KR20080103303A - Manufacturing method of liquid crystal display device - Google Patents

Abstract

A liquid crystal display device and a method for manufacturing the same are provided to efficiently forming an align key on a motherboard which does not have pattern. A first motherboard includes a first area where a TFT is formed, and a second part which covers the first area and has an align key(S100). A second motherboard includes a first part corresponding to the first area other and a second part corresponding to the second area(S200). A resin layer includes the resin align key located on the second part, and a alignment layer positioned in the first part(S300). A step for arranging the resin align key is aligned on the align key, and the second motherboard is placed opposing to the first motherboard(S600).

Description

MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE

1 is a perspective view of a liquid crystal panel manufactured according to the first embodiment of the present invention,

FIG. 2 is an enlarged cross-sectional view taken along II-II of FIG. 1;

3 is a flowchart of a method of manufacturing a liquid crystal panel according to a first embodiment of the present invention;

4 to 8 are views for explaining a manufacturing method according to a first embodiment of the present invention,

9 is an enlarged cross-sectional view of a liquid crystal panel manufactured according to a second embodiment of the present invention.

10A to 10C are views for explaining a manufacturing method according to a second embodiment of the present invention.

Explanation of symbols on the main parts of the drawings

10: first mother substrate 11: first mother insulating substrate

12: alignment key 20: the second motherboard

21: second mother insulating substrate 22: a patternless transparent electrode layer

31: first resin layer 31a: alignment layer

31b: resin alignment key 41: second resin layer

50: Resin liquid 100: First substrate

110: first insulating substrate 121: gate line

122: gate electrode 123: gate pad

131: gate insulating film 132: semiconductor layer

141: data line 142: source electrode

143: drain electrode 144: data pad

151: first insulating film 161: black matrix

165: color filter 171: second insulating film

181: pixel electrode 200: first alignment layer

300: second substrate 310: second insulating substrate

321: common electrode 400: second alignment layer

500: sealant 600: liquid crystal layer

The present invention relates to a method for manufacturing a liquid crystal display device, and more particularly, to a method for manufacturing a liquid crystal display device using a mother substrate without a pattern.

Recently, many flat panel displays such as liquid crystal display devices (LCDs), plasma display panels (PDPs), and organic light emitting diodes (OLEDs) have been developed in place of conventional CRTs. It is becoming.

Among them, a liquid crystal display device includes a liquid crystal panel having a first substrate including a thin film transistor, a second substrate facing the first substrate, and a liquid crystal layer interposed between both substrates. Since the liquid crystal panel is a non-light emitting device, a backlight unit for supplying light to the liquid crystal panel is located behind the liquid crystal panel.

On the other hand, when manufacturing the liquid crystal panel, the first mother substrate on which the first substrate is manufactured, the second mother substrate is made of the second mother substrate is arranged opposite to each other alignment key formed on both mother substrates to match the first mother The liquid crystal panel is manufactured by aligning the substrate and the second mother substrate to bond the first mother substrate and the second mother substrate. The align key is usually formed by forming a pattern on the mother board.

The second substrate of the existing liquid crystal panel includes a color filter, a black matrix and a common electrode.

Recently, color filters, black matrices, and the like are formed on a first substrate in order to simplify the process of manufacturing a liquid crystal panel and to improve light transmittance.

However, in this case, since a process of forming a pattern is performed only on the first mother substrate on which the first substrate is manufactured, an additional process for forming an alignment key on the second mother substrate on which the second substrate without a pattern is manufactured is added. There is a problem that needs to be done.

Accordingly, it is an object of the present invention to provide a method of manufacturing a liquid crystal display device capable of effectively forming an alignment key in a patternless mother substrate.

An object of the present invention is to provide a first mother substrate including a first region in which a thin film transistor is formed and a second region surrounding an first region and an alignment key formed therein, and a first region corresponding to the first region. Providing a second mother substrate comprising a first portion and a second portion corresponding to the second region; an alignment film positioned in the first portion and a resin alignment key positioned in the second portion on the second mother substrate; Forming a resin layer, and arranging a second mother substrate on the first mother substrate and aligning the resin alignment keys on the alignment key.

