KR20080033808A - A composition for preparing an electron emission source, an electron emission source prepared from the composition, an electron emission device comprising the electron emission source and an electron emission display device comprising the electron emission source - Google Patents

Abstract

A composition for an electron emission source, the electron emission source, an electron emission device, and an electron emission display device are provided to generate a fine pattern on the electron emission source by improving a coupling property between a substrate and a photo-sensitive resin. An electron emission display device includes an electron emission device(101), a front panel(102), and a spacer(60). The electron emission device and the front panel form a discharge space. The spacer maintains a distance between the electron emission device and the front panel. The electron emission device includes a first electrode(110), gate and cathode electrodes(120), and an insulation layer(130). The gate and cathode electrodes are arranged to cross each other on the first substrate. The insulation layer is arranged between the cathode electrodes, such that the gate electrode is electrically insulated from the cathode electrode. An electron emission source hole is formed at intersections between the gate and cathode electrodes. The front panel includes a second substrate(90), an anode electrode(80), and a fluorescent layer. The anode electrode is arranged under the second substrate. The fluorescent layer is formed under the anode electrode.

Description

A composition for forming an electron emission source, an electron emission source manufactured therefrom, an electron emission device having the electron emission source, and an electron emission display device having the electron emission source source prepared from the composition, an electron emission device comprising the electron emission source and an electron emission display device comprising the electron emission source}

1 is a perspective view schematically showing the configuration of an electron emission device and an electron emission display device according to the present invention;

FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 1.

<Short description of drawing symbols>

60: spacer 70: phosphor layer

80: anode electrode 90: second substrate

100: electron emission display device

101: electron emission device

102: front panel 103: light emitting space

110: first substrate 120: cathode electrode

130: first insulator layer 131: electron emission source hole

140: gate electrode 150: electron emission source

The present invention relates to a composition for forming an electron emission source, an electron emission source prepared therefrom, an electron emission device having the electron emission source, and an electron emission display device having the electron emission source. A composition for forming an electron emission source having improved developability and adhesion to a substrate, including a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin and an acrylate compound derived from An electron emission device provided with the electron emission source and an electron emission display device provided with the electron emission source. By using the composition for forming an electron emission source, an electron emission source having an excellent current density while having a precise fine pattern can be obtained.

In general, an electron emission device includes a method using a hot cathode and a cold cathode as an electron emission source. Examples of electron-emitting devices using a cold cathode include field emitter array (FEA), surface conduction emitter (SCE) type, metal insulator metal (MIM) type, metal insulator semiconductor (MIS) type, and ballistic electron surface emitting (BSE) type. ) And the like are known.

The FEA type uses the principle that electrons are easily released due to electric field difference in vacuum when a material having a low work function or a high β function is used as an electron emission source. Molybdenum (Mo) and silicon A tip structure with a major material such as (Si), a carbon-based material such as graphite, DLC (Diamond Like Carbon), and a recent nano tube or nano wire, etc. Devices have been developed that use nanomaterials as electron emission sources.

The SCE type is a device in which an electron emission source is formed by providing a conductive thin film between a first electrode and a second electrode disposed to face each other on a first substrate and providing a micro crack in the conductive thin film. The device uses a principle that electrons are emitted from an electron emission source that is a micro crack by applying a voltage to the electrodes to flow a current to the surface of the conductive thin film.

The MIM type and the MIS type electron emission devices each form an electron emission source having a metal-dielectric layer-metal (MIM) and metal-dielectric layer-semiconductor (MIS) structure, and are disposed between two metals or metals with a dielectric layer interposed therebetween. When a voltage is applied between semiconductors, a device using the principle of emitting electrons is moved and accelerated from a metal or semiconductor having a high electron potential toward a metal having a low electron potential.

The BSE type uses the principle that electrons travel without scattering when the size of the semiconductor is reduced to a dimension area smaller than the average free stroke of the electrons in the semiconductor, thereby forming an electron supply layer made of a metal or a semiconductor on an ohmic electrode. And an insulator layer and a metal thin film formed on the electron supply layer to emit electrons by applying power to the ohmic electrode and the metal thin film.

