KR20080098435A - Process for preparing bis-phthalonitrile monomer - Google Patents
Process for preparing bis-phthalonitrile monomer Download PDFInfo
- Publication number
- KR20080098435A KR20080098435A KR1020087023461A KR20087023461A KR20080098435A KR 20080098435 A KR20080098435 A KR 20080098435A KR 1020087023461 A KR1020087023461 A KR 1020087023461A KR 20087023461 A KR20087023461 A KR 20087023461A KR 20080098435 A KR20080098435 A KR 20080098435A
- Authority
- KR
- South Korea
- Prior art keywords
- bis
- benzene
- phthalonitrile monomer
- phthalonitrile
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000000178 monomer Substances 0.000 title claims abstract description 56
- 229920006391 phthalonitrile polymer Polymers 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 68
- 239000000203 mixture Substances 0.000 claims abstract description 22
- XJJYJJKMQRFGQM-UHFFFAOYSA-N 3-[3-(3-hydroxyphenoxy)phenoxy]phenol Chemical compound OC1=CC=CC(OC=2C=C(OC=3C=C(O)C=CC=3)C=CC=2)=C1 XJJYJJKMQRFGQM-UHFFFAOYSA-N 0.000 claims abstract description 20
- -1 3,4-dicyanophenoxy Chemical group 0.000 claims abstract description 18
- NTZMSBAAHBICLE-UHFFFAOYSA-N 4-nitrobenzene-1,2-dicarbonitrile Chemical compound [O-][N+](=O)C1=CC=C(C#N)C(C#N)=C1 NTZMSBAAHBICLE-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000003446 ligand Substances 0.000 claims abstract description 10
- 238000002360 preparation method Methods 0.000 claims abstract description 10
- 150000001879 copper Chemical class 0.000 claims abstract description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000003054 catalyst Substances 0.000 claims abstract description 8
- 239000012380 dealkylating agent Substances 0.000 claims abstract description 5
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims abstract description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 24
- 239000002585 base Substances 0.000 claims description 19
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical group CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 14
- 150000008378 aryl ethers Chemical class 0.000 claims description 14
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical group [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 14
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims description 12
- 150000001491 aromatic compounds Chemical class 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- ASHGTJPOSUFTGB-UHFFFAOYSA-N 3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1 ASHGTJPOSUFTGB-UHFFFAOYSA-N 0.000 claims description 8
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical compound CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 claims description 8
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 8
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 7
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical compound N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 claims description 6
- 239000003880 polar aprotic solvent Substances 0.000 claims description 6
- HIXFSHWMTVMNID-UHFFFAOYSA-N 1,3-bis(3-methoxyphenoxy)benzene Chemical compound COC1=CC=CC(OC=2C=C(OC=3C=C(OC)C=CC=3)C=CC=2)=C1 HIXFSHWMTVMNID-UHFFFAOYSA-N 0.000 claims description 5
- JSRLURSZEMLAFO-UHFFFAOYSA-N 1,3-dibromobenzene Chemical compound BrC1=CC=CC(Br)=C1 JSRLURSZEMLAFO-UHFFFAOYSA-N 0.000 claims description 5
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 4
- 108700003601 dimethylglycine Proteins 0.000 claims description 4
- 229940078490 n,n-dimethylglycine Drugs 0.000 claims description 4
- PLDWAJLZAAHOGG-UHFFFAOYSA-N 1-bromo-3-methoxybenzene Chemical compound COC1=CC=CC(Br)=C1 PLDWAJLZAAHOGG-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims description 3
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 claims description 2
- 125000001246 bromo group Chemical group Br* 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000002346 iodo group Chemical group I* 0.000 claims description 2
- 238000001953 recrystallisation Methods 0.000 claims description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 37
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 9
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004128 high performance liquid chromatography Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- YAFUCDIOZPWIKO-UHFFFAOYSA-N 4-[3-[3-[3-(3,4-dicyanophenoxy)phenoxy]phenoxy]phenoxy]benzene-1,2-dicarbonitrile Chemical compound C1=C(C#N)C(C#N)=CC=C1OC1=CC=CC(OC=2C=C(OC=3C=C(OC=4C=C(C(C#N)=CC=4)C#N)C=CC=3)C=CC=2)=C1 YAFUCDIOZPWIKO-UHFFFAOYSA-N 0.000 description 3
- GCQXFKBSPSLVPY-UHFFFAOYSA-N 4-[4-[4-(3,4-dicyanophenoxy)phenyl]phenoxy]benzene-1,2-dicarbonitrile Chemical group C1=C(C#N)C(C#N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=C(C(C#N)=CC=3)C#N)=CC=2)C=C1 GCQXFKBSPSLVPY-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- 230000020335 dealkylation Effects 0.000 description 3
- 238000006900 dealkylation reaction Methods 0.000 description 3
- 239000012429 reaction media Substances 0.000 description 3
- HBUCPZGYBSEEHF-UHFFFAOYSA-N 3-phenoxyphenol Chemical compound OC1=CC=CC(OC=2C=CC=CC=2)=C1 HBUCPZGYBSEEHF-UHFFFAOYSA-N 0.000 description 2
- SSIIVKRGBWPLNS-UHFFFAOYSA-N 4-[3-(3,4-dicyanophenoxy)phenoxy]benzene-1,2-dicarbonitrile Chemical compound C1=C(C#N)C(C#N)=CC=C1OC1=CC=CC(OC=2C=C(C(C#N)=CC=2)C#N)=C1 SSIIVKRGBWPLNS-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 238000010752 Ullmann ether synthesis reaction Methods 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000012065 filter cake Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- CMQCNTNASCDNGR-UHFFFAOYSA-N toluene;hydrate Chemical compound O.CC1=CC=CC=C1 CMQCNTNASCDNGR-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- YRAJNWYBUCUFBD-UHFFFAOYSA-N 2,2,6,6-tetramethylheptane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(C)(C)C YRAJNWYBUCUFBD-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- 238000006887 Ullmann reaction Methods 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000003862 amino acid derivatives Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
- C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
- C08G73/065—Preparatory processes
- C08G73/0655—Preparatory processes from polycyanurates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C253/00—Preparation of carboxylic acid nitriles
- C07C253/30—Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
- C08G65/4012—Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
- C08G65/4031—(I) or (II) containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
본 발명은 올리고페닐 에테르 스페이서 사슬을 가진 비스-프탈로니트릴 모노머의 제조 방법에 관한 것으로, 상기 비스-프탈로니트릴은 식(I)에서 n이 2인 것이다:The present invention relates to a process for the preparation of bis-phthalonitrile monomers having oligophenyl ether spacer chains, wherein the bis-phthalonitrile is n in formula (I):
. .
