KR20040050437A - Novel process for preparing cefditoren - Google Patents

Novel process for preparing cefditoren Download PDF

Info

Publication number
KR20040050437A
KR20040050437A KR1020020078278A KR20020078278A KR20040050437A KR 20040050437 A KR20040050437 A KR 20040050437A KR 1020020078278 A KR1020020078278 A KR 1020020078278A KR 20020078278 A KR20020078278 A KR 20020078278A KR 20040050437 A KR20040050437 A KR 20040050437A
Authority
KR
South Korea
Prior art keywords
formula
catalyst
compound
cod
group
Prior art date
Application number
KR1020020078278A
Other languages
Korean (ko)
Inventor
우남태
이정식
Original Assignee
삼천당제약주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼천당제약주식회사 filed Critical 삼천당제약주식회사
Priority to KR1020020078278A priority Critical patent/KR20040050437A/en
Publication of KR20040050437A publication Critical patent/KR20040050437A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/48Methylene radicals, substituted by hetero rings
    • C07D501/56Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)

Abstract

PURPOSE: A process for preparing cefditoren is provided, thereby cheaply preparing cefditoren which has wide range of antimicrobial spectrum in higher yield and purity without preparing E isomer by Wittig reaction. CONSTITUTION: The process for preparing cefditoren represented by formula (I) comprises the steps of: (i) reacting 5-ethynyl-4-methyl thiazole compound of formula (II) with a compound of formula (IIIa) or (IIIb) in the presence of base and catalyst to prepare an intermediate of formula (IVa) or (IVb); and (ii) reacting the intermediate of formula (IVa) or (IVb) with cephem compound of formula (V) in the presence of catalyst and organic solvent, wherein X is halogen atom, triplate(-OTf), mesylate(-OMs) or tosylate(-OTs); PMB is p-methoxybenzyl as a carbonyl protecting group; the catalyst in the step (i) is £Rh(cod)Cl|2-P(iPr)3, £Rh(cod)Cl|2-PCy3 or £Ir(cod)Cl|2-P(iPr)3; the base is triethylamine or trimethylamine; and the catalyst in the step (ii) is Pd2dba3 or Pd(OAc)2 having a ratio of 2:1 with each of Pd(PPh3)4, PdCl2(PPh3)2, PdCl2(PhCN)2, PdCl2(MeCN)2 and P(o-tol)3; and the organic solvent is dimethylformamide, dimethylsulfoxide or a mixed solvent thereof.

Description

세프디토렌의 신규 제조 방법 {Novel process for preparing cefditoren}Novel process for preparing cefditoren}

본 발명은 하기 화학식 1로 표현되는 일반명 세프디토렌(cefditoren)으로 알려진 세펨(cephem) 화합물인 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산(신 이성체(syn isomer), 시스 이성체(cis isomer)) 화합물(일본특허 평64503호, 미국특허 제4,839,350호 및 유럽특허 제0175610호)의 신규한 제조방법에 관한 것으로서, 이 화합물은 우수한 세파로스포린(cephalosphorin) 항생물질로서, 독성이 낮으며 또한 매우 광범위한 항균 스펙트럼을 가져 그램 양성균(gram-positive bacteria) 또는 그램 음성균(gram-negative bacteria)에 의해 야기되는 질병의 치료 및 예방에 탁월한 효과가 있는 것으로 알려져 있다(Kenji, Sakagami et al.;J. Antibiotics,8, pp91047-1050, 1990). 그램 음성균에 대한 세프디토렌의 우수한 항균 활성은 세프디토렌 분자의 3-비닐기의 탄소-탄소 2중결합에 대해 세펨환(cephem ring)과 4-메틸티아졸-5-일기가 시스(cis)-배위(配位)로 결합되어 있는 Z 배치를 세프디토렌 화합물이 가지는 것에 관계된다.The present invention is 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido which is a cephem compound known as the general name cefditoren represented by the following general formula (1): ] -3- [2- (4-methylthiazol-5-yl) vinyl] -3-cepem-4-carboxylic acid ( syn isomer , cis isomer ) compound (Japanese Patent No. 64503 No. 4,839,350 and European Patent No. 0175610), which are excellent cephalosphorin antibiotics, have low toxicity and a very broad spectrum of antimicrobial grams. It is known to have an excellent effect on the treatment and prevention of diseases caused by (gram-positive bacteria) or gram-negative bacteria (Kenji, Sakagami et al .; J. Antibiotics , 8 , pp91047-1050, 1990). Gusev superior antimicrobial activity of the alkylene Ditto for gram-negative bacteria is Joseph Ditto alkylene carbon of the 3-vinyl group of the molecule carbon pemhwan II for binding of (cephem ring) and 4-methylthiazol-5-group is cis (cis It is related to what the ceftitorene compound has in a Z configuration which is bonded by) -coordination.

하기 화학식 2의 화합물은 상기 세프디토렌 화합물의 4-카르복실기를 피발로일옥시메틸기로 에스테르화하여 유도되는 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산 피발로일옥시메틸 에스테르(신 이성체(syn-isomer), 시스 이성체(cis-isomer)) 화합물, 즉 세프디토렌 피복실(cefditoren pivoxil)이라는 일반명으로 알려진 프로드러그(prodrug)로서, 융점이 127℃ 내지 129℃인 담황색의 분말상 물질이다(Merck Index, 12판, p317).The compound of formula 2 is 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetate derived by esterifying the 4-carboxyl group of the ceftitorene compound with a pivaloyloxymethyl group amido] -3- [2- (4-methylthiazol-5-yl) vinyl] -3-cephem-4-carboxylic acid pivaloyloxymethyl ester (De isomer (syn-isomer), cis-isomer (cis -isomer )), a prodrug known by the generic name cefditoren pivoxil, is a pale yellow powdery material with a melting point of 127 ° C to 129 ° C (Merck Index, 12th edition, p317). .

세프디토렌은 포유동물에 대해 독성이 낮으나 그램양성 박테리아 및 그램음성 박테리아에 대해 매우 광범위한 항균력을 가졌으며, 세프디토렌 피복실은 그 자체로는 항균력이 없지만 포유동물의 소화기관내에 경구투여가 가능하고, 포유동물의 소화기관내에서 에스테르를 형성하는 피발로일옥시메틸기가 떨어져 나가면서 항균활성인 세프디토렌으로 변환될 수 있는 프로드러그로서 유용하다. 세프디토렌 및 세프디토렌 피복실과 같은 3-(2-치환-비닐)-세파로스포린 항생물질은 일반적으로 그것의 Z 이성체가 E 이성체(트란스 이성체)보다도 항생물질의 제특성에 관하여 우수하다는 것이 알려져 있다.Ceftitorene is less toxic to mammals but has a very broad spectrum of antimicrobial activity against Gram-positive and Gram-negative bacteria, while ceftitorene coating itself is not antibacterial but can be administered orally into a mammal's digestive system. It is useful as a prodrug that can be converted to ceftitorene, which is an antimicrobial activity, while the pivaloyloxymethyl group forming an ester in the digestive tract of a mammal is separated. 3- (2-substituted-vinyl) -sephalosporin antibiotics, such as ceftitorene and ceftitorene coating, generally indicate that their Z isomers are superior to the antibiotic properties of the E isomers (trans isomers). Known.

