KR102559972B1 - High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method - Google Patents

High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method Download PDF

Info

Publication number
KR102559972B1
KR102559972B1 KR1020210095683A KR20210095683A KR102559972B1 KR 102559972 B1 KR102559972 B1 KR 102559972B1 KR 1020210095683 A KR1020210095683 A KR 1020210095683A KR 20210095683 A KR20210095683 A KR 20210095683A KR 102559972 B1 KR102559972 B1 KR 102559972B1
Authority
KR
South Korea
Prior art keywords
coating layer
component
thin film
constituent elements
adhesion
Prior art date
Application number
KR1020210095683A
Other languages
Korean (ko)
Other versions
KR20230014396A (en
Inventor
김왕렬
박인욱
김준호
허성보
박찬혁
Original Assignee
한국생산기술연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국생산기술연구원 filed Critical 한국생산기술연구원
Priority to KR1020210095683A priority Critical patent/KR102559972B1/en
Publication of KR20230014396A publication Critical patent/KR20230014396A/en
Application granted granted Critical
Publication of KR102559972B1 publication Critical patent/KR102559972B1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025Metallic sublayers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/048Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/36Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including layers graded in composition or physical properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.The method for manufacturing a high-temperature, low-friction multicomponent thin film to which vanadium is added according to the present invention includes the step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material, the step (b) of laminating an intermediate coating layer having a number of components equal to or greater than the number of components constituting the adhesion coating layer, including a Cr component and an Al component, on the adhesion coating layer, and a step (b) of laminating an intermediate coating layer having a number of components equal to or greater than the number of components constituting the intermediate coating layer, including Cr components, Al components, and V components, on the intermediate coating layer, but having a number of components equal to or greater than the number of components constituting the intermediate coating layer. and (c) step of laminating the final coating layer.

Description

바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 및 이의 제조방법{High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method}High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method}

본 발명은 다성분계 박막 및 이의 제조방법에 관한 것으로서, 보다 상세하게는 바나듐이 첨가되어 고온에서 저마찰계수를 가지는 특성을 가지도록 형성되는 다성분계 박막 및 이의 제조방법에 관한 것이다.The present invention relates to a multi-component thin film and a method for manufacturing the same, and more particularly, to a multi-component thin film formed to have a low coefficient of friction at a high temperature by adding vanadium and a method for manufacturing the same.

일반적으로 전통적인 자동차 및 선박과 같은 운송수단은 엔진이 가장 중요한 부품이다. 이와 같은 부품들은 많은 접촉 부위에서 마찰, 마모에 의한 열이 발생되고, 이러한 열은 소재를 약하게 만들기 때문에 파손, 파괴 등의 문제점을 일으키게 된다.In general, the engine is the most important part of vehicles such as automobiles and ships. These parts generate heat due to friction and abrasion at many contact areas, and this heat weakens the material, causing problems such as breakage and destruction.

즉 엔진이나 서로 접촉이 빈번하게 일어나는 부분의 부품들은 고속, 고온의 상태에서 마찰, 마모가 일어나기 때문에 더욱 문제가 되고 있다.That is, the parts of the engine or parts that frequently come into contact with each other are becoming more problematic because friction and wear occur in high-speed and high-temperature conditions.

이와 유사하게, 절삭공구(선삭, 밀링 등)에서도 마찬가지로 가공 시에 1,100℃ 이상의 고온이 발생되며, 엄청난 마찰, 마모 때문에 수 분~수십 분 정도 사용할 경우 수명이 다하여 가공 툴을 교체하여야 하는 문제점이 있었다.Similarly, cutting tools (turning, milling, etc.) also generate high temperatures of 1,100 ° C or more during processing, and when used for several minutes to tens of minutes due to tremendous friction and wear, the tool life is over and the processing tool must be replaced.