Among these, the FEA type electron emission device can be classified into a top gate type and an under gate type according to the arrangement of the cathode electrode and the gate electrode. It can be divided into a pole tube, a triode or a quadrupole.

Among the electron emission devices as described above, as the electron emission material included in the electron emission source, a carbon-based material, for example, carbon nanotubes may be used. The carbon nanotubes are expected to be an ideal electron emission source of an electron emission device because they have excellent conductivity and electric field concentration effect, low work function, excellent field emission characteristics, low voltage driving, and large area.

The method for producing an electron emission source containing carbon nanotubes includes, for example, a carbon nanotube growth method using a CVD method or the like, a paste method using an electron emission source formation composition containing carbon nanotubes and a vehicle. By using the above paste method, the manufacturing cost is low and the electron emission source can be formed in a large area. Compositions for forming electron emission sources, including carbon nanotubes, are described, for example, in US Pat. No. 6,436,221.

However, when the electron emission source is manufactured using the electron emission source formation composition prepared according to the conventional paste method, it is easy to remove the electron emission source formation composition from the photoresist layer defining the electron emission source formation region. Therefore, development using an alkaline developer is not easy, and adhesion to the substrate is poor, and thus an electron emission source having a satisfactory level of precise pattern cannot be formed. Therefore, improvement thereof is required.

The present invention solves the problems of the prior art as described above, an electron emission source forming composition capable of forming an electron emission source having a high current density while having a finer fine pattern, an electron emission source prepared therefrom, An object of the present invention is to provide an electron emission device having the electron emission source and an electron emission display device having the electron emission source.

In order to achieve the above object of the present invention, a first aspect of the present invention, a carbon-based material; Vehicle; And a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin and an acrylate compound derived from bisphenol A.

In order to achieve the above another object of the present invention, the second aspect of the present invention provides an electron emission source prepared from the composition for forming an electron emission source as described above.

In order to achieve another object of the present invention, a third aspect of the present invention provides an electron emission device having an electron emission source manufactured from the composition for forming an electron emission source as described above.

In order to achieve another object of the present invention, a fourth aspect of the present invention provides an electron emission display device having an electron emission source manufactured from the composition for forming an electron emission source as described above.

The composition for forming an electron emission source according to the present invention includes an epoxy resin derived from bisphenol A and a photosensitive resin obtained from an epoxy ring-opening reaction of an acrylate-based compound. Adhesion is improved to obtain an electron emission source having a more precise pattern and excellent current density.

Hereinafter, the present invention will be described in more detail.

First, the composition for forming an electron emission source according to the present invention includes a carbon-based material. The carbon-based material has excellent conductivity and electron emission characteristics, thereby releasing electrons to the phosphor layer when the electron emission device is operated to excite the phosphor. Non-limiting examples of such carbon-based materials include carbon nanotubes, graphite, diamond, fullerenes, silicon carbide (SiC), and the like. Among these, carbon nanotubes are preferable.

Carbon nanotubes are carbon allotropes in which graphite sheets are rounded to a nano-sized diameter to form tubes. have. The carbon nanotubes of the present invention are manufactured using a CVD method such as thermal chemical vapor deposition (hereinafter referred to as "CVD method"), DC plasma CVD method, RF plasma CVD method, microwave plasma CVD method. It may have been.

In addition, the composition for forming an electron emission source includes a vehicle. The vehicle included in the composition for forming an electron emission source serves to control the flowability and viscosity of the composition for forming an electron emission source. The vehicle may include a resin component and a solvent component.

The resin component may be, for example, a cellulose resin such as ethyl cellulose, nitro cellulose or the like; Acrylic resins such as polyester acrylate and urethane acrylate; At least one of a vinyl-based resin such as polyvinyl acetate, polyvinyl butyral, polyvinyl ether, and the like may be included, but is not limited thereto. At least some of the resin components may also serve as photosensitive resins described below.

The solvent component is, for example, at least one of terpineol, butyl carbitol (BC), butyl carbitol acetate (BCA), toluene and texanol It may include. Among these, it is preferable to contain terpineol.

