KR200475173Y1 - Hole cleaning apparatus of vacuum chamber for organic light emitting diode manufacture - Google Patents

Abstract

The present invention discloses a hole cleaning apparatus for a vacuum chamber for manufacturing an organic light emitting diode, which is suitable for hole cleaning of a vacuum chamber used for manufacturing an organic light emitting diode. A hole cleaning apparatus for a vacuum chamber for manufacturing an organic light emitting diode according to the present invention includes a main body including a control unit, a spray gun connected to the main body at one end, a cleaning liquid supply unit connected to the spray gun, A suction cover installed at the other end of the spray gun for blocking scattering of a cleaning liquid sprayed from the nozzle, and a suction cover disposed at the other end of the spray gun to prevent scattering of the cleaning liquid sprayed from the nozzle, And a suction pipe extending to an inner side thereof.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a vacuum cleaning chamber for an organic light emitting diode,

The present invention relates to a cleaning apparatus, and more particularly, to a hole cleaning apparatus for a vacuum chamber for manufacturing an organic light emitting diode, which is suitable for cleaning a hole in a vacuum chamber used for manufacturing an organic light emitting diode.

An organic light emitting diode (OLED) device is a self-luminous type device using a principle that electrons and holes combine in an organic layer when a current flows through a fluorescent or phosphorescent organic thin film, and light is emitted by a backlight. The display device is evaluated as a display device optimized for moving images because the response speed is faster and the color reproduction rate and contrast ratio are higher than that of a liquid crystal display (LCD) device. In particular, since OLED devices do not require a separate light source such as a backlight, they have the advantage of being able to reduce bulk and weight compared to LCD devices.

In such an OLED device, the organic material layer includes a plurality of functional layers such as a hole injection layer, a hole transport layer, a light emitting material layer, an electron transport layer, and an electron injection layer, and the light emitting performance is improved through combination and arrangement of such functional layers .

On the other hand, such OLED devices are generally formed by depositing the above-mentioned functional layers on a substrate through a chemical vapor deposition (CVD) process. Here, the deposition process is usually performed in a closed vacuum chamber for deposition efficiency and prevention of contamination, and the inside of the vacuum chamber must be kept clean at all times. This is because, when chemical contaminants such as impurities or reaction residues introduced from the outside are left adsorbed on the inner surface of the vacuum chamber, the contaminants may contaminate the deposition layer formed on the substrate in the deposition process, .

Particularly, in recent years, since the display device has become large-sized and circuits are highly integrated, a fine and precise vapor deposition layer is required, and therefore, the cleaning of the vacuum chamber in which the vapor deposition process is performed is most important. Particularly, since the vacuum chamber used in the manufacturing process of the OLED device uses an organic substance instead of an inorganic substance as a coating material in the manufacturing process, when a certain time passes after the coating process, the organic substance remaining adsorbed on the inner surface of the vacuum chamber, , It is recognized that the removal of such contaminants is a very important problem to judge the success or failure of the OLED industry.

Accordingly, in order to remove contaminants adsorbed to the vacuum chamber used in the deposition process, cleaning and cleaning processes such as high pressure cleaning, steam cleaning and chemical cleaning using a detergent are performed on the vacuum chamber before and after the deposition process.

However, since the conventional cleaning and cleaning process mainly proceeds to remove contaminants remaining on the inner wall of the vacuum chamber, it is difficult to remove contaminants remaining in the inner wall holes of the vacuum chamber, that is, Is not properly done.

On the other hand, in order to remove contaminants remaining in the holes of the vacuum chamber, the cleaning is performed with a cotton swab, air or steam, but since the thread is formed on the inner wall of the hole, Such as electrolytic solution and cutting oil, remain unremoved and remain, which may result in product defects due to fine residual contaminants remaining in the holes of the vacuum chamber.

Patent Registration No. 10-1098968 Patent Document 1:

SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a hole cleaning apparatus for a vacuum chamber for manufacturing an OLED capable of effectively removing contaminants remaining in holes of a vacuum chamber.

According to another aspect of the present invention, there is provided an apparatus for cleaning a hole in a vacuum chamber for manufacturing an OLED, the apparatus comprising: An enclosing body; A spray gun whose one end is connected to the main body; A cleaning liquid supply unit connected to the spray gun to supply a cleaning liquid into the spray gun; A nozzle coupled to the other end opposite to one end of the spray gun; A suction cover installed at the other end of the spray gun to block scattering of the washing liquid sprayed from the nozzle; And a suction pipe extending from the outside of the suction cover to the inside thereof.

