KR20050055263A - Liquid crystal display and method of manufacturing the same - Google Patents

Abstract

Disclosed are a liquid crystal display and a method of manufacturing the same for reducing size. The first substrate is formed with a first groove that surrounds a central area where an image is displayed, and the second substrate faces the first substrate, and the first substrate has a shape corresponding to the first groove in an area corresponding to the first groove. Two grooves are formed, and the coupling member is formed in one of the first groove and the second groove to join the first and second substrates, and the liquid crystal is formed between the first substrate and the second substrate. Therefore, the seal line, which is a coupling member, does not overlap the alignment layer by the first and second grooves formed in the first substrate and the second substrate, so that the separation distance between the seal line and the alignment layer is unnecessary, thereby preventing a seal line defect. At the same time, the size of the liquid crystal display device can be reduced.

Description

Liquid crystal display and its manufacturing method {LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME}

The present invention relates to a liquid crystal display device and a manufacturing method thereof, and more particularly, to a liquid crystal display device and a method for manufacturing the same for reducing the size.

In general, a liquid crystal display device includes a liquid crystal display panel having a TFT substrate, a color filter substrate facing the TFT substrate, and a liquid crystal interposed between both substrates to determine whether light is transmitted as an electric signal is applied. In addition, the liquid crystal display device includes a backlight assembly configured under the liquid crystal display panel to provide light to the liquid crystal display panel.

The TFT substrate and the color filter substrate are firmly coupled by a predetermined coupling member. That is, as shown in FIG. 1, a seal line 110, which is a coupling member, is formed in an edge region of the TFT substrate 100. In this case, the seal line 110 has a predetermined distance d from the alignment layer 120 formed in the central region of the TFT substrate 100, and a sealant is applied to surround the alignment layer 120 at the outside. Is formed.

As such, in order to assemble the TFT substrate 100 and the color filter substrate 200 on which the seal lines 110 are formed, the color filter substrate 200 is positioned on the TFT substrate 100 as shown in FIG. 2A. . Subsequently, pressure is applied to the two substrates at the upper portion of the color filter substrate 200 and the lower portion of the TFT substrate 100 in order to bring the two substrates 100 and 200 into close contact with each other. The seal line 110 is cured to firmly bond the TFT substrate 100 and the color filter substrate 200.

In this case, as shown in FIG. 2B, the seal line 110 is laterally spread by the pressure applied to the two substrates 100 and 200, and the seal line 110 which is laterally spread is the TFT substrate 100 and the color filter substrate ( A portion of the alignment layers 120 and 210 formed in the yarn 200 are overlapped.

Therefore, the seal line 110 overlapping the alignment layers 120 and 210 serves as a pollution source of the liquid crystal interposed between the TFT substrate 100 and the color filter substrate 200. In addition, the alignment layers 120 and 210 formed on the TFT substrate 100 and the color filter substrate 200 may have a phenomenon such as agglomeration at their ends. As the alignment layers 120 and 210 and the seal line 110 overlap, the cell gap is poor. This is more likely to occur.

Therefore, in order to prevent the above problem from occurring, as shown in FIG. 1, the seal line 110 is formed with a sufficient distance d from the alignment layers 120 and 210. That is, the seal line was formed at a sufficient distance from the alignment film so as not to overlap the alignment film even when the seal line spreads laterally by the pressure applied to the TFT substrate and the color filter substrate.

Therefore, a problem arises in that the size of the liquid crystal display panel becomes large in order to secure a sufficient separation distance between the alignment layer and the seal line.

Accordingly, an object of the present invention is to provide a liquid crystal display for reducing the size while preventing the occurrence of overlap between the seal line and the alignment layer.

In addition, another object of the present invention is to provide a manufacturing method for manufacturing the above-described liquid crystal display device.

In order to achieve the above object, the first substrate of the present invention has a first groove formed around the central region where an image is displayed, and the second substrate faces the first substrate and corresponds to the first groove. A second groove having a shape corresponding to the first groove is formed in the coupling member, and the coupling member is formed in one of the first groove and the second groove to join the first and second substrates, and the liquid crystal is formed of the first substrate and the first substrate. It is formed between two substrates.

