KR20020056724A - Method for fabricating liquid crystal display module with humidity-proof - Google Patents

Method for fabricating liquid crystal display module with humidity-proof Download PDF

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Publication number
KR20020056724A
KR20020056724A KR1020000086129A KR20000086129A KR20020056724A KR 20020056724 A KR20020056724 A KR 20020056724A KR 1020000086129 A KR1020000086129 A KR 1020000086129A KR 20000086129 A KR20000086129 A KR 20000086129A KR 20020056724 A KR20020056724 A KR 20020056724A
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South Korea
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moisture
film
black matrix
crystal display
color filter
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KR1020000086129A
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Korean (ko)
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박장식
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주식회사 현대 디스플레이 테크놀로지
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Priority to KR1020000086129A priority Critical patent/KR20020056724A/en
Publication of KR20020056724A publication Critical patent/KR20020056724A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022466Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133519Overcoatings

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

PURPOSE: A method of manufacturing an LCD module having strong wet endurance is provided to correct a black matrix structure so as to block leakage of lights and to prevent the black matrix from being damaged due to moisture. CONSTITUTION: A black matrix(8) and an ITO film(24) are formed on a color filter substrate(20). A moisture prevention layer(30) is formed on an exposed portion of the black matrix, a portion under a color filter and the ITO film other than an active area of a liquid crystal display panel. The moisture prevention layer is formed of SiO2 in thickness of 30 nanometers. The moisture prevention layer is formed from SiNx film or SiON film. A pad part are molded with silicon when the color filter substrate is attached to a TFT substrate to improve moisture endurance of the display crystal display panel.

Description

내습성이 강한 엘씨디 모듈 제작방법{METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY MODULE WITH HUMIDITY-PROOF}How to make an LCD module with high moisture resistance {METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY MODULE WITH HUMIDITY-PROOF}

본 발명은 내습성이 강한 LCD 모듈 제작방법에 관한 것으로, 보다 상세하게는 외부로 노출된 블랙 매트릭스를 커버하여 빛샘을 방지하고 패드를몰딩(moulding)하여 습기가 패드부를 부식하는 것을 막아줄 수 있도록 된 내습성이 강한 LCD 모듈 제작방법에 관한 것이다.The present invention relates to a method of manufacturing a LCD module having high moisture resistance, and more particularly, to cover the black matrix exposed to the outside to prevent light leakage and to mold the pad to prevent moisture from corroding the pad part. The present invention relates to a method of manufacturing a strong moisture resistant LCD module.

액정표시소자는 여러분야에 적용되고 있는데, 예를 들면, LCD 노트북, LCD TV등에 적용된다.Liquid crystal display devices are applied to you, for example, LCD notebooks, LCD TVs.

도 1 은 종래 LCD 모듈 구조를 나타낸 평면도이고, 도 2 는 도 1 의 컬러필터 부분을 확대하여 도시한 단면도이고, 도 3 은 TFT LCD 모듈부의 구조를 나타낸 단면도로서, 이에 도시한 바와 같이, 게이트 패드(2)와 데이터 패드(4)가 가장자리에 형성된 LCD 모듈에서, 액티브영역(6)을 둘러싸는 형태로 형성된 블랙매트릭스부(8)와 컬러필터(Color Filter: C/F) 에지부(9)의 사이의 거리(b)에서 상기 블랙매트릭스(8)의 노출이 생긴다. 즉, 도 2 에 도시한 바와 같이, 컬러 필터(Color Filter: C/F)(20)측의 기판과 TFT 측의 기판(10)이 합착된 상태에서, 블랙 매트릭스(Black Matrix: BM)(8)은 최대 확장하여 후술하는 도 3에서와 같이 백라이트(BackLight: B/L)로부터 빛이 발생할 때, 빛은 C/F의 액티브 영역이 아닌 영역으로 통과되지 않도록 한다. 참고부호 a는 블랙매트릭스로부터 시일제(12)까지의 거리이다.1 is a plan view illustrating a conventional LCD module structure, FIG. 2 is a cross-sectional view illustrating an enlarged portion of a color filter of FIG. 1, and FIG. 3 is a cross-sectional view illustrating a structure of a TFT LCD module unit. In the LCD module (2) and the data pad (4) formed at the edges, the black matrix portion 8 and the color filter (C / F) edge portion 9 formed in a shape surrounding the active region 6 The exposure of the black matrix 8 occurs at a distance b between. That is, as shown in Fig. 2, in the state where the substrate on the color filter (C / F) 20 side and the substrate 10 on the TFT side are bonded together, the black matrix (BM) 8 ) Is maximized so that when light is generated from a backlight (BackLight B / L) as shown in FIG. 3 to be described later, the light does not pass to an area other than the active area of the C / F. Reference numeral a denotes the distance from the black matrix to the sealant 12.

