KR20000003017A - Flash memory device and program method thereof - Google Patents

Abstract

PURPOSE: A flash memory device and a program method thereof is provided to reduce the programming time. CONSTITUTION: A flash memory device comprises: a program voltage generating circuit(100) for generating the program voltage; a row decoder(200) for supplying one of program detecting voltages supplied from the program voltage generating circuit when performing the program detecting to the memory cell; a detecting circuit(400) for detecting the plural data for detecting if the program from the memory cell is real.

Description

A FLASH MEMORY DEVICE AND METHOD FOR PROGRAMMING THE SAME

The present invention relates to a flash memory device, and more particularly, to a flash memory device having multi bit data and a programming method thereof.

Recently, the demand for semiconductor memory devices that can be electrically programmed and erased and that does not require a refresh function to rewrite data at regular intervals is increasing. In addition, in order to develop a large-capacity memory device capable of storing a large amount of data, a high integration technology of memory cells has been developed. The erase and program of the flash memory uses a FN tunneling method and a hot carrier method to inject or emit electrons into a floating gate, thereby removing the threshold voltage of the memory cell. : By controlling Vth).

The programming method of the flash memory device is highly dependent on program performance and distribution of the threshold voltage Vth of the programmed cells. In particular, a multi level cell (MLC) in which a plurality of data is programmed in one memory cell has a very narrow distribution of the threshold voltage (Vth) compared to a general single level cell (SLC) ( tight), the programming time is long because the threshold voltage (Vth) ranges to be programmed are large. Therefore, the multi-level cell (MLC) requires an optimized programming method to satisfy a narrow distribution and short program time. The programming method is similarly applied to the case of the single level cell SLC as well as the multi level cell MLC.

The program according to the prior art has the cells at a program voltage (Vpgm) stepped up step by step without deviating from the desired threshold voltage distribution at every program to optimize the threshold voltage (Vth) distribution. Program. For example, when the distribution of the threshold voltage Vth is within 0.2V, the program operation is performed by stepping up the program voltage Vpgm step by step by a predetermined voltage (0.2V). For example, the multi-level cell MLC capable of programming two bits of data has three threshold voltage distributions to program. The multi-level cell MLC having the erased voltage Vth of the erased cell '-3V' and the thresholded voltage Vth to be programmed '3V' is programmed to operate from '-3V' to '3V'. The number of executions is (3V-(-3V)) / 0.2V = 30 times. Thus, the conventional program method satisfies the distribution of the threshold voltage Vth, but the program time increases as the number of program executions increases.

It is therefore an object of the present invention to provide a flash memory device and a program method thereof which can reduce program time.

1 is a circuit diagram of a flash memory device according to the present invention;

FIG. 2A is a circuit diagram of a row decoder provided in the flash memory device of FIG. 1; FIG.

2B is a circuit diagram of a sensing circuit included in the flash memory device of FIG. 1;

3 is a timing diagram for describing an operation of a flash memory device according to the present invention.

* Explanation of symbols on the main parts of the drawings

100: program voltage generation circuit 200: row decoder

300: memory cell array 400: detection circuit

500: output buffer

(Configuration)

According to one aspect of the present invention for achieving the above object, there is provided a plurality of memory cells connected to corresponding word lines and bit lines, wherein at least one bit of data is programmed in one threshold voltage distribution. The flash memory device includes a program voltage generation circuit for generating a program voltage stepped up in response to an external clock signal during a program operation; In response to an external address, the program voltage is supplied to one of the memory cells of the memory cells through a word line corresponding to the external address during the program operation, and the program of one of the program verify voltages supplied from the outside during the program verify operation. A row decoder for supplying a verify voltage to the memory cell; A sensing circuit for sensing a plurality of verification data output from the memory cell during a program verify operation; The program voltage generation circuit includes adjusting a boost level of the program voltage in response to one of the verify data.

In this embodiment, the program voltage generating circuit includes a high voltage generator generating the program voltage in response to the external clock signal and a comparison signal, and detecting the program voltage in response to the verification data and outputting a detection voltage. And a voltage detecting circuit and a comparing circuit for comparing the detected voltage with a reference voltage supplied from the outside and outputting a comparison signal.

