KR20060055246A - Manufacturing method of four separated glass substrate for plasma display panel - Google Patents

Abstract

The present invention relates to a four chamfered glass substrate for a plasma display panel for adjusting the position of the exhaust hole of each unit panel on the four chamfering mother glass substrate has an effect of reducing the manufacturing cost.

The present invention, the present invention for achieving this object, in the method of manufacturing a four-chamfered glass substrate for plasma display panel for chamfering the unit panel for plasma display panel manufacturing, mother glass to form a unit panel And dividing the substrate into four regions, and forming exhaust holes at the same positions in the unit panels divided into four regions.

Plasma Display Panel, Glass Substrate, Exhaust Hole, Multifaceted, 4-Chamfered

Description

Manufacturing Method of Four Separated Glass Substrate for Plasma Display Panel

1 is a view showing the structure of a typical plasma display panel.

2 is a view for explaining a method of manufacturing a general plasma display panel.

3 is a view for explaining a conventional method for manufacturing a glass substrate for a plasma display panel.

4 is a view showing an example in which an exhaust pipe is connected to an exhaust hole formed on a glass substrate for a conventional plasma display panel.

5 is a view for explaining a manufacturing method of a four-chamfered glass substrate for a conventional plasma display panel.

FIG. 6 is a diagram for describing the unit panel of FIG. 5 in more detail.

7 is a view for explaining a manufacturing method of a four chamfered glass substrate for a plasma display panel of the present invention.

8A to 8D are views for explaining a method of forming the exhaust hole in more detail.

9A to 9D are views for explaining in more detail to each region 8A to 8D.                 

<Explanation of symbols for the main parts of the drawings>

80: mother glass substrate 81: exhaust hole

The present invention relates to a glass substrate for a plasma display panel, and more particularly to a four chamfered glass substrate for a plasma display panel to reduce the manufacturing cost by adjusting the position of the exhaust hole of each unit panel on the four chamfering mother glass substrate.

In general, a plasma display panel is a partition wall formed between a front substrate and a rear substrate to form a unit cell, and each cell includes neon (Ne), helium (He), or a mixture of neon and helium (Ne + He) and An inert gas containing the same main discharge gas and a small amount of xenon is filled. When discharged by a high frequency voltage, the inert gas generates vacuum ultraviolet rays and emits phosphors formed between the partition walls to realize an image. Such a plasma display panel has a spotlight as a next generation display device because of its thin and light configuration.

1 illustrates a structure of a general plasma display panel.

As shown in FIG. 1, a plasma display panel includes a front substrate in which a plurality of sustain electrode pairs formed by pairing a scan electrode 102 and a sustain electrode 103 are formed on a front glass 101, which is a display surface on which an image is displayed. The back substrate 110 having the plurality of address electrodes 113 arranged to intersect the plurality of sustain electrode pairs on the back glass 111 forming the back surface 100 and the back is coupled in parallel with a predetermined distance therebetween. .

The front substrate 100 is made of a scan electrode 102 and a sustain electrode 103, that is, a transparent electrode (a) formed of a transparent ITO material and a metal material to mutually discharge and maintain light emission of the cells in one discharge cell. The scan electrode 102 and the sustain electrode 103 provided as the bus electrode b are included in pairs. The scan electrode 102 and the sustain electrode 103 are covered by one or more upper dielectric layers 104 that limit the discharge current and insulate the electrode pairs, and to facilitate the discharge conditions on the upper dielectric layer 104 top surface. A protective layer 105 on which magnesium oxide (MgO) is deposited is formed.

The rear substrate 110 is arranged in such a manner that a plurality of discharge spaces, that is, barrier ribs 112 of a stripe type (or well type) for forming discharge cells are maintained in parallel. In addition, a plurality of address electrodes 113 which perform address discharge to generate vacuum ultraviolet rays are arranged in parallel with the partition wall 112. On the upper side of the rear substrate 110, R, G, and B phosphors 114 which emit visible light for image display during address discharge are coated. A lower dielectric layer 115 is formed between the address electrode 113 and the phosphor 114 to protect the address electrode 113. A method of manufacturing a general plasma display panel having such a structure will be described with reference to FIG. 2.