The content of the resin component may be 100 to 2000 parts by weight, more preferably 200 to 1500 parts by weight based on 100 parts by weight of the carbon-based material. On the other hand, the content of the solvent component may be 500 to 1500 parts by weight, preferably 800 to 1200 parts by weight based on 100 parts by weight of the carbon-based material. When the content of the vehicle consisting of the resin component and the solvent component is outside the above range may cause a problem that the flowability and viscosity of the composition for forming an electron emission source is lowered. In particular, when the content of the vehicle exceeds the above range, there is a problem that the drying time may be too long.

On the other hand, the composition for forming an electron emission source according to the present invention includes a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin derived from bisphenol A and an acrylate compound. The photosensitive resin serves to form an electron emission pattern through crosslinking or the like during exposure.

Typically, the main component of the photoresist layer defining the electron emission source formation region is a novolak resin or a resol resin, and the adhesion between the electron emission source formation composition and the photoresist layer must be low so as to prevent electrons from being developed. The uncured portion of the source composition can be effectively removed from the photoresist layer. The composition for forming an electron emission source according to the present invention includes an epoxy resin derived from bisphenol A and a photosensitive resin obtained from an epoxy ring-opening reaction of an acrylate compound, comprising: a photoresist layer defining an electron emission source formation region; Low adhesive strength of can be developed effectively.

On the other hand, the cured portion of the composition for forming an electron emission source must have excellent adhesion to the substrate so that it may not be detached from the substrate during development, and furthermore, during the activation process. In the composition for forming an electron emission source according to the present invention, a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin derived from bisphenol A and an acrylate compound may include a hydrophilic group (for example, a carboxyl group) and a hydrophobic group (for example, For example, the hardening part of such a composition for electron emission source formation is excellent in the adhesive force with a board | substrate, including all hydrocarbon groups etc.).

Therefore, the composition for forming an electron emission source according to the present invention has excellent developability and adhesion to the substrate, and thus can effectively form a more precise and accurate electron emission pattern.

In the photosensitive resin obtained from the epoxy ring-opening reaction of the epoxy resin and the acrylate compound derived from bisphenol A, the epoxy resin derived from bisphenol A is synthesized using bisphenol A as a starting material, and at least one epoxy group The epoxy resin which has is pointed out. More specifically, the epoxy resin derived from bisphenol A may have the following Chemical Formula 1, but is not limited thereto.

<Formula 1>

In Formula 1, n is 0 and an integer of 1 to 100.

On the other hand, in the photosensitive resin obtained from the epoxy ring-opening reaction of the epoxy resin derived from the bisphenol A and the acrylate compound, the acrylate compound is an epoxy ring-opened epoxy resin derived from bisphenol A as described above. It will not restrict | limit especially if it is a well-known acrylate compound which can react.

For example, the acrylate compound may be methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, sec-butyl acrylate, iso-butyl acrylate, tert-butyl Acrylate, cyclohexyl acrylate, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxy triethylene glycol acrylate, glycerol acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, isobor Nyl acrylate, 2-hydroxypropyl acrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, n-decyl methacrylate, n-hexadecyl methacrylate, and one or more of these It can be selected from the group consisting of a polymer having a monomer (including two or more of them as a copolymer having a monomer). I, and the like.

The photosensitive resin may include a unit represented by the following Chemical Formula 2 derived from bisphenol A, and may include a terminal group represented by the following Chemical Formula 3 derived from an acrylate compound.

<Formula 2>

<Formula 3>

In Formula 3, A may be a substituted or unsubstituted C ₁ -C ₂₀ alkylene group, preferably a substituted or unsubstituted C ₁ -C ₂₀ alkylene group.

In Formula 3, R ₁ , R ₂ , and R ₃ are each independently hydrogen, a substituted or unsubstituted C ₁ -C ₂₀ alkyl group, a substituted or unsubstituted C ₁ -C ₂₀ alkoxy group, or a substituted or unsubstituted group. It may be a C ₆ -C ₃₀ aryl group.