The first mother substrate may include a color filter formed in the first region.

The first mother substrate may include a black matrix formed in the first region.

The first mother substrate may include a pixel electrode and a common electrode formed in the first region.

The second mother substrate may include an insulating substrate, and the resin alignment key may be formed in direct contact with the insulating substrate.

The second mother substrate may include a patternless transparent electrode layer formed over the first portion and the entirety of the second portion.

The resin alignment key can be formed in direct contact with the patternless transparent electrode layer.

The first area may include a display area and a non-display area, and the alignment layer may be formed to correspond to the display area.

The resin layer may be formed through a flexo printing method or an ink jet printing method.

Hereinafter, the present invention will be described with reference to the accompanying drawings.

A liquid crystal panel 1 manufactured according to the first embodiment of the present invention will be described with reference to FIGS. 1 and 2.

1 and 2, the liquid crystal panel 1 manufactured according to the first exemplary embodiment of the present invention may include a first substrate 100 and a first alignment layer disposed on the first substrate 100. 200, the second substrate 300 disposed to face the first substrate 100, the second alignment layer 400 positioned on the second substrate 300, the first substrate 100 and the second substrate. And a liquid crystal layer 600 positioned in a space formed by the first substrate 100, the second substrate 300, and the sealant 500.

The first substrate 100 and the second substrate 300 are rectangular in shape, and the first substrate 100 is somewhat larger than the second substrate 300. The first substrate 100 is divided into a display area a overlapping the second substrate 300 and a non-display area a not overlapping the second substrate 300.

The thin film transistor T and the sealant 500 are formed in the display area a, and the pads 123 and 144 for connecting to an external circuit are formed in the non-display area a. The non-display area a is formed on two adjacent sides of four sides of the first substrate 100.

First, the first substrate 100 and the first alignment layer 200 will be described.

Gate wirings 121, 122, and 123 are formed on the first insulating substrate 110. The gate wirings 121, 122, and 123 may be connected to the gate lines 121 extending in parallel with each other in the first direction, the gate electrodes 122 connected to the gate lines 121, and end portions of the gate lines 121. A gate pad 123 is provided. The gate pad 123 is increased in width for connection with an external circuit.

A gate insulating film 125 made of silicon nitride (SiNx) or the like is formed on the first insulating substrate 110 and the gate wirings 121, 122, and 123.

A semiconductor layer 131 made of a semiconductor such as amorphous silicon is formed on the gate insulating film 125 of the gate electrode 122, and n + hydrogenated amorphous silicon doped with silicide or n-type impurities at a high concentration on the semiconductor layer 131. An ohmic contact layer 132 made of such a material is formed.

Data wirings 141, 142, 143, and 144 are formed on the ohmic contact layer 132 and the gate insulating layer 125. The data lines 141, 142, 143, and 144 are formed in a second direction, which is a horizontal direction in the first direction, and intersect the data line 141 and the data line 141 that cross the gate line 121 to define pixels. And a drain electrode which is separated from the source electrode 142 and the source electrode 142 extending to the upper portion of the ohmic contact layer 132 and formed on the opposite side of the source electrode 142 with respect to the gate electrode 122. 143 and a data pad 144 formed at an end of the data line 141. The data pad 144 is increased in width for connection with an external driving circuit.

The source electrode 142 and the drain electrode 143 form an ohmic contact with the ohmic contact 132 on the semiconductor layer 131.

The gate electrode 122, the source electrode 142, the drain electrode 143, the semiconductor layer 131, and the ohmic contact layer 132 form a thin film transistor (T).

A first insulating layer 151 made of silicon nitride (SiNx) or silicon oxide (SiO 2) is formed on the data line wirings 141, 142, 143, and 144 and the exposed semiconductor layer 131.

The black matrix 161 is positioned on the first insulating layer 151 corresponding to the thin film transistor T.

The black matrix 161 may be formed of an organic material including a black pigment, and may be formed of a metal thin film such as chromium (Cr).

The black matrix 161 serves to block the thin film transistor T and the like from being recognized to the outside. Although not illustrated, the black matrix 161 may be formed on at least one of the gate line 121 and the data line 141.