종래에는 이와 같은 문제점을 보완하기 위한 수단으로서 마모가 발생하는 부품에 내식성을 향상시키기 위한 TiAlN, TiSiN, CrAlN, CrAlSiN 등의 코팅막을 적용하고 있었으나, 이 역시 사용자가 원하는 수명을 보장하기 어렵다는 문제가 발생하고 있다.Conventionally, as a means to compensate for this problem, a coating film such as TiAlN, TiSiN, CrAlN, CrAlSiN, etc. has been applied to improve corrosion resistance on parts that wear out, but this also guarantees the lifespan desired by the user. There is a problem that it is difficult to guarantee.

이에 따라 현실적으로 부품과 공구 등의 수명을 향상시키고 안정적인 사용환경을 구축하기 위해서는 고온에서 저마찰 특성을 나타낼 수 있는 코팅막의 개발이 필요한 상황이다.Accordingly, it is necessary to develop a coating film capable of exhibiting low friction characteristics at high temperatures in order to realistically improve the lifespan of parts and tools and establish a stable use environment.

한국등록특허 제10-1453583호Korean Patent Registration No. 10-1453583

본 발명은 상술한 종래 기술의 문제점을 해결하기 위하여 안출된 발명으로서, 다양한 부하가 집중되는 기계부품에 적용하여 고온에서도 저마찰 특성을 부여할 수 있으며, 항공, 우주와 같은 첨단 산업에도 적용 가능하도록 모재의 표면에 증착되어 저마찰계수를 가지는 특성 박막 및 이의 제조방법을 제공하기 위한 목적을 가진다.The present invention is an invention made to solve the above-mentioned problems of the prior art, and can be applied to mechanical parts where various loads are concentrated to impart low friction characteristics even at high temperatures, and can be applied to high-tech industries such as aviation and space.

본 발명의 과제들은 이상에서 언급한 과제들로 제한되지 않으며, 언급되지 않은 또 다른 과제들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.The tasks of the present invention are not limited to the tasks mentioned above, and other tasks not mentioned will be clearly understood by those skilled in the art from the following description.

상기한 목적을 달성하기 위한 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.In order to achieve the above object, the method of manufacturing a high-temperature, low-friction multi-component thin film to which vanadium is added according to the present invention includes the step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material, the step (b) of laminating an intermediate coating layer having a number of elements equal to or greater than the number of elements constituting the adhesion coating layer, including a Cr component and an Al component, on the adhesion coating layer, and a component element constituting the intermediate coating layer including Cr, Al and V components on the intermediate coating layer and (c) of laminating a final coating layer having the number of constituent elements equal to or greater than the number of elements.

이때 상기 (a)단계는, 상기 밀착 코팅층을 복수 개 적층하되, 하부에 위치된 밀착 코팅층에서 상부에 위치된 밀착 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행할 수 있다.At this time, in step (a), the adhesion coating layer may be laminated in plurality, but the lamination may be performed such that the number of constituent elements increases from the adhesion coating layer located at the bottom to the adhesion coating layer located at the top.

더불어 상기 (b)단계는, 상기 중간 코팅층을 복수 개 적층하되, 하부에 위치된 중간 코팅층에서 상부에 위치된 중간 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행할 수 있다.In addition, in the step (b), a plurality of intermediate coating layers may be laminated so that the number of constituent elements increases from the lower intermediate coating layer to the upper intermediate coating layer.

또한 상기 (c)단계는, 상기 최종 코팅층을 복수 개 적층하되, 하부에 위치된 최종 코팅층에서 상부에 위치된 최종 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행할 수 있다.In addition, in the step (c), the final coating layer may be laminated in plurality, but the lamination may be performed such that the number of constituent elements increases from the lower final coating layer to the upper final coating layer.

그리고 상기한 목적을 달성하기 위한 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막은, 대상 모재의 표면에 적층되며, Cr 성분을 포함하는 밀착 코팅층, 상기 밀착 코팅층 상에 적층되며, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층 및 상기 중간 코팅층 상에 적층되며, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 포함한다.In addition, the high-temperature, low-friction multi-component thin film to which vanadium is added according to the present invention is laminated on the surface of the target base material and laminated on the adhesion coating layer, including a Cr component and an Al component, but including a Cr component and an Al component, and the final coating layer laminated on the intermediate coating layer and having a number of components greater than or equal to the number of components constituting the intermediate coating layer and including a Cr component, an Al component, and a V component, and including a Cr component, an Al component, and a V component. includes

이때 상기 밀착 코팅층은 복수 개가 구비되되, 하부에 위치된 밀착 코팅층에서 상부에 위치된 밀착 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성될 수 있다.In this case, the adhesion coating layer may be provided in plural numbers, and the number of constituent elements may increase from the adhesion coating layer located at the bottom to the adhesion coating layer located at the top.

