KR20070039628A - Color filter substrate and fabricating method thereof - Google Patents

Abstract

The present invention relates to a color filter substrate having a simple manufacturing process and resistant to external impact and a method of manufacturing the same.

The present invention provides a color filter formed on an insulating substrate and including a black matrix including protrusions and at least one organic layer formed to cover the protrusions and protruding in an area overlapping the protrusions to maintain a cell gap. It relates to a substrate and a method of manufacturing the same.

Column spacers, black matrices, protrusions, overcoats, organic films

Description

Color filter substrate and its manufacturing method {COLOR FILTER SUBSTRATE AND FABRICATING METHOD THEREOF}

1 is a plan view showing a color filter substrate according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along line II-II 'of FIG. 1.

3A to 3F are perspective views showing the shape of the protrusion according to the embodiment of the present invention.

4 is a cross-sectional view showing a conventional color filter substrate.

5A to 5F are cross-sectional views illustrating a method of manufacturing a color filter substrate according to an exemplary embodiment of the present invention.

<Code Description of Main Parts of Drawing>

10: color filter substrate 20: substrate

30: black matrix 40: protrusion

50: color filter 60: overcoat

70: organic film 80: common electrode

90: slit 100: black layer

110: partial exposure mask 120: partial exposure mask substrate

130: light blocking layer 140: transparent conductive layer

The present invention relates to a color filter substrate and a method for manufacturing the same, and more particularly, to a color filter substrate having a simple manufacturing process and resistant to external impact and a method for manufacturing the same.

As information technology advances, the market for computers and televisions as well as personal mobile communication devices such as mobile phones is increasing. The display device, which is the final connection medium between these devices and the user, is required to have high quality, and thus, a liquid crystal display device, which is not a conventional CRT (Cathode Ray Tube), has been in the spotlight recently.

A liquid crystal display device is an apparatus for displaying an image by adjusting the light transmittance of a liquid crystal using an electric field. The liquid crystal display device includes a thin film transistor substrate and a color filter substrate that are bonded to each other with the liquid crystal interposed therebetween.

In the thin film transistor substrate, gate lines and data lines formed to cross each other, thin film transistors formed at intersections thereof, and pixel electrodes connected to the thin film transistors are formed on the substrate.

In the color filter substrate, a black matrix for preventing light leakage, a color filter for color implementation, an overcoat for protecting the color filter, and a common electrode forming an electric field with the pixel electrode are formed on another substrate.

A column spacer is formed between the color filter substrate and the thin film transistor substrate so that the two substrates maintain a predetermined gap, that is, a cell gap. However, in the conventional liquid crystal display, when an external shock is applied, the external shock is transmitted to the common electrode under the column spacer as it is, and thus the common electrode is damaged, thereby easily causing a defect such as smear. In addition, since a column spacer is manufactured using a separate mask for a column spacer, the cost of the liquid crystal display is increased and the manufacturing process is complicated.

Accordingly, the technical problem to be achieved by the present invention is to provide a color filter substrate having a simple manufacturing process and resistant to external impact and a method of manufacturing the same.

In order to achieve the above object, the present invention includes a black matrix formed on an insulating substrate and including at least one organic layer formed to cover the protrusion and protruding from an area overlapping the protrusion to maintain a cell gap. Provided is a color filter substrate.

And a color filter formed in the pixel region partitioned by the black matrix, and an overcoat formed to cover the color filter and the black matrix.

Specifically, the at least one organic film is characterized in that the overcoat.

The method may further include a common electrode formed on the overcoat of the remaining region except for the region overlapping the protrusion.

In addition, the height of the protrusion is characterized in that 2㎛ ~ 5㎛.

And, the diameter of the bottom surface of the protrusion is characterized in that 5㎛ ~ 40㎛.

In addition, the shape of the protrusion is characterized in that any one of a cone, cone, cylinder, polygonal pyramid, polygonal pyramid, polyhedron.

In addition, the overcoat has a thickness of 0.5 μm to 2 μm.

In order to achieve the above object, the present invention includes forming a black matrix including a protrusion on an insulating substrate, and forming at least one organic layer on the protrusion to protrude in an area overlapping the protrusion. It provides a method for producing a color filter substrate, characterized in that.

And forming a color filter in the pixel region partitioned by the black matrix, and forming an overcoat to cover the color filter and the black matrix.

