KR20040078751A - Reagent feeding utility in SCR system for nitrogen oxide treatment and washing method - Google Patents

Reagent feeding utility in SCR system for nitrogen oxide treatment and washing method Download PDF

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KR20040078751A
KR20040078751A KR1020030013585A KR20030013585A KR20040078751A KR 20040078751 A KR20040078751 A KR 20040078751A KR 1020030013585 A KR1020030013585 A KR 1020030013585A KR 20030013585 A KR20030013585 A KR 20030013585A KR 20040078751 A KR20040078751 A KR 20040078751A
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filtration filter
urea solution
urea
secondary filtration
opening
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KR1020030013585A
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KR100667474B1 (en
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정삼헌
박기용
고준호
양희성
오태영
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현대중공업 주식회사
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8621Removing nitrogen compounds
    • B01D53/8625Nitrogen oxides
    • B01D53/8631Processes characterised by a specific device
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D35/00Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/02Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8621Removing nitrogen compounds
    • B01D53/8625Nitrogen oxides
    • B01D53/8628Processes characterised by a specific catalyst
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/88Handling or mounting catalysts
    • B01D53/885Devices in general for catalytic purification of waste gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01NGAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/10Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust
    • F01N3/18Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control
    • F01N3/20Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control specially adapted for catalytic conversion ; Methods of operation or control of catalytic converters
    • F01N3/2066Selective catalytic reduction [SCR]
    • F01N3/208Control of selective catalytic reduction [SCR], e.g. dosing of reducing agent
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01NGAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2570/00Exhaust treating apparatus eliminating, absorbing or adsorbing specific elements or compounds
    • F01N2570/14Nitrogen oxides
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01NGAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2610/00Adding substances to exhaust gases
    • F01N2610/02Adding substances to exhaust gases the substance being ammonia or urea

Abstract

PURPOSE: An apparatus for supplying aqueous urea solution as reducing agent in SCR (selective catalyst reduction) system, which is able to uniformly, stably and continuously supply the reducing agent of the nitrogen oxide to treat the nitrogen oxide and prevent a nozzle plugging, and a washing method thereof. CONSTITUTION: The apparatus comprises an aqueous urea solution storage tank(1) storing the aqueous urea solution and pressurizing to send it to an urea spraying device, a first filtering filter(9) connected to the aqueous urea solution storage tank to remove impurities from the aqueous urea solution, a second filtering filter(10) connected to the first filtering filter, a flow rate controller(11) connected to the second filtering filter to control the spray amount of the aqueous urea solution, an urea spraying device(5) connected to the flow rate controller by a nozzle to spray the aqueous urea solution and a clean water supplying device(12) connected between the urea spraying device and the second filtering filter to wash the inner part of the nozzle.

Description

질소 산화물 처리용 SCR 시스템의 환원제 공급장치 및 세척방법{Reagent feeding utility in SCR system for nitrogen oxide treatment and washing method}Reagent feeding utility in SCR system for nitrogen oxide treatment and washing method

본 발명은 질소 산화물 처리용 SCR 시스템의 환원제 공급장치 및 세척방법에 관한 것으로, 보다 상세하게는 배기가스에 포함된 질소산화물 처리시설인 SCR(Selective Catalytic Reduction : 선택적 촉매환원)시스템에 있어서 환원제로 사용되는 요소수용액을 연속적으로 공급할 뿐만 아니라 요소 반응생성물에 의한 노즐의 막힘 현상을 방지할 수 있는 질소 산화물 처리용 SCR 시스템의 환원제 공급장치 및 세척방법을 제공함에 있다The present invention relates to a reducing agent supply apparatus and a washing method of the SCR system for treating nitrogen oxides, and more particularly, as a reducing agent in an SCR (Selective Catalytic Reduction) system which is a nitrogen oxide treatment facility included in exhaust gas. The present invention provides a reductant supplying device and a cleaning method for a nitrogen oxide treatment SCR system that can not only continuously supply urea aqueous solution but also prevent clogging of the nozzle by the urea reaction product.

