KR200160726Y1 - Device for forming a thin film - Google Patents
Device for forming a thin film Download PDFInfo
- Publication number
- KR200160726Y1 KR200160726Y1 KR2019940036648U KR19940036648U KR200160726Y1 KR 200160726 Y1 KR200160726 Y1 KR 200160726Y1 KR 2019940036648 U KR2019940036648 U KR 2019940036648U KR 19940036648 U KR19940036648 U KR 19940036648U KR 200160726 Y1 KR200160726 Y1 KR 200160726Y1
- Authority
- KR
- South Korea
- Prior art keywords
- forming
- thin film
- thin
- film
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940036648U KR200160726Y1 (en) | 1994-12-28 | 1994-12-28 | Device for forming a thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940036648U KR200160726Y1 (en) | 1994-12-28 | 1994-12-28 | Device for forming a thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960025280U KR960025280U (en) | 1996-07-22 |
KR200160726Y1 true KR200160726Y1 (en) | 1999-11-15 |
Family
ID=19403413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940036648U KR200160726Y1 (en) | 1994-12-28 | 1994-12-28 | Device for forming a thin film |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200160726Y1 (en) |
-
1994
- 1994-12-28 KR KR2019940036648U patent/KR200160726Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR960025280U (en) | 1996-07-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
LAPS | Lapse due to unpaid annual fee |