Here, the at least one insulating film is characterized in that the overcoat.

The forming of the black matrix including the protrusion on the insulating substrate may include applying a black layer on the insulating substrate and patterning the black layer using a partial exposure mask to form the black matrix and the black matrix. And forming the protrusion having a higher height.

The method may further include forming a common electrode formed on the overcoat of the remaining region except for the region overlapping the protrusion.

Other objects and features of the present invention in addition to the above object will become apparent from the description of the embodiments with reference to the accompanying drawings. Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

1 is a plan view illustrating a color filter substrate according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line II-II 'of FIG.

1 and 2, the color filter substrate 10 according to the exemplary embodiment of the present invention is formed in a matrix form on the substrate 20 to define a black region 30 and a black matrix 30. Overcoat 60 and protrusions formed to cover the color filter 50, the black matrix 30, and the color filter 50 formed in each pixel region defined by the protrusion 40 formed on the black matrix 30. An organic film 70 formed to cover 40 and a common electrode 80 formed on the overcoat 60 are included.

The black matrix 30 is formed in a matrix form on the substrate 20 so as to distinguish the pixel region in which the color filter 50 is to be formed, and overlaps the gate line, the data line, and the thin film transistor of the thin film transistor substrate. The black matrix 30 blocks transmitted light generated by an undesired liquid crystal array, thereby improving contrast of the liquid crystal display device and blocking direct light irradiation to the thin film transistor to prevent light leakage current of the thin film transistor. To this end, the black matrix 30 is formed of an opaque polymer resin or the like. Here, the thickness A of the black matrix 30 is preferably 0.5 μm to 3 μm. The more preferable thickness A of the black matrix 30 is 1 micrometer-2 micrometers.

The protrusion 40 is formed of the same material as the black matrix 30 on the black matrix 30. The protrusions 40 may be formed in the same number as each pixel area. Alternatively, the protrusion 40 may be formed less than the number of each pixel area.

As shown in Fig. 3A, the protrusion 40 is formed of a cone having a triangular shape of a side surface. Here, it is preferable that the height B of the protrusion part 40 is 2 micrometers-5 micrometers. The height B of the more preferable protrusion part 40 is 3 micrometers-3.5 micrometers. Moreover, it is preferable that the diameter C of the bottom surface of the protrusion part 40 is 5 micrometers-40 micrometers. The diameter C of the bottom surface of the more preferable protrusion part 40 is 20 micrometers-25 micrometers. However, as shown in FIG. 3B, the protrusion 40 may be formed in a conical shape having a trapezoidal side shape, and as shown in FIG. 3C, a protruding portion 40 may be formed in a cylindrical shape having a rectangular shape. . Alternatively, the protrusion 40 may be formed as a polygonal pyramid having a triangular shape of a side surface as shown in FIG. 3D, and may be formed as a polygonal pyramid having a trapezoidal shape as shown in FIG. 3E. As shown in FIG. 3F, the side surface may have a rectangular polyhedron shape.

The color filter 50 includes red (R), green (G), and blue (B) color filters to implement colors. The red (R), green (G), and blue (B) color filters absorb red or green light by absorbing or transmitting light of a specific wavelength through the red (R), green (G), and blue (B) pigments. (R), green (G), and blue (B). At this time, various colors are realized through additive color mixing of red (R), green (G), and blue (B) light that has passed through the red (R), green (G), and blue (B) color filters. The color arrangement of the color filter 50 has a stripe shape in which red (R), green (G), and blue (B) color filters are arranged in a line. On the other hand, since the region in which the protrusion 40 is formed is a region through which light does not transmit, the color filter 50 may be formed to cover the protrusion 40.

The overcoat 60 protects the color filter 50 and is formed for good step coverage of the common electrode 80. Here, it is preferable that the thickness D of the overcoat 60 is 0.5 micrometer-2 micrometers. The more preferable thickness D of the overcoat 60 is 0.8 micrometer-1.5 micrometers.

The organic layer 70 is formed on the protrusion 40 in the same material as the overcoat 60 in correspondence with the shape and number of the protrusions 40. Here, the thickness of the organic layer 70 may be the same as the thickness D of the overcoat 60 because the organic layer 70 is formed of the same material as the overcoat 60. Alternatively, the thickness of the organic layer 70 may be smaller than the thickness D of the overcoat 60.

