KR200160726Y1 - Device for forming a thin film - Google Patents

Device for forming a thin film Download PDF

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Publication number
KR200160726Y1
KR200160726Y1 KR2019940036648U KR19940036648U KR200160726Y1 KR 200160726 Y1 KR200160726 Y1 KR 200160726Y1 KR 2019940036648 U KR2019940036648 U KR 2019940036648U KR 19940036648 U KR19940036648 U KR 19940036648U KR 200160726 Y1 KR200160726 Y1 KR 200160726Y1
Authority
KR
South Korea
Prior art keywords
forming
thin film
thin
film
Prior art date
Application number
KR2019940036648U
Other languages
Korean (ko)
Other versions
KR960025280U (en
Inventor
Kyung Wha Cho
Jeon Hoe Ku
Tae Gyun Jeong
Original Assignee
Daewoo Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daewoo Electronics Co Ltd filed Critical Daewoo Electronics Co Ltd
Priority to KR2019940036648U priority Critical patent/KR200160726Y1/en
Publication of KR960025280U publication Critical patent/KR960025280U/en
Application granted granted Critical
Publication of KR200160726Y1 publication Critical patent/KR200160726Y1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019940036648U 1994-12-28 1994-12-28 Device for forming a thin film KR200160726Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940036648U KR200160726Y1 (en) 1994-12-28 1994-12-28 Device for forming a thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940036648U KR200160726Y1 (en) 1994-12-28 1994-12-28 Device for forming a thin film

Publications (2)

Publication Number Publication Date
KR960025280U KR960025280U (en) 1996-07-22
KR200160726Y1 true KR200160726Y1 (en) 1999-11-15

Family

ID=19403413

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940036648U KR200160726Y1 (en) 1994-12-28 1994-12-28 Device for forming a thin film

Country Status (1)

Country Link
KR (1) KR200160726Y1 (en)

Also Published As

Publication number Publication date
KR960025280U (en) 1996-07-22

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Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
LAPS Lapse due to unpaid annual fee