KR20030084254A - A micro mass spectrometer using micromachining technology and the fabrication method - Google Patents

A micro mass spectrometer using micromachining technology and the fabrication method Download PDF

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Publication number
KR20030084254A
KR20030084254A KR1020020022870A KR20020022870A KR20030084254A KR 20030084254 A KR20030084254 A KR 20030084254A KR 1020020022870 A KR1020020022870 A KR 1020020022870A KR 20020022870 A KR20020022870 A KR 20020022870A KR 20030084254 A KR20030084254 A KR 20030084254A
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South Korea
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mass spectrometer
micro mass
ion
micro
tungsten filament
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KR1020020022870A
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Korean (ko)
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양상식
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양상식
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349Creating layers of material on a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00388Etch mask forming
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/04Electrodes

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

PURPOSE: A micro mass spectrometer and a method for fabricating the same are provided to reduce a size of the micro mass spectrometer by fabricating the micro mass spectrometer using a micro machining technique. CONSTITUTION: A micro mass spectrometer includes an ion generator, an ion separator, and an ion detector. The ion generator and an ion separator includes a tungsten filament(2) and four pairs of nickel electrodes(3a,3b,3c,3d) formed on an upper surface of a silicon substrate(1). The tungsten filament(2) discharges thermal electrons and the nickel electrodes(3a,3b,3c,3d) collect and accelerate ions. Electrons heated by the tungsten filament(2) are accelerated due to pulse voltage applied from the electrode(3a). Thus, the electrons collide with test molecules, so that test molecules are ionized. Ions are moved due to pulse voltage applied from the electrode(3b) and accelerated while passing through a predetermined area.

Description

마이크로머시닝 기술을 이용한 초소형 질량 분석기 및 그 제조 방법 {A micro mass spectrometer using micromachining technology and the fabrication method}Micro mass spectrometer using micromachining technology and the fabrication method

기존의 질량 분석기는 크기가 크고 수천 볼트 이상의 고전압을 사용하는 고가의 대형 장비이다. 이에 반하여 본 발명에 제시한 초소형 질량 분석기는 크기가 작고 저전압을 사용하는 장점을 가지고 있다.Conventional mass spectrometers are expensive, large equipment that is large and uses high voltages of thousands of volts or more. On the contrary, the ultra-small mass spectrometer proposed in the present invention has a small size and an advantage of using low voltage.

본 발명에서는 마이크로머시닝 기술을 이용하여 질량 분석기를 제작함으로써 기존의 질량 분석기의 크기를 줄인다.In the present invention, the mass spectrometer is manufactured by using micromachining technology to reduce the size of the existing mass spectrometer.

도 1: 초소형 질량 분석기의 구조도.1: Schematic diagram of a miniature mass spectrometer.

도 2: 초소형 질량 분석기의 원리를 보여주는 개념도.2 is a conceptual diagram showing the principle of a miniature mass spectrometer.

도 3: 마이크로머시닝 기술을 이용한 초소형 질량 분석기의 공정도.3 is a process diagram of a miniature mass spectrometer using micromachining technology.

도 1은 본 발명의 초소형 질량 분석기의 구조를 보여주는 구조도이다. 초소형 질량 분석기는 이온 발생기, 이온 분리기 그리고 이온 검출기 세부분으로 구성된다. 도면에서 보듯이 이온 발생기와 이온 분리기는 실리콘 기판(1) 위에 텅스텐 필라멘트(2), 네 쌍의 니켈 전극(3a)(3b)(3c)(3d)으로 이루어져 있다. 이 때, 텅스텐 필라멘트는 열전자 방출을 위한 것이고 니켈 전극은 이온을 모아주고 가속시키기 위한 것이다.1 is a structural diagram showing the structure of a microscopic mass spectrometer of the present invention. The ultra-compact mass spectrometer consists of ion generator, ion separator and ion detector details. As shown in the figure, the ion generator and the ion separator consist of tungsten filaments 2 and four pairs of nickel electrodes 3a, 3b, 3c and 3d on the silicon substrate 1. At this time, tungsten filament is for hot electron emission and nickel electrode is for collecting and accelerating ions.

도 2는 본 발명의 초소형 질량 분석기의 원리를 보여주는 개념도이다. 초소형 질량 분석기의 분리 방식은 질량에 따라 달라지는 비행 시간의 차이를 이용한비행 시간 질량 분석기의 방식이다. 필라멘트의 가열에 의해 발생된 전자는 바로 앞의 전극(3a)에서 가해주는 펄스 전압에 의하여 가속되어 중성의 시료분자와 충돌하여 분자를 이온화시킨다. 생성된 이온은 전극(3b)에서 가해주는 펄스 전압에 의하여 출발되고 d 영역을 지나는 동안 가속된 후 D 영역을 등속운동으로 비행하여 최종 이온 검출기에 도달하게 된다. 이 때, 이온의 비행시간은에 비례한다. 질량 분석기를 통해 검출되는 각 이온들의 도달시간을 오실로스코프로 관측하면 시료의 정확한 질량을 확인할 수 있으며 신호의 세기로부터 정량분석도 가능하다. 또한 이온 가속기에 각각 걸어주는 자기장을 펄스 형태로 가해줌으로써 효율적인 이온화와 질량분석기의 분해능을 극대화하고, 이온 가속기의 각 전극에 걸어주는 전압의 폭을 짧게 함으로써 질량 분석기의 분해능을 향상시킨다.2 is a conceptual diagram showing the principle of the ultra-small mass spectrometer of the present invention. The separation method of the ultra-compact mass spectrometer is a time-of-flight mass spectrometer using a difference in flight time depending on mass. The electrons generated by the heating of the filament are accelerated by the pulse voltage applied from the electrode 3a immediately before and collide with the neutral sample molecules to ionize the molecules. The generated ions are started by the pulse voltage applied by the electrode 3b, accelerated while passing through the region d, and then fly through the region D in constant motion to reach the final ion detector. At this time, the flight time of ions Proportional to Observing the time of arrival of each ion detected by the mass spectrometer with an oscilloscope can confirm the exact mass of the sample and quantitatively analyze the signal intensity. In addition, by applying a magnetic field applied to each of the ion accelerator in the form of a pulse, the efficiency of the mass spectrometer is improved by maximizing efficient ionization and resolution of the mass spectrometer and shortening the voltage applied to each electrode of the ion accelerator.

