KR20080036382A - Plasma display panel - Google Patents

Abstract

A plasma display panel is provided to reduce defect rates by preventing contact nozzles with barrier ribs when phosphors are formed. A plasma display panel includes barrier ribs having plural discharge cells and dummy cells. The discharge cells and dummy cells have different barrier rib heights from one another. The height of the barrier ribs of the discharge cells is higher than that of the dummy cells. The height of the barrier ribs of the dummy cells is gradually decreased within a predetermined length. The predetermined length includes a first length(L1) and a second length(L2). The first length is gradually increased up to a first height with respect to the heights of the barrier ribs of the discharge cells. The second length is gradually decreased from a first height to a second height.

Description

Plasma display panel {Plasma display panel}

1 is a perspective view showing a first embodiment of a plasma display panel according to the present invention.

2 is a cross-sectional view showing a first embodiment of a partition of the plasma display panel according to the present invention.

<Explanation of symbols on main parts of the drawings>

10: upper substrate 11: scan electrode

12: sustain electrode 11a, 12a: transparent electrode

11b and 12b: metal bus electrodes 11c and 12c: second black matrix

13: upper dielectric layer 14: protective film

15: first black matrix 20: lower substrate

21: bulkhead 21a: vertical bulkhead

21b: transverse bulkhead 22: address electrode

23 phosphor layer 24 lower dielectric layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel, and more particularly, to a plasma display panel having a height of a partition wall of a plurality of discharge cells being higher than a partition wall height forming a dummy cell.

Plasma display devices are not only easy to enlarge and thin, but also have a simple structure, which makes them easy to manufacture and has a higher luminance and higher luminous efficiency than other flat panel displays.

In the conventional plasma display panel, partition walls forming a plurality of discharge cells and dummy cells are formed. Recently, a technology for adjusting the height of the photosensitive partition wall using a photo mask has been developed.

However, when the barrier rib of the plasma display panel of the present invention uses a photo mask, the barrier rib height of the dummy cell is higher than the barrier rib height of the discharge cell, which causes a problem of colliding with the nozzle when the phosphor is applied.

SUMMARY OF THE INVENTION An object of the present invention is to provide a plasma display panel in which the barrier rib height of the plurality of discharge cells is higher than the barrier rib height of the dummy cell.

The plasma display panel of the present invention includes a partition wall forming a plurality of discharge cells and a dummy cell, and the plurality of discharge cells and the dummy cell have different heights of the partition wall.

Hereinafter, a plasma display device according to the present invention will be described in detail with reference to the accompanying drawings.

 1 is a perspective view showing a first embodiment of a plasma display panel according to the present invention.

The plasma display panel shown in FIG. 1 includes a scan electrode 11, a sustain electrode 12, a sustain electrode 12, and an address electrode 22 formed on the lower substrate 20, which are pairs of sustain electrodes formed on the upper substrate 10. .

The sustain electrode pairs 11 and 12 generally include transparent electrodes 11a and 12a and bus electrodes 11b and 12b formed of indium tin oxide (ITO), and bus electrodes 11b and 12b. Silver may be formed of a metal such as silver (Ag), chromium (Cr), or a lamination of chromium / copper / chromium (Cr / Cu / Cr) or a lamination of chromium / aluminum / chromium (Cr / Al / Cr). The bus electrodes 11b and 12b are formed on the transparent electrodes 11a and 12a to serve to reduce voltage drop caused by the transparent electrodes 11a and 12a having high resistance.

Meanwhile, according to the first embodiment of the present invention, the sustain electrode pairs 11 and 12 have a structure in which the transparent electrodes 11a 12a and the bus electrodes 11b and 12b are stacked, and the bus electrodes 11b and 12b are enumerated above. In addition to one material, various materials such as photosensitive silver may be possible.

Light between the scan electrodes 11 and the sustain electrodes 12 between the transparent electrodes 11a and 12a and the bus electrodes 11b and 11c to absorb external light generated outside the upper substrate 10 to reduce reflection. A black matrix (BM, 15) is arranged that functions to block and to improve the purity and contrast of the upper substrate 10.