그리고 상기 복수 개의 밀착 코팅층은, 단일 Cr 성분으로 이루어지는 제1밀착 코팅층 및 CrN 성분으로 이루어지는 제2밀착 코팅층으로 구성될 수 있다.The plurality of adhesion coating layers may include a first adhesion coating layer composed of a single Cr component and a second adhesion coating layer composed of a CrN component.

더불어 상기 중간 코팅층은 복수 개가 구비되되, 하부에 위치된 중간 코팅층에서 상부에 위치된 중간 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성될 수 있다.In addition, a plurality of intermediate coating layers may be provided, and the number of constituent elements may increase from the lower intermediate coating layer to the upper intermediate coating layer.

이때 상기 복수 개의 중간 코팅층은, CrAlN 성분으로 이루어지는 제1중간 코팅층 및 CrAlSiN 성분으로 이루어지는 제2중간 코팅층으로 구성될 수 있다.In this case, the plurality of intermediate coating layers may include a first intermediate coating layer made of a CrAlN component and a second intermediate coating layer made of a CrAlSiN component.

그리고 상기 최종 코팅층은 복수 개가 구비되되, 하부에 위치된 최종 코팅층에서 상부에 위치된 최종 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성될 수 있다.In addition, the final coating layer may be provided in plurality, and the number of constituent elements may increase as it goes from the final coating layer located at the bottom to the final coating layer located at the top.

여기서 상기 복수 개의 최종 코팅층은, CrAlVN 성분으로 이루어지는 제1최종 코팅층 및 CrAlVSiN 성분으로 이루어지는 제2최종 코팅층으로 구성될 수 있다.Here, the plurality of final coating layers may include a first final coating layer made of a CrAlVN component and a second final coating layer made of a CrAlVSiN component.

상기한 과제를 해결하기 위한 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 및 이의 제조방법은, 밀착 코팅층, 중간 코팅층 및 최종 코팅층을 포함하며, 하부에서 상부로 갈수록 구성 원소가 점차 증가하도록 형성됨에 따라 초고온, 고압, 마찰의 분위기에서 저마찰계수를 가지는 특성을 발현할 수 있는 표면 개질 방법을 제공할 수 있는 장점을 가진다.The multi-component thin film with high-temperature low-friction properties to which vanadium is added and the method for manufacturing the same of the present invention to solve the above problems include an adhesion coating layer, an intermediate coating layer, and a final coating layer, and as the constituent elements are gradually increased from the bottom to the top, it has the advantage of providing a surface modification method capable of expressing characteristics having a low coefficient of friction in an atmosphere of ultra-high temperature, high pressure, and friction.

본 발명의 효과들은 이상에서 언급한 효과들로 제한되지 않으며, 언급되지 않은 또 다른 효과들은 청구범위의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.The effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description of the claims.

도 1은 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법의 각 과정을 나타낸 도면;
도 2는 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 구성을 나타낸 도면; 및
도 3은 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 특성 분석 결과를 나타낸 도면이다.
1 is a view showing each process of a method for manufacturing a high-temperature low-friction multi-component thin film to which vanadium is added according to an embodiment of the present invention;
2 is a view showing the configuration of a high-temperature low-friction property multi-component thin film to which vanadium is added according to an embodiment of the present invention; and
3 is a view showing the results of characterization of a high-temperature, low-friction multi-component thin film to which vanadium is added according to an embodiment of the present invention.

