KR20050028543A - Non-pb glass composition with low melting temperature for plasma display panel - Google Patents
Non-pb glass composition with low melting temperature for plasma display panel Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/19—Silica-free oxide glass compositions containing phosphorus containing boron
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C3/16—Silica-free oxide glass compositions containing phosphorus
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/16—Compositions for glass with special properties for dielectric glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/36—Spacers, barriers, ribs, partitions or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/38—Dielectric or insulating layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/38—Cold-cathode tubes
- H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
- H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current
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Abstract
Description
본 발명은 플라즈마 디스플레이 패널용 무연 저융점 유리 조성물에 관한 것으로, 보다 자세하게는 P2O5, ZnO, SnO의 주성분 그리고 나머지 첨가물로서 SiO 2 또는 B2O3를 포함하는 조성물에 관한 것이다.The present invention relates to a lead-free low melting glass composition for plasma display panels, and more particularly to a composition comprising SiO 2 or B 2 O 3 as the main component of P 2 O 5 , ZnO, SnO and the remaining additives.
플라즈마 디스플레이 패널(Plasma Display Panel 이하, PDP)은 He+Xe 또는 Ne+Xe 가스의 방전시 발생하는 147nm의 자외선에 의해 형광체를 발광시킴으로써 문자 또는 그래픽을 포함한 화상을 표시하게 된다. 이러한 PDP는 박막화와 대형화가 용이할 뿐만 아니라 최근의 기술 개발에 힘입어 크게 향상된 화질을 제공한다.Plasma display panels (PDPs) are used to display images including characters or graphics by emitting phosphors by 147 nm ultraviolet rays generated when discharge of He + Xe or Ne + Xe gas. Such a PDP is not only thin and easy to enlarge, but also greatly improved in quality due to recent technology development.
도 1을 참조하면, 어드레스 전극(11)이 실장된 하부 유리기판(12)과 유지전극쌍(13)이 실장되어진 상부 유리기판(14)을 구비하는 교류 구동방식의 PDP가 도시되어 있다. 어드레스 전극이 실장된 하부 유리기판 상에는 유전체 후막(15)과 방전셀들을 분할하는 격벽(16)이 형성된다. 유전체 후막과 격벽의 표면에는 형광체(17)가 도포된다. 형광체는 플라즈마 방전시 발생되는 자외선에 의해 발광함으로써 가시광선이 발생되게 한다. 유지전극쌍이 실장된 상부 유리기판(16)에는 유전층(17)과 보호막(18)이 순차적으로 형성된다. 유전층은 플라즈마 방전시 벽전하를 축적하게 되고, 보호막은 플라즈마 방전시 가스 이온의 스퍼터링으로부터 유지전극쌍과 유전층을 보호함과 아울러 이차전자의 방출효율을 높이는 역할을 한다. 이러한 PDP의 방전셀들에는 He+Xe 또는 Ne+Xe의 혼합가스가 봉입된다. Referring to FIG. 1, a PDP of an AC driving method including a lower glass substrate 12 on which an address electrode 11 is mounted and an upper glass substrate 14 on which a pair of sustain electrodes 13 are mounted is illustrated. On the lower glass substrate on which the address electrode is mounted, a partition wall 16 for dividing the dielectric thick film 15 and the discharge cells is formed. Phosphor 17 is applied to the surface of the dielectric thick film and the partition wall. The phosphor emits light by ultraviolet rays generated during plasma discharge, thereby causing visible light to be generated. The dielectric layer 17 and the passivation layer 18 are sequentially formed on the upper glass substrate 16 on which the sustain electrode pairs are mounted. The dielectric layer accumulates wall charges during the plasma discharge, and the protective layer protects the pair of sustain electrodes and the dielectric layer from sputtering of gas ions during the plasma discharge and increases the emission efficiency of the secondary electrons. The discharge cells of the PDP are filled with a mixed gas of He + Xe or Ne + Xe.
격벽은 방전셀간의 전기적·광학적 크로스토크(Crosstalk)를 방지하는 역할을 한다. 따라서, 격벽은 표시품질과 발광효율을 위한 가장 중요한 요소이며 패널이 대형화·고정세화됨에 따라 격벽에 대한 다양한 연구가 이루어지고 있다. 격벽 제조방법으로는 스크린 프린팅(Screen printing)법, 샌드 블라스팅(Sand blasting)법, 첨가(Additive), 감광성 페이스트법 및 LTCCM(Low Temperature Cofired Ceramic on Metal) 방법 등이 적용되고 있다.The partition wall prevents electrical and optical crosstalk between discharge cells. Therefore, the bulkhead is the most important factor for display quality and luminous efficiency, and as the panel is enlarged and fixed, various studies on the bulkhead have been made. As the barrier rib manufacturing method, a screen printing method, a sand blasting method, an additive, a photosensitive paste method, and a low temperature cofired ceramic on metal (LTCCM) method are applied.
