KR20070040564A - Cleaning device used for fabricating liquid crystal display device and cleaning method - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus and a cleaning method for manufacturing a liquid crystal display device, and includes a chamber or a container on which a substrate is mounted, and provides a cleaning apparatus and a cleaning method capable of removing sludge from the substrate using an acid cleaning liquid. As described above, the present invention can remove the sludge adsorbed on the surface of the substrate by cleaning the substrate using an acid cleaning liquid, and effectively removes the sludge remaining in the recessed region between the upper glass substrate and the lower glass substrate.

Cleaning, acid cleaning liquid, liquid crystal display, panel, sludge, spraying, chamber, container

Description

Cleaning device used for fabricating liquid crystal display device and cleaning method

1 is a cross-sectional conceptual view for explaining a problem of a conventional cleaning process.

2 is a flowchart for explaining a method of manufacturing a liquid crystal display panel according to the present invention.

3 is a conceptual diagram for explaining the cleaning equipment according to an embodiment of the present invention.

4 to 7 are views for explaining modifications of the substrate cleaning unit according to the present embodiment.

<Explanation of symbols for the main parts of the drawings>

100 substrate cleaning part 200 cleaning liquid tank part

300: measuring unit 400: cleaning liquid supply unit

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus and a cleaning method for manufacturing a liquid crystal display device, and more particularly, to an acid cleaning apparatus and a cleaning method for removing sludge generated after glass etching.

Liquid crystal display devices (LCDs) have advantages of small size, light weight, and large screen compared with conventional display devices, such as cathode ray tubes (CRTs), and their development has been actively performed. In particular, the liquid crystal display device has been developed enough to perform a role as a flat panel display device and is widely used as a display device of a portable information device such as a liquid crystal of a mobile phone, a PDA, a digital camera, a camcorder or a notebook computer.

In order to enhance the portability of such portable information devices, the weight reduction of information devices has been continuously studied. In one aspect, many studies are being conducted to reduce the weight of the glass substrate, which is a basic element of the liquid crystal display. Since the glass substrate has the largest weight among the elements constituting the liquid crystal display device, it is preferable to reduce the weight of the liquid crystal display device by reducing the weight of the glass substrate.

Recently, liquid crystal display devices have become larger, and there is a limit to reducing the size of the substrate to reduce the weight. Therefore, a method of reducing the weight of the substrate by reducing the thickness of the substrate has been studied.

However, as the thickness of the glass becomes thinner, the glass is easily broken, and if the glass surface is not smoothed during the processing of the glass, there is a problem in that the image quality of the liquid crystal display device is defective.

Currently, the most widely used method to reduce the weight by reducing the thickness of the glass substrate is to immerse the glass substrate in a container filled with an etchant to etch the surface of the glass substrate using the etchant.

However, the above method has a problem that the sludge generated in the substrate etching process is adsorbed on the substrate. Therefore, conventionally, the sludge adsorbed on the substrate is removed through a cleaning process in which high pressure pure water (DIW) is injected.

1 is a cross-sectional conceptual view for explaining a problem of a conventional cleaning process.

FIG. 1 removes sludge adsorbed on the upper glass substrate and the lower glass substrate of the liquid crystal panel by spraying high pressure pure water through a plurality of spray nozzles on the surface of the etched liquid crystal panel to reduce the thickness of the upper and lower glass substrates. do. However, as shown in the drawings, the conventional high pressure pure water cleaning process has a problem that the sludge stuck in the region between the upper glass substrate and the lower glass substrate is not easily removed but remains. As such, the sludge that is not removed through the high pressure pure cleaning process is adsorbed into the scribe facility during the subsequent scribing process, which causes the corrosion of the scribe facility.

Accordingly, the present invention was derived to solve the above problems, and the present invention provides a cleaning apparatus and a cleaning method for manufacturing a liquid crystal display device capable of completely removing even the sludge adsorbed between the upper glass substrate and the lower glass substrate by cleaning with an acid. Its purpose is to provide.

Cleaning apparatus for manufacturing a liquid crystal display device for removing the sludge adsorbed to the upper and lower substrates during the etching process after the etching process for reducing the thickness of the bonded upper substrate and lower substrate in accordance with the present invention to achieve the above object A cleaning apparatus comprising: a chamber on which a substrate is seated, and a cleaning liquid spraying means for spraying an acid cleaning liquid onto the substrate.

