KR20010001457A - Composition for MgO layer of plasma dispaly panel - Google Patents
Composition for MgO layer of plasma dispaly panel Download PDFInfo
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- KR20010001457A KR20010001457A KR1019990020683A KR19990020683A KR20010001457A KR 20010001457 A KR20010001457 A KR 20010001457A KR 1019990020683 A KR1019990020683 A KR 1019990020683A KR 19990020683 A KR19990020683 A KR 19990020683A KR 20010001457 A KR20010001457 A KR 20010001457A
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Abstract
Description
본 발명은 플라즈마 디스플레이 패널의 MgO막 형성용 조성물에 관한 것으로서, 보다 상세하기로는, MgO 입자의 분산성이 개선된 플라즈마 디스플레이 패널의 MgO막 형성용 조성물에 관한 것이다.The present invention relates to a composition for forming a MgO film of a plasma display panel, and more particularly, to a composition for forming a MgO film of a plasma display panel with improved dispersibility of MgO particles.
일반적인 플라즈마 디스플레이 패널은 플라즈마 방전에 의한 발광 또는 방전에 의해 여기된 형광체에 의해 화상을 형성하는 장치이며 플라즈마 디스플레이 패널의 방전공간에 설치된 두 전극에 소정의 전압을 인가하여 이들 사이에서 플라즈마 방전이 일어나도록 하고, 이 글로우방전시 발생되는 자외선에 의해 소정의 패턴으로 형성된 형광체층을 여기시켜 화상이 형성되게 한다. 이러한 플라즈마 디스플레이는 크게 교류형(AC type), 직류형(DC type) 및 혼합형(Hybrid type)으로 대별된다.A typical plasma display panel is an apparatus for forming an image by phosphors excited by light emission or discharge by plasma discharge, and applying a predetermined voltage to two electrodes installed in the discharge space of the plasma display panel so that plasma discharge occurs between them. Then, the phosphor layer formed in a predetermined pattern is excited by the ultraviolet rays generated during the glow discharge so that an image is formed. Such plasma displays are roughly classified into an AC type, a DC type, and a hybrid type.
도 1은 종래의 교류형 플라즈마 디스플레이 패널의 구조를 나타낸 단면도이다.1 is a cross-sectional view showing the structure of a conventional AC plasma display panel.
이를 참조하면, 일반적인 플라즈마 디스플레이 패널은 배면기판 (10)과, 상기 배면기판 (10) 위에 형성된 어드레스 전극인 제1전극 (11)과, 이 제1전극 (11)이 형성된 배면기판 (10) 위에 형성된 유전체층 (12)와, 이 유전체층 (12) 상부에 형성되어 방전거리를 유지시키고 셀간의 전기적 광학적 크로스 토크를 방지하는 다수의 격벽(13)을 포함한다.Referring to this, a general plasma display panel includes a rear substrate 10, a first electrode 11 which is an address electrode formed on the rear substrate 10, and a rear substrate 10 on which the first electrode 11 is formed. The dielectric layer 12 formed thereon and a plurality of partitions 13 formed on the dielectric layer 12 to maintain a discharge distance and to prevent electro-optical crosstalk between cells.
또한 제2전극 (16)은, 상기 배면기판 (10)에 형성된 제1전극 (11)과 소정간격으로 이격되어 직교하게 전면기판 (15) 상부에 형성된다. 그리고 제2전극 (16)이 형성된 전면기판 (15) 상부에는 칼라필터층 (17)이 형성되어 있고, 이 칼라필터층 (17) 상부에는 상기 제2전극 (16)과 칼라필터층 (17)을 몰입하고 있는 유전체층 (18)과, 보호막 (19)이 순차적으로 형성되어 있다.In addition, the second electrode 16 is formed on the front substrate 15 to be orthogonally spaced apart from the first electrode 11 formed on the rear substrate 10 at a predetermined interval. A color filter layer 17 is formed on the front substrate 15 on which the second electrode 16 is formed, and the second electrode 16 and the color filter layer 17 are immersed on the color filter layer 17. The dielectric layer 18 and the protective film 19 which are present are sequentially formed.