2 is a view for explaining a method of manufacturing a general plasma display panel.

As shown in FIG. 2, a general method of manufacturing a plasma display panel includes a substrate forming step (S20) of forming a front substrate and a rear substrate using a front glass substrate and a rear glass substrate, and bonding the front substrate and the rear substrate to each other. (S21) and the exhaust step (S22) for exhausting the impurity gas such as moisture or nitrogen between the bonded front substrate and the rear substrate to the outside through a predetermined exhaust pipe (S22), and then helium between the bonded front substrate and the rear substrate The discharge gas injection step (S23) for injecting a discharge gas, such as xenon through a predetermined exhaust pipe.

The substrate forming step (S20) of forming the front substrate and the rear substrate with the front glass substrate and the rear glass substrate, respectively, is performed by combining with a predetermined guide plate for fixing the electrode, dielectric layer, and protection on the front glass substrate and the rear glass substrate. It is a step of forming a layer, a partition, a phosphor layer, and the like. In more detail, an electrode, a dielectric layer, a protective layer are formed on the front glass substrate and the rear glass substrate, or an electrode, a dielectric layer, a partition wall, and a phosphor layer are formed to form the front substrate and the rear substrate. At this time, an impurity gas remaining inside the panel is discharged to the rear glass substrate in which the electrode, the dielectric layer, the partition wall, and the phosphor layer are formed during the exhaust gas of the exhausting step (S22) or the discharging gas injection process of the discharging gas injection step (S23). The exhaust hole for connecting the exhaust pipe for exhausting the furnace or for injecting the discharge gas into the panel is integrally formed.

Bonding step (S21) is a step of applying a predetermined seal (Seal) between the front substrate and the rear substrate and a predetermined pressing means such as a clip on the edges of the front substrate and the rear substrate is bonded to each other. Hereinafter, the front substrate and the rear substrate are bonded to each other.

The evacuation step S22 is a step of discharging impurities, such as moisture or nitrogen, between the front substrate and the back substrate bonded in the bonding step S21 to the outside of the panel using a predetermined exhaust means, for example, a vacuum pump. .

Discharge gas injection step (S23) is an inert gas containing a small amount of xenon and a main discharge gas such as neon, helium or a mixture of neon and helium inside the panel, the front substrate and the rear substrate as a predetermined gas injection means Injecting into the panel.

Thereafter, the plasma display panel is completed through a process such as sealing, firing, and module attaching.

In such a method of manufacturing a plasma display panel, an exhausting process of exhausting impurity gas remaining inside the panel to the outside of the panel and an injection process of injecting discharge gas into the panel are performed through an exhaust pipe in the aforementioned exhausting step (S22). This exhaust pipe is connected to the exhaust hole. Such an exhaust hole is formed on a glass substrate for manufacturing a plasma display panel. Looking at the glass substrate for manufacturing a plasma display panel having such an exhaust hole is as shown in FIG.

3 is a view for explaining a conventional method for manufacturing a glass substrate for a plasma display panel.

As shown in FIG. 3, a conventional glass substrate for a plasma display panel includes an exhaust hole 31, which is formed at a predetermined position on the glass substrate 30 for a plasma display panel. The exhaust hole 31 is preferably formed on the ineffective surface on the glass substrate 30, the size of the exhaust hole 31 can be changed according to the size of the exhaust pipe to be connected. Here, the glass substrate 30 for the plasma display panel is a front glass substrate or a rear glass substrate. An example in which an exhaust pipe is connected to the exhaust hole 31 is as shown in FIG. 4.

4 is a view showing an example in which an exhaust pipe is connected to an exhaust hole formed on a glass substrate for a conventional plasma display panel. As illustrated, the exhaust pipe 40 is connected to the exhaust hole 31 formed on the glass substrate 30 for the conventional plasma display panel.