일반적으로 에너지의 이용으로 생성되는 배기가스에는 다양한 대기오염물질이 존재하는데, 상기 대기오염 물질중 질소산화물에 대한 저감기술이 아직까지 확실하게 확립되어 있지 않으며 현재 연소 후 발생되는 질소산화물 제거를 위해 선택적 촉매 환원법(SCR : Selective Catalytic Reduction)이 상용 기술중 경제적, 기술적인 측면에서 가장 유용한 것으로 평가받고 있다.In general, there are various air pollutants in the exhaust gas generated by the use of energy, and a technology for reducing nitrogen oxides in the air pollutants has not been established yet. Selective Catalytic Reduction (SCR) is considered to be the most useful from the economical and technical aspects of commercial technologies.

통상 지금까지 SCR기술은 암모니아를 환원제로 사용하여 NOX를 질소와 물로 환원시키는 방법을 사용하였는데, 암모니아는 유독물질로서 저장, 처리, 수송과 관련된 안전문제를 가지고 있기 때문에 취급 및 저장이 용이한 요소수용액의 사용범위가 커지고 있다.Traditionally, the SCR technology has used a method of reducing NO x to nitrogen and water by using ammonia as a reducing agent.Ammonia is a toxic substance and has a safety problem related to storage, processing, and transportation. The range of use of aqueous solution is increasing.

도 1 은 종래 SCR 시스템의 요소수용액 공급장치를 도시한 계략도로서, 요소수용액을 환원제로 사용하는 경우 요소이송펌프(7)에 의해 요소수용액저장탱크(1) 내의 요소수용액이 이동해 요소이송필터(8)를 통과하면서 요소수용액 속에 포함된 불순물 또는 침전물이 1차로 제거되어 정화된 후 다시 요소수용액저장탱크(1)로 순환되어 오고, 계속해서 요소공급펌프(2)를 가동하면 1차로 정화된 요소수용액이 요소공급필터(3)에서 2차로 걸러진 다음 유량조절장치(4)로 이송되고, 상기 유량조절장치(4)에서 유량을 조절하면서 요소분사장치(5)로 이송되며, 상기 요소분사장치(5) 내부는 이중관이 형성되어 있어 압축공기에 의해 배기가스 중으로 최종 분사되어, SCR시스템의 요소수용액 공급장치 전단에 설치된 혼합기에서 배기가스와 균일하게 혼합되어 촉매층에 접촉하고, 요소이송필터(8)와 요소공급필터(3)에서 걸러진 불순물 또는 침전물은 침전물포집탱크(6)로 보내져 포집된다.1 is a schematic diagram showing a urea solution supply apparatus of a conventional SCR system. After passing through 8), impurities or sediments contained in the urea solution are first removed and purified, and then circulated back to the urea solution storage tank 1, and when the urea supply pump 2 is operated continuously, the urea purified firstly The aqueous solution is secondarily filtered out of the urea supply filter 3 and then transferred to the flow regulating device 4, and is transferred to the urea spraying device 5 while controlling the flow rate in the flow regulating device 4, wherein the urea spraying device ( 5) Inside the double pipe is formed, the final injection into the exhaust gas by the compressed air, uniformly mixed with the exhaust gas in the mixer installed in front of the urea solution supply device of the SCR system to the catalyst layer In contact with each other, impurities or deposits filtered by the urea transfer filter 8 and the urea supply filter 3 are sent to the sediment capture tank 6 for collection.

상술한 바와 같은 종래의 SCR 시스템의 환원제 공급장치는 요소수용액을 환원제로 사용하는 경우 요소를 반응 덕트 내에 분사할 때 고온의 배기가스에 노즐이 노출되면서 요소가 암모니아로 분해되는 과정에서 요소의 분해 온도(133℃)와 요소수용액에 포함된 수분의 증발온도(100℃)의 차이 때문에 상전이 된 반응 생성물을 형성되어 노즐선단에 부착하여 굳어서 노즐의 막힘현상(Nozzle plugging)이 발생하는 점이며, 노즐로의 요소수용액 공급 정지시 노즐내부에 잔류하고 있던 요소수용액을 제거하지 않으면 상전이 된 반응 생성물이 보다 용이하게 형성된다는 것이다.Reducing agent supply apparatus of the conventional SCR system as described above is the decomposition temperature of the urea in the process of decomposing the urea into ammonia when the urea solution is used as the reducing agent when the nozzle is exposed to the hot exhaust gas when the urea is injected into the reaction duct Due to the difference between the evaporation temperature (100 ℃) of water contained in 133 ℃ and the urea solution, a phase-change reaction product is formed and adheres to the tip of the nozzle so that nozzle plugging occurs. If the urea solution remaining in the nozzle was not removed when the urea solution supply was stopped, the reaction product formed as a phase change was more easily formed.

