KR20040040304A - Method and apparatus for manufacturing resources coated with photocatalyst - Google Patents

Method and apparatus for manufacturing resources coated with photocatalyst Download PDF

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KR20040040304A
KR20040040304A KR1020030020696A KR20030020696A KR20040040304A KR 20040040304 A KR20040040304 A KR 20040040304A KR 1020030020696 A KR1020030020696 A KR 1020030020696A KR 20030020696 A KR20030020696 A KR 20030020696A KR 20040040304 A KR20040040304 A KR 20040040304A
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South Korea
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photocatalyst
coating
manufacturing
panel
coating film
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KR1020030020696A
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Korean (ko)
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KR100534034B1 (en
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김주섭
김경한
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김주섭
김경한
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B01J35/39
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/02Processes for applying liquids or other fluent materials performed by spraying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0218Pretreatment, e.g. heating the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures

Abstract

PURPOSE: A method for making photocatalyst-coated materials is provided to minimize photocatalyst loss, to increase coating density and adhesion, to maintain the effect of the photocatalyst for a long time and to save the cost. CONSTITUTION: The method for making photocatalyst-coated materials comprises the steps of: washing a material to be coated with a photocatalyst to remove impurities; depositing a liquid photocatalyst on the material through a spray nozzle spraying a liquid photocatalyst to form a photocatalyst coating; and heating and drying the material coated with the photocatalyst coating in a drying assembly at 20-600 deg.C, wherein UV is irradiated from a UV lamp to activate the photocatalyst coating deposited on the material.

Description

광촉매 코팅피막자재의 제조 방법 및 장치{METHOD AND APPARATUS FOR MANUFACTURING RESOURCES COATED WITH PHOTOCATALYST}METHOD AND APPARATUS FOR MANUFACTURING RESOURCES COATED WITH PHOTOCATALYST}

본 발명은 광촉매 코팅피막자재의 제조 방법 및 장치에 관한 것으로, 더욱 상세하게는 광촉매의 손실을 최소화하고 피막 밀도 및 밀착성을 높이며 광촉매가 활성화되도록 함으로써 광촉매의 기능 향상을 제고할 수 있도록 함과 동시에 장기간의 광촉매 효과를 유지할 수 있도록 한 광촉매 코팅피막자재의 제조 방법 및 장치에 관한 것이다.The present invention relates to a method and apparatus for manufacturing a photocatalyst coating material, and more particularly, to improve the function of the photocatalyst by improving the photocatalyst function by minimizing the loss of the photocatalyst, increasing the film density and adhesion, and activating the photocatalyst. The present invention relates to a method and an apparatus for producing a photocatalyst coating film material capable of maintaining the photocatalytic effect.

일반적으로 광촉매(photocatalyst)는 빛(Photo)과 촉매(catalyst)의 합성어로 빛을 이용한 촉매라 할 수 있으며 빛을 에너지원으로 촉매 반응을 진행시키는 물질을 지칭하는데, 그 자신은 변화하지 않으면서 화학반응을 촉진시키는 효과가 있는 물질이다.In general, photocatalyst is a compound word of photo and catalyst, which is a catalyst using light, and refers to a material that proceeds catalyzed light as an energy source. It is a substance that has an effect of accelerating the reaction.

광촉매로는 반도체성 금속 산화물이나 황 화합물이 이용되는데, 반도체는 일정한 영역의 에너지가 가해지면 전자가 가전자대(valence band)에서 전도대(conduction band)로 여기 된다. 즉, 전도대에는 전자(electron)들이 형성되고 가전자대에는 정공(electron hole)이 형성된다. 이렇게 형성된 전자와 정공은 각각 산화/환원 반응에 참여하게 된다.As the photocatalyst, a semiconducting metal oxide or a sulfur compound is used. In the semiconductor, when a certain region of energy is applied, electrons are excited from the valence band to the conduction band. In other words, electrons are formed in the conduction band and holes are formed in the valence band. The electrons and holes thus formed participate in the oxidation / reduction reaction, respectively.

이러한 광촉매는 그 기능이 다양하여 적용분야가 급속히 확대되고 있는데, 광촉매의 주요효과를 살펴보면 다음과 같다.These photocatalysts have various functions and are rapidly expanding their application fields. The main effects of the photocatalyst are as follows.

첫째, 자정효과(self-cleaning)가 있다. 광촉매는 유기물을 분해하고 먼지나 기름 등 각종 오염물을 용이하게 제거하므로 청결상태를 유지할 수 있게 한다.First, there is self-cleaning. Photocatalyst can keep organic state by decomposing organic matter and easily removing various contaminants such as dust and oil.

둘째, 냄새를 제거한다. 실내 및 밀폐된 공간에서 발생하는 각종 미생물균 및 악취를 분해하여 준다. 광촉매는 단순한 냄새 흡수가 아니라 담배의 니코친, 곰팡이, 암모니아 계통의 냄새 원인을 분자 레벨로 분해하므로 근본적인 냄새를 제거한다.Second, remove the smell. Decomposes various microorganisms and odors generated in indoor and enclosed spaces. Photocatalysts eliminate fundamental odors by breaking down the odor causes of nicotine, mold and ammonia from tobacco at the molecular level, rather than simply absorbing odors.

셋째, 살균작용을 한다. 광촉매는 각종 병원균과 박테리아 등 모든 대상물질을 산화시켜 살균되게 한다.Third, sterilization. The photocatalyst oxidizes and sterilizes all target substances such as various pathogens and bacteria.