The alkyl group, alkoxy group, aryl group may be unsubstituted or substituted, and when substituted, the substituent may be a hydroxyl group, an amino group, a carboxyl group, a cyano group or a C ₁ -C ₂₀ alkyl group.

Formulas (2) and (3) can be easily recognized by those skilled in the art who understand the chemical formulas of bisphenol A and acrylate compounds.

The photosensitive resin may have a weight average molecular weight of 5000 to 200000, preferably a weight average molecular weight of 8000 to 12000. When the weight average molecular weight of the photosensitive resin is less than 5000, crosslinking may not be sufficiently formed at the time of exposure, and thus an electron emission pattern may not be effectively formed. When the weight average molecular weight of the photosensitive resin exceeds 200000, an electron emission source is formed. The flowability and viscosity of the composition for degradation may be reduced, making it difficult to print on the substrate, and it may be difficult to effectively form an electron emission source pattern due to a decrease in resolution.

The content of the photosensitive resin may be 500 parts by weight to 2000 parts by weight, preferably 800 parts by weight to 1600 parts by weight, based on 100 parts by weight of the carbon-based material. When the content of the photosensitive resin is less than 500 parts by weight based on 100 parts by weight of the carbon-based material, the exposure sensitivity is lowered, and when the content exceeds 2000 parts by weight based on 100 parts by weight of the carbon-based material, development is not preferable.

On the other hand, in addition to the photosensitive resin described above, a benzophenone monomer, an acetophenone monomer (for example, 2,2-dimethoxy-2-phenylacetophenone), a thioxanthone monomer (for example, 2, It may optionally further comprise a photosensitive resin such as 4-diethyloxanthone (2,4-diethyloxanthone).

In addition, the composition for forming an electron emission source according to the present invention may further include a photoinitiator, a filler, and the like.

The photoinitiator serves to initiate crosslinking of the photosensitive resin when the photosensitive resin is exposed, and may be selected from known materials. For example, benzophenone, methyl o-benzoyl benzoate, 4, 4-bis (dimethylamine) benzophenone, 4, 4-bis (diethylamino) benzophenone, 4, 4- dichloro benzophenone, 4-benzoyl- 4-methyldiphenylketone, dibenzylketone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, thioxanthone, 2 Methyl thioxanthone, 2-chloro thioxanthone, 2-isopropyl thioxanthone, diethyl thioxanthone, benzyl dimethyl ketanol, benzyl methoxy ethyl acetal, etc. may be used, but is not limited thereto.

The content of the photoinitiator may be 300 to 1000 parts by weight, preferably 500 to 800 parts by weight based on 100 parts by weight of the carbon-based material. When the content of the photoinitiator is less than 300 parts by weight based on 100 parts by weight of the carbon-based material, efficient crosslinking may not occur, which may cause a problem in pattern formation. This may cause a rise.

The filler is a material that serves to improve conductivity of the carbon-based material that is not sufficiently adhered to the substrate, and non-limiting examples thereof include Ag, Al, Pd, and the like.

The composition for forming an electron emission source of the present invention comprising a material as described above may have a viscosity of 3,000 to 50,000 cps, preferably 5,000 to 30,000 cps. If it is out of the viscosity range, a problem may arise that the workability is poor.

As described above, when the composition for forming an electron emission source according to the present invention is used, developability and adhesion to the substrate are improved, and thus an electron emission source having a precise pattern can be obtained. An electron emitter according to the present invention comprises the steps of providing a composition for forming an electron emitter as described above; Providing the composition for forming an electron emission source to a substrate according to an electron emission pattern; And heat treating the composition for forming an electron emission source provided on the substrate.

First, a composition for forming an electron emission source as described above is prepared. Component and component content ratio of the composition for forming an electron emission source refer to the foregoing.

Thereafter, the provided composition for forming an electron emission source is provided to the substrate according to the electron emission source pattern. The "substrate" is a substrate on which an electron emission source is to be formed, which may be different depending on the electron emission element to be formed, which is easily recognized by those skilled in the art. For example, the "substrate" may be a cathode when manufacturing an electron emission device having a gate electrode provided between a cathode electrode and an anode electrode.