세프디토렌을 포함하여 상기 3-(2-치환-비닐)-세파로스포린 항생물질 또는 이것의 합성용 중간체는 여러 가지 방법으로 제조될 수 있으며, 이들 항생물질의 이용가능한 제조법 중 하나로 위티그(Wittig) 반응을 사용하는 방법이 있다. 위티그 반응을 사용하는 3-(2-치환-비닐) 세파로스포린 항생물질 또는 이것의 합성용 중간체의 제조방법에서 반응 생성물은 항상 Z 이성체(시스 이성체)와 E 이성체(트란스 이성체)의 혼합물의 형태로 얻어지게 되며(일본 특허공개공보 제91-264590호, 미국특허 제5,233,035호, 유럽특허출원공고 제0175610A2호, 국제특허출원 PCT/JP94/01618호, 유럽특허출원 공개 제0734965A1호), 이로 인해 원하는 목적물질의 수율이 저조할 뿐만 아니라, 분리공정이 포함되어 전체적으로 효율적인 공정이 이루어지지 않았다.The 3- (2-substituted-vinyl) -sephalosporin antibiotics or their intermediates for synthesis, including ceftitorene, can be prepared in a number of ways, and one of the available preparations of these antibiotics is Wittig ( There is a way to use the Wittig) reaction. In the process for the preparation of 3- (2-substituted-vinyl) separosporin antibiotics or their synthetic intermediates using the Wittig reaction, the reaction product always contains a mixture of the Z isomer (cis isomer) and the E isomer (trans isomer). It is obtained in the form (Japanese Patent Publication No. 91-264590, US Patent No. 5,233,035, European Patent Application Publication No. 0175610A2, International Patent Application PCT / JP94 / 01618, European Patent Application Publication No. 0834965A1) Due to the low yield of the desired target material, including the separation process, the overall efficient process was not achieved.

예를 들면, 하기의 반응도식에 표시되는 바와 같이, 7-[(Z)-2-(아미노티아졸-4-일)-2-메톡시이미노아세트아미도]-3-(Z)-(4-메틸티아졸-5-일)비닐)-3-세펨-4-카르본산의 합성에 사용되는 7-β-페닐아세트아미도-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산의p-메톡시벤질에스테르를 아세톤중에서 요오드화나트륨으로 처리하여 대응하는 3-요오드메틸 유도체(2)를 생성하고, 이 유도체를 트리페닐포스핀으로 처리하여 트리페닐포스포늄-요오다이드 유도체(3)를 생성하고, 또한 디클로로메탄과 물로 이루어지는 불균질(heterogeneous) 반응매질 중에서 탄산수소나트륨의 존재하에 상기 트리페닐포스포늄-요오다이드 화합물(4)과 5-포르밀-4-메틸티아졸(5)을 실온에서 위티그 반응 공정을 수행하여 7-β-페닐아세트아미도-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산-4-메톡시벤질에스테르(6)가 생성되었다.For example, as shown in the following scheme, 7-[(Z) -2- (aminothiazol-4-yl) -2-methoxyiminoacetamido] -3- (Z)- 7-β-phenylacetamido-3- [2- (4-methylthiazol-5- used for the synthesis of (4-methylthiazol-5-yl) vinyl) -3-cepm-4-carboxylic acid (1) Treatment of p -methoxybenzyl ester of vinyl] -3-cef-4-carboxylic acid with sodium iodide in acetone to give the corresponding 3-iodine methyl derivative (2), which is converted to triphenylphosphine. The triphenylphosphonium iodide derivative (3) was treated to produce triphenylphosphonium iodide derivative (4), and in the presence of sodium bicarbonate in a heterogeneous reaction medium consisting of dichloromethane and water (4) 7-β-phenylacetamido-3- [2- (4-methylthiazol-5-yl) and 5-formyl-4-methylthiazole (5) were subjected to a Wittig reaction process at room temperature. Vinyl] -3-cefe-4-carboxylic acid-4- A methoxybenzyl ester (6) was produced.

상기 방법에 있어서, 중간체인 7-β-페닐아세트아미도-3-[(트리페닐포스포르아닐리덴)메틸]-3-세펨-4-카르본산-4-메톡시벤질에스테르 (4)가 위티그 반응에 의해 5-포르밀-4-메틸티아졸 (5)과 반응하여 7-β-페닐아세트아미도-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산-4-메톡시벤질에스테르 (6)가 생성되는데, 이 반응생성물은 Z 이성체(시스 이성체)와 E 이성체(트란스 이성체)가 4.7:1의 혼합물형으로 수득되었다고 문헌에 기재되어 있으며, 또한 이 혼합물은 칼럼 크로마토그래피에 의해서도 서로 분리하는 것이 곤란하다고 기술되어 있다(Kenji, Sakagami et al.;J. Antibiotics,8, pp91047-1050, 1990). 그러므로, 최종적으로 수득할 수 있는 원하는 Z 이성체의 수율은 상당히 낮아질 수 밖에 없었다.In the above method, the intermediate 7-β-phenylacetamido-3-[(triphenylphosphoranilidene) methyl] -3-cepm-4-carboxylic acid-4-methoxybenzyl ester (4) Reaction with 5-formyl-4-methylthiazole (5) by TIG reaction to 7-β-phenylacetamido-3- [2- (4-methylthiazol-5-yl) vinyl] -3- Cefem-4-carboxylic acid-4-methoxybenzyl ester (6) is produced, and the reaction product is described in the literature that Z isomer (cis isomer) and E isomer (trans isomer) were obtained in a mixture of 4.7: 1. It is also described that these mixtures are difficult to separate from each other by column chromatography (Kenji, Sakagami et al .; J. Antibiotics , 8 , pp91047-1050, 1990). Therefore, the yield of the desired Z isomer which can be finally obtained was inevitably lowered.

또한, 하기 반응도식에 표기된 일본 특허공개공보 제 95-188250호 또는 이에 대응하는 미국특허 제 5,616,703호 또는 유럽 특허출원공개 제658558A1호에 기재된 제조방법에서, 7-아미노-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산 또는 이것의 유도체로서 얻어지는 반응생성물 (5)이 Z 이성체와 E 이성체의 혼합물인 것으로 기술되어 있으며, 일본 특허공개공보 제 95-188250호에서는 7-아미노-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산의 Z/E 혼합물을 아민염으로 전환하고, 또한 얻어진 아민염에 대하여 재결정법을 실행함으로서, Z 이성체를 단리하는 방법이 기술되어 있으며, 상기 Z/E 혼합물을 크로마토그래피상에서 활성이 낮은 E 이성체를 가능한 한 제거된 Z 이성체를 얻을 수 있음이 기술되어 있다. 실제로 이 반응공정에 의한 목적 화합물의 수율은 31%로 매우 저조한 반응 수율을 보여주고 있다.In addition, in the production method described in Japanese Patent Application Laid-Open No. 95-188250 or the corresponding US Patent No. 5,616,703 or European Patent Application Publication No. 658558A1 shown in the following reaction scheme, 7-amino-3- [2- (4 The reaction product (5) obtained as -methylthiazol-5-yl) vinyl] -3-cefe-4-carboxylic acid or derivatives thereof is described as being a mixture of the Z isomer and the E isomer. 95-188250 converts a Z / E mixture of 7-amino-3- [2- (4-methylthiazol-5-yl) vinyl] -3-cefe-4-carboxylic acid into an amine salt and further obtains By carrying out the recrystallization method for the amine salt, a method for isolating the Z isomer is described, and it is described that the Z isomer obtained by removing the low activity E isomer as much as possible on the Z / E mixture can be obtained. . In fact, the yield of the target compound by this reaction process is very low at 31%.