본 발명은 상기와 같은 종래의 문제점을 해결하기 위하여 창출되는 것으로, 가스터빈, 보일러 또는 엔진의 배기가스등에 포함된 질소산화물 NOX을 처리함에 있어서 균일하고 안정적으로 질소산화물의 환원제를 연속적으로 공급할 뿐만 아니라 요소 반응생성물에 의한 노즐의 막힘 현상을 방지할 수 있는 질소 산화물 처리용 SCR 시스템의 환원제 공급장치 및 세척방법을 제공함을 목적으로 한다.The present invention is created in order to solve the conventional problems as described above, in the treatment of nitrogen oxides NO X contained in the gas turbine, boiler or engine exhaust gas, etc., uniformly and stably supplying a reducing agent of nitrogen oxides continuously. It is also an object of the present invention to provide a reducing agent supply apparatus and a cleaning method of the SCR system for treating nitrogen oxides, which can prevent the clogging of the nozzle by the urea reaction product.

본 발명은 요소수용액을 저장하고 가압하여 요소분사장치로 보내는 요소용액저장탱크와, 상기 요소용액저장탱크에 연결되어 공급되는 요소수용액에 포함된 불순물을 제거하는 1차 여과필터와, 상기 1차 여과필터에 연결된 2차 여과필터와, 상기 2차 여과필터에 연결되어 공급되는 요소수용액의 분사량을 조절하는 유량조절기와, 상기 유량조절기에 노즐로 연결되어 요소수용액을 분사하는 요소분사장치와, 상기 요소분사장치 및 2차 여과필터 사이에 연결되어 노즐의 내부를 세척하는 청수공급장치를 제공함으로서 발명이 추구하는 목적을 달성할 수 있다.The present invention is a urea solution storage tank for storing and pressurizing the urea solution to be sent to the urea injection device, a primary filtration filter for removing impurities contained in the urea solution supplied to the urea solution storage tank, and the primary filtration A secondary filtration filter connected to the filter, a flow regulator for controlling the injection amount of the urea solution supplied and connected to the secondary filtration filter, a urea injection device connected to a nozzle to the flow controller to inject the urea solution, and the urea It is possible to achieve the object pursued by the invention by providing a fresh water supply device connected between the injection device and the secondary filtration filter to wash the inside of the nozzle.

도 1 은 종래 SCR 시스템의 요소수용액 공급장치를 도시한 계략도,1 is a schematic diagram showing a urea solution supply apparatus of the conventional SCR system,

도 2 는 본 발명의 요소수용액 공급장치 및 청수공급장치를 도시한 계략도.Figure 2 is a schematic diagram showing a urea solution supply device and fresh water supply device of the present invention.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

(1) : 요소수용액저장탱크 (2) : 요소공급펌프(1): Urea solution storage tank (2): Urea supply pump

(3) : 요소공급필터 (4) : 유량조절장치(3): Urea supply filter (4): Flow regulator

(5) : 요소분사장치 (6) : 침전물포집탱크(5): Urea injection device (6): Sediment capture tank

(7) : 요소이송펌프 (8) : 요소이송필터(7): Element transfer pump (8): Element transfer filter

(9) : 1차 여과필터 (10) : 2차 여과필터(9): primary filtration filter (10): secondary filtration filter

(11) : 유량조절기 (12) : 청수공급장치(11): flow regulator (12): fresh water supply device

(13) : 1차 여과필터 개폐밸브 (14) : 2차 여과필터 제1개폐밸브(13): Primary filtration filter on-off valve (14): Secondary filtration filter on-off valve

(15) : 2차 여과필터 제2개폐밸브 (16) : 청수공급장치 개폐밸브(15): secondary filtration filter second opening and closing valve (16): fresh water supply device opening and closing valve

(17) : 유량조절기 개폐밸브 (18) : 배수밸브(17): flow regulator on / off valve (18): drain valve

상기 목적을 달성하기 위한 본 발명의 구성에 대해 첨부도면과 연계하여 설명하면 다음과 같다.Referring to the configuration of the present invention for achieving the above object in conjunction with the accompanying drawings as follows.