넷째, 오염방지작용을 한다. 광촉매는 축산폐수, 오수, 공장폐수의 BOD, 색도 및 난분해성 오염물질 및 환경호르몬 등을 완벽히 제거하여준다.Fourth, to prevent pollution. Photocatalysts completely remove livestock wastewater, sewage, factory wastewater BOD, chromatic and hardly degradable contaminants, and environmental hormones.

한편, 이와 같은 광촉매의 다양한 기능 및 효과에 의하여 광촉매의 적용범위는 급속도로 확대 적용되어가고 있는데, 종래의 기술에 의하면 광촉매의 응용시 광촉매의 피막밀도 및 밀착성이 떨어지거나 활성화가 제대로 이루어지지 못하여 오히려 광촉매의 기능 및 효과를 저하시키는 요인으로 작용할 뿐만 아니라 장기간의 효과유지가 어려워 반영구적으로 사용할 수 없는 문제점이 있으며, 제작단가가 높아 광범위한 적용을 어렵게 하는 문제점이 있었다.On the other hand, due to the various functions and effects of the photocatalyst, the application range of the photocatalyst is rapidly expanding and applied. According to the related art, the film density and adhesiveness of the photocatalyst are decreased or activation is not properly performed when the photocatalyst is applied. Not only does it act as a factor to deteriorate the function and effect of the photocatalyst, there is a problem that can not be used semi-permanently because it is difficult to maintain the long-term effect, there is a problem that the high production cost makes it difficult to apply a wide range.

본 발명은 상기와 같은 문제점을 해결하기 위하여 제안된 것으로서, 그 목적으로 하는 바는 광촉매의 손실을 최소화하고 피막 밀도 및 밀착성을 높일 수 있도록 함과 더불어 장기간의 광촉매 효과를 유지할 수 있도록 하며 제작단가를 낮출수 있도록 한 광촉매 코팅피막자재의 제조방법을 제공하는데 있다.The present invention has been proposed to solve the above problems, and its purpose is to minimize the loss of the photocatalyst, to increase the film density and adhesion, and to maintain the long-term photocatalytic effect and to increase the manufacturing cost. It is to provide a method for producing a photocatalyst coating film material to be lowered.

특히, 본 발명은 자외선의 빛에너지 조사에 의하여 광촉매의 활성화를 촉진시킬 수 있도록 한 광촉매 코팅피막자재의 제조방법을 제공하는데 있다.In particular, the present invention is to provide a method for producing a photocatalyst coated film material to facilitate the activation of the photocatalyst by irradiation of light energy of ultraviolet light.

본 발명의 다른 목적은 광촉매의 손실을 최소화하고 피막 밀도 및 밀착성을 높일 수 있으며 광촉매의 활성화를 촉진시킬 수 있도록 한 광촉매 코팅피막자재의 제조장치를 제공하는데 있다.Another object of the present invention is to provide an apparatus for producing a photocatalyst coating film material which can minimize the loss of the photocatalyst, increase the film density and adhesion, and promote the activation of the photocatalyst.

도 1은 본 발명에 따른 광촉매 코팅피막자재의 제조장치를 나타낸 전체 구성도.1 is an overall configuration diagram showing an apparatus for manufacturing a photocatalyst coating film material according to the present invention.

도 2는 도 1의 장치 중 광촉매 분사 어셈블리를 나타내는 상세도.FIG. 2 is a detailed view of the photocatalyst injection assembly of the device of FIG. 1. FIG.

도 3은 본 발명에 따른 광촉매 코팅피막자재의 제조장치를 나타낸 정면도.Figure 3 is a front view showing an apparatus for producing a photocatalyst coating film material according to the present invention.

도 4 및 도 5는 본 발명의 잉크분해시험 결과를 나타낸 사진.4 and 5 are photographs showing the ink decomposition test results of the present invention.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

10: 광촉매 코팅부재 20: 광촉매 코팅피막자재10: photocatalyst coating member 20: photocatalyst coating film material

100: 광촉매 코팅피막 제조장치 110: 컨베이어100: photocatalyst coating film manufacturing apparatus 110: conveyor

120: 광촉매 분사 어셈블리 121: 코팅실120: photocatalyst injection assembly 121: coating chamber

122: 분사노즐 123: 광촉매 공급부122: injection nozzle 123: photocatalyst supply unit

124: 공기압 공급부 130: 건조 어셈블리124: pneumatic pressure supply 130: drying assembly

140: 자외선램프140: UV lamp

상기 목적을 달성하기 위한 본 발명의 광촉매 코팅피막자재의 제조방법은,Method for producing a photocatalyst coating film material of the present invention for achieving the above object,

광촉매 코팅부재를 세척하여 불순물을 제거하고 광촉매 액상을 분사하는 분사노즐을 통해 상기 광촉매 코팅부재에 광촉매 액상을 균일하게 도포하여 광촉매 피막을 형성되게 한 후 20~600℃ 조건의 건조 어셈블리에서 광촉매 코팅피막이 형성된 상기 광촉매 코팅부재를 가열/건조시키되 자외선램프에 의한 조사를 통하여 상기 광촉매 코팅부재에 코팅된 광촉매의 피막을 활성화시켜 광촉매 코팅피막자재를 제조하는 방법을 그 기술적 공정상의 기본 특징으로 한다.After the photocatalyst coating member is removed, impurities are removed and the photocatalyst liquid is uniformly applied to the photocatalyst coating member through a spray nozzle which sprays the photocatalyst liquid. The method of manufacturing a photocatalyst coating film material by heating / drying the formed photocatalyst coating member and activating the film of the photocatalyst coated on the photocatalyst coating member through irradiation with an ultraviolet lamp is a basic feature of the technical process.