마찬가지로, 국제특허출원 제 PCT/EP 92/02965호에는 모든 보호기가 유리된 세펨 화합물을 염산염, 알칼리염, 아민염의 형태로 전환시킴으로서, Z 이성체와 E 이성체간에 나타나는 용해도 차이를 이용하여 E 이성체의 함량을 감소시키는 방법이 개시되어 있는데, 이 방법은 결정이 쉽게 침전되므로 여과를 통하여 용이하게 분리, 수득할 수 있다는 장점은 있으나, 제거되는 E 이성체의 양이 적어 비효율적이며 전반적으로 얻어지는 수율 또한 낮은데, 이러한 수율의 손실은 여러 단계를 거쳐 제조된 세프디토렌 화합물의 손실이란 점에서 원가에 부담을 주는 문제점이있다.Similarly, International Patent Application No. PCT / EP 92/02965 describes the content of E isomers by converting all protecting group-free cefe compounds into the form of hydrochloride, alkali salts, and amine salts, taking advantage of the difference in solubility between Z and E isomers. The method for reducing the amount of the present invention is disclosed. This method has the advantage that crystals are easily precipitated and thus can be easily separated and obtained through filtration. However, since the amount of the E isomers removed is inefficient, the overall yield is low. The loss of yield is a problem in that the cost of the loss of the ceftitorene compound produced through several steps.

따라서, 위티그 반응에 의해 만들어지는 3-(2-치환-비닐)-세파로스포린 화합물 중 원하는 Z 이성체를 높은 수율로 수득하는 것을 가능하게 하는 3-(2-치환-비닐)-세파로스포린 화합물의 새로운 제조법이 요구되어 왔다.Thus, 3- (2-substituted-vinyl) -sephalosporin which makes it possible to obtain the desired Z isomer in high yield among the 3- (2-substituted-vinyl) -sephalosporin compounds made by the Wittig reaction. There is a need for new preparations of compounds.

세프디토렌을 합성함에 있어서, 세펨 화합물의 C-3 위치에 비닐기를 도입하는 단계의 반응은 통상 위티그 반응을 통하여 수행되는데, 이때 비닐기의 이중결합으로 인하여 입체적으로 Z 이성체와 E 이성체가 동시에 생성되므로, 위티그 반응을 이용하는 3-(2-치환-비닐)-세파로스포린의 종래의 제조방법은 E 이성체의 생성에 비해 Z 이성체 생성의 선택성이 좋지 않고, E 이성체로부터 Z 이성체를 단리하기 위해 추가로 번잡한 조작을 필요로 하며, 또한 Z 이성체의 실제상 수율이 만족스럽지 않는 등의 여러 가지 결점이 있었으며, 또한 상기 종래 방법을 실시하는 경우, 반응매질로서 대부분 비슷한 염화메틸렌 또는 염화메틸렌-물을 사용하는 등의 통상적인 제조방법이었다.In synthesizing ceftitorene, the reaction of introducing a vinyl group into the C-3 position of the cefem compound is usually carried out through a Wittig reaction, in which the Z isomer and the E isomer are formed at the same time due to the double bond of the vinyl group. Therefore, the conventional method for preparing 3- (2-substituted-vinyl) -sephalosporin using the Wittig reaction does not have good selectivity for Z isomer production compared to the production of E isomers, and isolating Z isomers from E isomers. For this reason, there are several drawbacks such as additional complicated operation, unsatisfactory yield of Z isomers, and in the case of carrying out the above-mentioned conventional methods, methylene chloride or methylene chloride- It was the conventional manufacturing method, such as using water.

상기에 비추어, 상기 공지방법의 단점이 배제된 효율적이면서 공정이 간단하고 경제적인 세프디토렌을 제조하기 위한 신규의 제조 방법이 여전히 요구되고 있으며, 이에 목적물의 화합물의 분리 없이 고순도 및 고수율로 제조할 수 있는 신규 방법을 개발하여 본 발명을 완성하였다.In view of the above, there is still a need for a new production method for producing ceftitorene which is efficient, simple and economical in which the disadvantages of the known method are eliminated, and thus is prepared in high purity and high yield without separation of the target compound. The present invention has been completed by developing a novel method.

본 발명의 목적은 세파로스포린계 항생제로 유용한 세프디토렌 피복실 즉,7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산 피발로일옥시 메틸에스테르의 신규 제조방법을 제공하는 것이다.It is an object of the present invention to provide a ceftodirene coating chamber useful as a cephalosporin antibiotic, namely 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3- [2 It is to provide a novel process for preparing-(4-methylthiazol-5-yl) vinyl] -3-cepm-4-carboxylic acid pivaloyloxy methyl ester.

상기 목적을 달성하기 위하여, 본 발명은 구조식 (Ⅱ)의 5-에티닐-4-메틸 티아졸(5-ethynyl-4-methyl thiazole) 화합물을 염기와 촉매 존재하에서 구조식 (Ⅲa) 또는 (Ⅲb)와 같은 보론화제 화합물과 반응시켜 Z형의 하기 구조식 (Ⅳa) 또는 (Ⅳb)의 중간체 화합물을 얻는 제 1 단계 및 이 중간체 화합물을 일반식 (Ⅴ)의 세펨 화합물과 반응시키는 제 2 단계 공정을 연속적으로 수행함을 특징으로 하는 일반식 (Ⅰ)의 세프디토렌 피복실 화합물을 고순도 및 고수율로 수득하는 새로운 제조 방법을 제공한다.In order to achieve the above object, the present invention provides a 5-ethynyl-4-methyl thiazole compound of formula (II) in the presence of a base and a catalyst of formula (IIIa) or (IIIb) A first step of reacting a boronating agent compound such as Z to obtain an intermediate compound of the following structural formula (IVa) or (IVb), and a second step of reacting the intermediate compound with the cefem compound of general formula (V) Provided is a novel process for obtaining a ceftitorene cladding compound of formula (I), characterized in that it is carried out in high purity and high yield.

(Ⅰ) (Ⅰ)

(Ⅱ) (Ⅱ)

(Ⅲa) (IIIa)

(Ⅲb) (IIIb)

(Ⅳa) (IVa)

(Ⅳb) (IVb)

(Ⅴ) (Ⅴ)

상기의 식에서,In the above formula,

X는 할로겐 원자, 트리플레이트(-OTf), 메실레이트(-OMs) 또는 토실레이트(-OTs)기이며, PMB는 카르보닐 보호기(carbonyl protecting group)인 파라메톡시벤질(p-methoxybenzyl)기이다.X is a halogen atom, a triflate (-OTf), mesylate (-OMs) or tosylate (-OTs) group, PMB is a carbonyl protecting group (carbonyl protecting group) in para-methoxybenzyl (p -methoxybenzyl) group is .

상기 1 단계 반응에서 사용할 수 있는 촉매는 [Rh(cod)Cl]2-P(iPr)3,[Rh(cod)Cl]2-PCy3(Cy는 시클로헥실) 또는 [Ir(cod)Cl]2-P(iPr)3이며, 사용 가능한 염기는 트리에틸아민(TEA) 또는 트리메틸아민(TMA)로서, 바람직한 사용량은 1 내지 2 당량이다.The catalyst that can be used in the one-step reaction is [Rh (cod) Cl] 2 -P (iPr) 3 , [Rh (cod) Cl] 2 -PCy 3 (Cy is cyclohexyl) or [Ir (cod) Cl] 2 -P (iPr) 3 , and the available base is triethylamine (TEA) or trimethylamine (TMA), with a preferred amount of 1 to 2 equivalents.