도 2 는 본 발명의 요소수용액 공급장치 및 청수공급장치를 도시한 계략도로서, 요소수용액을 저장하고 가압하여 노즐을 통해 요소분사장치로 보내는 요소용액저장탱크(1)와, 상기 요소용액저장탱크(1)에 연결되어 공급되는 요소수용액에 포함된 불순물을 제거하는 1차 여과필터(9)와, 상기 1차 여과필터(9)에 연결되어 불순물을 한번더 제거하는 2차 여과필터(10)와, 상기 2차 여과필터(10)에 연결되어 공급되는 요소수용액의 분사량을 조절하는 유량조절기(11)와, 상기 유량조절기(11)에 노즐로 연결되어 요소수용액을 분사하는 요소분사장치(5)와, 상기 요소분사장치(5) 및 제 2차 여과필터(10) 사이에 연결되어 노즐의 내부를 세척하는 청수공급장치(12)가 설치되어 있다.Figure 2 is a schematic diagram showing the urea solution supply device and fresh water supply device of the present invention, the urea solution storage tank (1) for storing and pressurizing the urea solution to be sent to the urea spray device through the nozzle, and the urea solution storage tank A primary filtration filter 9 for removing impurities contained in the urea solution supplied and connected to (1), and a secondary filtration filter 10 for removing impurities once more by being connected to the primary filtration filter 9 And a flow regulator 11 for controlling the injection amount of the urea solution supplied and connected to the secondary filtration filter 10, and a urea injection device 5 for spraying the urea solution with a nozzle to the flow regulator 11; And a fresh water supply device 12 connected between the urea injection device 5 and the secondary filtration filter 10 to wash the inside of the nozzle.

상기1차 여과필터(9)와, 2차 여과필터(10) 사이에 1차 여과필터 개폐밸브(13)와, 2차 여과필터 제1개폐밸브(14)가 설치되어 있고, 2차 여과필터(10)와 청수공급장치(12) 및 유량조절기(11) 사이에 각각 청수공급장치 개폐밸브(16)와 유량조절기 개폐밸브(17)와, 2차 여과필터 제2개폐밸브(15)가 설치되어 있으며 1차 여과필터(9)와 2차 여과필터(10) 사이에 연결되어 물이 배수할 수 있도록 결합된 배수라인에 배수밸브(18)가 설치되어 있다.A primary filtration filter opening / closing valve 13 and a secondary filtration filter opening / closing valve 14 are provided between the primary filtration filter 9 and the secondary filtration filter 10, and the secondary filtration filter. A fresh water supply opening / closing valve 16, a flow regulator opening and closing valve 17, and a secondary filtration filter second opening / closing valve 15 are installed between the fresh water supply device 12 and the flow regulator 11, respectively. It is connected to the primary filtration filter 9 and the secondary filtration filter 10, the drain valve 18 is installed in the drain line coupled to drain the water.

상기와 같은 구성을 참조하여 본 발명의 환원제인 요소수용액 공급방법을 설명하면 다음과 같다.Referring to the configuration as described above will be described the method of supplying the urea aqueous solution of the present invention as follows.

배수밸브(18)와 청수공급장치 개폐밸브(16)를 막은 다음 40%또는 50%의 농도로 제조된 요소수용액이 저장된 요소수용액저장탱크(1)에 압축공기(Compressed air)를 사용하여 가압하는 단계와,The drain valve 18 and the fresh water supply opening / closing valve 16 are blocked and pressurized by using compressed air to the urea solution storage tank 1 in which the urea solution prepared at a concentration of 40% or 50% is stored. Steps,

상기 요소수용액이 압축공기로 가압 및 이송되어 1차 여과필터 (9)및,2차(10) 여과필터를 통과하면서 불순물 또는 침전물을 걸러내는 단계와,The urea aqueous solution is pressurized and conveyed by compressed air to filter the impurities or deposits while passing through the primary filtration filter (9) and the secondary (10) filtration filter,

상기 걸러진 요소수용액이 유량조절기(11)에 의해 분사량이 조절되어 요소분사장치(5)에서 분사되는 단계와,The filtered urea solution is injected by the flow rate regulator 11 is injected from the urea injection device (5),

상기 분사된 요소수용액은 기상 생성물로 전환 및 암모니아로 분해되어 촉매 상에서 NOX와 반응하여 배출가스 흐름으로부터 질소산화물을 제거하는데 사용되는 단계와,The sprayed urea aqueous solution is converted to a gaseous product and decomposed into ammonia and reacted with NO X on a catalyst to remove nitrogen oxides from the off-gas stream;

