KR20060031919A - Liquid crystal display device and method for manufacturing the same - Google Patents

Abstract

The present invention relates to a liquid crystal display device and a method of manufacturing the same, which change the shape of the lower substrate corresponding to the column spacer, thereby strengthening the adhesion between the column spacer and the lower substrate, thereby preventing gravity defects, and the like. The liquid crystal display device includes a first substrate and a second substrate facing each other, a column spacer formed on the first substrate, recesses defined at predetermined portions corresponding to the column spacers on the second substrate, And a liquid crystal layer formed between the first and second substrates.

Poor gravity, column spacer, adhesion

Description

Liquid crystal display device and method for manufacturing the same

1 is a plan view showing a conventional liquid crystal display device

2 is a structural cross-sectional view taken along line II ′ of FIG. 1.

3A and 3B are a plan view and a cross-sectional view showing a state in which a touch stain occurs in the liquid crystal panel;

4A and 4B are plan views and cross-sectional views of a liquid crystal panel in which gravity failure occurs.

5 is a plan view of a liquid crystal display according to a first exemplary embodiment of the present invention.

6 is a plan view of a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 7 is a cross-sectional view taken along line IV-IV ′ of FIGS. 5 and 6.

* Description of symbols on the main parts of the drawings *

40: first substrate 42: gate insulating film

43: protective film 43a: hole (main part)

44: gate line 44a: gate electrode

45: data line 45a: source electrode

45b: drain electrode 46: pixel electrode

50 column spacer 55 liquid crystal layer

60 second substrate 61 black matrix layer

63: common electrode or overcoat layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display, and in particular, to change the shape of a lower substrate corresponding to a column spacer, to strengthen adhesion between the column spacer and the lower substrate, thereby preventing gravity defects and the like, and to manufacture the same. It is about a method.

As the information society develops, the demand for display devices is increasing in various forms, and in recent years, liquid crystal display devices (LCDs), plasma display panels (PDPs), organic electro luminescent displays (OLD), and vacuum (VFD) Various flat panel display devices such as fluorescent display have been studied, and some of them are already used as display devices in various devices.

Among them, LCD is the most widely used as the substitute for CRT (Cathode Ray Tube) for mobile image display device because of its excellent image quality, light weight, thinness, and low power consumption. In addition to the use of the present invention has been developed in various ways such as a television and a computer monitor for receiving and displaying broadcast signals.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. can do.

Such a liquid crystal display may be classified into a liquid crystal injection method and a liquid crystal dropping method according to its manufacturing method.

Here, the liquid crystal injection process will be briefly described as follows.

First, the container containing the liquid crystal material to be injected and the liquid crystal panel to inject the liquid crystal are placed in the chamber, and the pressure in the chamber is maintained in a vacuum state to remove moisture from the liquid crystal material or the inner wall of the container. Then, bubbles are de-included and the inner space of the liquid crystal panel is vacuumed.

The liquid crystal injection hole of the liquid crystal panel is immersed in or contacted with a container containing a liquid crystal material in a desired vacuum state, and then the pressure inside the chamber is changed from a vacuum state to an atmospheric pressure state, and the pressure inside the liquid crystal panel and the pressure of the chamber. By the difference, the liquid crystal material is injected into the liquid crystal panel through the liquid crystal injection hole.

There existed the following problems in the liquid crystal display device manufacturing method of such a liquid crystal injection system.

First, after cutting into a unit panel, the liquid crystal injection hole is immersed in the liquid crystal liquid by maintaining the vacuum state between the two substrates, so that the liquid crystal injection takes a lot of time, the productivity is reduced.

Second, in the case of manufacturing a large-area liquid crystal display device, when the liquid crystal is injected by the liquid crystal injection type, the liquid crystal is not completely injected into the panel, which causes a defect.

Third, since the process is complicated and time-consuming as described above, several liquid crystal injection equipment is required, which requires a lot of space.

Fourth, in the case of the ball spacer used in the liquid crystal display of the injection method, since the individual ball spacers are aggregated together and the sparkling galaxy defects are generated in a scattered state or are arranged in a scattered state, there is a problem of causing light leakage by rolling in the pixel. .

Accordingly, in order to overcome the problems of the liquid crystal injection method, a method of manufacturing a liquid crystal drop type liquid crystal display device in which a liquid crystal is dropped on one of two substrates and then the two substrates are bonded to each other has been developed.