Here, a cleaning liquid tank unit for supplying the acid cleaning liquid to the cleaning liquid spraying means, a measuring unit for measuring the concentration and amount of the acid cleaning liquid in the cleaning liquid tank unit, and a cleaning liquid for supplying the acid cleaning liquid to the cleaning liquid tank unit according to the result of the measuring unit. It is preferable to further include a supply part.

It is effective to include a seating means in which the substrate is seated in the chamber. Of course, the substrate may be seated in the chamber through a cassette unit in which a plurality of substrates are mounted.

The above-described cleaning liquid spraying means includes spraying means having a plurality of spray nozzles formed on a surface thereof, the first spraying means for spraying the acid cleaning liquid on the upper surface of the substrate, and the acid cleaning liquid on the lower surface of the substrate. It is preferable to include the 2nd injection means and the 3rd injection means which injects the acid washing | cleaning liquid to the side surface of the said board | substrate.

And, it is effective to further include an exhaust port for discharging the acid cleaning liquid injected into the chamber to the outside.

At this time, the pH of the acid cleaning solution is in the range of 1 to 7, the temperature is preferably 15 to 60 degrees. It is effective that the acid cleaning liquid contains hydrochloric acid or sulfuric acid.

In addition, after the etching process for reducing the thickness of the bonded upper substrate and the lower substrate according to the present invention, in the cleaning apparatus for manufacturing a liquid crystal display device for removing the sludge adsorbed to the upper and lower substrate during the etching process, the substrate is It provides a cleaning device including a container to be seated and a cleaning liquid tube for supplying or discharging the acid cleaning liquid to the container.

Here, a cleaning liquid tank unit for supplying the acid cleaning liquid to the container, a measuring unit for measuring the concentration and amount of the acid cleaning liquid in the cleaning liquid tank unit, and a cleaning liquid supply unit for supplying the acid cleaning liquid to the cleaning liquid tank unit according to the result of the measuring unit. It is preferable to further include.

It is effective that the container is formed in a cylindrical shape with an open top, and the cleaning liquid tube includes a cleaning liquid supply pipe for supplying an acid cleaning liquid and a cleaning liquid discharge pipe for discharging the acid cleaning liquid. And, it is preferable that the container includes a seating means for mounting the substrate. Of course, the substrate may be seated in the container through a cassette unit on which a plurality of substrates are seated.

In addition, after the etching process for reducing the thickness of the bonded upper substrate and the lower substrate according to the present invention, in the cleaning method for removing the sludge adsorbed to the upper and lower substrate during the etching process, into the substrate cleaning unit A method of cleaning includes loading a substrate, cleaning the substrate with an acid cleaning liquid, and unloading the substrate.

Here, the substrate cleaning unit preferably includes a chamber or a container.

At this time, the step of cleaning the substrate through the acid cleaning liquid, it is effective to remove the sludge of the substrate by spraying the acid cleaning liquid on the substrate. Of course, in the cleaning of the substrate through the acid cleaning solution, the acid cleaning solution may be supplied to the substrate cleaning part to erode the substrate to remove sludge of the substrate. In addition, the cleaning of the substrate through the acid cleaning solution may remove the sludge of the substrate by discharging the acid cleaning solution of the substrate cleaning part in which the substrate is eroded into the acid cleaning solution.

In addition, providing an upper glass substrate comprising a color filter according to the present invention, a lower glass substrate comprising a TFT, bonding the upper glass substrate and the lower glass substrate, the upper glass substrate and the Performing etching to reduce the thickness of the lower glass substrate, performing a cleaning process for removing sludge of the etched upper glass substrate and the lower glass substrate through an acid cleaning liquid, and the upper glass substrate and the lower portion It provides a method for manufacturing a liquid crystal display device comprising the step of cutting a portion of the glass substrate.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various forms, and only the embodiments are intended to complete the disclosure of the present invention and to those skilled in the art. It is provided for complete information. Like numbers refer to like elements in the figures.

Prior to the description of the cleaning apparatus and cleaning method of the present invention, a brief description will be given of a manufacturing method of a liquid crystal display panel including the cleaning method.

2 is a flowchart illustrating a method of manufacturing a liquid crystal display panel according to the present invention.