2 단계 반응에서 사용할 수 있는 촉매는 Pd(PPh3)4, PdCl2(PPh3)2, PdCl2(PhCN)2, PdCl2(MeCN)2, P(o-tol)3과 각각 2:1의 비를 갖는 Pd2dba3또는 Pd(OAc)2등의 팔라듐 촉매이며, 사용 가능한 염기는 무기 염기로 탄산나트륨, 수산화나트륨, 수산화리튬, 수산화칼륨이다.The catalysts that can be used in the two-stage reaction are Pd (PPh 3 ) 4 , PdCl 2 (PPh 3 ) 2 , PdCl 2 (PhCN) 2 , PdCl 2 (MeCN) 2 , P ( o -tol) 3 and 2: 1, respectively. A palladium catalyst such as Pd 2 dba 3 or Pd (OAc) 2 having a ratio of. The bases that can be used are inorganic carbonates, sodium carbonate, sodium hydroxide, lithium hydroxide and potassium hydroxide.

또한, 상기의 제조 공정에서 사용될 수 있는 유기용매는 디메틸아세트아미드(DMA), 디메틸포름아미드, 헥사메틸포스포릭트리아미드(hexamethylphosphoric triamide) 등의 아미드류, 아세토니트릴, 프로피오니트릴, 부티로니트릴, 이소부티로니트릴, 바레로니트릴 등의 니트릴류, 디메틸이미다졸(DMI), 디메틸설폭시드(DMF) 등, 테트라히드로퓨란(THF), 디옥산 등을 예시할 수 있고, 단독 또는 2종 이상 혼합하여 사용할 수 있다.In addition, organic solvents that can be used in the above production process are amides such as dimethylacetamide (DMA), dimethylformamide, hexamethylphosphoric triamide, acetonitrile, propionitrile, butyronitrile, Nitriles such as isobutyronitrile and vareronitrile, dimethylimidazole (DMI), dimethyl sulfoxide (DMF), and the like, tetrahydrofuran (THF), dioxane, and the like can be exemplified. It can be mixed and used.

특히, 바람직한 용매로서는 디메틸포름아미드, 디메틸설폭시드를 주용매로 사용하는 것이며, 이들의 혼합용매도 가능하다.In particular, preferred solvents include dimethylformamide and dimethyl sulfoxide as main solvents, and mixed solvents thereof are also possible.

마찬가지로, 상기 공정에서의 반응온도는 10 내지 120℃, 바람직하게는 30 내지 100℃이며, 반응 시간은 5 내지 50시간, 바람직하게는 10 내지 15시간이다.Similarly, the reaction temperature in the process is 10 to 120 ° C, preferably 30 to 100 ° C, and the reaction time is 5 to 50 hours, preferably 10 to 15 hours.

상기 일반식 (Ⅴ)의 아미노기 보호기로는, 문헌(Theodora W. Greenwj,Protective Groups in Organic Synthesis, p218-287, 1981)에 기재되어 있는 각종 기 외에, 페녹시아세트아미드,p-메틸페녹시아세트아미드,p-메톡시페녹시아세트아미드,p-클로로페녹시아세트아미드,p-브로모페녹시아세트아미드, 페닐아세트아미드,p-메틸페닐아세트아미드,p-메톡시페닐아세트아미드, 페닐모노클로로아세트아미드, 페닐디클로로아세트아미드, 페닐히드록시아세트아미드, 티에닐아세트아미드, 페닐아세톡시아세트아미드, α-옥소페닐아세트아미드, 벤즈아미드,p-메틸벤즈아미드,p-메톡시벤즈아미드,p-클로로벤즈아미드,p-브로모벤즈아미드, 페닐글리실아미드나 아미노기가 보호된 페닐글리실아미드 등의 아미드류, 프탈이미드, 니트로프탈이미드 등의 이미드류를 예시할 수 있다. 페닐글리실아미드 및p-히드로시페닐글리실아미드의 아미노기의 보호기로는 상기 문헌의 제 7장에 기재되어 있는 각종 기를 예시할 수 있으며,p-히드록시페닐글리실아미드의 수산기의 보호기로서는, 상기 문헌의 제 2장에 기재되어 있는 각종 기를 예시할 수 있다.Examples of the amino group protecting group of the general formula (V) include phenoxyacetamide and p -methylphenoxyacet as well as various groups described in Theodora W. Greenwj, Protective Groups in Organic Synthesis , p218-287, 1981. Amide, p -methoxyphenoxyacetamide, p -chlorophenoxyacetamide, p -bromophenoxyacetamide, phenylacetamide, p -methylphenylacetamide, p -methoxyphenylacetamide, phenylmonochloroacet Amide, phenyldichloroacetamide, phenylhydroxyacetamide, thienylacetamide, phenylacetoxyacetamide, α-oxophenylacetamide, benzamide, p -methylbenzamide, p -methoxybenzamide, p -chloro Amides such as benzamide, p -bromobenzamide, phenylglycidamide and phenylglycidamide protected with an amino group, and imides such as phthalimide and nitrophthalimide have. As a protecting group of the amino group of phenyl glycylamide and p -hydrophenylphenyl glycylamide, various groups described in Chapter 7 of the said document can be illustrated, As a protecting group of the hydroxyl group of p -hydroxyphenyl glycylamide, The various groups described in Chapter 2 of the said document can be illustrated.

상기 일반식 (Ⅴ)의 카르복실산의 보호기로서는, 상기 문헌의 제 5장에 기재되어 있는 각종 기 외에, 아릴기, 벤질기,p-메톡시벤질기,p-니트로벤질기, 디페닐메틸기, 트리클로로메틸기, 트리클로로에틸기,t-부틸기 등을 예시할 수 있다.As a protecting group of the said carboxylic acid of General formula (V), in addition to the various groups described in Chapter 5 of the said document, an aryl group, benzyl group, p -methoxybenzyl group, p -nitrobenzyl group, diphenylmethyl group , Trichloromethyl group, trichloroethyl group, t -butyl group and the like can be exemplified.

이하, 본 발명의 제조 공정을 하기의 반응 도식으로 상세히 표시하면 하기와 같으며, 본 발명의 제조 공정은 하기의 반응식 1에 도시된 방법에 의해 화학적으로 합성될 수 있지만, 이 예로만 한정되는 것은 아니며, 당업자들에 의해 숙지된 시약 및 출발물질의 적당한 변화에 의해 제조될 수 있다.Hereinafter, the manufacturing process of the present invention will be described in detail with the following reaction scheme, and the manufacturing process of the present invention may be chemically synthesized by the method shown in Scheme 1 below, but is not limited thereto. Or, by appropriate changes in reagents and starting materials known to those skilled in the art.

상기의 식에서,In the above formula,

X는 할로겐 원자, 트리플레이트(-OTf), 메실레이트(-OMs) 또는 토실레이트(-OTs)기이며, PMB는 카르보닐 보호기인 파라메톡시벤질기이다.X is a halogen atom, triflate (-OTf), mesylate (-OMs) or tosylate (-OTs) group, and PMB is a paramethoxybenzyl group which is a carbonyl protecting group.