The color filter 165 is positioned in the pixel which is adjacent to the black matrix 161 and divided into the gate line 121 and the data line 141.

The color filter 165 is positioned in each pixel, and is composed of an organic material containing a photosensitive material including pigments representing red, green, and blue colors, respectively.

The second insulating layer 171 is positioned on the color filter 165 and the black matrix 161.

Like the first insulating layer 151, the second insulating layer 171 is made of an inorganic material such as silicon nitride (SiNx) or silicon oxide (SiO 2). The surface of the color filter 165 and the black matrix 161 formed of an organic material may be rough to reduce luminance, and the second insulating layer 171 may have a surface roughness of the color filter 165 and the black matrix 161 formed of an organic material. To reduce the brightness.

The second insulating film 171 may be omitted in other embodiments.

In the second insulating layer 171, a contact hole 175 is formed in which the drain electrode 143 is exposed by patterning the second insulating layer 171 through the color filter 165 to the first insulating layer 151.

The pixel electrode 181 made of indium tin oxide (ITO) or indium zinc oxide (IZO) is formed on the second insulating layer 171.

The pixel electrode 181 is physically and electrically connected to the drain electrode 143 through the contact hole 175 to receive a data voltage from the drain electrode 143.

In another embodiment, various patterns may be formed on the pixel electrode 181.

The first alignment layer 200 is positioned on the pixel electrode 181 and the second insulating layer 171.

The first alignment layer 200 includes a polyimide organic material having heat resistance, and serves to determine the initial orientation of the liquid crystal layer 600.

The first alignment layer 200 is positioned in the display area a of the liquid crystal panel 1.

Hereinafter, the second substrate 300, the second alignment layer 400, the sealant 500, and the liquid crystal layer 600 will be described with reference to FIGS. 1 and 2.

The common electrode 321 through which the common power is transferred is formed on the second insulating substrate 310.

The common electrode 321 is in direct contact with the second insulating substrate 310.

The common electrode 321 is made of indium tin oxide (ITO) or indium zinc oxide (IZO) like the pixel electrode 181.

The second substrate 300 does not include a separate pattern, and the common electrode 321 is also not patterned.

The second alignment layer 400 is positioned on the common electrode 321.

The second alignment layer 400 includes a polyimide organic material having heat resistance like the first alignment layer 200, and determines the initial orientation of the liquid crystal layer 600.

The second alignment layer 400 is positioned in the display area a of the liquid crystal panel 1.

The sealant 500 is positioned at the ends of the first substrate 100 and the second substrate 300.

The sealant 500 includes a photocurable organic material and serves to bond the first substrate 100 and the second substrate 300.

The liquid crystal layer 600 is positioned in a region formed by the sealant 500, the first substrate 100, and the second substrate 300.

The liquid crystal layer 300 is positioned between the first alignment layer 200 and the second alignment layer 400, and maintains an initial alignment state by the first alignment layer 200 and the second alignment layer 400.

When a voltage is applied to the pixel electrode 181 and the common electrode 321, the liquid crystal layer 600 changes the direction of the liquid crystal by a vertical electric field formed by the pixel electrode 181 and the common electrode 321.

The liquid crystal layer 300 may use a liquid crystal such as a vertical alignment mode or a twisted nematic mode.

Hereinafter, a method of manufacturing the liquid crystal panel 1 according to the first embodiment of the present invention will be described with reference to FIGS. 3 to 8.

As shown in FIG. 3, the manufacturing method of the liquid crystal panel 1 according to the first embodiment of the present invention includes preparing a first mother substrate (S100) and preparing a second mother substrate (S200). And forming a resin layer on the second mother substrate and the first mother substrate (S300), forming a sealant on the first mother substrate (S400), forming a liquid crystal layer (S500), And arranging the second mother substrate to face each other on the first mother substrate (S600).

First, as shown in FIG. 4, the first mother substrate 10 is provided (S100).

The first mother substrate 10 includes a first region A to be the first substrate 100 of the liquid crystal panel 1 and a second region B surrounding the first region A. FIG.

The first area A of the first mother substrate 10 includes a display area a and a non-display area a.