In such a liquid crystal drop type liquid crystal display device, the bonding process is performed after the liquid crystal dropping, and when the ball spacer is used, the ball spacer rolls on the substrate surface together with the liquid crystal, and it may be difficult to maintain an appropriate cell gap. Accordingly, a column spacer is adhered to a predetermined portion on a substrate in a liquid crystal drop type liquid crystal display device.

Hereinafter, a liquid crystal drop type liquid crystal display including a column spacer will be described with reference to the accompanying drawings.

1 is a plan view illustrating a conventional liquid crystal display, and FIG. 2 is a structural cross-sectional view taken along line II ′ of FIG. 1.

As shown in FIGS. 1 and 2, a conventional liquid crystal display device includes a first substrate 1 and a second substrate 2, and a first substrate 1 and a second substrate 2 bonded to each other with a large space. It consists of a liquid crystal layer (not shown) injected in between.

In more detail, the first substrate 1 has a plurality of gate lines 4 formed in one direction at regular intervals to define a pixel region, and a predetermined interval in a direction perpendicular to the gate line 4. A plurality of formed data lines 5 are arranged. In addition, a pixel electrode 6 is formed in each pixel region, and a thin film transistor T is formed at a portion where each of the gate lines 4 and the data lines 5 intersect to form the thin film transistor. A data signal of the data line is applied to each pixel electrode 6 in accordance with the signal.

The thin film transistor corresponds to a gate electrode 4a protruding from the gate line 4, a semiconductor layer 17 having a shape covering the gate electrode 4a, and both sides of the semiconductor layer 17. And a source electrode 5a protruding from the data line 5 to be formed and a drain electrode 5b spaced apart from the predetermined interval.

In addition, a black matrix layer 7 is formed on the second substrate 2 to block light in portions other than the pixel region, and on the second substrate 2 including the black matrix layer 7. Color filter layers 8 for selectively expressing R, G, and B colors are formed for each region, and a common electrode 14 for realizing an image is formed on the color filter layers 8.

 A column for maintaining a cell gap in order to maintain a predetermined gap (cell gap) between the first and second substrates 1 and 2 at a predetermined portion on the common electrode 14. Spacer 20 is formed. Here, the column spacer 20 is formed at a portion corresponding to the upper side of the gate line 4.

Meanwhile, a gate line 4 is formed on the first substrate 1, and a gate insulating layer 15 is formed on the entire surface of the substrate including the gate line 4 to insulate the data line 5. The passivation layer 16 is formed on the gate insulating layer 15 to insulate the pixel electrode 6.

In addition, the second substrate 2 includes a black matrix layer 7 for covering non-pixel regions (gate lines, data lines, and thin film transistor regions) except the pixel region, and a color including the black matrix layer 7. The common electrode 14 formed on the entire surface of the second substrate 2 including the color filter layer 8 and the color filter layer 8 formed on the filter substrate 2 by corresponding R, G, and B pigments in sequence for each pixel region. ) Is formed.

In addition, two substrates 1 and 2 are formed on the common electrode 14 of the portion corresponding to the gate line 4 so that the column spacer 20 is positioned on the gate line 4. ) Is coalesced. In this case, the column spacer 20 is formed on the second substrate 2 by giving a height corresponding to a cell gap between the first and second substrates 1 and 2. Therefore, after bonding of the first and second substrates 1 and 2, the upper surface of the column spacer 20 comes into contact with the uppermost layer of the first substrate 1.

In the conventional liquid crystal display device as described above, the liquid crystal layer formed between the first and second substrates 1 and 2 is aligned by an electric field formed between the pixel electrode 6 and the common electrode 14. The amount of light passing through the liquid crystal layer may be adjusted according to the degree of alignment of the liquid crystal layer to express an image.

Such a manufacturing method of a conventional liquid crystal display device will be described below.

The manufacturing process of the liquid crystal display device is largely divided into an array process, a cell process, a module process, and the like.

In the array process, as described above, a TFT array including a gate line 4 and a data line 5, a pixel electrode 6, a thin film transistor, or the like is formed on the first substrate 1, and It is a process of forming the color filter array provided with the black matrix layer 7, the color filter layer 8, the common electrode 140, the column spacer 20, etc. in the 2 board | substrate 2.