그리고 상기 격벽 (13)의 측면과 이들 사이로 노출된 유전체층 (12)의 상면에 일측에는 형광체층 (14)가 형성되어 있다.The phosphor layer 14 is formed on one side of the partition 13 and the upper surface of the dielectric layer 12 exposed therebetween.
한편, 상기 보호막 (19) 형성재료로는 MgO를 사용하는 것이 일반적이다. 여기에서 MgO가 보호막 형성물질로서 매우 유용한 것은, 전극을 보호하는 기능이외에 2차전자의 방출로 방전을 돕기 때문이다.On the other hand, MgO is generally used as the material for forming the protective film 19. MgO is very useful as a protective film forming material here because it not only functions to protect the electrode, but also assists in discharge by emission of secondary electrons.
보호막으로 사용되는 MgO막은 종래에는 E-빔 증착법을 사용하여 형성한다. 그런데, 이와 같이 E-빔 증착법을 사용하는 경우에는 투명도 및 결정성 특성이 우수한 MgO막을 얻을 수 있지만 고가의 진공증착설비를 갖추어야 하고 제조시간이 길게 소요되므로 생산성이 저하되는 문제점이 있다.The MgO film used as a protective film is conventionally formed using the E-beam vapor deposition method. However, in the case of using the E-beam evaporation method as described above, it is possible to obtain an MgO film having excellent transparency and crystallinity, but there is a problem in that productivity is reduced because an expensive vacuum deposition apparatus is required and manufacturing time is long.
이러한 문제점을 해결하기 위하여 MgO를 스핀코팅하는 방법이 제안되었다. 이와 같이 스핀코팅방법을 사용하는 경우에는, 제조공정시간이 줄어들고 설비비를 크게 줄일 수 있는 장점을 가지고 있다.In order to solve this problem, a method of spin coating MgO has been proposed. In the case of using the spin coating method as described above, the manufacturing process time is reduced and the equipment cost can be greatly reduced.
한편, MgO의 분산성은 MgO막의 막특성에 매우 중요한 영향을 미치며, 궁극적으로는 플라즈마 디스플레이 패널의 특성에 영향을 미치게 된다. 여기에서 MgO의 분산성은 MgO 입자의 입경 분포 특성과 직결되는데, 이는 MgO 입자 분산시 사용되는 용매 시스템에 따라 달라진다.On the other hand, the dispersibility of MgO has a very important effect on the film properties of the MgO film, and ultimately affects the properties of the plasma display panel. The dispersibility of MgO here is directly related to the particle size distribution characteristic of the MgO particles, which depends on the solvent system used in dispersing the MgO particles.
종래에는 MgO의 분산매로서 물을 주로 사용하였다. 그런데, 이와 같이 물을 이용하여 MgO를 분산시키는 경우에는, 분산후 MgO 입자들이 재응집되는 현상이 발생되는 문제점이 있다.Conventionally, water was mainly used as a dispersion medium of MgO. However, in the case of dispersing MgO using water as described above, there is a problem in that the phenomenon of reaggregation of MgO particles occurs after dispersion.
이와 같은 문제점을 해결하기 위하여 분산시 유기용매나 산(acid)를 사용하는 방법이 제안되었다. 그러나, 분산매로서 유기용매를 사용하는 경우에는 분산과정에 장시간이 소요되고, 산을 이용하는 경우에는 MgO가 산에 용해되므로 바람직하지 않다.In order to solve this problem, a method of using an organic solvent or an acid during dispersion has been proposed. However, when an organic solvent is used as the dispersion medium, a long time is required for the dispersion process, and when an acid is used, MgO is dissolved in an acid, which is not preferable.