C/F 에지(9)에서 BM(8)까지의 거리를 약0.3mm로 유지하면 빛샘이 발생하지 않는다. 컬러필터 기판(20)과 TFT기판(10)의 합착에 필요한 시일(seal)(12)재와 크롬(Cr) BM(8)까지는 약 0.3mm로 유지하여 상하기판을 봉합하여 도 3 에서와 같이 모듈 상태로 하고 실리콘으로 패널의 패드를 몰딩(moulding)해서 습기가 패드부를 부식하는 것을 막아주는데, 즉, 습기가 패널의 갭(gap)사이로 침투하는 것을 막아준다.그러나 실리콘(silicon)이 패널의 갭을 부실하게 몰딩하는 경우가 발생한다.If the distance from the C / F edge 9 to the BM 8 is maintained at about 0.3 mm, no light leakage occurs. The seal 12 material and the chromium (Cr) BM (8) required for bonding the color filter substrate 20 and the TFT substrate 10 are kept at about 0.3 mm to seal the upper and lower substrates, as shown in FIG. The module is molded and the pads of the panels are molded with silicon to prevent moisture from corroding the pads, ie, to prevent moisture from penetrating between the gaps of the panels. Poor molding of the gap occurs.

구동전압이 인가되는 가혹한 신뢰성 조건에서 습기로 인해서 BM이 손상을 입어 유리로부터 떨어져 나가게 되어 백라이트로부터 발생하는 빛이 이 영역을 통과해서 빛샘이 발생하고, 이러한 현상은 장기간 LCD를 사용할 때도 발생할 수도 있는 문제점이 있다.Under severe reliability conditions with driving voltage applied, the BM can be damaged and fall off the glass, causing light leakage from the backlight to pass through this area, which can occur even when the LCD is used for a long time. There is this.

본 발명의 목적은 상기한 바와 같은 종래 액정표시장치에서의 문제점을 개선하기 위해 안출한 것으로, 백라이트로 부터 발생하는 빛의 빛샘을 방지할 수 있도록 블랙매트릭스구조를 보완하고 습기로 인하여 블랙매트릭스가 손상되지 않도록 된 내습성이 강한 LCD 모듈 제작방법을 제공함에 있다.An object of the present invention is to solve the problems in the conventional liquid crystal display device as described above, to complement the black matrix structure to prevent the light leakage of light generated from the backlight and damage the black matrix due to moisture The present invention provides a method of manufacturing an LCD module, which is resistant to moisture.

도 1 은 종래 LCD 모듈 구조를 나타낸 평면도.1 is a plan view showing a conventional LCD module structure.

도 2 는 도 1 의 컬러필터 부분을 확대하여 도시한 단면도.FIG. 2 is an enlarged cross-sectional view of the color filter part of FIG. 1; FIG.

도 3 은 TFT LCD 모듈부의 구조를 나타낸 단면도.3 is a cross-sectional view showing the structure of a TFT LCD module unit;

도 4 은 본 발명에 따른 내습성이 강한 LCD 모듈 구조를 나타낸 평면도.Figure 4 is a plan view showing the LCD module structure strong moisture resistance according to the present invention.

도 5 는 도 4 의 컬러필터 부분을 확대하여 도시한 단면도이다.FIG. 5 is an enlarged cross-sectional view of the color filter part of FIG. 4.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

10 : TFT측 기판 20 : 컬러필터 기판10 TFT side substrate 20 color filter substrate

22 : 블랙 매트릭스(BlackMatrix:BM)22: Black Matrix (BM)

24 : ITO(Indium Tin Oxide) 30 : 습기방지층(SiO2층)24: ITO (Indium Tin Oxide) 30: Moisture barrier layer (SiO2 layer)

50 : 실리콘(silicon)50: silicon

상기한 바와 같은 목적을 달성하기 위한 본 발명의 바람직한 일실시예에 따르면, BM(BlackMatrix), 및 ITO막이 C/F(ColorFilter) 유리상에 형성된 상태에서, 상기 BM의 노출된 부분과 패드사이인 상기 컬러필터의 하면과, 패널의 액티브영역을 제외한 상기 ITO막 상에 습기방지층을 약 30nm정도 성막하고, 상기 C/F 기판과 TFT 기판과의 합착시 패드부를 실리콘으로 몰딩하여 제작함으로써 습기에 대해 대응력을 높일 수 있도록 된 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법이 제공된다.According to a preferred embodiment of the present invention for achieving the above object, the BM (BlackMatrix), and the ITO film is formed on the C / F (ColorFilter) glass, the exposed portion of the BM and the pad between A moisture barrier layer is formed on the lower surface of the color filter and the ITO film except for the active area of the panel by about 30 nm, and the pad part is molded with silicon when the C / F substrate and the TFT substrate are bonded to each other. Provided is a method of manufacturing a liquid crystal display device module having a strong moisture resistance, which is characterized in that it can be increased.