In this case, the array process does not form one liquid crystal panel on one substrate, but rather designes a plurality of liquid crystal panels (a plurality of first and second substrates are defined) on one large glass substrate. TFT arrays and color filter arrays are formed in the regions, respectively.

In this manner, the TFT substrate (mother substrate of the first substrate) on which the TFT array is formed and the color filter substrate (mother substrate of the second substrate) on which the color filter array is formed are moved to the cell processing line.

Subsequently, an alignment process is applied to the TFT substrate and the color filter substrate, and an alignment process (rubbing process) is performed to ensure that the liquid crystal molecules have uniform orientation.

Here, the alignment process proceeds in order of washing before application of the alignment film, alignment film printing, alignment film firing, alignment film inspection, and rubbing process.

Subsequently, the TFT substrate and the color filter substrate are cleaned, respectively.

Subsequently, a liquid crystal is dropped in a predetermined region on one of the TFT substrate and the color filter substrate, and a seal pattern is formed on the outer portion of each liquid crystal panel region of the remaining substrate by using a dispensing device.

Subsequently, the substrate on which the liquid crystal is not dropped is inverted (inverted to face), the TFT substrate and the color filter substrate are pressed together, and the seal pattern is cured.

Subsequently, the bonded substrate is cut and processed for each liquid crystal panel.

In addition, the liquid crystal display device may be manufactured by inspecting appearance and electrical defects of the processed unit liquid crystal panel.

In the manufacturing method of the liquid crystal dropping system mentioned above, a column spacer is formed on a color filter substrate, a liquid crystal is dripped on a TFT substrate, two substrates are joined, and a liquid crystal panel is formed.

3A and 3B are a plan view and a cross-sectional view showing a state where a touch unevenness occurs in the liquid crystal panel.

As shown in FIG. 3A, when the surface of the liquid crystal panel 10 is swung in a predetermined direction while being touched with a finger or a pen, the upper substrate 2 of the liquid crystal panel 10 may be a finger or a pen as shown in FIG. 3B. The predetermined interval is shifted in this passing direction.

At this time, the columnar columnar spacer 20 is in contact with the upper and lower substrates 1 and 2, and the contact area is large, and the friction force generated between the column spacer 20 and the opposing substrate (lower substrate 1) is large. Therefore, after shifting in the touch direction, the upper substrate 2 has not been restored to its original state for a long time. In this case, the liquid crystal in the spot where the finger or the pen passes is scattered, and a phenomenon in which the liquid crystal collects in the peripheral region of the passed spot occurs. In this case, a portion where liquid crystals (filled in the space between the first and second substrates 1 and 2 except the column spacer 20) are collected around the touch may be a portion of another portion defined by the height of the column spacer 20. The cell gap h1 is higher than the cell gap h2, and liquid crystals are scattered in the touch area where a finger or a pen passes, and the touch area is not driven due to lack of liquid crystal and excessive liquidity in the touch area and the surrounding area of the touch area. And touch defects in which the boundary is observed as spots.

The reason why such a touch defect is observed in the liquid crystal display device in which the column spacer is formed is that the column spacer is fixed to one substrate and is in planar contact with the opposing substrate (upper surface contact), so that the substrate is compared with the conventional spherical ball spacer. This is because the area in contact with is wide.

4A and 4B are plan views and cross-sectional views of a liquid crystal panel in which gravity failure occurs.

As shown in FIG. 4A, the liquid crystal panel 10 may be defined by being divided into a display area in a dotted line display and a non-display area at an outside thereof. A thin film transistor array (formed on the first substrate 1) and a color filter array (formed on the second substrate 2) corresponding thereto are formed in the display area, and display is performed. In the non-display area, a gate driver ( The driving unit of the data driver (not shown) and the data driver (not shown), and the seal line 25 formed around the display area to join the first and second substrates 1 and 2 are disposed.

By the way, in the case of a liquid crystal panel in which a liquid crystal layer is formed in a dropping manner among these liquid crystal panels, a gravity failure is observed at the edge of the liquid crystal panel close to the ground, as shown in FIG. This is because, when the liquid crystal panel is placed in a high temperature state, the edge of the liquid crystal panel close to the ground bulges bulge by the property that the liquid crystal expands with temperature.