On the other hand, in recent years, in order to lower the manufacturing cost of the plasma display panel, a multi-faceted method of producing a plurality of panels with a single glass substrate has been applied. This multi-faceted method first takes a plurality of unit panels by cutting and grinding one mother glass substrate, which is the base material of the unit panel, to take a unit panel that is a substrate of the front substrate and the rear substrate. In this way, a method of taking a plurality of unit panels from a single mother glass substrate is called a multifaceted method, and is divided into three chamfered and four chamfered methods according to the number of unit panels to be taken. As many exhaust holes as the number of chamfered unit panels are formed on the mother glass substrate. An example in which an exhaust hole is formed in a glass substrate for a plasma display panel applied to the multi-sided chamfering method will be described with reference to FIG. 5 as an example.

FIG. 5 is a view for explaining a method of manufacturing a four-chamfered glass substrate for a plasma display panel having a conventional exhaust hole.

As shown in FIG. 5, the four chamfered glass substrate 50 for a plasma display panel having a conventional exhaust hole is formed of four zones, that is, four unit panels P ₁ , P ₂ , P ₃ , and P ₄ . Exhaust holes 51 for connecting a predetermined exhaust pipe (not shown) to each of the zones for chamfering the four unit panels P ₁ , P ₂ , P ₃ , and P ₄ set in this manner are divided into zones for chamfering. ) Is integrally formed. Subsequently, a dielectric layer, an electrode, or the like is formed by patterning, and the spare portion A for separating the unit panels P ₁ , P ₂ , P ₃ , and P _{4 from the} glass substrate 50 for the plasma display panel. By separating along, B), one glass substrate 50 eventually produces four unit panels P ₁ , P ₂ , P ₃ , and P ₄ .

Here, the above-described exhaust hole 51 is formed at a predetermined position of a zone for chamfering each unit panel P ₁ , P ₂ , P ₃ , P ₄ , and the glass substrate 50 for the plasma display panel of such exhaust hole. ) Is formed at a position where the formation process of the exhaust hole 51 can be easily performed. For example, each exhaust hole 51 is formed in the edge portion of the glass substrate 50 for the plasma display panel. The unit panels P ₁ , P ₂ , P ₃ , and P ₄ in which the exhaust holes 51 are formed will be described in more detail as shown in FIG. 6.

FIG. 6 is a diagram for describing the unit panel of FIG. 5 in more detail.

As shown in FIG. 6, the unit panel P ₁ or P ₂ of (a) has an exhaust hole 51 formed at an upper left portion, and the unit panel P ₃ or P ₄ of (b) has an air exhausted at a lower right portion thereof. The hole 51 is formed. As the portions in which the exhaust holes 51 are located are different from each other, the phosphor array structure of the unit panel is affected. For example, as shown in FIG. 6, assuming that phosphors are arranged in order of red (R), green (G), and blue (B), the unit panel P ₁ or P ₂ of (a) may have an exhaust hole 51. R, G, and B phosphors are arranged side by side, and in the unit panel P ₃ or P ₄ of (b), B, G, and R phosphors are arranged in line with the exhaust hole 51. As a result, the unit panel P ₁ or P ₂ of (a) and the unit panel P ₃ or P ₄ of (b) become unit panels of different structures. Accordingly, the management of the unit panel P ₁ or P ₂ of (a) and the management of the unit panel P ₃ or P ₄ of (b) should be made different. For example, the position of the exhaust pipe of the plasma display panel manufactured by the unit panel P ₁ or P ₂ of (a) is changed, and thus the position on the plasma display panel to which the driving circuit is attached is changed. As a result, the unit panel P ₁ or P ₂ of (a) and the unit panel P ₃ or P ₄ of (b) must go through different logistics systems, and must be manufactured as plasma display panels through different manufacturing processes.

For this reason, costs such as logistics costs, design costs, etc. are increased, which causes the manufacturing cost to rise rapidly.

In order to solve this problem, an object of the present invention is to provide a method for manufacturing a four-chamfered glass substrate for a plasma display panel in which exhaust holes are formed at the same position on each unit panel.

