KR102641173B1 - Horizontal pump for semiconductor production - Google Patents

Abstract

The present invention relates to a vertical pump device for semiconductor manufacturing, which includes a main impeller that is rotated by a motor within the casing to suck in and discharge the process liquid, and a cup seal and dry seal that seal between the casing and the motor to purify the process from the main tank. It is a vertical pump device for semiconductor manufacturing that pumps liquid and supplies it to the system. The casing between the motor and the cup chamber is filled with ultra-pure water that is supplied to the air passage that is sucked into the casing from the motor side when the vertical pump operates and filters out foreign substances in the air. Provides a vertical pump device for semiconductor manufacturing.

Description

Vertical pump device for semiconductor production {Horizontal pump for semiconductor production}

The present invention relates to a vertical pump device for semiconductor manufacturing, and more specifically, to block the inflow of foreign substances during operation of the vertical pump device that supplies the process fluid (cleaning fluid) used in the semiconductor manufacturing system, so that only pure process fluid is supplied to the semiconductor manufacturing system. This relates to a vertical pump device for semiconductor manufacturing that can be supplied.

In general, a pump is a mechanical device that transports and supplies fluids such as liquid or gas by the action of pressure and can supply low-pressure fluid as high-pressure fluid. Depending on the driving method, it can be divided into reciprocating pump, rotary pump, centrifugal pump, and axial flow pump. It can be divided into pumps, friction pumps, etc.

In particular, centrifugal pumps are widely used in the industrial field because they can rotate at high speeds, are compact and lightweight, and have a simple structure.

A centrifugal pump is largely composed of a casing, an impeller, and a drive shaft, and is designed to suck in and discharge fluid by centrifugal force generated by the high-speed rotation of the impeller.

As an example of such a conventional pump, a vertical type pump has been proposed and disclosed in Republic of Korea Patent No. 10-2308037, registered by the present applicant (inventor).

The pump proposed in Registration Patent No. 10-2308037 includes a casing formed with an inlet and an outlet, a motor shaft in which a main impeller rotatably installed inside the casing is combined, and a motor provided in the casing to rotate the motor shaft. It is a pump with a gas leak prevention function, and is equipped with a checker impeller that is coupled to the motor shaft inside the casing and rotates together with the main impeller to blow air from the motor side to the main impeller side. Oil vapor is blown to the motor side by the blowing force of the checker impeller. It is configured to block and prevent leakage, and the checker impeller is equipped with a dry seal combined with it. The inside of the casing is provided with a carbon seal that is in contact with the dry seal and is sealed. The dry seal is made of a high-viscosity, high-adhesion waterproofing material with a solid content of 99% or more. , a fixing part that is coupled and fixed to the upper part of the checker impeller, a seal part that protrudes from the fixing part and seals in contact with the carbon seal inside the casing, and a protrusion that protrudes outward from the seal part. When the checker impeller rotates, the seal part includes It is configured to form a gap between the and the carbon chamber.

Such a conventional pump by the present applicant (inventor) sucks fluid into the suction port and discharges it through the discharge port by an impeller rotating within the casing. In this process, the cup seal and dryer of the sealing part provided to protect the motor from the fluid. The seal is separated from the carbon seal that was in contact with it by centrifugal force and opened, and as a result, the oil vapor that had flowed into the motor escapes due to the rotation of the impeller and is discharged through the discharge port.

However, at this time, when the motor is driven, the air sucked from the motor side, along with foreign substances in the air, passes through the open cup chamber and dry chamber and is mixed into the hydraulic oil flowing inside the pump, and in addition, in the section where the motor is operated at incomplete speed, the motor shaft There is a disadvantage in that particles (hereinafter collectively referred to as "foreign substances") are generated due to friction between the cup seal and the dry seal that are in contact with the pump and are mixed into the hydraulic oil inside the pump, causing the contaminated hydraulic oil to be supplied to the system as is.

In particular, when applying such a pump to a semiconductor manufacturing system, foreign substances are mixed into the fluid used in the semiconductor manufacturing system, that is, the process fluid (or cleaning fluid, hereinafter referred to as "process fluid"), and the contaminated process fluid is used in the semiconductor manufacturing system. Since it is supplied and used as is in the etching process or cleaning process of the manufacturing system, there is a problem that it may cause defects such as damage to the silicon oxide film on the wafer surface.

Republic of Korea Patent No. 10-2308037

Therefore, the present invention was devised to solve the problems of the prior art as described above, and prevents the inflow of foreign substances into the vertical pump device when operating the vertical pump device provided in the semiconductor manufacturing system to supply the process fluid (cleaning fluid). The purpose is to provide a vertical pump device for semiconductor manufacturing that can block and supply only pure process fluid to the semiconductor manufacturing system.

The vertical pump device for semiconductor manufacturing according to the present invention to achieve the above-described object includes a main impeller that is rotated by a motor within the casing and sucks in and discharges the process liquid, and a cup seal and a dry seal that seal between the casing and the motor. It is a vertical pump device for semiconductor manufacturing that pumps pure process fluid from the main tank and supplies it to the system. In the casing between the motor and the cup room, when the vertical pump device operates, it is supplied on the air passage that is sucked into the casing from the motor side, and the liquid in the air is supplied to the system. It is characterized by being filled with ultrapure water that filters out foreign substances.