상기 방법은, (i) 구리염 및 리간드를 포함하는 촉매 조성물 및 염기의 존재 하에서 3-알콕시페놀과 m-디할로벤젠을 반응시켜 1,3-비스(3-알콕시페녹시)벤젠을 수득하는 단계, (ⅱ) 수득한 1,3-비스(3-알콕시페녹시)벤젠을 탈알킬화제와 반응시켜 1,3-비스(3-하이드록시페녹시)벤젠을 수득하는 단계, 및 (ⅲ) 수득한 1,3-비스(3-하이드록시페녹시)벤젠을 염기의 존재 하에서 4-니트로프탈로니트릴과 반응시켜 1,3-비스[3-(3,4-디시아노페녹시)페녹시]벤젠을 수득하는 단계를 포함한다.The method comprises (i) reacting 3-alkoxyphenol and m-dihalobenzene in the presence of a base and a catalyst composition comprising a copper salt and a ligand to yield 1,3-bis (3-alkoxyphenoxy) benzene (Ii) reacting the obtained 1,3-bis (3-alkoxyphenoxy) benzene with a dealkylating agent to give 1,3-bis (3-hydroxyphenoxy) benzene, and (iii) obtaining 1,3-bis [3- (3,4-dicyanophenoxy) phenoxy] by reacting one 1,3-bis (3-hydroxyphenoxy) benzene with 4-nitrophthalonitrile in the presence of a base Obtaining benzene.
Description
본 발명은 올리고페닐 에테르 스페이서 사슬(oligophenyl ether spacer chain)을 가진 비스-프탈로니트릴 모노머의 제조 방법에 관한 것으로, 상기 모노머는 식(I)으로 나타내어진다:The present invention relates to a process for the preparation of bis-phthalonitrile monomers having oligophenyl ether spacer chains, wherein the monomers are represented by formula (I):
보다 구체적으로, 본 발명은 상기 식에서 n이 2인 모노머를 제조하는 새로운 방법에 관한 것이다. 또 다른 측면에서, 본 발명은 본 발명에 따른 방법으로 얻어지는 중간 생성물을, n이 4 또는 6인 식(I)의 비스-프탈로니트릴 모노머를 수득하는 공정에 이용하는 용도에 관한 것이다.More specifically, the present invention relates to a new process for preparing monomers in which n is 2. In another aspect, the present invention relates to the use of the intermediate product obtained by the process according to the invention in the process of obtaining a bis-phthalonitrile monomer of formula (I) wherein n is 4 or 6.
프탈로니트릴(PN) 수지는 본래 1980년대 초에 미국 해군 연구소에 의해 폴리이미드 수지의 고온 대체물로서 개발되었다. PN 수지는 비스-프탈로니트릴 모노머로부터 유도된 열경화성 물질(thermoset)이다. 이러한 모노머는 경화제의 존재 하에서 트리아진 네트워크를 형성하는 부가방식 반응에서 중합을 일으킨다. 완전 경 화된 수지는 양호한 열적, 산화적 안정성을 나타내며, 고온에서 장기간 기계적 성질을 유지한다. 또한, 상기 모노머의 골격 구조를 형성하는 벤젠환은 매우 안정하다. 이러한 성질들의 조합은, 제조되는 복합체가 높은 내화성을 가진다는 것을 의미한다.Phtharonitrile (PN) resins were originally developed in the early 1980s by the US Naval Research Institute as high temperature substitutes for polyimide resins. PN resins are thermosets derived from bis-phthalonitrile monomers. Such monomers cause polymerization in addition mode reactions which form triazine networks in the presence of a curing agent. Fully cured resins exhibit good thermal and oxidative stability and retain long-term mechanical properties at high temperatures. Moreover, the benzene ring which forms the skeletal structure of the said monomer is very stable. The combination of these properties means that the composite produced is highly fire resistant.
다양한 프탈로니트릴 모노머 및 폴리머가, 다수의 특허 및 특허 출원서에 기재되어 있는데, 그러한 특허 문헌은 일반적으로 프탈로니트릴 모노머의 제조 방법 및 중합 방법을 교시한다. 개시된 모노머는 전형적으로 2개의 프탈로니트릴기를 가지며, 이 2개의 기는 연결되는 스페이서 사슬의 각 단부에 하나씩 존재한다. 상기 모노머는 경화될 수 있고, 그 결과 시아노기들 사이에 가교결합이 일어날 수 있다.Various phthalonitrile monomers and polymers are described in a number of patents and patent applications, which patents generally teach methods for making and polymerizing phthalonitrile monomers. The disclosed monomers typically have two phthalonitrile groups, one of which is present at each end of the spacer chain to which they are linked. The monomer may be cured, and as a result crosslinking may occur between cyano groups.
미국특허 제4,587,325호는 실시예 1 및 5에서, 2개의 비스-프탈로니트릴 모노머, 즉 식(II)의 4,4'-비스(3,4-디시아노페녹시)비페닐 및 식(III)의 1,3-비스(3,4-디시아노페녹시)벤젠을 개시한다:U.S. Pat. No. 4,587,325 discloses, in Examples 1 and 5, two bis-phthalonitrile monomers, namely 4,4'-bis (3,4-dicyanophenoxy) biphenyl of formula (II) and formula (III). 1,3-bis (3,4-dicyanophenoxy) benzene of
상기 모노머들은 4-니트로프탈로니트릴을 방향족 디올과 반응시킴으로써 제조되고, 두 모노머 모두는 PN 수지의 제조시 전구체로서 사용될 수 있다. 그러나, 이들 모노머는 처리 온도가 비교적 높고, 모노머의 높은 융점으로 인해 공정 윈도 우(processing window)가 좁다는 단점을 가진다. 4,4'-비스(3,4-디시아노페녹시)비페닐의 융점은 약 235℃이고, 1,3-비스(3,4-디시아노페녹시)벤젠의 융점은 약 184℃이다.The monomers are prepared by reacting 4-nitrophthalonitrile with aromatic diols, and both monomers can be used as precursors in the preparation of PN resins. However, these monomers have the disadvantage that the processing temperature is relatively high and the processing window is narrow due to the high melting point of the monomers. The melting point of 4,4'-bis (3,4-dicyanophenoxy) biphenyl is about 235 ° C and the melting point of 1,3-bis (3,4-dicyanophenoxy) benzene is about 184 ° C.