In this embodiment, the voltage detection circuit includes a first switch circuit for selectively outputting the program voltage in response to the verification data, and the program voltage supplied through the first switch circuit to divide the detection voltage. A divider circuit for outputting first and second divided voltages, and a second switch circuit for selectively outputting the first and second divided voltages in response to the verification data, wherein the divided voltage circuit divides the program voltage. And a second voltage dividing circuit for outputting the first divided voltage, and a second voltage dividing circuit for dividing the program voltage to output the second voltage.

In this embodiment, the sensing circuit includes a first latch circuit for latching first verify data output from the memory cell, and a second latch circuit for latching second verify data output from the memory cell. .

According to still another aspect of the present invention, a method of programming a flash memory device having a plurality of memory cells in which at least one bit of data is programmed in one threshold voltage distribution may include a threshold voltage of a memory cell selected from among the memory cells. Having a target threshold voltage distribution of one of the plurality of threshold voltage distributions; Pre-programming with a first program voltage such that the threshold voltage of the memory cell has a predetermined voltage level lower than the lowest voltage of the target threshold voltage distribution; Main-programming a threshold voltage of the pre-programmed memory cell to a second program voltage having a voltage level lower than the first program voltage to have a voltage within the target threshold voltage distribution.

(Action)

With such an apparatus and method, the program time can be reduced by performing a program operation with different program voltages according to each program step.

(Example)

Hereinafter, the present invention will be described in detail with reference to FIGS. 1 to 3 according to embodiments of the present invention.

Referring to FIG. 1, a flash memory device according to the present disclosure provides a program voltage generation circuit, a row decoder, a memory cell array, and a sensing circuit. The program voltage generation circuit generates first and second program voltages that are stepped up step by step every time under the control of verification data supplied from the sensing circuit. The row decoder supplies the first and second program voltages and the first and second program verify voltages to a memory cell through a word line corresponding to an external address. The sensing circuit supplies one of the verification data output from the memory cell to the program voltage generation circuit to control a boost level of the program voltage.

1 is a circuit diagram of a flash memory device according to the present invention.

Referring to FIG. 1, a flash memory device according to the present invention includes a program voltage generation circuit 100, a row decoder 200, a memory cell array 300, a sensing circuit 400, and an output buffer 500. The program voltage generator circuit 100 includes a high voltage generator 110, a detection circuit 120, and a comparison circuit 130. The high voltage generator 110 generates a program voltage Vpgm stepped up by the control of the clock signal CLK supplied from the outside and the comparison signal COM output from the comparison circuit 130. The detection circuit 120 includes a first switch circuit 121, a voltage divider circuit 122, and a second switch circuit 123. One end of the first switch circuit 121 is connected between the high voltage generator 110 and the row decoder 200, and the other terminal is selective to the first and second input terminals of the voltage divider circuit 122. The program voltage Vpgm, which is output from the high voltage generator 110 by the control of the first verification data RV1 output from the sensing circuit 400, may be connected to the first and second voltages of the voltage dividing circuit 122. Supply to one of the second input terminals.

The voltage divider circuit 122 includes a first voltage divider circuit having a first output terminal connected to a variable resistor R1 and a resistor R2 in series and connected to a connection point between the variable resistor R1 and the resistor R2. A second voltage divider circuit 122b having a second output terminal 122a connected to the variable resistor R3 and the resistor R4 in series and connected to a connection point of the variable resistor R3 and the resistor R4; It includes. The variable resistors R1 and R3 have different amounts of change with respect to a constant voltage. The voltage dividing circuit 122 divides the program voltage Vpgm selectively supplied from the first switch circuit 121 through the first and second voltage dividing circuits 122a and 122b. The partial pressures Vd1 and Vd2 are output. One terminal of the second switch circuit 123 is connected to the first and second output terminals of the voltage divider circuit 122, and is controlled by the first verification data RV1 output from the sensing circuit 400. The divided voltage Vd of one of the first and second divided voltages Vd1 and Vd2 output from the voltage dividing circuit 122 is supplied to the comparison circuit 130. The comparison circuit 130 compares the divided voltage Vd supplied through the second switch circuit 123 with a reference voltage Vref supplied from the outside, and transmits the comparison signal COM to the high voltage generator 110. Supply.