Providing the composition for forming an electron emission source according to the electron emission pattern may include, for example, forming a photoresist layer along the electron emission pattern on the substrate using a conventional photolithography method, and then forming an electron emission source. After printing the composition for exposure, it exposes and forms an unhardened part and a hardened part. Thereafter, by removing the uncured portion and the photoresist layer, a composition for forming an electron emission source is provided on the substrate according to the electron emission pattern. Removal of the uncured portion and the photoresist pattern is performed by TMAH (tetra methyl ammonium hydroxide), Na ₂ CO ₃ , NaHCO ₃ , K ₂ CO ₃ , K ₂ HCO ₃ , (NH ₄ ) ₂ CO ₃ , (NH ₄ ) HCO ₃ After developing the uncured portion with an alkaline developer such as the above, a two-stage developing process is possible in which the photoresist layer is removed with an organic solvent such as ketones or alcohols (for example, acetone).

At this time, the composition for forming an electron emission source according to the present invention has a low adhesive strength with the photoresist layer, and may exhibit excellent developability. In addition, the adhesion with the substrate is high, so that an electron emission source having a precise pattern can be formed while minimizing the defect rate.

As described above, the composition for forming an electron emission source provided on the substrate according to the electron emission pattern is subjected to a heat treatment step. Through the heat treatment step, the carbon-based material in the composition for forming an electron emission source may improve adhesion to the substrate, at least some vehicles may be volatilized, and other inorganic binders may be melted and solidified to contribute to improving durability of the electron emission source. Will be. The heat treatment temperature should be determined in consideration of the volatilization temperature and time of the vehicle included in the composition for forming an electron emission source. Typical heat treatment temperatures are 400 ° C to 500 ° C, preferably 450 ° C. This is because if the heat treatment temperature is less than 400 ° C., there is a problem that volatilization such as a vehicle is not sufficiently performed. If the heat treatment temperature exceeds 500 ° C., a manufacturing cost may increase and a substrate may be damaged. .

The heat treatment step may be performed in the presence of an inert gas to prevent degradation of the carbon-based material. The inert gas may be, for example, nitrogen gas, argon gas, neon gas, xenon gas, and a mixed gas of two or more thereof.

The heat treated resultant surface is optionally subjected to an activation step for vertical alignment, surface exposure, etc. of the carbon-based material. According to one embodiment of the activation step, after applying a solution that can be cured in the form of a film through a heat treatment process, for example, an electron emission source surface treatment agent containing a polyimide-based polymer on the firing result, and then heat treatment Then, the film formed by the heat treatment is peeled off. According to another embodiment of the activation step, the activation process may be performed by forming an adhesive part having an adhesive force on the surface of the roller driven by a predetermined driving source and pressing the surface of the firing product at a predetermined pressure. Through this activation step, the carbonaceous material may be controlled to be exposed to the electron emission surface or vertically aligned.

The electron emission device according to the present invention includes an electron emission source manufactured from the composition for forming an electron emission source as described above, and more specifically, a substrate, a plurality of cathode electrodes disposed on the substrate, and the cathode. A plurality of gate electrodes disposed to intersect the electrodes, an insulator layer disposed between the cathode electrode and the gate electrode to insulate the cathode electrodes and the gate electrodes, and the cathode electrode and the gate electrode intersect with each other. And an electron emission source hole formed at a point to which the electron emission source hole is disposed.

The electron emission device may further include a second insulator layer covering an upper side of the gate electrode. In addition, various modifications are possible, such that the second insulator layer may further include a focusing electrode insulated from the gate electrode and arranged in parallel with the gate electrode.

The electron emission device may be used in various electronic devices, for example, a backlight unit such as an LCD (Liquid Crystal Display), or may be used in an electron emission display device.