In addition, a seal housing is installed fixedly in the casing between the motor and the cup chamber and has a groove filled with ultra-pure water on the upper surface, and as it rotates at the top of the seal housing, the air sucked from the motor is introduced into the ultra-pure water in the groove to create air. A sub-impeller may be provided to filter out foreign substances in the ultrapure water.

In addition, during operation of the vertical pump device, the process fluid supplied to the system from the vertical pump device may be bypassed and discharged in an incomplete speed operation section before reaching the rated speed operation section.

According to the vertical pump device for semiconductor manufacturing of the present invention, when operating the vertical pump device provided and used in the semiconductor manufacturing system, foreign substances in the air sucked from the outside are blocked from flowing into the vertical pump device and the pump is operated at an incomplete speed. Foreign substances that are generated in the cup room and dry room due to contact with the motor shaft inside and mixed into the process fluid can be removed from the semiconductor manufactured by supplying only pure process fluid to the semiconductor manufacturing system by bypassing the contaminated process fluid to the storage tank at the beginning of operation. It has the effect of lowering the defect rate.

1 is an overall configuration diagram of a vertical pump device for semiconductor manufacturing according to the present invention.
FIG. 2 is an enlarged view of portion “A” of FIG. 1, illustrating the fluid flow in the sealing portion during initial operation of the vertical pump device.
FIG. 3 is an enlarged view of portion “A” of FIG. 1, illustrating fluid flow in the sealing portion during normal operation of the vertical pump device.
Figure 4 is an overall configuration diagram of a vertical pump device equipped with a vacuum release device according to a second embodiment of the present invention.
Figure 5 is an enlarged view of the main portion of the vacuum release device during operation of the vertical pump device according to the second embodiment of the present invention.
Figure 6 is an enlarged view of the main portion of the vacuum release device when the vertical pump device is at rest according to the second embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings.

The terms used in the present invention are terms defined in consideration of the functions in the present invention, and may vary depending on the intention or custom of the user or operator, so the definitions of these terms are defined in accordance with the technical details of the present invention. It should be interpreted as a concept.

In addition, the embodiments of the present invention do not limit the scope of the present invention, but are merely illustrative of the components presented in the claims of the present invention, and are included in the technical idea throughout the specification of the present invention and are included in the claims. This is an embodiment that includes components that can be replaced as equivalents in the components.

Additionally, optional terms in the examples below are used to distinguish one component from another component, and the components are not limited by the terms.

Accordingly, when describing the present invention, detailed descriptions of related known technologies that may unnecessarily obscure the gist of the present invention are omitted.

1 to 6 are diagrams showing an embodiment of a vertical pump device for semiconductor manufacturing according to the present invention and its configuration and structure, respectively.

The vertical pump device for semiconductor manufacturing according to the present invention is a vertical pump device that supplies process liquid (or cleaning liquid) used in an etching process or cleaning process in a semiconductor manufacturing system.

As shown in FIG. 1, the vertical pump device of the present invention is a vertical pump installed vertically, including a motor 170, a casing 110 provided at the lower part of the motor 170, and an inside of the casing 110. It includes an impeller that is provided and driven to rotate by a motor 170.

The motor 170 is provided with a motor shaft 171 that is inserted into the casing 110 and coupled to an impeller, which will be described later, to rotate the impeller.

In addition, a motor base 172 is provided between the motor 170 and the casing 110 to connect and mount the motor 170 to the casing 110, and the motor shaft 171 is connected to the motor base 172 and the casing. It is provided to sequentially pass through (110), and a plurality of oil chambers 173 are sequentially provided on the motor shaft 171 penetrating the motor base 172 to form a space between the motor shaft 171 and the motor base 172. It is sealed in the middle.

In addition, the casing 110 is a hollow member with an empty interior, and on both sides of the casing 110, there is an intake port 111 through which fluid, that is, pure process fluid, is sucked from the main tank 196, and a vent 111 through which the sucked pure process fluid is discharged. A discharge port 112 is formed, respectively. At this time, the discharge port 112 is located at a lower position than the suction port 111, so there is an advantage that the pure process fluid flowing inside the casing 110 can be smoothly discharged and supplied.

The suction port 111 and the discharge port 112 are provided in communication with the flow path 113 inside the casing 110. The flow path 113 is connected from the suction port 111 to the bottom of the casing 110 and then upward again. By being connected to the discharge port 112, the pure process liquid pumped by the plurality of main impellers 120 and 121, which will be described later, is sucked into the suction port 111 and flows into the casing 110 through the flow path 113 of the casing 110. ) flows to the bottom side and is then discharged through the discharge port 112.

As a result, it is possible to prevent the process fluid or suction force sucked through the suction port 111 from acting directly on the sealing portion (S), which will be described later, and thus protect the sealing portion (S) from the process fluid or suction force that is sucked in. .

In particular, the dry seal 131 and the cup seal 141 of the sealing portion S, which will be described later, allow the process fluid or oil vapor (oil vapor of the process fluid) sucked into the casing 110 through the suction port 111 to flow toward the motor 170. By blocking the inflow, the motor 170 can be safely protected from process fluid or oil vapor.

In addition, the impeller provided in the casing 110 is provided with a plurality of main impellers 120 (121), a middle impeller 130, and a sub impeller 142, and impellers 120 (121) (130) (142) ) are all coupled and fixed to the motor shaft 171 of the motor 170 by means such as a key combination, so that they are rotated and driven integrally with the motor shaft 171.