Referring to FIG. 2, an upper glass substrate and a lower glass substrate for a liquid crystal display panel are provided (S10). Thereafter, a plurality of gate lines arranged in one direction with a predetermined distance on the lower substrate through a thin film pattern forming process, a plurality of data lines arranged at regular intervals in a direction perpendicular to the gate line, A plurality of pixel electrodes formed in a matrix in a pixel region defined by crossing data lines, and a plurality of thin film transistors switched by the gate line signals to transfer data line signals to each pixel electrode, and the upper glass substrate A black matrix layer for blocking light of portions except the pixel region, an R, G, and B color filter layer for expressing color colors, and a common electrode for forming an image are formed on the substrate (S20).

Thereafter, a sealant is formed at the edge of the lower glass substrate and / or the upper glass substrate between the lower glass substrate and the upper glass substrate manufactured as described above. At this time, it is preferable to use a thermosetting resin and a photocurable resin as a sealant. Align and position between the upper glass substrate and the lower glass substrate to which the sealant is applied, and then harden the sealant by hot pressing the two substrates to bond the upper glass substrate to the lower glass substrate. Subsequently, a liquid crystal material is injected into the region between the substrates using a vacuum injection method to form a liquid crystal layer and then sealed (S30).

Thereafter, an etching process for reducing the thickness of the upper glass substrate and the lower glass substrate is performed (S40). In this case, the etching process is performed by immersing the upper glass substrate and the lower glass substrate bonded in the etching equipment filled with the etching solution. In this case, the etching equipment may use a batch or sheetfed etching equipment, and may use an etching equipment added with various equipment such as a bubbler to improve the etching rate and the etching uniformity.

Thereafter, a cleaning process of removing the sludge adsorbed to the etched upper glass substrate and the lower glass substrate is performed by using the cleaning apparatus using the acid solution of the present invention to remove the sludge generated during the etching process (S50). The sludge (H ₂ SiF ₆ ) described above is a by-product generated during etching of the organic substrate and can be easily removed by an acidic solution such as hydrochloric acid and sulfuric acid. Therefore, in the present invention, the acidic solution is used to remove the sludge through cleaning equipment capable of performing at least one of a spray method, an up flow method, and a drain method. This will be described in detail below. The upper glass substrate and the lower glass substrate etched as described above are cut by using a scribing apparatus to manufacture a liquid crystal display device (S60).

As described above, the present invention can completely remove the sludge adsorbed on the surface of the upper glass substrate and the lower glass substrate as well as the region therebetween using an acidic solution. In addition, the sludge is completely removed with an acid solution to prevent the problem that the sludge is adsorbed to the scribe equipment during the cutting process using the scribe equipment to prevent corrosion in advance, thereby increasing the life of the equipment.

Hereinafter, a cleaning apparatus for performing cleaning using an acidic solution and a cleaning method using the same will be described.

3 is a conceptual diagram illustrating a cleaning device according to an embodiment of the present invention.

Referring to FIG. 3, the cleaning apparatus according to the present embodiment includes a substrate cleaning unit 100 for cleaning sludge adsorbed on a substrate using an acid cleaning liquid, and a cleaning liquid tank for supplying an acid cleaning liquid to the substrate cleaning unit 100. The unit 200 is included. In addition, the measurement unit 300 for measuring the acidity (PH) and the concentration of the cleaning liquid, and the cleaning liquid supply unit 40 for supplying the acid cleaning liquid to the cleaning liquid tank unit 200 in accordance with the result of the measuring unit 300 Include.

As a result, when the substrate on which the etching is completed is loaded and mounted on the substrate cleaner 100, the substrate cleaner 100, which is supplied with the acid cleaner from the cleaning tank 200, is formed on the upper glass substrate and the lower glass substrate using the acid cleaner. Remove the sludge adsorbed on the In the acid cleaning solution, an acid solution having a pH of 1 to 7 is used, and hydrochloric acid and sulfuric acid are preferably used.

Hereinafter, each part constituting the cleaning equipment according to the present embodiment described above will be described in more detail.