The row decoder 200 receives an external address Add_x supplied from the outside, supplies the program voltage Vpgm to a target memory cell through a word line corresponding to the external address Add_x during a program operation, and then During the verify operation, the verify voltage Va supplied from the outside is supplied to the memory cell through the word line corresponding to the external address Add_x. Although not shown in the drawing, the memory cell array 300 includes a plurality of memories each connected to a plurality of word lines W / L and a plurality of bit lines B / L disposed to intersect the word lines. It contains cells. The sensing circuit 400 latches the first and second verification data RV1 and RV2 output from the memory cell during the program verify operation. The output buffer 500 outputs the first and second verification data RV1 and RV2 output from the sensing circuit 400 to a data line D / L.

FIG. 2A is a detailed circuit diagram of the row decoder included in the flash memory device of FIG. 1.

Referring to FIG. 2A, the row decoder 200 according to the present invention includes a switch circuit 210 and NMOS transistors S1, S2, S3, S4, and S5. The switch circuit 210 outputs a signal EN for conducting the NMOS transistor S1 under the control of a pulse signal? P supplied from the outside, the external address Addxx, and a program signal PGM. . The NMOS transistor S1 may control a gate controlled by a current path formed between the program voltage generation circuit 100 and the NMOS transistor S2 and the signal EN output from the switch circuit 210. Have

The NMOS transistor S2 is controlled by a current path formed between the NMOS transistor S1 and the word line W / L and an internal address Add_B for selecting the word line W / L. Has a gate. The NMOS transistor S3 has a gate controlled by a current path and a signal VFY formed between a connection point of the NMOS transistor S2 and the NMOS transistors S4 and S5. The NMOS transistor S4 has a current path formed between the NMOS transistor S3 and the first verify voltage input terminal and a gate controlled by the signal PVF. The NMOS transistor S5 has a current path formed between the NMOS transistor S3 and the second verify voltage input terminal and a gate controlled by the signal MVF.

FIG. 2B is a detailed circuit diagram of a sensing circuit included in the flash memory device of FIG. 1.

Referring to FIG. 2B, the sensing circuit 400 of the present invention includes a first latch circuit 410, a second latch circuit 420, and NMOS transistors M1, M2,..., M8, M9. The first latch circuit 410 includes two inverters I1 and I2 cross connected. The input terminal of the inverter I1 is connected to the current path of the NMOS transistor M2 and the output terminal is connected to the gate of the NMOS transistor M4. The input terminal of the inverter I2 is connected to the output terminal of the inverter I1 and the output terminal is connected to the input terminal of the inverter I1. The second latch circuit 420 includes two inverters I3 and I4 cross connected. The input terminal of the inverter I3 is connected to the current path of the NMOS transistor M3 and the output terminal is connected to the drain of the NMOS transistor M7. The input terminal of the inverter I4 is connected to the output terminal of the inverter I3 and the output terminal is connected to the input terminal of the inverter I3.

The NMOS transistor M1 has a current path formed between the bit line B / L and the ground voltage VSS and a gate controlled by a signal RST. The NMOS transistor M2 has a current path formed between the bit line B / L and the first latch circuit 410 and a gate controlled by the signal SB1. The NMOS transistor M3 has a gate controlled by a current path and a signal SB2 formed between the current path of the NMOS transistor M5 and the second latch circuit 420. The NMOS transistor M4 has a current path formed between the bit line B / L and the gate of the NMOS transistor M6 and a gate controlled by the voltage of the node 411. The NMOS transistor M5 has a current path formed between the bit line B / L and the current path of the NMOS transistor M3 and a gate controlled by the voltage of the node 412.

The NMOS transistor M6 has a current path and a gate controlled by a signal sense connected between the first latch circuit 410 and the current path of the NMOS transistor M8. The NMOS transistor M7 has a current path connected between the second latch circuit 420 and the NMOS transistor M9 and a gate controlled by a signal Sense. It has a gate controlled by a signal øsense1 and a current path formed between the NMOS transistor M6 and the ground voltage VSS. The NMOS transistor M9 has a current path formed between the NMOS transistor M7 and the ground voltage VSS and a gate controlled by a signal? Sense1.

3 is a timing diagram for describing an operation of a flash memory device according to the present invention.