In order to achieve the above object, the present invention provides a method of manufacturing a four-chamfered glass substrate for a plasma display panel for chamfering a unit panel for manufacturing a plasma display panel, wherein the mother glass substrate is divided into four regions to form a unit panel. And dividing the unit panel into compartments and forming exhaust holes at the same positions in the unit panels divided into four areas.

The exhaust holes are each formed at any one corner portion of the area partitioned to form the unit panel.

The center of the exhaust hole is characterized in that spaced at a distance of 1mm or more and 50mm or less from the cutting surface for cutting the mother glass substrate or the mother glass substrate for each panel.

Hereinafter, a method of manufacturing a four chamfered glass substrate for a plasma display panel of the present invention will be described in detail with reference to the accompanying drawings.

7 is a view for explaining a method for manufacturing a four-chamfered glass substrate for a plasma display panel of the present invention.

As shown in FIG. 7, in the method of manufacturing a four chamfered glass substrate for a plasma display panel of the present invention, first, four mother glass substrates are formed to form four unit panels in a unit panel partitioning step S70. Partition into zones.

Thus, the formation position of the exhaust hole for connecting the exhaust pipe to the predetermined positions of the four areas divided by the unit panel partition step is specified (S71). When designating the positions for forming the exhaust holes, the positions of the exhaust holes are designated to be the same on each of the four areas.                     

The exhaust hole having a predetermined depth and diameter is drilled at the position specified in the exhaust hole formation position designation step at the position specified in step S71 (S72).

Here, a method of designating a position at which the exhaust hole is to be formed and forming the exhaust hole at the designated position will be described in more detail with reference to FIGS. 8A to 8D.

8A to 8D are diagrams for describing a method of forming an exhaust hole in more detail.

As shown in FIGS. 8A to 8D, the mother glass substrate 80 is divided into four regions P ₁ , P ₂ , P ₃ , and P ₄ for forming four unit panels. Exhaust holes 81 are formed in respective regions P ₁ , P ₂ , P ₃ , and P ₄ . In this case, the mother glass substrate 80 is divided according to the marginal portions A and B for dividing the unit panels P ₁ , P ₂ , P ₃ , and P ₄ . At this time, the formation positions of the exhaust holes 81 are the same in each of the four regions P ₁ , P ₂ , P ₃ , and P ₄ . Here, the formation position of the above-described exhaust hole 81 is located at each corner of any one of the _four regions described above, that is, the regions P ₁ , P ₂ , P ₃ , and P ₄ partitioned to form the unit panel. More preferably.

For example, referring to 8a, the exhaust holes 81 are formed at the upper left end of each of the _four regions P ₁ , P ₂ , P ₃ , and P ₄ . The position where the exhaust hole 81 is formed is a point on the ineffective surface of the plasma display panel. An example in which the exhaust holes 81 are formed in the upper right portions on each of the _four regions P ₁ , P ₂ , P ₃ , and P ₄ in this manner is shown in FIG. 8B. In addition, an example in which the exhaust hole 81 is formed at the lower right corner on each of the _four regions P ₁ , P ₂ , P ₃ , and P _{4 is} shown in FIG. 8C, respectively. ) Is shown in Fig. 8D.

Here, the position of the exhaust hole 81 in each of the areas P ₁ , P ₂ , P ₃ , and P ₄ partitioned to form the unit panel, the exhaust hole 81 is each area (P ₁ , P) ₂ , P ₃ , P ₄ ) should be located on an ineffective surface and the exhaust hole 81 has a diameter of a predetermined size, so that the center of the exhaust hole 81 is the edge of the mother glass substrate 80 or the mother glass substrate. It is formed so as to be spaced at a distance of 1 mm or more and 50 mm or less from the cutting surface for cutting by each region (P ₁ , P ₂ , P ₃ , P ₄ ) partitioned to form a unit panel.

In addition, in consideration of efficiency and workability in manufacturing the plasma display panel, the mother glass substrate 80 having the above-described exhaust hole 81 is preferably a mother glass substrate for manufacturing a back substrate.