이에 본 발명이 이루고자 하는 기술적 과제는 상기 문제점을 해결하여 분산후 MgO 입자간의 재응집을 막을 수 있는 동시에 광산란에 의한 투과도 저하를 방지할 수 있는 플라즈마 디스플레이 패널의 MgO막 형성용 조성물을 제공하는 것이다.Therefore, the technical problem to be achieved by the present invention is to provide a composition for forming a MgO film of the plasma display panel that can solve the above problems to prevent reaggregation between MgO particles after dispersion and to prevent a decrease in permeability due to light scattering.
도 1은 종래의 교류형 플라즈마 디스플레이의 구조를 나타낸 단면도이고,1 is a cross-sectional view showing the structure of a conventional AC plasma display;
도 2는 본 발명의 실시예 1에 따른 MgO막 형성용 조성물에 있어서, 분산전후의 MgO 평균입경 분포 상태를 나타낸 도면이다.2 is a view showing the MgO average particle diameter distribution state before and after dispersion in the composition for MgO film formation according to Example 1 of the present invention.
〈도면의 주요 부분에 대한 부호의 설명〉<Explanation of symbols for main parts of drawing>
10... 배면기판 11... 제1전극10 ... back substrate 11 ... first electrode
12, 18... 유전체층 13... 격벽12, 18 ... dielectric layer 13 ... bulkhead
14... 형광체층 15... 전면기판14 ... phosphor layer 15 ... front substrate
16... 제2전극 17... 칼라필터층16. Second electrode 17 ... Color filter layer
19... 보호막19 ... Shield
상기 기술적 과제를 이루기 위하여 본 발명에서는, MgO와, 이를 분산시키 위한 알콜류 용매와 아미드기 함유 유기 염기를 포함하고 있는 것을 특징으로 하는 플라즈마 디스플레이 패널의 MgO막 형성용 조성물을 제공한다.In order to achieve the above technical problem, the present invention provides a composition for forming a MgO film of a plasma display panel comprising MgO, an alcohol solvent for dispersing the same, and an amide group-containing organic base.
본 발명에서는 MgO의 분산매로서 알콜류 유기용매와 아미드기 함유 유기염기를 사용한다. 여기에서 알콜류 유기용매와 아미드기 함유 유기용매의 혼합중량비는 3:1 내지 2:1인 것이 바람직하다. 알콜류 유기용매에 대한 아미드기 함유 유기염기의 함량이 상기 범위를 벗어나는 경우에는 분산효율이 떨어지므로 바람직하지 못하다. 그리고 상기 유기용매와 아미드기 함유 유기염을 포함하는 분산매의 총함량은 MgO 1 중량부를 기준으로 하여 4 내지 10 중량부인 것이 바람직하다. 여기에서 상기 분산매의 함량이 상기 범위를 벗어나는 경우에는 MgO의 분산효율면에서 바람직하지 못하다.In the present invention, an alcoholic organic solvent and an amide group-containing organic base are used as the dispersion medium of MgO. Herein, the mixing weight ratio of the alcohol organic solvent and the amide group-containing organic solvent is preferably 3: 1 to 2: 1. If the content of the amide group-containing organic base in the alcoholic organic solvent is outside the above range, it is not preferable because the dispersion efficiency is lowered. The total content of the dispersion medium including the organic solvent and the amide group-containing organic salt is preferably 4 to 10 parts by weight based on 1 part by weight of MgO. In the case where the content of the dispersion medium is outside the above range, it is not preferable in terms of the dispersion efficiency of MgO.
상술한 분산매를 사용하여 MgO를 분산하는 경우, MgO의 평균입경이 200nm 이하, 바람직하게는 130nm 이하로 조절된다. 여기에서 MgO의 평균입경이 200nm를 초과하는 경우에는 가시광의 산란에 의하여 투과도 특성이 저하되어 바람직하지 못하다.When MgO is disperse | distributed using the above-mentioned dispersion medium, the average particle diameter of MgO is adjusted to 200 nm or less, Preferably it is 130 nm or less. In the case where the average particle diameter of MgO is more than 200 nm, transmittance characteristics are deteriorated due to scattering of visible light, which is not preferable.