As shown in FIG. 4B, when the upper and lower sides of the liquid crystal panel 10 are cut off, the column spacer 20 positioned at the lower edge of the liquid crystal panel 10 supports the first and second substrates 1 and 2 by the expansion force of the liquid crystal. It does not, and the phenomenon which falls on the 1st board | substrate 1 arises. In particular, when the liquid crystal panel 10 is erected in a state in which the liquid crystal is dripped excessively, when the temperature rises, the gravity failure phenomenon in which the liquid crystal flows toward the ground close to the ground under the influence of gravity becomes severe.

When such a gravity failure occurs, a portion where gravity failure occurs is swelled, and the liquid crystal layer 3 has a different cell gap between a region where gravity failure occurs and a region where gravity failure does not occur.

On the other hand, the cause of the poor gravity is considered that the adhesion between the column spacer and the thin film transistor substrate is weak at the portion corresponding to the column spacer, the liquid crystal flows through this portion.

Conventional liquid crystal display devices including the column spacer as described above and manufactured by the liquid crystal dropping method have the following problems.

First, a problem occurs in that the touch part and its boundary part appear as uneven color when the liquid crystal panel surface is pushed in a predetermined direction.                         

Second, when the surface of the liquid crystal panel is upright, a gravity failure phenomenon occurs in which the liquid crystal swells at the bottom thereof. This is aggravated when the amount of liquid crystal is excessively filled and when the ambient temperature is high. In particular, when an excessive amount of liquid crystal is dropped in a liquid crystal dropping method in which a liquid crystal is dropped on one side of the substrate, it is very difficult to adjust an appropriate amount. It gets worse.

The present invention has been made to solve the above problems, the liquid crystal display device by changing the shape of the lower substrate corresponding to the column spacer, to strengthen the adhesion between the column spacer and the lower substrate to prevent the failure of gravity, etc. And to provide a method for producing the same.

The liquid crystal display device of the present invention for achieving the above object corresponds to the first substrate and the second substrate facing each other, the column spacer formed on the first substrate, and the column spacer on the second substrate It is characterized in that it comprises a liquid crystal layer formed between the recessed portion defined in a predetermined portion and the first and second substrates.

A color filter array is formed on the first substrate, and a thin film transistor array is formed on the second substrate.

The color filter array may be formed on the entire surface of the first substrate including the black matrix layer formed on a predetermined portion on the first substrate, the color filter layer formed on the first substrate including the black matrix layer, and the black matrix layer and the color filter layer. It comprises a common electrode.

The thin film transistor array may include a gate line and a data line vertically crossing each other on the second substrate to define a pixel region, a thin film transistor formed at an intersection of the gate line and the data line, and between the gate line and the data line. A gate insulating film interposed therebetween, a pixel electrode formed in the pixel region, and a protective film interposed between the data line and the pixel electrode.

The recess is a hole formed in the protective film and the gate insulating film.

The recess is formed to correspond to a portion of the surface where the column spacer contacts the second substrate.

The color filter array may be formed on the entire surface of the first substrate including the black matrix layer formed on a predetermined portion on the first substrate, the color filter layer formed on the first substrate including the black matrix layer, and the black matrix layer and the color filter layer. It comprises an overcoat layer.

The thin film transistor array may include a gate line and a data line vertically crossing each other on the second substrate to define a pixel region, a thin film transistor formed at an intersection of the gate line and the data line, and between the gate line and the data line. A gate insulating film interposed therebetween, a pixel electrode formed in the pixel region, and a protective film interposed between the data line and the pixel electrode.

The recess is a hole formed in the protective film and the gate insulating film.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of preparing a first, second substrate facing each other, forming a gate line and a gate electrode on the first substrate, Forming a gate insulating film on the first substrate including the gate line and the gate electrode, forming a semiconductor layer on the gate insulating film to cover the gate electrode, and forming a gate insulating film on the gate insulating film including the semiconductor layer. Forming a data line in a direction crossing the gate line in a predetermined region to define a pixel region, and forming a source electrode protruding from the data line and a drain electrode spaced apart from the predetermined data line; Forming a protective film on an entire surface of the gate insulating film including a drain electrode; Forming a first and a second hole by removing the passivation layer and the gate insulating layer on an upper part of the in-electrode and the upper portion of the gate line, and forming a pixel electrode in the pixel region to be in contact with the drain electrode through the first hole. Forming a black matrix layer on the second substrate; forming a color filter layer on the second substrate; and forming a black matrix layer on the entire surface of the second substrate including the black matrix layer and the color filter layer. Forming a common electrode, forming a column spacer on the second substrate so as to correspond to the second hole, forming a liquid crystal layer between the first and second substrates, and forming the first and second It is characterized in that it comprises a step of bonding the two substrates.