The hole cleaning apparatus for a vacuum chamber for manufacturing an OLED according to the present invention may further include an adsorption plate installed at an end of the suction cover to be adsorbed on an inner wall of a vacuum chamber including a hole to be cleaned.

In the hole cleaning apparatus for a vacuum chamber for manufacturing an OLED according to the present invention, the cleaning liquid supply unit may include a neutralizer unit, a cleaner unit, a pure water unit, an IPA unit, and an air unit.

In the hole cleaning apparatus for a vacuum chamber for manufacturing an OLED according to the present invention, the neutralizer unit, the detergent unit, the pure water unit, the IPA unit and the air unit are respectively provided with first to fifth Tank; First to fifth connecting pipes connecting the first to fifth tanks and the spray gun, respectively; And first to fifth valves installed in the first to fifth connection pipes, respectively.

In a hole cleaning apparatus for a vacuum chamber for manufacturing an OLED according to the present invention, the neutralizing agent includes a soda solution composed of sodium carbonate (Na2CO3) or sodium bicarbonate (NaHCO3), and the cleaning agent includes phosphoric acid (H2PO4) and sulfuric acid Based on the total weight of the solution.

The present invention provides a dedicated cleaning device for removing contaminants remaining in the holes of a vacuum chamber, so that it is possible to cleanly remove contaminants remaining in the holes as well as mountains of holes or taps of the vacuum chamber.

Therefore, the present invention can keep the inside of the vacuum chamber clean by preventing the contaminants from remaining in the holes as well as the inner wall of the vacuum chamber, thereby preventing the contamination by the residues when depositing the organic layer The quality of the OLED device can be ensured.

In addition, the hole cleaning apparatus of the present invention can be easily applied to the hole cleaning of an LCD device other than an OLED, a plasma display panel (PDP) device, and a vacuum chamber for manufacturing a semiconductor device, and reliability of these devices can be ensured .

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view illustrating a hole cleaning apparatus for a vacuum chamber for manufacturing an organic light emitting diode according to the present invention; FIG.
BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an organic light emitting diode (OLED).

BRIEF DESCRIPTION OF THE DRAWINGS The above objects, features and advantages of the present invention will be more readily understood through the following embodiments with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are provided so that this disclosure will be thorough and complete, and will fully convey the concept of this invention to those skilled in the art.

In this specification, when an element is referred to as being on another element, it may be directly formed on another element, or a third element may be interposed therebetween. Further, in the drawings, the thickness of the components is exaggerated for an effective description of the technical content.

Where the terms first and second are used herein to describe components, these components should not be limited by such terms. These terms are merely used to distinguish one element from another. The embodiments described and exemplified herein also include their complementary embodiments.

Further, when it is mentioned that the first component is operated or executed on the second component, the first component may be operated or executed in an environment where the second component is operated or executed, or may be directly or indirectly It should be understood that it is operated or executed through interaction.

The terminology used herein is for the purpose of illustrating embodiments and is not intended to limit the scope of the present invention. In the present specification, the singular form includes plural forms unless otherwise specified in the specification. That is, 'comprises' and / or 'comprising', as used herein, means that the recited element does not exclude the presence or addition of one or more other elements.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

It should be noted that the component shapes and the like in the drawings may be exaggerated in order to emphasize a clearer description, and the same members are denoted by the same reference numerals in the drawings. In addition, in some cases, it is commonly known in the art of designing that parts of the design that are not significantly related to the design do not describe the design to prevent chaos from happening without reason.

1 is a cross-sectional view showing a hole cleaning apparatus of a vacuum chamber for manufacturing an OLED according to the present invention.

As shown in the drawing, the hole cleaning apparatus 100 for a vacuum chamber for manufacturing an OLED according to the present invention includes a body 10, a spray gun 20, a cleaning liquid supply unit 30, a nozzle 40, a suction cover 50 and a suction pump 60. In addition, the hole cleaning apparatus 100 of the vacuum chamber for manufacturing an OLED according to the present invention may further include a suction plate 70.