According to an embodiment of the present invention, a first substrate having a first groove formed around the central region where an image is displayed is formed, and a second substrate having a shape corresponding to the first groove in an area corresponding to the first groove, facing the first substrate. A second substrate on which grooves are formed is formed. Subsequently, a coupling member is formed in either the first groove or the second groove, the first substrate and the second substrate are coupled by the coupling member, and a liquid crystal layer is formed between the first substrate and the second substrate.

According to the present invention, the seal line, which is a coupling member, does not overlap the alignment layer by the first and second grooves formed in the first substrate and the second substrate, so that the separation distance between the seal line and the alignment layer is unnecessary. The size of the liquid crystal display device can be reduced while preventing phosphorus defects.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view conceptually showing the configuration of a liquid crystal display device according to the present invention, FIG. 4 is a plan view schematically showing the configuration of the TFT substrate shown in FIG. 3, and FIG. 5 is a configuration of the TFT substrate shown in FIG. Is a cross-sectional view schematically.

Referring to FIG. 3, a liquid crystal display according to the present invention includes an TFT substrate 300, a color filter substrate 400, and a liquid crystal layer 500 formed between the TFT substrate 300 and the color filter substrate 400. It includes a liquid crystal display panel 600 for displaying. In addition, the liquid crystal display according to the present invention further includes a light generating device 650 configured under the TFT substrate 300 to provide light to the TFT substrate 300 and the color filter substrate 400.

The liquid crystal display panel 600 is divided into a display area DA in which an image is displayed and a seal line area SA surrounding the display area DA from the outside.

The TFT substrate 300 is formed on the thin film transistor layer 320 and the thin film transistor layer 320 in which a plurality of thin film transistors (not shown) are formed in the display area DA on the first insulating substrate 310. The organic insulating layer 330 to be formed, the pixel electrode 340 formed on the organic insulating layer 330 and electrically connected to the thin film transistor layer 320, and the first electrode on which the pixel electrode 340 is formed. The first alignment layer 350 is formed on the entire surface of the insulating substrate 310. In this case, the organic insulating layer 330 and the first alignment layer 350 are formed in the seal line area SA as well as the display area DA.

The organic insulating layer 330 includes a first groove 335 formed in the seal line area SA. That is, as shown in FIGS. 4 and 5, the organic insulating layer 330 corresponding to the seal line area SA is partially removed from the first groove 335 to partially cover the display area DA. It is formed in the form of surroundings. In this case, the first groove 335 is formed to have a first width w1.

In addition, the first alignment layer 350 is formed by a flexography printing method on the organic insulating layer 330 having the first grooves 335. In detail, since the first alignment layer 350 is formed by printing the alignment layer forming material on the resin plate and printing the substrate, the first alignment layer 350 is not formed in the first groove 335. Therefore, the first alignment layer 350 has a shape in which a portion corresponding to the first groove 335 is removed by the first width w1.

Referring to FIG. 3 again, the color filter substrate 400 may include a color filter 420 formed in the display area DA on the second insulating substrate 410, and a planarization film formed on the color filter 420. Over Coating Layer (430), the common electrode 440 formed on the planarization layer 430, and the second alignment layer 450 formed on the entire surface of the second insulating substrate 410 on which the common electrode 440 is formed. It includes. The planarization layer 430 and the second alignment layer 450 may be formed in the seal line area SA as well as the display area DA.

The color filter 420 is composed of R (Red), G (Green), and B (Blue) color pixels that are expressed in a predetermined color by light. In this case, the color filter 420 further includes a black matrix 700 (see FIG. 7) or blocks the color pixels partially overlap each other to block light leaking from the color pixels.

The planarization layer 430 is disposed on the color filter 420 to remove the step formed between the color pixels of the color filter 420 and the black matrix, or the step formed between the partially overlapped color pixels. It is formed to a certain thickness.