상기 목적을 달성하기 위한 본 발명의 광촉매 코팅피막자재의 제조장치는,Apparatus for producing a photocatalyst coating film material of the present invention for achieving the above object,

광촉매 코팅부재를 일정 전송속도로 이동시키는 컨베이어와, 상기 컨베이어에 의해 이송되는 광촉매 코팅부재에 광촉매 액상을 균일하게 분사하여 광촉매 피막을 형성시키는 광촉매 분사 어셈블리와, 상기 컨베이어의 상에 설치되며 상기 광촉매 분사 어셈블리를 통해 광촉매 피막이 형성된 상기 광촉매 코팅부재에 열에너지를 공급하여 가열/건조시키는 건조 어셈블리를 포함하여 이루어지는 것을 그 기술적 장치상의 기본 특징으로 한다.A conveyor for moving the photocatalyst coating member at a constant transmission speed, a photocatalyst injection assembly for uniformly injecting a photocatalyst liquid onto the photocatalyst coating member transported by the conveyor to form a photocatalyst film, and a photocatalyst injection on the conveyor And a drying assembly for supplying heat energy to the photocatalyst coating member on which the photocatalytic coating film is formed through the assembly and heating / drying the same.

이하에서는 본 발명의 바람직한 실시예를 도면을 참조하면서 상세히 설명하기로 하며, 이 실시예를 통해 본 발명의 목적, 특징 및 이점들을 보다 잘 이해할 수 있게 될 것이다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings, through which the objects, features, and advantages of the present invention will be better understood.

도 1은 본 발명에 따른 광촉매 코팅피막자재의 제조장치를 나타낸 전체 구성도이고, 도 2는 도 1의 장치 중 광촉매 분사 어셈블리를 나타내는 상세도이며, 도 3은 본 발명에 따른 광촉매 코팅피막자재의 제조장치를 나타낸 정면도이다.1 is an overall configuration diagram showing an apparatus for manufacturing a photocatalyst coating film material according to the present invention, Figure 2 is a detailed view showing a photocatalyst injection assembly of the apparatus of Figure 1, Figure 3 is a photocatalyst coating film material of the present invention It is a front view which shows a manufacturing apparatus.

도 1 내지 도 3에 나타낸 바와 같이, 본 발명에 따른 광촉매 코팅피막자재의 제조장치(100)는 광촉매 코팅부재(10)를 이동시키는 컨베이어(110)와, 상기 컨베이어(110)에 의해 이송되는 광촉매 코팅부재(10)에 광촉매 액상의 분사를 통해 광촉매를 도포하여 광촉매 피막을 형성시키는 광촉매 분사 어셈블리(120)와, 상기 컨베이어(110) 상에 설치되며 상기 광촉매 분사 어셈블리(120)를 통해 광촉매 피막이 형성된 광촉매 코팅부재에 열에너지를 공급하여 가열/건조시키는 건조 어셈블리(130)와, 상기 건조 어셈블리(130)의 내부 상측에 설치되며 광촉매 피막이 형성된 광촉매 코팅부재에 빛에너지를 공급하여 코팅피막된 광촉매의 활성화를 촉진시키는 자외선램프(140)로 이루어진다.1 to 3, the apparatus 100 for manufacturing a photocatalyst coating film material according to the present invention includes a conveyor 110 for moving the photocatalyst coating member 10 and a photocatalyst transferred by the conveyor 110. A photocatalyst spraying assembly 120 for forming a photocatalyst film by applying a photocatalyst to the coating member 10 by spraying a photocatalyst liquid, and a photocatalyst film formed on the conveyor 110 to form a photocatalyst film through the photocatalyst spraying assembly 120. Drying assembly 130 for heating / drying by supplying heat energy to the photocatalyst coating member, and light energy is supplied to the photocatalyst coating member which is installed on the inside of the drying assembly 130 and is formed with a photocatalyst coating to activate the coated photocatalyst. It consists of an ultraviolet lamp 140 to promote.

이때, 상기 컨베이어(110)는 1m/min∼5m/min의 전송속도 조건으로 조절되도록 한다.At this time, the conveyor 110 is adjusted to a transmission speed condition of 1m / min ~ 5m / min.

상기 광촉매 분사 어셈블리(120)는 외부의 물리적인 요인으로부터 보호하여광촉매 피막효율을 향상시키기 위한 코팅실(121)과, 상기 코팅실(121) 내부에 위치하여 광촉매 액상을 분사하며 왕복작동을 위한 셔틀 주파수 10∼40shuttle/min 및 분사직경 0.2∼1.0mm를 갖는 분사노즐(122)과, 상기 분사노즐(122)에 연결되어 광촉매를 액상으로 공급하는 광촉매 공급부(123)와, 상기 분사노즐(122)에 연결되어 광촉매 액상이 일정 분사되도록 1∼7kg/㎠의 공기압을 제공하는 공기압 공급부(124)로 구성된다.The photocatalyst injection assembly 120 is coated with a coating chamber 121 to improve the photocatalytic coating efficiency by protecting against external physical factors, and is located inside the coating chamber 121 to inject a photocatalyst liquid and shuttle for reciprocating operation. An injection nozzle 122 having a frequency of 10 to 40 shuttle / min and an injection diameter of 0.2 to 1.0 mm, a photocatalyst supply unit 123 connected to the injection nozzle 122 to supply a photocatalyst in a liquid state, and the injection nozzle 122 Is connected to the air is composed of a pneumatic pressure supply unit 124 for providing a pneumatic pressure of 1 ~ 7kg / ㎠ so that the photocatalyst liquid is injected.