또한, 본 발명에 있어서, 상기 습기방지층은 SiO2막으로 이루어진 것을 특징으로 한다.In the present invention, the moisture barrier layer is characterized in that the SiO 2 film.

또한, 본 발명에 있어서, 상기 SiO2막은 100°C이하의 RF법으로 성막하여 C/F의 액티브 영역에 영향을 주지 않도록 된 것을 특징으로 한다.In addition, in the present invention, the SiO 2 film is formed by an RF method of 100 ° C. or less so as not to affect the active region of C / F.

또한, 본 발명에 있어서, 상기 BM의 구조는 2중막 CrOx/Cr, 또는 3중막 CrOx/CrNx/Cr인 것을 특징으로 한다.In the present invention, the structure of the BM is characterized in that the double-layer CrOx / Cr, or triple-layer CrOx / CrNx / Cr.

또한, 본 발명에 있어서, 상기 BM은 수지로 된 것을 특징으로 한다.In the present invention, the BM is characterized in that the resin.

또한, 본 발명에 있어서, 상기 습기방지층은 SiNx 또는 SiON막으로 된 것을 특징으로 한다.In the present invention, the moisture barrier layer is characterized in that the SiNx or SiON film.

이하 본 발명에 따른 내습성이 강한 LCD 모듈 제작방법을 바람직한 실시예를 중심으로 첨부도면을 참조하여 설명한다.Hereinafter, a method of manufacturing a moisture resistant LCD module according to the present invention will be described with reference to the accompanying drawings, with reference to a preferred embodiment.

도 4 은 본 발명에 따른 내습성이 강한 LCD 모듈 구조를 나타낸 평면도이고, 도 5 는 도 4 의 컬러필터 부분을 확대하여 도시한 단면도로서, 이에 도시한 바와 같이, 종래와 같이 내습성이 약한 C/F의 크롬 BM에 대해서 내습성을 높여주기 위해 방책이 필요하다. 즉, C/F 제작의 마지막 공정인 ITO(24) 성막공정후에 액티브 영역(6)을 제외하고 패널 외곽부의 크롬 블랙매트릭스의 상부를 SiO2 절연체(30)로 성막을 한다. SiO2 절연막(30)이 약 30nm이상이면 습기에 대한 장벽(barrier)역할을 할 수 있고 시일(seal)제에 대한 부착효과가 높다. 그리고 TR(transfer)이 디스펜스(dispensing) 되는 영역에는 SiO2를 코팅하지 않는다.4 is a plan view showing the structure of the LCD module having a strong moisture resistance according to the present invention, and FIG. 5 is an enlarged cross-sectional view of the color filter part of FIG. 4, as shown in FIG. In order to increase the moisture resistance of / F's chrome BM, measures are needed. That is, after the ITO 24 film formation process, which is the final step of C / F fabrication, the upper part of the chrome black matrix of the panel outer portion except the active region 6 is formed with the SiO 2 insulator 30. If the SiO 2 insulating film 30 is about 30 nm or more, it can act as a barrier to moisture and has a high adhesion effect to the sealant. In addition, SiO 2 is not coated in a region where TR is dispensed.

그리고 SiO2막(30)의 형성은 약 100°C의 낮은 온도에서 RF성막법을 이용하여 C/F 액티브 영역에 대한 영향을 주지 않도록 한다.In addition, the formation of the SiO 2 film 30 does not affect the C / F active region by using the RF film forming method at a low temperature of about 100 ° C.

이러한 패널을 도 3 과 같이 모듈을 부착하고 패널의 패드부를 실리콘으로도포하며, 패널의 갭사이가 부실하게 도포되어 지는 경우, 고온 고습의 신뢰성 시험과 장기간 LCD-모듈을 사용하더라도 크롬 블랙 매트릭스의 습기에 대한 대응력이 높아 손상을 입지 않는다.When the panel is attached to the module as shown in FIG. 3 and the pad portion of the panel is coated with silicon, and the gap between the panel gaps is poorly applied, the reliability test of high temperature and high humidity and the moisture of the chrome black matrix even after using the LCD module for a long time Its high responsiveness does not damage it.