The first substrate corresponding area of the column spacer is larger than the cross section of the second hole.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of preparing a first and a second substrate facing each other, parallel to the gate line, gate electrode, the gate line on the first substrate; Forming a common line and a common electrode protruding from the common line, forming a gate insulating film on the first substrate including the gate line and the gate electrode, and covering the gate electrode on the gate insulating film Forming a semiconductor layer, defining a pixel region by forming a data line in a direction crossing the gate line at a predetermined portion on the gate insulating layer including the semiconductor layer, and a source electrode protruding from the data line; Forming drain electrodes spaced apart from each other, the data lines and sources / Forming a protective film on the entire gate insulating film including the drain electrode, removing the protective film and the gate insulating film on the upper portion of the drain electrode and the upper portion of the gate line to form first and second holes; Forming a pixel electrode in the pixel region to contact the drain electrode through one hole, forming a black matrix layer on the second substrate, and forming a color filter layer on the second substrate; Forming an overcoat layer on an entire surface of the second substrate including the black matrix layer and the color filter layer, forming a column spacer on the second substrate so as to correspond to the second hole, It is another feature that comprises the step of forming a liquid crystal layer between the two substrates and the step of bonding the first and second substrates.

The first substrate corresponding area of the column spacer is larger than the cross section of the second hole.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

Each embodiment described below relates to a liquid crystal display device in a twisted nematic mode (TN mode), and the latter relates to a liquid crystal display device in an in-plane switching (IPS mode) mode.

First Embodiment

FIG. 5 is a plan view of a liquid crystal display according to a first exemplary embodiment of the present invention, and FIG. 7 is a cross-sectional view taken along line IV-IV ′ of FIG. 5.

5 and 7, the liquid crystal display according to the first exemplary embodiment of the present invention relates to a twisted nematic mode, and includes a first substrate 40 and a second substrate 60 facing each other. The liquid crystal layer 55 filled between the first and second substrates 40 and 60 and the column spacer 50 and the first substrate 40 formed at predetermined portions of the second substrate 60 may be formed on the liquid crystal layer 55. And a recessed portion (or hole) 43a formed in a predetermined portion of the corresponding portion of the column spacer.

Hereinafter, the liquid crystal display according to the first embodiment of the present invention will be described in detail.

Thin film transistors formed on the first substrate 40 at the intersections of the gate lines 44 and the data lines 45 and the gate lines 44 and the data lines 45 that vertically cross each other to define pixel regions. (TFT), the gate insulating film 42 interposed between the gate line 44 and the data line 45, the pixel electrode 46 formed in the pixel region, the data line 45 and the pixel electrode ( A protective film 43 interposed between 46 is formed.

The thin film transistor corresponds to a gate electrode 44a protruding from the gate line 44, a semiconductor layer 47 having a shape covering the gate electrode 44a, and both sides of the semiconductor layer 47. It includes a source electrode 45a protruding from the data line 45 to be formed and a drain electrode 45b spaced apart from the predetermined interval.

Here, a hole 43a formed in the gate insulating layer 42 and the passivation layer 43 at a predetermined portion corresponding to the column spacer 50 is formed. Therefore, when the first and second substrates 40 and 60 are opposed to each other so that the column spacer 50 and the hole 43a correspond to each other, a vacuum is applied to a space of the empty hole 43a and the column spacer is provided. The contact force (adhesion force, adhesion) between the first substrate 40 facing 50 can be enhanced.

As described above, since the column spacer 50 is held in a vacuum on the first substrate 40 even when the liquid crystal is expanded due to an increase in temperature or an excessive amount of the liquid crystal is driven from the edge close to the ground, the column spacer ( 50 is hard to fall from the first substrate 40, so that the gravity failure that the space between the first and second substrates 40 and 60 bulges bulges significantly is reduced.