Among these, an electron emission display device according to the present invention includes a first substrate, a plurality of cathode electrodes disposed on the first substrate, a plurality of gate electrodes disposed to intersect the cathode electrodes, and the cathode electrode. An insulator layer disposed between the gate electrode and the gate electrode to insulate the cathode electrodes from the gate electrodes, an electron emission hole formed at an intersection point of the cathode electrode and the gate electrode, and in the electron emission source hole. An electron emission source may be disposed, a second substrate disposed substantially parallel to the first substrate, and an anode electrode disposed on the second substrate.

FIG. 1 is a partial perspective view showing a schematic configuration of a top gate type electron emission display device of the electron emission display device according to the present invention, and FIG. 2 is a cross-sectional view taken along the line II-II of FIG. have.

As shown in FIGS. 1 and 2, the electron emission display apparatus 100 includes an electron emission element 101 and a front panel 102 arranged side by side to form a light emitting space 103 that is a vacuum, and the electron emission. A spacer 60 is provided to maintain a gap between the device 101 and the front panel 102.

The electron emission device 101 may include a first substrate 110, gate electrodes 140, cathode electrodes 120, and the gate electrodes 140 arranged to intersect on the first substrate 110. The insulating layer 130 is disposed between the cathode electrode 120 and electrically insulates the gate electrode 140 from the cathode electrode 120.

Electron emission holes 131 are formed in regions where the gate electrodes 140 and the cathode electrode 120 cross each other, and an electron emission source 150 is disposed therein.

The front panel 102 includes a second substrate 90, an anode electrode 80 disposed on the bottom surface of the second substrate 90, and a phosphor layer 70 disposed on the bottom surface of the anode electrode 80. do.

Although the electron emission display device according to the present invention has been described with reference to FIGS. 1 and 2, various modifications such as an electron emission display device further including a second insulator layer and / or a focusing electrode are possible.

Hereinafter, preferred examples and comparative examples of the present invention are described. The following examples are only described for the purpose of more clearly expressing the present invention, and the content of the present invention is not limited to the following examples.

EXAMPLE

Example

First, 10 g of terpineol, 1 g of carbon nanotube powder (manufactured by CNI), 0.2 g of glass frit (8000 L, manufactured by Emerging Industries), and polyester acrylate (middle average molecular weight 32000, manufactured by Miwon Co., Ltd. 15g, 15 g of epoxy acrylate (made by Miwon Co., Ltd., trade name PE320, weight average molecular weight is 8000), 5 g of benzophenone, and then stirred Thus, a composition for forming an electron emission source having a viscosity of 30,000 cps was prepared. This is called Composition 1.

Comparative example

Formation of an electron emission source using the same method as the composition for forming an electron emission source of the above embodiment except that polyester acrylate (manufactured by Sartomer, trade name is CN294) was used instead of epoxy acrylate as the photosensitive resin. A composition for preparation was prepared. This is called Composition A.

Evaluation example

After preparing a substrate having a Cr gate electrode, an insulator layer, and an ITO electrode, a photoresist layer was formed according to the electron emission source forming region by using a conventional photolithography method, and then the composition 1 obtained from the preparation example was printed. It was. Thereafter, irradiation was performed using a parallel exposure machine at an exposure energy of 2000 mJ / cm ² to form a hardened portion and an uncured portion. Thereafter, a micrograph immediately after removing the uncured portion of Composition 1 with 0.25 wt% TMAH solution, see FIG. 3. It can be seen from FIG. 3 that substantially all of the uncured portion of Composition 1 is removed over the photoresist layer. The uncured portion of the composition for electron emission source formation was removed.

The experiment as described above was repeated using Composition A instead of Composition 1. See micrograph 4 immediately after removing the uncured portion of composition A. From FIG. 4, it can be seen that the uncured portion of composition A still remains on top of the photoresist layer.

Therefore, it was confirmed that the composition for forming an electron emission source according to the present invention has excellent developability as compared with the conventional composition for forming an electron emission source.