국제 특허출원 공보 WO 03/091312호는, 올리고머계 또는 폴리머계 방향족 에테르 스페이서 사슬을 가진 비스-프탈로니트릴 모노머는 상대적으로 낮은 융점을 가질 것으로 예측되므로 PN 수지에서 더 유용할 것이라고 교시한다. 융점과 경화 온도 사이에 넓은 윈도우를 가진 화합물은 경화 속도 및 경화시의 점도를 제어하기 위해 바람직하다. 상기 열경화성 물질은 또한 말단 프탈로니트릴 모이어티들 사이의 스페이서 사슬이 짧은 시스템에 비해 향상된, 인성(toughness) 및 가공성(processability)과 같은 물리적 성질을 가진다. 일반적으로 인성 및 취성(brittleness)은 가교결합 밀도가 낮을수록 향상된다. 이것은 스페이서 사슬의 길이가 더 긴 PN 모노머를 사용함으로써 달성될 수 있다. 상기 특허 출원서에서, 발명자들은 레조르시놀과 같은 m-디하이드록시 방향족 화합물을 1,3-디브로모벤젠과 같은 m-디할로 방향족 화합물과 반응시킴으로써 형성된 하이드록시 종결(hydroxyterminated) 방향족 에테르 올리고머의 제조에 대한 실시예를 개시한다. 상기 반응은 구리염 및 탄산세슘의 존재 하에서 울만(Ullmann) 합성법에 의해 실행된다. 방향족 에테르 올리고머의 사슬 길이는 m-디하이드록시 방향족 및 m-디할로 방향족 화합물의 몰비에 의해 조절된다. 하이드록시 종결 방향족 에테르 올리고머는 4-니트로프탈로니트릴과 추가로 반응하여 식(I)의 비스-프탈로니트릴 모노머를 형성하는데, 에테르 스페이서 사슬은 이론적으로 2, 4, 6, 또는 8개인 상기 식에서 의 n에 대응하여 평균 3, 5, 7 또는 9개의 방향족기를 포함한다.International patent application WO 03/091312 teaches that bis-phthalonitrile monomers having oligomeric or polymeric aromatic ether spacer chains will be more useful in PN resins because they are expected to have a relatively low melting point. Compounds having a wide window between the melting point and the curing temperature are preferred for controlling the rate of curing and the viscosity at curing. The thermoset also has physical properties such as toughness and processability, with improved spacer chains between terminal phthalonitrile moieties compared to shorter systems. In general, toughness and brittleness are improved with lower crosslink density. This can be accomplished by using PN monomers with longer spacer chain lengths. In this patent application, the inventors have described the hydroxyterminated aromatic ether oligomers formed by reacting m-dihydroxy aromatic compounds such as resorcinol with m-dihalo aromatic compounds such as 1,3-dibromobenzene. An example for preparation is disclosed. The reaction is carried out by Ullmann synthesis in the presence of copper salts and cesium carbonate. The chain length of the aromatic ether oligomer is controlled by the molar ratio of m-dihydroxy aromatic and m-dihalo aromatic compounds. The hydroxy terminated aromatic ether oligomers further react with 4-nitrophthalonitrile to form bis-phthalonitrile monomers of formula (I), wherein the ether spacer chain is theoretically 2, 4, 6, or 8 wherein Corresponding to n includes 3, 5, 7 or 9 aromatic groups on average.
WO 03/091312에 개시된 비스-프탈로니트릴 모노머의 제조 방법은 적어도 다음과 같은 단점을 나타낸다. 실시예에서 사용된 반응 조건은 스페이서 사슬 길이가 넓게 분포된 비스-프탈로니트릴 모노머들의 복합 혼합물을 포함하는 생성물을 형성한다. 얻어진 생성물은 또한 산성 수용액으로부터 분리되므로, 하이드록시 및 할로겐 종결 올리고머와 같은 모든 수 불용성 부산물이 생성물에 잔존한다. 이에 따라 경화 단계에서 생성물의 반응을 제어하는 데 큰 어려움이 초래될 수 있다. 따라서, 그러한 혼합물은 향상된 물리적 성질과 함께 양호한 열적 및 산화적 안정성이 요구되는 PN 수지용 전구체로서는 바람직하지 않다.The process for the preparation of bis-phthalonitrile monomers disclosed in WO 03/091312 exhibits at least the following disadvantages. The reaction conditions used in the examples form a product comprising a complex mixture of bis-phthalonitrile monomers with widely distributed spacer chain lengths. The product obtained is also separated from the acidic aqueous solution, so that all water insoluble byproducts such as hydroxy and halogen terminated oligomers remain in the product. This can lead to great difficulties in controlling the reaction of the product in the curing step. Therefore, such mixtures are not preferred as precursors for PN resins that require good thermal and oxidative stability with improved physical properties.
올리고머계 방향족 에테르 스페이서 사슬을 가진 고순도의 비스-프탈로니트릴 모노머의 제조 방법에 대한 요구가 있는 것으로 밝혀졌다. 본 발명은 예상치 않게, n이 2인 상기 식(I)의 비스-프탈로니트릴 모노머의 제조 방법으로서 예를 들면 98%보다 높은 고순도의 생성물을 생성하는 새로운 제조 방법을 제공한다. 본 발명의 방법은 다음과 같은 단계를 포함한다:It has been found to be a need for a process for the preparation of high purity bis-phthalonitrile monomers having oligomeric aromatic ether spacer chains. The present invention unexpectedly provides a new process for producing bis-phthalonitrile monomers of formula (I) wherein n is 2, for example producing a product of high purity higher than 98%. The method of the present invention comprises the following steps:
i) 구리염 및 리간드를 포함하는 촉매 조성물 및 염기의 존재 하에서 3-알콕시페놀과 m-디할로벤젠을 반응시켜 1,3-비스(3-알콕시페녹시)벤젠을 수득하는 단계,i) reacting 3-alkoxyphenol and m-dihalobenzene in the presence of a base and a catalyst composition comprising a copper salt and a ligand to obtain 1,3-bis (3-alkoxyphenoxy) benzene,
ⅱ) 단계(i)에서 수득한 1,3-비스(3-알콕시페녹시)벤젠을 탈알킬화제(dealkylating agent)와 반응시켜 1,3-비스(3-하이드록시페녹시)벤젠을 수득하는 단계, 및Ii) reacting the 1,3-bis (3-alkoxyphenoxy) benzene obtained in step (i) with a dealkylating agent to obtain 1,3-bis (3-hydroxyphenoxy) benzene , And
ⅲ) 단계(ⅱ)에서 수득한 1,3-비스(3-하이드록시페녹시)벤젠을 염기의 존재 하에서 4-니트로프탈로니트릴과 반응시켜 식(I)로 나타내어지는 1,3-비스[3-(3,4-디시아노페녹시)페녹시]벤젠을 수득하는 단계.Iii) 1,3-bis (3-hydroxyphenoxy) benzene obtained in step (ii) is reacted with 4-nitrophthalonitrile in the presence of a base to give 1,3-bis [ Obtaining 3- (3,4-dicyanophenoxy) phenoxy] benzene.