한국공개특허 제2003-10416호는 Bi2O3 60 내지 75 중량%, B2O가 4 내지 15 중량%, SiO가 5 내지 8 중량%, P2O가 1 내지 18 중량%, Al2O가 1 내지 3 중량%, Zn가 2 내지 7 중량%, Ba가 1 내지 3 중량% 및 TiO가 0 내지 2 중량%의 조성을 갖는 무연 무알칼리 저융점 유리에 관한 기술을 소개하였고, 미합중국등록특허 제6,589,894호는 BaO 5 내지 40mol%, ZnO 20 내지 55mol%, B2O3 15 내지 50mol%, SiO2 0 내지 25mol%의 성분을 갖는 무연 무알칼리 저융점 유리에 관한 기술을 소개하였다.Korean Patent Publication No. 2003-10416 discloses 60 to 75% by weight of Bi 2 O 3 , 4 to 15% by weight of B 2 O, 5 to 8% by weight of SiO, 1 to 18% by weight of P 2 O, and Al 2 O. Introduced a technique for lead-free alkali-free low melting glass having a composition of 1 to 3% by weight, 2 to 7% by weight of Zn, 1 to 3% by weight of Ba and 0 to 2% by weight of TiO. 6,589,894 introduces a technique for lead-free, alkali-free low melting glass having components of 5 to 40 mol% BaO, 20 to 55 mol% ZnO, 15 to 50 mol% B 2 O 3 , and 0 to 25 mol% SiO 2 .
그러나, 종래의 플라즈마 디스플레이 패널에 사용되는 투명 유전체용, 봉착용, 격벽용, 백색 유전체용 유리 조성물들은 전후면 유리기판의 열적특성에 맞추어서 낮은 소성온도, 기판과 비슷한 선팽창계수, 적당한 유전상수 특성을 지닌 PbO, B2O3 및 SiO2를 주성분으로 하고 있다. 그러나, 현재 이들 유리조성들은 인체에 해롭고 환경오염에도 심각한 영향을 끼치는 PbO 성분이 다량 함유하고 있기 때문에 제품 폐기시 폐수 중의 산 또는 알칼리 용액과 화학 반응을 일으키게 되면 토양 및 수질 오염에 의한 환경 공해를 유발시키는 문제점이 있다.However, the glass compositions for transparent dielectric, sealing, bulkhead, and white dielectrics used in the conventional plasma display panel have low firing temperature, linear expansion coefficient similar to substrate, and proper dielectric constant characteristics in accordance with the thermal characteristics of the front and back glass substrates. It has PbO, B 2 O 3 and SiO 2 as its main component. However, these glass compositions contain a large amount of PbO, which is harmful to the human body and seriously affects the environmental pollution. Therefore, when the product is disposed of, chemical reactions with acid or alkaline solutions in the waste water may cause environmental pollution due to soil and water pollution. There is a problem.
따라서, 본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위한 것으로, PbO 성분을 전혀 사용하지 않음으로써 환경오염 문제를 해결하고, 낮은 소성온도를 가지며, 내수성이 강하고 적당한 선팽창계수 특성을 가지는 PDP에 요구되는 유리조성물을 제공함에 본 발명의 목적이 있다. Accordingly, the present invention is to solve the problems of the prior art as described above, solves the environmental pollution problem by using no PbO component at all, has a low firing temperature, has a high water resistance and has a suitable coefficient of linear expansion coefficient PDP It is an object of the present invention to provide the required glass composition.
본 발명의 상기 목적은 유리 조성물의 주성분이 P2O5 30 내지 50mol%, ZnO 20 내지 50mol%, SnO 15 내지 45mol%를 포함하여 이루어진 플라즈마 디스플레이 패널용 무연 저융점 조성물에 의해 달성된다.The above object of the present invention is achieved by a lead-free low melting point composition for a plasma display panel, wherein the main composition of the glass composition comprises 30 to 50 mol% P 2 O 5 , 20 to 50 mol% ZnO, and 15 to 45 mol% SnO.
