KR20080042810A - Indole compound, optical filter and optical recording material - Google Patents
Indole compound, optical filter and optical recording material Download PDFInfo
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- KR20080042810A KR20080042810A KR1020087002962A KR20087002962A KR20080042810A KR 20080042810 A KR20080042810 A KR 20080042810A KR 1020087002962 A KR1020087002962 A KR 1020087002962A KR 20087002962 A KR20087002962 A KR 20087002962A KR 20080042810 A KR20080042810 A KR 20080042810A
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- South Korea
- Prior art keywords
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- carbon atoms
- optical recording
- compound
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- -1 Indole compound Chemical class 0.000 title claims abstract description 167
- SIKJAQJRHWYJAI-UHFFFAOYSA-N benzopyrrole Natural products C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 title claims abstract description 51
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 title claims abstract description 49
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 230000003287 optical effect Effects 0.000 title claims description 125
- 239000000463 material Substances 0.000 title claims description 32
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 41
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 24
- 150000001450 anions Chemical class 0.000 claims abstract description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 11
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- 125000005843 halogen group Chemical group 0.000 claims abstract description 9
- 125000001424 substituent group Chemical group 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 6
- 150000001875 compounds Chemical class 0.000 claims description 66
- 125000004429 atom Chemical group 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 claims description 2
- 230000003472 neutralizing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 102
- 238000001816 cooling Methods 0.000 description 31
- 238000010521 absorption reaction Methods 0.000 description 28
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 27
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 24
- 239000007787 solid Substances 0.000 description 22
- 239000002904 solvent Substances 0.000 description 22
- 229910052757 nitrogen Inorganic materials 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 17
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000001914 filtration Methods 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 239000010419 fine particle Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 238000005160 1H NMR spectroscopy Methods 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 9
- 238000001035 drying Methods 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 229920002678 cellulose Polymers 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 238000001953 recrystallisation Methods 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- NBUKAOOFKZFCGD-UHFFFAOYSA-N 2,2,3,3-tetrafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)F NBUKAOOFKZFCGD-UHFFFAOYSA-N 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 238000002835 absorbance Methods 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 5
- 239000001913 cellulose Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 230000001050 lubricating effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000002688 persistence Effects 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- BLRHMMGNCXNXJL-UHFFFAOYSA-N 1-methylindole Chemical compound C1=CC=C2N(C)C=CC2=C1 BLRHMMGNCXNXJL-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 3
- 0 C[n]1c2ccccc2c(/C=I(\C)/*)c1 Chemical compound C[n]1c2ccccc2c(/C=I(\C)/*)c1 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000004816 latex Substances 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
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- 238000002360 preparation method Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- SFWZZSXCWQTORH-UHFFFAOYSA-N 1-methyl-2-phenylindole Chemical compound C=1C2=CC=CC=C2N(C)C=1C1=CC=CC=C1 SFWZZSXCWQTORH-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004861 4-isopropyl phenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
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- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 229940008309 acetone / ethanol Drugs 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
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- 239000005018 casein Substances 0.000 description 2
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 2
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
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- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
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- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 2
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
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Classifications
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Abstract
Description
본 발명은 신규의 인돌화합물, 광학필터 및 광학기록 재료에 관한 것이다. 상기 인돌화합물은 광학요소 등으로서 유용하다. 상기 인돌화합물은 특히, 화상표시 장치용의 광학필터에 함유시키는 자외선 흡수제로서 유용하고, 또한, 가시 및 근적외 영역의 파장을 가지면서 저에너지의 레이저 등에 의한 고밀도의 광학기록 및 재생이 가능한 광학기록 매체에 사용되는 광학기록 재료에 유용하다. The present invention relates to novel indole compounds, optical filters and optical recording materials. The indole compound is useful as an optical element or the like. The indole compound is particularly useful as an ultraviolet absorber to be included in an optical filter for an image display device, and has an optical recording medium capable of high-density optical recording and reproducing by a low energy laser or the like having a wavelength in the visible and near infrared region. It is useful for optical recording materials used for
광학기록 매체는 일반적으로, 기록 용량이 크며, 기록 또는 재생이 비접촉으로 행해지는 것 등 뛰어난 특징을 가지는 것에서 널리 보급되고 있다. WORM, CD-R, DVD-R 등 추기형(追記型)의 광 디스크에서는, 광학기록층의 매우 작은 면적에 레이저를 집광(集光)시켜서, 광학기록층의 성상을 바꾸어 기록하여, 기록 부분과 미기록 부분의 반사광 량의 차이에 의해 재생을 행하고 있다. Optical recording media generally have a large recording capacity and are widely used for having excellent characteristics such as recording or reproducing in a non-contact manner. In write-once optical discs such as WORM, CD-R, DVD-R, etc., a laser is focused on a very small area of the optical recording layer, and the characteristics of the optical recording layer are changed and recorded. Playback is performed due to the difference in the amount of reflected light between the and unrecorded portions.
현재, 상기의 광 디스크에 있어서는, 기록 및 재생에 이용하는 반도체 레이저의 파장은 CD-R에서는 750~830㎚이며, DVD-R에서는 620㎚~690㎚인데, 한층 더한 용량의 증가를 실현하기 위해, 단파장 레이저를 사용하는 광 디스크가 검토되고 있으며, 예를 들면, 기록광으로서 380~420㎚의 광을 이용하는 것이 검토되고 있다.At present, in the above optical disk, the wavelength of the semiconductor laser used for recording and reproduction is 750 nm to 830 nm in CD-R and 620 nm to 690 nm in DVD-R. In order to realize further increase in capacity, Optical discs using short wavelength lasers have been studied. For example, the use of 380-420 nm light as recording light has been studied.
단파장 레이저용의 광학기록 매체에 있어서, 광학기록층의 형성에는, 각종 화합물이 사용되고 있다. 예를 들면, 특허문헌 1에는 아조화합물이 보고되어 있고, 특허문헌 2에는 포르피린화합물이 보고되어 있으며, 특허문헌 3에는 트리아졸화합물의 금속착체가 보고되어 있다. 그러나, 이들 화합물은 광학기록층의 형성에 이용되는 광학기록 재료로서는, 그 흡수파장 특성이 반드시 적합한 것은 아니었다.In the optical recording medium for short wavelength laser, various compounds are used for formation of an optical recording layer. For example, an azo compound is reported in Patent Document 1, a porphyrin compound is reported in Patent Document 2, and a metal complex of a triazole compound is reported in Patent Document 3. However, these compounds do not necessarily have suitable absorption wavelength characteristics as the optical recording material used for forming the optical recording layer.
한편, 액정 표시장치(LCD), 플라스마 디스플레이 패널(PDP), 일렉트로 루미네센스 디스플레이(ELD), 음극관 표시장치(CRT), 형광표시관, 전계 방사형 디스플레이 등의 화상표시 장치용의 광학필터에 있어서, 300~390㎚의 파장의 광을 흡수하는 화합물이 자외선 흡수제로서 이용되고 있다.On the other hand, in an optical filter for an image display device such as a liquid crystal display (LCD), a plasma display panel (PDP), an electroluminescent display (ELD), a cathode ray tube display (CRT), a fluorescent display tube, a field emission display, and the like. The compound which absorbs the light of the wavelength of 300-390 nm is used as an ultraviolet absorber.
예를 들면, 하기 특허문헌 4에는, 자외선 흡수제를 함유하고, 200~410㎚의 광을 차단하는 유기 EL 디스플레이 소자용 필터가 보고되어 있다. 그러나, 이 유기 EL 디스플레이 소자용 필터에 이용되고 있는 자외선 흡수제는 광학필터용의 자외선 흡수제로서는, 그 흡수파장 특성이 반드시 적합한 것은 아니었다.For example, the following patent document 4 reports the filter for organic electroluminescent display elements containing a ultraviolet absorber and blocking the light of 200-410 nm. However, the ultraviolet absorber used for this organic EL display element filter was not necessarily suitable as the ultraviolet absorber for optical filters.
[특허문헌 1] 일본국 특허공개 2004-209771호 공보[Patent Document 1] Japanese Patent Publication No. 2004-209771
[특허문헌 2] 일본국 특허공개 2004-58365호 공보[Patent Document 2] Japanese Patent Publication No. 2004-58365
[특허문헌 3] 일본국 특허공개 2004-174838호 공보[Patent Document 3] Japanese Patent Publication No. 2004-174838
[특허문헌 4] 일본국 특허공개 2004-102223호 공보[Patent Document 4] Japanese Patent Publication No. 2004-102223
따라서, 본 발명의 목적은 특히, 화상표시 장치용의 광학필터 및 단파장 레이저광용 광학기록 매체를 위한 광학기록 재료에 이용되는 광학요소에 적합한 광학특성을 가지는 화합물을 제공하는 것에 있다.It is therefore an object of the present invention to provide a compound having optical properties suitable for an optical element used in an optical recording material for an optical filter for an image display device and an optical recording medium for short wavelength laser light, in particular.
본 발명자는 검토를 거듭한 결과, 이미노 구조를 가지는 특정의 인돌화합물이 상기 광학요소로서 만족하는 흡수파장 특성을 가지는 것을 발견하여 본 발명에 도달하였다.As a result of extensive studies, the inventors have found that a specific indole compound having an imino structure has an absorption wavelength characteristic that satisfies the optical element.
본 발명은 상기 지견에 근거하여 이루어진 것으로, 하기 일반식(Ⅰ)로 표현되는 인돌화합물, 상기 인돌화합물을 함유하여 이루어지는 광학필터 및 기체상에 광학기록층이 형성된 광학기록 매체의 상기 광학기록층에 이용되는 상기 인돌화합물을 함유하여 이루어지는 광학기록 재료를 제공하는 것이다.SUMMARY OF THE INVENTION The present invention has been made on the basis of the above findings, and includes an indole compound represented by the following general formula (I), an optical filter containing the indole compound, and an optical recording layer of an optical recording medium having an optical recording layer formed on a substrate. An optical recording material comprising the indole compound used is provided.
(식 중, Rl 및 R2는 각각 독립적으로, 수소원자, 탄소 원자수 1~30인 탄화수소기 또는 하기 일반식(Ⅱ)로 표현되는 치환기를 나타내며, R3 및 R4는 각각 독립적으로, 탄소 원자수 1~10인 알킬기, 탄소 원자수 1~10인 알콕시기 또는 탄소 원자수 6~30인 아릴기를 나타내며, R5, R6, R7 및 R8은 각각 독립적으로, 수소원자, 탄소 원자수 1~30인 탄화수소기, 할로겐원자, 수산기, 니트로기, 시아노기, NHR 또는 NR'R''를 나타내며, R, R' 및 R''는 각각 독립적으로, 탄소 원자수 1~10인 알킬기를 나타내며, R' 및 R''는 서로 연결하여 환을 형성하고 있어도 되며, R5 및 R6, R6 및 R7, R7 및 R8은 각각, 서로 연결하여 환을 형성하고 있어도 된다. Anq -는 q가의 음이온을 나타내며, q는 1 또는 2를 나타내며, p은 전하를 중성으로 유지하는 계수를 나타낸다.)(In formula, R <1> and R <2> respectively independently represents a hydrogen atom, a hydrocarbon group of 1-30 carbon atoms, or a substituent represented by the following general formula (II), R <3> and R <4> respectively independently, An alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an aryl group having 6 to 30 carbon atoms, and R 5 , R 6 , R 7 and R 8 each independently represent a hydrogen atom and carbon; A hydrocarbon group having 1 to 30 atoms, a halogen atom, a hydroxyl group, a nitro group, a cyano group, NHR or NR'R '', and each of R, R 'and R''is independently 1 to 10 carbon atoms. An alkyl group, R 'and R''may be linked to each other to form a ring, and R 5 and R 6 , R 6 and R 7 , R 7 and R 8 may be linked to each other to form a ring; An q - represents q valent anion, q represents 1 or 2, p represents the coefficient of maintaining charge neutral.
(식 중, Ra~Ri는 각각 독립적으로 수소원자 또는 탄소 원자수 1~4인 알킬기를 나타내며, 상기 알킬기 중의 메틸렌기는 -O- 또는 -CO-로 치환되어 있어도 되며, Z는 직접 결합 또는 치환기를 가져도 되는 탄소 원자수 1~8인 알킬렌기를 나타내며, 상기 알킬렌기 중의 메틸렌기는 -O-, -S-, -CO-, -CO0-, -OC0-, -S02-, -NH-, -CONH-, -NHC0-, -N=CH- 또는 -CH=CH-로 치환되어 있어도 되며, M은 금속원자를 나타낸다.)(Wherein, R a to R i each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, the methylene group in the alkyl group may be substituted with -O- or -CO-, and Z is a direct bond or It represents an alkylene group having 1 to 8 carbon atoms which may have a substituent, and the methylene group in the alkylene group is -O-, -S-, -CO-, -CO0-, -OC0-, -S0 2- , -NH -, -CONH-, -NHC0-, -N = CH- or -CH = CH- may be substituted, and M represents a metal atom.)
이하, 본 발명의 인돌화합물과 상기 인돌화합물을 함유하여 이루어지는 광학필터 및 광학기록 재료에 대하여, 바람직한 실시형태에 근거하여 상세하게 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, the optical filter and optical recording material which contain the indole compound of this invention and the said indole compound are demonstrated in detail based on preferable embodiment.
우선, 본 발명의 인돌화합물에 대하여 설명한다.First, the indole compound of the present invention will be described.