본 발명에 따른 방법의 단계(i)에서 3-알콕시페놀은 m-디할로벤젠과 반응하여 하기 반응 스킴(IV)에 예시된 바와 같이 1,3-비스(3-알콕시페녹시)벤젠을 형성한다:In step (i) of the process according to the invention the 3-alkoxyphenol is reacted with m-dihalobenzene to form 1,3-bis (3-alkoxyphenoxy) benzene as illustrated in the following reaction scheme (IV). do:
상기 식에서, R은 메틸, 에틸, 프로필 또는 부틸기와 같은 저급 알킬기, 또는 벤질기와 같은 알킬아릴기이고, X는 브롬 또는 요오드와 같은 할로겐이다. 따라서, 상기 알콕시는 바람직하게는 메톡시, 에톡시, 프로폭시, 부톡시 또는 벤질옥시와 같은 아릴알콕시이고, 상기 할로는 마찬가지로 요오도 또는 브로모인 것이 바람직하다. 상기 3-알콕시페놀은, 본 발명의 바람직한 실시예에서, 3-메톡시페놀이고, 상기 m-디할로벤젠은 마찬가지로 1,3-디브로모벤젠인 것이 바람직하다. 적합한 몰비는, 예를 들면, m-디할로벤젠 1몰에 대해 3-알콕시페놀 2∼3몰이다. 본 발명의 실시예에서, 상기 반응은 디메틸 설폭사이드, N,N-디메틸포름아미드, N,N-디메틸아세트아미드 및/또는 N-메틸-2-피롤리돈과 같은 하나 이상의 극성 비양성자성 용매(aprotic solvent)의 존재 하에서 수행된다. 가장 바람직한 용매는 N-메틸-2-피롤리돈이다. 상기 반응은 염기와 촉매를 사용하는 Ullmann 에테르 합성법으로서 실행된다. 적합한 염기는 알칼리 및 알칼리 토금속 비카보네이트, 카보네이트, 하이드록사이드 및 알코올레이트이다. 카보네이트가 일반적으로 바람직한 염기이고, 가장 바람직한 카보네이트는 탄산칼륨이다. 염기의 적합한 양은 반응 매질에 존재하는 3-알콕시페놀 1몰에 대해 0.5∼2몰이다. 촉매는 Ullmann 에테르 촉매로서, 예를 들면 구리염과 같은 금속염이다. 가장 바람직한 구리염은 요오드화구리(I) 및/또는 브롬화구리(I)이다. 또 다른 적합한 구리 화합물로는, 제한되지는 않지만, 염화구리(I), 브롬화구리(II), 황산구리(II) 및 아세트산구리(II)가 포함된다. 촉매의 적합한 양은 일반적으로 상기 m-디할로벤젠의 몰을 기준으로 계산했을 때 0.1∼10 몰%, 예를 들면 0.5∼2 몰% 범위 내이다. 상기 반응의 활성도는 예를 들면 구리염을 반응 매질 중에 더 잘 용해되도록 적절한 리간드를 첨가함으로써 더욱 향상될 수 있다. 구리 촉매화 Ullmann 에테르 합성용으로 몇 가지 효과적인 리간드가 개발되었는데, 그 예로는 지방족 디아민, 1,10-페난트롤린 및 그의 유도체, 비덴테이트 및 모노덴테이트 포스핀, 아미노산 유도체 및 2,2,6,6-테트라메틸헵탄-3,5-디온 등이다. 특히 N,N-디메틸글리신은 본 발명의 단계(I)의 반응 조건 하에서 효과적인 리간드인 것으로 입증되었다. 리간드의 적합한 양은 상기 m-디할로벤젠의 몰 기준으로 계산했을 때 0.3∼20 몰%, 예를 들면 1∼6 몰%이다.Wherein R is a lower alkyl group such as methyl, ethyl, propyl or butyl group or an alkylaryl group such as benzyl group and X is halogen such as bromine or iodine. Thus, the alkoxy is preferably an arylalkoxy such as methoxy, ethoxy, propoxy, butoxy or benzyloxy and the halo is likewise iodo or bromo. In the preferred embodiment of the present invention, the 3-alkoxyphenol is 3-methoxyphenol, and the m-dihalobenzene is likewise preferably 1,3-dibromobenzene. Suitable molar ratios are, for example, 2-3 moles of 3-alkoxyphenol per 1 mole of m-dihalobenzene. In an embodiment of the invention, the reaction comprises one or more polar aprotic solvents such as dimethyl sulfoxide, N, N-dimethylformamide, N, N-dimethylacetamide and / or N-methyl-2-pyrrolidone (aprotic solvent) in the presence of. Most preferred solvent is N-methyl-2-pyrrolidone. The reaction is carried out as Ullmann ether synthesis using a base and a catalyst. Suitable bases are alkali and alkaline earth metal bicarbonates, carbonates, hydroxides and alcoholates. Carbonates are generally preferred bases and the most preferred carbonate is potassium carbonate. Suitable amounts of base are from 0.5 to 2 moles relative to 1 mole of 3-alkoxyphenol present in the reaction medium. The catalyst is a Ullmann ether catalyst, for example a metal salt such as a copper salt. Most preferred copper salts are copper iodide (I) and / or copper bromide (I). Still other suitable copper compounds include, but are not limited to, copper chloride (I), copper (II) bromide, copper (II) sulfate and copper (II) acetate. Suitable amounts of catalyst are generally in the range of 0.1 to 10 mol%, for example 0.5 to 2 mol%, calculated on the basis of the moles of m-dihalobenzene. The activity of the reaction can be further enhanced, for example, by adding appropriate ligands to better dissolve the copper salts in the reaction medium. Several effective ligands have been developed for copper catalyzed Ullmann ether synthesis, including aliphatic diamines, 1,10-phenanthroline and derivatives thereof, bidentate and monodentate phosphines, amino acid derivatives and 2,2,6 , 6-tetramethylheptan-3,5-dione and the like. In particular N, N-dimethylglycine has proven to be an effective ligand under the reaction conditions of step (I) of the present invention. Suitable amounts of ligands are from 0.3 to 20 mol%, for example from 1 to 6 mol%, calculated on the molar basis of m-dihalobenzene.
상기 단계(i)의 전형적인 과정은 다음과 같이 기술될 수 있다:A typical procedure of step (i) can be described as follows:
3-메톡시페놀과 같은 3-알콕시페놀을 반응 용기에 넣는다. N-메틸-2-피롤리돈과 같은 용매를 상기 반응제 및 생성물을 용해하기에 충분한 양 이상의 양으로 첨가한다. 탄산칼륨과 같은 염기를 예를 들면 3-알콕시페놀 1몰에 대해 0.5∼2몰 범위로 첨가하고, 반응중에 형성되는 물을 공비혼합 방식으로 제거할 수 있도록 최종적으로 톨루엔과 같은 적합한 용매를 충분한 양으로 상기 혼합물에 첨가한다. 가장 바람직하게는, 질소 또는 아르곤과 같은 불활성 가스의 스트림을 반응 용기로 통과시킨다. 온도를 130∼170℃로 상승시켜 톨루엔-물 공비혼합물을 증류 제거한다. 반응 혼합물을 130∼170℃에서 1∼4시간 동안 유지하여 나머지 물과 톨루엔을 증류 제거한다. 3-알콕시페놀 1몰에 대해, 1,3-디브로모벤젠과 같은 m-디할로벤젠 0.3∼0.5몰을 첨가한 다음, m-디할로벤젠의 몰을 기준으로 계산하여 요오드화구리(I)와 같은 촉매 0.5∼2 몰%, 및 N,N-디메틸글리신과 같은 리간드 1∼6 몰%를 첨가한다. 반응 혼합물을 100∼160℃에서 5∼24시간 동안 또는 반응이 완결될 때까지 교반한다. 20∼40℃로 냉각한 후, 톨루엔과 같은 적합한 용매를 첨가한 다음, 혼합물로부터 무기염을 여과한다. 여과액을 먼저 10% NaOH와 같은 수계 염기로 세척한 다음, 물로 세척하고 최종적으로 1% NaCl 수용액으로 세척한다. 계속해서, 60∼100℃에서 예를 들면 30 mbar의 진공 하에서 증류함으로써 용매/물을 제거하여 1,3-비스(3-알콕시페녹시)벤젠을 얻고, 이것을 추가로 정제하거나, 적합한 경우에는 정제하지 않고 단계(ii)에서 사용한다.3-alkoxyphenol, such as 3-methoxyphenol, is placed in the reaction vessel. A solvent, such as N-methyl-2-pyrrolidone, is added in an amount greater than or equal to sufficient to dissolve the reactant and product. A base such as potassium carbonate is added in the range of 0.5 to 2 moles, for example with respect to 1 mole of 3-alkoxyphenol, and finally a sufficient amount of a suitable solvent such as toluene can be removed in an azeotropic manner to remove the water formed during the reaction. To the mixture. Most preferably, a stream of inert gas such as nitrogen or argon is passed through the reaction vessel. The temperature is raised to 130-170 ° C to distill off the toluene-water azeotrope. The reaction mixture is maintained at 130-170 ° C. for 1-4 hours to distill off the remaining water and toluene. To 1 mole of 3-alkoxyphenol, 0.3-0.5 mole of m-dihalobenzene, such as 1,3-dibromobenzene, is added, and then calculated based on the mole of m-dihalobenzene, copper iodide (I) 0.5-2 mol% of a catalyst such as and 1-6 mol% of a ligand such as N, N-dimethylglycine are added. The reaction mixture is stirred at 100-160 ° C. for 5-24 hours or until the reaction is complete. After cooling to 20-40 ° C., a suitable solvent such as toluene is added and the inorganic salts are filtered out of the mixture. The filtrate is first washed with an aqueous base such as 10% NaOH, then with water and finally with an aqueous 1% NaCl solution. Subsequently, the solvent / water is removed by distillation under vacuum at, for example, 30 mbar at 60-100 ° C. to give 1,3-bis (3-alkoxyphenoxy) benzene, which is further purified or, where appropriate, purified. Use in step (ii).