본 발명은 중금속 특히, PbO 및 Bi2O3를 함유하지 않아 토양 및 수질 오염에 의한 환경오염 및 자연 생태계 파괴 등의 문제점을 해결할 수 있는 무연 투명 유전체 유리 조성물, 봉착용 유리 조성물, 격벽용 유리 조성물 및 백색 유전체 유리 조성물에 관한 것이다.The present invention does not contain heavy metals, in particular, PbO and Bi 2 O 3 lead-free transparent dielectric glass composition, sealing glass composition, partition glass composition that can solve problems such as environmental pollution and natural ecosystem destruction by soil and water pollution And white dielectric glass compositions.
본 발명의 상기 목적과 기술적 구성 및 그에 따른 작용효과에 관한 자세한 사항은 본 발명의 바람직한 실시예를 개시하고 있는 이하 상세한 설명에 의해 보다 명확하게 이해될 것이다.Details of the above objects and technical configurations and the effects thereof according to the present invention will be more clearly understood by the following detailed description which discloses preferred embodiments of the present invention.
먼저, 표 1에 나타낸 실시예의 조성을 통하여 각 성분에 따른 열적, 화학적 특성을 주로 알아보았다. First, the thermal and chemical properties of each component were mainly examined through the composition of the examples shown in Table 1.
<실시예><Example>
1. 실시 방법1. Implementation method
각각의 조성으로 배합하여 알루미나 도가니에 넣고 섭씨 1300도에서 20분 용융시킨 다음 분말 시료와 벌크시편을 제조하여 전이점, 연화점, 선팽창 계수, 내수성 등을 측정하여 표 1의 아래 부분에 나타내었다. 각 특성들에 대한 측정방법은 아래에 나타내었다.Each composition was mixed into an alumina crucible and melted at 1300 ° C. for 20 minutes, and then a powder sample and a bulk specimen were prepared. The transition point, softening point, linear expansion coefficient, and water resistance were measured and shown in the lower part of Table 1. The measurement method for each characteristic is shown below.
a) 전이점 (Tg) : DTA(Differential Thermal Analysis)를 이용하여 10℃/min 승온 속도로 섭씨 1100도까지 측정하였다. a) Transition point (Tg): Measured to 1100 degrees Celsius at a rate of temperature increase of 10 ℃ / min using DTA (Differential Thermal Analysis).
b) 연화점 (Ts) : 비스코메터(Viscometer)를 이용하여 25℃/min 승온 속도로 측정하였다. 시편 크기는 3mm×3mm×2㎜로 성형하여 연마한다.b) Softening point (Ts): It was measured at a temperature increase rate of 25 ℃ / min using a viscometer (Viscometer). The specimen size is molded to 3 mm x 3 mm x 2 mm and polished.
c) 선팽창 계수(CTE) : TMA(Thermal mechanical analyser)를 이용하여 5℃/min 승온 속도로 측정하였다. 시편 크기는 5mm×5mm×5mm로 성형하여 연마한다. c) Linear expansion coefficient (CTE): measured at a temperature of 5 ℃ / min using a thermal mechanical analyzer (TMA). Specimen size is molded by grinding 5mm × 5mm × 5mm.
d) 내수성 측정 : 제조된 벌크유리를 90℃의 증류수 속에 36시간 동안 정치 후 꺼내어 중량의 변화를 측정하였다. d) Water resistance measurement: The prepared bulk glass was taken out after standing in distilled water at 90 ° C. for 36 hours, and the change in weight was measured.
2. 성분변화에 따른 물성 변화2. Changes in physical properties due to changes in composition
a) P2O5는 유리를 구성하기 위한 필수성분인 유리 형성 산화물로서, 본 연구에 사용된 PSZ(P2O5-SnO-ZnO)계에서는 P2O5의 양이 35mol%일 때 유리 형성에 있어서 가장 안정하고 차후에 논의될 내수특성에 있어서도 양호한 특성을 나타내기에 그 양을 35mol%로 고정하여 실험이 진행되었다. P2O5 함량에 있어서 전체 유리 조성물 100mol%에 대해 30mol% 미만이면 부분적 결정화 또는 전체적인 결정화가 나타났으며, 또한 50mol% 이상인 경우 내수성이 현저하게 나빠지는 특성을 보였다.a) P 2 O 5 is a glass-forming oxide which is an essential component for constituting glass, and in the PSZ (P 2 O 5 -SnO-ZnO) system used in the present study, when the amount of P 2 O 5 is 35 mol% The experiment was carried out by fixing the amount to 35 mol% because it was the most stable in forming and showed good characteristics in the water resistance characteristics which will be discussed later. When the content of P 2 O 5 was less than 30 mol% with respect to 100 mol% of the total glass composition, partial crystallization or total crystallization was observed, and when it was 50 mol% or more, water resistance was remarkably deteriorated.