In addition, the planarization layer 430 includes a second groove 435 formed at a position corresponding to the first groove 335 formed in the organic insulating layer 330. The second groove 435 is formed in the seal line area SA to surround the display area DA from the outside. In addition, the second groove 435 has the same first width w1 as the first groove 335. That is, the second groove 435 has the same shape as the first groove 335 as shown in FIGS. 4 and 5 and is formed at positions corresponding to each other.

The second alignment layer 450 is formed on the planarization layer 430 having the second grooves 435 by a flexographic printing method. Therefore, since the second alignment layer 450 is not formed in the second groove 435, the second alignment layer 450 may have the first width w1 at a portion corresponding to the second groove 435. As long as the shape is removed.

The TFT substrate 300 and the color filter substrate 400 having the above-described configuration are firmly coupled by the coupling member 550 formed in the seal line area SA. In this case, the coupling member 550 is a seal line formed by applying a sealant to a predetermined thickness, hereinafter referred to as a seal line.

The seal line 550 is formed in the first groove 335 formed on the TFT substrate 300. In this case, the seal line 550 has a predetermined height for maintaining a cell gap of a predetermined height between the TFT substrate 300 and the color filter substrate 400, and is greater than the first width w1. It is formed to have a small second width w2. Therefore, when pressure is applied from the top and the bottom to couple the TFT substrate 300 and the color filter substrate 400, the seal line 550 is an empty space inside the first and second grooves 435 and 445. Spreads. Therefore, the seal line 550 is prevented from spreading toward the first or second alignment layers 350 and 450 by the first and second grooves 335 and 435.

In order to combine the TFT substrate 300 and the color filter substrate 400 configured as described above, the color filter substrate 400 is first placed on the TFT substrate 300. Subsequently, pressure is applied to the lower portion of the TFT substrate 300 and the upper portion of the color filter substrate 400 to heat the two substrates 300 and 400 or irradiate ultraviolet rays. At this time, the seal line 550 formed in the first grooves 335 of the TFT substrate 300 is cured by heat or ultraviolet rays applied to the two substrates 300 and 400, so that the TFT substrate 300 and the color filter substrate 400 are firm. To be combined.

Here, the seal line 550 formed on the TFT substrate 300 spreads sideways only inside the first and second grooves 345 and 445 even when pressure is applied from the upper and lower portions to closely contact the two substrates 300 and 400. Or it does not spread to the second alignment layer 350 and 450 side. Therefore, a portion where the seal line 550 overlaps the first or second alignment layers 350 and 450 does not occur.

In addition, since the seal line 550 does not spread laterally by the first and second grooves 345 and 445, a separation distance between the seal line 550 and the first and second alignment layers 350 and 450 is unnecessary. .

Although the seal line 550 is formed in the first groove 335 of the TFT substrate 300 as an example, the seal line 550 is the second groove 435 of the color filter substrate 400. ), And the result is the same.

A method of manufacturing a liquid crystal display device according to the present invention having the above configuration will be described in detail with reference to the accompanying drawings.

6A to 6C are cross-sectional views illustrating a manufacturing process of the TFT substrate illustrated in FIG. 3.

As shown in FIG. 6A, a thin film transistor layer 320 including a plurality of thin film transistors having a gate electrode 322, a drain electrode 324, and a source electrode 326 is formed on the first insulating substrate 310. Form. Subsequently, a photosensitive organic insulating layer 330 such as an acrylic resin is coated on the entire surface of the first insulating substrate 310 on which the thin film transistor layer 320 is formed.

Referring to FIG. 6B, a first mask 360 having a predetermined pattern is formed on the organic insulating layer 420. In this case, the first mask 360 may include a first opening 362 corresponding to the seal line area SA and the drain electrode 324 to form the first groove 335 in the organic insulating layer 330. Has a second opening 364 for exposing a portion. Here, the first opening 362 has a form in which a slit pattern (not shown) for partially exposing the seal line area SA for forming the first groove 335 is formed.

Subsequently, the organic insulating layer 330 is exposed and then developed using a tetramethyl-ammonium hydroxide (TMAH) developer. Then, the first groove 335 is formed while the region exposed by the first opening 362 is removed from the organic insulating layer 330, and the contact hole 337 is formed in the region exposed by the second opening 364. ) Is formed.

Referring to FIG. 6C, the pixel electrode 340 is formed by depositing a transparent conductive film such as ITO or IZO on the organic insulating layer 330 and the contact hole 337 to a uniform thickness. The pixel electrode 340 is formed only in the display area DA, and is electrically connected to the drain electrode 324 of the thin film transistor layer 320 through the contact hole 337.

Subsequently, a first alignment layer 350 is formed on the entire surface of the first insulating substrate 310 on which the pixel electrode 340 is formed by a flexographic printing method. Here, the first alignment layer 350 is formed in the display area DA and the seal line area SA. This completes the TFT substrate.

7A to 7C are cross-sectional views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 3.

As shown in FIG. 7A, a black matrix 700 is formed on the second insulating substrate 410. Subsequently, a first photoresist (not shown) including a red dye or a red pigment is coated on the second insulating substrate 410 on which the black matrix 700 is formed to have a uniform thickness. Thereafter, the first photoresist is patterned to form an R color pattern. Next, after forming a second photoresist (not shown) including a green dye and a green pigment on the second insulating substrate 410, the second photoresist is patterned to form a G color pixel pattern. Subsequently, after forming a third photoresist (not shown) including a blue dye and a blue pigment on the second insulating substrate 410, the third photoresist is patterned to form a B pixel pattern.

Each of the color pixel patterns is spaced apart from the adjacent color pixel pattern at a predetermined interval on the black matrix 700. As a result, the color filter 420 including R, G, and B color pixels is completed on the second insulating substrate 410.

Subsequently, a planarization layer 430 made of an acrylic resin or a polyamide resin, which is one of the photosensitive organic insulating layers, is formed on the second insulating substrate 410 on which the color filter 420 and the black matrix 700 are formed. The planarization layer 430 is formed on the entire surface of the second insulating substrate 410, that is, the display area DA and the seal line area SA.

Referring to FIG. 7B, a second mask 460 having a predetermined pattern is formed on the planarization layer 430. In this case, the second mask 460 has a third opening 465 corresponding to the seal line area SA in order to form the second groove 435 in the planarization layer 430.

Subsequently, the planarization layer 430 is exposed and then developed using a tetramethyl-ammonium hydroxide (TMAH) developer. Then, the second groove 435 is formed in the planarization layer 430 while the region exposed by the third opening 465 is removed.

As illustrated in FIG. 7C, a transparent conductive film, such as ITO or IZO, is deposited on the planarization film 430 having the second groove 435 to a uniform thickness to form the pixel electrode 340 of the TFT substrate 300. ) To form a common electrode 440. In this case, the common electrode 440 is formed only in the display area DA.

Subsequently, a second alignment layer 450 is formed on the entire surface of the second insulating substrate 410 on which the common electrode 440 is formed by a flexo printing method. The second alignment layer 450 is formed in the display area DA and the seal line area SA. This completes the TFT substrate.

Herein, the color filter substrate in which the color pixels partially overlap the black matrix has been described as an example, but the same may be applied to the color filter substrate in which there is no black matrix and the color pixels overlap each other.

As described above, the present invention includes a first groove and a second groove formed in the seal line region of the TFT substrate and the color filter substrate, respectively. In this case, first and second alignment layers are not formed in the first and second grooves.

Therefore, after the seal line having a width smaller than the first and second grooves is formed in the first groove or the second groove, the pressure is applied to the two substrates to couple the TFT substrate and the color filter substrate. Since the seal line spreads only inside the first groove and the second groove, the seal line does not overlap the first and second alignment layers.

Therefore, the present invention does not overlap the seal line and the alignment layer, so that the separation distance between the seal line and the alignment layer is unnecessary, thereby reducing the size of the liquid crystal display device.

In addition, the present invention can prevent a portion of the seal line from overlapping the alignment layer, so that spots do not occur on the edge of the liquid crystal display panel, thereby improving display quality.

While the invention has been described with reference to the examples, those skilled in the art may variously modify and change the invention without departing from the spirit and scope of the invention as set forth in the claims below. You will understand.

1 is a plan view showing the configuration of a TFT substrate according to the prior art.

FIG. 2A is a view illustrating a state before pressing for coupling the color filter substrate and the TFT substrate of FIG. 1.

FIG. 2B is a view illustrating a state after pressing for coupling the color filter substrate and the TFT substrate of FIG. 1.

3 is a cross-sectional view conceptually illustrating a configuration of a liquid crystal display according to the present invention.

4 is a plan view schematically showing the configuration of the TFT substrate shown in FIG.

FIG. 5 is a cross-sectional view schematically showing the configuration of the TFT substrate shown in FIG. 3.

6A to 6C are cross-sectional views illustrating a manufacturing process of the TFT substrate illustrated in FIG. 3.

7A to 7C are cross-sectional views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 3.

* Description of the symbols for the main parts of the drawings *

300 TFT substrate 330 organic insulating film

335: first groove 350: first alignment layer

400: color filter substrate 430: planarization film

435: second groove 450: second alignment layer

550: Seal line

Claims (11)

A first substrate having a first groove formed around the central region where an image is displayed; A second substrate facing the first substrate and having a second groove having a shape corresponding to the first groove in a region corresponding to the first groove; A coupling member formed in one of the first groove and the second groove to join the first and second substrates; And And a liquid crystal formed between the first substrate and the second substrate. The liquid crystal display of claim 1, wherein the first and second grooves are formed to have a first width, and the coupling member is formed to have a second width smaller than the first width. The method of claim 1, wherein the first substrate Board An organic layer formed on an entire surface of the substrate and removing a portion of a region corresponding to the first groove; And And an alignment layer formed on an entire surface of the substrate on which the organic layer is formed, the alignment layer having a shape in which a portion corresponding to the first groove is removed. The method of claim 1, wherein the second substrate is Board; A planarization layer formed on an entire surface of the substrate and having a portion of a region corresponding to the second groove removed; And And an alignment layer formed on an entire surface of the substrate on which the planarization layer is formed, the alignment layer having a shape in which a portion corresponding to the second groove is removed. A first substrate having a first groove that surrounds a central region where an image is displayed, and a second groove that faces the first substrate and is opposite to the first substrate, and has a second groove corresponding to the first groove; Forming a second substrate; Forming a coupling member in one of the first groove and the second groove; Coupling the first substrate and the second substrate by the coupling member; And Forming a liquid crystal layer between the first substrate and the second substrate. The method of claim 5, wherein the forming of the first substrate is performed. Forming an organic insulating film on the substrate; Partially removing the organic insulating layer in a region corresponding to the first groove to form the first groove; And And forming an alignment layer having a shape in which a region corresponding to the first groove is removed on the entire surface of the organic insulating layer on which the first groove is formed. The method of claim 5, wherein the forming of the second substrate is performed. Forming a planarization film on the entire surface of the substrate; Partially removing the planarization film in a region corresponding to the second groove to form the second groove; And And forming an alignment layer having a shape in which a region corresponding to the second groove is removed on the entire surface of the planarization layer in which the second groove is formed. The method of claim 5, wherein the first and second grooves are formed to have a first width, and the coupling member is formed to have a second width smaller than the first width. A first substrate having a first groove that surrounds a central area where an image is displayed, and a second groove corresponding to the first groove in an area corresponding to the first groove and facing the first groove; Forming a second substrate having branches; Forming a coupling member in one of the first groove and the second groove; Forming a liquid crystal layer between the first substrate and the second substrate; And And coupling the first substrate and the second substrate by the coupling member. A first substrate having a first groove formed around the central region where an image is displayed; A second substrate facing the first substrate; A coupling member formed in the first groove to join the first and second substrates; And And a liquid crystal formed between the first substrate and the second substrate. The liquid crystal display of claim 10, wherein the second substrate has a second groove having a shape identical to that of the first groove in a region corresponding to the first groove.