상기 요소수용액의 공급을 중지한 후 청수공급장치 개폐밸브(16) 및 배수 밸브(18)는 열고, 1차 여과필터 개폐밸브(13)와, 유량조절기 개폐밸브(17)는 닫은 다음 청수를공급하여 2차 여과필터(10)에서 걸러진 불순물을 세척하는 단계와,After the supply of the urea solution is stopped, the fresh water supply device open / close valve 16 and the drain valve 18 are opened, the primary filtration filter open / close valve 13 and the flow regulator open / close valve 17 are closed, and then fresh water is supplied. Washing the impurities filtered by the secondary filtration filter 10, and

상기 2차 여과필터(10)를 세척한 후 2차 여과필터 제2개폐밸브(15)는 닫고 유량조절기 개폐밸브(17)를 열어 노즐분사를 계속하여 노즐내부에 잔류하고 있는 요소수용액을 요소분사장치(5)를 통해 제거하는 단계로 구성되어 요소수용액에 의해 반응 생성물이 형성되는 것을 방지한다.After the secondary filtration filter 10 is washed, the secondary filtration filter second opening / closing valve 15 is closed and the flow regulator opening / closing valve 17 is opened to continue nozzle spraying to discharge urea solution remaining in the nozzle. Removing through the apparatus 5 to prevent the formation of reaction products by the urea aqueous solution.

본 발명은 상술한 특정의 바람직한 실시예에 한정되지 아니하며, 청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변형실시가 가능한 것은 물론이고, 그와 같은 변경은 청구범위 기재의 범위 내에 있게 된다.The present invention is not limited to the above-described specific preferred embodiments, and various modifications can be made by any person having ordinary skill in the art without departing from the gist of the present invention claimed in the claims. Of course, such changes will fall within the scope of the claims.

상기와 같은 구성 및 작용에 의해 기대할 수 있는 본 발명의 효과는 균일하고 안정적으로 질소산화물의 환원제를 연속적으로 공급할 뿐만 아니라 요소수용액 공급 장치의 운전이 멈추면서 노즐 내부에 남아있던 요소 반응생성물을 청수공급장치에서 청수를 노즐로 분사하여 세정함으로서 노즐의 막힘 현상을 방지 할 수 있는 매우 유용한 발명이다.The effect of the present invention, which can be expected by the configuration and action as described above, not only continuously and stably supplies a reducing agent of nitrogen oxide, but also supplies fresh water to the urea reaction product remaining inside the nozzle while the urea solution supply device is stopped. It is a very useful invention that can prevent clogging of the nozzle by spraying fresh water to the nozzle in the device to clean.

Claims (3)

요소수용액을 저장하고 가압하여 요소분사장치로 보내는 요소용액저장탱크(1)와, 상기 요소용액저장탱크(1)에 연결되어 공급되는 요소수용액에 포함된 불순물을 제거하는 1차 여과필터(9)와, 상기 1차 여과필터(9)에 연결된 2차 여과필터(10)와, 상기 2차 여과필터(10)에 연결되어 공급되는 요소수용액의 분사량을 조절하는 유량조절기(11)와, 상기 유량조절기(11)에 노즐로 연결되어 요소수용액을 분사하는 요소분사장치(5)와, 상기 요소분사장치(5) 및 제 2차 여과필터(10) 사이에 연결되어 노즐의 내부를 세척하는 청수공급장치(12)로 구성된 것을 특징으로 하는 질소 산화물 처리용 SCR 시스템의 환원제 공급장치.Urea solution storage tank (1) for storing and pressurizing the urea solution to be sent to the urea injection device, and the primary filtration filter (9) for removing impurities contained in the urea solution supplied to the urea solution storage tank (1) And a secondary filtration filter 10 connected to the primary filtration filter 9, a flow controller 11 for controlling the injection amount of the urea solution supplied and connected to the secondary filtration filter 10, and the flow rate. A urea spraying device (5) connected to the controller 11 by a nozzle for injecting urea solution, and connected between the urea spraying device (5) and the secondary filtration filter (10) to clean the inside of the nozzle A reducing agent supply apparatus for an SCR system for treating nitrogen oxides, comprising an apparatus (12). 제 1 항에 있어서,The method of claim 1, 상기 1차 여과필터(9)와, 2차 여과필터(10) 사이에 1차 여과필터 개폐밸브(13)와, 2차 여과필터 제1개폐밸브(14)가 설치되어 있고, 2차 여과필터(10)와 청수공급장치(12) 및 유량조절기(11) 사이에 각각 2차 여과필터 제2개폐밸브(15)와, 청수공급장치 개폐밸브(16)와 유량조절기 개폐밸브(17)가 설치되어 있으며 1차 여과필터(9)와 2차 여과필터(10)가 연결되는 연결라인 사이에 물이 배수할 수 있도록 배수밸브(18)가 구비된 배수라인이 결합되어 있는 것을 특징으로 하는 질소 산화물 처리용 SCR 시스템의 환원제 공급장치.A primary filtration filter opening / closing valve 13 and a secondary filtration filter opening / closing valve 14 are provided between the primary filtration filter 9 and the secondary filtration filter 10, and the secondary filtration filter. A secondary filtration filter second opening / closing valve 15, a fresh water supply opening / closing valve 16 and a flow regulator opening / closing valve 17 are installed between the 10 and the fresh water supply device 12 and the flow regulator 11, respectively. Nitrogen oxide, characterized in that the drain line is provided with a drain valve 18 is coupled so that water can drain between the connection line connecting the primary filtration filter (9) and the secondary filtration filter (10) Reductant feeder for SCR system for treatment. 배수 밸브(18)와 청수공급장치 개폐밸브(16)를 막은 다음 40% 또는 50%의 농도로 제조된 요소수용액이 저장된 요소수용액저장탱크(1)에 압축공기(Compressed air)를 사용하여 가압하는 단계와,The drain valve 18 and the fresh water supply opening / closing valve 16 are blocked and pressurized by using compressed air to the urea solution storage tank 1 in which the urea solution prepared at a concentration of 40% or 50% is stored. Steps, 상기 요소수용액이 압축공기로 가압되어 공급라인을 통해 이송하여 1 차 여과필터(9) 및, 제 2차 여과필터(10)를 통과하면서 불순물 또는 침전물을 걸러내는 단계와,The urea aqueous solution is pressurized with compressed air and transported through a supply line to filter out impurities or precipitates while passing through the primary filtration filter 9 and the secondary filtration filter 10; 상기 걸러진 요소수용액이 유량조절기(11)에 의해 분사량이 조절되어 요소분사장치(5)에서 분사되는 단계와,The filtered urea solution is injected by the flow rate regulator 11 is injected from the urea injection device (5), 상기 분사된 요소수용액은 기상 생성물로 전환 및 암모니아로 분해되어 촉매 상에서 NOX와 반응하여 배출가스 흐름으로부터 질소산화물을 제거하는데 사용되는 단계와,The sprayed urea aqueous solution is converted to a gaseous product and decomposed into ammonia and reacted with NO X on a catalyst to remove nitrogen oxides from the off-gas stream; 상기 요소수용액의 공급을 중지한 후 청수공급장치 개폐밸브(16) 및 배수 밸브(18)는 열고, 1차 여과필터 개폐밸브(13)와, 유량조절기 개폐밸브(17)는 닫은 다음 청수를공급하여 2차 여과필터(10)에서 걸러진 불순물을 세척하는 단계와,After the supply of the urea solution is stopped, the fresh water supply device open / close valve 16 and the drain valve 18 are opened, the primary filtration filter open / close valve 13 and the flow regulator open / close valve 17 are closed, and then fresh water is supplied. Washing the impurities filtered by the secondary filtration filter 10, and 상기 2차 여과필터(10)를 세척한 후 2차 여과필터 제2개폐밸브(15)는 닫고 유량조절기 개폐밸브(17)를 열어 노즐분사를 계속하여 노즐내부에 잔류하고 있는요소수용액을 요소분사장치(5)를 통해 제거하는 단계로 구성된 것을 특징으로 하는 질소 산화물 처리용 SCR 시스템의 환원제 세척방법.After the secondary filtration filter 10 is washed, the secondary filtration filter second opening / closing valve 15 is closed, and the flow regulator opening / closing valve 17 is opened to continue nozzle injection to discharge urea solution remaining in the nozzle. Reducing agent cleaning method of SCR system for nitrogen oxide treatment, characterized in that the step of removing through the device (5).
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