Hereinafter, a flash memory device and a program method thereof according to the present invention will be described with reference to FIGS. 1 to 3.

The multi-level cell MLC is a memory cell in which a plurality of bits of data are programmed in one memory cell. The multi-level cell (MLC) capable of programming two bits of data has four threshold voltage distributions. In other words, the memory cell has one erase threshold voltage distribution and three program threshold voltage distributions. For example, if the erase threshold voltage distribution is '-3V or less' and the program threshold voltage distributions are '0.4V to 0.6V', '1.4V to 1.6V' and '2.4V to 2.6V', the multi-level The program of the cell MLC shifts the erase voltage (below -3V) of the erased memory cell into the program threshold voltage distributions (0.4V to 0.6V, 1.4V to 1.6V, 2.4V to 2.6V). It is to let.

The program operation of the flash memory device according to the present invention is largely divided into a pre-program operation and a main-program operation. For example, the threshold voltage Vth of the memory cell is determined by the program threshold voltage distribution (0.4V to 0.6V) among the program threshold voltage distributions (0.4V to 0.6V, 1.4V to 1.6V, and 2.4V to 2.6V). When programming within 0.6V), the pre-program operation causes the erased voltage of the erased memory cell (below -3V) to be less than the lowest voltage (0.4V) of the program threshold voltage distribution (0.4V to 0.6V). Programming is based on a low predetermined voltage (0V). In this case, the high voltage generation circuit 110 of FIG. 1 supplies the first pre-program voltage 14V to the row decoder 200 under the control of the external clock signal CLK and the comparison signal COM. . The row decoder 200 sets the first program voltage 14V to the word line W / L corresponding to the external address Add_x under the control of the signals Add_x,? P, PGM, and Add_B of FIG. 2A. Is supplied to the memory cell. In this case, the first and second latch circuits 410 and 420 and the bit line B / L of the sensing circuit 400 of FIG. 2B are connected to the NMOS transistor M1 under the control of the signal RST. Is initialized by conducting the current path.

When the pre-program operation ends, the row decoder 200 transmits the first program verify voltage Va1 to the external address AddX by the control of the signals AddVB, VFY and PVF of FIG. 2A. The memory cell is supplied to the memory cell through the corresponding word line W / L. In this case, the sensing circuit 400 of FIG. 2B supplies a current Sense to the memory cell through the NMOS transistors M2 and M4. When the threshold voltage Vth of the memory cell is lower than the predetermined voltage 0V, the first latch circuit 410 of the sensing circuit 400 has the first verification data RV1 of '0'. Is latched.

The first and second switch circuits 121 and 123 of the program voltage generation circuit 100 are connected to the first voltage divider circuit 122a by the control of the first verification data RV1. When the program verify operation ends, the second pre-program operation starts. When the second pre-program operation is started, the high voltage generator 110 outputs a second pre-program voltage 14.6V that is '0.6V' higher than the first pre-program voltage 14V. The first voltage dividing circuit 122a divides the second program voltage 14.6V supplied through the first switch circuit 121 and supplies the divided voltage to the second switch circuit 123. When the second pre-program voltage 14.6V is supplied, the resistance value of the variable resistor R1 is lowered so that the first divided voltage Vd1 is constantly output. The comparator 130 compares the divided voltage Vd1 supplied through the second switch circuit 123 with the reference voltage Vref and supplies the comparison signal COM to the high voltage generator 110. The high voltage generator 110 outputs the second pre-program voltage 14.6V which does not exceed the voltage 14.6V under the control of the comparison signal COM.

The row decoder 200 sets the second program voltage 14.6V to the word line W / L corresponding to the external address Add_x under the control of the signals Add_x,? P, PGM, and Add_B. Supply to the memory cell through. In this case, the first and second latch circuits 410 and 420 and the bit line B / L of the sensing circuit 400 are initialized. After the second pre-program operation ends, the row decoder 200 transfers the first program verify voltage Va1 to the external address AddX by the control of the signals AddVB, VFY and PVF. The memory cell is supplied to the memory cell through the corresponding word line W / L. In this case, the sensing circuit 400 supplies a current Sense to the memory cell through the NMOS transistors M2 and M4. When the threshold voltage Vth of the memory cell exceeds the predetermined voltage 0V, the first latch data 410 of the sensing circuit 400 includes the first verification data RV1 of '1'. Is latched.