When the plurality of main impellers (120) (121) and the middle impeller (130) provided in this way rotate, a suction force is applied to the inside of the casing (110), so that pure process fluid from the main tank (196) flows into the suction port (111). ) and is quickly discharged through the flow path 113 to the discharge port 112.

At this time, the plurality of main impellers 120 and 121 are provided as two-stage impellers to generate a large suction force, so that the process fluid can be supplied at a constant flow rate and head.

In addition, when discharging the process fluid through the discharge port 112, a positive pressure corresponding to the pumping force is applied to the discharge port 112, and this positive pressure is applied to the branch path 110a of the casing 110 in communication with the discharge port 112. It acts as is on the first housing block 230 of the vacuum release device 200 of the second embodiment, which will be described later.

In addition, vacuum pressure (negative pressure) due to suction of the process fluid is applied to the inside of the casing 110 at the top of the sealing part S (direction toward the motor 170), which will be described later, and accordingly, inside the casing 110. Not only can it prevent the inflow of process fluid into the sealing part (S) as much as possible, but even if process fluid or oil vapor flows into the sealing part (S), the sealing part (S) can be temporarily opened by vacuum pressure. When the process liquid or oil vapor flows into the sealing part (S), it is sucked out and quickly discharged to the discharge port (112).

In particular, the process liquid or oil vapor that has flowed into the sealing part (S) can be discharged more quickly by the middle impeller 130, which will be described later.

At this time, the plurality of main impellers 120 and 121, which directly suck and discharge the process liquid into the vertical pump device 100, are provided with a larger diameter than the middle impeller 130 or the sub-impeller 142 to be described later, and the middle impeller ( 130) or a larger flow rate and head than the sub-impeller 142.

In addition, the middle impeller 130 is coupled and fixed to the upper part of the motor shaft 171 spaced from the main impeller 120 toward the motor 170, and the middle impeller 130 rotates together with the main impeller 120 to form a sealing part. Fluid such as process fluid or oil vapor that has flowed into the motor 170 between the dry seal 131 and the cup seal 141 of the (S) or through the cup seal 141 of the sealing part (S) is sucked out and the flow path 113 is opened. It serves to quickly discharge the liquid through the discharge port 112.

In addition, the sub-impeller 142 is coupled and fixed to the motor shaft 171 in the motor base 172 spaced apart from the middle impeller 130 and rotates together with the main impeller 120 (121) and the middle impeller 130, as described later. In addition to sucking ultrapure water from the ultrapure water tank 180, the sub-impeller 142 generates a vortex flow in the ultrapure water filled in the groove 160b of the second seal housing 160, which will be described later.

Accordingly, the air sucked into the motor base 172 from the motor 170 side is guided to the groove portion 160b of the second seal housing 160 and passes through the ultrapure water flowing as a vortex in the groove portion 160b. At this time, all foreign substances in the air are filtered out in ultrapure water, and the filtered foreign substances settle to the bottom of the groove 160b by gravity, so foreign substances in the air sucked from the motor 170 flow inside the casing 110. It has excellent filtration performance that can never be mixed into pure process fluid.

In addition, a sealing portion (S) is formed within the casing 110 and the motor base 172 between the middle impeller 130 and the sub-impeller 142 to block the inflow of process fluid and oil vapor into the motor 170. .

The sealing portion (S) includes a dry seal 131 provided in the middle impeller 130, a cup seal 141 provided in the sleeve 140, and the first and second seal housings 150 and 160. Includes each carbon chamber (151) (161) provided on the inner surface of.

The dry seal 131 is fixed to the outer surface of the middle impeller 130, and the seal portion protruding to the outside with a gradually thinner thickness comes into contact with the first carbon seal 151 of the first seal housing 150 and is sealed.

In addition, the sleeve 140 is provided to protect the motor shaft 171 by being inserted and wrapped around the motor shaft 171 in a state in contact with the middle impeller 130, and a cup seal 141 is provided on the outer periphery of the sleeve 140. do.

The cup chamber 141 is formed in an approximately "V" cross-sectional shape with its central portion penetrating. The central portion of the cup chamber 141 is inserted into and fixed to the outer periphery of the sleeve 140, and the outer periphery is spread outward while its end portion is fixed. The seal part protrudes and seals in contact with the second carbon chamber 161 of the second seal housing 160 in surface contact, and the seal part is provided with a gradually thinner thickness toward the end.

Meanwhile, on the inner periphery of the casing 110 and the motor base 172, first and second seal housings 150 and 160 are provided in a sealed state and are in close contact with each other, and the first and second seal housings 150 and 160 ), first and second carbon seals 151 and 161 are provided on the inner periphery of the dry seal 131 and the cup seal 141, respectively.

At this time, the second carbon chamber 161 is preferably provided below the flow path 160b of the second seal housing 160, and the flow path 160b of the second seal housing 160 is connected to the motor base 172, which will be described later. It is located in a straight line and is provided in communication with the supply path (172a).

Accordingly, the sealing unit (S) double seals the inside of the casing 110 through which the fluid flows with the dry seal 131 and the cup seal 141, so that the process fluid and oil vapor sucked into the vertical pump device 100 are absorbed into the motor 170. ) side and leakage can be prevented as much as possible.