The black matrix 15 according to the first embodiment of the present invention is formed on the upper substrate 10. The first black matrix 15 and the transparent electrodes 11a, which are formed at positions overlapping the partition wall 21 are formed. The second black matrices 11c and 12c formed between 12a and the bus electrodes 11b and 12b may be formed. Here, the first black matrix 15 and the second black matrices 11c and 12c, also referred to as black layers or black electrode layers, may be simultaneously formed and physically connected in the formation process, or may not be simultaneously connected to each other. The first black matrix 15 may not be formed, and only the second black matrices 11c and 12c may be formed.

In addition, when physically connected and formed, the first black matrix 15 and the second black matrix 11c and 12c may be formed of the same material, but may be formed of different materials when they are formed separately.

Here, the bus electrodes 11b and 12b are stacked with the stacked second black matrices 11c and 12c and the transparent electrodes 11a and 12a. In other words, the bus electrodes 11b and 12b are stacked at predetermined distances from one edges of the second black matrices 11c and 12c and stacked with the transparent electrodes 11a and 12a by the predetermined distance.

Accordingly, the bus electrodes 11b and 12b are integrally formed because the bus electrodes 11b and 12b are spaced apart by the predetermined distance from one edges of the second black matrices 11c and 12c.

The upper dielectric layer 13 and the passivation layer 14 are stacked on the upper substrate 10 having the scan electrode 11 and the sustain electrode 12 side by side. Charged particles generated by the discharge are accumulated in the upper dielectric layer 13, and the protective electrode pairs 11 and 12 may be protected. The protective film 14 protects the upper dielectric layer 13 from sputtering of charged particles generated during gas discharge, and increases emission efficiency of secondary electrons. In addition, magnesium oxide (MgO) may be generally used for the protective film 14, and Si-MgO to which silicon (Si) is added may be used. Here, the content of silicon (Si) added to the protective film 14 may be 50PPM to 200PPM based on the weight percent (wt%).

On the other hand, the address electrode 22 is formed in the direction crossing the scan electrode 11 and the sustain electrode 12. In addition, a lower dielectric layer 24 and a partition wall 21 are formed on the lower substrate 20 on which the address electrode 22 is formed.

In addition, the phosphor layer 23 is formed on the surfaces of the lower dielectric layer 24 and the partition wall 21. The partition wall 21 has a vertical partition wall 21a and a horizontal partition wall 21b formed in a closed shape, and physically distinguishes discharge cells, and prevents ultraviolet rays and visible light generated by the discharge from leaking into adjacent discharge cells.

In the first embodiment of the present invention, not only the structure of the partition wall 21 illustrated in FIG. 1, but also the structure of the partition wall 21 having various shapes may be possible. For example, a channel type having a channel that can be used as an exhaust passage in at least one of a differential partition structure, a vertical partition 21a, or a horizontal partition 21b having different heights of the vertical partition 21a and the horizontal partition 21b. The barrier rib structure having a groove formed in at least one of the barrier rib structure, the vertical barrier rib 21a or the horizontal barrier rib 21b may be possible.

Here, in the case of the differential partition wall structure, the height of the horizontal partition wall 21b is more preferable, and in the case of the channel partition wall structure or the groove partition wall structure, it is preferable that a channel is formed or the groove is formed in the horizontal partition wall 21b. something to do.

On the other hand, in the first embodiment of the present invention is shown and described that each of the R, G and B discharge cells are arranged on the same line, it may be arranged in a different shape. For example, a Delta type arrangement in which R, G, and B discharge cells are arranged in a triangular shape may be possible. In addition, the shape of the discharge cell may be not only rectangular, but also various polygonal shapes such as a pentagon and a hexagon.

In addition, the phosphor layer 23 emits light by ultraviolet rays generated during gas discharge to generate visible light of any one of red (R), green (G), and blue (B). Here, an inert mixed gas such as He + Xe, Ne + Xe and He + Ne + Xe for discharging is injected into the discharge space provided between the upper / lower substrates 10 and 20 and the partition wall 21.

2 is a cross-sectional view showing a first embodiment of a partition of the plasma display panel according to the present invention.

Referring to FIG. 2, the partition wall 21 of the plasma display panel according to the present invention is formed of a first region A in which discharge cells are formed and a second region B in which dummy cells are formed.

The first region A is formed to have a height of 112 μm or less at the same height as the barrier rib height H1 of the lower substrate 20, and the height of the barrier rib 21 of the lower substrate 20 is equal to the first region A. FIG. The first predetermined area B1 having the height of the partition wall 21 gradually higher than the first area A and the second predetermined area B2 gradually lowering at the height of the partition wall 21 of the first predetermined area B1. do.