상기 일반식(Ⅰ)로 표현되는 본 발명의 인돌화합물에 있어서, Rl, R2, R5, R6, R7 및 R8로 표시되는 탄소 원자수 1~30인 탄화수소기로서는, 메틸, 에틸, 프로필, 이소프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 아밀, 이소아밀, 제3아밀, 헥실, 시클로헥실, 시클로헥실메틸, 2-시클로헥실에틸, 헵틸, 이소헵틸, 제3헵틸, n-옥틸, 이소옥틸, 제3옥틸, 2-에틸헥실, 노닐, 이소노닐, 데실, 도데실, 트리데실, 테트라데실, 펜타데실, 헥사데실, 헵타데실, 옥타데실 등의 알킬기, 비닐, 1-메틸에테닐, 2-메틸에테닐, 프로페닐, 부테닐, 이소부테닐, 펜테닐, 헥세닐, 헵테닐, 옥테닐, 데세닐, 펜타데세닐, 1-페닐프로펜-3-일 등의 알케닐기, 페닐, 나프틸, 2-메틸페닐, 3-메틸페닐, 4-메틸페닐, 4-비닐페닐, 3-이소프로필페닐, 4-이소프로필페닐, 4-부틸페닐, 4-이소부틸페닐, 4-제3부틸페닐, 4-헥실페닐, 4-시클로헥실페닐, 4-옥틸페닐, 4-(2-에틸헥실)페닐, 4-스테아릴페닐, 2,3-디메틸페닐, 2,4-디메틸페닐, 2,5-디메틸페닐, 2,6-디메틸페닐, 3,4-디메틸페닐, 3,5-디메틸페닐, 2,4-디제3부틸페닐, 시클로헥실페닐 등의 알킬아릴기, 벤질, 페네틸, 2-페닐프로판-2-일, 디페닐메틸, 트리페닐메틸, 스티릴, 신나밀 등의 아릴알킬기 등, 이들이 에테르 결합 및/또는 티오에테르 결합에서 중단된 것, 예를 들면, 2-메톡시에틸, 3-메 톡시프로필, 4-메톡시부틸, 2-부톡시에틸, 메톡시에톡시에틸, 메톡시에톡시에톡시에틸, 3-메톡시부틸, 2-페녹시에틸, 3-페녹시프로필, 2-메틸티오에틸, 2-페닐티오에틸 등을 들 수 있다. 또한, 이들 기는 알콕시기, 알케닐기, 니트로기, 시아노기, 할로겐원자 등으로 치환되어 있어도 되며, 알콕시기, 알케닐기 및 시아노기로부터 선택되는 1종 이상으로 치환되는 경우는 이들의 치환기를 포함한 전체의 탄소 원자수가 최대로 30이다.In the indole compound of the present invention represented by the general formula (I), as the hydrocarbon group having 1 to 30 carbon atoms represented by R 1 , R 2 , R 5 , R 6 , R 7 and R 8 , methyl, Ethyl, propyl, isopropyl, butyl, secondary butyl, tertiary butyl, isobutyl, amyl, isoamyl, tertiary amyl, hexyl, cyclohexyl, cyclohexylmethyl, 2-cyclohexylethyl, heptyl, isoheptyl, first Alkyl groups such as 3heptyl, n-octyl, isooctyl, tertiary octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, Vinyl, 1-methylethenyl, 2-methylethenyl, propenyl, butenyl, isobutenyl, pentenyl, hexenyl, heptenyl, octenyl, decenyl, pentadecenyl, 1-phenylpropene-3- Alkenyl groups such as one, phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, 3-isopropylphenyl, 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl , 4-Part 3 Phenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl, 4-stearylphenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2, Alkyl aryl groups, such as 5-dimethylphenyl, 2, 6- dimethylphenyl, 3, 4- dimethylphenyl, 3, 5- dimethylphenyl, 2, 4- di- tert-butylphenyl, and cyclohexylphenyl, benzyl, phenethyl, 2 Arylalkyl groups such as -phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, styryl, cinnamil, and the like, and those interrupted at ether bonds and / or thioether bonds, for example 2-methoxyethyl , 3-methoxypropyl, 4-methoxybutyl, 2-butoxyethyl, methoxyethoxyethyl, methoxyethoxyethoxyethyl, 3-methoxybutyl, 2-phenoxyethyl, 3-phenoxypropyl , 2-methylthioethyl, 2-phenylthioethyl, and the like. In addition, these groups may be substituted by an alkoxy group, an alkenyl group, a nitro group, a cyano group, a halogen atom, etc., and when substituted by one or more types selected from an alkoxy group, an alkenyl group, and a cyano group, the whole including these substituents Has up to 30 carbon atoms.
상기 일반식(Ⅰ)에 있어서의 R3, R4, R, R' 및 R''로 표시되는 탄소 원자수 1~10인 알킬기로서는, 메틸, 에틸, 프로필, 이소프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 아밀, 이소아밀, 제3아밀, 헥실, 시클로헥실, 헵틸, 이소헵틸, 제3헵틸, n-옥틸, 이소옥틸, 제3옥틸, 2-에틸헥실, 노닐, 데실 등을 들 수 있으며, 탄소 원자수 1~10인 알콕시기로서는, 메틸옥시, 에틸옥시, 이소프로필옥시, 프로필옥시, 부틸옥시, 펜틸옥시, 이소펜틸옥시, 헥실옥시, 헵틸옥시, 옥틸옥시, 2-에틸헥실옥시 등을 들 수 있으며, 탄소 원자수 6~30인 아릴기로서는, 페닐, 나프틸, 2-메틸페닐, 3-메틸페닐, 4-메틸페닐, 4-비닐페닐, 3-이소프로필페닐, 4-이소프로필페닐, 4-부틸페닐, 4-이소부틸페닐, 4-제3부틸페닐, 4-헥실페닐, 4-시클로헥실페닐, 4-옥틸페닐, 4-(2-에틸헥실)페닐, 4-스테아릴페닐, 2,3-디메틸페닐, 2,4-디메틸페닐, 2,5-디메틸페닐, 2,6-디메틸페닐, 3,4-디메틸페닐, 3,5-디메틸페닐, 2,4-디제3부틸페닐, 2,5-디제3부틸페닐, 2,6-디-제3부틸페닐, 2,4-디제3펜틸페닐, 2,5-디제3 아밀페닐, 2,5-디제3옥틸페닐, 2,4-디쿠밀페닐, 시클로헥실페닐, 비페닐, 2,4,5-트리 메틸페닐, 벤질, 페네틸, 2-페닐프로판-2-일, 디페닐메틸, 트리페닐메틸, 스티릴, 신나밀 등을 들 수 있다.Examples of the alkyl group having 1 to 10 carbon atoms represented by R 3 , R 4 , R, R ', and R''in the general formula (I) include methyl, ethyl, propyl, isopropyl, butyl, and second butyl. , Tert-butyl, isobutyl, amyl, isoamyl, tert-amyl, hexyl, cyclohexyl, heptyl, isoheptyl, tertiary heptyl, n-octyl, isooctyl, tert-octyl, 2-ethylhexyl, nonyl, decyl Examples of the alkoxy group having 1 to 10 carbon atoms include methyloxy, ethyloxy, isopropyloxy, propyloxy, butyloxy, pentyloxy, isopentyloxy, hexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy etc. are mentioned, As an aryl group of 6-30 carbon atoms, phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, 3-isopropylphenyl , 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl, 4-tertbutylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl , 4-stearylphenyl, 2,3- Methylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-dize-3butylphenyl, 2,5- Di-tert-butylphenyl, 2,6-di-tert-butylphenyl, 2,4-di-tert-pentylphenyl, 2,5-di-tertyl amylphenyl, 2,5-di-tert-octylphenyl, 2,4-dicumylphenyl , Cyclohexylphenyl, biphenyl, 2,4,5-trimethylphenyl, benzyl, phenethyl, 2-phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, styryl, cinnamil and the like.
상기 일반식(Ⅰ)에 있어서의 R5, R6, R7 및 R8로 표시되는 할로겐원자로서는, 불소, 염소, 브롬, 요오드를 들 수 있다.Examples of the halogen atom represented by R 5 , R 6 , R 7 and R 8 in General Formula (I) include fluorine, chlorine, bromine and iodine.
상기 일반식(Ⅰ)에 있어서의 R' 및 R''가 연결되어 형성되는 환으로서는, 피페리딘 환, 피페라진 환, 피로리딘 환, 모르폴린 환 등을 들 수 있으며, R5 및 R6, R6 및 R7과 R7 및 R8이 연결되어 형성되는 환으로서는, 시클로부텐 환, 시클로펜텐 환, 시클로헥센 환, 벤젠 환, 피리딘 환 등을 들 수 있다.Examples of the ring in which R 'and R''in General Formula (I) are linked to each other include a piperidine ring, a piperazine ring, a pyriridine ring, a morpholine ring, and the like. R 5 and R 6 As a ring formed by connecting R <6> and R <7> and R <7> and R <8> , a cyclobutene ring, a cyclopentene ring, a cyclohexene ring, a benzene ring, a pyridine ring, etc. are mentioned.
상기 일반식(Ⅱ)에 있어서의 Ra~Ri로 표시되는 탄소 원자수 1~4인 알킬기로서는, 메틸, 에틸, 프로필, 이소프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 메톡시, 에톡시, 프로필옥시, 이소프로필옥시, 메톡시메틸, 에톡시메틸, 2-메톡시에틸, 아세틸, 1-카르보닐에틸, 아세틸메틸, 1-카르보닐프로필, 2-옥소부틸, 2-아세틸에틸, 1-카르보닐이소프로필 등을 들 수 있으며, Z로 표시되는 치환기를 가져도 되는 탄소 원자수 1~8인 알킬렌기로서는, 메틸렌, 에틸렌, 프로필렌, 메틸에틸렌, 부틸렌, 1-메틸프로필렌, 2-메틸프로필렌, 1,2-디메틸프로필렌, 1,3-디메틸프로필렌, 1-메틸부틸렌, 2-메틸부틸렌, 3-메틸부틸렌, 4-메틸부틸렌, 2,4-디메틸부틸렌, 1,3-디메틸부틸렌, 펜틸렌, 헥실렌, 헵틸렌, 옥틸렌, 에탄-1,1-디일, 프로판-2,2-디일, 에테닐렌, 프로페닐렌, 메틸렌옥시, 에틸렌옥시, 옥시메틸렌, 티오메틸렌, 카르보닐메틸렌, 카르보닐옥시메틸렌, 메틸렌카르보닐옥시, 술포닐메틸렌, 아미노메틸렌, 아세틸아미노, 에틸렌카르복시아미드, 에탄이미드일 등을 들 수 있으며, M으로 표시되는 금속원자로서는, 철, 코발트, 니켈, 구리, 아연, 알루미늄, 티탄, 지르코늄, 바나듐, 니오브, 탄탈, 크롬, 몰리브덴, 텅스텐, 오스뮴, 망간, 루테늄, 갈륨, 인듐, 규소, 게르마늄, 주석, 안티몬, 비스무트, 금, 은, 팔라듐, 로듐, 백금, 이리듐, 이트륨, 란탄, 프라세오디뮴, 네오디뮴, 프로메튬, 가돌리늄, 디스프로슘, 홀뮴, 루테튬, 스칸듐 등을 들 수 있다.Examples of the alkyl group having 1 to 4 carbon atoms represented by R a to R i in General Formula (II) include methyl, ethyl, propyl, isopropyl, butyl, second butyl, third butyl, isobutyl, and Methoxy, ethoxy, propyloxy, isopropyloxy, methoxymethyl, ethoxymethyl, 2-methoxyethyl, acetyl, 1-carbonylethyl, acetylmethyl, 1-carbonylpropyl, 2-oxobutyl, 2- Acetyl ethyl, 1-carbonyl isopropyl, etc. are mentioned, As a C1-C8 alkylene group which may have a substituent represented by Z, methylene, ethylene, propylene, methyl ethylene, butylene, 1-methyl Propylene, 2-methylpropylene, 1,2-dimethylpropylene, 1,3-dimethylpropylene, 1-methylbutylene, 2-methylbutylene, 3-methylbutylene, 4-methylbutylene, 2,4-dimethyl Butylene, 1,3-dimethylbutylene, pentylene, hexylene, heptylene, octylene, ethane-1,1-diyl, propane-2,2-diyl, ethenylene, propenylene, methyleneoxy, ethyl Oxy, oxymethylene, thiomethylene, carbonylmethylene, carbonyloxymethylene, methylenecarbonyloxy, sulfonylmethylene, aminomethylene, acetylamino, ethylenecarboxyamide, ethaneimideyl and the like, and are represented by M Examples of metal atoms include iron, cobalt, nickel, copper, zinc, aluminum, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, osmium, manganese, ruthenium, gallium, indium, silicon, germanium, tin, antimony, Bismuth, gold, silver, palladium, rhodium, platinum, iridium, yttrium, lanthanum, praseodymium, neodymium, promethium, gadolinium, dysprosium, holmium, lutetium, scandium and the like.
상기 일반식(Ⅰ)에 있어서, Anq -로 표시되는 음이온으로서는, 예를 들면, 1가인 것으로서, 염소 음이온, 브롬 음이온, 요오드 음이온, 불소 음이온 등의 할로겐 음이온; 과염소산 음이온, 염소산 음이온, 티오시안산 음이온, 6불화 인 음이온, 6불화 안티몬 음이온, 4불화 붕소 음이온 등의 무기계 음이온; 벤젠술폰산 음이온, 톨루엔술폰산 음이온, 트리플루오로메탄술폰산 음이온, 디페닐아민-4-술폰산 음이온, 2-아미노-4-메틸-5-클로로벤젠술폰산 음이온, 2-아미노-5-니트로벤젠술폰산 음이온 등의 유기 술폰산 음이온; 옥틸인산 음이온, 도데실인산 음이온, 옥타데실인산 음이온, 페닐인산 음이온, 노닐페닐인산 음이온, 2,2'-메틸렌비스(4,6-디제3부틸페닐)포스폰산 음이온 등의 유기 인산계 음이온, 비스트리플루오로메틸술포닐이미드 음이온, 비스퍼플루오로부탄술포닐이미드 음이온, 퍼플루오로-4-에틸시클로헥산술포네이트 음이온, 테트라키스(펜타플루오로페닐)붕산 음이온, 트리스(플루오로알킬술포닐)카르보 음이온 등을 들 수 있으며, 2가인 것으로서는, 예를 들면, 벤 젠디술폰산 음이온, 나프탈렌디술폰산 음이온 등을 들 수 있다. 또한, 여기(勵起)상태에 있는 활성분자를 탈여기(脫勵起)시키는(켄칭(quenching)시키는) 기능을 가지는 켄처 음이온이나 시클로펜타디에닐 환에 카르복실기나 포스폰산기, 술폰산기 등의 음이온성 기를 가지는 페로센, 루테오센 등의 메탈로센화합물 음이온 등도 필요에 따라서 이용할 수 있다.In the general formula (I), examples of the anion represented by An q − include halogen anions such as chlorine anion, bromine anion, iodine anion, and fluorine anion as monovalent ones; Inorganic anions such as perchlorate anion, chlorate anion, thiocyanate anion, phosphorus hexafluoride anion, antimony hexafluoride anion, and boron tetrafluoride anion; Benzenesulfonic acid anion, toluenesulfonic acid anion, trifluoromethanesulfonic acid anion, diphenylamine-4-sulfonic acid anion, 2-amino-4-methyl-5-chlorobenzenesulfonic acid anion, 2-amino-5-nitrobenzenesulfonic acid anion, etc. Organic sulfonic acid anion; Organic phosphate anions such as octyl phosphate anion, dodecyl phosphate anion, octadecyl phosphate anion, phenyl phosphate anion, nonylphenyl phosphate anion, and 2,2'-methylenebis (4,6-di- tert-butylphenyl) phosphonic anion; Bistrifluoromethylsulfonylimide anion, bisperfluorobutanesulfonylimide anion, perfluoro-4-ethylcyclohexanesulfonate anion, tetrakis (pentafluorophenyl) boric anion, tris (fluoro Alkyl sulfonyl) carbo anion etc. are mentioned, As a bivalent thing, a benzen disulfonic acid anion, a naphthalenedisulfonic acid anion, etc. are mentioned, for example. In addition, a carboxyl group, a phosphonic acid group, a sulfonic acid group, etc. may be added to a quencher anion or cyclopentadienyl ring having a function of de-exciting (quenching) active molecules in an excited state. Metallocene compound anions, such as ferrocene and luteose, which have an anionic group, can also be used as necessary.