The main body 10 is a kind of arm, for example, connected to a transfer robot in an automation device, and can support the cleaning device 100 of the present invention. Alternatively, the main body 10 may be a part that the operator grasps with the hand in the manual device. The main body 10 may be provided to have a bar shape and various operation buttons for spraying neutralizing agent (or antacid), cleaning agent, pure water, IPA (isopropylene alcohol) Can be provided. Accordingly, the main body 10 may include a control unit. Here, the shape and function of the main body 10 can be varied in design.

The spray gun 20 is a portion into which a neutralizing agent (or an antacid), a cleaning agent, pure water, IPA, and air flow, and has one end and the other end opposite to the one end, and one end is connected to the main body 10. The spray gun 20 may be a circular or polygonal tubular shape having an inner hollow although not shown in detail. A neutralizing agent (or an antacid), a cleaning agent, a pure water, an IPA And holes through which air is introduced.

The cleaning liquid supply unit 30 is provided for supplying a neutralizing agent (or antacid), a cleaning agent, pure water, IPA and air to the holes of the vacuum chamber to be cleaned. The neutralizing agent unit 31, the detergent unit 32, 33, an IPA unit 34, and an air unit 35. Here, the neutralizing agent (or antacid) is used to remove contaminants such as oil remaining in the holes, and may contain a soda solution such as sodium carbonate (Na2CO3) or sodium bicarbonate (NaHCO3). The detergent may be an alkaline solution mixed with phosphoric acid (H2PO4) and sulfuric acid (H2SO4), for example, at a ratio of 9: 1 for cleaning the hole portion, and the detergent is supplied at a temperature of approximately 60 & The contaminants remaining in the holes of the vacuum chamber are cleaned.

The neutralizer unit 31 includes a first tank 31a containing a neutralizing agent (or an antacid), a first connecting pipe 31b connecting the first tank 31a and the spray gun 20, And a first valve 31c provided at a predetermined portion of the connection pipe 31b and opening and closing the flow of the neutralizing agent flowing from the first tank 32a into the spray gun 20 through the first connection pipe 31b .

The detergent unit 32 includes a second tank 32a containing a detergent, a second connection pipe 32b connecting the second tank 32a and the spray gun 20, and a second connection pipe 32b connecting the second tank 32a and the spray gun 20. [ And a second valve 32c which is provided at a predetermined portion and opens and closes the flow of the cleaning agent flowing into the spray gun 20 from the second tank 32a through the second connection pipe 33b. Here, it is preferable that the cleaning agent is supplied at a temperature of about 60 캜.

The pure water unit 33 includes a third tank 33a containing pure water, a third connection pipe 33b connecting the third tank 33a and the spray gun 20, and a third connection pipe 33b connecting the third tank 33a and the spray gun 20. [ And a third valve 33c installed at a predetermined portion to open and close the flow of pure water flowing from the third tank 33a into the spray gun 20 via the third connection pipe 33b. Here, pure water is preferably supplied at a temperature of about 100 캜.

The IPA supply unit 34 is provided for the purpose of vaporizing the neutralizing agent, the cleaning agent and the oil on the surface of the hole or the tab cleaned by pure water. The IPA supply unit 34 includes a fourth tank 34a containing IPA, A fourth connecting pipe 34b connecting the fourth tank 34a to the second tank 20 and a fourth connecting pipe 34b provided at a predetermined portion of the fourth connecting pipe 34b to connect the spray gun 20 from the fourth tank 34a, And a fourth valve 34c for opening and closing the flow of the IPA flowing into the IPA. Here, the IPA unit 34 can use alcohol itself as it is instead of IPA.

The air supply unit 35 is for drying the holes of the cleaned vacuum chamber and includes a fifth tank 35a containing air, a fifth connection pipe 35a connecting the fifth tank 35a and the spray gun 20, (35b) for opening and closing the flow of air flowing from the fifth tank (35a) to the spray gun (20) through a fifth connection pipe (35b) provided at a predetermined portion of the fifth connection pipe (35b) 5 valve 35c.

Subsequently, the nozzle 40 is coupled to the other end of the spray gun 20 not connected to the main body 10, and is provided with a fine hole (not shown) at an end thereof, like the ordinary nozzle, (Or antacid), cleaner, pure water, IPA, and air introduced through the through holes are strongly injected into the holes or tabs of the vacuum chamber. Here, the length and shape of the nozzle 40 can be varied in design.