상기 반응식 1에서와 같이, 출발물질인 5-브로모-4-메틸 티아졸을 염기 및 촉매 존재하에서 알키닐 실란과 반응시켜 구조식 (Ⅱ)의 5-에티닐-4-메틸-티아졸 화합물을 제조할 수 있으며, 이 화합물을 구조식 (Ⅲa)의 4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란(4,4,5,5-tetramethyl-[1,3,2]dioxaborolane) 또는 구조식 (Ⅲb)의 벤조[1,3,2]디옥사보롤(benzo[1,3,2] dioxaborole)과 같은 보론화제와 반응시켜 중간체 화합물인 Z형의 화합물인 구조식 (Ⅳa)의 4-메틸-5-[2-(4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란-2-일)비닐]티아졸 (4-methyl-5-[2-(4,4,5,5-tetra methyl-[1,3,2]dioxaborolan-2-yl)vinyl]thiazole) 또는 구조식 (Ⅳb)의 5-(2-벤조[1,3,2]디옥사보롤-2-일-비닐)-4-메틸 티아졸 (5-(2-benzo[1,3,2]dioxa borol-2-yl-vinyl)-4-methyl-thiazole)을 제조할 수 있으며, 이 화합물을 세펨 화합물 (Ⅴ)과 테트라키스 트리페닐포스핀 팔라듐과 유기용매하에서 농축하여, 세프디토렌 피복실 (Ⅰ)을 얻을 수 있다.As in Scheme 1, starting 5-bromo-4-methyl thiazole is reacted with an alkynyl silane in the presence of a base and a catalyst to give the 5-ethynyl-4-methyl-thiazole compound of formula (II). And 4,4,5,5-tetramethyl- [1,3,2] dioxaborolane (4,4,5,5-tetramethyl- [1,3) of formula (IIIa). (2) dioxaborolane) or a benzo [1,3,2] dioxaborole such as benzo [1,3,2] dioxaborole of the formula (IIIb) 4-methyl-5- [2- (4,4,5,5-tetramethyl- [1,3,2] dioxaborolan-2-yl) vinyl] thiazole (IVa) -[2- (4,4,5,5-tetra methyl- [1,3,2] dioxaborolan-2-yl) vinyl] thiazole) or 5- (2-benzo [1,3, 2] dioxabolol-2-yl-vinyl) -4-methyl thiazole (5- (2-benzo [1,3,2] dioxa borol-2-yl-vinyl) -4-methyl-thiazole) And the compound is cefem compound (V) and tetrakis triphenylphosphine palladium Concentrated under solvent-based, it is possible to obtain a chef Ditto alkylene coating chamber (Ⅰ).

상기 반응 공정중의 1 단계는 5-할로-4-메틸 티아졸 화합물의 할로기를 알킨기로 치환하는 것으로서, 사용가능한 반응화제로는,,또는이 바람직하며, 촉매로는 비스페닐포스핀 클로로 팔라듐(PdCl2(PPh3)2) 및 요오드화구리가 바람직하고, 사용되는 염기로는 유기 염기로 트리에틸아민, N-메틸모포린, 피롤리딘, 피페리딘, 벤질아민, 디에틸아민, 디이소프로필에틸아민, 디메틸에틸아민, 디메틸벤질아민, 트리에타놀아민, 테트라메틸에틸렌디아민, 디메틸에틸리덴디아민 등이 있고, 무기 염기로 탄산나트륨, 수산화나트륨, 수산화리튬, 수산화칼륨 등이 있으며, 이 중 트리에틸아민과 수산화칼륨이 가장 바람직하고, 용매로는 극성용매인 저급 알콜류 및 물이 사용 가능하다.The first step in the reaction process is to replace the halo group of the 5-halo-4-methyl thiazole compound with an alkyne group. , , or Preferred examples of the catalyst include bisphenylphosphine chloro palladium (PdCl 2 (PPh 3 ) 2 ) and copper iodide, and the base used may be triethylamine, N-methylmorpholine, pyrrolidine, or the like. , Piperidine, benzylamine, diethylamine, diisopropylethylamine, dimethylethylamine, dimethylbenzylamine, triethanolamine, tetramethylethylenediamine, dimethylethylidenediamine and the like, and sodium carbonate and hydroxide as inorganic bases. Sodium, lithium hydroxide, potassium hydroxide and the like, triethylamine and potassium hydroxide are most preferred, and the lower alcohols and water which are polar solvents can be used as a solvent.

상기 2 단계는 생성된 구조식 (Ⅱ)의 5-에티닐-4-메틸 티아졸 화합물의 삼중결합을 보론화(hydroboration)하여 Z형의 중간체 화합물을 생성하는 것으로서, 사용가능한 보론화제로는 구조식(Ⅲa)의 피나콜보란 (4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란) 또는 구조식 (Ⅲb)의 카테콜보란 (벤조[1,3,2]디옥사보롤)이 바람직하며, 촉매로는 [Rh(cod)Cl]2- P(iPr)3,[Rh(cod)Cl]2- PCy3(Cy는 시클로헥실) 또는 [Ir(cod)Cl]2- P(iPr)3등이 바람직하다.The second step is to hydroborate the triple bond of the 5-ethynyl-4-methyl thiazole compound of formula (II) to produce an intermediate compound of type Z. Pinacolborane (4,4,5,5-tetramethyl- [1,3,2] dioxaborolane) of IIIa) or catecholborane (benzo [1,3,2] dioxane of formula (IIIb) Borol), and the catalyst is [Rh (cod) Cl] 2 -P (iPr) 3 , [Rh (cod) Cl] 2 -PCy 3 (Cy is cyclohexyl) or [Ir (cod) Cl] 2 P (iPr) 3 and the like are preferred.

본 발명의 반응 수율을 높이기 위해서는 염기의 첨가가 필수적이다. 염기를 사용하지 않고 반응을 시키는 경우에도 반응은 진행되지만, 그 수율은 40 내지 60%에 불과하며, 반면에 일정량의 염기를 첨가하게 되면 80% 이상의 수율로 Z 이성체를 수득할 수가 있으며, 특히 Z 이성체의 함유량도 변하지 않고 90% 이상을 유지한다. 상기 반응에서 사용 가능한 염기로는 유기 염기로 트리에틸아민, N-메틸모포린, 피롤리딘, 피페린딘, 벤질아민, 디에틸아민, 디이소프로필에틸아민, 디메틸에틸아민, 디메틸벤질아민, 트리에타놀아민, 테트라메틸에틸렌아민, 디메틸에틸리덴아민 등이 있고, 무기 염기로 탄산나트륨, 수산화나트륨, 수산화리튬, 수산화칼륨 등이 있으며, 바람직하게는 트리에틸아민(TEA) 또는 트리메틸아민(TMA)으로서, 바람직한 사용량은 1 내지 2 당량이다.In order to increase the reaction yield of the present invention, addition of a base is essential. The reaction proceeds even when the reaction is performed without using a base, but the yield is only 40 to 60%. On the other hand, when a certain amount of base is added, the Z isomer can be obtained in a yield of 80% or more, in particular, Z The content of the isomer does not change, but is maintained at 90% or more. Examples of the base usable in the reaction include triethylamine, N-methylmorpholine, pyrrolidine, piperindine, benzylamine, diethylamine, diisopropylethylamine, dimethylethylamine, dimethylbenzylamine, Triethanolamine, tetramethylethyleneamine, dimethylethylideneamine, and the like, and inorganic bases include sodium carbonate, sodium hydroxide, lithium hydroxide, potassium hydroxide, and the like, preferably triethylamine (TEA) or trimethylamine (TMA). As a preferred usage amount, it is 1 to 2 equivalents.