상기의 켄처 음이온으로서는, 예를 들면, 하기 일반식(A), (B) 또는 하기식(C)로 표현되는 것, 일본국 특허공개 소60-234892호 공보, 일본국 특허공개 평5-43814호 공보, 일본국 특허공개 평5-305770호 공보, 일본국 특허공개 평6-239028호 공보, 일본국 특허공개 평9-309886호 공보, 일본국 특허공개 평9-323478호 공보, 일본국 특허공개 평10-45767호 공보, 일본국 특허공개 평11-208118호 공보, 일본국 특허공개 2000-168237호 공보, 일본국 특허공개 2002-201373호 공보, 일본국 특허공개 2002-206061호 공보, 일본국 특허공개 2005-297407호 공보, 일본국 특허공고 평7-96334호 공보, 국제공개 98/29257호 공보 등에 기재된 바와 같은 음이온을 들 수 있다.As said quencher anion, it is represented by the following general formula (A), (B) or following formula (C), for example, Unexamined-Japanese-Patent No. 60-234892, Unexamined-Japanese-Patent No. 5-43814. Japanese Patent Laid-Open No. 5-305770, Japanese Patent Laid-Open No. 6-239028, Japanese Patent Laid-Open No. 9-309886, Japanese Patent Laid-Open No. 9-323478, Japanese Patent Japanese Patent Laid-Open No. 10-45767, Japanese Patent Laid-Open No. 11-208118, Japanese Patent Laid-Open No. 2000-168237, Japanese Patent Laid-Open No. 2002-201373, Japanese Patent Laid-Open No. 2002-206061, Japan Anion as described in Unexamined-Japanese-Patent No. 2005-297407, Unexamined-Japanese-Patent No. 7-96334, international publication 98/29257, etc. are mentioned.
(식 중, X는 니켈원자 또는 구리원자를 나타내며, R9 및 RlO은 각각 독립적으로, 할로겐원자, 탄소 원자수 1~8인 알킬기, 탄소 원자수 6~30인 아릴기 또는 -SO2-G기를 나타내며, G는 알킬기, 할로겐원자로 치환되어 있어도 되는 아릴기, 디알킬아미노기, 디아릴아미노기, 피페리디노기 또는 모르폴리노기를 나타내며, a 및 b는 각각 0~4를 나타낸다. 또한, Rll, R12, R13 및 R14는 각각 독립적으로, 알킬기, 알킬페닐기, 알콕시페닐기 또는 할로겐화 페닐기를 나타낸다.) Wherein X represents a nickel atom or a copper atom, and R 9 and R 10 each independently represent a halogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 30 carbon atoms, or -SO 2- Represents a G group, G represents an aryl group, a dialkylamino group, a diarylamino group, a piperidino group, or a morpholino group which may be substituted with an alkyl group or a halogen atom, and a and b each represent 0 to 4. R ll , R 12 , R 13 and R 14 each independently represent an alkyl group, an alkylphenyl group, an alkoxyphenyl group or a halogenated phenyl group.)
본 발명의 인돌화합물 중에서도, 상기 일반식(Ⅰ)에 있어서, Rl이 탄소 원자수 1~30인 탄화수소기, 특히 탄소 원자수 1~8인 알킬기 또는 탄소 원자수 6~13인 아릴기인 것; R2가 수소원자 또는 탄소 원자수 1~30인 탄화수소기, 특히 수소원자, 탄소 원자수 1~8인 알킬기 또는 탄소 원자수 6~13인 아릴기인 것; R3이 탄소 원자수 1~10인 알킬기, 특히 탄소 원자수 1~4인 알킬기인 것; R4가 탄소 원자수 1~10인 알 킬기, 특히 탄소 원자수 1~4인 알킬기인 것이 비용 및 광학특성의 면에서 뛰어나므로 바람직하다.Among the indole compounds of the present invention, in general formula (I), R 1 is a hydrocarbon group having 1 to 30 carbon atoms, especially an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 13 carbon atoms; R 2 is a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms, in particular a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 13 carbon atoms; R 3 is an alkyl group having 1 to 10 carbon atoms, particularly an alkyl group having 1 to 4 carbon atoms; R 4 is preferably an alkyl group having 1 to 10 carbon atoms, particularly an alkyl group having 1 to 4 carbon atoms, because it is excellent in terms of cost and optical properties.
따라서, 본 발명의 인돌화합물의 구체예로서는, 하기 화합물 No.1~24를 들 수 있다.Therefore, the following compound Nos. 1-24 are mentioned as a specific example of the indole compound of this invention.
상기 일반식(Ⅰ)로 표현되는 본 발명의 인돌화합물은 그 제조방법은 특별히 한정되지 않고, 주지 일반의 반응을 이용한 방법으로 얻을 수 있는데, 제조방법으로서는, 예를 들면, 1가의 음이온을 가지는 인돌화합물을 얻는 경우에는, 하기 [화학식 6]에 나타낸 루트와 같이 합성하는 방법을 들 수 있다.The indole compound of the present invention represented by the above general formula (I) is not particularly limited in its production method, and can be obtained by a method using a well-known general reaction. As the production method, for example, an indole having a monovalent anion When obtaining a compound, the synthesis | combining method like the route shown in following [Formula 6] is mentioned.
(식 중, Rl, R2, R3, R4, R5, R6, R7, R8은 상기 일반식(Ⅰ)과 같고, Hal은 할로겐원자를 나타내며, D-는 음이온을 나타낸다.)(Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 are the same as the general formula (I), Hal represents a halogen atom, and D − represents an anion). .)
본 발명의 인돌화합물은 특정의 파장, 특히 320~420㎚의 파장의 광을 흡수함으로써 기능을 발휘하는 광학요소로서 유용하다. 광학요소의 예로서는, 광학필터에 함유시키는 자외선 흡수제, 광 디스크 등의 광학기록 매체의 광학기록층의 형성에 이용되는 광학기록제 등을 들 수 있다.The indole compound of the present invention is useful as an optical element that exhibits a function by absorbing light having a specific wavelength, particularly at a wavelength of 320 to 420 nm. As an example of an optical element, the optical recording agent etc. which are used for formation of the optical recording layer of optical recording media, such as an ultraviolet absorber and an optical disk which are contained in an optical filter, are mentioned.
또한, 본 발명의 인돌화합물은 광학요소 외에, 의약품, 농약, 향료, 염료 등의 합성 중간체, 혹은 각종 기능성 재료 등에 이용할 수도 있다.In addition to the optical element, the indole compound of the present invention may be used in synthetic intermediates such as pharmaceuticals, pesticides, flavorings, dyes, or various functional materials.
다음으로, 본 발명의 광학필터에 대하여 설명한다.Next, the optical filter of this invention is demonstrated.
본 발명의 광학필터는 본 발명의 인돌화합물을 함유한다. 본 발명의 인돌화합물은 흡수 극대 파장을 340~390㎚로 가지며, 410㎚이하의 자외선 및 일부의 가시광선을 흡수해서 차단할 수 있으므로, 본 발명의 인돌화합물을 함유하는 본 발명의 광학필터는 표시 화상의 고품질화에 이용되는 화상표시 장치용의 광학필터로서 특히 적합하다. 본 발명의 광학필터는 화상표시 장치용 외에, 분석장치용, 반도체 장치 제조용, 천문관측용, 광통신용, 안경 렌즈용 등의 각종 용도에도 이용할 수 있다.The optical filter of the present invention contains the indole compound of the present invention. Since the indole compound of the present invention has an absorption maximum wavelength of 340 to 390 nm, and can absorb and block ultraviolet rays of 410 nm or less and some visible light, the optical filter of the present invention containing the indole compound of the present invention is a display image. It is particularly suitable as an optical filter for an image display device to be used for high quality. The optical filter of the present invention can be used not only for an image display device but also for various applications such as analytical device, semiconductor device manufacture, astronomical observation, optical communication, and spectacle lens.
본 발명의 광학필터는 통상 디스플레이의 전면에 배치된다. 예를 들면, 본 발명의 광학필터는 디스플레이의 표면에 직접 붙여도 되고, 디스플레이 앞에 전면판이 마련되어 있는 경우는 전면판의 표면측(외측) 또는 이면측(디스플레이측)에 붙여도 된다.The optical filter of the present invention is usually arranged in front of the display. For example, the optical filter of the present invention may be directly attached to the surface of the display, or may be attached to the front side (outside) or the rear side (display side) of the front plate when the front plate is provided in front of the display.
본 발명의 광학필터의 대표적인 구성으로서는, 투명지지체에, 필요에 따라서, 초벌칠층, 반사 방지층, 하드코트층, 윤활층 등 각 층을 형성한 것을 들 수 있다. 본 발명의 인돌화합물이나, 본 발명의 인돌화합물 이외의 색소화합물, 각종 안정제 등의 임의 성분을 본 발명의 광학필터에 함유시키는 방법으로서는, 예를 들면, (1)투명지지체 또는 임의의 각 층에 함유시키는 방법, (2)투명지지체 또는 임의의 각 층에 코팅하는 방법, (3)투명지지체 및 임의의 각 층으로부터 선택되는 임의의 서로 이웃하는 양자 간의 점착제층에 혼입시키는 방법, (4)각 층과는 별도로 본 발명의 인돌화합물 등의 광 흡수제 등을 함유하는 광 흡수층을 형성하는 방법 등을 들 수 있다.As a typical structure of the optical filter of this invention, what provided each layer, such as a supercoat layer, an antireflection layer, a hard coat layer, a lubrication layer, in the transparent support body as needed. As a method of including in the optical filter of the present invention an optional component such as an indole compound of the present invention, a dye compound other than the indole compound of the present invention, various stabilizers, and the like, for example, (1) a transparent support or any desired layer A method of incorporating, (2) a method of coating on a transparent support or any respective layer, (3) a method of incorporating an adhesive layer between any adjacent neighbors selected from a transparent support and any of each layer, (4) each Apart from the layer, a method of forming a light absorbing layer containing a light absorbing agent such as the indole compound of the present invention and the like can be given.
본 발명의 광학필터에 있어서, 본 발명의 인돌화합물의 사용량은 광학필터의 단위면적당, 통상 1~1000㎎/㎡, 바람직하게는 5~100㎎/㎡로서, 1㎎/㎡미만의 사용량에서는, 광 흡수 효과를 충분히 발휘할 수 없고, 1000㎎/㎡를 넘게 사용했을 경우에는, 필터의 색조가 지나치게 강해져서 표시품질 등을 저하시킬 우려가 있으며, 또한, 명도가 저하할 우려도 있다.In the optical filter of the present invention, the amount of the indole compound of the present invention is usually 1 to 1000 mg / m 2, preferably 5 to 100 mg / m 2, per unit area of the optical filter. When the light absorbing effect cannot be sufficiently exhibited, and when used in excess of 1000 mg / m 2, the color tone of the filter may become too strong to reduce the display quality and the like, and the brightness may also decrease.
본 발명의 인돌화합물은 그 사용량을 광학필터의 단위면적당, 상술의 범위로 하기 위해서는, 통상, 다음과 같이 하여 사용된다. 예를 들면, 점착제층에 본 발명의 인돌화합물을 함유하는 광학필터를 만드는 경우에는, 아크릴계 점착제 등 점착제 100질량부에 대하여, 본 발명의 인돌화합물을 바람직하게는 0.001~0.05질량부 및 메틸에틸케톤 등의 용제를 바람직하게는 40~500질량부 첨가하여 바니시를 작성 하고, 이 바니시를 역밀착 처리한 PET 필름 등의 투명지지체에 도포한 후, 경화시켜서, 두께 0.1~10미크론의 점착제층(경화막)을 가지는 광학필터를 얻는다.In order to use the indole compound of the present invention in the above-mentioned range per unit area of the optical filter, it is usually used as follows. For example, when making the optical filter containing the indole compound of this invention in an adhesive layer, Preferably it is 0.001-0.05 mass part and methyl ethyl ketone with respect to 100 mass parts of adhesives, such as an acryl-type adhesive, 40-500 mass parts of solvents, such as these, are added, and a varnish is created, this varnish is apply | coated to transparent support materials, such as PET film which carried out the back contact | contact | adherence process, and it hardens | cures, and the adhesive layer (curing | curing of thickness 0.1-10 microns) Film) to obtain an optical filter.
본 발명의 인돌화합물 및 임의 성분을 본 발명의 광학필터에 함유시키는 방법으로서, 상술의 (1)~(4)의 어느 방법을 취하는 경우든, 각 성분의 배합 비율은 상술의 배합 비율에 준하면 된다.As a method of incorporating the indole compound and the optional component of the present invention into the optical filter of the present invention, when the method of any of the above (1) to (4) is used, the blending ratio of each component is in accordance with the above blending ratio. do.
상기 투명지지체의 재료로서는, 예를 들면, 유리 등의 무기재료; 디아세틸셀룰로오스, 트리아세틸셀룰로오스(TAC), 프로피오닐셀룰로오스, 부티릴셀룰로오스,아세틸프로피오닐셀룰로오스, 니트로셀룰로오스 등의 셀룰로오스에스테르; 폴리아미드; 폴리카보네이트; 폴리에틸렌테레프탈레이트, 폴리에틸렌나프탈레이트, 폴리부틸렌테레프탈레이트, 폴리-1,4-시클로헥산디메틸렌테레프탈레이트, 폴리에틸렌-1,2-디페녹시에탄-4,4'-디카르복실레이트 등의 폴리에스테르; 폴리스티렌; 폴리에틸렌, 폴리프로필렌, 폴리메틸펜텐 등의 폴리올레핀; 폴리메틸메타크릴레이트 등의 아크릴계 수지; 폴리술폰; 폴리에테르술폰; 폴리에테르케톤; 폴리에테르이미드; 폴리옥시에틸렌, 노르보르넨수지 등의 고분자 재료를 들 수 있다. 투명지지체의 투과율은 80%이상인 것이 바람직하고, 86%이상인 것이 더욱 바람직하다. 헤이즈는 2%이하인 것이 바람직하고, 1%이하인 것이 더욱 바람직하다. 굴절율은 1.45~1.70인 것이 바람직하다.As a material of the said transparent support body, For example, inorganic materials, such as glass; Cellulose esters such as diacetyl cellulose, triacetyl cellulose (TAC), propionyl cellulose, butyryl cellulose, acetyl propionyl cellulose and nitrocellulose; Polyamides; Polycarbonate; Poly such as polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate ester; polystyrene; Polyolefins such as polyethylene, polypropylene and polymethylpentene; Acrylic resins such as polymethyl methacrylate; Polysulfones; Polyether sulfone; Polyether ketones; Polyetherimide; Polymeric materials, such as polyoxyethylene and norbornene resin, are mentioned. The transmittance of the transparent support is preferably 80% or more, and more preferably 86% or more. It is preferable that haze is 2% or less, and it is more preferable that it is 1% or less. It is preferable that refractive index is 1.45-1.70.
이들 투명지지체 중에는 적외선 흡수제, 무기 미립자 등을 첨가할 수 있고,또한, 투명지지체에는 각종의 표면처리를 가할 수 있다.In these transparent supports, infrared absorbers, inorganic fine particles, and the like can be added, and various surface treatments can be applied to the transparent supports.
상기 무기 미립자로서는, 예를 들면, 층상(層狀) 점토광물, 이산화규소, 이 산화티탄, 황산바륨, 탄산칼슘 등을 들 수 있다.Examples of the inorganic fine particles include layered clay minerals, silicon dioxide, titanium dioxide, barium sulfate, calcium carbonate and the like.
상기 각종 표면처리로서는, 예를 들면, 약품처리, 기계적 처리, 코로나 방전처리, 화염처리, 자외선 조사처리, 고주파 처리, 글로우 방전(Glow discharge)처리, 활성 플라스마 처리, 레이저 처리, 혼산(混酸)처리, 오존 산화처리 등을 들 수 있다.Examples of the various surface treatments include chemical treatment, mechanical treatment, corona discharge treatment, flame treatment, ultraviolet irradiation treatment, high frequency treatment, glow discharge treatment, active plasma treatment, laser treatment, and mixed acid treatment. And ozone oxidation treatment.