The suction cover 50 is disposed in a portion other than a hole (or a tab) of a vacuum chamber to be cleaned from the nozzle 40 so as to prevent secondary contamination inside the vacuum chamber And is provided at the other end of the spray gun 20 in which the nozzle 40 is installed. The suction cover 50 may be made of various materials within a range that can prevent scattering of the washing liquid, and the shape of the suction cover 50 may also be a polygonal shape including a circle or a square when viewed in a plan view.

Further, the suction cover 50 may include a suction plate 70 provided at an end thereof for complete suction into a vacuum chamber portion including a hole (or a tab) to be cleaned. By this suction plate 70 It is completely adsorbed on the inner wall of the vacuum chamber portion including the holes (or tabs) to be cleaned, thereby completely blocking unwanted scattering of the washing liquid sprayed through the nozzles 40.

The suction pump 60 is connected to a suction pump 60 whose one end is disposed on the outer side of the suction cover 50 and the other end opposite to the one end is sucked And a suction pipe 62 extending from the outside to the inside of the cover 50. Here, the other end of the suction pipe 64 disposed inside the suction cover 50 may be provided to have a shape and material that is easy to suck the cleaning liquid. In addition, unlike the drawing of this embodiment, It can be disposed at an appropriate position.

The first to fifth tanks 31a to 35a and the first to fifth inlet pipes 31b to 31c of the cleaning liquid supply unit 30 in the hole cleaning apparatus 100 of the vacuum chamber according to the present invention, 35b and a part of the suction pump 60 and the suction tube 62 can be understood to be arranged outside the vacuum chamber and the first to fifth inlet pipes 31b to 35b, And the suction pipe 62 are preferably made of a flexible material so as to facilitate the use of the hole cleaning apparatus 100 according to the present invention.

FIG. 2 is a cross-sectional view for explaining a hole cleaning process using a hole cleaning apparatus for a vacuum chamber for manufacturing an OLED according to the present invention.

First, the hole cleaning apparatus 100 according to the present invention is placed in a hole 210 in a vacuum chamber 200 to be cleaned by movement of the main body 10, and the suction plate 50, which is provided at the end of the suction cover 50, The suction cover 50 is adsorbed on the inner wall of the portion of the vacuum chamber 200 including the holes 210 to be cleaned by using the vacuum cleaner 70. At this time, a nozzle 40 is disposed inside the suction cover 50, and these nozzles are directed toward the hole 210 to be cleaned.

In this state, the valves 31c to 35c of the neutralizer unit 31, the detergent unit 32, the pure water unit 33, the IPA unit 34, and the air unit 35 connected to the spray gun 20 A neutralizer (or antacid), a cleaning agent, pure water, IPA and air are sequentially supplied to the holes 210 to be sequentially opened and closed.

The first valve 31c is opened to supply a soda solution such as sodium carbonate (Na2CO3) or sodium bicarbonate (NaHCO3) contained in the first tank 31a to the spray gun 20 through the first connection pipe 31b A neutralizing agent (or an antacid) is injected into the notched portion of the hole 210 having the threaded portion through the nozzle 40 and the contaminant such as oil remaining in the hole 210 Striking, dropping, or neutralizing so that it can easily be removed from the successor. Thereafter, the first valve 31c is closed so that the neutralizing agent is no longer introduced into the spray gun 20.

Next, the second valve 32c is opened to supply the alkali solution mixed with phosphoric acid (H2PO4) and sulfuric acid (H2SO4), for example, 9: 1, in the second tank 32a to the second connection pipe 32b, The cleaning agent is injected again through the nozzle 40 into the hole 210 where the neutralizing agent is injected and the hole 210 is cleaned through the nozzle. At this time, the cleaning agent composed of the alkali solution is supplied at a temperature of approximately 60 ° C, and the contaminant neutralized by the neutralizing agent (or the antacid) is removed through the injection of the cleaning agent. Thereafter, the second valve 32c is closed so that the cleaning agent is no longer introduced into the spray gun 20.

The third valve 33c is opened to prevent the contaminants from adhering to the surface of the hole 210 cleaned with the neutralizing agent and the cleaning agent, and pure water contained in the third tank 33a is supplied to the spray gun 20, And sprayed through a nozzle 40 to a portion of the hole 210 cleaned with a neutralizing agent and a cleaning agent so that the portion of the cleaned hole 210 is wiped clean with pure water. At this time, pure water is supplied at a temperature of about 100 캜. Thereafter, the third valve 33c is closed so that the pure water is no longer introduced into the spray gun 20.