상기의 3 단계는 생성된 Z형의 중간체 화합물 (Ⅳa) 또는 (Ⅳb)를 세펨 화합물 (Ⅴ)과 반응시키는 것으로서, 촉매로는 2 단계 반응에서 사용할 수 있는 촉매는 Pd(PPh3)4, PdCl2(PPh3)2, PdCl2(PhCN)2, PdCl2(MeCN)2, P(o-tol)3과 각각 2:1의 비를 갖는 Pd2dba3또는 Pd(OAc)2등의 팔라듐 촉매가 바람직하며, 사용될 수 있는 유기용매는 디메틸아세트아미드(DMA), 디메틸포름아미드, 헥사메틸포스포릭 트리아미드(hexamethylphosphoric triamide) 등의 아미드류, 아세토니트릴, 프로피오니트릴, 부티로니트릴, 이소부티로니트릴, 바레로니트릴 등의 니트릴류, 디메틸이미다졸(DMI), 디메틸설폭시드(DMF) 등, 테트라히드로퓨란(THF), 디옥산 등을 예시할 수 있고, 단독 또는 2종 이상 혼합하여 사용할 수 있다.The above three step is to react the resulting Z-type intermediate compound (IVa) or (IVb) with the cefe compound (V), the catalyst that can be used in the two-step reaction is Pd (PPh 3 ) 4 , PdCl Palladium such as Pd 2 dba 3 or Pd (OAc) 2 having a ratio of 2 (PPh 3 ) 2 , PdCl 2 (PhCN) 2 , PdCl 2 (MeCN) 2 , P ( o- tol) 3 and 2: 1, respectively Catalysts are preferred, and organic solvents that can be used include amides such as dimethylacetamide (DMA), dimethylformamide, hexamethylphosphoric triamide, acetonitrile, propionitrile, butyronitrile and isobuty. Nitriles such as ronitrile and vareronitrile, tetrahydrofuran (THF), dioxane and the like, such as dimethylimidazole (DMI) and dimethyl sulfoxide (DMF), may be exemplified, Can be used.

또한, 상기 용매를 주로 하여, 이것에 다른 통상의 용매, 예를 들면 포름산메틸, 포름산에틸, 포름산프로필, 포름산부틸, 초산메틸, 초산에틸, 초산프로필, 프로피온산에틸 등의 저급알킬 카르복실산의 저급알킬 에스테르류, 디에틸에테르, 에틸프로필에테르, 에틸부틸에테르, 디프로필에테르, 디이소프로필에테르, 디부틸에테르, 메틸 셀로솔브(methyl cellosolve), 디메톡시에탄 등의 에테르류, 테트라히드로퓨란, 디옥산 등의 고리상 에테르류, 벤젠, 톨루엔, 크실렌, 클로로벤젠, 아니솔(anisole) 등의 치환 또는 무치환의 방향족 탄화수소류, 펜탄, 헥산, 헵탄, 옥탄 등의 탄화수소류, 시클로펜탄, 시클로헥산, 시클로헵탄, 시클로옥탄 등의 시클로알칸류, 디클로로메탄, 클로로포름, 디클로로에탄, 트리클로로에탄, 디브로모에탄, 프로필렌디클로라이드, 사염화탄소, 프레온 등의 할로겐화 탄화수소류를 병용한 혼합용매로서 사용하는 것도 가능하다.In addition, the above solvent is mainly used, and other ordinary solvents, for example, lower alkyl carboxylic acids such as methyl formate, ethyl formate, propyl formate, butyl formate, methyl acetate, ethyl acetate, propyl acetate, and ethyl propionate Ethers such as alkyl esters, diethyl ether, ethyl propyl ether, ethyl butyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, methyl cellosolve, dimethoxyethane, tetrahydrofuran, di Cyclic ethers such as oxane, substituted or unsubstituted aromatic hydrocarbons such as benzene, toluene, xylene, chlorobenzene and anisole, hydrocarbons such as pentane, hexane, heptane and octane, cyclopentane and cyclohexane Cycloalkanes such as, cycloheptane and cyclooctane, dichloromethane, chloroform, dichloroethane, trichloroethane, dibromoethane, propylene dichloride, tetrachloride Carbon, it is also possible to use a mixed solvent in combination with halogenated hydrocarbons such as Freons.

특히, 바람직한 용매로서는 디메틸포름아미드, 디메틸설폭시드를 주용매로 사용하는 것이며, 이들의 혼합용매도 가능하다.In particular, preferred solvents include dimethylformamide and dimethyl sulfoxide as main solvents, and mixed solvents thereof are also possible.

마찬가지로, 상기 공정에서의 반응온도는 10 내지 120℃, 바람직하게는 30 내지 100℃이며, 반응 시간은 5 내지 50시간, 바람직하게는 10 내지 15시간이다.Similarly, the reaction temperature in the process is 10 to 120 ° C, preferably 30 to 100 ° C, and the reaction time is 5 to 50 hours, preferably 10 to 15 hours.

상술한 바와 같이, 본 발명은 Z 이성체와 E 이성체의 분리 공정이 필요한 공지의 방법보다 현저하게 높은 수율로 일반식 (Ⅰ)의 세프디토렌 피복실 화합물을 제조할 수 있으므로, 공지의 방법보다 공정상 단순하고 경제적인 제조방법이다.As described above, the present invention can produce the ceftitorene coating chamber compound of the general formula (I) in a significantly higher yield than the known method requiring the separation process of the Z isomer and the E isomer. It is a simple and economic manufacturing method.

본 발명은 하기의 실시예들에 의해 보다 더 잘 이해될 수 있으며, 하기의 실시예는 본 발명을 예시하기 위한 것이며 한정되는 보호범위를 제한하고자 하는 것은 아니다.The invention can be better understood by the following examples, which are intended to illustrate the invention and are not intended to limit the scope of protection.

실시예 1. 5-에티닐-4-메틸 티아졸 화합물의 제조Example 1.Preparation of 5-ethynyl-4-methyl thiazole compound

5-브로모-4-메틸 티아졸 54.0g(0.26mol)과 에티닐 트리메틸실란 20.9g(0.22mol)과 수산화칼륨 5g을 메탄올에 용해시키고, 디트리페닐포스핀 클로린 팔라듐(PdCl2(PPh3)2) 10.5g과 트리에틸아민 6.7g을 첨가하여, 환류교반하였다. 이 반응물을 냉각시키고 증류수를 첨가하여 생성된 침전물을 여과한 다음 증류수로 씻어주고 건조하여, 5-에티닐-4-메틸 티아졸 23.29g(수율: 79%)을 얻었다.54.0 g (0.26 mol) of 5-bromo-4-methyl thiazole, 20.9 g (0.22 mol) of ethynyl trimethylsilane and 5 g of potassium hydroxide were dissolved in methanol, and ditriphenylphosphine chlorine palladium (PdCl 2 (PPh 3 2 ) 10.5 g and 6.7 g of triethylamine were added and stirred under reflux. The reactant was cooled and distilled water was added, and the resulting precipitate was filtered, washed with distilled water and dried to give 23.29 g of 5-ethynyl-4-methyl thiazole (yield: 79%).

1H-NMR (300MHz, CDCl3) δ: 3.43 (1H, s), 8.47 (1H, s), 2.53 (3H, s). 1 H-NMR (300 MHz, CDCl 3 ) δ: 3.43 (1H, s), 8.47 (1H, s), 2.53 (3H, s).