In addition, a black matrix layer 61 formed on a predetermined portion of the second substrate 60 corresponding to an area excluding the pixel region, and a color filter layer formed on the second substrate 60 corresponding to the pixel region (not shown). ), A common electrode 63 formed on the entire surface of the second substrate 60 including the black matrix layer 61 and the color filter layer, and a column spacer 50 formed on the first substrate 40. have.

Here, the upper surface (corresponding surface to the first substrate) of the column spacer 50 formed on the second substrate 60 is larger than the cross section of the recess 43a.

In addition, the manufacturing method of the liquid crystal display according to the first embodiment of the present invention described above is performed in the following order.

First, first and second substrates 40 and 60 facing each other are prepared.

Subsequently, a gate line 44 and a gate electrode 44a are formed on the first substrate 40.

Subsequently, a gate insulating layer 42 is formed on the first substrate 40 including the gate line 44 and the gate electrode 44a.

Subsequently, the semiconductor layer 47 is formed on the gate insulating layer 42 to cover the gate electrode 44a.

Subsequently, a data line 45 is formed at a predetermined portion on the gate insulating layer 42 including the semiconductor layer 47 in a direction crossing the gate line 44 to define a pixel area, and the data line 45 The source electrode 45a protruding from the () and the drain electrode 45b spaced apart from the predetermined distance are formed.

Subsequently, a passivation layer 43 is formed on the entire gate insulating layer 42 including the data line 45 and the source / drain electrodes 45a and 45b.

Subsequently, the passivation layer 43 and the gate insulating layer 42 at a predetermined portion of the drain electrode 45b and the gate line 44 are removed to remove the first and second holes (not shown). ).

Subsequently, a pixel electrode 46 is formed in the pixel area to contact the drain electrode 45b.

The second substrate 60 is formed as follows.

Subsequently, a black matrix layer 61 is formed on the second substrate 60.

Subsequently, a color filter layer (not shown) is formed on the second substrate 60.

Next, a common electrode 63 is formed on the entire surface of the second substrate 60 including the black matrix layer 61 and the color filter layer.

Subsequently, the column spacer 50 is formed on the second substrate 60 to correspond to the recess 43a.

Next, the liquid crystal layer 55 is formed between the first and second substrates 40 and 60.

Next, the first and second substrates 40 and 60 are bonded to each other.

Second Embodiment

FIG. 6 is a plan view of a liquid crystal display according to a second exemplary embodiment of the present invention, and FIG. 7 is a cross-sectional view taken along line IV to IV ′ of FIG. 6.

6 and 7, the liquid crystal display according to the second embodiment of the present invention is driven in an in-plane switching mode (IPS mode), and the first substrate 40 and the second substrate ( 60 and the column spacer 50 and the first substrate 40 formed at predetermined portions of the liquid crystal layer 55 and the second substrate 60 filled between the first and second substrates 40 and 60. And a recess portion 43a formed at a predetermined portion of a corresponding portion of the column spacer 50.

The difference from the above-described first embodiment is a mode difference, in which the pixel electrode 46 and the common electrode 48a are alternately formed on the first substrate 40 and formed on the second substrate 60. The difference is that the overcoat layer 63 is formed entirely in place of the common electrode.

Hereinafter, a liquid crystal display according to a second exemplary embodiment of the present invention will be described in detail.

Thin film transistors formed on the first substrate 40 at the intersections of the gate lines 44 and the data lines 45 and the gate lines 44 and the data lines 45 that vertically cross each other to define pixel regions. (TFT), the gate insulating film 42 interposed between the gate line 44 and the data line 45, the pixel electrode 46 and the common electrode 48a formed alternately in the pixel region, and A protective film 43 interposed between the data line 45 and the pixel electrode 46 is formed.

The thin film transistor corresponds to a gate electrode 44a protruding from the gate line 44, a semiconductor layer 47 having a shape covering the gate electrode 44a, and both sides of the semiconductor layer 47. It includes a source electrode 45a protruding from the data line 45 to be formed and a drain electrode 45b spaced apart from the predetermined interval.

The common line 48 is formed on the same layer as the gate line 44 in parallel with the gate line 44, and branches from the common line 48 to form the common electrode 48a.

The pixel electrode 46 is parallel to the common electrode 48a and is alternately formed.