본 발명의 알콜류 유기용매는 특별히 제한되지는 않으며, 구체적인 예로서 이소프로필 알콜, 에탄올, 메탄올 등을 사용한다. 그리고 아미드기 함유 유기염기로는 N,N-디메틸포름아미드, N,N-디에틸포름아미드, N,N-디메틸아세트아미드, N,N-디에틸아세트아미드, 포름아미드, N-브로모아세트아미드, 클로로아세트아미드, 플로로아세트아미드(floroacetamide), 아세트아미드(acetamide), N-메틸포름아미드, 아크릴아미드, 프로피온아미드, 시아노아세트아미드, 클로랄 포름아미드(chloral formamide), n-부티라미드(n-butyramide), 이소발레르아미드(isovaleramide), 시아노아미드(cyanamide), 티오포름아미드(thioformamide), 티오아세트아미드(thioacetamide) 및 디시아노디아미드(dicyanodiamide)중에서 선택된 하나 이상을 사용하며, 그중에서도 N,N-디메틸포름아미드, N,N-디메틸아세트아미드가 보다 바람직하다.The alcohol organic solvent of the present invention is not particularly limited, and specific examples thereof include isopropyl alcohol, ethanol, methanol and the like. And amide group-containing organic bases include N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, formamide, and N-bromoacet. Amide, chloroacetamide, floroacetamide, acetamide, N-methylformamide, acrylamide, propionamide, cyanoacetamide, chloral formamide, n-butyra Using one or more selected from n-butyramide, isovaleramide, cyanamide, thioformamide, thioacetamide and dicyanodiamide, Among them, N, N-dimethylformamide and N, N-dimethylacetamide are more preferable.
이하, 본 발명을 하기 실시예를 들어 상세히 설명하기로 하되, 본 발명이 하기 실시예로만 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to the following examples, but the present invention is not limited to the following examples.
실시예 1Example 1
페인트 쉐이커(paint shaker)에 평균입경 50nm의 MgO 10 중량부, 에탄올 65 중량부, N,N-디메틸포름아미드 25중량부 및 입경 0.2mm의 지코니아 볼(Zirconia ball)을 부가한 다음, 이를 밀링(milling)하였다.To the paint shaker was added 10 parts by weight of MgO with an average particle diameter of 50 nm, 65 parts by weight of ethanol, 25 parts by weight of N, N-dimethylformamide and a zirconia ball with a particle diameter of 0.2 mm, which were then milled. (milling).
2시간 경과한 다음, 상기 결과물을 여과하여 MgO막 형성용 조성물을 제조하였다. 이 조성물을 스핀코팅하여 플라즈마 디스플레이 패널(PDP)용 MgO막을 형성하였다.After 2 hours, the resultant was filtered to prepare a composition for MgO film formation. The composition was spin coated to form an MgO film for plasma display panel (PDP).
실시예 2Example 2
에탄올 대신 이소프로필 알콜을 사용하는 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하여 PDP용 MgO막을 형성하였다.The MgO film for PDP was formed in the same manner as in Example 1 except that isopropyl alcohol was used instead of ethanol.
실시예 3Example 3
N,N-디메틸포름아미드 대신 N,N-디메틸아세트아미드를 사용한 것을 제외하고는, 실시예 1과 동일한 방법에 따라 실시하여 PDP용 MgO막을 형성하였다.A MgO film for PDP was formed in the same manner as in Example 1 except that N, N-dimethylacetamide was used instead of N, N-dimethylformamide.
