressing the embossed pattern.

일반적으로, 모자는 부채꼴의 원단을 연속 재봉하여서 반구형을 이루게 만들어지는 것이다.In general, the hat is made to form a hemisphere by sewing a series of fan-shaped fabric.

이상과 같은 모자는 그 제조에 있어 디자인성을 높이고 상표적 식별력을 가질 수 있도록 수를 놓거나 별도의 무늬천을 덧 되어 무늬와 상표를 표현하고 있다.Hats as described above are embroidered or added with a separate pattern to express the pattern and trademark so as to increase the design in the manufacture and have a trademark distinction.

그러나, 상기한 바와 같이 수를 놓거나 별도의 무늬천을 덧 되어 무늬를 표현하는 것은 별도의 작업을 거쳐야 하고 그 작업공정이 까다로워 생산원가가 고가로 형성되는 문제점이 있었다However, as described above, expressing a pattern by embroidering or adding a separate pattern cloth has to go through a separate work, and the work process is difficult, resulting in a high production cost.

이에, 본 고안은 상술한 바와 같이 모자의 제조에 있어서 무늬의 형성이 용 이하지 않고 생산원가가 고가로 형성되는 문제점을 해결할 수 있도록 한 것이다.Thus, the present invention is to solve the problem that the production cost is formed at a high cost without the formation of a pattern in the manufacturing of the cap as described above.

즉, 본 고안은 모자에 있어서, 프레스 성형 형성되는 양각 무늬의 형이 유지되게 모자원단의 배면에 양각 지지층을 형성한 것이다.That is, in the present invention, in the cap, the embossed support layer is formed on the back of the hat fabric so that the shape of the embossed pattern formed by press molding is maintained.

따라서, 본 고안은 모자원단의 배면에 양각 지지층을 형성함으로써 프레스 성형에 의하여 양각무늬를 형성할 수 있어 그 양각무늬의 형성이 용이하고 저렴하게 이루어지는 것이다.Therefore, the present invention can form an embossed pattern by press molding by forming an embossed support layer on the back surface of the hat fabric is easy and inexpensive to form the embossed pattern.

이하, 첨부된 도면에 의하여 상세히 설명하면 다음과 같다.Hereinafter, described in detail by the accompanying drawings as follows.

본 고안은 모자의 제조에 있어 양각무늬를 용이하고 저렴하게 형성할 수 있도록 한 것이다.The present invention is to be able to form an embossed pattern easily and inexpensively in the manufacture of a hat.

즉, 본 고안은 부채꼴의 모자원단(20)을 연속 재봉하여서 반구형을 이루게 형성된 모자에 있어서, 도 1 과 도 2 에 도시된 바와 같이 프레스 성형에 의하여 형성되는 양각 무늬(1)의 형이 유지되게 상기 모자원단(20)의 배면에 합성수지발포제로 이루어져 합지된 양각 지지층(10)을 형성한 것이다.That is, the present invention in the cap formed to form a hemispherical shape by continuously sewing the fan-shaped hat fabric 20, so that the shape of the embossed pattern (1) formed by press molding as shown in Figs. The embossed support layer 10 formed of a synthetic resin foaming agent is formed on the back of the hat fabric 20.

여기서, 상기 양각 지지층(10)은 폴리에틸렌(PE), 에틸비닐아세테이트(EVA) 등의 재질로 구성하여 실시할 수 있는 것이다.Here, the embossed support layer 10 may be made of a material such as polyethylene (PE), ethyl vinyl acetate (EVA).

한편, 도 3 에 도시된 바와 같이 상기 양각 지지층(10)의 배면에는 모자의 착용과정에 있어 마찰손상을 방지하고, 땀 흡수력을 극대화할 수 있게 보호 직물 층(30)을 형성하여 실시할 수 있는 것이다.On the other hand, as shown in Figure 3 on the back of the embossed support layer 10 can be carried out by forming a protective fabric layer 30 to prevent frictional damage in the process of wearing the hat, to maximize the sweat absorption will be.

또한, 도 4 에 도시된 바와 같이 상기 양각 지지층(10)에는 통기성을 높일 수 있게 관통된 다수의 통기공(11)을 형성하여 실시할 수 있는 것이다.In addition, as shown in FIG. 4, the embossed support layer 10 may be formed by forming a plurality of through-holes 11 penetrated to increase air permeability.

이하, 본 고안의 작용에 대하여 설명하면 다음과 같다.Hereinafter, the operation of the present invention will be described.

상기한 바와 같이 즉, 본 고안은 부채꼴의 모자원단(20)을 연속 재봉하여서 반구형을 이루게 형성된 모자에 있어서, 프레스 성형에 의하여 형성되는 양각 무늬(1)의 형이 유지되게 상기 모자원단(20)의 배면에 합성수지발포제로 이루어져 합지된 양각 지지층(10)을 형성한 본 고안은 모자원단(20)에 양각 지지층(10)을 형성한 후 부채꼴 모양으로 형성하고, 이를 재봉 연결하여서 반구형의 모자 모양을 형성한다.As described above, the present invention is a hat formed in a hemispherical shape by continuously sewing a fan-shaped hat fabric 20, the hat fabric 20 to maintain the shape of the embossed pattern (1) formed by press molding The present invention formed the embossed support layer 10 is made of a synthetic resin foaming agent on the back of the forming the embossed support layer (10) on the cap fabric (20) and then formed into a fan-shaped shape, by sewing it connected to form a hemispherical hat shape Form.

이상과 같이 형성된 모자를 양각무늬가 형성된 금형에 넣고 가압 성형하여서 양각 무늬(1)가 형성되게 한다.The cap formed as described above is put into a mold having an embossed pattern, and is press-molded to form the embossed pattern 1.