The cleaning liquid tank unit 200 includes a storage unit in which an acid cleaning liquid (not shown) is stored, an impurity removing unit for removing impurities of the acid cleaning liquid, and a temperature control unit for maintaining a constant temperature of the acid cleaning liquid. That is, it is preferable to remove impurities in the acid cleaning liquid through an impurity removing part such as a filter and supply the impurities to the substrate cleaning part 100. In addition, as shown in the drawing, the cleaning liquid tank unit 200 may not only supply the acid cleaning liquid to the substrate cleaning unit 100, but may also receive the acid cleaning liquid from the substrate cleaning unit 100. Thus, impurities in the acid cleaning liquid flowing from the substrate cleaning unit 100 may be removed through the impurity removal unit. In addition, the temperature control unit may maintain the temperature of the acid cleaning solution within 15 to 60 degrees to optimize the cleaning process. In addition, the cleaning liquid tank unit 200 may further include a separate exhaust unit to discharge the acid cleaning liquid in the cleaning liquid tank unit 200 to the outside.

The measurement unit 300 includes a PH measuring means for measuring the pH of the acid cleaning liquid in the cleaning liquid tank 200, not shown, and a residual amount measuring means for measuring the amount of the acid cleaning liquid in the cleaning liquid tank 200 do. The cleaning solution supply unit 400 includes a first tank in which an acid solution, not shown, is stored, and a second tank in which a dilution solution for diluting the acid solution is stored.

Accordingly, the pH of the acid cleaning liquid and the amount of the acid cleaning liquid in the cleaning liquid tank unit 200 are measured through the measuring unit 300, and when the pH is low, the acid cleaning liquid having a high pH is washed through the cleaning liquid supply unit 400. When supplied to the tank unit 200 and the pH is high, the pH of the acid cleaning liquid in the cleaning liquid tank unit 200 may be adjusted by supplying an acid cleaning liquid having a low PH to the cleaning liquid tank unit 200. In addition, when the storage amount of the acid cleaning liquid is small, the storage amount of the acid cleaning liquid may be adjusted by supplying the pickling semen to the cleaning liquid tank unit 200.

The substrate cleaner according to the present exemplary embodiment may apply various methods for removing sludge of the upper glass substrate and the lower glass substrate by using an acid cleaner. That is, the acid cleaning liquid may be sprayed onto the substrate through the spray method, the acid cleaning liquid may be supplied into the container on which the substrate is seated through the upflow method, or the substrate may be introduced into the container in which the acid cleaning liquid is stored by the drain method. In the following, a modification of the substrate cleaning unit according to the above-described method will be described.

4 to 7 are views for explaining modified examples of the substrate cleaning unit according to the present embodiment.

Referring to FIG. 4, the substrate cleaner 100 according to the first modified example includes a chamber 110 on which the substrate 120 is mounted, and cleaning liquid spraying means 130a and 130b for spraying an acid cleaning liquid onto the substrate 120. 130c; 130). The chamber 110 may further include a separate substrate seating member (not shown) on which the substrate 120 is seated.

The cleaning liquid spraying means 130 has a plurality of spray nozzles 131 are formed on the surface thereof. The cleaning liquid spraying means 130 according to the present modification includes first spraying means 130a for spraying the acid cleaning liquid on the upper surface of the substrate 120 and second spraying means for spraying the acid cleaning liquid on the lower surface of the substrate 120 ( 130b) and third spraying means 130c for spraying the acid cleaning liquid on the side surface of the substrate 120. As a result, as shown in FIG. 4, the acid cleaning liquid is sprayed on the upper and lower portions of the substrate 120 as well as the side regions of the substrate 120, and thus, the upper and lower surfaces of the upper glass substrate 121 and the lower surface of the lower glass substrate 122. Not only the adsorbed sludge can be removed, but also sludge formed in the space between the upper glass substrate 121 and the lower glass substrate 122 can be removed.

In addition, the cleaning liquid injection means 130 may be fixed, or may be movable. At this time, when the cleaning liquid spraying means 130 is fixed, the first and second spraying means 130a and 130b are formed in a plate shape having a width equal to or wider than that of the substrate 120 and thus the upper portion of the substrate 120. And it is preferable to uniformly spray the acid cleaning liquid on the lower surface, the third injection means (130c) is also formed in the form of a plate having a width equal to or wider than the side of the substrate 120 to the side of the substrate 120 The acid washing liquid can be sprayed uniformly. On the other hand, when the cleaning liquid jetting means 130 is movable, it is effective to form a plate or a line shape. At this time, the cleaning liquid spraying means 130 can improve the removal effect of the sludge by allowing not only to move up and down or back and forth, but also to rotate. In addition, the substrate may move without being limited thereto.