Example

After preparing a substrate having a Cr gate electrode, an insulator layer, and an ITO electrode, a photoresist layer was formed according to the electron emission source forming region by using a conventional photolithography method, and then the composition 1 obtained from the preparation example was printed. It was. Thereafter, irradiation was performed using a parallel exposure machine at an exposure energy of 2000 mJ / cm ² to form a hardened portion and an uncured portion. Thereafter, the uncured portion of the composition for forming an electron emission source was removed with a 0.25 wt% TMAH solution, and then the photoresist layer was also removed with acetone. The resulting product was heat-treated in the presence of a temperature of 450 ° C. and nitrogen gas to form an electron emission source. As a result of observing the electron emission source, it was confirmed that it has a precise pattern and excellent adhesion to the substrate.

The composition for forming an electron emission source of the present invention includes a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin derived from bisphenol A and an acrylate compound, in addition to a carbonaceous material and a vehicle, The adhesion of can be improved. Therefore, the electron emission source prepared from the composition for forming an electron emission source according to the present invention may have a precise pattern.

Although the above has been described with reference to preferred embodiments of the present invention, those skilled in the art will variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. I can understand that you can.

Claims (12)

Carbon-based materials; Vehicle; And a photosensitive resin obtained from an epoxy ring-opening reaction of an epoxy resin and an acrylate compound derived from bisphenol A. The method of claim 1, Composition for forming an electron emission source, characterized in that the epoxy resin derived from bisphenol A has the following general formula (1): <Formula 1>

In Formula 1, n is 0 and an integer of 1 to 100. The method of claim 1, The acrylate compound may be methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, sec-butyl acrylate, iso-butyl acrylate, tert-butyl acrylate, cyclo Hexyl acrylate, allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxy triethylene glycol acrylate, glycerol acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, isobornyl acrylate , 2-hydroxypropyl acrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, n-decyl methacrylate, n-hexadecyl methacrylate, and one or more of these as monomers Composition for forming an electron emission source, characterized in that selected from the group consisting of one polymer. The method of claim 1, The photosensitive resin includes a unit represented by the following formula (2) derived from bisphenol A, and comprises a terminal group represented by the following formula (3) derived from an acrylate compound: <Formula 2>

<Formula 3>

In Formula 3, A is a substituted or unsubstituted C ₁ -C ₂₀ alkylene group, R ₁ , R ₂ , and R ₃ independently of one another are hydrogen, a substituted or unsubstituted C ₁ -C ₂₀ alkyl group, a substituted or unsubstituted C ₁ -C ₂₀ alkoxy group or a substituted or unsubstituted C ₆ -C ₃₀ aryl group. The method of claim 1, The composition for electron emission source formation, wherein the photosensitive resin has a weight average molecular weight of 5000 to 200000. The method of claim 1, The composition for forming an electron emission source, characterized in that the content of the photosensitive resin is 500 to 2000 parts by weight per 100 parts by weight of the carbon-based material. An electron emission source prepared from the composition for forming an electron emission source of any one of claims 1 to 6. An electron emission device having an electron emission source prepared from the composition for electron emission source formation according to any one of claims 1 to 6. The method of claim 8, The electron emitting device, Board; A plurality of cathode electrodes disposed on the substrate; A plurality of gate electrodes disposed to intersect the cathode electrodes; An insulator layer disposed between the cathode electrode and the gate electrode to insulate the cathode electrodes from the gate electrodes; An electron emission source hole formed at a point where the cathode electrode and the gate electrode cross each other; And An electron emission source disposed in the electron emission hole; Electron emitting device comprising a. The method of claim 9, And a second insulator layer covering the upper side of the gate electrode, and a focusing electrode insulated from the gate electrode by the second insulator layer, and arranged in a direction parallel to the gate electrode. An electron emission display device comprising an electron emission source manufactured from the composition for electron emission source formation according to any one of claims 1 to 6. The method of claim 11, A first substrate; A plurality of cathode electrodes disposed on the first substrate; A plurality of gate electrodes disposed to intersect the cathode electrodes; An insulator layer disposed between the cathode electrode and the gate electrode to insulate the cathode electrodes from the gate electrodes; An electron emission source hole formed at a point where the cathode electrode and the gate electrode cross each other; An electron emission source disposed in the electron emission hole; And A second substrate disposed substantially parallel to the first substrate; An anode disposed on the second substrate; And And a phosphor layer disposed on the anode electrode.

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