여기서, 광촉매 공급부(123)는 광촉매를 20∼50cc/min의 공급조건으로 분사노즐(122)에 공급되도록 한다.Here, the photocatalyst supply unit 123 allows the photocatalyst to be supplied to the injection nozzle 122 under a supply condition of 20 to 50 cc / min.

상기 자외선램프(140)는 315nm~400nm인 장파 A영역의 자외선 방출이 이루어지도록 한다.The ultraviolet lamp 140 emits ultraviolet light in a long wave region A of 315 nm to 400 nm.

한편, 본 발명의 상세한 구성설명의 기재에 있어 전반적으로 사용되어지는 상기 광촉매 코팅부재(10)는 "광촉매의 코팅 형성을 위한 부수적인 재료(部材)"를 의미하며 광촉매의 코팅피막이 이루어지지 않은 기본재료에 해당되는 것으로 이해하면 된다.On the other hand, the photocatalyst coating member 10 which is generally used in the description of the detailed configuration of the present invention means "ancillary material for forming a coating of the photocatalyst" and the basic coating film of the photocatalyst is not formed. It is understood that it corresponds to the material.

또한, 차후에 기술될 광촉매 코팅피막자재(20)는 "상기 광촉매 코팅부재(10)에 본 발명에서 기술하는 조건으로 광촉매가 도포되어 광촉매의 코팅피막이 이루어진 자재(資材)"를 의미하는 것이다.In addition, the photocatalyst coating film material 20 to be described later means "a material in which the photocatalyst is coated on the photocatalyst coating member 10 under the conditions described in the present invention to form a coating film of the photocatalyst".

상기와 같은 구성으로 이루어진 본 발명에 따른 광촉매 코팅피막자재의 제조장치(100)의 작용 및 이를 이용하여 광촉매 코팅부재(10)에 광촉매의 코팅피막을 극대화시킬 수 있도록 한 광촉매 코팅피막자재의 제조방법을 도 1 내지 도 3을 참조하여 설명하면 다음과 같다.Action of the apparatus 100 for manufacturing a photocatalyst coating film material according to the present invention having the above configuration and a method of manufacturing the photocatalyst coating film material to maximize the coating film of the photocatalyst on the photocatalyst coating member 10 by using the same When described with reference to Figures 1 to 3 as follows.

먼저, 광촉매 코팅피막자재의 제조장치(100)를 최적의 운영조건으로 설치한다.First, the manufacturing apparatus 100 of the photocatalyst coating film material is installed under optimum operating conditions.

컨베이어(110)는 전체길이 20~40m,폭 1.5m로 구성하되 전송속도를 1~5m/min로 설정한다.Conveyor 110 is composed of a total length of 20 ~ 40m , width 1.5m but set the transmission speed to 1 ~ 5m / min.

광촉매 분사 어셈블리(120)는 코팅실(121)을 컨베이어(110) 상의 초기부분에 위치되게 하고 코팅실(121) 내에서 왕복운동이 가능하도록 셔틀 슬라이드 형태(shuttle slide type)의 분사노즐(122)을 설치하며 광촉매 공급부(123) 및 공기압 공급부(124)를 분사노즐(122)의 상측으로 연결한다. 이때, 분사노즐(122)은 분사직경을 0.5mm로 하되 왕복운동을 위한 셔틀 주파수(shuttle frequency)를 20shuttle/min로 설정하는 것이 좋고, 광촉매 공급부(123)에서는 30cc/min의 소모량으로 공급되도록 설정하며, 공기압 공급부(124)에서는 3kg/㎠의 공기압이 공급되도록 설정하는 것이 바람직하다.The photocatalyst injection assembly 120 allows the coating chamber 121 to be positioned at an initial portion on the conveyor 110 and a shuttle slide type injection nozzle 122 to allow reciprocating movement in the coating chamber 121. And connect the photocatalyst supply part 123 and the pneumatic pressure supply part 124 to the upper side of the injection nozzle 122. At this time, the injection nozzle 122 is preferably set to the injection diameter of 0.5mm but the shuttle frequency (shuttle frequency) for the reciprocating motion (shuttle frequency) is set to 20shuttle / min, the photocatalyst supply unit 123 is set to be supplied at a consumption of 30cc / min The air pressure supply unit 124 is preferably set to supply the air pressure of 3kg / ㎠.

건조 어셈블리(130)는 광촉매 분사 어셈블리(120)의 뒤쪽에 위치시키되 오븐(oven)을 사용하도록 하며, 광촉매의 기능 저하를 방지하도록 600?? 이내에서 가열/건조되게 한다. 이때, 건조 어셈블리(130)는 그 중심부 온도를 전/후반부의 온도에 비해 높게 형성되도록 하며 중심부 온도는 가열/건조를 위한 최대치가 형성되도록 한다The drying assembly 130 is positioned at the rear of the photocatalyst injection assembly 120 to use an oven, and to prevent deterioration of the photocatalyst. Allow heating / drying within At this time, the drying assembly 130 is to form the central temperature higher than the temperature of the front / rear portion, and the central temperature is such that the maximum value for heating / drying is formed.

자외선램프(140)는 건조 어셈블리(130) 내의 상측부에 일정간격으로 다수 설치한다.UV lamp 140 is installed in a plurality at regular intervals on the upper side in the drying assembly (130).