Preferably, the spray nozzles 131 formed on the first and second spray means 130a and 130b are formed to have a uniform interval and spray uniformly, and the spray nozzle 131 formed on the third spray means 130c. The spray nozzle 131 is concentrated on the region of the third spraying means 131c corresponding to the recessed region through the bonding of the upper glass substrate 121 and the lower glass substrate 122 to the upper glass substrate 121. It is also possible to completely remove the sludge in the recessed area of the space between the lower glass substrate 122.

Looking at the operation of the cleaning apparatus including the substrate cleaning unit 100 according to the above-described modification, the substrate 120 into the chamber 110 of the substrate cleaning unit 100 through a robot arm (not shown) Load. Thereafter, the acid cleaning liquid is supplied to the cleaning liquid spraying means 130 through the cleaning liquid tank unit 200, and sprayed onto the substrate 120 through the cleaning liquid spraying means 130. In this case, as described above, since the cleaning solution spraying means 130 is formed to surround the substrate 120 or is formed to move around the substrate 120, the cleaning solution is acid-exposed to the entire surface area of the substrate 120 exposed to the outside. Is sprayed. Through this, the acid component of the acid cleaning solution and the sludge react to remove the sludge. Here, to prevent the phenomenon that the sealing member 123, such as a sealant, provided between the upper glass substrate 121 and the lower glass substrate 122 through the acid cleaning liquid, the cleaning time using the acid cleaning liquid is performed within 30 minutes. It is preferable to keep the pH of the acid washing liquid within the range of 1 to 7 and to maintain the temperature of the acid washing liquid within the range of 15 to 60 degrees.

After the cleaning process is completed, the substrate 120 is unloaded to the outside of the chamber 110 by using a robot. At this time, after the substrate unloading step, a cleaning step using pure water may be performed once more to remove the acid cleaning liquid remaining on the substrate surface, or a drying step may be performed to dry the substrate.

As described above, the substrate cleaning unit of the present embodiment may clean a plurality of substrates by mounting a single substrate. Hereinafter, the substrate cleaner according to the second modification will be described with reference to FIG. 5. In the following description, a description overlapping with the above-described modification will be omitted.

Referring to FIG. 5, the substrate cleaning unit 100 according to the present modification includes a cassette unit 140 on which a plurality of substrates 120 are seated, a chamber 110 on which the cassette unit 140 is seated, and It includes a cleaning liquid spraying means 130 for injecting the acid cleaning liquid to the substrate 120 in the cassette 140. In the drawing, the cassette 140 is indicated by a dotted line.

The cassette unit 140 includes a shaft having a fixing means for fixing and supporting a plurality of substrates 120 not shown, and a frame having the shaft fixed thereto. Since the substrate 120 is manufactured in a rectangular shape, the axis includes four axes so as to correspond to the four edges of the rectangular substrate, and the vertex portion of the substrate is seated and fixed through the fixing means of each axis.

Of course, the present invention is not limited thereto, and the cassette unit 140 may be modified in various shapes and shapes so that the acid cleaning solution sprayed through the cleaning solution spraying unit 130 may be uniformly sprayed onto the plurality of substrates 120.

In addition, the substrate cleaning unit 100 of the present embodiment is not limited to the above-described spraying type, and the substrate cleaning unit 100 may be supplied to the container on which the substrate 120 is seated to clean the substrate 120. Hereinafter, the substrate cleaner 100 according to the third modified example will be described with reference to FIG. 6. In the following description, a description overlapping with the above-described modifications will be omitted.

Referring to FIG. 6, the substrate cleaning unit 100 according to the present modification includes a container 150 on which the substrate 120 is mounted, and a cleaning liquid supply pipe 160 for supplying an acid cleaning liquid to the container 150. .

The container 150 may be formed in a cylindrical shape with an open top, and a mounting means (not shown) may be formed in the container 150 to seat the substrate 120. Then, the container 150 preferably has a depth enough to allow the substrate 120 to be completely submerged by injecting the acid cleaning liquid after the substrate 120 is seated therein. In addition, a part of the container 150 may be provided with a bubbler (not shown) that generates bubbles to improve the efficiency of the cleaning process. The cleaning solution supply pipe 160 is connected to the cleaning solution tank 200 to supply an acid cleaning solution to the container 150. The injection amount of the acid cleaning liquid injected by using the valve into the cleaning liquid supply pipe 160 may be adjusted. In FIG. 6, the cleaning solution supply pipe 160 is integrally formed with the container on the upper sidewall of the container 150, but is not limited thereto, and may be manufactured separately from the container 150.