When the first verification data RV1 of '1' is output from the first latch circuit 410, the pre-program operation ends and the main-program operation starts. When programming into the program threshold voltage distribution (0.4V to 0.6V), the main-program operation converts the threshold voltage (Vth) of the memory cell above the voltage (0V) into the program threshold voltage distribution ( 0.4V to 0.6V). When the main-program operation is started, the first and second switch circuits 121 and 123 of the program voltage generation circuit 100 are controlled by the first voltage divider circuit under control of the first verification data RV1. Is connected to 122b. The variable resistor R3 of the second voltage dividing circuit 122b has a change rate larger than that of the variable resistor R1 of the first voltage dividing circuit 122a. That is, the change amount of the main-program voltage stepped up is made smaller than the rate of change of the pre-program voltage. When the pre-program voltage is boosted by '0.6 V', the variable resistor R3 is boosted to a voltage (0.2 V) that does not deviate from the program threshold voltage distribution (0.4 V to 0.6 V). Control through the comparison circuit 130.

When the main-program operation starts, the high voltage generator 110 applies the first main-program voltage 14.8V that is '0.2V' higher than the second pre-program voltage 14.6V to the row decoder 200. To supply. The row decoder 200 sets the first main-program voltage 14.8 V to the word line W / L corresponding to the external address Add_x under the control of the signals Add_x,? P, PGM, and Add_B. Is supplied to the memory cell. In this case, the second latch circuit 420 and the bit line B / L of the sensing circuit 400 are initialized. When the main-program operation ends, the row decoder 200 sets the second program verify voltage Va2 corresponding to the external address Add_x under the control of the signals Add_B, VFY and PVF. The memory cell is supplied to the memory cell through a word line W / L.

In this case, the first latch circuit 410 continuously latches the first verification data RV1 '1' as the current path of the NMOS transistor M2 is blocked, and the second latch circuit 420 ) Is latched by the NMOS transistor M3 which is conducted by the control of the signal SB2. When the main-program verify operation is started, the sensing circuit 400 supplies a current Sense to the memory cell through the NMOS transistor M4. When the threshold voltage Vth of the memory cell is lower than the lowest voltage (0.4V) of the program threshold voltage distribution (0.4V to 0.6V), the second latch circuit 420 of the sensing circuit 400 The second verification data RV2 of '0' is latched.

When the main-program verify operation ends, the second main-program operation starts again. When the second main-program operation is started, the high voltage generator 110 outputs a second main-program voltage 15V that is '0.2V' higher than the first main-program voltage 14.8V. The second voltage dividing circuit 122b divides the second main-program voltage 15V supplied through the first switch circuit 121 and supplies the divided voltage to the second switch circuit 123. When the second main-program voltage 15V is supplied, the resistance value of the variable resistor R3 is lowered so that the second divided voltage Vd2 is constantly output. The comparator 130 compares the divided voltage Vd2 supplied through the second switch circuit 123 with the reference voltage Vref and supplies the comparison signal COM to the high voltage generator 110. The high voltage generator 110 outputs the second main-program voltage 15V that does not exceed the voltage 15V under the control of the comparison signal COM.

The row decoder 200 sets the second main-program voltage 15V to the word line W / L corresponding to the external address Add_x under the control of the signals Add_x,? P, PGM, and Add_B. Supply to the memory cell through. In this case, the second latch circuit 420 and the bit line B / L of the sensing circuit 400 are initialized. After the second main-program operation is finished, the row decoder 200 transfers the second program verify voltage Va2 to the external address AddX by the control of the signals AddVB, VFY and PVF. The memory cell is supplied to the memory cell through the corresponding word line W / L. In this case, the sensing circuit 400 supplies a current Sense to the memory cell through the NMOS transistor M4. When the threshold voltage Vth of the memory cell exceeds the lowest voltage (0V) of the program threshold voltage distribution (0.4V to 0.6V), the second latch circuit 420 of the sensing circuit 400 The second verification data RV2 of '1' is latched. When the first and second verification data RV1 and RV2 are output as '1', the program of the memory cell is terminated and the program operation of the memory cell corresponding to the next external address Add_x is performed. The pre-program operation and the main-program operation are the same even when programming to the program threshold voltage distributions (1.4 V to 1.6 V and 2.4 V to 2.6 V) in the erase threshold voltage distribution (-3 V or less). Is performed.