다음으로, 광촉매 코팅부재(10)의 표면을 AIR나, 물·세제 등의 세척제, 알코올 및 솔벤트 등으로 깨끗하게 세척하여 불순물을 제거한다. 이는 코팅부재(10)에 광촉매의 코팅피막을 용이하게 형성되게 할 뿐만 아니라 광촉매의 손실을 최소화할 수 있게 한다.Next, the surface of the photocatalyst coating member 10 is cleaned with AIR, a cleaning agent such as water and detergent, alcohol, solvent, and the like to remove impurities. This makes it possible to easily form a coating film of the photocatalyst on the coating member 10 as well as to minimize the loss of the photocatalyst.

광촉매 코팅부재(10)로는 폴리카보네이트 시트, 알루미늄 불소 패널, 알루미늄 복합패널 및 SHEET판넬, 아연도 불소 패널, 법랑 패널, STS 패널(스테인리스 패널) 및 착색패널 등의 패널부재와 타일, 유리, 커튼, 버티칼, 블라인드, 금속천장재 등이 사용되며 사용용도에 따라 어느 하나를 선택 사용하면 된다.The photocatalyst coating member 10 includes panel members such as polycarbonate sheets, aluminum fluorine panels, aluminum composite panels and sheet panels, galvanized fluorine panels, enamel panels, STS panels (stainless panels) and colored panels, and tiles, glass, curtains, Verticals, blinds, metal ceilings, etc. are used, and any one can be selected depending on the intended use.

상기와 같이 광촉매 코팅피막자재의 제조장치(100)가 설치되고 광촉매 코팅부재(10)의 세척이 완료되면, 광촉매 코팅 형성을 위한 코팅부재(10)를 일정 전송속도로 작동하는 컨베이어(110) 상에 투입한다.When the apparatus 100 for manufacturing the photocatalyst coating film material is installed as described above and the cleaning of the photocatalyst coating member 10 is completed, the coating member 10 for forming the photocatalyst coating is operated on a conveyor 110 at a constant transmission speed. Put it in.

컨베이어(110) 상에 투입된 광촉매 코팅부재(10)는 광촉매 분사 어셈블리(120)의 코팅실(121) 내로 유입되고 광촉매 공급부(123)로부터 광촉매 액상 30~100cc/min 및 공기압 공급부(124)로부터 공기압 1~7kg/㎠을 제공받은 분사노즐(122)에 의해 광촉매가 분사되어 광촉매 코팅부재(10)의 표면을 도포, 즉 광촉매의 피막 형성을 이루어지게 한다.The photocatalyst coating member 10 introduced on the conveyor 110 flows into the coating chamber 121 of the photocatalyst injection assembly 120 and is supplied with the photocatalytic liquid 30 to 100 cc / min from the photocatalyst supply unit 123 and the pneumatic pressure from the air pressure supply unit 124. The photocatalyst is sprayed by the spray nozzle 122 provided with 1˜7 kg / cm 2 to apply the surface of the photocatalyst coating member 10, that is, to form a film of the photocatalyst.

이때, 분사노즐(122)은 0.2~1.0mm인 분사직경과 1~7kg/㎠인 공기압 및 좌우 왕복작동을 위한 20shuttle/min의 셔틀 주파수에 의해 광촉매 피막 두께를 0.5∼1㎛로 유지되게 한다.At this time, the injection nozzle 122 is to maintain the photocatalytic film thickness of 0.5 ~ 1㎛ by the injection diameter of 0.2 ~ 1.0mm and the air pressure of 1 ~ 7kg / ㎠ and the shuttle frequency of 20shuttle / min for the left and right reciprocating operation.

여기서, 피막 형성에 사용되는 광촉매로는 TiO2, ZnO, CdS, WO3등 여러 종류를 사용할 수 있지만, 광(光) 여기반응을 일으키는데 필요한 에너지가 387.5nm 정도로 태양광으로부터 충분한 에너지를 받을 수 있고 화학적으로 안정하며 인체에 무해한 점 등 물성이 우수할 뿐만 아니라 염소나 오존보다 높은 산화력을 갖고 있어 강력한 살균력과 모든 유기물을 이산화탄소와 물로 분해할 수 있는 능력이 있는 산화티타늄(TiO2)을 사용하는 것이 바람직하다.Here, as the photocatalyst used for forming the film, various kinds such as TiO 2 , ZnO, CdS, and WO 3 may be used, but the energy required to cause the photoexcitation reaction may receive sufficient energy from the sunlight as about 387.5 nm. It is not only chemically stable and harmless to human body but also has higher oxidizing power than chlorine or ozone, so it is recommended to use titanium oxide (TiO 2 ) which has strong sterilizing power and ability to decompose all organic matter into carbon dioxide and water. desirable.

광촉매의 피막 형성이 이루어진 광촉매 코팅부재(10)는 컨베이어(110)의 전송속도에 의해 이동되어 건조 어셈블리(130) 내로 유입되고 열에너지의 공급에 의한 광촉매로서의 기능성 건조가 시작되는데, 사용되는 광촉매 코팅부재(10)의 종류에 따라 건조 어셈블리(130)의 온도를 다르게 설정하여 광촉매의 기능성과 밀착성 및 경도가 최적화되도록 한다.The photocatalyst coating member 10 in which the film formation of the photocatalyst is formed is moved by the transmission speed of the conveyor 110 to be introduced into the drying assembly 130 and to start functional drying as a photocatalyst by supplying thermal energy. The temperature of the drying assembly 130 is set differently according to the type of 10 so that the functionality, adhesion and hardness of the photocatalyst are optimized.