The gate line 121, the data line 141, and the thin film transistor on the first mother insulating substrate 11 corresponding to the display area a of the first region A of the first mother substrate 10. (T), a black matrix (not shown), a color filter (not shown), and a pixel electrode 181 are formed.

A gate pad (not shown) is formed on the first mother insulating substrate 11 corresponding to the non-display area a of the first mother substrate 10 and the first region A while forming the gate line 121 and the data line 141. 123 and the data pad 144 are formed.

The alignment key 12 is formed on the first mother insulating substrate 11 corresponding to the second region B of the first mother substrate 10.

The alignment key 12 is formed at an edge portion of the first mother insulating substrate 11, and is not limited thereto. The alignment key 12 may be positioned between the first regions A of the neighboring first mother substrates 10.

The alignment key 12 may be formed together with the gate line 121, the data line 141, the thin film transistor T, and a black matrix (not shown), but is not limited thereto. The first mother insulating substrate ( 11) may be formed when providing.

The align key 12 represents a cross, and in other embodiments, the align key 12 is not limited to a cross but may be a grid, a polygon, a circle, or the like.

Next, as shown in Figure 5, to provide a second mother substrate 20 (S200).

The second mother substrate 20 may include a first portion C corresponding to the display region a of the first region A of the first mother substrate 10, and a second region of the first mother substrate 10. It corresponds to B) and includes a second portion (D) surrounding the first portion (C). The first portion C later becomes the second substrate 300 of the liquid crystal panel 1.

The patternless transparent electrode layer 22 is formed on the second mother insulating substrate (insulating substrate) 21 corresponding to the entirety of the first portion C and the second portion D of the second mother substrate 20. More specifically, the patternless transparent electrode layer 22 is formed over the entire second mother insulating substrate (insulating substrate) 21.

The patternless transparent electrode layer 22 corresponding to the first portion C later becomes the common electrode 321 of the liquid crystal panel 1.

The second mother substrate 20 does not include a separate pattern, and the patternless transparent electrode layer 22 is also not patterned.

In another embodiment, the order of preparing the first mother substrate 10 (S100) and the preparing of the second mother substrate 20 (S200) may be interchanged with each other and may be performed at the same time.

Next, as shown in FIGS. 6A to 7, resin layers 31 and 41 are formed on the second mother substrate 20 and the first mother plate 10 (S300).

First, the formation of the first resin layer (resin layer 31) on the second mother substrate 20 will be described.

As shown in FIG. 6A, the resin liquid 50 is jetted onto the first part C and the second part D of the second mother substrate 20 through an ink jet printing method. do.

The ink jet printing method refers to a method of printing by jetting ink, that is, the resin liquid 50, using an injector.

As shown in FIG. 6B, since the resin liquid 50 jetted onto the second mother substrate 20 has an energy unstable first phase, the resin liquid 50 may be transformed into an energy stable second phase. It spreads on the two mother substrates 20 to form a first resin layer (resin layer 31).

The first resin layer (resin layer 31) includes an alignment film 31a and a resin alignment key 31b and is in direct contact with the patternless transparent electrode layer 22.

The alignment layer 31a is positioned in the first portion C of the second mother substrate 20 corresponding to the display area a of the first region A of the first mother substrate 10. C) It is formed a little smaller than the whole. The alignment layer 31a later becomes the second alignment layer 400 of the second substrate 300 of the liquid crystal panel 1.

The resin alignment key 31b is located in the second portion D and is in direct contact with the patternless transparent electrode layer 22.

In another embodiment, the patternless transparent electrode layer 22 is not formed at the position where the resin alignment key 31b is to be formed so that the resin alignment key 31b is in direct contact with the second mother insulating substrate (insulating substrate 21). You may be doing

The resin alignment key 31b is formed at an edge portion of the second mother substrate 20 like the alignment key 12, but is not limited thereto. The first portion C of the second mother substrate 20 adjacent to each other is not limited thereto. It can be located in between.

The resin alignment key 31b has a cross shape like the alignment key 12. In another embodiment, the alignment key 12 is not limited to the cross shape but may be a lattice pattern, a polygon, a circle, or the like.