비교예 1Comparative Example 1
볼밀(ball-mill)에 평균입경 50nm의 MgO 10 중량부, 물 90 중량부 및 입경 0.2mm의 지르코니아 볼을 부가한 다음, 이를 밀링하였다. 2시간 경과한 다음, 상기 결과물을 여과하여 MgO막 형성용 조성물을 제조하였다. 이어서, 이 조성물을 스핀코팅하여 PDP용 MgO막을 형성하였다.10 parts by weight of MgO having an average particle diameter of 50 nm, 90 parts by weight of water, and a zirconia ball having a particle diameter of 0.2 mm were added to a ball mill, and then milled. After 2 hours, the resultant was filtered to prepare a composition for MgO film formation. Subsequently, this composition was spin-coated to form an MgO film for PDP.
비교예 2Comparative Example 2
물 90 중량부 대신 에탄올 90 중량부를 사용하는 것을 제외하고는, 비교예 1과 동일한 방법에 따라 실시하여 PDP용 MgO막을 형성하였다.Except for using 90 parts by weight of ethanol instead of 90 parts by weight of water, the same procedure as in Comparative Example 1 was carried out to form a MgO film for PDP.
상기 실시예 1-3에 따라 제조된 MgO막 형성용 조성물내에서의 MgO의 입경 분포를 조사하여 도 2에 나타내었다. 여기에서 MgO의 입경 분포는 제타-마스타를 이용하여 측정하였다.The particle size distribution of MgO in the composition for forming a MgO film prepared according to Example 1-3 was examined and shown in FIG. 2. Here, the particle size distribution of MgO was measured using zeta-master.
그 결과, 도 2에 도시되어 있는 바와 같이 MgO의 평균입경이 분산전에는 357nm이고 분산후에는 135nm로 줄어들었다. 이러한 결과로부터 MgO의 분산성이 매우 우수하다는 확인할 수 있었다.As a result, as shown in FIG. 2, the average particle diameter of MgO decreased to 357 nm before dispersion and to 135 nm after dispersion. From these results, it was confirmed that the dispersibility of MgO is very excellent.
반면, 비교예 1에 따라 제조된 MgO막 형성용 조성물은 분산직후에는 MgO의 평균입경이 250nm로서 분산성이 우수하지만, 약 1시간 경과후 MgO 입자가 재응집되는 현상이 관찰되었다. 그리고 비교예 2의 경우와 마찬가지로 분산매로서 에탄올과 같은 유기용매만을 사용하는 경우에는 분산시간이 3일정도가 소요되었다.On the other hand, the MgO film-forming composition prepared according to Comparative Example 1 was excellent in dispersibility with an average particle diameter of 250 nm immediately after dispersion, but after about 1 hour, the phenomenon of MgO particles was reaggregated. As in the case of Comparative Example 2, when only an organic solvent such as ethanol was used as the dispersion medium, the dispersion time was about 3 days.
본 발명의 MgO막 형성용 조성물을 이용하면 MgO를 평균입경 200 nm 이하인 상태로 분산시킬 수 있다. 따라서 광산란에 의하여 투과도 특성이 저하되는 것을 방지할 수 있다. 또한, MgO 입자가 분산후에 재응집되는 것을 방지되어 분산성이 매우 우수한 MgO막을 형성할 수 있게 된다.By using the composition for MgO film formation of this invention, MgO can be disperse | distributed in the state whose average particle diameter is 200 nm or less. Therefore, the permeability characteristic can be prevented from falling by light scattering. In addition, the MgO particles can be prevented from reaggregating after dispersion to form an MgO film having excellent dispersibility.
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CN106336794A (en) * | 2016-08-27 | 2017-01-18 | 徐春生 | Recoated waterborne ultraviolet curing coating |
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WO2009102108A1 (en) * | 2008-02-15 | 2009-08-20 | Gigalane Co.Ltd | Printed circuit board |
EP2338850A1 (en) * | 2009-09-29 | 2011-06-29 | Samsung SDI Co., Ltd. | Composition for protective layer of plasma display panel, plasma display panel and method of manufacturing same |
CN106336794A (en) * | 2016-08-27 | 2017-01-18 | 徐春生 | Recoated waterborne ultraviolet curing coating |
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