In addition, a groove 160b is formed on the upper surface of the second seal housing 160, which is filled with ultra-pure water supplied to the supply passage 172a of the motor base 172, which will be described later, and a sub-impeller is located within the groove 160b. The wing of (142) is provided to rotate within the groove portion (160b) in an inserted state.

As a result, the ultrapure water filled in the groove 160b flows as a vortex flow (vortex) due to the centrifugal force caused by the rotating sub-impeller 142, and a plurality of main impellers 120 (121) including the sub-impeller 142. ), Since a large suction force by the middle impeller 130 is applied within the motor base 172, the air sucked from the motor 170 passes smoothly through the ultrapure water and all foreign substances are filtered out.

Accordingly, the air sucked into the motor base 172 from the motor 170 side has the advantage of having excellent filtration performance that is close to perfect because only clean air from which foreign substances have been filtered is introduced.

Meanwhile, when the vertical pump device 100 configured as described above is operated, oil is generated in the oil chamber 173 that is continuously in contact with the rotating motor shaft 171 and is sucked into the motor base 172 from the motor 170 side. Foreign matter in the air (hereinafter referred to as “external foreign matter”), and the cup room 141 and dry room 131 in the casing 110 during the initial operation of the vertical pump device 100 are separated into carbon rooms 151 and 161, respectively. ), foreign substances (hereinafter referred to as "internal foreign substances") generated in the cup chamber 141 and the dry chamber 131 respectively as they are rotated in contact with the pure process fluid supplied to the semiconductor manufacturing system 183. Mixture may result in contamination.

Accordingly, in the present invention, external foreign substances can be completely filtered out by supplying and filling the groove portion 160b of the second seal housing 160 facing the sub-impeller 142 with ultrapure water, and the vertical pump device 100 is rated Until the speed operation section is reached, the process liquid discharged from the vertical pump device 100 is not supplied to the system 183, but is bypassed and discharged to a separate storage tank 182, so that the system 183 is always a pure process. Only liquid can be supplied.

To explain this in detail, first, as shown in FIGS. 2 and 3, when the vertical pump device 100 is operated, the motor base 172 between the sub-impeller 142 and the cup chamber 141 is moved from the motor 170 side. (172) A filtration means is provided to filter out foreign substances in the air that are inhaled (hereinafter referred to as “external foreign substances”).

This filtration means is implemented by supplying and filling the groove portion 160b of the second seal housing 160 with ultrapure water.

For this purpose, the vertical pump device 100 includes an ultrapure water tank 180 in which ultrapure water is stored, a storage tank 182 in which contaminated process fluid generated during the initial operation of the vertical pump device 100 is stored, and a second chamber. An ejector 181 that discharges ultrapure water contaminated by foreign substances while filled in the groove 160b of the housing 160, and a waste tank 184 that stores the contaminated ultrapure water discharged by the ejector 181. Includes.

In addition, the vertical pump device 100, the ultrapure water tank 180, the ejector 181, the waste tank 184, and the storage tank 182 are connected to each hydraulic line, and each hydraulic line has a respective solenoid valve. It can be provided.

As shown in FIGS. 2 and 3, this filtration means is provided with an ultra-pure water tank 180 in which ultra-pure water is stored, and is installed in the groove 160b of the second seal housing 160 facing the sub-impeller 142. As the ultrapure water from the ultrapure water tank 180 is supplied and filled, all external foreign substances in the air sucked into the casing 110 from the motor 170 through the motor base 172 are filtered out when the vertical pump device 100 is operated. Since the inflow of foreign substances is completely blocked, only pure process fluid is supplied to the system 183, and the contaminated ultrapure water filled in the groove 160b of the second seal housing 160 is ejected by the ejector 181. It is provided to be discharged to the outside of the casing 110.

In particular, the motor base 172 to which the ultrapure water tank 180 is connected is provided with a supply path 172a penetrating from the outside to the inside, and the motor base 172 on the opposite side of the supply path 172a is provided with a supply path 172a penetrating from the inside to the outside. A discharge passage 172c is provided.

At this time, the supply passage 172a is located between the sub-impeller 142 and the cup chamber 141 to supply and fill ultrapure water into the groove 160b of the second seal housing 160, and the discharge passage 172c supplies It is provided at a lower position than the furnace 172a, so that the contaminated ultrapure water filled in the groove 160b of the second seal housing 160 can be discharged smoothly.

In addition, fittings 172b and 172d are respectively installed in the supply path 172a and the discharge path 172c of the motor base 172.

The ultra-pure water tank 180 is connected to the supply fitting 172b provided in the supply path 172a through the sub-supply line 190, and a solenoid valve (sol V2) is installed in the sub-supply line 190. It is provided to open and close the sub supply line 190.

The ejector 181 is connected to the discharge fitting 172d provided in the discharge passage 172c via the discharge line 191, and the ejector 181 is connected to the waste tank via the recovery line 192. 184) is connected and provided.

In addition, nitrogen gas (N ₂ ) can be supplied to the ejector 181 through a separate line and flow into the waste tank 184. At this time, the vacuum pressure generated by the flow rate of nitrogen gas passing through the ejector 181 (Negative pressure) acts as a suction force of the ejector 181, which suctions the contaminated ultrapure water into the groove 160b of the second seal housing 160.