실시예 2. 4-메틸-5-(Z)-[2-(4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란-2-일)비닐] 티아졸 제조Example 2. Preparation of 4-methyl-5- (Z)-[2- (4,4,5,5-tetramethyl- [1,3,2] dioxaborolan-2-yl) vinyl] thiazole

실시예 1에서 제조된 5-에티닐-4-메틸 티아졸 11.0g(0.07mol)에 [Rh(cod)Cl]24.3g과 포스핀 리간드(P(iPr)3) 6.7g 및 TEA 0.101g(1mmol)과 4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란 14.3g(0.05mol)을 첨가하고 4시간동안 80℃에서 환류 교반하였다. 이 반응물을 냉각시키고 증류수를 첨가하여 생성된 침전물을 여과한 다음 증류수로 씻어주고 건조하여, 4-메틸-5-(Z)-[2-(4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란-2-일)비닐] 티아졸 10.725g (수율: 75%)을 얻었다.To 11.0 g (0.07 mol) of 5-ethynyl-4-methyl thiazole prepared in Example 1, 4.3 g of [Rh (cod) Cl] 2 , 6.7 g of phosphine ligand (P (iPr) 3 ), and 0.101 g of TEA (1 mmol) and 14.3 g (0.05 mol) of 4,4,5,5-tetramethyl- [1,3,2] dioxaborolane were added and stirred under reflux at 80 ° C. for 4 hours. The reactant was cooled and distilled water was added, and the resulting precipitate was filtered, washed with distilled water and dried to obtain 4-methyl-5- (Z)-[2- (4,4,5,5-tetramethyl- [1 , 3,2] dioxaborolan-2-yl) vinyl] thiazole 10.725 g (yield: 75%) was obtained.

1H-NMR (300MHz, CDCl3) δ: 8.71 (s, 1H), 6.66 (d, J=10.2㎐, 1H), 5.25 (d, J=10.2㎐, 1H), 2.47 (5, 3H0, 1.26 (2, 12H). 1 H-NMR (300 MHz, CDCl 3 ) δ: 8.71 (s, 1H), 6.66 (d, J = 10.2 Hz, 1H), 5.25 (d, J = 10.2 Hz, 1H), 2.47 (5, 3H0, 1.26 (2, 12H).

실시예 3. 5-(Z)-(2-벤조[1,3,2]디옥사보롤-2-일-비닐)-4-메틸 티아졸 제조Example 3. Preparation of 5- (Z)-(2-benzo [1,3,2] dioxaborole-2-yl-vinyl) -4-methyl thiazole

실시예 1에서 제조된 5-에티닐-4-메틸 티아졸 11.0g(0.07mol)에 [Rh(cod)Cl]24.3g와 포스핀 리간드(P(iPr)3) 6.7g 및 TEA 0.101g(1mmol)과 벤조[1,3,2]디옥사보롤 14.0g(0.05mol)을 첨가하고 4시간동안 80℃에서 환류 교반하였다. 이 반응물을 냉각시키고 증류수를 첨가하여 생성된 침전물을 여과한 다음 증류수로 씻어주고 건조하여, 5-(Z)-(2-벤조[1,3,2]디옥사보롤-2-일-비닐)-4-메틸 티아졸 11.34g (수율: 81%)을 얻었다.To 11.0 g (0.07 mol) of 5-ethynyl-4-methyl thiazole prepared in Example 1, 4.3 g of [Rh (cod) Cl] 2 , 6.7 g of phosphine ligand (P (iPr) 3 ) and 0.101 g of TEA (1 mmol) and 14.0 g (0.05 mol) of benzo [1,3,2] dioxaborole were added and stirred under reflux at 80 ° C. for 4 hours. The reactant was cooled, distilled water was added, the resulting precipitate was filtered, washed with distilled water and dried to give 5- (Z)-(2-benzo [1,3,2] dioxaborole-2-yl-vinyl). 11.34 g (yield: 81%) of 4-methyl thiazole were obtained.

1H-NMR (300MHz, CDCl3) δ: 8.71 (s, 1H), 6.65 (m, 4H0, 6.66 (d, J=10㎐, 1H), 5.23 (d, J=10㎐, 1H), 2.47 (s, 3H). 1 H-NMR (300 MHz, CDCl 3 ) δ: 8.71 (s, 1H), 6.65 (m, 4H0, 6.66 (d, J = 10 Hz, 1H), 5.23 (d, J = 10 Hz, 1H), 2.47 (s, 3 H).

실시예 4. 세프디토렌 피복실 화합물의 제조Example 4 Preparation of Ceftitorene Covering Room Compounds

상기 실시예 2에서 제조된 4-메틸-5-(Z)-[2-(4,4,5,5-테트라메틸-[1,3,2]디옥사보롤란-2-일)비닐] 티아졸 10.725g (0.0375mol)과 세펨 화합물을 DMF 300㎖에 용해시키고, 테트라키스 트리페닐포스핀 팔라듐 (Pd(PPh3)4) 15.2g을 첨가하여, 환류교반하였다. 이 반응물에 POCl32.6g,피리딘 3g, 삼불화아세트산(CF3COOH, trifluoroacetic acid) (30 mg, 0.27 mmol) 및 아니솔 30㎖을 첨가하여 냉각시키고 증류수를 첨가하여 생성된 침전물을 여과한 후, 다음 증류수로 씻어주고 건조하여, 생성된 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산을 얻었으며, 탄산나트륨 3.2g, 피발로일옥시메틸 요오다이드 10.7g(0.05mol)을 DMF 100㎖에 용해시켜 첨가하였으며, 담황색 분말형인 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-4-카르본산 피발로일옥시 메틸 에스테르 화합물을(수율: 72.3%) 얻었다.4-Methyl-5- (Z)-[2- (4,4,5,5-tetramethyl- [1,3,2] dioxaborolan-2-yl) vinyl] prepared in Example 2 above] 10.725 g (0.0375 mol) of thiazole and the cefe compound were dissolved in 300 mL of DMF, and 15.2 g of tetrakis triphenylphosphine palladium (Pd (PPh 3 ) 4 ) was added thereto, followed by reflux stirring. 2.6 g of POCl 3 , 3 g of pyridine, trifluoroacetic acid (CF 3 COOH, trifluoroacetic acid) (30 mg, 0.27 mmol) and 30 ml of anisole were added to the reaction mixture, and the resulting precipitate was filtered by distilled water. , And then rinsed with distilled water and dried to produce 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3- [2- (4-methylthiazole- 5-yl) vinyl] -3-cepem-4-carboxylic acid was obtained, and 3.2 g of sodium carbonate and 10.7 g (0.05 mol) of pivaloyloxymethyl iodide were dissolved and added to 100 ml of DMF. 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3- [2- (4-methylthiazol-5-yl) vinyl] -3-cepem- The 4-carboxylic acid pivaloyloxy methyl ester compound was obtained (yield: 72.3%).

결과적으로, 본원의 그램양성 및 그램음성 박테리아에 탁월한 효과를 지닌 세프디토렌 즉, 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-카르본산 피발로일옥시 메틸에스테르를 제조하는 본원의 신규 제조 방법은 기존의 위티그 반응에 의한 공정 단계를 단순화하여 공지의 방법을 이용한 수율을 현저하게 높여 경제적 및 산업적으로 유용한 발명임을 확인할 수 있었다.As a result, ceftitorene, ie, 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3-, having an excellent effect on the Gram-positive and Gram-negative bacteria herein. The novel process for the preparation of [2- (4-methylthiazol-5-yl) vinyl] -3-cepem-carboxylic acid pivaloyloxy methylester is simplified by simplifying the process steps by the existing Wittig reaction. It was confirmed that the invention is an economically and industrially useful invention by significantly increasing the yield using a known method.

본 발명의 광범위한 항균스펙트럼을 갖는 유용한 항균제인 세프디토렌 피복실 즉, 7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-[2-(4-메틸티아졸-5-일)비닐]-3-세펨-카르본산 피발로일옥시 메틸에스테르의 제조 방법에 있어서, 위티그(Wittig) 반응에 의한 E 이성체의 생성없이 안전하고 단순화한 공정을 수행하여 고순도 및 고수율의 세프디토렌 피복실 화합물을 경제적으로 생산할 수 있다.Ceftitorene cladding, a useful antimicrobial agent having a broad antimicrobial spectrum of the present invention, namely 7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3- [2- A process for the preparation of (4-methylthiazol-5-yl) vinyl] -3-cefem-carboxylic acid pivaloyloxy methyl ester, comprising a safe and simplified process without generation of the E isomer by the Wittig reaction. It is possible to economically produce high purity and high yield of ceftitorene coating compound.