도 3은 본 발명에 따른 마이크로머시닝 기술을 이용한 초소형 질량 분석기의 공정도이다. (a)에서 실리콘 식각 마스크로 사용할 열산화막을 성장시키고, (b)와 같이 실리콘 식각액으로 실리콘을 식각하여 단차를 만든 후, 금속 증착 공정을 이용하여 크롬과 금을 증착한다. 니켈 전극을 제작하기 위해 (c)와 같이 후막 감광제(AZ 4620)를 이용하여 mold를 만든 후 전기도금을 한다. (d)에서 금속 증착 공정을 이용하여 금속을 증착하고 패터닝하여 금속 필라멘트를 제작한 후, 식각 보호막으로 사용된 크롬을 금속 증착 공정을 이용하여 증착한다. 마지막으로 (f)와 같이 실리콘 식각액을 이용하여 필라멘트 아래에 공간을 형성하여 초소형 질량 분석기를 완성한다.3 is a process diagram of a micro mass spectrometer using micromachining technology according to the present invention. In step (a), a thermal oxide film to be used as a silicon etching mask is grown, and as shown in (b), silicon is etched with a silicon etching solution to form a step, and then chromium and gold are deposited using a metal deposition process. In order to manufacture the nickel electrode as shown in (c) using a thick film photosensitive agent (AZ 4620) to make a mold and then electroplating. In (d), a metal is deposited and patterned using a metal deposition process to fabricate a metal filament, and then chromium used as an etch protection layer is deposited using a metal deposition process. Finally, as shown in (f), a space is formed under the filament using a silicon etchant to complete the ultra-small mass spectrometer.

본 발명은 휴대가 가능하거나 설치가 용이한 초소형 질량 분석기 및 그를 제조하기 위한 방법에 관한 것으로 생의학, 화학 및 환경 산업과 반도체 산업 등에서 특정 가스나 물질의 농도를 측정하는데 널리 이용될 수 있다.The present invention relates to a portable mass spectrometer and a method for manufacturing the ultra-compact mass spectrometer, and can be widely used to measure the concentration of a specific gas or material in the biomedical, chemical and environmental industries, and the semiconductor industry.

Claims (4)

금속 증착 공정과 이방성 식각을 이용하여 텅스텐 필라멘트를 제작하는 방법Fabrication of tungsten filaments using metal deposition and anisotropic etching 제 1항을 이용하여 전자를 방출시켜 이온화하는 방법과 구조Method and structure of ionizing by emitting electrons using claim 1 이온화된 분자를 가속하여 분리시키는 니켈 전극의 구조Nickel Electrode Structure Accelerates Ionized Molecules 제 1항, 제 2항, 제 3항에 있어서 마이크로머시닝 기술을 이용한 초소형 질량 분석기의 제작 방법A method of fabricating an ultra-compact mass spectrometer according to claim 1, 2 or 3 using micromachining technology.
KR1020020022870A 2002-04-26 2002-04-26 A micro mass spectrometer using micromachining technology and the fabrication method KR20030084254A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0290451A (en) * 1988-09-28 1990-03-29 Oki Electric Ind Co Ltd Quadruple mass spectrometer
JPH10269985A (en) * 1998-04-24 1998-10-09 Hitachi Ltd Mass spectrometer and mass spectroscopic method
KR19980084813A (en) * 1997-05-26 1998-12-05 손욱 Mass spectrometer
JP2000082439A (en) * 1998-09-03 2000-03-21 Jeol Ltd Time-of-flight mass spectrometer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0290451A (en) * 1988-09-28 1990-03-29 Oki Electric Ind Co Ltd Quadruple mass spectrometer
KR19980084813A (en) * 1997-05-26 1998-12-05 손욱 Mass spectrometer
JPH10269985A (en) * 1998-04-24 1998-10-09 Hitachi Ltd Mass spectrometer and mass spectroscopic method
JP2000082439A (en) * 1998-09-03 2000-03-21 Jeol Ltd Time-of-flight mass spectrometer

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
Sensors and Actuators A97-98 *
the 11th international conference on solid-state sensor and actuators, transducers ''01 and eurosensors XV Munich,Germany, june 10-14 *
대한전기학회논문지, 50C권 8호, pp.419-422 *
성균논문집(기초과학편) 제46집 No.2 *

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