The organic layer 70 serves as a column spacer 75 formed on the common electrode 85 in the conventional color filter substrate 15 as shown in FIG. 4. That is, the organic film 70 is formed to maintain the cell gap. At this time, the lower cross-sectional area of the organic layer 70 is wider than the lower cross-sectional area of the conventional column spacer 75, so that the impact can be dispersed in various directions during an external impact. As shown in Equation 1, when the organic film 70 (or the column spacer 75) receives an impact P from the outside, it is located below the organic film 70 (or the column spacer 75). This is because the stress? Transmitted to the film is inversely proportional to the contact area A with the lower film.

In other words, for example, if the lower cross-sectional area of the organic film 70 using the protrusion 40 as the lower film is twice as large as the lower cross-sectional area of the existing column spacer 75 using the common electrode 85 as the lower film. The stress σ applied to the lower film is half of the existing one.

In addition, since the lower film has a protrusion 40 formed of the same material as the black matrix 30 instead of the common electrode 85, the smear defect is advantageous.

The common electrode 80 applies a common voltage to the liquid crystal corresponding to the pixel voltage of the pixel electrode. To this end, the common electrode 80 is formed of a material such as indium tin oxide (ITO) or indium zinc oxide (IZO) that is transparent and conductive. The preferred thickness E of the common electrode 80 is 500 kPa to 2000 kPa. More preferably, the thickness E of the common electrode 80 is 800 kPa to 1500 kPa. The common electrode 80 includes a slit 90 having a chevron shape. The chevron slit 90 of the common electrode 80 is formed with another slit of chevron formed in the pixel electrode therebetween. Due to the slit 90 of the common electrode 80 and another slit of the pixel electrode, the liquid crystal is inclined in a predetermined direction, thereby securing a wide viewing angle.

The color filter substrate 10 is formed through a manufacturing process as shown in FIGS. 5A to 5F.

Referring to FIG. 5A, a black layer 100, such as an opaque polymer resin, is applied to form a black matrix and a protrusion on a substrate 20.

Specifically, the black layer 100 having negative photosensitivity is coated on the substrate 20 through a spin coating method. Herein, the thickness F of the coated black layer 100 is preferably 2.5 μm to 8 μm. More preferable thickness F of black layer 100 is 4 micrometers-5.5 micrometers.

Referring to FIG. 5B, after applying the black layer 100, the black layer 100 is exposed using a partial exposure mask 110, which is a diffraction slit mask. Here, instead of using the diffraction slit mask as the partial exposure mask 110, a transflective mask may be used.

In detail, the partial exposure mask 110 is formed of the partial exposure mask substrate 120 and the light blocking layer 130 formed thereunder, and a part of the light blocking layer 130 is formed in a slit pattern. Here, the slit pattern is preferably formed to a size smaller than the resolution of the exposure machine to enable diffraction exposure.

When the black layer 100 is exposed by the partial exposure mask 110, the black layer 100 is completely blocked by light so that the black layer 100 does not remain at all after development, the partial exposure mask 110. The light is partially blocked by the slit pattern of) to form the region H where the black matrix 30 and the protrusion 40 are to be formed after development.

Referring to FIG. 5C, the black layer is exposed and developed to simultaneously form the black matrix 30 and the protrusion 40.

Specifically, when the black layer is developed using a developer, a region G in which no black layer remains is formed, and a black matrix 30 and a protrusion 40 are formed by a slit pattern. At this time, it is preferable that the thickness A of the formed black matrix 30 is 0.5 micrometer-3 micrometers. The more preferable thickness A of the black matrix 30 is 1 micrometer-2 micrometers. In addition, it is preferable that the height B of the formed protrusion part 40 is 2 micrometers-5 micrometers. The height B of the more preferable protrusion part 40 is 3 micrometers-3.5 micrometers. And it is preferable that the diameter C of the bottom surface of the protrusion part 40 is 5 micrometers-40 micrometers. The diameter C of the bottom surface of the more preferable protrusion part 40 is 20 micrometers-25 micrometers.

Referring to FIG. 5D, after forming the black matrix 30 and the protrusion 40, the color filter 50 is formed, followed by the overcoat 60 and the organic layer 70.