여기서, 건조 어셈블리(130)의 온도조건으로는 광촉매 코팅부재(10)가 폴리카보네이트 시트·알루미늄 복합패널 및 SHEET판넬·착색 패널인 경우 20~40℃로 설정하고, 커튼·버티칼·블라인드·금속천장재인 경우 20~30℃로 설정하고, 아연도 불소 패널인 경우 30~50℃로 설정하고, STS 패널인 경우 60~80℃로 설정하며, 법랑 패널·타일·유리인 경우 500~600℃로 설정하는 것이 바람직하다.Here, as the temperature condition of the drying assembly 130, the photocatalyst coating member 10 is set to 20 to 40 ° C. in the case of the polycarbonate sheet aluminum composite panel and the sheet panel and the coloring panel, and the curtain vertical blind metal ceiling material Is set to 20 ~ 30 ℃, zinc is set to 30 ~ 50 ℃ for fluorine panel, 60 ~ 80 ℃ for STS panel, and 500 ~ 600 ℃ for enamel panel, tile and glass. It is desirable to.

나아가, 열에너지의 공급과 더불어 자외선램프(140)에 의한 빛에너지(특히 315nm~400nm인 장파 A영역의 자외선)가 공급되어 광촉매의 코팅피막효율을 향상시킴은 물론 광촉매의 활성화를 촉진되게 한다. 이는 광촉매의 기능성과 밀착성 및 경도의 증대효과를 발휘한다.Furthermore, in addition to supplying thermal energy, light energy (particularly, ultraviolet rays in the long wave A region of 315 nm to 400 nm) is supplied by the ultraviolet lamp 140 to improve the coating film efficiency of the photocatalyst and to promote the activation of the photocatalyst. This exerts an effect of increasing the functionality, adhesion and hardness of the photocatalyst.

그래서, 광촉매 분사 어셈블리(120) 및 건조 어셈블리(130)를 통과하면 광촉매의 피막 밀도 및 밀착성이 좋아지고 광촉매의 기능성 및 경도가 증대되어 장기간의 효과를 발휘할 수 있을 뿐만 아니라 저가공급이 가능한 광촉매 코팅피막자재(20)가 완성된다.Therefore, when passing through the photocatalyst injection assembly 120 and the drying assembly 130, the film density and adhesion of the photocatalyst may be improved, and the functionality and hardness of the photocatalyst may be increased, thereby providing a long-term effect and providing a low-cost photocatalyst coating film. Material 20 is completed.

이렇게 제조된 본 발명의 광촉매 코팅피막자재(20)는 주로 건축자재용 내/외장재 및 생활용품으로 사용할 수 있으며 자정효과(self-cleaning), 오염방지효과 및 살균효과 등의 기능을 발휘하게 된다.The photocatalyst coating film material 20 of the present invention manufactured as described above can be mainly used as interior / exterior materials and household goods for building materials, and exhibits functions such as self-cleaning, anti-pollution effect, and sterilization effect.

한편, 본 발명에 의해 제조된 광촉매 코팅피막자재(20)에 대하여 자정효과를 확인하기 위해 잉크분해시험을 실시하였으며 그 결과를 도 4 및 도 5를 참조하여 살펴보면 다음과 같다.On the other hand, for the photocatalyst coating film material 20 prepared by the present invention was carried out an ink decomposition test to confirm the self-cleaning effect and the results are described with reference to Figures 4 and 5 as follows.

[잉크분해시험][Ink Decomposition Test]

1. 시험방법 : 하나의 시험부재(법랑패널) 상에 좌측부는 광촉매 코팅피막을 형성시키지 않은 일반적인 상태로 두고 우측부는 본 발명에 의한 광촉매의 코팅피막이 형성된 상태로 구획한 후 동일한 잉크를 도포하여 시간경과에 따른 잉크분해능력을 테스트하였다. 이때, 광택은 96∼98을 유지하게 하였으며, 마스킹용 동전을 경계지역에 위치하게 하였다.1. Test method: On one test member (enamel panel), the left part is left in a general state without forming a photocatalyst coating film and the right part is partitioned in a state where a coating film of photocatalyst according to the present invention is formed, and then the same ink is applied for a time. Ink degradability was tested over time. At this time, the gloss was maintained at 96-98, and the masking coin was placed at the boundary area.

2. 시험결과 : 잉크를 도포한 후 20분이 경과된 때부터 광촉매의 코팅피막이 형성된 상태의 우측부에서 잉크가 연해져 잉크분해가 시작됨을 확인할 수 있고, 1시간 20분이 경과된 때부터는 잉크분해의 촉진에 따라 광촉매의 피막이 형성되지 않은 일반적인 상태의 좌측부와 확연하게 구분됨이 보였으며 계속적인 시간 경과시 좌측부와 우측부가 더욱 뚜렷하게 차이를 나타내었다.2. Test result: After 20 minutes have passed after application of ink, it can be confirmed that the ink is softened at the right part of the state where the coating film of the photocatalyst is formed, and the ink decomposition starts. As a result of the promotion, the left side of the photocatalyst was not clearly formed, and the left side and the right side of the photocatalyst were more clearly distinguished.

한편, 본 발명에 따른 광촉매 코팅피막자재의 제조 방법 및 장치는 첨부된 도면 및 상술한 바와 같은 구체적인 실시예에 의하여 특별히 제한되는 것은 아니며 본 발명의 기술적 사상의 범위 내에서 다양한 적용이 가능함은 자명하다 할 것이다.On the other hand, the method and apparatus for manufacturing a photocatalyst coating film material according to the present invention is not particularly limited by the accompanying drawings and the specific embodiments as described above, it is apparent that various applications are possible within the scope of the technical idea of the present invention. something to do.