As a result, the contaminated ultrapure water discharged from the groove 160b of the second seal housing 160 by the ejector 181 is stored in the storage tank 182 through the discharge line 191 and the recovery line 192 to the waste tank ( 184) and is stored.

Meanwhile, the semiconductor manufacturing system 183 is connected to the discharge port 112 of the vertical pump device 100 through the main supply line 193, and a solenoid valve (sol V3) is installed in the main supply line 193. It is provided to open and close the supply line 193, and the storage tank 182 is connected to the solenoid valve (sol V3) of the main supply line 193 via a bypass line 194.

Accordingly, during the initial operation of the vertical pump device 100, that is, in the incomplete speed operation section before the vertical pump device 100 reaches the rated speed operation section, the direction of the solenoid valve (sol V3) is changed as shown in FIG. The main supply line 193 is closed and the bypass line 194 is opened, so that all of the initial process liquid discharged to the vertical pump device 100 is bypassed and discharged to the storage tank 182.

In addition, in the rated speed operation section of the vertical pump device 100, the bypass line 194 is closed and the main supply line 193 is opened by switching the solenoid valve sol V3 in the reverse direction as shown in FIG. 3, All pure process fluid discharged from the vertical pump device 100 is supplied to the system 183.

In particular, during the initial operation of the vertical pump device 100, the cup chamber 141 and the dry chamber 131 are rotated in contact with each carbon chamber 151 and 161, resulting in nanoparticle foreign matter (hereinafter referred to as “internal foreign matter”). ) is generated, and internal foreign matter continues to be generated until the cup chamber (141) and dry chamber (131) are separated from each carbon chamber (151) (161), and the pure process fluid supplied to the system (183) contaminates.

Therefore, during the initial operation of the vertical pump device 100, the main supply line 193 is closed and the bypass line 194 is opened, thereby polluting the process by internal foreign substances generated in the cup room 141 and the dry room 131. By bypassing and discharging the liquid to the storage tank 182 instead of supplying it to the system 183, it is possible to prevent defects in semiconductors caused by contaminated process liquid.

Meanwhile, the vertical pump device 100 as described above may be equipped with a separate controller (not shown), and the controller controls the overall operation of the vertical pump device 100. That is, each solenoid valve can be controlled according to set operating conditions, such as an incomplete speed operation section or a rated speed operation section, of the vertical pump device 100, thereby forming a hydraulic line suitable for the corresponding operating conditions.

When operating the vertical pump device for semiconductor manufacturing as described above, as the motor 170 is driven, a plurality of main impellers 120 and 121 fixed to the motor shaft 171, a middle impeller 130, and a sub-impeller 142 ) are rotated simultaneously.

At this time, in the initial operation of the vertical pump device 100, that is, in the incomplete speed operation section before the vertical pump device 100 reaches the rated speed operation section, the main supply line (sol V3) is used as shown in FIG. 2. At the same time that 193) is closed, the bypass line 194 is opened, and the sub supply line 190 is opened by changing the direction of the solenoid valve (sol V23).

In this state, the ultra-pure water in the ultra-pure water tank 180 passes through the sub-supply line 190 due to the suction force generated by the rotating impellers 120, 121, 130, 142, and the groove 160b of the second seal housing 160. ) is supplied and filled, and the space between the second seal housing 160 and the sub-impeller 142 is sealed by the filled ultrapure water.

Therefore, the air sucked into the motor base 172 from the motor 170 side passes between the sub-impeller 142 and the second seal housing 160, and external foreign substances in the air are filtered out by ultrapure water, and the filtered foreign substances settles to the bottom of the groove 160b of the second seal housing 160 by gravity.

External foreign substances deposited in this way are discharged to the discharge line 191 through the discharge path 172c by the suction force of the ejector 181 together with the contaminated ultra-pure water, and the discharged external foreign substances and ultra-pure water pass through the ejector 181 and are recovered. By flowing into the waste tank 184 through the line 192 and storing it, it is possible to completely block and prevent contamination of the pure process fluid by external foreign substances.

In addition, during the initial operation of the vertical pump device 100, the cup chamber 141 and the dry chamber 131 are rotated in contact with each carbon chamber 151 and 161, causing internal foreign matter of nanoparticles to be generated. Foreign substances are mixed into the pure process fluid sucked from the main tank 196 through the suction force of the plurality of main impellers 120 and 121, thereby contaminating the process fluid.

The contaminated process fluid is discharged through the discharge port 112 and supplied to the main supply line 193, but is not supplied to the system 183 because the main supply line 193 is closed by the solenoid valve (sol V3). All of it flows into the storage tank 182 through the open bypass line 194 and is stored.

Thereafter, when the vertical pump device 100 reaches the rated speed operation section, the cup chamber 141 and the dry chamber 131 are separated from the carbon chambers 151 and 161 and are spaced apart, as shown in FIG. 3. Likewise, the solenoid valve (sol V3) is switched in the reverse direction to open the main supply line 193 and close the bypass line 194.

Accordingly, the pure process fluid sucked from the main tank 196 by the vertical pump device 100 is directly supplied to the system 183.

Therefore, when supplying the pure process fluid sucked from the main tank 196 by the vertical pump device 100 to the system 183, external foreign substances in the air sucked from the motor 170 are stored in the second seal housing 160. ) is filtered by ultra-pure water filled in the groove 160b, and internal foreign matter generated in the cup chamber 141 and dry chamber 131, which are rotated in contact with each carbon chamber 151 and 161, is contained in the cup chamber ( 141) and the dry chamber 131 are mixed in the process liquid and discharged into the storage tank 182 until they are separated from each carbon chamber 151 and 161, thereby making it a pure process in the semiconductor manufacturing system 183. Only liquid is supplied.