Here, the height H1 of the partition wall of the first region A has been described as 112 μm or less, but the present invention is not limited thereto. The height of the partition wall 21 of the discharge cell may be higher or lower depending on the manufacturing process and shape.

In addition, the second region B in which the dummy cell is formed may include the first predetermined region B1 gradually increasing within the first predetermined length L1 at the partition height H1 of the first region A, and The second predetermined area B2 gradually decreases within the second predetermined length L2 at the height of the partition wall 21 of the first predetermined area B1.

Here, the first predetermined area B1 gradually increases from the partition height H1 of the first area A by the first height H2 during the first predetermined length L1.

That is, the first height H2 is preferably 1 μm to 8 μm or more, that is, 113 μm to 120 μm than the barrier height H1 of the first region A. When the phosphor is applied to the barrier wall 21, the first height H2 is not rubbed with the nozzle. This is to form a uniform surface when bonding with the upper substrate 10.

In addition, the first predetermined length L1 is a distance from the end of the discharge cell to the height of the partition wall 21 gradually increasing to the first height H2, preferably 1.5 mm to 2.5 mm, and the dummy cell This area can be reduced.

The second predetermined area B2 is gradually lowered from the maximum first height H2 of the first predetermined area B1 to the second height H3 during the second predetermined length L2.

At this time, the second height (H3) is gradually lowered by about 10um to 60um in the first height (H2) is preferably 60um to 110um, it is possible to prevent the noise caused by the non-uniformity of the partition wall height of the dummy cell area.

In addition, the second predetermined length L2 is a length from an end of the dummy cell region to an end of the first predetermined region B1, and preferably 1.5 mm to 1.8 mm.

That is, the first and second predetermined areas B1 and B2 of the dummy cell are lengths formed within the maximum range of the non-display area among the display area where the image is displayed and the non-display area where the image is not displayed. , The second heights H2 and H3 and the first and second predetermined lengths L1 and L2 may decrease and increase according to the ratio of the length and height of the partition wall 21 of the discharge cell.

Therefore, the first and second predetermined regions B1 and B2 of the dummy cell are not contacted with the nozzle when the phosphor is applied based on the first and second heights H2 and H3, so that the partition wall is damaged and the upper substrate 10 is bonded. In this case, the adhesive surface becomes uniform and noise may be reduced.

Here, the area of the dummy cell is divided into first and second predetermined areas B1 and B2, but the first predetermined area gradually rises from the partition height H1 of the discharge cell area to become the first height H2. (B1) is not formed and can be formed only in the second predetermined region B2, wherein the second predetermined region B2 is gradually increased from the partition height H1 of the discharge cell region to the second height H3. It can be lowered and formed.

Although a preferred embodiment of the present invention has been described in detail above, those skilled in the art to which the present invention pertains can make various changes without departing from the spirit and scope of the invention as defined in the appended claims. It will be appreciated that modifications or variations may be made. Accordingly, modifications to future embodiments of the present invention will not depart from the technology of the present invention.

Plasma display panel according to the present invention is different from the height of the partition wall constituting the discharge cell and the height of the partition wall constituting the dummy cell, it is not in contact with the nozzle during the coating of the phosphor, the damage caused by the contact and the adhesive surface is uniform, the plasma display There is an effect of reducing the noise of the panel, process yield and defective rate in the manufacturing process.

Claims (8)

In the plasma display panel comprising a plurality of discharge cells and the partition wall forming a dummy cell, And the plurality of discharge cells and the dummy cells have different heights of the barrier ribs. The method of claim 1, And a height of the barrier rib forming the discharge cell is higher than a height of the barrier rib forming the dummy cell. The method of claim 1, wherein the dummy cell, And a height of the barrier rib gradually decreases within a predetermined length. The method of claim 3, wherein the predetermined length is, A first predetermined length gradually increasing from a height of the barrier rib of the discharge cell to a first height; And a second predetermined length gradually lowering from the first height to the second height. The method of claim 4, wherein the first predetermined length, The plasma display panel is 1.5mm to 2.5mm from the point separated by the second predetermined length. The method of claim 4, wherein the second predetermined length, Plasma display panel is 1.5mm to 1.8mm at the end of the partition wall. The method of claim 4, wherein the first height is, Plasma display panel of 113um to 120um. The method of claim 4, wherein the second height is, 60um to 110um plasma display panel.

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