이상에서 살펴본 바와 같이 본 발명에 따른 광촉매 코팅피막자재의 제조 방법 및 장치에 의하면, 광촉매 코팅피막을 위한 광촉매 분사 어셈블리와 광촉매로서의 기능성 발휘 및 경도를 위한 건조 어셈블리의 운영조건을 최적으로 하되 자외선램프에 의한 자외선 조사를 통하여 광촉매의 활성화를 촉진되게 함으로써 광촉매의 손실을 최소화시키면서 피막 밀도 및 밀착성을 높일 수 있고 광촉매의 기능성 발휘 및 경도를 증대시킬 수 있으며 장기간의 광촉매 효과를 유지할 수 있을 뿐만 아니라 광촉매 코팅피막자재의 제작단가를 낮출 수 있는 유용한 효과가 있다.As described above, according to the method and apparatus for manufacturing the photocatalyst coating material according to the present invention, the photocatalyst injection assembly for the photocatalyst coating film and the operating conditions of the drying assembly for the function and hardness of the photocatalyst are optimally applied to the UV lamp. By activating photocatalyst through UV irradiation, photocatalyst density and adhesion can be increased while minimizing loss of photocatalyst, functional performance and hardness of photocatalyst can be increased, long-term photocatalytic effect can be maintained, and photocatalyst coating film There is a useful effect to lower the manufacturing cost of the material.

따라서, 본 발명의 광촉매 코팅피막자재의 제조 방법 및 장치에 의해 제조되는 폴리카보네이트 시트, 알루미늄 불소 패널, 알루미늄 복합패널 및 SHEET판넬, 아연도 불소 패널, 법랑 패널, STS 패널(스테인리스 패널) 및 착색패널 등의 패널부재와 타일, 유리, 커튼, 버티칼, 블라인드, 금속천장재 등의 광촉매 코팅피막자재는 광촉매 효과의 장기간 발휘가 가능하고 반영구적으로 사용할 수 있으며 저렴한 공급이 가능하여 적용범위의 확대를 기할 수 있는 이점을 지니게 된다.Therefore, polycarbonate sheet, aluminum fluorine panel, aluminum composite panel and sheet panel, galvanized fluorine panel, enamel panel, STS panel (stainless steel panel) and colored panel produced by the method and apparatus for manufacturing the photocatalyst coating film material of the present invention Photocatalyst coated film materials such as panel members such as tiles, glass, curtains, verticals, blinds, and metal ceiling materials can exhibit long-term photocatalytic effects, can be used semi-permanently, and can be supplied inexpensively to expand the scope of application. It has an advantage.

Claims (10)