Meanwhile, in the vertical pump device 100 as described above, excessive vacuum that may be generated inside the vertical pump device 100 due to the operation of the pump 100 is maintained whenever the operation of the vertical pump device 100 is stopped. A vacuum release device 200 is further configured to release the vacuum by allowing atmospheric pressure to be applied inside the device 100.

This vacuum release device 200 is provided in a horizontal direction along the installation direction of the vertical pump device 100 on the motor base 172 spaced apart from the supply fitting 172b, thereby avoiding interference with the above-described filtering means. .

Specifically, as shown in FIGS. 4 to 6, the vacuum release device 200 includes a first housing block 230 that is axially inserted and buried at one end of the motor base 172, and a first housing block 230. A first valve 250 provided in the housing block 230 to communicate with or block the internal pipe 231 of the first housing block 230 and the first and second flow paths 235 and 236, and a first valve It includes an elastic member 243 that elastically supports (250).

This first housing block 230 is formed with an internal pipe 231 penetrating in its embedding direction, that is, in the axial direction, and the internal pipe 231 is connected to the outside and inside of the motor base 172, respectively. The first and second flow paths 235 and 236 for communication are provided to communicate.

In addition, the first and second flow paths 235 and 236 are formed at one end and the other end of the first housing block 230, respectively, and the second flow path 236 is provided in direct communication with the internal pipe 231. . Accordingly, the first and second flow paths 235 and 236 are provided to communicate with or block each other through the internal conduit 231 by the first valve 250, which will be described later.

And, on one end of the first housing block 230 where the first flow path 235 is located, an insertion hole 234 communicating with the internal pipe 231 is formed with an inner diameter larger than that of the internal pipe 231, and this insertion hole 234 ) is provided with a first valve 250, which will be described later, inserted.

In addition, an inner inclined surface that gradually narrows toward the internal pipe 231 is formed at the inner end of the insertion hole 234, and an outer surface gradually narrows toward the internal pipe 231 at the tip of the first housing block 230 opposite the insertion hole 234. A slope is formed.

Accordingly, the first flow path 235 of the first housing block 230 is connected to the internal pipe 231 through the insertion hole 234, and the second flow path 236 is provided to be directly connected to the internal pipe 231. As the first valve 250, which will be described later, opens and closes the internal pipe 231 at the insertion port 234, the first and second flow paths 235 and 236 are provided to communicate or block.

In addition, the insertion hole 234 of the first housing block 230 is provided in communication with the discharge port 112 through a branch passage 110a formed through the casing 110, and the first flow path of the first housing block 230 (235) is provided to communicate with the outer communication path (172e) of the motor base 172, and the second flow path 236 of the first housing block 230 is connected to the inner communication path (172f) of the motor base 172. It is provided in communication with the interior of the motor base 172 (internal space where a vacuum is formed by suction force).

At this time, the inner surface of the motor base 172 in contact with the insertion hole 234 of the first housing block 230 has an inclined surface of the casing 110 to secure a space where the first valve 250, which will be described later, can flow. It may be formed in a structure that is recessed toward the branch passage (110a).

In particular, the motor base 172 has an outer communication passage 172e and an inner communication passage that communicate the inside and outside of the motor base 172 in a different direction from the supply passage 172a and discharge passage 172c of the above-described filtration means. (172f) is further provided, and the inner communication path (172f) is a vertical pump device (100) through a separate flow path different from the flow path (160a) of the second seal housing (160) through which ultra-pure water is supplied from the ultra-pure water tank (180). ) It is provided in communication with the interior.

Meanwhile, the first valve 250 is provided in the insertion hole 234 of the first housing block 230 and communicates or blocks the internal conduit 231 and the first flow path 235 of the first housing block 230. As a result, when the vertical pump device 100 is stopped, the discharge pressure (positive pressure) does not act on the branch passage 110a of the casing 110, so the internal pipe 231 and the first flow path of the first housing block 230 (235) is communicated, and when the vertical pump device 100 operates, discharge pressure (positive pressure) is applied to the branch passage 110a of the casing 110, so that the internal pipe 231 of the first housing block 230 and It is provided to block the first flow path 235.

This first valve 250 is fixedly provided between the first housing block 230 and the motor base 172 and connects the internal conduit 231 and the first and second flow paths 235 of the first housing block 230 ( A fixing part 251 that blocks the discharge port 112 of the casing 110 (236), a shaft part 252 protruding from one side of the fixing part 251 toward the insertion hole 234 of the first housing block 230, and , a sealing protrusion 253 that protrudes from the tip of the shaft portion 252 and blocks or communicates the internal pipe 231 and the first flow path 235 depending on whether it is in contact with the internal pipe 231 of the first housing block 230. Includes.

In particular, the fixing part 251 of the first valve 250 is provided as a flexible disk that isolates the insertion hole 234 of the first valve 250 and the branch passage 110a of the casing 110, and the first valve 250 The sealing protrusion 253 of 250 is extended from the shaft portion 252 and is provided in a cone shape that contacts and seals the internal pipe 231 of the first housing block 230.