상기 단계(i)에서 수득한 1,3-비스(3-알콕시페녹시)벤젠을 본 발명에 따른 방법의 단계(ii)에서, 하기 반응 스킴(V)에 예시한 바와 같이 탈알킬화하여 1,3-비스(3-하이드록시페녹시)벤젠을 얻는다:In the step (ii) of the process according to the invention, the 1,3-bis (3-alkoxyphenoxy) benzene obtained in step (i) is dealkylated as exemplified in the following reaction scheme (V) to 1, Obtain 3-bis (3-hydroxyphenoxy) benzene:
상기 식에서, R은 앞에 기재한 것과 동일하다. 문헌에 따르면, 알킬아릴 에테르의 분열(cleaving)에 유용한 반응제로는 매우 다양한 것들이 있으며, 그 예를 들면 무수 술폰산, N-메틸-2-피롤리돈 중의 NaS, 디메틸 설폭사이드 중의 NaCN, AlBr3, AlCl3, BBr3, BCl3 및 48% HBr과 H2 및 벤질 에테르용 Pd/C 등이다. 스킴(V)에 제시된 바와 같은 1,3-비스(3-알콕시페녹시)벤젠을 탈알킬화하는 적합한 방법은, 제한되지는 않지만, 분열제로서 48% 브롬화수소산 및 아세트산의 혼합물을 사용하는 것이다. 아세트산은 혼합물의 수분 함량을 감소시켜 반응 속도를 증가시키기 위해 무수물로서 첨가하는 것이 바람직하다. 48% 브롬화수소산 및 무수 아세트산의 적합한 양은, 존재하는 1,3-비스(3-알콕시페녹시)벤젠 1 중량부에 대해 1∼6 중량부, 예를 들면 2∼3 중량부이다.Wherein R is the same as described above. According to the literature, there are a wide variety of reagents useful for cleaving alkylaryl ethers, for example sulfonic anhydride, NaS in N-methyl-2-pyrrolidone, NaCN in dimethyl sulfoxide, AlBr 3 , AlCl 3 , BBr 3 , BCl 3 and 48% HBr and Pd / C for H 2 and benzyl ether. A suitable method for dealkylating 1,3-bis (3-alkoxyphenoxy) benzene as shown in scheme (V) is to use, but not limited to, a mixture of 48% hydrobromic acid and acetic acid as a splitting agent. Acetic acid is preferably added as anhydride to reduce the water content of the mixture to increase the reaction rate. Suitable amounts of 48% hydrobromic acid and acetic anhydride are 1 to 6 parts by weight, for example 2 to 3 parts by weight, relative to 1 part by weight of 1,3-bis (3-alkoxyphenoxy) benzene present.
상기 단계(i)의 전형적인 과정은 다음과 같이 기술될 수 있다:A typical procedure of step (i) can be described as follows:
본 발명의 단계(i)에서 얻어진 1,3-비스(3-메톡시페녹시)벤젠과 같은 1,3-비스(3-알콕시페녹시)벤젠을 상기 에테르 올리고머 1 중량부에 대해 48% 브롬화수소산 2∼3 중량부와 혼합하고, 그 혼합물을 80∼100℃로 가열한다. 계속해서, 상기 에테르 올리고머 1 중량부에 대해 무수 아세트산 2∼3 중량부를 80∼100℃에서 10∼60분 동안에 상기 반응 혼합물에 첨가한다. 반응 혼합물을 100∼115℃에서 4∼20시간 동안 또는 반응이 완결될 때까지 교반한다. 20∼40℃로 냉각한 후, 물 및 메틸 이소부틸 케톤과 같은 적합한 용매를 첨가한다. 20∼40℃에서 교반한 후 상을 분리하고, 유기층을 물로 세척한다. 최종적으로 유기층을 60∼100℃에서, 예를 들면, 30 mbar의 진공 하에서 증발시켜 1,3-비스(3-하이드록시페녹시)벤젠을 얻고, 이것을 추가로 정제하거나, 적합한 경우에는 정제하지 않고 단계(ⅲ)에서 사용한다.48% bromination of 1,3-bis (3-alkoxyphenoxy) benzene, such as 1,3-bis (3-methoxyphenoxy) benzene, obtained in step (i) of the present invention with respect to 1 part by weight of the ether oligomer It is mixed with 2-3 parts by weight of hydrochloric acid, and the mixture is heated to 80 to 100 ° C. Subsequently, 2-3 parts by weight of acetic anhydride are added to the reaction mixture for 10 to 60 minutes at 80 to 100 ° C with respect to 1 part by weight of the ether oligomer. The reaction mixture is stirred at 100-115 ° C. for 4-20 hours or until the reaction is complete. After cooling to 20-40 ° C., suitable solvents such as water and methyl isobutyl ketone are added. After stirring at 20-40 ° C., the phases are separated and the organic layer is washed with water. Finally the organic layer is evaporated at 60-100 ° C., for example under a vacuum of 30 mbar, to give 1,3-bis (3-hydroxyphenoxy) benzene, which is further purified or, if appropriate, without purification. Used in step (iii).