Specifically, after the black matrix 30 and the protrusion 40 are formed, a red color layer having negative photosensitivity is applied, and then a red color filter is formed through a photo process using a red color filter mask. Subsequently, a green color layer having negative photosensitivity is applied and then a green color filter is formed through a photo process using a green color filter mask. Subsequently, a blue color layer having negative photosensitivity is applied and then a blue color filter is formed through a photo process using a blue color filter mask.

Next, the overcoat 60 and the organic layer 70 are simultaneously formed by applying the organic material to the entire surface. At this time, it is preferable that the thickness D of the formed overcoat 60 is 0.5 micrometer-2 micrometers. The more preferable thickness D of the overcoat 60 is 0.8 micrometer-1.5 micrometers. Here, since the overcoat 60 and the organic layer 70 are formed of the same material at the same time, the thickness of the organic layer 70 may be the same as the thickness D of the overcoat 60. Alternatively, the thickness of the organic layer 70 may be smaller than the thickness D of the overcoat 60.

Referring to FIG. 5E, a transparent conductive layer 140 such as ITO or IZO is deposited on the overcoat 60 and the organic layer 70.

Specifically, the transparent conductive layer 140 such as ITO or IZO is deposited by a sputtering method using a method such as plasma enhanced chemical vapor deposition (PECVD).

Referring to FIG. 5F, the deposited transparent conductive layer is patterned to form a common electrode 80 and a slit 90.

Specifically, after the transparent conductive layer is deposited, the common electrode 80 is formed through a photolithography process using a common electrode mask. The preferred thickness E of the formed common electrode 80 is 500 kPa to 2000 kPa. More preferably, the thickness E of the common electrode 80 is 800 kPa to 1500 kPa. Meanwhile, the common electrode 80 is formed through the photolithography process, the slit 90 is formed, and the transparent conductive layer formed on the organic layer 70 is also photo-etched and removed.

As described above, the color filter substrate of the present invention and a method of manufacturing the same include an organic film on a protrusion formed simultaneously with the same material as that of the black matrix.

That is, since the organic layer on the protrusion replaces the role of the column spacer separately manufactured on the common electrode, the column spacer process using the separate column spacer mask can be removed, thereby reducing the cost of the liquid crystal display device. In addition, since the lower layer of the organic layer uses a protrusion formed simultaneously with the same material as the black matrix instead of the common electrode, it is also strong against external impact and can remove smear defects.

In the detailed description of the present invention described above with reference to the preferred embodiment of the present invention, those skilled in the art or those skilled in the art having ordinary knowledge of the present invention described in the claims to be described later It will be understood that various modifications and variations can be made in the present invention without departing from the spirit and scope of the art.

Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (13)

A black matrix formed on the insulating substrate and including a protrusion; And at least one organic layer formed to cover the protrusion and protruding from an area overlapping the protrusion to maintain a cell gap. The method of claim 1, A color filter formed in the pixel region partitioned by the black matrix; And a overcoat formed to cover the color filter and the black matrix. The method of claim 2, And said at least one organic film is said overcoat. The method of claim 3, The color filter substrate further comprises a common electrode formed on the overcoat of the remaining region except for the region overlapping the protrusion. The method of claim 3, The height of the protrusion is a color filter substrate, characterized in that 2㎛ ~ 5㎛. The method of claim 3, The diameter of the bottom surface of the protrusion is a color filter substrate, characterized in that 5㎛ ~ 40㎛. The method of claim 3, The protrusion has a shape of any one of a cone, a cone, a cylinder, a polygonal pyramid, a polygonal pyramid, and a polyhedron. The method of claim 3, The thickness of the overcoat is a color filter substrate, characterized in that 0.5㎛ ~ 2㎛. Forming a black matrix including protrusions on the insulating substrate; And forming at least one organic layer on the protrusion to protrude in a region overlapping with the protrusion. The method of claim 9, Forming a color filter in the pixel region partitioned by the black matrix; Forming an overcoat to cover the color filter and the black matrix further comprising the step of forming a color filter substrate. The method of claim 10, And said at least one layer of insulating film is said overcoat. The method of claim 9, Forming the black matrix including the protrusion on the insulating substrate is Coating a black layer on the insulating substrate; And patterning the black layer using a partial exposure mask to form the black matrix and the protrusion having a height higher than that of the black matrix. The method of claim 10, And forming a common electrode formed on the overcoat of the remaining region except for the region overlapping the protrusion.

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