따라서, 상기한 본 발명에 따른 내습성이 강한 LCD 모듈 제작방법에 의하면, C/F의 액티브 영역 외각의 크롬 블랙매트릭스 상부에 SiO2를 성막함에 의해 습기에 대한 대응력이 높아져 고온고습의 신뢰성시험이나 장기간 사용에 따른 크롬 블랙매트릭스부에 대한 손상을 제거할 수 있는 효과가 있다.Therefore, according to the method of manufacturing a moisture resistant LCD module according to the present invention, by forming SiO 2 on the chromium black matrix on the outside of the C / F active region, the ability to cope with moisture is increased, so that the reliability test of high temperature and high humidity or a long term There is an effect to remove the damage to the chrome black matrix portion in accordance with the use.

아울러, 상기한 본 발명의 바람직한 실시예는 예시의 목적을 위해 개시된 것이며, 당업자라면 본 발명의 사상과 범위 안에서 다양한 수정, 변경, 부가 등이 가능할 것이며, 이러한 수정 변경 등은 이하의 특허청구의 범위에 속하는 것으로 보아야 할 것이다.In addition, the preferred embodiment of the present invention described above is for the purpose of illustration, various modifications, changes, additions, etc. will be possible to those skilled in the art within the spirit and scope of the present invention, such modifications and changes are the scope of the claims Should be seen as belonging to.

Claims (6)

BM(BlackMatrix), 및 ITO막이 C/F(ColorFilter) 유리상에 형성된 상태에서, 상기 BM의 노출된 부분과 패드사이인 상기 컬러필터의 하면과, 패널의 액티브영역을 제외한 상기 ITO막 상에 습기방지층을 약 30nm정도 성막하고,With a BM (BlackMatrix) and ITO film formed on C / F (ColorFilter) glass, a moisture barrier layer on the lower surface of the color filter between the exposed portion of the BM and the pad and on the ITO film except the active area of the panel. Film about 30nm, 상기 C/F 기판과 TFT 기판과의 합착시 패드부를 실리콘으로 몰딩하여 제작함으로써 습기에 대해 대응력을 높일 수 있도록 된 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법.The method of manufacturing a liquid crystal display device module having a high moisture resistance, characterized in that to increase the ability to cope with moisture by molding the pad portion with silicon when bonding the C / F substrate and the TFT substrate. 제 1 항에 있어서, 상기 습기방지층은 SiO2막으로 이루어진 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법.The method of claim 1, wherein the moisture barrier layer comprises an SiO 2 film. 제 2 항에 있어서, 상기 SiO2막은 100°C이하의 RF법으로 성막하여 C/F의 액티브 영역에 영향을 주지 않도록 된 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법.The method of claim 2, wherein the SiO 2 film is formed by an RF method of 100 ° C. or less so as not to affect the active region of the C / F. 제 1 항에 있어서, 상기 BM의 구조는 2중막 CrOx/Cr, 또는 3중막 CrOx/CrNx/Cr인 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법.The method of claim 1, wherein the BM has a double layer CrOx / Cr or triple layer CrOx / CrNx / Cr. 제 1 항에 있어서, 상기 BM은 수지로 된 것을 특징으로 하는 내습성이 강한액정표시소자 모듈 제작방법.The method of claim 1, wherein the BM is made of a resin. 제 1 항에 있어서, 상기 습기방지층은 SiNx 또는 SiON막으로 된 것을 특징으로 하는 내습성이 강한 액정표시소자 모듈 제작방법.The method of claim 1, wherein the moisture barrier layer is formed of a SiNx or SiON film.
KR1020000086129A 2000-12-29 2000-12-29 Method for fabricating liquid crystal display module with humidity-proof KR20020056724A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436725A (en) * 1990-06-01 1992-02-06 Ube Ind Ltd Liquid crystal display panel
JPH09244011A (en) * 1996-03-11 1997-09-19 Toshiba Corp Liquid crystal display device
KR19980020094A (en) * 1996-09-05 1998-06-25 손욱 Film liquid crystal display device
KR19990025716U (en) * 1997-12-17 1999-07-05 김영환 Liquid crystal panel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436725A (en) * 1990-06-01 1992-02-06 Ube Ind Ltd Liquid crystal display panel
JPH09244011A (en) * 1996-03-11 1997-09-19 Toshiba Corp Liquid crystal display device
KR19980020094A (en) * 1996-09-05 1998-06-25 손욱 Film liquid crystal display device
KR19990025716U (en) * 1997-12-17 1999-07-05 김영환 Liquid crystal panel

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