b) ZnO는 본 발명에 따른 조성물에서 유리를 안정화시키는데 효과가 있다. 전체 유리조성물 100중량%에 대해 20 내지 50mol% 범위에서 투명한 유리가 형성되었다. b) ZnO has an effect on stabilizing the glass in the composition according to the invention. Transparent glass was formed in the range of 20 to 50 mol% with respect to 100 wt% of the total glass composition.
c) SnO는 유리 수식제로 작용하여 유리 전이점과 연화온도를 저하시키고 선팽창계수를 증가시킨다. 45mol% 이상에서 10 이상의 선팽창 계수 값을 갖게 한다. c) SnO acts as a glass modifier to decrease the glass transition point and softening temperature and increase the coefficient of linear expansion. It has a coefficient of linear expansion of 10 or more at 45 mol% or more.
d) SiO2는 유리 형성제로 유리 전이점을 높이는 역할을 한다. 10mol% 이상에서는 현저한 내수성의 감소를 초래한다.d) SiO 2 serves as a glass former to increase the glass transition point. Above 10 mol% results in a significant decrease in water resistance.
e) B2O3는 유리 형성제로 SiO2 와 같이 유리전이점을 높이는 역할을 하고, 유리 전이점 이후에 결정화 피크가 없는 안정한 유리를 얻을 수 있게 도와 준다.e) B 2 O 3 is a glass former, which acts to increase the glass transition point like SiO 2, and helps to obtain a stable glass free of crystallization peaks after the glass transition point.
표 1에서 보는 바와 같이, 본 발명의 유리 산화물의 조성에 있어서 P2O5의 양을 35mol%로 고정하였다. 이러한 이유는 P2O5의 양이 35mol%를 넘어가게 되면 수화반응을 일으켜 내수화성이 약해지고 30mol% 이하부터는 결정화가 일어나기 쉽기 때문이다. 참고로 비교예를 살펴보면 P2O5의 양이 35mol%일 경우가 40 내지 45mol%일 경우보다 내수화성이 2배 가까이 좋다는 것을 알 수 있다.As shown in Table 1, the amount of P 2 O 5 in the composition of the free oxide of the present invention was fixed at 35 mol%. This is because when the amount of P 2 O 5 exceeds 35 mol%, a hydration reaction occurs, so that the water resistance is weak and crystallization tends to occur from 30 mol% or less. For reference, when looking at the comparative example it can be seen that the case of the amount of P 2 O 5 35 mol% is nearly two times better water resistance than the case of 40 to 45 mol%.
실시 예 1 내지 4까지는 SnO의 양을 변화시켰는데 SnO의 양이 증가될수록 전이점과 연화점은 낮아지는 반면 열팽창계수의 값이 증가하는 경향을 나타냈다. 이는 이온장 세기가 0.41인 2가의 Sn이 0.52인 Zn보다 작기 때문에 모상 유리에 Sn이 들어감에 따라서 비-가교 산소의 수가 Zn의 함량이 많을 때보다 늘어남으로써 유리의 구조가 끊어져서이다. 한편 형성 유리의 안정성으로 표현될 수 있는 Tc-Tg(결정화온도-전이점)값에 있어서도 SnO의 증가에 따라 유리의 안정성의 증가를 기대할 수 있다.In Examples 1 to 4, the amount of SnO was changed, but as the amount of SnO was increased, the transition point and softening point were lowered, but the coefficient of thermal expansion tended to increase. This is because the structure of the glass is broken by increasing the number of non-crosslinked oxygen than when the content of Zn increases as Sn enters into the mother glass because the divalent Sn having an ion field strength of 0.41 is smaller than Zn having 0.52. On the other hand, the Tc-Tg (crystallization temperature-transition point) value, which can be expressed as the stability of the formed glass, can be expected to increase the stability of the glass with the increase of SnO.