In this manner, each region P ₁ , P ₂ , P ₃ , and P ₄ for partitioning the unit panel on which the exhaust hole 81 is formed will be described in more detail with reference to FIGS. 9A to 9D.

9A to 9D are diagrams for describing FIG. 8A to FIG. 8D in more detail for each region.

First, referring to 9a, the phosphor arrangement of each region P ₁ , P ₂ , P ₃ , and P _{4 in} which exhaust holes are formed by the method of FIG. 8A is illustrated. When the exhaust hole 81 is formed by the method of FIG. 8A, as shown in FIG. 9A, the enemy R side by side after the exhaust hole 81 in all regions P ₁ , P ₂ , P ₃ , and P ₄ . , Green (G) and blue (B) phosphors are arranged in this order. Similarly, when the exhaust hole 81 is formed by the method of FIG. 8B, red (R), green (G), and blue are formed in all regions P ₁ , P ₂ , P ₃ , and P ₄ as shown in FIG. 9B. (B) The exhaust holes 81 are positioned after the phosphors are arranged in order.

Further, as if presented in Figure 9c form the way to the exhaust hole 81 of Fig. 8c, all the areas _{(P 1, P 2, P} 3, P 4) in the red (R), green (G), and blue ( B) The exhaust holes 81 are positioned after the phosphors are arranged in sequence. In FIG. 9C, the exhaust holes are located at the lower right end of each region P ₁ , P ₂ , P ₃ , and P ₄ , unlike in FIG. 9B. 81 is located.

In addition, when the exhaust hole 81 is formed by the method of FIG. 8D, as shown in FIG. 9D, the enemy R is arranged side by side after the exhaust hole 81 in all regions P ₁ , P ₂ , P ₃ , and P ₄ . , Green (G) and blue (B) phosphors are arranged in order. In FIG. 9D, unlike the case of FIG. 9A, the exhaust holes 81 are disposed at the lower left of each region P ₁ , P ₂ , P ₃ , and P ₄ . ) Is located.

As a result, the unit panels of all the areas P ₁ , P ₂ , P ₃ , and P _{4 become} unit panels having a mode-like structure. Accordingly, management of the unit panels of all the areas P ₁ , P ₂ , P ₃ , and P ₄ may be integrated into one. For example, the plasma display panel manufactured from the unit panels of the regions P ₁ , P ₂ , P ₃ , and P ₄ may all have the same position of the exhaust pipe and the same position on the plasma display panel to which the driving circuit is attached. Do. As a result, the unit panels of all regions P ₁ , P ₂ , P ₃ , and P ₄ may be manufactured as plasma display panels through the same manufacturing process.

For this reason, costs such as logistics costs and design costs are reduced.

As described above, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features.

Therefore, the above-described embodiments are to be understood as illustrative and not restrictive in all respects, and the scope of the present invention is indicated by the appended claims rather than the detailed description, and the meaning and scope of the claims and All changes or modifications derived from the equivalent concept should be interpreted as being included in the scope of the present invention.

As described above in detail, the present invention forms an exhaust hole at the same position of each area partitioned by each unit panel of the four-chamfered glass substrate for plasma display panel, thereby reducing the cost of logistics, design, etc., It is effective in lowering the manufacturing cost.

Claims (3)

In the manufacturing method of a four-chamfered glass substrate for a plasma display panel for chamfering a unit panel for plasma display panel manufacturing, A unit panel partitioning step of partitioning a mother glass substrate into four regions to form the unit panel; Forming exhaust holes at the same positions in the unit panels divided into the four areas; Method of manufacturing a four chamfered glass substrate for a plasma display panel comprising a. The method of claim 1, And the exhaust hole is formed at each corner portion of the area partitioned to form the unit panel. The method according to claim 1 or 2, The center of the exhaust hole is a four-chamfered glass substrate for plasma display panel, characterized in that spaced apart from the edge of the mother glass substrate or the cutting surface for cutting the mother glass substrate for each unit panel by a distance of 1mm or more and 50mm or less. Way.

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