A substrate cleaning process using the substrate cleaning unit 100 having the above-described structure will be described below.

First, the substrate 120 is loaded into the container 150 having an empty inside thereof using a robot. Thereafter, the cleaning solution supply pipe 160 is opened to supply the acid cleaning solution 500 into the container 150 in which the substrate 120 is loaded. In this case, as shown in FIG. 6A, the acid cleaning solution 500 rises to completely erode the substrate 120 as shown in FIG. 6B. As such, as the acid cleaning liquid 500 rises inside the container 150, sludge adsorbed on the surface of the substrate 120 is removed, and in particular, an acid rising in the region between the upper glass substrate 121 and the lower glass substrate 122 is removed. The cleaning liquid 150 may be sufficiently penetrated to completely remove the sludge in the region between the upper glass substrate 121 and the lower glass substrate 122.

After the cleaning process is completed, the substrate 120 is unloaded to the outside of the container 150 by using a robot. After the substrate 120 is unloaded, the acid cleaning liquid 150 remaining in the container 150 may be supplied back to the cleaning liquid tank 200 or exhausted to the outside.

In addition, the substrate cleaning unit 100 of the present embodiment is not limited to the upflow type described above, and the substrate 120 is introduced into the container 150 filled with the acid cleaning liquid 500, and then the pickling liquid 500 is exhausted. You may. Hereinafter, the substrate cleaner 100 according to the fourth modified example will be described with reference to FIG. 7. In the following description, a description overlapping with the above-described modifications will be omitted.

Referring to FIG. 7, the substrate cleaning unit 100 according to the present modification includes a container 150 filled with an acid cleaning liquid 500, and a cleaning liquid exhaust pipe 170 for exhausting the acid cleaning liquid of the container 150. .

The container 150 may be formed in a cylindrical shape with an open top, and a mounting means (not shown) may be formed in the container 150 to seat the substrate 120. The acid cleaning liquid 500 filled in the container 150 is effectively filled to a depth such that the substrate 120 on which the substrate 120 is seated can be completely locked.

The cleaning liquid exhaust pipe 170 is formed on the bottom surface of the container 150 to allow the substrate 120 to be seated in the container 150 and then discharge the acid cleaning liquid 500 inside the container 150 to the outside at a constant speed. It is preferable. The cleaning liquid exhaust pipe 170 may adjust a discharge amount of the acid cleaning liquid 500 by using a valve. The cleaning liquid exhaust pipe 170 may supply the cleaning liquid tank unit 200 with the acid cleaning liquid 500 discharged by being connected to the external cleaning liquid tank unit 200.

A substrate cleaning process using the substrate cleaning unit 100 having the above-described structure will be described below.

First, the acid cleaning liquid 500 is supplied to the inside of the container 150 through an external cleaning liquid tank 200 to fill the inside of the container 150 with the acid cleaning liquid 500.

The substrate is introduced into the container filled with the acid cleaning liquid as shown in FIG. At this time, the substrate is mounted on the substrate mounting means inside the container using a robot. Thereafter, the cleaning liquid is exhausted through the cleaning liquid exhaust pipe disposed under the container. This removes sludge from the substrate surface. Thereafter, after the acid cleaning liquid in the container is exhausted, the substrate is unloaded to the outside of the container to complete the process.

The structure of the substrate cleaning unit and the cleaning method using the same in the present embodiment are not limited to each of the above-described modifications, and these modifications may be applied in duplicate.

That is, the structure inside the chamber can contain the cleaning liquid like a container, and the cleaning liquid injection means is arranged outside the sludge to remove the sludge on the surface of the substrate while spraying the acid cleaning liquid, and the injected acid cleaning liquid is filled in the chamber. As a result, the substrate inside the chamber may be completely eroded, and the filled acid cleaning liquid may be discharged to the outside. In addition, the acid cleaning liquid may be slowly supplied to the inside of the container to erode the substrate, and then the acid cleaning liquid may be slowly discharged to the outside of the container. At this time, the acid cleaning liquid may be repeatedly supplied and exhausted a plurality of times.

As described above, the present invention can remove the sludge adsorbed on the surface of the substrate during the substrate etching process by cleaning the substrate using an acidic solution, and effectively removes the sludge remaining in the recess region between the upper glass substrate and the lower glass substrate. Can be removed.