Next, the fourth valve 34c is opened so that the oil or the like is completely vaporized in the portion of the hole 210 that has been cleaned by pure water, so that the IPA contained in the fourth tank 34a is discharged to the spray gun 20 And then the IPA is injected into the hole 210 washed through the nozzle 40. [ Thereafter, the fourth valve 34c is closed so that the IPA is no longer introduced into the spray gun 20.

Then, the fifth valve 35c is opened with respect to the hole 210 which has been cleaned with the neutralizing agent (or the antacid), the cleaning agent, the pure water and the IPA, and the air contained in the fifth tank 35a is supplied to the spray gun 20 Air is sprayed to the portion of the hole 210 washed through the nozzle 40 and dried, thereby completely removing the pure water and IPA remaining in the hole 210. Thereafter, the fifth valve 35c is closed to prevent air from flowing into the spray gun 20 any longer.

In the process of injecting the neutralizing agent (or the antacid), the cleaning agent, the pure water and the IPA, the suction pump 60 is operated to move the hole 210 through the portion of the suction pipe 62 disposed inside the suction cover 50, (Or antacid), cleaner, pure water and IPA used for cleaning Also, air is taken out as well.

Since the suction cover 50 surrounds the hole 210 to be cleaned during the spraying of the neutralizing agent (or the antacid), the cleaning agent, the pure water, the IPA and the air, the neutralizing agent (or the antacid ), Cleansing agent, pure water and IPA are not scattered, and therefore unwanted secondary contamination by neutralizing agent (or antacid), detergent, pure water and IPA scattering is not induced in other parts inside the vacuum chamber 200.

Then, the hole cleaning apparatus 100 according to the present invention is removed from the inside of the vacuum chamber 200 to complete the hole cleaning process of the vacuum chamber for manufacturing an OLED.

While the present invention has been shown and described with respect to specific embodiments thereof, it is not intended that the present invention be construed as being limited thereto. The scope of the following claims for utility model registration is not limited to the spirit and scope of the present invention. It will be readily apparent to those skilled in the art that various modifications and variations can be made.

10: main body 20: spray gun
30: cleaning liquid supply unit 31: neutralizing agent unit
32; Cleaner unit 33: pure water unit
34: IPA unit 35: Air unit
40: nozzle 50: suction cover
60: suction pump 62: suction tube
70: Suction plate 200: Vacuum chamber
210: hole

Claims (5)

A hole cleaning apparatus for a vacuum chamber for manufacturing an organic light emitting diode for cleaning a hole of a vacuum chamber used for depositing an organic material layer of an organic light emitting diode,
A body including a control unit;
A spray gun whose one end is connected to the main body;
A cleaning liquid supply unit connected to the spray gun to supply a cleaning liquid into the spray gun;
A nozzle coupled to the other end opposite to one end of the spray gun;
A suction cover installed at the other end of the spray gun to block scattering of the washing liquid sprayed from the nozzle; And
A suction pump including a suction pipe extending from the outside of the suction cover to the inside thereof;
Lt; / RTI >
Further comprising a suction plate installed at an end of the suction cover to be adsorbed to an inner wall of a vacuum chamber including a hole to be cleaned.
delete The method according to claim 1,
Wherein the cleaning liquid supply unit includes a neutralizer unit, a cleaner unit, a pure water unit, an IPA unit, and an air unit.
The method of claim 3,
The neutralizer unit, the detergent unit, the pure water unit, the IPA unit,
First to fifth tanks each containing a neutralizing agent, a cleaning agent, pure water, IPA and air, respectively;
First to fifth connecting pipes connecting the first to fifth tanks and the spray gun, respectively; And
First to fifth valves provided respectively in the first to fifth connection pipes;
Wherein the hole cleaning apparatus comprises a vacuum cleaner for cleaning the hole in the vacuum chamber for manufacturing the organic light emitting diode.
5. The method of claim 4,
Characterized in that the neutralizing agent comprises a soda solution of sodium carbonate (Na2CO3) or sodium bicarbonate (NaHCO3), and the cleaning agent comprises an alkaline solution of phosphoric acid (H2PO4) and sulfuric acid (H2SO4) Hole cleaning device in chamber.

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