이와 같이 형성된 양각 무늬(1)는 발포합성수지로 이루어진 양각 지지층(10)에 의하여 그 형이 유지되는 것이다.The embossed pattern 1 formed as described above is maintained by the embossed support layer 10 made of a foamed synthetic resin.

또한, 본 고안의 다른 실시 예와 같이 양각 지지층(10)의 배면에 보호 직물층(30)을 형성하여 실시하게 되면 잦은 착용과정에 있어 마손이 방지되고 착용과정에 발생하는 땀이 흡수되어 착용감이 쾌적하게 유지되는 것이다.In addition, when the protective fabric layer 30 is formed on the back surface of the embossed support layer 10 as in another embodiment of the present invention, wear and tear is prevented in the frequent wearing process and the sweat generated during the wearing process is absorbed. It is to remain comfortable.

또한, 본 고안의 다른 실시 예와 같이 양각 지지층(10)에 다수의 통기공(11)을 형성하여 실시하게 되면 착용과정에 발생한 땀이 통기공(11)을 통한 통풍을 통 하여 건조되어 그 착용감이 쾌적하게 유지되는 것이다.In addition, when forming a plurality of ventilation holes 11 in the embossed support layer 10, as in another embodiment of the present invention, the sweat generated during the wearing process is dried through the ventilation through the ventilation holes 11, the feeling of wearing This is what keeps you comfortable.

따라서, 본 고안은 모자원단의 배면에 양각 지지층을 형성함으로써 프레스 성형에 의하여 양각무늬를 형성할 수 있어 그 양각무늬의 형성이 용이하고 저렴하게 이루어지는 것이다.Therefore, the present invention can form an embossed pattern by press molding by forming an embossed support layer on the back surface of the hat fabric is easy and inexpensive to form the embossed pattern.

그리고, 양각 지지층의 배면에 보호 직물층을 형성함으로써 잦은 착용과정에 있어 마손이 방지되고 착용과정에 발생하는 땀이 흡수되어 착용감이 향상되는 것이다.And, by forming a protective fabric layer on the back of the embossed support layer to prevent wear and tear in the frequent wearing process and the sweat generated during the wearing process is absorbed to improve the fit.

또한, 양각 지지층에 다수의 통기공을 형성함으로써 착용과정에 발생한 땀이 통기공을 통한 통풍을 통하여 건조되어 그 착용감이 향상되는 것이다.In addition, by forming a plurality of ventilation holes in the embossed support layer, the sweat generated during the wearing process is dried through the ventilation through the ventilation holes to improve the fit.

도 1 은 본 고안에 따른 일 실시 예가 적용된 상태를 보인 사시도.1 is a perspective view showing a state in which an embodiment according to the present invention is applied.

도 2 는 본 고안에 따른 일 실시 예에 따른 측 단면도.Figure 2 is a side cross-sectional view according to an embodiment according to the present invention.

도 3 은 본 고안에 따른 다른 실시 예에 따른 측 단면도.Figure 3 is a side cross-sectional view according to another embodiment according to the present invention.

도 4 는 본 고안에 따른 또 다른 실시 예에 따른 측 단면도.Figure 4 is a side cross-sectional view according to another embodiment according to the present invention.

<도면의 주요부분에 대한 부호의 설명> <Description of the symbols for the main parts of the drawings>

1 : 양각 무늬1: embossed pattern

10 : 양각지지층10: embossed support layer

11 : 통기공11: ventilator

20 : 모자원단20: hat fabric

30 : 보호직물층30: protective fabric layer

Claims (2)

부채꼴의 모자원단을 연속 재봉하여서 반구형을 이루게 형성된 모자에 있어서;In the cap formed in a hemispherical shape by continuously sewing the fan-shaped hat fabric; 프레스 성형에 의하여 형성되는 양각 무늬(1)의 형이 유지되게 상기 모자원단(20)의 배면에 합성수지발포제로 이루어져 합지된 양각 지지층(10)을 형성한 것을 특징으로 하는 양각 무늬를 갖는 모자.Hat having an embossed pattern, characterized in that the embossed support layer (10) formed of a synthetic resin foaming agent formed on the back surface of the hat fabric 20 to maintain the shape of the embossed pattern (1) formed by press molding. 제 1 항에 있어서;The method of claim 1; 상기 양각 지지층(10)의 배면에는 모자의 착용과정에 있어 마찰손상을 방지하고, 땀 흡수력을 극대화할 수 있게 보호 직물층(30)을 형성하고, On the back of the embossed support layer 10 to form a protective fabric layer 30 to prevent friction damage in the wearing process of the hat, to maximize the sweat absorption, 상기 양각 지지층(10)에는 통기성을 높일 수 있게 관통된 다수의 통기공(11)을 형성한 것을 특징으로 하는 양각 무늬를 갖는 모자.The embossed support layer 10 is a hat having an embossed pattern, characterized in that a plurality of through-holes 11 are formed so as to increase the breathability.
KR2020080000234U 2008-01-07 2008-01-07 A cap had embo-pattern KR200445525Y1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299314B1 (en) * 2011-11-02 2013-08-26 주식회사 다다씨앤씨 A headwear with a logo using memory foam
US11206887B1 (en) * 2016-05-16 2021-12-28 Elegant Headwear Co., Inc. Method of forming a raised three-dimensional decorative image on a fabric product and cap made thereby

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3884711B2 (en) * 2003-01-14 2007-02-21 株式会社コカジ Cap manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299314B1 (en) * 2011-11-02 2013-08-26 주식회사 다다씨앤씨 A headwear with a logo using memory foam
US11206887B1 (en) * 2016-05-16 2021-12-28 Elegant Headwear Co., Inc. Method of forming a raised three-dimensional decorative image on a fabric product and cap made thereby

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