상기 단계(ii)에서 수득한 1,3-비스(3-하이드록시페녹시)벤젠을 본 발명에 따른 방법의 단계(ⅲ)에서, 하기 반응 스킴(VI)에 예시한 바와 같이 4-니트로프탈로니트릴과 반응시켜 1,3-비스[3-(3,4-디시아노-페녹시)페녹시]벤젠을 얻는다:The 1,3-bis (3-hydroxyphenoxy) benzene obtained in step (ii) is subjected to 4-nitrope as illustrated in the following reaction scheme (VI) in step (iii) of the process according to the invention. Reaction with dealonitrile affords 1,3-bis [3- (3,4-dicyano-phenoxy) phenoxy] benzene:
페닐 에테르 스페이서 사슬을 구비한 비스-프탈로니트릴 모노머는 전형적으로, 하이드록시 종결 방향족 에테르 및 4-니트로프탈로니트릴을 용매 중에 용해하고, 염기의 존재 하에서 가열함으로써 제조된다. 상기 반응은 디메틸 설폭사이드, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, 또는 N-메틸-2-피롤리돈과 같은 극성 비양성자성 용매 중에서 수행된다. 적합한 염기는 알칼리 및 알칼리 토금속 비카보네이트, 카보네이트, 하이드록사이드 및 알코올레이트이다. 카보네이트가 바람직한 염기이고, 가장 바람직한 카보네이트는 탄산칼륨이다. 4-니트로프탈로니트릴 및 상기 염기의 적합한 양은 반응 매질에 존재하는 3-비스(3-하이드록시페녹시)벤젠 1몰에 대해 2∼3몰이다. Bis-phthalonitrile monomers with phenyl ether spacer chains are typically prepared by dissolving hydroxy terminated aromatic ether and 4-nitrophthalonitrile in a solvent and heating in the presence of a base. The reaction is carried out in a polar aprotic solvent such as dimethyl sulfoxide, N, N-dimethylformamide, N, N-dimethylacetamide, or N-methyl-2-pyrrolidone. Suitable bases are alkali and alkaline earth metal bicarbonates, carbonates, hydroxides and alcoholates. Carbonates are preferred bases and most preferred carbonate is potassium carbonate. Suitable amounts of 4-nitrophthalonitrile and the base are 2-3 moles relative to 1 mole of 3-bis (3-hydroxyphenoxy) benzene present in the reaction medium.
상기 단계(ⅲ)의 전형적인 과정은 다음과 같이 기술될 수 있다:A typical procedure of the above step can be described as follows:
1,3-비스(3-하이드록시페녹시)벤젠을 반응제와 생성물을 용해하기에 충분한 양 이상의 양으로 N,N-디메틸포름아미드와 같은 용매와 혼합한다. 계속해서, 4-니트로프탈로니트릴 및 탄산칼륨과 같은 염기를, 1,3-비스(3-하이드록시페녹시)벤젠 1몰에 대해 2∼3몰의 비율로 첨가한다. 질소 또는 아르곤과 같은 불활성 가스의 스트림을 반응 용기로 통과시킨다. 온도를 25∼80℃로 상승시키고, 3∼12시간 동안 또는 반응이 완결될 때까지 유지시킨다. 고온의 반응 혼합물을 여과하여 무기염을 제거한다. 혼합물로부터 목표로 하는 생성물을 침전시키기에 충분한 양 이상의 양으로, 메탄올과 같은 적합한 침전제를 여과액에 첨가한다. 이어서, 생성물이 결정화될 때까지, 예를 들면 -10∼30℃의 온도에서 혼합물을 교반한다. 고체 생성물을 포집하고 메탄올과 같은 적합한 용매로 세척한다. 얻어진 조생성물(crude product)은 적합한 용매, 예를 들면 N,N-디메틸포름아미드와 메탄올의 혼합물 중에서 재결정시켜 추가로 정제함으로써, 순도가 예를 들어 >98%인 1,3-비스[3-(3,4-디시아노페녹시)페녹시]벤젠을 수득한다.1,3-bis (3-hydroxyphenoxy) benzene is mixed with a solvent such as N, N-dimethylformamide in an amount greater than or equal to sufficient to dissolve the reactant and the product. Subsequently, bases such as 4-nitrophthalonitrile and potassium carbonate are added in a ratio of 2 to 3 mol relative to 1 mol of 1,3-bis (3-hydroxyphenoxy) benzene. A stream of inert gas such as nitrogen or argon is passed through the reaction vessel. The temperature is raised to 25-80 ° C. and maintained for 3-12 hours or until the reaction is complete. The hot reaction mixture is filtered to remove inorganic salts. In an amount greater than or equal to sufficient to precipitate the desired product from the mixture, a suitable precipitant such as methanol is added to the filtrate. The mixture is then stirred until the product crystallizes, for example at a temperature of -10 to 30 ° C. The solid product is collected and washed with a suitable solvent such as methanol. The crude product obtained is further purified by recrystallization in a suitable solvent such as a mixture of N, N-dimethylformamide and methanol to give 1,3-bis [3- with a purity of> 98%, for example. (3,4-dicyanophenoxy) phenoxy] benzene is obtained.
본 발명의 신규 방법에 의하면, 약 120℃의 융점을 가진 1,3-비스[3-(3,4-디시아노페녹시)페녹시]벤젠과 같은 고순도의 비스-프탈로니트릴 모노머를 제조할 수 있다. 따라서, 본 발명의 방법은 적어도 다음과 같은 이점을 제공한다: (1) 예컨대 1,3-비스[3-(3,4-디시아노페녹시)페녹시]벤젠을 기재로 하는 PN 수지 시스템은 이렇게 비교적 낮은 융점을 가지므로, 식(II) 및 (III)에 개시된 4,4'-비스(3,4-디시아노페녹시)비페닐 및 1,3-비스(3,4-디시아노페녹시)벤젠과 같은 PN 수지를 기재로 하는 수지 시스템에 비해 더 낮은 공정 온도 및 더 넓은 공정 윈도우를 나타내고, (2) 생성물의 순도가 높기 때문에, 경화 단계에서의 반응 제어의 어려움은 실질적으로 감소되거나, 경우에 따라서는 완전 해소될 수 있다.According to the novel process of the present invention, a high-purity bis-phthalonitrile monomer such as 1,3-bis [3- (3,4-dicyanophenoxy) phenoxy] benzene having a melting point of about 120 ° C can be prepared. Can be. Thus, the process of the present invention provides at least the following advantages: (1) PN resin systems based on 1,3-bis [3- (3,4-dicyanophenoxy) phenoxy] benzene, for example, Because of this relatively low melting point, the 4,4′-bis (3,4-dicyanophenoxy) biphenyl and 1,3-bis (3,4-dicyanophenoxy) disclosed in Formulas (II) and (III) C) shows lower process temperatures and wider process windows compared to resin systems based on PN resins such as benzene, and (2) the high purity of the product, the difficulty of controlling the reaction in the curing step is substantially reduced or In some cases, it can be completely eliminated.
또한, 상기 단계(II)에서 얻어지는 중간체인 1,3-비스(3-하이드록시페녹시)벤젠은, 하기 반응 스킴(VII)에 예시하는 바와 같이, 3-알콕시할로 방향족 화합물을 사용한 Ullmann 에테르 반응 및 탈알킬화에 의해, 훨씬 더 긴 올리고페닐 에테르 스페이서 사슬을 가진 하이드록시 종결 방향족 에테르 올리고머를 제조하는 데 유용하다:Further, 1,3-bis (3-hydroxyphenoxy) benzene, which is the intermediate obtained in step (II), is Ullmann ether using 3-alkoxyhalo aromatic compound, as illustrated in the following reaction scheme (VII). By reaction and dealkylation, it is useful to prepare hydroxy terminated aromatic ether oligomers with much longer oligophenyl ether spacer chains:
상기 식에서, R 및 X는 앞에서 정의한 것과 동일한 것이면 적합하다. 적합한 3-알콕시할로 방향족 화합물의 예는 3-메톡시브로모벤젠이다. 다른 바람직한 반응제, 염기, 탈알킬화제 및 반응 조건 등은 앞에서 개시한 바와 같다. 얻어지는 하이드록시 종결 방향족 에테르 올리고머는 4-니트로프탈로니트릴과 더욱 반응을 진행하여, n이 4인 식(I)의 비스-프탈로니트릴 모노머를 생성하도록 할 수 있다. 얻어지는 하이드록시 종결 방향족 에테르 올리고머는 또한 상기 3-알콕시할로 방향족 화합물과의 제2 반응 및 제2 탈알킬화를 통해 하이드록시 종결 방향족 에테르 올리고머를 생성한 다음, 4-니트로프탈로니트릴과의 반응에 의해 n이 6인 식(I)의 비스-프날로니트릴 모노머를 생성하도록 할 수 있다.In the above formula, R and X are suitably the same as defined above. An example of a suitable 3-alkoxyhalo aromatic compound is 3-methoxybromobenzene. Other preferred reagents, bases, dealkylating agents and reaction conditions are as described above. The resulting hydroxy terminated aromatic ether oligomer can be further reacted with 4-nitrophthalonitrile to produce a bis-phthalonitrile monomer of formula (I) with n = 4. The resulting hydroxy terminated aromatic ether oligomer is also subjected to a second reaction with the 3-alkoxyhalo aromatic compound and a second dealkylation to produce a hydroxy terminated aromatic ether oligomer, followed by reaction with 4-nitrophthalonitrile. It is possible to produce a bis-pronalonitrile monomer of formula (I) wherein n is 6.