Here, a hole 43a formed in the gate insulating layer 42 and the passivation layer 43 at a predetermined portion corresponding to the column spacer 50 is formed. Therefore, when the first and second substrates 40 and 60 are opposed to each other so that the column spacer 50 and the hole 43a correspond to each other, a vacuum is applied to a space of the empty hole 43a and the column spacer is provided. A contact force between the first substrate 40 opposite the 50 may be enhanced.

Since the column spacer 50 is held in a vacuum on the first substrate 40 even when an expansion of the liquid crystal occurs due to an increase in temperature or an excess of the liquid crystal is driven from the edge close to the ground, the column spacer 50 is It is hard to fall from the first substrate 40, and the gravity defect that the space between the first and second substrates 40 and 60 bulges bulges significantly is reduced.

In addition, a black matrix layer 61 formed on a predetermined portion of the second substrate 60 corresponding to an area excluding the pixel region, and a color filter layer formed on the second substrate 60 corresponding to the pixel region (not shown). ), A common electrode 63 formed on the entire surface of the second substrate 60 including the black matrix layer 61 and the color filter layer, and a column spacer 50 formed on the first substrate 40. have.

In addition, the manufacturing method of the liquid crystal display according to the second embodiment of the present invention described above is performed in the following order.

First, first and second substrates 40 and 60 facing each other are prepared.

Subsequently, a gate line 44, a gate electrode 44a, a common line 48 parallel to the gate line 44, and a common electrode protruding from the common line 48 are formed on the first substrate 40. 48a).

Subsequently, a gate insulating layer 42 is formed on the first substrate 40 including the gate line 44 and the gate electrode 44a.

Subsequently, the semiconductor layer 47 is formed on the gate insulating layer 42 to cover the gate electrode 44a.

Subsequently, a data line 45 is formed at a predetermined portion on the gate insulating layer 42 including the semiconductor layer 47 in a direction crossing the gate line 44 to define a pixel area, and the data line 45 The source electrode 45a protruding from the () and the drain electrode 45b spaced apart from the predetermined distance are formed.

Subsequently, a passivation layer 43 is formed on the entire gate insulating layer 42 including the data line 45 and the source / drain electrodes 45a and 45b.

Subsequently, the passivation layer 43 and the gate insulating layer 42 of the predetermined portion of the drain electrode 45b and the gate line 44 are removed to remove the first hole (not shown) and the second hole 43a. Form.

Subsequently, the pixel electrode 46 is formed in contact with the drain electrode 45b and alternately with the common electrode 48a in the pixel region.

The following manufacturing process is performed on the second substrate 60 facing the first substrate 40.

The black matrix layer 61 is formed on the second substrate 60.

Subsequently, a color filter layer (not shown) is formed on the second substrate 60.

Subsequently, an overcoat layer 63 is formed on the entire surface of the second substrate 60 including the black matrix layer 61 and the color filter layer.

Subsequently, column spacers 50 are formed on the overcoat layer 63 to correspond to the holes 43a.

Next, the liquid crystal layer 55 is formed between the first and second substrates 40 and 60.

Next, the first and second substrates 40 and 60 are bonded to each other.

The holes (or recesses 43a) formed in the present invention are formed together with the formation of the protective film hole on the drain electrode and opening of the gate pad or data pad. In this case, the width of the hole to be formed is smaller than the width and width of the upper surface of the column spacer (the surface opposite to the first substrate).

In this case, since the column spacer and the first substrate correspond to each other except for the hole, the contact area of the column spacer with the first substrate is actually a very small part, and the hole corresponds to the spacer and is held in a vacuum so as to correspond to the spacer. Enhances the adhesion between the column spacer and the first substrate.

The liquid crystal display of the present invention as described above and a method of manufacturing the same have the following effects.

First, by forming recesses in the portions of the first substrate corresponding to the column spacers, a vacuum is applied between the column spacers and the recesses when the first and second substrates are bonded, thereby strengthening the adhesion force so that the liquid crystals are caused by excessive liquid crystal dropping or temperature increase. Due to the expansion, the phenomenon in which the space between the first and second substrates bulges beyond the cell gap can be prevented.

Second, since the column spacer corresponding to the main portion contacts the first substrate in a considerably small area, the restoring force restored after the substrate is shifted to one side when the surface of the liquid crystal panel is touched is improved, so that poor touch may be improved. .