Although the invention has been described with reference to the accompanying drawings and the preferred embodiments described above, the invention is not limited thereto, but is defined by the claims that follow. Accordingly, one of ordinary skill in the art may variously modify and modify the present invention without departing from the spirit of the following claims.

Claims (19)

In the cleaning apparatus for manufacturing a liquid crystal display device for removing the sludge adsorbed on the upper and lower substrates during the etching process after the etching process for reducing the thickness of the bonded upper substrate and lower substrate, A chamber on which the substrate is seated; And And a cleaning liquid spraying means for injecting an acid cleaning liquid onto the substrate. The method according to claim 1, A washing liquid tank unit for supplying the acid washing liquid to the washing liquid spraying means; A measuring unit which measures the concentration and the amount of the acid washing liquid in the washing liquid tank unit; And And a cleaning solution supply section for supplying an acid cleaning solution to the cleaning solution tank section in accordance with the result of the measurement section. The method according to claim 1, And a seating means in which the substrate is mounted in the chamber. The method according to claim 1, The cleaning apparatus in which the substrate is seated in the chamber through a cassette portion on which a plurality of substrates are seated. The method according to claim 1, wherein the cleaning liquid injection means, A spraying means having a plurality of spray nozzles formed on a surface thereof, the spraying means comprising: a first spraying means for spraying acid cleaning liquid on the upper surface of the substrate, a second spraying means for spraying acid cleaning liquid on the lower surface of the substrate; And a third spraying means for spraying the acid washing liquid on the side surface. The method according to claim 1, The cleaning device further comprises an exhaust port for discharging the acid cleaning liquid injected into the chamber to the outside. The method according to claim 1, The pH of the acid cleaning liquid is in the range of 1 to 7, the temperature is 15 to 60 degrees. The method according to claim 1, The acid cleaning liquid comprises a hydrochloric acid or sulfuric acid. In the cleaning apparatus for manufacturing a liquid crystal display device for removing the sludge adsorbed to the upper and lower substrates during the etching process after the etching process for reducing the thickness of the bonded upper substrate and lower substrate, A container on which the substrate is seated; And And a cleaning liquid tube for supplying an acid cleaning liquid or discharging the acid cleaning liquid to the container. The method according to claim 9, A cleaning liquid tank unit for supplying the acid cleaning liquid to the container; A measuring unit which measures the concentration and the amount of the acid washing liquid in the washing liquid tank unit; And And a cleaning solution supply section for supplying an acid cleaning solution to the cleaning solution tank section in accordance with the result of the measurement section. The method according to claim 9, The container is formed in a cylindrical shape with an open top, and the cleaning liquid tube includes a cleaning liquid supply pipe for supplying an acid cleaning liquid, and a cleaning liquid discharge pipe for discharging the acid cleaning liquid. The method according to claim 9, And a seating means in which the substrate is seated in the container. The method according to claim 9, A cleaning device in which a substrate is seated in the container through a cassette unit on which a plurality of substrates are seated. In the cleaning method for removing the sludge adsorbed to the upper and lower substrates during the etching process after the etching process for reducing the thickness of the bonded upper substrate and lower substrate, Loading a substrate into the substrate cleaner; Cleaning the substrate with an acid wash; And Unloading the substrate. The method according to claim 14, And the substrate cleaner comprises a chamber or a container. The method of claim 14, wherein the cleaning of the substrate with an acid cleaning liquid comprises: And cleaning the sludge of the substrate by spraying an acid cleaning liquid onto the substrate. The method of claim 14, wherein the cleaning of the substrate with an acid cleaning liquid comprises: And cleaning the substrate by supplying an acid cleaning liquid to the substrate cleaning part to erode the substrate. The method of claim 14, wherein the cleaning of the substrate with an acid cleaning liquid comprises: And discharging the acid cleaning liquid of the substrate cleaning part in which the substrate is eroded into the acid cleaning liquid to remove sludge of the substrate. Providing an upper glass substrate comprising a color filter and a lower glass substrate comprising a TFT; Bonding the upper glass substrate and the lower glass substrate; Etching to reduce thicknesses of the upper and lower glass substrates; Performing a cleaning process to remove sludge of the etched upper glass substrate and the lower glass substrate through an acid cleaning liquid; And And cutting a portion of the upper glass substrate and the lower glass substrate.

Images