This sealing protrusion 253 is formed in a cone shape corresponding to the inner inclined surface of the insertion hole 234, so that its outer circumferential surface contacts the inner surface of the insertion hole 234 in surface contact, thereby forming the inner pipe of the first housing block 230. (231) is tightly sealed and sealed.

And, the fixing part 251 is connected to the first housing block by the elastic force of the elastic member 243 acting on both sides of the first valve 250 or the discharge pressure (positive pressure) through the branch passage 110a of the casing 110. The insertion hole 234 of (230) is bent outward or returned to its original state, thereby communicating or blocking the internal pipe 231 of the first housing block 230 and the first and second flow paths 235 and 236. .

In addition, the motor base 172 may be further provided with a second housing block 240 that is inserted into the motor base 172 from the outer end and contacts the first housing block 230.

In the second housing block 240, an internal pipe 241 that coincides with and communicates with the internal pipe 231 of the first housing block 230 is formed through the axial direction of the second housing block 240, and the second housing block 240 An elastic member 243 is inserted into the internal conduit 241 of the block 240.

The elastic member 243 is provided as a compression coil spring, and an adjustment screw 242 is screwed at the outer end of the second housing block 240 to support the elastic member 243 and adjust the elastic force of the elastic member 243. It is provided in combination.

Accordingly, the elastic member 243 is provided in a compressed state between the adjustment screw 242 and the second valve 260, which will be described later, and is operated to expand and contract, and the second valve 260, which will be described later, is operated by the elastic force of the elastic member 243. ), the first valve 250 is pushed toward the branch passage 110a of the casing 110 and bent. At this time, when discharge pressure acts on the first valve 250 of the casing 110, the discharge pressure is Since the elastic force of the elastic member 243 is greater than that of the elastic member 243, the elastic member 243 cannot be tensioned and remains compressed, so the first valve 250 does not flow.

That is, when the discharge pressure acts on the first valve 250 due to the operation of the vertical pump device 100, the first valve 250 enters the insertion hole 234 and comes into contact with the inner surface of the insertion hole 234. 1 The first and second flow paths 235 and 236 of the housing block 230 are blocked, and when the vertical pump device 100 is stopped without discharge pressure acting on the first valve 250, the first valve 250 ) flows by the tensile force of the elastic member 243 to communicate with the first and second flow paths 235 and 236 of the first housing block 230.

In addition, a second valve 260 is provided between the first and second housing blocks 230 and 240, and the second valve 260 is located on the boundary surface of the first and second housing blocks 230 and 240. A fixing part 261 is provided to be fixed and isolates the first and second housing blocks 230 and 240, and is formed to protrude from the fixing part 261 and is inserted into the internal conduit 231 of the first housing block 230. A coupling in which the shaft portion 262 is supported in contact with the sealing protrusion 253 of the first valve 250 and the elastic member 243 is inserted and supported by protruding from the fixing portion 261 to the opposite side of the shaft portion 262. Includes protrusion 263.

This second valve 260 is elastically supported by the elastic member 243 provided between the adjustment screw 242 and the coupling protrusion 263 of the second valve 260, thereby elastically supporting the first valve 250. I do it.

The fixing part 261 of the second valve 260, like the first valve 250 and the fixing part 251, is provided as a flexible disk and connects the internal conduit 231 of the first housing block 230 and the second It is provided to isolate the internal pipe 241 of the housing block 240.

In addition, the fixing part 261 has a restoring force of the first valve 250 (first housing block ( 230) is bent toward the first valve 250 by the pressurizing force in contact with the internal pipe 231 and moves the first valve 250, or is provided to be returned to its original state by the first valve 250 being returned to its original position. do.

At this time, the fixing part 261 is bent and deformed until it contacts the outer inclined surface of the first valve 250, and the first valve 250 moves toward the branch path 110a of the casing 110 by the amount of deformation. As this happens, the first and second flow paths 235 and 236 of the first housing block 230 are communicated.

In addition, the shaft portion 262 of the second valve 260 is formed to have an outer diameter smaller than the internal pipe 231 of the first housing block 230, and moves together with the fixing portion 261 by the elastic member 243. As the first valve 250 is pushed out of the insertion hole 234, the first and second flow paths 235 and 236 of the first housing block 230 are communicated, and the first valve is returned to its original position by the action of positive pressure. As it moves in the opposite direction by 250, the first and second passages 235 and 236 of the first housing block 230 are blocked.

In addition, the outer communication passage 172e of the motor base 172 is provided with a fitting pipe 220 for communicating external air with the first passage 235 of the first housing block 230, and the fitting pipe 220 has a vertical A filter is provided to filter out foreign substances contained in the external air sucked into the first passage 235 of the first housing block 230 by the vacuum pressure (negative pressure) inside the pump device 100, and foreign substances in the external air are sucked in. It is possible to prevent failure or malfunction of the vertical pump device 100 due to .

Meanwhile, the vacuum release device 200 configured as described above blocks the inside and outside of the vertical pump device 100 when the vertical pump device 100 is in operation, and when the vertical pump device 100 is idle (stopped), the vacuum release device 200 blocks the vertical pump device 100. By communicating the inside and outside of the device 100 to release the vacuum, it is possible to smoothly perform an independent operation without interfering with the operation of the above-mentioned filtering means.