Next, as shown in FIG. 7, the second resin layer 41 is formed on the display area a of the first mother substrate 10 in the same manner as the formation of the first resin layer (resin layer 31). do. The second resin layer 41 later becomes the first alignment layer 200 of the first substrate 100 of the liquid crystal panel 1.

As described above, the resin layers 31 and 41 were formed on the second mother substrate 20 and the first mother substrate 10.

Next, as illustrated in FIG. 7, the sealant 500 is formed along the circumference of the display area a of the first area A of the first mother substrate 10 (S400).

The sealant 500 includes a photocurable material and the like, and is formed by using a screen mask method or a dispense method.

Next, as shown in FIG. 7, the liquid crystal layer 600 is formed in the display area a that the sealant 500 surrounds (S500).

The liquid crystal layer 600 in the sealant 500 is formed by a dropping method. However, the present invention is not limited thereto and can be formed by an injection method or the like.

Next, as shown in FIG. 8, the second mother substrate 20 is aligned to face the first mother substrate 10 (S600).

The resin alignment key 31b which faces the second mother substrate 20 on the first mother substrate 10 and is formed on the second mother substrate 20 on the alignment key 12 of the first mother substrate 10. ) To align the first mother substrate 10 and the second mother substrate 20.

Thereafter, the first mother substrate 10 and the second mother substrate 20 are bonded to each other, and the first mother substrate 10 is cut along the circumference of the first region A and the second portion C is thus aligned. Cutting the substrate 20 produces a liquid crystal panel 1 manufactured according to the first embodiment of the present invention shown in FIG.

Effects of the manufacturing method of the liquid crystal display device according to the first embodiment of the present invention described above will be described.

Recently, color filters, black matrices, and the like are formed on a first substrate in order to simplify the process of manufacturing a liquid crystal panel and to improve light transmittance.

However, in this case, since a process of forming a pattern is performed only on the first mother substrate on which the first substrate is manufactured, an additional process for forming an alignment key on the second mother substrate on which the second substrate without a pattern is manufactured is added. There is a problem that needs to be done.

However, in the manufacturing method of the liquid crystal display device according to the first embodiment of the present invention, the first resin layer (resin layer 31) including the resin alignment key 31b on the second mother substrate 20 having no process of forming a pattern. By forming the present invention, a method of manufacturing a liquid crystal display device capable of effectively forming an alignment key on a second mother substrate 20 without a pattern without a separate process for forming the alignment key is provided.

In addition, since there is no separate process for forming an alignment key on the second mother substrate 20, a manufacturing method of a liquid crystal display device which can reduce manufacturing cost is provided.

Hereinafter, a second embodiment of the present invention will be described with reference to FIGS. 9 to 10C.

Hereinafter, only the characteristic parts distinguished from the first embodiment will be described and described, and the descriptions thereof will be omitted according to the first embodiment and known techniques. In addition, in the second embodiment of the present invention, for the convenience of description, the same components will be described using the same reference numerals.

Hereinafter, the liquid crystal panel 2 manufactured according to the second embodiment of the present invention will be described with reference to FIG. 9.

As shown in FIG. 9, the first substrate 100 of the liquid crystal panel 2 manufactured according to the second embodiment of the present invention may be formed on the pixel electrode 181 and the second insulating layer 171 by a third insulating layer (eg, a third insulating layer). 183) is located.

The third insulating layer 183 insulates the first substrate common electrode (common electrode) 185 and the pixel electrode 181 which will be described later.

The first substrate common electrode (common electrode) 185 is positioned on the third insulating layer 183.

The first substrate common electrode (common electrode) 185 is formed of indium tin oxide (ITO) or indium zinc oxide (IZO) like the pixel electrode 181.

The pixel electrode 181 and the first substrate common electrode (common electrode) 185 are formed to cross each other.

When a voltage is applied to the pixel electrode 181 and the first substrate common electrode (common electrode) 185, a horizontal electric field is formed between the pixel electrode 181 and the first substrate common electrode (common electrode) 185 to form a liquid crystal layer ( The direction of the liquid crystal of 600 changes.