상기 초벌칠층은 광 흡수제를 함유하는 광 흡수층을 형성하는 경우에, 투명지지체와 광 흡수층 사이에 이용하는 층이다. 상기 초벌칠층은 유리 전이온도가 -60~60℃의 폴리머를 포함하는 층, 광 흡수층측의 표면이 조면(粗面)인 층, 또는 광 흡수층의 폴리머와 친화성을 가지는 폴리머를 포함하는 층으로서 형성한다. 또한, 초벌칠층은 광 흡수층이 형성되어 있지 않은 투명지지체의 면에 형성하고, 투명지지체와 그 위에 형성되는 층(예를 들면, 반사 방지층, 하드코트층)의 접착력을 개선하기 위해 형성해도 되며, 광학필터와 화상표시 장치를 접착하기 위한 접착제와 광학필터의 친화성을 개선하기 위해 형성해도 된다. 초벌칠층의 두께는 2㎚~20㎛가 바람직하고, 5㎚~5㎛가 보다 바람직하며, 20㎚~2㎛가 더욱 바람직하며, 50㎚~1㎛가 더더욱 바람직하며, 80㎚~300㎚가 가장 바람직하다. 유리 전이온도가 -60~60℃인 폴리머를 포함하는 초벌칠층은 폴리머의 점착성으로 투명지지체와 필터층을 접착한다. 유리 전이온도가 -60~60℃인 폴리머는 예를 들면, 염화비닐, 염화비닐리덴, 초산비닐, 부타디엔, 네오프렌, 스티렌, 클로로프렌, 아크릴산에스테르, 메타크릴산에스테르, 아크릴로니트릴 또는 메틸비닐에테르의 중합 또는 이들의 공중합에 의해 얻을 수 있다. 유리 전이온도는 50℃이하인 것이 바람직하고, 40℃이 하인 것이 보다 바람직하며, 30℃이하인 것이 더욱 바람직하며, 25℃이하인 것이 더더욱 바람직하며, 20℃이하인 것이 가장 바람직하다. 초벌칠층의 25℃에 있어서의 탄성율은 1~1000MPa인 것이 바람직하고, 5~800MPa인 것이 더욱 바람직하며, 10~500MPa인 것이 가장 바람직하다. 광 흡수층측의 표면이 조면인 초벌칠층은 조면의 위에 광 흡수층을 형성함으로써, 투명지지체와 광 흡수층을 접착한다. 광 흡수층측의 표면이 조면인 초벌칠층은 폴리머 라텍스의 도포에 의해 용이하게 형성할 수 있다. 라텍스의 평균 입경은 0.02~3㎛인 것이 바람직하고, 0.05~1㎛인 것이 더욱 바람직하다. 광 흡수층의 바인더 폴리머와 친화성을 가지는 폴리머로서는, 아크릴수지, 셀룰로오스 유도체, 젤라틴, 카세인, 전분, 폴리비닐알코올, 가용성 나일론 및 고분자 라텍스 등을 들 수 있다. 또한, 본 발명의 광학필터에는, 둘 이상의 초벌칠층을 형성해도 된다. 초벌칠층에는, 투명지지체를 팽윤시키는 용제, 매트제, 계면활성제, 대전방지제, 도포 조제, 경막제 등을 첨가해도 된다.The primary coating layer is a layer used between the transparent support and the light absorbing layer when forming the light absorbing layer containing the light absorbing agent. The primary coating layer is a layer containing a polymer having a glass transition temperature of -60 to 60 ° C, a layer having a rough surface on the light absorbing layer side, or a layer containing a polymer having affinity with the polymer of the light absorbing layer. Form. In addition, the primary coating layer may be formed on the surface of the transparent support on which the light absorbing layer is not formed, and may be formed to improve the adhesion between the transparent support and the layer (for example, antireflection layer, hard coat layer) formed thereon, You may form in order to improve the affinity of the optical filter with the adhesive agent for bonding an optical filter and an image display apparatus. The thickness of the primer layer is preferably 2 nm to 20 μm, more preferably 5 nm to 5 μm, still more preferably 20 nm to 2 μm, even more preferably 50 nm to 1 μm, and 80 nm to 300 nm. Most preferred. The primary coating layer comprising a polymer having a glass transition temperature of -60 to 60 ° C. adheres the transparent support to the filter layer due to the adhesiveness of the polymer. Polymers having a glass transition temperature of -60 ° C to 60 ° C are, for example, vinyl chloride, vinylidene chloride, vinyl acetate, butadiene, neoprene, styrene, chloroprene, acrylic acid ester, methacrylic acid ester, acrylonitrile or methyl vinyl ether. It can be obtained by polymerization or copolymerization thereof. It is preferable that glass transition temperature is 50 degrees C or less, It is more preferable that it is 40 degrees C or less, It is more preferable that it is 30 degrees C or less, It is still more preferable that it is 25 degrees C or less, Most preferably, it is 20 degrees C or less. It is preferable that the elasticity modulus at 25 degrees C of a primary coating layer is 1-1000 Mpa, It is more preferable that it is 5-800 Mpa, It is most preferable that it is 10-500 Mpa. The primary coating layer having a rough surface on the light absorbing layer side forms a light absorbing layer on the rough surface, thereby adhering the transparent support and the light absorbing layer. The rough coat layer having a rough surface on the light absorbing layer side can be easily formed by application of a polymer latex. It is preferable that it is 0.02-3 micrometers, and, as for the average particle diameter of latex, it is more preferable that it is 0.05-1 micrometer. Examples of the polymer having affinity with the binder polymer of the light absorbing layer include acrylic resins, cellulose derivatives, gelatin, casein, starch, polyvinyl alcohol, soluble nylon and polymer latex. In the optical filter of the present invention, two or more primary coating layers may be formed. You may add the solvent which swells a transparent support body, a mat agent, surfactant, an antistatic agent, an application | coating adjuvant, a film-forming agent, etc. to a primary coating layer.
상기 반사 방지층에 있어서는, 저굴절율층이 필수적이다. 저굴절율층의 굴절율은 상기 투명지지체의 굴절율보다도 낮다. 저굴절율층의 굴절율은 1.20~1.55인 것이 바람직하고, 1.30~1.50인 것이 더욱 바람직하다. 저굴절율층의 두께는 50~400㎚인 것이 바람직하고, 50~200㎚인 것이 더욱 바람직하다. 저굴절율층은 굴절율이 낮은 함불소 폴리머로 이루어지는 층(일본국 특허공개 소57-34526호, 일본국 특허공개 평3-130103호, 일본국 특허공개 평6-115023호, 일본국 특허공개 평8-313702호, 일본국 특허공개 평7-168004호의 각 공보 기재), 졸겔법에 의해 얻어지는 층(일본국 특허공개 평5-208811호, 일본국 특허공개 평6-299091호, 일본국 특허공개 평7-168003호의 각 공보 기재), 혹은 미립자를 포함하는 층(일본국 특허공고 소60-59250호, 일본국 특허공개 평5-13021호, 일본국 특허공개 평6-56478호, 일본국 특허공개 평7-92306호, 일본국 특허공개 평9-288201호의 각 공보 기재)으로서 형성할 수 있다. 미립자를 포함하는 층에서는, 미립자간 또는 미립자내의 미크로 보이드(microvoid)로서, 저굴절율층에 공극(空隙)을 형성할 수 있다. 미립자를 포함하는 층은 3~50체적%의 공극율을 가지는 것이 바람직하고, 5~35체적%의 공극율을 가지는 것이 더욱 바람직하다.In the antireflection layer, a low refractive index layer is essential. The refractive index of the low refractive index layer is lower than that of the transparent support. It is preferable that it is 1.20-1.55, and, as for the refractive index of a low refractive index layer, it is more preferable that it is 1.30-1.50. It is preferable that it is 50-400 nm, and, as for the thickness of a low refractive index layer, it is more preferable that it is 50-200 nm. The low refractive index layer is made of a fluorinated polymer having a low refractive index (Japanese Patent Publication No. 57-34526, Japanese Patent Application Laid-Open No. 3-130103, Japanese Patent Publication No. Hei 6-115023, Japanese Patent Publication No. 8) -313702, Japanese Patent Application Laid-Open No. Hei 7-168004, layers obtained by the sol-gel method (Japanese Patent Application Laid-open No. Hei 5-208811, Japanese Patent Application Laid-open No. Hei 6-299091, Japanese Patent Application Laid-Open No. 7-168003) or a layer containing fine particles (Japanese Patent Publication No. 60-59250, Japanese Patent Publication No. Hei 5-13021, Japanese Patent Publication No. Hei 6-56478, Japanese Patent Publication 7-92306 and Japanese Patent Laid-Open No. Hei 9-288201). In the layer containing the fine particles, voids can be formed in the low refractive index layer as microvoids between the fine particles or in the fine particles. It is preferable that the layer containing microparticles | fine-particles has a porosity of 3-50 volume%, and it is more preferable to have a porosity of 5-35 volume%.
넓은 파장영역의 반사를 방지하기 위해서는, 상기 반사 방지층에 있어서, 저굴절율층과 더불어, 굴절율이 높은 층(중·고굴절율층)을 적층하는 것이 바람직하다. 고굴절율층의 굴절율은 1.65~2.40인 것이 바람직하고, 1.70~2.20인 것이 더욱 바람직하다. 중굴절율층의 굴절율은 저굴절율층의 굴절율과 고굴절율층의 굴절율의 중간 값이 되도록 조정한다. 중굴절율층의 굴절율은 1.50~1.90인 것이 바람직하고, 1.55~1.70인 것이 더욱 바람직하다. 중·고굴절율층의 두께는 5㎚~100㎛인 것이 바람직하고, 10㎚~10㎛인 것이 더욱 바람직하며, 30㎚~1㎛인 것이 가장 바람직하다. 중·고굴절율층의 헤이즈는 5%이하인 것이 바람직하고, 3%이하인 것이 더욱 바람직하며, 1%이하인 것이 가장 바람직하다. 중·고굴절율층은 비교적 높은 굴절율을 가지는 폴리머 바인더를 이용하여 형성할 수 있다. 굴절율이 높은 폴리머로서는, 폴리스티렌, 스티렌 공중합체, 폴리카보네이트, 멜라민수지, 페놀수지, 에폭시수지, 환상(環狀)(지환식 또는 방향족) 이소시아네이트와 폴리올의 반응에서 얻어지는 폴리우레탄 등을 들 수 있다. 그 밖의 환상(방향족, 복소환식, 지환식)기를 가지는 폴리머나, 불소 이외의 할로겐원자를 치환기로서 가지는 폴리머도 굴절율이 높다. 이중 결합을 도입하여 라디칼 경화를 가능하게 한 모노머의 중합반응에 의해 형성된 폴리머를 이용해도 된다.In order to prevent reflection of a wide wavelength range, in the said anti-reflection layer, it is preferable to laminate | stack a layer with a high refractive index (medium-high refractive index layer) in addition to a low refractive index layer. It is preferable that it is 1.65-2.40, and, as for the refractive index of a high refractive index layer, it is more preferable that it is 1.70-2.20. The refractive index of the medium refractive index layer is adjusted to be an intermediate value between the refractive index of the low refractive index layer and the refractive index of the high refractive index layer. It is preferable that it is 1.50-1.90, and, as for the refractive index of a medium refractive index layer, it is more preferable that it is 1.55-1.70. It is preferable that the thickness of a medium and high refractive index layer is 5 nm-100 micrometers, It is more preferable that it is 10 nm-10 micrometers, It is most preferable that it is 30 nm-1 micrometer. The haze of the medium-high refractive index layer is preferably 5% or less, more preferably 3% or less, and most preferably 1% or less. The medium and high refractive index layer can be formed using a polymer binder having a relatively high refractive index. Examples of the polymer having a high refractive index include polystyrene, styrene copolymers, polycarbonates, melamine resins, phenol resins, epoxy resins, polyurethanes obtained by reaction of cyclic (alicyclic or aromatic) isocyanates and polyols. Polymers having other cyclic (aromatic, heterocyclic, or alicyclic) groups or polymers having halogen atoms other than fluorine as substituents also have high refractive index. You may use the polymer formed by the superposition | polymerization reaction of the monomer which introduced the double bond and enabled radical hardening.
더 높은 굴절율을 얻기 위해서, 상기 폴리머 바인더 중에 무기 미립자를 분산해도 된다. 무기 미립자의 굴절율은 1.80~2.80인 것이 바람직하다. 무기 미립자는 금속의 산화물 또는 황화물로 형성하는 것이 바람직하다. 금속의 산화물 또는 황화물로서는, 산화티탄(예를 들면, 루틸, 루틸/아나타제의 혼합결정, 아나타제, 아모르퍼스 구조), 산화주석, 산화인듐, 산화아연, 산화지르코늄, 황화아연 등을 들 수 있다. 이들 중에서도, 산화티탄, 산화주석 및 산화인듐이 특히 바람직하다. 무기 미립자는 이들 금속의 산화물 또는 황화물을 주성분으로 하고, 또한 다른 원소를 포함할 수 있다. 주성분이란, 입자를 구성하는 성분 중에서 가장 함유량(중량%)이 많은 성분을 의미한다. 다른 원소로서는, Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, S 등을 들 수 있다. 피막 형성성으로 용제에 분산할 수 있거나, 그 자신이 액상인 무기재료, 예를 들면, 각종 원소의 알콕시드, 유기산의 염, 배위성 화합물과 결합한 배위화합물(예를 들면 킬레이트화합물), 활성 무기 폴리머를 이용하여, 중·고굴절율층을 형성할 수도 있다.In order to obtain a higher refractive index, inorganic fine particles may be dispersed in the polymer binder. It is preferable that the refractive index of an inorganic fine particle is 1.80-2.80. The inorganic fine particles are preferably formed of an oxide or sulfide of a metal. Examples of the metal oxides or sulfides include titanium oxide (for example, mixed crystals of rutile, rutile / anatase, anatase, amorphous structure), tin oxide, indium oxide, zinc oxide, zirconium oxide, zinc sulfide, and the like. Among these, titanium oxide, tin oxide and indium oxide are particularly preferable. The inorganic fine particles are mainly composed of oxides or sulfides of these metals, and may also contain other elements. A main component means the component with most content (weight%) among the components which comprise particle | grains. Examples of other elements include Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, S and the like. Inorganic materials that can be dispersed in a solvent or form liquids, such as alkoxides of various elements, salts of organic acids, coordination compounds (e.g. chelate compounds), active inorganic compounds A medium and high refractive index layer can also be formed using a polymer.