Claims (13)

A first substrate and a second substrate facing each other; A column spacer formed on the first substrate; Recesses defined on predetermined portions corresponding to the column spacers on the second substrate; And And a liquid crystal layer formed between the first and second substrates. The method of claim 1, The color filter array is formed on the first substrate, and the thin film transistor array is formed on the second substrate. The method of claim 2, The color filter array A black matrix layer formed on a predetermined portion on the first substrate; A color filter layer formed on the first substrate including the black matrix layer; And And a common electrode formed on an entire surface of the first substrate including the black matrix layer and the color filter layer. The method of claim 3, wherein The thin film transistor array A gate line and a data line crossing the second substrate perpendicularly to each other to define a pixel area; A thin film transistor formed at an intersection of the gate line and the data line; A gate insulating layer interposed between the gate line and the data line; A pixel electrode formed in the pixel area; And And a passivation layer interposed between the data line and the pixel electrode. The method of claim 4, wherein And the recess is a hole formed in the protective film and the gate insulating film. The method of claim 1, And the recess is formed to correspond to a portion of a surface where the column spacer contacts the second substrate. The method of claim 2, The color filter array A black matrix layer formed on a predetermined portion on the first substrate; A color filter layer formed on the first substrate including the black matrix layer; And And an overcoat layer formed on the entire surface of the first substrate including the black matrix layer and the color filter layer. The method of claim 7, wherein The thin film transistor array A gate line and a data line crossing the second substrate perpendicularly to each other to define a pixel area; A thin film transistor formed at an intersection of the gate line and the data line; A gate insulating layer interposed between the gate line and the data line; A pixel electrode formed in the pixel area; And And a passivation layer interposed between the data line and the pixel electrode. The method of claim 8, And the recess is a hole formed in the protective film and the gate insulating film. Preparing first and second substrates facing each other; Forming a gate line and a gate electrode on the first substrate; Forming a gate insulating film on the first substrate including the gate line and the gate electrode; Forming a semiconductor layer on the gate insulating layer to cover the gate electrode; Defining a pixel region by forming a data line in a direction crossing the gate line in a predetermined portion on the gate insulating layer including the semiconductor layer, and forming a source electrode protruding from the data line and a drain electrode spaced apart from the predetermined distance step; Forming a protective film on an entire surface of the gate insulating film including the data line and a source / drain electrode; Forming first and second holes by removing the passivation layer and the gate insulating layer on the drain electrode and the predetermined portion of the gate line; Forming a pixel electrode in the pixel region to contact the drain electrode through the first hole; Forming a black matrix layer on the second substrate; Forming a color filter layer on the second substrate; Forming a common electrode on an entire surface of the second substrate including the black matrix layer and the color filter layer; Forming a column spacer on the second substrate to correspond to the second hole; Forming a liquid crystal layer between the first and second substrates; And And bonding the first and second substrates together. The method of claim 10, And a first substrate corresponding area of the column spacer is larger than a cross section of the second hole. Preparing first and second substrates facing each other; Forming a gate line, a gate electrode, a common line parallel to the gate line, and a common electrode protruding from the common line on the first substrate; Forming a gate insulating film on the first substrate including the gate line and the gate electrode; Forming a semiconductor layer on the gate insulating layer to cover the gate electrode; A pixel region is defined by forming a data line in a direction crossing the gate line in a predetermined portion on the gate insulating layer including the semiconductor layer, and a source electrode protruding from the data line and a drain electrode spaced apart from the predetermined interval are formed. Doing; Forming a protective film on an entire surface of the gate insulating film including the data line and a source / drain electrode; Forming first and second holes by removing the passivation layer and the gate insulating layer on the drain electrode and the predetermined portion of the gate line; Forming a pixel electrode in the pixel region to contact the drain electrode through the first hole; Forming a black matrix layer on the second substrate; Forming a color filter layer on the second substrate; Forming an overcoat layer over the entire surface of the second substrate including the black matrix layer and the color filter layer; Forming a column spacer on the second substrate to correspond to the second hole; Forming a liquid crystal layer between the first and second substrates; And And bonding the first and second substrates together. The method of claim 12, And a first substrate corresponding area of the column spacer is larger than a cross section of the second hole.

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