광촉매 코팅부재를 세척하여 불순물을 제거하고 광촉매 액상을 분사하는 분사노즐을 통해 상기 광촉매 코팅부재에 광촉매 액상을 균일하게 도포하여 광촉매의 피막을 형성되게 한 후 20~600℃ 조건의 건조 어셈블리에서 광촉매 피막이 형성된 상기 광촉매 코팅부재를 가열/건조시키되 자외선램프에 의한 자외선 조사를 통하여 상기 광촉매 코팅부재에 코팅된 광촉매의 피막을 활성화시켜 광촉매 코팅피막자재를 제조하는 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.After washing the photocatalyst coating member to remove impurities and uniformly apply the photocatalyst liquid to the photocatalyst coating member through a spray nozzle for spraying the photocatalyst liquid to form a film of the photocatalyst, and then the photocatalyst film is dried in a dry assembly at a temperature of 20 to 600 ° C. Method of manufacturing a photocatalyst coating film material, characterized in that for heating / drying the formed photocatalyst coating member to activate the film of the photocatalyst coated on the photocatalyst coating member through ultraviolet irradiation with an ultraviolet lamp. 제 1 항에 있어서,The method of claim 1, 상기 광촉매 코팅부재는 폴리카보네이트 시트, 알루미늄 불소 패널, 알루미늄 복합패널 및 SHEET판넬, 아연도 불소 패널, 법랑 패널, STS 패널, 착색패널, 타일, 유리, 커튼, 버티칼, 블라인드, 금속천장재 중에서 선택되는 어느 하나인 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.The photocatalyst coating member is a polycarbonate sheet, Aluminum fluorine panels, Aluminum composite panel and sheet panel, galvanized fluorine panel, enamel panel, STS panel, coloring panel, tile, glass, curtain, vertical, blind, metal ceiling material manufacturing method of the photocatalyst coating material, characterized in that any one selected from . 제 1 항에 있어서,The method of claim 1, 상기 자외선램프에 의한 자외선은 그 파장이 315nm~400nm의 장파 A영역인 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.Ultraviolet light by the ultraviolet lamp has a wavelength of 315nm ~ 400nm long-wave A region of the manufacturing method of the photocatalyst coating film material, characterized in that. 제 1 항에 있어서,The method of claim 1, 상기 광촉매 도포를 위한 분사노즐의 공기압 및 직경은 각각 1∼7kg/㎠, 0.2∼1.0mm로 하는 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.The air pressure and the diameter of the spray nozzle for coating the photocatalyst is 1 ~ 7kg / ㎠, 0.2 ~ 1.0mm The method of manufacturing a photocatalyst coating material, characterized in that. 제 1 항에 있어서,The method of claim 1, 상기 광촉매 코팅부재에 도포되는 광촉매의 피막 두께는 0.5∼1㎛로 하는 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.The film thickness of the photocatalyst applied to the photocatalyst coating member is 0.5 to 1㎛ characterized in that the manufacturing method of the photocatalyst coating film material. 제 1 항 또는 제 2 항에 있어서,The method according to claim 1 or 2, 상기 건조 어셈블리의 온도조건으로는 상기 광촉매 코팅부재가 폴리카보네이트 시트·알루미늄 복합패널 및 SHEET판넬·착색 패널인 경우 20~40℃, 커튼·버티칼·블라인드·금속천장재인 경우 20~30℃, 아연도 불소 패널인 경우 30~50℃, STS 패널인 경우 60~80℃, 법랑 패널·타일·유리인 경우 500~600℃로 설정하는 것을 특징으로 하는 광촉매 코팅피막자재의 제조방법.The temperature conditions of the drying assembly are 20 to 40 ° C. for the photocatalyst coating member for polycarbonate sheet, aluminum composite panel, sheet panel and colored panel, and 20 to 30 ° C. for zinc curtain, vertical blind, and metal ceiling material. 30 to 50 ° C. for fluorine panels, 60 to 80 ° C. for STS panels, and 500 to 600 ° C. for enamel panels, tiles and glass. 광촉매 코팅피막을 위한 코팅부재(10)를 일정 전송속도로 이동시키는 컨베이어(110)와,A conveyor 110 for moving the coating member 10 for the photocatalyst coating film at a constant transmission speed; 상기 컨베이어(110)에 의해 이송되는 상기 광촉매 코팅부재(10)에 광촉매 액상을 균일하게 분사하여 광촉매 피막을 형성시키는 광촉매 분사 어셈블리(120)와,A photocatalyst injection assembly 120 for forming a photocatalyst film by uniformly injecting a photocatalyst liquid onto the photocatalyst coating member 10 conveyed by the conveyor 110; 상기 컨베이어(110)의 연장 위에 설치되며 상기 광촉매 분사 어셈블리(120)를 통해 광촉매의 코팅피막이 형성된 상기 코팅부재(10)에 열에너지를 공급하여 가열/건조시키는 건조 어셈블리(130)를 포함하여 이루어지는 것을 특징으로 하는 광촉매 코팅피막자재의 제조장치(100).It is installed on the extension of the conveyor 110 and comprises a drying assembly 130 for heating / drying by supplying thermal energy to the coating member 10 formed with a coating film of the photocatalyst through the photocatalyst injection assembly 120 Apparatus for producing a photocatalyst coating film material (100). 제 7 항에 있어서,The method of claim 7, wherein 상기 건조 어셈블리(130)의 내부 상측에 설치되며, 광촉매의 코팅피막이 형성된 상기 광촉매 코팅부재(10)에 자외선의 빛에너지를 공급하여 광촉매의 활성화를 촉진시키는 자외선램프(140)를 더 포함하여 이루어지는 것을 특징으로 하는 광촉매 코팅피막자재의 제조장치(100).It is installed on the inner upper side of the drying assembly 130, and further comprises an ultraviolet lamp 140 to supply the light energy of the ultraviolet light to the photocatalyst coating member 10 is formed a coating film of the photocatalyst to promote the activation of the photocatalyst Apparatus for manufacturing a photocatalyst coating film material, characterized in that (100). 제 7 항에 있어서,The method of claim 7, wherein 상기 광촉매 분사 어셈블리(120)는,The photocatalyst injection assembly 120, 외부의 물리적인 요인으로부터 보호하여 광촉매 피막효율을 향상시키기 위한 코팅실(121)과,A coating chamber 121 for protecting from external physical factors to improve photocatalytic coating efficiency; 상기 코팅실(121) 내부에 위치하여 광촉매 액상을 분사하며 왕복운동을 위한 셔틀 주파수 10∼40shuttle/min 및 분사직경 0.2∼1.0mm를 갖는 분사노즐(122)과,An injection nozzle 122 positioned in the coating chamber 121 to inject a photocatalyst liquid and having a shuttle frequency of 10 to 40 shuttle / min and an injection diameter of 0.2 to 1.0 mm for reciprocating motion; 상기 분사노즐(122)에 연결되어 광촉매 액상을 공급하는 광촉매 공급부(123)와,A photocatalyst supply unit 123 connected to the injection nozzle 122 to supply a photocatalyst liquid phase; 상기 분사노즐(122)에 연결되어 광촉매 액상을 1∼7kg/㎠의 공기압으로 제공하는 공기압 공급부(124)를 포함하는 구성인 것을 특징으로 하는 광촉매 코팅피막자재의 제조장치(100).The apparatus 100 for manufacturing a photocatalyst coating film material, characterized in that it comprises a pneumatic supply unit 124 connected to the injection nozzle 122 to provide a photocatalyst liquid at an air pressure of 1 ~ 7kg / ㎠. 제 8 항에 있어서,The method of claim 8, 상기 자외선램프(140)는 315nm~400nm인 장파 A영역의 자외선 방출램프인 것을 특징으로 하는 광촉매 코팅피막자재의 제조장치.The ultraviolet lamp 140 is a device for manufacturing a photocatalyst coated film material, characterized in that the ultraviolet light emitting lamp of the long wave A region of 315nm ~ 400nm.
KR10-2003-0020696A 2002-11-05 2003-04-02 Method and apparatus for manufacturing resources coated with photocatalyst KR100534034B1 (en)

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