상기 반사 방지층의 표면에는, 안티글래어 기능(antiglare function)(입사광을 표면에서 산란시켜서, 막 주위의 모습이 막 표면에 비치는 것을 방지하는 기능)을 부여할 수 있다. 예를 들면, 투명 필름의 표면에 미세한 요철을 형성하여 그 표면에 반사 방지층을 형성하거나, 혹은, 반사 방지층을 형성한 후, 엠보스 롤에 의 해 표면에 요철을 형성함으로써, 안티글래어 기능을 가지는 반사 방지층을 얻을 수 있다. 안티글래어 기능을 가지는 반사 방지층은 일반적으로 3~30%의 헤이즈를 가진다.The surface of the antireflection layer can be given an antiglare function (a function of scattering incident light from the surface to prevent the appearance of the surroundings of the film from being reflected on the surface of the film). For example, antiglare function can be achieved by forming fine unevenness on the surface of the transparent film to form an antireflection layer on the surface, or by forming an antireflection layer on the surface and then forming the unevenness on the surface by using an embossing roll. The branch can obtain an antireflection layer. An antireflection layer having an antiglare function generally has a haze of 3 to 30%.
상기 하드코트층은 상기 투명지지체의 경도보다도 높은 경도를 가진다. 하드코트층은 가교(架橋)하고 있는 폴리머를 포함하는 것이 바람직하다. 하드코트층은 아크릴계, 우레탄계, 에폭시계의 폴리머, 올리고머 또는 모노머(예를 들면 자외선 경화형 수지) 등을 이용하여 형성할 수 있다. 실리카계 재료로 하드코트층을 형성할 수도 있다.The hard coat layer has a hardness higher than that of the transparent support. It is preferable that a hard-coat layer contains the polymer bridge | crosslinked. The hard coat layer can be formed using an acryl, urethane or epoxy polymer, oligomer or monomer (for example, ultraviolet curable resin). It is also possible to form a hard coat layer from a silica-based material.
상기 반사 방지층(저굴절율층)의 표면에는, 윤활층을 형성해도 된다. 윤활층은 저굴절율층 표면에 슬라이딩성을 부여하여, 내상성(耐傷性)을 개선하는 기능을 가진다. 윤활층은 폴리오르가노실록산(예를 들면 실리콘 오일), 천연 왁스, 석유 왁스, 고급 지방산 금속염, 불소계 윤활제 또는 그 유도체 등을 이용하여 형성할 수 있다. 윤활층의 두께는 2~20㎚인 것이 바람직하다.A lubricating layer may be formed on the surface of the antireflection layer (low refractive index layer). The lubricating layer has a function of imparting sliding property to the surface of the low refractive index layer and improving scratch resistance. The lubricating layer can be formed using polyorganosiloxane (for example silicone oil), natural wax, petroleum wax, higher fatty acid metal salt, fluorine-based lubricant or derivatives thereof. It is preferable that the thickness of a lubrication layer is 2-20 nm.
상술한 각 층과는 별도로 광 흡수층을 형성하는 경우는 본 발명의 인돌화합물을 그대로 사용할 수도 있고, 바인더를 사용할 수도 있다. 바인더로서는, 예를 들면, 젤라틴, 카세인, 전분, 셀룰로오스 유도체, 알긴산 등의 천연 고분자 재료,혹은, 폴리메틸메타크릴레이트, 폴리비닐부티랄, 폴리비닐피로리돈, 폴리비닐알코올, 폴리염화비닐, 스티렌-부타디엔코폴리머, 폴리스티렌, 폴리카보네이트, 폴리아미드, 폴리우레탄, 폴리에스테르, 폴리우레아 등의 합성 고분자 재료가 이용된다.When forming a light absorbing layer separately from each layer mentioned above, the indole compound of this invention may be used as it is, or a binder may be used. As the binder, for example, natural polymer materials such as gelatin, casein, starch, cellulose derivative, alginic acid, or polymethyl methacrylate, polyvinyl butyral, polyvinylpyrrolidone, polyvinyl alcohol, polyvinyl chloride, styrene Synthetic polymer materials such as butadiene copolymer, polystyrene, polycarbonate, polyamide, polyurethane, polyester, and polyurea.
상기의 초벌칠층, 반사 방지층, 하드코트층, 윤활층, 광 흡수층 등은 일반적 인 도포방법에 의해 형성할 수 있다. 도포방법으로서는, 딥 코트법, 에어 나이프(air knife) 코트법, 커튼 코트법, 롤러 코트법, 와이어 바(wire bar) 코트법, 그라비어(gravure) 코트법, 호퍼(hopper)를 사용하는 익스트루젼(extrusion) 코트법(미국 특허 제2681294호 명세서 기재) 등을 들 수 있다. 둘 이상의 층을 동시 도포에 의해 형성해도 된다. 동시 도포법에 대해서는, 예를 들면, 미국 특허 제2761791호, 미국 특허 제2941898호, 미국 특허 제3508947호, 미국 특허 제3526528호의 각 명세서 및 하라사키 유지 저(箸) 『코팅 공학』 253페이지(1973년 아사쿠라 서점 발행)에 기재되어 있다.Said primary coating layer, antireflection layer, hard coat layer, lubricating layer, light absorbing layer and the like can be formed by a general coating method. As a coating method, the deep coating method, the air knife coating method, the curtain coating method, the roller coating method, the wire bar coating method, the gravure coating method, the hopper using the hopper Extrusion coating method (described in the specification of US Pat. No. 2,268,942), and the like. Two or more layers may be formed by simultaneous application. For the simultaneous coating method, for example, the specifications of U.S. Pat.No.2761791, U.S. Pat.No.2941898, U.S. Pat.No.3508947, U.S.Patent No.3526528, and Harasaki Yuki Co., Ltd., page 253 ( Published by Asakura Bookstore in 1973).
다음으로, 본 발명의 광학기록 재료에 대하여 설명한다.Next, the optical recording material of the present invention will be described.
본 발명의 광학기록 재료는 본 발명의 인돌화합물을 함유하고, 광학기록 매체의 광학기록층의 형성에 이용되는 것이며, 함유하는 인돌화합물의 광 흡수특성에 따라서 각종의 광학기록 매체에 적용할 수 있다. 본 발명의 광학기록 재료 중에서도, 파장이 380㎚~420㎚인 단파장 레이저용의 광 디스크에 특히 적합한 것은 함유하는 인돌화합물이 용액상태에서의 광 흡수특성에 있어서, 최대 흡수파장 λmax를 320~420㎚의 범위에 가지는 것이다. 또한, 흡수 강도에 대해서는, λmax에서의 ε이 1.0×104보다 작으면 기록 감도가 저하할 우려가 있으므로, 1.0×104이상이 바람직하다. 상기 인돌화합물의 용액상태에서의 λmax 및 ε의 측정은 상법에 따라서, 시료 용액의 농도, 측정에 이용하는 용매 등을 선택하여 행할 수 있다.The optical recording material of the present invention contains the indole compound of the present invention and is used for forming the optical recording layer of the optical recording medium, and can be applied to various optical recording media according to the light absorption characteristics of the indole compound. . Of the optical recording materials of the present invention, particularly suitable for optical disks for short wavelength lasers having a wavelength of 380 nm to 420 nm, the indole compound containing a maximum absorption wavelength? Max of 320 to 420 nm in the light absorption characteristic in solution state It is in the range of. Regarding the absorption intensity, if the ε at λ max is smaller than 1.0 × 10 4 , the recording sensitivity may decrease, so 1.0 × 10 4 or more is preferable. (Lambda) max and (epsilon) in the solution state of the said indole compound can be performed by selecting the density | concentration of a sample solution, the solvent used for a measurement, etc. according to a conventional method.
상기의 인돌화합물을 함유하는 본 발명의 광학기록 재료를 이용하여 광학기 록 매체의 광학기록층을 형성하는 방법에 대해서는, 특별히 제한을 받지 않는다. 일반적으로는, 메탄올, 에탄올 등의 저급 알코올류; 메틸셀로솔브, 에틸셀로솔브, 부틸셀로솔브, 부틸디글리콜 등의 에테르 알코올류; 아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 시클로헥사논, 디아세톤알코올 등의 케톤류, 초산에틸, 초산부틸, 초산메톡시에틸 등의 에스테르류; 아크릴산 에틸, 아크릴산 부틸 등의 아크릴산 에스테르류, 2,2,3,3-테트라플루오로프로판올 등의 불화 알코올류; 벤젠, 톨루엔, 크실렌 등의 탄화수소류; 메틸렌디클로라이드, 디클로로에탄, 클로로포름 등의 염소화 탄화수소류 등의 유기용매에, 본 발명의 인돌화합물 및 각종 화합물을 용해한 용액을 기체 위에, 스핀 코트, 스프레이, 디핑(dipping) 등으로 도포하는 습식 도포법, 증착법, 스퍼터링법 등을 들 수 있다.The method for forming the optical recording layer of the optical recording medium using the optical recording material of the present invention containing the above indole compound is not particularly limited. Generally, lower alcohols, such as methanol and ethanol; Ether alcohols such as methyl cellosolve, ethyl cellosolve, butyl cellosolve and butyl diglycol; Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and diacetone alcohol; esters such as ethyl acetate, butyl acetate and methoxy ethyl acetate; Fluorinated alcohols such as acrylic acid esters such as ethyl acrylate and butyl acrylate, and 2,2,3,3-tetrafluoropropanol; Hydrocarbons such as benzene, toluene and xylene; Wet coating method in which a solution obtained by dissolving the indole compound and various compounds of the present invention in an organic solvent such as chlorinated hydrocarbons such as methylene dichloride, dichloroethane and chloroform is applied on a substrate by spin coating, spraying or dipping. , Vapor deposition method, sputtering method and the like.
상기 광학기록층은 박막으로서 형성되고, 그 두께는 통상, 0.001~10㎛가 적당하며, 바람직하게는 0.01~5㎛의 범위이다.The optical recording layer is formed as a thin film, and the thickness thereof is usually 0.001 to 10 mu m, preferably in the range of 0.01 to 5 mu m.
또한, 본 발명의 광학기록 재료 중에 있어서의 본 발명의 인돌화합물의 함유량은 본 발명의 광학기록 재료에 포함되는 고형분 중, 10~100질량%가 바람직하다. 상기 광학기록층은 광학기록층 중에 상기 일반식(Ⅰ)로 표현되는 인돌화합물을 50~100질량% 함유하도록 형성되는 것이 바람직하고, 이와 같은 인돌화합물 함유량의 광학기록층을 형성하기 위해서, 본 발명의 광학기록 재료는 상기 일반식(Ⅰ)로 표현되는 인돌화합물을 본 발명의 광학기록 재료에 포함되는 고형분 기준으로 50~100질량% 함유하는 것이 더욱 바람직하다.In addition, the content of the indole compound of the present invention in the optical recording material of the present invention is preferably 10 to 100% by mass in the solid content contained in the optical recording material of the present invention. The optical recording layer is preferably formed so as to contain 50 to 100% by mass of the indole compound represented by the general formula (I) in the optical recording layer, and in order to form an optical recording layer having such an indole compound content, The optical recording material of more preferably contains 50 to 100% by mass of the indole compound represented by the general formula (I), based on the solid content contained in the optical recording material of the present invention.
본 발명의 광학기록 재료는 본 발명의 인돌화합물 외에, 필요에 따라 시아닌 계 화합물, 아조계 화합물, 프탈로시아닌계 화합물, 옥소놀계 화합물, 스쿠아릴륨계 화합물, 스티릴계 화합물, 포르핀계 화합물, 아즐레늄계 화합물, 크로코닉메틴(croconic methine)계 화합물, 피릴륨계 화합물, 티오피릴륨계 화합물, 트리아릴메탄계 화합물, 디페닐메탄계 화합물, 테트라히드로콜린계 화합물, 인도페놀계 화합물, 안트라퀴논계 화합물, 나프토퀴논계 화합물, 크산텐계 화합물, 티아진계 화합물, 아크리딘계 화합물, 옥사진계 화합물, 스피로피란계 화합물, 플루오렌계 화합물, 로다민계 화합물 등의 통상 광학기록층에 이용할 수 있는 화합물; 폴리에틸렌, 폴리에스테르, 폴리스티렌, 폴리카보네이트 등의 수지류; 계면활성제; 대전방지제; 활제; 난연제; 힌더드 아민 등의 라디칼 포착제; 페로센 유도체 등의 피트(pit) 형성 촉진제; 분산제; 산화 방지제; 가교제; 내광성 부여제 등을 함유해도 된다. 또한, 본 발명의 광학기록 재료는 일중항 산소 등의 켄처로서 방향족 니트로 소화합물, 아미늄화합물, 이미늄화합물, 비스이미늄화합물, 천이 금속 킬레이트화합물 등을 함유해도 되며, 켄처 음이온을 이용해도 된다. 본 발명의 광학기록 재료에 있어서, 이들 각종 화합물은 본 발명의 광학기록 재료에 포함되는 고형분 중, 0~50질량%의 범위가 되는 양으로 사용되는 것이 바람직하다.The optical recording material of the present invention is, in addition to the indole compound of the present invention, if necessary, a cyanine compound, an azo compound, a phthalocyanine compound, an oxonol compound, a squarylium compound, a styryl compound, a porpine compound, an azlenium compound , Croconic methine compounds, pyryllium compounds, thiopyryllium compounds, triarylmethane compounds, diphenylmethane compounds, tetrahydrocholine compounds, indophenol compounds, anthraquinone compounds, naph Compounds usable for ordinary optical recording layers such as toquinone compounds, xanthene compounds, thiazine compounds, acridine compounds, oxazine compounds, spiropyran compounds, fluorene compounds, and rhodamine compounds; Resins such as polyethylene, polyester, polystyrene and polycarbonate; Surfactants; Antistatic agent; Lubricant; Flame retardant; Radical scavengers such as hindered amines; Pit formation promoters such as ferrocene derivatives; Dispersants; Antioxidants; Crosslinking agents; You may contain a light fastener. The optical recording material of the present invention may contain an aromatic nitro compound, an aluminum compound, an iminium compound, a bisiminium compound, a transition metal chelate compound, or the like as a quencher such as singlet oxygen, or a quencher anion may be used. . In the optical recording material of the present invention, it is preferable that these various compounds are used in an amount within the range of 0 to 50% by mass in the solid content contained in the optical recording material of the present invention.
이와 같은 광학기록층을 형성하는 상기 기체의 재질은 기입(기록)광 및 판독(재생)광에 대하여 실질적으로 투명한 것이면 특별히 제한은 없고, 예를 들면, 폴리메틸메타크릴레이트, 폴리에틸렌테레프탈레이트, 폴리카보네이트 등의 수지, 유리 등이 이용된다. 또한, 그 형상은 용도에 따라, 테이프, 드럼, 벨트, 디스크 등 임의의 형상의 것을 사용할 수 있다.The material of the substrate forming such an optical recording layer is not particularly limited as long as it is substantially transparent to writing (writing) light and reading (reproducing) light. For example, polymethyl methacrylate, polyethylene terephthalate, poly Resin, such as carbonate, glass, etc. are used. In addition, the shape may use any shape, such as a tape, a drum, a belt, and a disk, according to a use.
또한, 상기 광학기록층상에는, 금, 은, 알루미늄, 구리 등을 이용하여, 증착법 혹은 스퍼터링법에 의해 반사막을 형성할 수도 있고, 아크릴수지, 자외선 경화성 수지 등에 의해 보호층을 형성할 수도 있다.On the optical recording layer, a reflective film may be formed by evaporation or sputtering using gold, silver, aluminum, copper, or the like, or a protective layer may be formed by acrylic resin, ultraviolet curable resin, or the like.
<실시예><Example>
이하, 실시예 및 비교예로서 본 발명을 더욱 상세히 설명한다. 그러나, 본 발명은 이하의 실시예 등에 의해 하등 제한을 받지 않는다.Hereinafter, the present invention will be described in more detail as examples and comparative examples. However, the present invention is not limited at all by the following examples and the like.
[실시예 1] 화합물 No.1의 합성Example 1 Synthesis of Compound No. 1
질소 치환한 반응 플라스크에, 디메틸포름아미드(DMF) 10㎖ 및 클로로포름 80㎖를 넣고, 빙냉하에서 옥시염화인 6.91g(45.1mmol)을 적하하여, 빙냉하에서 1시간 교반하였다. 1-메틸인돌 3.94g(30.Ommol)을 클로로포름 40㎖에 용해한 것을 빙냉하에서 적하하여, 3시간 가열 환류하였다. 실온에 냉각하고, 반응액을 6불화 인산칼륨 23.1g(126mmol)의 400㎖ 수용액에 서서히 적하하여, 실온에서 2시간 교반하였다. 석출물을 여과 분별하고, 메탄올 200㎖를 이용하여 실온에서 30분간 교반하여, 세정을 행하였다. 여과, 건조를 거쳐 분홍색 고체를 9.32g(수율 93.4%) 얻었다. 얻어진 분홍색 고체는 목적물인 화합물 No.1인 것이 확인되었다. 얻어진 화합물 No.1에 대한 분석결과를 이하에 나타낸다.Into a nitrogen-substituted reaction flask, 10 ml of dimethylformamide (DMF) and 80 ml of chloroform were added, and 6.91 g (45.1 mmol) of phosphorus oxychloride was added dropwise under ice cooling, followed by stirring for 1 hour under ice cooling. What dissolved 3.94 g (30.Ommol) of 1-methylindole in 40 ml of chloroforms was dripped under ice cooling, and it heated and refluxed for 3 hours. After cooling to room temperature, the reaction solution was slowly added dropwise to a 400 ml aqueous solution of 23.1 g (126 mmol) of potassium hexafluorophosphate, followed by stirring at room temperature for 2 hours. The precipitate was separated by filtration, and washed with 200 ml of methanol at room temperature for 30 minutes. 9.32 g (yield 93.4%) of pink solids were obtained through filtration and drying. It was confirmed that the obtained pink solid is compound No. 1 which is a target object. The analysis results of Compound No. 1 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
3.57(s;3H), 3.74(s;3H), 4.01(s;3H), 7.39-7.50(m;2H), 7.26-7.65(m;1H), 8.00-8.10(m;1H), 8.70(s;1H), 9.12(s;1H)3.57 (s; 3H), 3.74 (s; 3H), 4.01 (s; 3H), 7.39-7.50 (m; 2H), 7.26-7.65 (m; 1H), 8.00-8.10 (m; 1H), 8.70 ( s; 1 H), 9.12 (s; 1 H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
3168, 1647, 1536, 1466, 1402, 1349, 1256, 1113, 838, 7583168, 1647, 1536, 1466, 1402, 1349, 1256, 1113, 838, 758
(3)UV 흡수 측정(아세톤 용매)(3) UV absorption measurement (acetone solvent)
λmax; 345.O㎚, ε; 1.86×104(농도 6.68×10-6mol/ℓ)λ max; 345.Onm, ε; 1.86 × 10 4 (concentration 6.68 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
295.8℃; 융점, 326.7℃; 질량감소 개시점295.8 ° C .; Melting point, 326.7 ° C .; Mass reduction start point
[실시예 2] 화합물 No.2의 합성Example 2 Synthesis of Compound No. 2
질소 치환한 반응 플라스크에, DMF lO㎖ 및 클로로포름 80㎖를 넣고, 빙냉하에서 옥시염화인 6.90g(45.Ommol)을 적하하여, 빙냉하에서 1시간 교반하였다. 1-메틸-2-페닐인돌 6.22g(30.Ommol)을 클로로포름 40㎖에 용해한 것을 빙냉하에서 적하하여, 3시간 가열 환류하였다. 실온에 냉각하고, 반응액을 6불화 인산칼륨 20.0g(109mmol)의 400㎖ 수용액에 서서히 적하하여, 실온에서 30분간 교반하였다. 수층을 제거하고, 물 400㎖를 첨가하여 실온에서 30분간 교반한 후, 석출물을 여과 분별하고, 에탄올 150㎖를 이용하여 실온에서 30분간 교반하여, 세정을 행하였다. 여과, 건조를 거쳐 회백색 고체를 얻었다. 아세토니트릴/에탄올 혼합용매로부터 재결정(再結晶)을 행하여, 회백색 고체를 5.06g(수율 41.5%) 얻었다. 얻어진 회백색 고체는 목적물인 화합물 No.2인 것이 확인되었다. 얻어진 화합물 No.2에 대한 분석결과를 이하에 나타낸다.Into a nitrogen-substituted reaction flask, 100 ml of DMF and 80 ml of chloroform were added, 6.90 g (45.Ommol) of phosphorus oxychloride was added dropwise under ice-cooling, followed by stirring for 1 hour under ice-cooling. What melt | dissolved 6.22 g (30.Ommol) of 1-methyl- 2-phenylindole in 40 ml of chloroforms was dripped under ice-cooling, and it heated and refluxed for 3 hours. After cooling to room temperature, the reaction solution was slowly added dropwise to a 400 ml aqueous solution of 20.0 g (109 mmol) of potassium hexafluorophosphate, followed by stirring at room temperature for 30 minutes. The aqueous layer was removed, 400 ml of water was added, the mixture was stirred at room temperature for 30 minutes, the precipitate was separated by filtration, and 150 ml of ethanol was stirred at room temperature for 30 minutes to wash. Filtration and drying yielded an off-white solid. Recrystallization was carried out from acetonitrile / ethanol mixed solvent to obtain 5.06 g (yield 41.5%) of an off-white solid. It was confirmed that the obtained off-white solid is compound No. 2 which is a target object. The analysis results of Compound No. 2 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
3.53(s;3H), 3.68(s;3H), 3.82(s;3H), 7.45-7.55(m;2H), 7.58-7.75(m;5H), 7.83(d;1H,J=7.8㎐), 7.88(d;1H,J=7.6㎐), 8.51(s;1H)3.53 (s; 3H), 3.68 (s; 3H), 3.82 (s; 3H), 7.45-7.55 (m; 2H), 7.58-7.75 (m; 5H), 7.83 (d; 1H, J = 7.8㎐) , 7.88 (d; 1H, J = 7.6 Hz), 8.51 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
3430, 1656, 1490, 1474, 1463, 1391, 1120, 842, 795, 754, 7053430, 1656, 1490, 1474, 1463, 1391, 1120, 842, 795, 754, 705
(3)UV 흡수 측정(아세톤 용매)(3) UV absorption measurement (acetone solvent)
λmax; 348.5㎚, ε; 1.74×104(농도 1.93×10-6mol/ℓ)λ max; 348.5 nm, epsilon; 1.74 × 10 4 (concentration 1.93 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
162.6℃; 융점, 332.9℃; 질량감소 개시점162.6 ° C .; Melting point, 332.9 ° C .; Mass reduction start point
[실시예 3] 화합물 No.3의 합성Example 3 Synthesis of Compound No. 3
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디부틸포름아미드 15g(95.4mmol) 및 옥시염화인 5.21g(34.Ommol)을 넣고, 빙냉하에서 1시간 교반하였다. 1-메틸인돌 2.62g(20.Ommol)을 빙냉하에서 첨가하여, 100℃에서 3시간 교반하였다. 실온에 냉각하고, N,N-n-디부틸포름아미드를 증발 제거 후, 6불화 인산칼륨 15.3g(95.4mmol)을 첨가하여 균일하게 혼합하였다. 물 150㎖를 첨가하여 실온에서 30분간 교반한 후, 석출물을 여과 분별하고, 메탄올 100㎖를 이용하여 실온에서 30분간 교반하여, 다시 물 50㎖를 첨가하고, 실온에서 30분간 교반하여 세정을 행하였다. 여과, 건조를 거쳐 황토색 고체를 얻었다. 아세토니트릴/메탄올 혼합용매로부터 재결정을 행하고, 여과, 건조를 거쳐 엷은 분홍색 고체를 2.90g(수율 34.8%) 얻었다. 얻어진 엷은 분홍색 고체는 목적물인 화합물 No.3인 것이 확인되었다. 얻 어진 화합물 No.3에 대한 분석결과를 이하에 나타낸다.In a nitrogen-substituted reaction flask, 15 g (95.4 mmol) of N, N-n-dibutylformamide and 5.21 g (34.O mmol) of phosphorus oxychloride were added under ice-cooling, and the mixture was stirred for 1 hour under ice-cooling. 2.62 g (20.Ommol) of 1-methylindole were added under ice-cooling, and stirred at 100 ° C for 3 hours. After cooling to room temperature, N, N-n-dibutylformamide was evaporated off, and then 15.3 g (95.4 mmol) of potassium hexafluorophosphate was added and mixed uniformly. After 150 ml of water was added and stirred at room temperature for 30 minutes, the precipitate was separated by filtration, stirred for 100 minutes at room temperature using 100 ml of methanol, again 50 ml of water was added, and the mixture was stirred at room temperature for 30 minutes to wash. It was. Filtration and drying yielded an ocher solid. Recrystallization was carried out from an acetonitrile / methanol mixed solvent, followed by filtration and drying to obtain 2.90 g (yield 34.8%) of a pale pink solid. It was confirmed that the obtained pale pink solid was compound No. 3 which is a target object. The analysis results of Compound No. 3 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.96(t;3H;J=7.3㎐), 0.97(t;3H;J=7.3㎐), 1.36(tq;2H;J=7.6,7.3㎐), 1.52(tq;2H;J=7.8,7.6㎐), 1.70-1.89(m;4H), 3.85-3.99(m;4H), 4.05(s;3H), 7.45(dd;1H,J=6.6,3.9㎐), 7.46(dd;1H,J=6.6,3.7㎐), 7.68-7.80(m;1H), 8.08-8.20(m;1H), 8.56(s;1H), 9.08(s;1H)0.96 (t; 3H; J = 7.3 kPa), 0.97 (t; 3H; J = 7.3 kPa), 1.36 (tq; 2H; J = 7.6, 7.3 kPa), 1.52 (tq; 2H; J = 7.8, 7.6 kPa ), 1.70-1.89 (m; 4H), 3.85-3.99 (m; 4H), 4.05 (s; 3H), 7.45 (dd; 1H, J = 6.6, 3.9 kPa), 7.46 (dd; 1H, J = 6.6 , 3.7㎐), 7.68-7.80 (m; 1H), 8.08-8.20 (m; 1H), 8.56 (s; 1H), 9.08 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2955, 2874, 1639, 1532, 1476, 1352, 1256, 1114, 834, 7512955, 2874, 1639, 1532, 1476, 1352, 1256, 1114, 834, 751
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 357.O㎚, ε; 2.04×104(농도 5.64×10-6mol/ℓ)λ max; 357. 0 nm, ε; 2.04 × 10 4 (concentration 5.64 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
179.7℃; 융점, 307.8℃; 질량감소 개시점179.7 ° C .; Melting point, 307.8 ° C .; Mass reduction start point
[실시예 4] 화합물 No.4의 합성Example 4 Synthesis of Compound No. 4
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디부틸포름아미드 15g(95.4mmol) 및 옥시염화인 5.21g(34.Ommol)을 넣고, 빙냉하에서 1시간 교반하였다. 1-메틸인돌 6.22g(30.Ommol)을 빙냉하에서 첨가하여, 100℃에서 4시간 교반하였다. 실온에 냉각하고, N,N-n-디부틸포름아미드를 증발 제거 후, 트리플루오로메탄술폰산칼륨 25.0g(132mmol)을 첨가하여 균일하게 혼합하였다. 물 150㎖를 첨가하여 실온에서 30분간 초음파 조사를 행한 후, 석출물을 여과 분별하였다. 에탄올/디 에틸에테르 혼합용매로부터 재결정을 행하고, 여과, 건조를 거쳐 엷은 황색 고체를 4.64g(수율 55.1%) 얻었다. 얻어진 엷은 황색 고체는 목적물인 화합물 No.4인 것이 확인되었다. 얻어진 화합물 No.4에 대한 분석결과를 이하에 나타낸다.In a nitrogen-substituted reaction flask, 15 g (95.4 mmol) of N, N-n-dibutylformamide and 5.21 g (34.O mmol) of phosphorus oxychloride were added under ice-cooling, and the mixture was stirred for 1 hour under ice-cooling. 6.22 g (30.Ommol) of 1-methylindole were added under ice-cooling, and stirred at 100 ° C for 4 hours. After cooling to room temperature, N, N-n-dibutylformamide was evaporated off, and then 25.0 g (132 mmol) of potassium trifluoromethanesulfonate was added and mixed uniformly. After adding 150 ml of water and performing ultrasonic irradiation for 30 minutes at room temperature, the precipitate was separated by filtration. Recrystallization was carried out from an ethanol / diethyl ether mixed solvent, followed by filtration and drying to obtain 4.64 g (yield 55.1%) of a pale yellow solid. It was confirmed that the obtained pale yellow solid was compound No. 4 which is a target object. The analysis results of Compound No. 4 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.94(t;3H;J=6.6㎐), 0.96(t;3H;J=7.1㎐), 1.35(tq;2H;J=7.6,7.6㎐), 1.51(tq;2H;J=7.6,7.6㎐), 1.70-1.85(m;4H), 3.85-3.95(m;4H), 4.05(s;3H), 7.35-7.50(m;2H), 7.65-7.80(m;1H), 8.05-8.20(m;1H), 8.58(s;1H), 9.09(s;1H)0.94 (t; 3H; J = 6.6 μs), 0.96 (t; 3H; J = 7.1 μs), 1.35 (tq; 2H; J = 7.6,7.6 μs), 1.51 (tq; 2H; J = 7.6,7.6 μs ), 1.70-1.85 (m; 4H), 3.85-3.95 (m; 4H), 4.05 (s; 3H), 7.35-7.50 (m; 2H), 7.65-7.80 (m; 1H), 8.05-8.20 (m) ; 1H), 8.58 (s; 1H), 9.09 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2960, 2874, 1624, 1588, 1476, 1464, 1430, 1265, 1153, 1032, 9652960, 2874, 1624, 1588, 1476, 1464, 1430, 1265, 1153, 1032, 965
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 356.5㎚, ε; 1.84×104(농도 9.89×10-6mol/ℓ)λ max; 356.5 nm, epsilon; 1.84 × 10 4 (concentration 9.89 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
110.3℃; 융점, 287.1℃; 질량감소 개시점110.3 ° C .; Melting point, 287.1 ° C .; Mass reduction start point
[실시예 5] 화합물 No.5의 합성Example 5 Synthesis of Compound No. 5
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디부틸포름아미드 22.5g(143mmol) 및 옥시염화인 7.82g(51.Ommol)을 넣고, 빙냉하에서 1시간 교반하였다. 1-(3,5-비스트리플루오로메틸페닐)인돌 6.08g(18.4mmol)을 빙냉하에서 첨가하여, 100℃에서 4시간 교반하였다. 실온에 냉각하고, N,N-n-디부틸포름아미드를 증발 제거 후, 6불화 인산칼륨 50.0g(272mmol)을 첨가하여 균일하게 혼합하였다.In a nitrogen-substituted reaction flask, 22.5 g (143 mmol) of N, N-n-dibutylformamide and 7.82 g (51.O mmol) of phosphorus oxychloride were added under ice-cooling, and the mixture was stirred for 1 hour under ice-cooling. 6.08 g (18.4 mmol) of 1- (3,5-bistrifluoromethylphenyl) indole were added under ice-cooling, followed by stirring at 100 ° C for 4 hours. After cooling to room temperature, N, N-n-dibutylformamide was evaporated off, and then 50.0 g (272 mmol) of potassium hexafluorophosphate was added and mixed uniformly.
물 1L를 첨가하여 실온에서 30분간 교반한 후, 수층을 제거하고 에탄올 1L를 이용하여 30분간 교반하여 세정을 행한 후, 석출물을 여과 분별하였다. 아세톤/에탄올 혼합용매로부터 재결정을 행하고, 여과, 건조를 거쳐 무색투명한 침상(針狀) 결정을 2.75g(수율 24.3%) 얻었다. 얻어진 무색투명한 침상 결정은 목적물인 화합물 No.5인 것이 확인되었다. 얻어진 화합물 No.5에 대한 분석결과를 이하에 나타낸다.After adding 1 L of water and stirring at room temperature for 30 minutes, the aqueous layer was removed, and after washing for 30 minutes using 1 L of ethanol, the precipitate was separated by filtration. Recrystallization was carried out from an acetone / ethanol mixed solvent, followed by filtration and drying to obtain 2.75 g (yield 24.3%) of colorless and transparent acicular crystals. It was confirmed that the obtained colorless transparent needle crystal was compound No. 5 which is a target object. The analysis results of Compound No. 5 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.96(t;3H;J=7.6㎐), 0.99(t;3H;J=7.1㎐), 1.40(tq;2H;J=7.3,7.1㎐), 1.48(tq;2H;J=7.6,7.6㎐), 1.78-1.95(m;4H), 4.05(t;2H;J=7.6㎐), 4.11(t;2H;J=7.8㎐), 7.51(dd;1H;J=8.5,7.1㎐), 7.55(dd;1H;J=7.8,7.1㎐), 7.64(d;1H;J=8.3㎐), 8.26(d;1H;J=7.6㎐), 8.41(s;1H), 8.60(s;2H), 8.83(s;1H), 9.34(s;1H)0.96 (t; 3H; J = 7.6 kPa), 0.99 (t; 3H; J = 7.1 kPa), 1.40 (tq; 2H; J = 7.3, 7.1 kPa), 1.48 (tq; 2H; J = 7.6, 7.6 kPa ), 1.78-1.95 (m; 4H), 4.05 (t; 2H; J = 7.6 μs), 4.11 (t; 2H; J = 7.8 μs), 7.51 (dd; 1H; J = 8.5,7.1 μs), 7.55 (dd; 1H; J = 7.8,7.1 Hz), 7.64 (d; 1H; J = 8.3 Hz), 8.26 (d; 1H; J = 7.6 Hz), 8.41 (s; 1H), 8.60 (s; 2H) , 8.83 (s; 1H), 9.34 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2967, 2880, 1646, 1522, 1475, 1360, 1282, 1230, 1192, 1146, 843, 825, 7622967, 2880, 1646, 1522, 1475, 1360, 1282, 1230, 1192, 1146, 843, 825, 762
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 354.5㎚, ε; 1.92×104(농도 6.87×10-6mol/ℓ)λ max; 354.5 nm, ε; 1.92 × 10 4 (concentration 6.87 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
183.3℃; 융점, 297.5℃; 질량감소 개시점183.3 ° C .; Melting point, 297.5 ° C .; Mass reduction start point
[실시예 6] 화합물 No.6의 합성Example 6 Synthesis of Compound No. 6
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디부틸포름아미드 22.5g(143mmol) 및 옥시염화인 7.82g(51.Ommol)을 넣고, 빙냉하에서 1시간 교반하였다. 1-메틸-2-페닐인돌 6.22g(30.Ommol)을 빙냉하에서 첨가하여 100℃에서 4시간 교반하였다. 실온에 냉각하고, N,N-n-디부틸포름아미드를 증발 제거 후, 6불화 인산칼륨 50.0g(272mmol)을 첨가하여 균일하게 혼합하였다. 물 1L를 첨가하여 실온에서 30분간 교반하여 세정을 행한 후, 석출물을 여과 분별하였다. 아세톤/에탄올 혼합용매로부터 재결정을 행하고, 여과, 건조를 거쳐 엷은 녹색 고체를 3.02g(수율 20.4%) 얻었다. 얻어진 엷은 녹색 고체는 목적물인 화합물 No.6인 것이 확인되었다. 얻어진 화합물 No.6에 대한 분석결과를 이하에 나타낸다.In a nitrogen-substituted reaction flask, 22.5 g (143 mmol) of N, N-n-dibutylformamide and 7.82 g (51.O mmol) of phosphorus oxychloride were added under ice-cooling, and the mixture was stirred for 1 hour under ice-cooling. 6.22 g (30.Ommol) of 1-methyl-2-phenylindole were added under ice-cooling and stirred at 100 ° C for 4 hours. After cooling to room temperature, N, N-n-dibutylformamide was evaporated off, and then 50.0 g (272 mmol) of potassium hexafluorophosphate was added and mixed uniformly. After adding 1 L of water and stirring for 30 minutes at room temperature, the precipitate was filtered off. Recrystallization was carried out from an acetone / ethanol mixed solvent, followed by filtration and drying to obtain 3.02 g (yield 20.4%) of a pale green solid. It was confirmed that the obtained pale green solid was Compound No. 6 which is a target substance. The analysis results of Compound No. 6 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.80(t;3H;J=7.3㎐), 0.90(t;3H;J=7.3㎐), 1.20(tq;2H;J=7.6,7.6㎐), 1.30(tq;2H;J=7.6,7.6㎐), 1.65-1.79(m;4H), 3.82(s;3H), 3.89(t;2H;J=6.8㎐), 3.91(t;2H;J=6.8㎐), 7.49(dd;1H;J=7.2,7.2㎐), 7.53(dd;1H;J=7.1,7.1㎐), 7.57-7.63(m;2H), 7.64-7.77(m;3H), 7.80(d;1H;J=7.8㎐), 7.85(d;1H;J=7.8㎐), 8.54(s;1H)0.80 (t; 3H; J = 7.3 kPa), 0.90 (t; 3H; J = 7.3 kPa), 1.20 (tq; 2H; J = 7.6,7.6 kPa), 1.30 (tq; 2H; J = 7.6, 7.6 kPa ), 1.65-1.79 (m; 4H), 3.82 (s; 3H), 3.89 (t; 2H; J = 6.8 Hz), 3.91 (t; 2H; J = 6.8 Hz), 7.49 (dd; 1H; J = 7.2,7.2 Hz), 7.53 (dd; 1H; J = 7.1, 7.1 Hz), 7.57-7.63 (m; 2H), 7.64-7.77 (m; 3H), 7.80 (d; 1H; J = 7.8 Hz), 7.85 (d; 1H; J = 7.8 Hz), 8.54 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2960, 2935, 2874, 1651, 1477, 1464, 1404, 1368, 1086, 838, 802, 7502960, 2935, 2874, 1651, 1477, 1464, 1404, 1368, 1086, 838, 802, 750
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 352.5㎚, ε; 2.48×104(농도 4.07×10-6mol/ℓ)λ max; 352.5 nm, epsilon; 2.48 × 10 4 (concentration 4.07 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
100.4℃; 융점, 304.9℃; 질량감소 개시점100.4 ° C .; Melting point, 304.9 ° C .; Mass reduction start point
[실시예 7] 화합물 No.21의 합성Example 7 Synthesis of Compound No.21
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디메틸포름아미드 10㎖, 클로로포름 80㎖ 및 옥시염화인 6.74g(44.Ommol)을 넣고, 빙냉하에서 1시간 교반하였다. 1-프로필페로세닐인돌 10.5g(29.3mmol)의 클로로포름 40㎖ 용액을 빙냉하에서 첨가하여, 3.5시간 가열 환류하였다. 실온에 냉각하고, 6불화 인산칼륨 23.5g(127mmol)의 물 500㎖ 수용액에 서서히 적하하여, 실온에서 1시간 교반하였다. 석출물을 여과 분별하고, 건조를 거쳐 다갈색 고체를 16.2g(수율 99.4%) 얻었다. 얻어진 다갈색 고체는 목적물인 화합물 No.21인 것이 확인되었다. 얻어진 화합물 No.21에 대한 분석결과를 이하에 나타낸다.In a nitrogen-substituted reaction flask, 10 ml of N, N-n-dimethylformamide, 80 ml of chloroform, and 6.74 g (44.Ommol) of phosphorus oxychloride were added to the reaction flask under ice-cooling, followed by stirring for 1 hour under ice-cooling. A 40 mL solution of 10.5 g (29.3 mmol) of chloroform in 1-propylferrocenyl indole was added under ice-cooling, and the mixture was heated to reflux for 3.5 hours. The mixture was cooled to room temperature, and slowly added dropwise to a 500 ml aqueous solution of 23.5 g (127 mmol) of potassium hexafluorophosphate, followed by stirring at room temperature for 1 hour. The precipitate was separated by filtration and dried to obtain 16.2 g (yield 99.4%) of a dark brown solid. It was confirmed that the obtained dark brown solid is compound No. 21 which is a target object. The analysis results of the obtained Compound No. 21 are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
1.48(dt;2H;J=7.3,7.3㎐), 1.90(dt;2H;J=7.3,7.3㎐), 2.32(t;2H;J=7.6㎐), 3.61(s;3H), 3.74(s;3H), 4.03(s;5H), 3.98-4.05(m;4H), 4.44(t;2H;J=7.3㎐), 7.35-7.50(m;2H), 7.81(d;1H;J=7.1㎐), 8.08(d;1H;J=6.8㎐), 8.76(s;1H), 9.17(s;1H)1.48 (dt; 2H; J = 7.3, 7.3 Hz), 1.90 (dt; 2H; J = 7.3, 7.3 Hz), 2.32 (t; 2H; J = 7.6 Hz), 3.61 (s; 3H), 3.74 (s ; 3H), 4.03 (s; 5H), 3.98-4.05 (m; 4H), 4.44 (t; 2H; J = 7.3 kPa), 7.35-7.50 (m; 2H), 7.81 (d; 1H; J = 7.1 I), 8.08 (d; 1H; J = 6.8 Hz), 8.76 (s; 1H), 9.17 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
1654, 1530, 1404, 1364, 1105, 8361654, 1530, 1404, 1364, 1105, 836
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 353.O㎚, ε; 2.10×104(농도 1.59×10-5mol/ℓ)λ max; 353.Onm, ε; 2.10 × 10 4 (concentration 1.59 × 10 -5 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
200.5℃; 융점, 284.7℃; 질량감소 개시점200.5 ° C .; Melting point, 284.7 ° C .; Mass reduction start point
[실시예 8] 화합물 No.24의 합성Example 8 Synthesis of Compound No. 24
질소 치환한 반응 플라스크에, 빙냉하에서 N,N-n-디부틸포름아미드 43.6g(277mmol) 및 옥시염화인 13.3g(87.1mmol)을 넣고, 빙냉하에서 1시간 교반하였다. 5-브로모-1-메틸인돌 12.2g(58.Ommol)을 빙냉하에서 첨가하여, 100℃에서 4시간 교반하였다. 실온에 냉각하고, N,N-n-디부틸포름아미드를 증발 제거 후, 6불화 인산칼륨 58.0g(315mmol)을 첨가하여 균일하게 혼합하였다. 물 1L를 첨가하여 실온에서 30분간 교반하여 세정을 행한 후, 석출물을 여과 분별하였다. 아세톤/메탄올 혼합용매로부터 재결정을 행하고, 여과, 건조를 거쳐 엷은 황색 고체를 18.9g(수율 65.8%) 얻었다. 얻어진 엷은 황색 고체는 목적물인 화합물 No.24인 것이 확인되었다. 얻어진 화합물 No.24에 대한 분석결과를 이하에 나타낸다. To the nitrogen-substituted reaction flask, 43.6 g (277 mmol) of N, N-n-dibutylformamide and 13.3 g (87.1 mmol) of phosphorus oxychloride were added to the reaction flask with ice, and the mixture was stirred for 1 hour under ice-cooling. 12.2 g (58.Ommol) of 5-bromo-1-methylindole was added under ice-cooling, and stirred at 100 ° C for 4 hours. After cooling to room temperature, N, N-n-dibutylformamide was evaporated off, and then 58.0 g (315 mmol) of potassium hexafluorophosphate was added and mixed uniformly. After adding 1 L of water and stirring for 30 minutes at room temperature, the precipitate was filtered off. Recrystallization was carried out from acetone / methanol mixed solvent, and filtration and drying yielded 18.9 g (yield 65.8%) of a pale yellow solid. It was confirmed that the obtained pale yellow solid was compound No. 24 which is a target object. The analysis results of Compound No. 24 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.95(t;3H;J=7.3㎐), 0.96(t;3H;J=7.3㎐), 1.36(tq;2H;J=7.3,7.8㎐), 1.50(tq;2H;J=7.6,7.8㎐), 1.72-1.87(m;4H), 3.91(t;4H;J=7.1㎐), 4.04(s;3H), 7.59(dd;1H;J=1.7,8.8㎐), 7.71(d;1H;J=8.8㎐), 8.41(d;1H;J=1.7㎐), 8.58(s;1H), 9.11(s;1H)0.95 (t; 3H; J = 7.3 kPa), 0.96 (t; 3H; J = 7.3 kPa), 1.36 (tq; 2H; J = 7.3, 7.8 kPa), 1.50 (tq; 2H; J = 7.6, 7.8 kPa ), 1.72-1.87 (m; 4H), 3.91 (t; 4H; J = 7.1 μs), 4.04 (s; 3H), 7.59 (dd; 1H; J = 1.7, 8.8 μs), 7.71 (d; 1H; J = 8.8 Hz), 8.41 (d; 1 H; J = 1.7 Hz), 8.58 (s; 1 H), 9.11 (s; 1 H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2964, 1638, 1530, 1449, 1353, 1253, 1123, 8382964, 1638, 1530, 1449, 1353, 1253, 1123, 838
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 354.O㎚, ε; 2.14×104(농도 1.01×10-5mol/ℓ)λ max; 354. 0 nm, ε; 2.14 × 10 4 (concentration 1.01 × 10 -5 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
161.7℃; 융점, 313.8℃; 질량감소 개시점161.7 ° C .; Melting point, 313.8 ° C .; Mass reduction start point
[실시예 9] 화합물 No.23의 합성Example 9 Synthesis of Compound No. 23
실시예 8에서 얻어진 화합물 No.24의 2.06g(4.18mmol)을 아세톤 20㎖에 용해하고, 화학식[C]로 표현되는 음이온의 트리에틸아민염 5.0mmol을 아세톤 162㎖에 용해한 것을 적하하여, 3시간 가열 환류하였다. 실온까지 냉각 후, 반응물을 물 800㎖에 서서히 적하하여 실온에서 14시간 교반하였다. 석출한 고체를 여과 분별하고, 아세톤으로 세정 후, 건조시켜서 적갈색 고체를 4.18g(수율 93.7%) 얻었다. 얻어진 적갈색 고체는 목적물인 화합물 No.23인 것이 확인되었다. 얻어진 화합물 No.23에 대한 분석결과를 이하에 나타낸다.2.06 g (4.18 mmol) of Compound No. 24 obtained in Example 8 was dissolved in 20 ml of acetone, and 5.0 mmol of the triethylamine salt of the anion represented by the formula [C] was added dropwise into 162 ml of acetone. It was heated to reflux for time. After cooling to room temperature, the reaction was slowly added dropwise to 800 ml of water and stirred at room temperature for 14 hours. The precipitated solid was separated by filtration, washed with acetone and dried to obtain 4.18 g (yield 93.7%) of reddish brown solid. It was confirmed that the obtained reddish-brown solid is compound No. 23 which is a target object. The analysis results of Compound No. 23 obtained are shown below.
(1)1H-NMR(ppm, DMSO 용매)(1) 1 H-NMR (ppm, DMSO solvent)
0.95(t;6H;J=7.1㎐), 1.01(t;12H;J=7.1㎐), 1.36(tq;2H;J=7.3,7.3㎐), 1.48(tq;2H;J=7.3,7.3㎐), 1.72-1.85(m;4H), 3.29(q;8H;J=6.8㎐), 3.89(t;4H;J=7.6㎐), 4.00(s;3H), 5.74(d;2H;J=2.4㎐), 6.35(dd;2H;J=2.7,9.5㎐), 6.55(d;2H;J=9.3㎐), 7.58(dd;1H;J=1.7,8.8㎐), 7.64(d;2H;J=9.3㎐), 7.69(d;1H;J=8.8㎐), 7.84(dd;2H;J=2.9,9.3㎐), 8.39(d;1H;J=1.7㎐), 8.54(s;1H), 9.00(d;2H;J=2.9㎐), 9.08(s;1H)0.95 (t; 6H; J = 7.1 μs), 1.01 (t; 12H; J = 7.1 μs), 1.36 (tq; 2H; J = 7.3,7.3 μs), 1.48 (tq; 2H; J = 7.3,7.3 μs ), 1.72-1.85 (m; 4H), 3.29 (q; 8H; J = 6.8 Hz), 3.89 (t; 4H; J = 7.6 Hz), 4.00 (s; 3H), 5.74 (d; 2H; J = 2.4 kV), 6.35 (dd; 2H; J = 2.7, 9.5 kPa), 6.55 (d; 2H; J = 9.3 kPa), 7.58 (dd; 1H; J = 1.7, 8.8 kPa), 7.64 (d; 2H; J = 9.3 kV), 7.69 (d; 1 H; J = 8.8 kV), 7.84 (dd; 2 H; J = 2.9, 9.3 kV), 8.39 (d; 1 H; J = 1.7 kV), 8.54 (s; 1 H) , 9.00 (d; 2H; J = 2.9 Hz), 9.08 (s; 1H)
(2)IR 흡수(㎝-l)(2) IR absorption (cm -l )
2975, 1611, 1578, 1459, 1320, 1283, 1262, 11412975, 1611, 1578, 1459, 1320, 1283, 1262, 1141
(3)UV 흡수 측정(클로로포름 용매)(3) UV absorption measurement (chloroform solvent)
λmax; 357.5㎚, ε; 3.95×104 λ max; 357.5 nm, ε; 3.95 × 10 4
541.5㎚, ε; 6.20×104(농도 2.18×10-6mol/ℓ)541.5 nm, epsilon; 6.20 × 10 4 (concentration 2.18 × 10 -6 mol / ℓ)
(4)분해온도(TG-DTA: 100㎖/분 질소기류 중, 승온 10℃/분)(4) Decomposition temperature (TG-DTA: 100 ml / min in nitrogen stream, elevated temperature 10 deg. C / min)
216.8℃; 융점, 258.9℃; 질량감소 개시점216.8 ° C .; Melting point, 258.9 ° C .; Mass reduction start point
[실시예 10] 점착제층을 포함하는 광학필터의 제조Example 10 Preparation of Optical Filter Including Adhesive Layer
하기의 배합으로 UV 바니시를 작성하고, 역밀착 처리한 188㎛ 두께의 PET 필름에, 상기 UV 바니시를 바 코터(bar coater) #9에 의해 도포한 후, 100℃로 10분간 건조시켰다. 그 후, 적외선 차단 필름 필터 부착 고압 수은등으로 자외선을 100mJ 조사하고, PET 필름상에 경화막 두께 약 5미크론의 필름층(점착제층)을 가지는 광학필터를 얻었다. 이 광학필터를 니혼 분코 가부시키가이샤 제품 자외가시 근적외 분광 광도계 V-570으로 측정한 바, λmax가 353㎚였다.A UV varnish was prepared by the following formulation, and the UV varnish was applied to a 188 μm-thick PET film subjected to reverse adhesion by bar coater # 9, followed by drying at 100 ° C. for 10 minutes. Then, 100 mJ of ultraviolet-rays were irradiated with the high pressure mercury lamp with an infrared cut film filter, and the optical filter which has a film layer (adhesive layer) of about 5 microns of cured film thickness on the PET film was obtained. (Lambda) max was 353 nm when this optical filter was measured with the ultraviolet visible near-infrared spectrophotometer V-570 by Nippon Bunko Corporation.
(배합)(combination)
화합물 No.4 2.0㎎Compound No. 4 2.0 mg
아크릴계 점착제(DB5541: 다이아 본도 고교 가부시키가이샤 제품) 20g20 g of acrylic pressure-sensitive adhesives (DB5541: DIA BODO CORPORATION)
메틸에틸케톤 80gMethyl ethyl ketone 80g
[실시예 11] 광학필터의 제조Example 11 Fabrication of Optical Filter
하기의 배합으로 UV 바니시를 작성하고, 역밀착 처리한 188㎛ 두께의 PET 필름에, 상기 UV 바니시를 바 코터 #9에 의해 도포한 후, 100℃로 10분간 건조시켰다. 그 후, 적외선 차단 필름 필터 부착 고압 수은등으로 자외선을 100mJ 조사하여, PET 필름에 경화막 두께 약 5미크론의 필름층을 가지는 광학필터를 얻었다. 이 광학필터를 니혼 분코 가부시키가이샤 제품 자외가시 근적외 분광 광도계 V-570으로 측정한 바, λmax가 354㎚였다.A UV varnish was prepared by the following formulation, and the UV varnish was applied to a 188 μm-thick PET film subjected to reverse adhesion by bar coater # 9, and then dried at 100 ° C. for 10 minutes. Thereafter, 100 mJ of ultraviolet rays were irradiated with a high pressure mercury lamp with an infrared ray blocking film filter to obtain an optical filter having a film layer having a cured film thickness of about 5 microns on a PET film. (Lambda) max was 354 nm when this optical filter was measured with the ultraviolet visible near-infrared spectrophotometer V-570 by Nihon Bunco.
(배합)(combination)
아데카옵토머 KRX-571-65 100gAdeka optomer KRX-571-65 100 g
(가부시키가이샤 아데카 제품 UV 경화 수지, 수지분 80중량%)(UV cured resin made by Adeka Co., Ltd., resin weight 80% by weight)
화합물 No.5 2.0㎎Compound No. 5 2.0 mg
메틸에틸케톤 60gMethyl ethyl ketone 60g
[실시예 12] 광학기록 재료 및 광학기록 매체의 제조와 광학기록 매체의 평가Example 12 Preparation of Optical Recording Material and Optical Recording Medium and Evaluation of Optical Recording Medium
상기 제조예 4에서 얻은 화합물 No.4를 화합물 No.4의 농도가 1.0질량%가 되도록 2,2,3,3-테트라플루오로프로판올에 용해하여, 2,2,3,3-테트라플루오로프로판올 용액으로서 광학기록 재료를 얻었다. 티탄킬레이트화합물(T-50: 닛폰 소다 가부시키가이샤 제품)을 도포, 가수분해하여 하지층(下地層)(0.01㎛)을 형성한 직경 12㎝의 폴리카보네이트 디스크 기판상에, 상기의 광학기록 재료를 스핀 코팅법으로 도포하여, 두께 100㎚의 광학기록층을 형성하여 광학기록 매체를 얻었다. 이 광학기록 매체에 대하여, 박막의 흡수 UV 스펙트럼과 입사각 5°의 반사광의 UV 스펙트 럼을 측정한 바, 흡수 λmax는 353㎚, 반사광 λmax는 382㎚였다.Compound No. 4 obtained in Preparation Example 4 was dissolved in 2,2,3,3-tetrafluoropropanol so that the concentration of Compound No. 4 was 1.0% by mass, and 2,2,3,3-tetrafluoro An optical recording material was obtained as a propanol solution. Titanium chelate compound (T-50: manufactured by Nippon Soda Co., Ltd.) was applied and hydrolyzed to form a base layer (0.01 μm) on a 12 cm diameter polycarbonate disc substrate, the optical recording material described above. Was applied by spin coating to form an optical recording layer having a thickness of 100 nm to obtain an optical recording medium. With respect to the optical recording medium, the absorption UV spectrum of the thin film and the UV spectrum of the reflected light having an incident angle of 5 ° were measured. The absorption lambda max was 353 nm and the reflected light lambda max was 382 nm.
본 발명의 인돌화합물을 사용한 필터는 특정의 파장(340~390㎚)에 흡수 극대를 가지고 있어(실시예 10 및 11), 광학필터용 자외선 흡수제로서 적합하다는 것을 확인할 수 있었다.The filter using the indole compound of the present invention had an absorption maximum at a specific wavelength (340 to 390 nm) (Examples 10 and 11), and it was confirmed that it was suitable as an ultraviolet absorber for an optical filter.
또한, 본 발명의 인돌화합물을 함유하는 광학기록 재료에 의해 형성된 광학기록층을 가지는 광학기록 매체는 특정의 파장(340~390㎚)에 반사광의 흡수 극대를 가지고 있다(실시예 12). 광 디스크로 대표되는 광학기록 매체의 재생모드에서는, 레이저광을 광학기록 매체에 반사시킨 반사광에 대하여, 레이저 파장의 광량의 차이로 기록의 유무를 검출하므로, 광학기록 매체는 반사광의 흡수 스펙트럼에 있어서, 레이저광의 파장에 가까운 곳에서 큰 흡수 강도를 나타내는 것일수록 바람직하다. 따라서, 본 발명의 인돌화합물을 함유하는 본 발명의 광학기록 재료는 단파장 레이저용 광 디스크 등의 405㎚의 레이저광을 이용하는 광학기록 매체의 광학기록층의 형성에 이용하는 광학기록 재료로서 적합하다.Further, the optical recording medium having the optical recording layer formed of the optical recording material containing the indole compound of the present invention has an absorption maximum of reflected light at a specific wavelength (340 to 390 nm) (Example 12). In the reproduction mode of the optical recording medium represented by the optical disk, the presence or absence of recording is detected by the difference in the amount of laser wavelengths with respect to the reflected light reflected by the laser light on the optical recording medium. It is more preferable that the greater the absorption intensity is shown in the vicinity of the wavelength of the laser light. Therefore, the optical recording material of the present invention containing the indole compound of the present invention is suitable as an optical recording material used for forming an optical recording layer of an optical recording medium using 405 nm laser light such as an optical disk for short wavelength laser.
[평가예 1-1~1-5 및 비교 평가예 1-1] 상기 일반식(Ⅰ)로 표현되는 화합물의 내광성 평가Evaluation Example 1-1 to 1-5 and Comparative Evaluation Example 1-1 Evaluation of light resistance of the compound represented by the general formula (I).
실시예 7~9에서 얻어진 화합물 No.21, No.23, No.24 및 비교화합물 1에 대하여, 내광성 평가를 행하였다.Light resistance evaluation was performed about the compound No.21, No.23, No.24 which were obtained in Examples 7-9, and the comparative compound 1.
우선, 2,2,3,3-테트라플루오로프로판올에 본 발명의 화합물을 1질량%가 되도록 용해하여 2,2,3,3-테트라플루오로프로판올 용액을 조제하고, 얻어진 용액을 20×20㎜의 폴리카보네이트판상에 2000rpm, 60초간 스핀 코팅법에 의해 도포하여, 시 험편을 작성하였다. 평가는 상기 시험편에 55000럭스의 광을 조사하고, 각각 24시간, 150시간 조사한 후, 조사 전의 UV 흡수 스펙트럼의 λmax에서 흡광도 잔존율을 측정함으로써 행하였다. 또한, [표 1]에 있어서, 병용물로서는, 하기 [화학식 8]에 나타내는 디임모늄(diimmonium)화합물 또는 디티올화합물을 2,2,3,3-테트라플루오로프로판올 용액의 0.1질량%가 되도록 용해하여 이용하였다. 결과를 [표 1]에 나타낸다.First, a 2,2,3,3-tetrafluoropropanol solution was prepared by dissolving the compound of the present invention in 1,2% by mass in 2,2,3,3-tetrafluoropropanol, and the resulting solution was 20x20. The test piece was prepared by apply | coating by the spin-coating method for 2000 rpm and 60 second on the polycarbonate plate of mm. Evaluation was performed by irradiating 55,000 lux of light to the said test piece, and irradiating for 24 hours and 150 hours, respectively, and measuring the absorbance residual ratio in (lambda) max of the UV absorption spectrum before irradiation. In addition, in Table 1, as a combined substance, 0.1 mass% of the diimmonium compound or dithiol compound shown in following [Formula 8] of a 2,2,3,3- tetrafluoropropanol solution is It was dissolved and used as much as possible. The results are shown in [Table 1].
[표 1]로부터 명백하듯이, 본 발명의 상기 일반식(Ⅰ)로 표현되는 화합물은 조사 150시간 후에 있어서도 흡광도 잔존율이 높고, 디임모늄화합물 또는 디티올화합물을 병용한 경우에 있어서도, 조사 150시간 후에 있어서도 흡광도 잔존율의 저하는 보이지 않았다. 한편, 비교화합물은 조사 24시간 후에 있어서 흡광도 잔존율의 저하가 보여졌고, 또한 조사 150시간 후에 있어서 현저한 흡광도 잔존율의 저하가 보여졌다.As is apparent from Table 1, the compound represented by the general formula (I) of the present invention has a high absorbance persistence even after 150 hours of irradiation, and is also irradiated even when a diimnium compound or a dithiol compound is used in combination. Even after 150 hours, no decrease in absorbance persistence was observed. On the other hand, the comparative compound showed a decrease in absorbance persistence after 24 hours of irradiation, and a remarkable decrease in absorbance persistence after 150 hours of irradiation.
본 발명은 광학요소로서 적합한 신규 인돌화합물을 제공할 수 있다. 또한, 상기 인돌화합물을 이용한 광학필터는 화상표시 장치용 광학필터로서 적합하며, 상기 인돌화합물을 함유하여 이루어지는 광학기록 재료는 광학기록 매체의 광학기록층의 형성에 적합하다.The present invention can provide a novel indole compound suitable as an optical element. Further, the optical filter using the indole compound is suitable as an optical filter for an image display device, and the optical recording material containing the indole compound is suitable for forming the optical recording layer of the optical recording medium.
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