Claims (6)

구조식 (Ⅱ)의 5-에티닐-4-메틸 티아졸 화합물을 염기와 촉매 존재하에서 구조식 (Ⅲa) 또는 (Ⅲb)와 같은 보론화제 화합물과 반응시켜 Z형의 하기 구조식 (Ⅳa) 또는 (Ⅳb)의 중간체 화합물을 얻는 제 1 단계 및 이 중간체 화합물을 일반식 (Ⅴ)의 세펨 화합물과 반응시키는 제 2 단계 공정을 연속적으로 수행함을 특징으로 하는 일반식 (Ⅰ)의 세프디토렌 피복실의 제조방법.The 5-ethynyl-4-methyl thiazole compound of formula (II) is reacted with a boronating agent compound such as formula (IIIa) or (IIIb) in the presence of a base and a catalyst to form Z of the following formulas (IVa) or (IVb) A first step of obtaining an intermediate compound and a second step of reacting the intermediate compound with the cefem compound of formula (V) are carried out continuously. . (Ⅰ) (Ⅰ) (Ⅱ) (Ⅱ) (Ⅲa) (IIIa) (Ⅲb) (IIIb) (Ⅳa) (IVa) (Ⅳb) (IVb) (Ⅴ) (Ⅴ) 상기의 식에서,In the above formula, X는 할로겐 원자, 트리플레이트(-OTf), 메실레이트(-OMs) 또는 토실레이트(-OTs)기이며, PMB는 카르보닐 보호기인 파라메톡시벤질(p-methoxybenzyl)기이다.X is a halogen atom, a triflate (-OTf), mesylate (-OMs) or tosylate (-OTs) group, PMB is a para-methoxybenzyl carbonyl protecting group (p -methoxybenzyl) group. 제 1항에 있어서, 상기 1 단계의 촉매는 [Rh(cod)Cl]2-P(iPr)3,[Rh(cod)Cl]2-PCy3또는 [Ir(cod)Cl]2-P(iPr)3인 제조방법.The method of claim 1, wherein the catalyst of the first step is [Rh (cod) Cl] 2 -P (iPr) 3 , [Rh (cod) Cl] 2 -PCy 3 or [Ir (cod) Cl] 2 -P ( iPr) 3 phosphorus preparation method. 제 1항에 있어서, 상기의 염기는 트리에틸아민 또는 트리메틸아민인 제조방법.The method according to claim 1, wherein the base is triethylamine or trimethylamine. 제 1항에 있어서, 염기의 사용량은 1 내지 2 당량인 제조방법.The production method according to claim 1, wherein the amount of base used is 1 to 2 equivalents. 제 1항에 있어서, 상기 2 단계의 촉매는 Pd(PPh3)4, PdCl2(PPh3)2, PdCl2(PhCN)2, PdCl2(MeCN)2, P(o-tol)3과 각각 2:1의 비를 갖는 Pd2dba3또는 Pd(OAc)2등의 팔라듐 촉매인 제조방법.The catalyst of claim 1, wherein the catalyst of step 2 is Pd (PPh 3 ) 4 , PdCl 2 (PPh 3 ) 2 , PdCl 2 (PhCN) 2 , PdCl 2 (MeCN) 2 , and P ( o- tol) 3 , respectively. A process for producing a palladium catalyst such as Pd 2 dba 3 or Pd (OAc) 2 having a ratio of 2: 1. 제 1항에 있어서, 상기 2 단계의 유기용매는 디메틸포름아미드, 디메틸설폭시드 또는 이들의 혼합용매인 제조방법.The method of claim 1, wherein the organic solvent of the second step is dimethylformamide, dimethyl sulfoxide or a mixed solvent thereof.
KR1020020078278A 2002-12-10 2002-12-10 Novel process for preparing cefditoren KR20040050437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020020078278A KR20040050437A (en) 2002-12-10 2002-12-10 Novel process for preparing cefditoren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020020078278A KR20040050437A (en) 2002-12-10 2002-12-10 Novel process for preparing cefditoren

Publications (1)

Publication Number Publication Date
KR20040050437A true KR20040050437A (en) 2004-06-16

Family

ID=37344633

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020078278A KR20040050437A (en) 2002-12-10 2002-12-10 Novel process for preparing cefditoren

Country Status (1)

Country Link
KR (1) KR20040050437A (en)

Similar Documents

Publication Publication Date Title
EP0175610B1 (en) New cephalosporin compounds and the production thereof
US4847373A (en) Production of 3-allyl- and 3-butenyl-3-cephems
CA1340672C (en) Cephalosporin derivatives
NZ193317A (en) 7-(2-(2-amino-4-thiazolyl)-2-((1-carboxy-1,1-dialkyl)-alkoxyimino)-acetamido)-cephem sulphoxide derivatives and pharmaceutical compositions
KR100528305B1 (en) New process for the preparation of vinyl-pyrrolidinone cephalosporine derivatives
CA2043817A1 (en) Process and intermediates for beta-lactams having aminothiazole (iminooxyacetic acid) acetic acid sidechains
GB2141428A (en) 3-acylamino-2-bcta-dioxo-azetidine-propanoic acid derivitives
EP1132391B1 (en) Process for the preparation of 3-sulfonyloxy-3-cephem compounds
KR100257130B1 (en) Novel cephalosphorine antibiotics
JP2003513983A (en) Method for producing high-purity cefpodoxime proxetil
US4604387A (en) 1,2,4-triazinylthiomethyl-3-cephem sulfoxides, and a procedure for their preparation
KR870002181B1 (en) Process for preparing cephalosporins
US4094978A (en) 3-propenyl derivatives of cephalosporin, compositions and their use
KR20040050437A (en) Novel process for preparing cefditoren
EP0001715A2 (en) Azetidinone antibiotics and their pharmaceutical formulations and use
KR20040050438A (en) Novel process for preparing cefditoren
US4687769A (en) 3-(3,3,3-trifluoropropenyl) cephalosporins
EP0481441B1 (en) Novel cephem compounds, their preparation processes and antibacterial agents
KAMACHI et al. IMPROVED SYNTHESIS OF AN ESTER-TYPE PRODRUG, 1-ACETOXYETHYL 7-[(Z)-2-(2-AMINOTHlAZOL-4-YL)-2-HYDROXYIMINOACETAMIDO]-3-[(Z)-1-PROPENYL]-3-CEPHEM-4-CARBOXYLATE (BMY-28271)
EP0049309B1 (en) Cephem derivatives, process for producing thereof, and antibacterial agents comprising said compounds
EP0188781B1 (en) 1-oxa-1-dethia-cephalosporin compounds and antibacterial agent comprising the same
US3985746A (en) 7-(α-Cyanomethylthio)acetamido-3-cephem carboxylates
NAGANO et al. STUDIES ON β-LACTAM ANTIBIOTICS III. SYNTHESES AND ANTIBACTERIAL ACTIVITIES OF NEW 3-(1, 3-DITHIOLAN-2-YL) CEPHALOSPORINS, YM-22508, YM-16457 AND THEIR PRODRUG-TYPE ESTERS
KR20040077356A (en) Novel process for preparing cefditoren pivoxil
JPH04221388A (en) Cephalosporin compound and production thereof

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid