KR20040070918A - Color Filter Panel for Liquid Crystal Display Device and Method of Fabricating the same - Google Patents

Abstract

PURPOSE: A color filter substrate of an LCD(Liquid Crystal Display) and a method for manufacturing the color filter substrate are provided to prevent the generation of poor domain and trap of contaminant between color filters. CONSTITUTION: A color filter substrate of an LCD includes a color filter part(120), a black matrix(122), a transparent electrode(124), and an alignment film(126). The color filter part includes red, green and blue color filters(120a,120b,120c) sequentially and repeatedly arranged. Adjacent color filters have a predetermined overlay between them. The black matrix is formed in the overlay region of the color filter part and has the same thickness as the thickness of the color filter part. The transparent electrode formed on the color filter part and black matrix. The alignment film is formed on the transparent electrode.

Description

Color filter panel for liquid crystal display device and manufacturing method thereof {Color Filter Panel for Liquid Crystal Display Device and Method of Fabricating the same}

The present invention relates to a liquid crystal display device, and more particularly, to a color filter substrate for a liquid crystal display device and a manufacturing method thereof.

Recently, liquid crystal displays have been spotlighted as next-generation advanced display devices with low power consumption, good portability, technology-intensive, and high added value.

The liquid crystal display is driven by injecting a liquid crystal between two substrates on which a transparent electrode is formed, and obtaining an image effect by using a difference in refractive index of light according to the anisotropy of the liquid crystal.

Currently, an active matrix liquid crystal display (AM-LCD), in which thin film transistors (TFTs), which are switching elements that open and close each pixel, is disposed for each pixel, has an excellent resolution and video performance. The most attention is.

1 is a stereoscopic view of a part of a general liquid crystal display device.

As shown in the figure, the upper and lower substrates 10 and 30 face each other with a predetermined distance therebetween, and the liquid crystal layer 50 is interposed between the upper and lower substrates 10 and 30.

A plurality of gates and data lines 32 and 34 cross each other on the lower substrate 30, and a thin film transistor T is formed at a point where the gates and data lines 32 and 34 cross each other. A pixel electrode 46 connected to the thin film transistor T is formed in the pixel area P defined as an area where the gate and the data lines 32 and 34 intersect.

Although not shown in detail in the drawing, the thin film transistor T is a channel for controlling voltage on / off by a gate electrode receiving a gate voltage, a source and drain electrode receiving a data voltage, and a difference between the gate voltage and the data voltage. (ch; channel).

The color filter layer 12 and the common electrode 16 are sequentially formed below the upper substrate 10.

Although not shown in detail in the drawing, the color filter layer 12 is composed of a color filter for transmitting only light of a specific wavelength band and a black matrix positioned at a boundary of the color filter to block light on an area where the arrangement of liquid crystals is not controlled.

In addition, upper and lower polarizers 52 and 54 for transmitting only light parallel to the polarization axis are positioned on each outer surface of the upper and lower substrates 10 and 30, and a backlight, which is a separate light source, is provided below the lower polarizer 54. light) is placed.

Such a liquid crystal display requires a color filter composed of red, green, and blue primary colors to realize full color.

2A and 2B are views of a conventional color filter substrate, and FIG. 2A is a plan view, and FIG. 2B is a cross-sectional view taken along the cutting line I-I of FIG. 2A.

In FIG. 2A, a black matrix 64 having the pixel region P as the opening 62 is formed, and the red, green, and blue color filters are formed in the opening 62 with the black matrix 64 as a boundary for each color. A color filter 66 composed of 66a, 66b, and 66c repeatedly arranged in sequence is formed.

In the region covering the color filter 66, the transparent electrode 68 and the alignment layer 70 are sequentially formed.

In FIG. 2B, black matrices 64 are formed on the substrate 60 so as to be spaced apart from each other, and red, green, and blue color filters 66a, 66b, 66c are formed using the black matrix 64 as a boundary for each color. It is formed in order to form the color filter 66, and the transparent electrode 68 and the alignment film 70 are sequentially formed in the area covering the color filter 66.

The color filter 66 is patterned in color units by photolithography, including an exposure and development process using a photosensitive color pigment, and the transparent electrode 68 and the alignment layer 70 are formed of a color filter ( Because of the laminated structure formed on the surface 66), the degree of overlay (II) defined by the interval of the color filter 66 for each color is closely related to the yield of the color filter substrate.

3A and 3B are scanning electron microscope (SEM) photographs of the overlay characteristics of the color filter. FIG. 3A is a case where the overlay of the color filter is wide, and FIG. 3B is a case where the overlay of the color filter is narrow.

As shown in FIG. 3A, when the overlay of the color filter is wide, the transparent electrode material and the alignment layer are formed along the color filter step, and thus, during the rubbing process of the alignment layer, the rubbing cloth pressurizes the outer wall between the color filter patterns, thereby providing As the same contaminants are induced, there is a problem in that a domain defect is generated by a bright spot like a milky way.

In more detail with respect to the domain failure, the above-described domain refers to a region in which the liquid crystal director is constant or continuously different and there is no discontinuity. When the distribution of the liquid crystal is changed due to misalignment or static electricity, the refraction of light locally occurs. It can be distorted and appear to be a bright spot.

In addition, when the overlay of the color filter is narrow as shown in FIG. 3B, the outer wall of the color filter is not affected by the rubbing cloth, but there is a problem in that contaminants and residual images are generated by contaminants trapped between the color filters.

In order to improve such a problem, the present invention is to provide a method of manufacturing a color filter substrate for a liquid crystal display device that can prevent the domain failure due to the bright spots and to prevent contaminant traps between the color filters.

To this end, the present invention intends to include a process of using the overlay region of the color filter as the black matrix region and etching the black matrix without a separate photo etching process so that the color filter and the black matrix have the same thickness value.

1 is a three-dimensional view of a portion of a general liquid crystal display device.

Figure 2a, 2b is a view of a conventional color filter substrate, Figure 2a is a plan view, Figure 2b is a cross-sectional view taken along the cutting line I-I of Figure 2a.

3A and 3B are scanning electron microscope (SEM) photographs of overlay characteristics of color filters.

4A and 4B are views of a color filter substrate for a liquid crystal display according to a first embodiment of the present invention. FIG. 4A is a plan view and FIG. 4B is a cross-sectional view taken along the line IV-IV of FIG. 4A.

5A through 5D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display device according to a second exemplary embodiment of the present invention.

6A and 6B are views of a liquid crystal display according to a third exemplary embodiment of the present invention. FIG. 6A is a plan view and FIG. 6B is a cross-sectional view taken along the line VII-VII of FIG. 6A.

<Description of Symbols for Major Parts of Drawings>

110: substrate 120a, 120b, 120c: red, green, blue color filter

120: color filter 122: black matrix

124 transparent electrode 126 alignment film

In order to achieve the above object, in the first aspect of the present invention, a red, green, and blue color filter sequentially arranged in sequence on a substrate and having a constant overlay with each other. A color filter consisting of; A black matrix formed in an overlay region of the color filter and having the same thickness as that of the color filter; A transparent electrode formed in an area covering the color filter and the black matrix; Provided is a color filter substrate for a liquid crystal display device including an alignment layer formed in a region covering the transparent electrode.

The black matrix is characterized in that the chromium (Cr) -based metal material.

According to a second aspect of the present invention, there is provided a method including forming a color filter on a substrate, the color filter including red, green, and blue color filters having a constant overlay therebetween; Forming a black matrix material on the entire surface of the substrate covering the overlay region and the color filter; Etching the black matrix material to a thickness that exposes the surface of the color filter to form a black matrix made of a black matrix material positioned in the overlay region; Forming a transparent electrode in an area covering the color filter and the black matrix; It provides a method of manufacturing a color filter substrate for a liquid crystal display device comprising the step of forming an alignment film in a region covering the transparent electrode.

The black matrix is selected from a chromium-based material, and the etching of the black matrix material may be performed by wet etching the chromium-based material, and the overlay area may be a minimum area for realizing a screen. It is formed to a value corresponding to a region other than the pixel region, and the forming of the alignment layer may include applying the alignment layer material and rubbing the alignment layer material.

The material constituting the color filter is selected from photosensitive color pigments, and the color filters are formed by a photolithography process using photosensitive color pigments.

According to a third aspect of the present invention, there is provided a semiconductor device comprising: first and second substrates disposed to face each other; A gate wiring and a data wiring formed on the inner surface of the first substrate to cross each other; A thin film transistor formed at an intersection point of the gate line and the data line; A pixel electrode positioned in a pixel region defined as an intersection of the gate wiring and the data wiring, and connected to the thin film transistor; A first alignment layer formed in an area covering the pixel electrode; A color filter on the inner surface of the second substrate, the color filter including an red, green, and blue color filter that has an overlay positioned in an area corresponding to an area other than the pixel area and is sequentially spaced apart from each other; A black matrix positioned in an overlay region of the color filter, the black matrix having a thickness equal to that of the color filter; A common electrode formed in an area covering the color filter and the black matrix; A second alignment layer formed in a region covering the common electrode; A liquid crystal display device including a liquid crystal layer interposed between the first and second alignment layers is provided.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

First Embodiment

4A and 4B are views illustrating a color filter substrate for a liquid crystal display according to a first embodiment of the present invention. FIG. 4A is a plan view and FIG. 4B is a cross-sectional view taken along the line IV-IV of FIG. 4A. .

As shown, the red, green, and blue color filters 120a, 120b, and 120c, which are positioned for each pixel region P and have a constant overlay III, are sequentially arranged to form the color filter 120. A black matrix 122 is formed in an overlay III region for each color of the color filter 120, and a transparent electrode 124 and an alignment layer 126 are formed in an area covering the color filter 120 and the black matrix 122. ) Are formed in order.

For example, the material forming the black matrix 122 may be selected from a chromium (Cr) -based metal material, deposited on the entire surface of the substrate on which the color filter 120 is formed, and then formed by etching without a separate photolithography process. In the etching process, it is preferable to use a wet etching process.

Hereinafter, referring to FIG. 4B, the stacked structure of the color filter substrate according to the present embodiment has a predetermined overlay III on the substrate 110 and is spaced apart from each other in red, green, and blue color filters 120a and 120b. A color filter 120 formed of 120c is formed, and a black matrix 122 having the same thickness D1 as the color filter 120 is formed in the overlay III region of the color filter 120. The transparent electrode 124 is formed in an area covering the color filter 120 and the black matrix 122, and the alignment layer 126 is formed on the transparent electrode 124.

In this embodiment, since the black matrix is formed in the overlay area for each color of the color filter, and the color filter and the black matrix are formed to have the same thickness value, the flatness of the substrate is increased before the transparent electrode and the alignment layer are formed. The occurrence of defects in the overlay section of the color filter can be prevented in advance.

Hereinafter, the manufacturing process of the color filter substrate for the liquid crystal display device according to the second embodiment of the present invention will be described in more detail.

Second Embodiment

5A through 5D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 5A illustrates a step of forming the color filter 212 by sequentially forming the red, green, and blue color filters 212a, 212b, and 212c on the substrate 210 by a photolithography process using a photosensitive color pigment. .

In this case, the red, green, and blue color filters 212a, 212b, and 212c are spaced by the color of the overlay (V), and the overlay for each color (V) is determined by the photolithography process conditions of the color filter (212). Can be adjusted.

In the present embodiment, since the black matrix (not shown) is formed on the substrate on which the color filter 212 is formed, the overlay V determines the formation width of the black matrix, and thus corresponds to the formation width of the black matrix. It is important to design the overlay (V).

In FIG. 5B, the black matrix material 214 is formed on the entire surface of the color filter 212. In FIG. 5C, the black matrix material 214 has a thickness value D2 exposing the surface of the color filter 212. ) To form a black matrix 216 by etching the photo matrix without a separate photo etching process. Since the color filter 212 is typically formed by a dry etching process using a photosensitive color pigment, the black matrix 216 may be colored. It is preferably formed by a wet etching process using a chromium-based metal material which may have an etch selectivity with the filter 212.

As described above, in the present embodiment, the color filter 212 is formed, and then a black matrix material (214 of FIG. 5B) is formed in the color filter 212 and the overlay color V region of the color filter 212. Next, since the black matrix 216 is formed by etching the black matrix material (214 of FIG. 5B) with a thickness value D2 exposing the surface of the color filter 212 without an additional photo etching process. In addition, the overall flatness of the substrate before the transparent electrode and the alignment layer forming step, which are not illustrated, may be increased.

In addition, since the black matrix 216 is formed in the overlay V region of the color filter 212, contaminants may be prevented from being trapped in the overlay V region, and at the same time, the color filter 212 and the black matrix may be prevented. The flatness of 216 can also prevent rubbing damage caused by a wide overlay.

FIG. 5D is a step of sequentially forming the transparent electrode 218 and the alignment layer 220 in a region covering the color filter 212 and the black matrix 216.

For example, the transparent electrode 218 is made of indium tin oxide (ITO) and used as a common electrode.

Third Embodiment

6A and 6B are views of a liquid crystal display according to a third exemplary embodiment of the present invention. FIG. 6A is a plan view, and FIG. 6B is a cross-sectional view taken along the cutting line VII-VII of FIG. 6A. The stacking structure of the color filter substrate according to the embodiment is illustrated.

In FIG. 6A, the gate wiring 312 is formed in the first direction, and the data wiring 316 is formed in the second direction crossing the first direction, and the gate wiring 312 and the data wiring 316 are formed. The thin film transistor T is formed at the intersection point, and the pixel electrode P is connected to the thin film transistor T in the pixel area P defined as an intersection area of the gate line 312 and the data line 316. 320 is formed.

The hatched region across the gate wiring 312 and the data wiring 316 and the thin film transistor T region corresponds to the overlay VI region of the color filter, which is not shown, forming the black matrix forming portion.

Although not shown in detail in the drawings, the color filter substrate structure may apply the structure of the first embodiment.

Hereinafter, referring to FIG. 6B, the cross-sectional structure of the liquid crystal display according to the present exemplary embodiment is provided with first and second substrates 310 and 330 disposed to face each other, and a gate is formed on an inner surface of the first substrate 310. The insulating film 312 is formed, and the data wiring 316 is formed on the gate insulating film 312 so as to be spaced apart from each other with the pixel region P interposed therebetween, and a protective layer is formed in the region covering the data wiring 316. 318 is formed, and a pixel electrode 320 is formed in the pixel region P above the passivation layer 318.

The first alignment layer 322 is formed in an area covering the pixel electrode 320.

In addition, the red, green, and blue color filters 332a, 332b, and 332c are arranged in sequence with each other at a position corresponding to the pixel electrode 320 on the inner surface of the second substrate 330. The color filter 332 is formed.

The overlayer VI has a width corresponding to a region VIII between the neighboring pixel electrodes 320 and the region VIII that covers the edge of the pixel electrode 320 at a predetermined interval.

In addition, a black matrix 334 having the same thickness value D3 as the color filter 332 is formed in the overlay VI region of the color filter 332, and the color filter 332 and the black matrix 334 are formed. The common electrode 336 and the second alignment layer 338 are sequentially formed in the region covering the.

The liquid crystal layer 350 is interposed between the first and second alignment layers 322 and 338.

As described above, according to the structure of the liquid crystal display device according to the present embodiment, since the black matrix which serves to block light in the non-pixel region is formed to have the same thickness value as that of the color filter in the overlay section of the color filter, the common electrode And it is possible to increase the bottom flatness of the second alignment layer, it is possible to solve the problem of defects in the overlay area of the existing color filter.

However, the present invention is not limited to the above embodiments, and various modifications may be made without departing from the spirit of the present invention.

For example, the stacked structure of the array element formed on the first substrate described above can be variously changed.

As described above, according to the color filter substrate for the liquid crystal display and the manufacturing method thereof according to the present invention, since the overlay region of the color filter is used as the black matrix forming unit, contaminant traps in the existing color filter overlay region can be effectively prevented. Since the color filter and the black matrix are formed to the same thickness value, the flatness of the lower portion of the transparent electrode and the alignment film can be increased, and contaminants generated by the step during the rubbing process of the alignment film can be effectively prevented, thereby increasing the production yield. Can be.

Claims (8)

A color filter comprising red, green, and blue color filters sequentially arranged in sequence on the substrate and having repeated overlays; A black matrix formed in an overlay region of the color filter and having the same thickness as that of the color filter; A transparent electrode formed in an area covering the color filter and the black matrix; Alignment layer formed in a region covering the transparent electrode Color filter substrate for a liquid crystal display device comprising a. The method of claim 1, The black matrix is a chromium (Cr) -based metal material color filter substrate for a liquid crystal display device. Forming a color filter on the substrate, the color filter comprising a red, green, and blue color filter having a constant overlay therebetween; Forming a black matrix material on the entire surface of the substrate covering the overlay region and the color filter; Etching the black matrix material to a thickness that exposes the surface of the color filter to form a black matrix made of a black matrix material positioned in the overlay region; Forming a transparent electrode in an area covering the color filter and the black matrix; Forming an alignment layer in a region covering the transparent electrode Method of manufacturing a color filter substrate for a liquid crystal display device comprising a. The method of claim 3, wherein The black matrix is selected from a chromium-based material, and the etching of the black matrix material may include performing a wet etching process on the chromium-based material. The method of claim 3, wherein The overlay region is a manufacturing method of a color filter substrate for a liquid crystal display device is formed with a value corresponding to a region other than the pixel region that is the minimum region for implementing the screen. The method of claim 3, wherein The forming of the alignment layer may include applying the alignment layer material and rubbing the alignment layer material. The method of claim 3, wherein The material constituting the color filter is selected from a photosensitive color pigment, and the color filter is a manufacturing method of a color filter substrate for a liquid crystal display device by a photolithography process using a photosensitive color pigment. First and second substrates disposed to face each other; A gate wiring and a data wiring formed on the inner surface of the first substrate to cross each other; A thin film transistor formed at an intersection point of the gate line and the data line; A pixel electrode positioned in a pixel region defined as an intersection of the gate wiring and the data wiring, and connected to the thin film transistor; A first alignment layer formed in an area covering the pixel electrode; A color filter on the inner surface of the second substrate, the color filter including an red, green, and blue color filter that has an overlay positioned in an area corresponding to an area other than the pixel area and is sequentially spaced apart from each other; A black matrix positioned in an overlay region of the color filter, the black matrix having a thickness equal to that of the color filter; A common electrode formed in an area covering the color filter and the black matrix; A second alignment layer formed in a region covering the common electrode; Liquid crystal layer interposed between the first and second alignment layers Liquid crystal display comprising a.