얻어지는 하이드록시 종결 방향족 에테르 올리고머는 물론 상기 3-알콕시할로 방향족 화합물과 반응하기 전에 상기 3-알콕시할로 방향족 화합물과의 반응 및 탈알킬화 공정을 반복적으로 거칠 수 있으며, 최종적으로 4-니트로프탈로니트릴과의 반응 후, n이 8, 10, 12 등인 식(I)의 비스-프탈로니트릴 모노머를 생성할 수 있다.The resulting hydroxy terminated aromatic ether oligomer as well as the reaction and dealkylation process with the 3-alkoxyhaloaromatic compound can be subjected to iterative reactions before reacting with the 3-alkoxyhalo aromatic compound and finally with 4-nitrophthal After the reaction with the nitrile, a bis-phthalonitrile monomer of formula (I) in which n is 8, 10, 12 or the like can be produced.
추가적 노력을 기울이지 않고도, 당업자는 이상과 같은 설명을 이용하여 본 발명을 충분히 활용할 수 있을 것으로 생각된다. 따라서, 이하의 바람직한 실시예는 단지 예시적인 것이며, 결코 본 개시 내용의 잔여 부분을 제한하는 것으로 해석해서는 안될 것이다. 이하에서, 실시예 1 내지 3은 본 발명의 방법 중 단계(i) 내지 (ⅲ)의 실시예에 따른 비스-프탈로니트릴 모노머의 제조에 관한 것이다.Without further effort, it is believed that one skilled in the art can, using the foregoing description, utilize the present invention to its fullest extent. Accordingly, the following preferred embodiments are merely exemplary and should not be construed as limiting the remainder of the disclosure. In the following, Examples 1 to 3 relate to the preparation of bis-phthalonitrile monomers according to the examples of steps (i) to (iii) of the process of the invention.
실시예Example 1 One
3-메톡시페놀 64.8g, N-메틸-2-피롤리돈 60ml, 탄산칼륨 72.2g, 및 톨루엔 100ml를, 온도계, 기계식 교반기, 증류 기구 및 질소 입구를 구비한 500ml 용량의 3구 반응용 플라스크에 넣었다. 질소 기류를 상기 용기로 통과시켰다. 상기 혼합물을 150℃로 가열하고, 톨루엔-물의 공비혼합물을 혼합물로 증류 제거했다. 반응 중에 형성되는 물과 잔여 톨루엔을 증류 제거하면서 150℃에서 2시간 동안 교반을 계속했다. 140℃로 냉각한 다음, 1,3-디브로모벤젠 51.4g, 요오드화구리(I) 0.40g 및 N,N-디메틸글리신 0.66g을 반응 혼합물에 첨가했다. HPLC 분석에 의해 반응이 완결된 것으로 나타날 때까지 140℃에서 11시간 동안 교반을 계속했다. 반응 혼합물을 20∼25℃로 냉각하고, 톨루엔 200ml를 첨가한 다음, 무기염을 제거하기 위해 여과했다. 여과 케익을 톨루엔으로 40ml씩 2회 세척하고, 세척액을 여과액과 합쳤다. 이 여과액에 10% NaOH 수용액 200ml를 첨가하고, 혼합물을 15분간 교반한 다음 층분리시켰다. 유기층을 물 200ml로 세척하고, 최종적으로 1% NaCl 수용액 200ml로 세척했다. 마지막으로, 80∼85℃에서 20 mbar 진공 하의 증발에 의해 유기층으로부터 톨루엔을 제거하여 1,3-비스(3-메톡시페녹시)벤젠 66.9g을 적색을 띤 오일로서 수득했다.500 ml three-necked reaction flask with 64.8 g of 3-methoxyphenol, 60 ml of N-methyl-2-pyrrolidone, 72.2 g of potassium carbonate, and 100 ml of toluene, equipped with a thermometer, a mechanical stirrer, a distillation apparatus, and a nitrogen inlet. Put in. Nitrogen airflow was passed through the vessel. The mixture was heated to 150 ° C. and the azeotrope of toluene-water was distilled off with the mixture. Stirring was continued at 150 ° C. for 2 hours while distilling off water and residual toluene formed during the reaction. After cooling to 140 ° C., 51.4 g of 1,3-dibromobenzene, 0.40 g of copper (I) iodide and 0.66 g of N, N-dimethylglycine were added to the reaction mixture. Stirring was continued at 140 ° C. for 11 hours until HPLC analysis indicated complete reaction. The reaction mixture was cooled to 20-25 ° C., 200 ml of toluene was added and then filtered to remove inorganic salts. The filter cake was washed twice with 40 ml of toluene and the wash was combined with the filtrate. 200 ml of 10% aqueous NaOH solution was added to the filtrate, and the mixture was stirred for 15 minutes and then separated. The organic layer was washed with 200 ml of water and finally with 200 ml of 1% NaCl aqueous solution. Finally, toluene was removed from the organic layer by evaporation under vacuum at 20 mbar at 80-85 ° C. to give 66.9 g of 1,3-bis (3-methoxyphenoxy) benzene as a reddish oil.
실시예Example 2 2
실시예 1에서 얻어진 1,3-비스(3-메톡시페녹시)벤젠 65.8g 및 48% 브롬화수소산 170g을, 온도계, 기계식 교반기 및 응축기를 구비한 1000ml 용량의 3구 반응용 플라스크에 넣었다. 혼합물을 90℃로 가열하고 무수 아세트산 162g을 90∼105℃에서 적하 깔때기를 이용하여 20분 이내에 첨가했다. HPLC 분석에 의해 반응이 완결된 것으로 나타날 때까지 105∼111℃에서 10시간 동안 교반을 계속했다. 반응 혼합물을 20∼25℃로 냉각하고, 물 200ml 및 메틸 이소부틸 케톤 150ml를 가했다. 혼합물을 15분간 교반한 다음 층분리시켰다. 메틸 이소부틸 케톤층을 물 200ml로 세척하고, 80∼85℃에서 20 mbar 진공 하에 건조될 때까지 증발시켜 1,3-비스(3-하 이드록시페녹시)벤젠 63.3g을 적색을 띤 점성 오일로서 수득했다.65.8 g of 1,3-bis (3-methoxyphenoxy) benzene obtained in Example 1 and 170 g of 48% hydrobromic acid were placed in a 1000 ml three-necked reaction flask equipped with a thermometer, a mechanical stirrer and a condenser. The mixture was heated to 90 ° C and 162 g of acetic anhydride was added within 20 minutes using a dropping funnel at 90-105 ° C. Stirring was continued for 10 hours at 105-111 ° C. until HPLC analysis indicated complete reaction. The reaction mixture was cooled to 20-25 ° C. and 200 ml of water and 150 ml of methyl isobutyl ketone were added. The mixture was stirred for 15 minutes and then separated. The methyl isobutyl ketone layer was washed with 200 ml of water and evaporated to dryness under vacuum at 20 mbar at 80-85 ° C. to 63.3 g of 1,3-bis (3-hydroxyphenoxy) benzene as a reddish viscous oil. Obtained as.
실시예Example 3 3
실시예 2에서 얻어진 1,3-비스(3-하이드록시페녹시)벤젠 62.2g, N,N-디메틸포름아미드 160ml, 4-니트로프탈로니트릴 70g 및 탄산칼륨 70g을, 온도계, 기계식 교반기, 응축기 및 질소 입구를 구비한 500ml 용량의 3구 반응용 플라스크에 넣었다. 질소 기류를 상기 용기로 통과시켰다. 상기 혼합물을 58∼60℃로 가열하고, HPLC 분석에 의해 반응이 완결된 것으로 나타날 때까지 상기 온도에서 5시간 동안 교반을 계속했다. 상기 온도에서 반응 혼합물을 여과하여 무기염을 제거하고, 여과 케익을 N,N-디메틸포름아미드로 30ml씩 2회 세척했다. 세척액을 여과액과 합치고 메탄올 800ml를 가했다. 이어서, 생성물이 결정화될 때까지 상기 혼합물을 20∼25℃에서 교반했다. 0∼5℃로 냉각한 다음, 흡입 여과에 의해 고체 생성물을 포집하고 메탄올로 세척했다. 조생성물을 메탄올 180ml와 N,N-디메틸포름아미드 80ml의 혼합물로부터 재결정시키고, 60℃에서 건조하여 1,3-비스[3-(3,4-디시아노페녹시)페놀시]벤젠 47.9g을 옅은 갈색의 분말로서 수득했다. 얻어진 생성물은 118∼122℃의 융점 및 98.6%의 순도(HPLC)를 나타냈다. 62.2 g of 1,3-bis (3-hydroxyphenoxy) benzene obtained in Example 2, 160 ml of N, N-dimethylformamide, 70 g of 4-nitrophthalonitrile and 70 g of potassium carbonate were prepared using a thermometer, a mechanical stirrer, and a condenser. And a 500 ml three-neck reaction flask with a nitrogen inlet. Nitrogen airflow was passed through the vessel. The mixture was heated to 58-60 ° C. and stirring was continued at this temperature for 5 hours until the reaction showed complete by HPLC analysis. At this temperature, the reaction mixture was filtered to remove the inorganic salts, and the filter cake was washed twice with 30 ml of N, N-dimethylformamide. The wash was combined with the filtrate and 800 ml of methanol was added. The mixture was then stirred at 20-25 ° C. until the product crystallized. After cooling to 0-5 [deg.] C., the solid product was collected by suction filtration and washed with methanol. The crude product was recrystallized from a mixture of 180 ml of methanol and 80 ml of N, N-dimethylformamide and dried at 60 ° C. to give 47.9 g of 1,3-bis [3- (3,4-dicyanophenoxy) phenoloxy] benzene. Obtained as a pale brown powder. The product obtained had a melting point of 118-122 ° C. and a purity of 98.6% (HPLC).
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| KR1020087023461A Withdrawn KR20080098435A (en) | 2006-03-06 | 2007-03-05 | Process for preparing bis-phthalonitrile monomer |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20080098435A (en) |
| CN (1) | CN101395201A (en) |
| SE (1) | SE530059C2 (en) |
| WO (1) | WO2007102766A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11591487B2 (en) | 2018-09-21 | 2023-02-28 | Lg Chem, Ltd. | Curable resin composition comprising a phthalonitrile oligomer and a prepolymer thereof |
| US11932727B2 (en) | 2018-08-28 | 2024-03-19 | Lg Chem, Ltd. | Phthalonitrile-based resin with improved impact strength |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102993070A (en) * | 2012-12-04 | 2013-03-27 | 四川大学 | Aromatic diamine containing phthalonitrile side group and synthesis method and application thereof |
| CN103408755A (en) * | 2013-07-09 | 2013-11-27 | 中国船舶重工集团公司第七二五研究所 | Low-viscosity cyano resin monomer and polymer, and preparation method thereof |
| KR102053093B1 (en) * | 2015-12-02 | 2019-12-06 | 주식회사 엘지화학 | Phthalonitrile compound |
| CN108884023B (en) * | 2016-03-31 | 2022-02-25 | 3M创新有限公司 | Bisphenol M bisphthalonitrile ether resin, bisphenol P bisphthalonitrile ether resin, their preparation method, resin blend and two-component system |
| CN106046360A (en) * | 2016-04-15 | 2016-10-26 | 电子科技大学 | Aromatic nitrile polymer and preparation method thereof |
| US11059937B2 (en) | 2016-07-25 | 2021-07-13 | The Boeing Company | Epoxy resin |
| WO2018018070A1 (en) * | 2016-07-25 | 2018-02-01 | The Boeing Company | Epoxy resin |
| RU2708399C1 (en) * | 2018-12-03 | 2019-12-06 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" (ИГХТУ) | 4,4'-(((1,4-phenylenebis(oxy))bis(4,1-phenylene))bis(oxy))diphtalonitrile |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6756470B2 (en) * | 2002-04-26 | 2004-06-29 | The United States Of America As Represented By The Secretary Of The Navy | Oligomeric hydroxy arylether phthalonitiles and synthesis thereof |
-
2006
- 2006-03-06 SE SE0600484A patent/SE530059C2/en not_active IP Right Cessation
-
2007
- 2007-03-05 CN CNA2007800079079A patent/CN101395201A/en active Pending
- 2007-03-05 WO PCT/SE2007/000210 patent/WO2007102766A1/en not_active Ceased
- 2007-03-05 KR KR1020087023461A patent/KR20080098435A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11932727B2 (en) | 2018-08-28 | 2024-03-19 | Lg Chem, Ltd. | Phthalonitrile-based resin with improved impact strength |
| US11591487B2 (en) | 2018-09-21 | 2023-02-28 | Lg Chem, Ltd. | Curable resin composition comprising a phthalonitrile oligomer and a prepolymer thereof |
| US11674045B2 (en) | 2018-09-21 | 2023-06-13 | Lg Chem, Ltd | Three-dimensional printing ink comprising a phthalonitrile oligomer |
Also Published As
| Publication number | Publication date |
|---|---|
| SE530059C2 (en) | 2008-02-19 |
| WO2007102766A1 (en) | 2007-09-13 |
| SE0600484L (en) | 2007-09-07 |
| CN101395201A (en) | 2009-03-25 |
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