The operation of the vacuum release device 200 as described above is first performed by a plurality of main impellers 120 and 121 that are rotated together with the motor shaft 171 by the motor 170 when the vertical pump device 100 is operated. Pure process fluid from the main tank 196 is sucked into the suction port 111 and discharged through the flow path 113 to the discharge port 112.

At the same time, as the middle impeller 130 and sub-impeller 142 rotate together with the main impeller 120 and 121, the process fluid flows into the motor base 172 through the dry room 131 and the cup room 141. Oil vapor is sucked in and discharged through the discharge port (112).

At this time, some of the process fluid discharged through the discharge port 112 acts on the fixing part 251 of the first valve 250 through the branch passage 110a of the casing 110, thereby forming the first valve 250. The sealing protrusion 253 is brought into close contact with the insertion hole 234 of the first housing block 230 as shown in FIG. 5 to close the internal passage 231 of the first valve housing 230.

As a result, it is possible to prevent leakage of the process fluid through the internal passage 231 of the first valve housing 230.

Thereafter, when the operation of the vertical pump device 100 is stopped, the discharge pressure (positive pressure) of the process fluid acting on the fixing part 251 of the first valve 250 through the branch passage 110a of the casing 110 increases. It disappears, and as a result, the elastic member 243, which was compressed in the internal pipe 241 of the second housing block 240, is stretched as shown in FIG. 6, and the second valve 260 is moved toward the first housing block 230. It is pushed out, and thus the shaft portion 262 of the second valve 260 moves from the internal pipe 231 of the first housing block 230 toward the first valve 250.

Then, the sealing protrusion 253 of the first valve 250 in contact with the shaft portion 262 of the second valve 260 is pushed and moved toward the branch passage 110a and is separated from the inner surface of the insertion port 234, The first flow path 235 of the first housing block 230, the internal pipe 231, and the second flow path 236 are communicated with each other through a spaced gap between the sealing protrusion 253 and the insertion hole 234.

Therefore, the outside air in the atmosphere is sucked into the fitting pipe 220 by the vacuum pressure (negative pressure) formed in the vertical pump device 100, and foreign substances in the outside air sucked into the fitting pipe 220 are filtered by the vacuum filter. Only clean outdoor air flows into the insertion hole 234 through the first flow path 235 of the first housing block 230.

Thereafter, the external air flowing into the insertion hole 234 passes through the internal conduit 231 and the second conduit 236 of the first housing block 230 and the inner conduit 172f of the motor base 172 to the vertical pump device 100. ) flows into the interior to create a vacuum inside the vertical pump device 100 at atmospheric pressure, thereby releasing the vacuum within the vertical pump device 100.

Although the present invention has been described in detail through specific examples, this is for detailed explanation of the present invention, and the present invention is not limited thereto, and can be understood by those skilled in the art within the technical spirit of the present invention. It is clear that modifications and improvements are possible.

All simple modifications or changes of the present invention fall within the scope of the present invention, and the specific scope of protection of the present invention will be made clear by the appended claims.

100: vertical pump device 110: casing
110a: branch 110c: slope
111: suction port 112: discharge port
113: Euro 120,121: Main impeller
130: Middle impeller 131: Dry room
140: sleeve 141: cup room
142: Sub-impeller 150,160: Seal housing
160a: Euro 160b: Groove
151,161: Carbon room 170: Motor
171: motor shaft 172: motor base
172a: Supply path 172b: Supply fitting
172c: discharge path 172d: discharge fitting
172e: outer communication path 172f: inner communication path
173: Oil room 180: Ultrapure water tank
181: ejector 182: storage tank
183: System 184: Waste tank
190: sub supply line 191: discharge line
192: recovery line 193: main supply line
194: bypass line 196: main tank
200: Vacuum release device 220: Fitting pipe
230: first housing block 231: internal pipe
234: Insertion port 235,236: 1st and 2nd euros
240: second housing block 241: internal pipe
242: adjustment screw 243: elastic member
250: first valve 251: fixed part
252: shaft 253: sealing protrusion
260: second valve 261: fixed part
262: shaft portion 263: coupling protrusion

Claims (3)

A casing provided at the bottom of the motor, a main impeller provided at the inner bottom of the casing and rotated by the motor to suck in and discharge pure process fluid, a cup seal provided inside the casing between the main impeller and the motor for sealing, and a cup. A vertical pump device for semiconductor manufacturing that pumps pure process fluid from the main tank and supplies it to the system, including a dry seal provided inside the casing between the seal and the main impeller for sealing.
An air passage is formed within the casing through which the air sucked from the motor side flows when the vertical pump device operates to the flow path where pure process fluid flows,
A seal housing is fixedly installed on the air passage between the motor and the cup chamber and has a groove filled with ultrapure water on the upper surface.
As it rotates with the main impeller at the top of the seal housing, ultra-pure water is sucked in through the air passage between the motor and the cup chamber to fill the groove of the seal housing, while air sucked from the motor is introduced into the ultra-pure water in the groove to remove foreign substances in the air. A vertical pump device for semiconductor manufacturing equipped with a sub-impeller that filters ultrapure water.
delete In claim 1,
A vertical pump device for semiconductor manufacturing in which a solenoid valve changes the direction of the flow path of the process fluid supplied to the system from the vertical pump device to bypass the process fluid in the incomplete speed operation section before reaching the rated speed operation section when the vertical pump device is operating. .

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