실시 예 5 내지 8에서는 유리 형성제로 B2O3 및 SiO2를 첨가하였는데 B 2O3의 경우 양을 늘릴수록 전이점이 440℃까지 증가하여 투명 유전체의 소성온도에 적용 가능한 값이 되었지만 6 이하의 낮은 열팽창계수 값을 나타내었다. SiO2의 양을 늘릴수록 B2O3의 첨가에서와 같이 전이점은 어느 정도 증가하였으나 낮은 열팽창 값을 나타내었고 수화반응이 많이 일어나 급격한 내수성의 감소를 초래하였다. 이 때 Al2O3를 추가적으로 첨가(표 1에는 명시 안함)하면 수화반응을 억제할 수 있다.In Examples 5 to 8, B 2 O 3 and SiO 2 were added as glass formers. In the case of B 2 O 3 , the transition point increased to 440 ° C. as the amount was increased, which was applicable to the firing temperature of the transparent dielectric material. Low coefficient of thermal expansion was shown. As the amount of SiO 2 increased, the transition point increased to some extent as in the addition of B 2 O 3 , but showed a low thermal expansion value and caused a lot of hydration reactions, leading to a rapid decrease in water resistance. At this time, the addition of Al 2 O 3 (not specified in Table 1) can inhibit the hydration reaction.
상세히 설명된 본 발명에 의하여 본 발명의 특징부를 포함하는 변화들 및 변형들이 당해 기술 분야에서 숙련된 보통의 사람들에게 명백히 쉬워질 것임이 자명하다. 본 발명의 그러한 변형들의 범위는 본 발명의 특징부를 포함하는 당해 기술 분야에 숙련된 통상의 지식을 가진 자들의 범위 내에 있으며, 그러한 변형들은 본 발명의 청구항의 범위 내에 있는 것으로 간주된다.It will be apparent that changes and modifications incorporating features of the invention will be readily apparent to those skilled in the art by the invention described in detail. It is intended that the scope of such modifications of the invention be within the scope of those of ordinary skill in the art including the features of the invention, and such modifications are considered to be within the scope of the claims of the invention.
따라서, 본 발명의 플라즈마 디스플레이 패널용 무연 저융점 조성물은 P2O5, ZnO 및 SnO을 주성분으로 하는 무연 유리 조성물을 제조함으로써 환경오염 문제를 해결하고 낮은 소성온도, 높은 내수성, 유효한 선팽창계수를 갖는 플라즈마 디스플레이 패널용 유리 조성물을 제조할 수 있는 효과가 있다.Accordingly, the lead-free low melting point composition for plasma display panel of the present invention solves the environmental pollution problem by preparing a lead-free glass composition mainly composed of P 2 O 5 , ZnO and SnO and has a low firing temperature, high water resistance, and effective coefficient of linear expansion There exists an effect which can manufacture the glass composition for plasma display panels.
도 1은 종래 기술에 의한 PDP의 구조 단면도.1 is a structural cross-sectional view of a PDP according to the prior art.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100929291B1 (en) * | 2005-10-03 | 2009-11-27 | 파나소닉 주식회사 | Plasma display panel |
| EP2151872A1 (en) * | 2007-05-30 | 2010-02-10 | Asahi Glass Company, Limited | Glass for optical device covering, glass-covered light-emitting element, and glass-covered light-emitting device |
| US8227988B2 (en) | 2008-09-11 | 2012-07-24 | Samsung Sdi Co., Ltd | Material for forming barrier ribs, barrier ribs formed using the material and PDP comprising the barrier ribs |
| US20150028291A1 (en) * | 2013-07-25 | 2015-01-29 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display apparatus |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100929291B1 (en) * | 2005-10-03 | 2009-11-27 | 파나소닉 주식회사 | Plasma display panel |
| EP2151872A1 (en) * | 2007-05-30 | 2010-02-10 | Asahi Glass Company, Limited | Glass for optical device covering, glass-covered light-emitting element, and glass-covered light-emitting device |
| EP2151872A4 (en) * | 2007-05-30 | 2012-12-05 | Asahi Glass Co Ltd | Glass for optical device covering, glass-covered light-emitting element, and glass-covered light-emitting device |
| US8227988B2 (en) | 2008-09-11 | 2012-07-24 | Samsung Sdi Co., Ltd | Material for forming barrier ribs, barrier ribs formed using the material and PDP comprising the barrier ribs |
| US20150028291A1 (en) * | 2013-07-25 | 2015-01-29 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display apparatus |
| US9324967B2 (en) * | 2013-07-25 | 2016-04-26 | Samsung Display Co., Ltd. | Method of manufacturing organic light-emitting display apparatus |
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