Referring to FIG. 3, a draw voltage of a memory cell having the erase threshold voltage distribution (-3V or less) is determined by the pre-program operation and the main-program operation, and thus the first program threshold voltage distribution (0.4V to 0.6). V: A state), the second program threshold voltage distribution (1.4V to 1.6V: B state), and the third program threshold voltage distribution (2.4V to 2.6V: C state). Referring to the respective program threshold voltage distributions of FIG. 3, in the pre-program period, the voltage is pre-programmed with a predetermined voltage (ΔV1: 0.6V), and in the main-program period, a voltage lower than the predetermined voltage (ΔV1). (ΔV2: 0.2V).

The program operation in the flash memory device of the present invention has a shorter program operation time than the flash memory device according to the prior art. For example, when programming from the erase threshold voltage distribution (-3V or less) to the program threshold voltage distribution (0.4V to 0.6V), the number of program operations according to the prior art is (0.4V-(-3V)). /0.2V = 17 times. In addition, if the program time required for one program operation is 50μsec, the total program time required for one cell is 50μsec * 17 = 0.85msec. However, the number of program operations according to the program method of the present invention is [{(0V-(-3V)) / 0.6} + {(0.4V- (0V)) / 0.2}] = 5 + 2 = 7 times. Therefore, if the program time required for one program operation is 50 μsec, the total program time required for one cell is 50 μsec * 7 = 0.35 msec. As described above, the program operation may be performed by dividing the program operation on the basis of a voltage lower than the lowest values of the program threshold voltage distributions, thereby reducing the time required for the program operation.

As described above, by dividing the program operation into a pre-program and a main-program, the program execution time can be reduced without departing from the program threshold voltage distribution.

Claims (6)

A flash memory device having a plurality of memory cells connected to corresponding word lines and bit lines, wherein at least one bit of data is programmed with one threshold voltage distribution: A program voltage generation circuit for generating a program voltage stepped up in response to an external clock signal during a program operation; Program verify voltages supplied to the memory cell of one of the memory cells through a word line corresponding to the external address in response to an external address and supplied from the program voltage generation circuit in a program verify operation; A row decoder for supplying one of the program verify voltages to the memory cells; A sensing circuit for sensing a plurality of verification data for verifying whether or not a program is from the memory cell during a program verify operation; The program voltage generator circuit, And adjusting the boost level of the program voltage in response to one of the verification data. The method of claim 1, The program voltage generator circuit, A high voltage generator generating the program voltage in response to the external clock signal and the comparison signal; A voltage detection circuit for detecting the program voltage in response to the verification data and outputting a detection voltage; And a comparison circuit for comparing the detected voltage with a reference voltage supplied from the outside and outputting a comparison signal. The method of claim 1, The program generation circuit, Generate a first program voltage that is repeatedly increased by a first voltage level that is greater than a target program voltage distribution range, And generating a second program voltage increased in response to the verification data by a second voltage level smaller than the target program voltage distribution range. The method of claim 2, The voltage detection circuit, A first switch circuit for selectively outputting the program voltage in response to the verification data; A voltage divider circuit for dividing the program voltage supplied through the first switch circuit to output first and second voltage dividers as the detection voltage; And a second switch circuit for selectively outputting the first and second partial voltages in response to the verification data. The method of claim 1, The sensing circuit, A first latch circuit for latching first verify data output from the memory cell; And a second latch circuit for latching second verification data output from the memory cell. A program method of a flash memory device having a plurality of memory cells in which at least one bit of data is programmed in one threshold voltage distribution, the method comprising: Causing a threshold voltage of a selected memory cell of the memory cells to have a target threshold voltage distribution of one of a plurality of threshold voltage distributions; Pre-programming with a first program voltage having a predetermined voltage level below which the threshold voltage of said memory cell is below the lowest voltage of said target threshold voltage distribution and shortening a program time; Main-programming a threshold voltage of the pre-programmed memory cell to a second program voltage having a voltage level lower than the first program voltage to have a voltage within the target threshold voltage distribution. Program method of flash memory device.