The first alignment layer 200 is positioned on the first substrate common electrode (common electrode) 185 and third insulating layer 183.

In the second substrate 300, the second alignment layer 400 is positioned on the second insulating substrate 310, and the second insulating substrate 310 and the second alignment layer 400 are in direct contact with each other.

Hereinafter, a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention will be described with reference to FIGS. 10A to 10C. In the method of manufacturing a liquid crystal display according to the second embodiment, the first mother substrate 10 includes a first substrate common electrode (common electrode) 185 formed on the first mother insulating substrate 11.

Hereinafter, the step of forming the first resin layer (resin layer 31) on the second mother substrate 20 will be described.

As shown in FIG. 10A, the resin liquid 50 is dot printed on the first and second portions C and 20 of the second mother substrate 20 through flexo printing. do.

The flexographic printing method refers to a method of printing using a printing apparatus including a first roll 81, a second roll 82, a third roll 83, and a fourth roll 84.

As shown in FIG. 10B, after the resin liquid 50 is buried in the first roll 81, the first roll 81 is rotated in a clockwise direction and the resin is formed in the recessed portion 82a of the second roll 82. Inject the liquid 50.

The second roll 82 in which the resin liquid 50 is injected into the recessed portion 82a is buried in the dot-shaped resin liquid 50 on the third roll 83 while rotating counterclockwise.

The third roll 83 is rotated in the clockwise direction and the fourth roll 84 facing the third roll 83 is rotated in the counterclockwise direction. ) And the second mother substrate 20 located between the fourth roll 84 is moved in the third direction.

As the second mother substrate 20 moves in the third direction, a dot-shaped resin liquid 50 is printed on the second mother substrate 20 on the third roll 83.

As shown in FIG. 10C, the resin liquid 50 dot printed on the second mother substrate 20 has a first phase which is energy unstable, and thus deforms into a second phase that is energy stable. Spread on the second mother substrate 20 to form a first resin layer (resin layer 31).

The first resin layer (resin layer 31) includes an alignment film 31a and a resin alignment key 31b and is in direct contact with the second mother insulating substrate (insulating substrate 21).

The alignment layer 31a is positioned in the first portion C and is slightly smaller than the entirety of the first portion C. FIG. The alignment layer 31a becomes a second alignment layer 400 of the second substrate 300 of the liquid crystal panel 2 later.

The resin alignment key 31b is located in the second portion D and is in direct contact with the second mother insulating substrate (insulating substrate 21).

Although embodiments of the present invention have been shown and described, it will be apparent to those skilled in the art that the present embodiments may be modified without departing from the spirit or spirit of the invention. It is intended that the scope of the invention be defined by the claims appended hereto and their equivalents.

As described above, according to the present invention, a method of manufacturing a liquid crystal display device capable of effectively forming an alignment key on a mother substrate without a pattern is provided.

Claims (9)

In the manufacturing method of the liquid crystal display device, Providing a first mother substrate including a first region having a thin film transistor and a second region surrounding the first region and having an alignment key formed thereon; Providing a second mother substrate including a first portion corresponding to the first region and a second portion corresponding to the second region; Forming a resin layer on the second mother substrate, the resin layer comprising an alignment layer positioned at the first portion and a resin alignment key positioned at the second portion; And arranging the second mother substrate to face the first mother substrate and aligning the resin alignment keys on the alignment key. The method of claim 1, And the first mother substrate comprises a color filter formed in the first region. The method of claim 1, And the first mother substrate comprises a black matrix formed in the first region. The method of claim 1, The first mother substrate includes a pixel electrode and a common electrode formed in the first region. The method according to any one of claims 1 to 4, The second mother substrate includes an insulating substrate, And the resin alignment key is formed in direct contact with the insulating substrate. The method of claim 1, And the second mother substrate includes a patternless transparent electrode layer formed over the first portion and the entirety of the second portion. The method of claim 6, And the resin alignment key is in direct contact with the patternless transparent electrode layer. The method of claim 1, The first area includes a display area and a non-display area, And the alignment layer is formed to correspond to the display area. The method of claim 1, And the resin layer is formed through a flexo printing method or an ink jet printing method.

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