이하 본 발명의 목적이 구체적으로 실현될 수 있는 본 발명의 바람직한 실시예를 첨부된 도면을 참조하여 설명한다. 본 실시예를 설명함에 있어서, 동일 구성에 대해서는 동일 명칭 및 동일 부호가 사용되며 이에 따른 부가적인 설명은 생략하기로 한다.Hereinafter, a preferred embodiment of the present invention in which the object of the present invention can be realized in detail will be described with reference to the accompanying drawings. In describing the present embodiment, the same name and the same reference numeral are used for the same configuration, and additional description thereof will be omitted.

도 1은 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법의 각 과정을 나타낸 도면이다.1 is a diagram showing each process of a method for manufacturing a high-temperature low-friction multi-component thin film to which vanadium is added according to an embodiment of the present invention.

도 1에 도시된 바와 같이, 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계와, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계와, 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.As shown in FIG. 1, a method for manufacturing a high-temperature low-friction multi-component thin film to which vanadium is added according to an embodiment of the present invention includes (a) laminating an adhesion coating layer containing a Cr component on the surface of a target base material, and (b) laminating an intermediate coating layer including a Cr component and an Al component on the adhesion coating layer, but having a number of elements equal to or greater than the number of constituent elements constituting the adhesion coating layer, and including a Cr component, an Al component, and a V component on the intermediate coating layer, and (c) laminating a final coating layer having a number of constituent elements greater than or equal to the number of constituent elements constituting the coating layer.

본 발명에서는 이와 같은 각 단계를 수행하는 과정에서 아크 이온 플레이팅 방식을 이용하며, 선형 이온원의 협조를 바탕으로 코팅막을 합성시킨다. 이때 본 발명은 기존 상온에서의 마찰 특성보다 고온 상태에서 더 낮은 마찰계수를 가지는 특성을 가진 다성분계 코팅막을 형성시킴으로서, 고온 및 고속 마찰 상태를 지속적으로 유지하게 되는 부품, 제품 등에 적용시켜 그 특성 및 수명을 향상시키도록 한다.In the present invention, an arc ion plating method is used in the process of performing each of these steps, and a coating film is synthesized based on the cooperation of a linear ion source. At this time, the present invention forms a multi-component coating film having a lower friction coefficient at high temperature than the conventional frictional property at room temperature, so that it is applied to parts, products, etc.

그리고 도 2는 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 구성을 나타낸 도면이다.2 is a view showing the configuration of a high-temperature low-friction property multi-component thin film to which vanadium is added according to an embodiment of the present invention.

도 2에 도시된 바와 같이, 전술한 (a)단계 내지 (c)단계를 거쳐 제조된 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막은, 밀착 코팅층(100), 중간 코팅층(200) 및 최종 코팅층(300)을 포함한다.As shown in FIG. 2, the high-temperature low-friction property multi-component thin film to which vanadium is added according to an embodiment of the present invention prepared through the above-described steps (a) to (c) includes an adhesion coating layer 100, an intermediate coating layer 200, and a final coating layer 300.

이와 같은 도 2와 도 1을 함께 참조하면, 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막은 (a)단계에 의해 대상 모재(10)의 표면에, Cr 성분을 포함하는 밀착 코팅층(100)이 적층된다.Referring to FIG. 2 and FIG. 1 together, the high-temperature, low-friction property multi-component thin film to which vanadium is added according to the present invention has an adhesion coating layer 100 containing Cr on the surface of the target base material 10 by step (a). Is laminated.

이때 (a)단계는, 이와 같은 밀착 코팅층(100)을 복수 개 적층하되, 하부에 위치된 밀착 코팅층(100)에서 상부에 위치된 밀착 코팅층(100)으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행할 수 있다.At this time, in step (a), a plurality of such adhesion coating layers 100 are laminated, but the number of constituent elements increases from the adhesion coating layer 100 located at the bottom to the adhesion coating layer 100 located at the top. Lamination can be performed.

이에 따라 복수 개의 밀착 코팅층(100)은 하부에 위치된 밀착 코팅층(100)에서 상부에 위치된 밀착 코팅층(100)으로 갈수록 구성 원소의 개수가 많아지도록 형성된다.Accordingly, the plurality of adhesion coating layers 100 are formed such that the number of constituent elements increases from the adhesion coating layer 100 located at the bottom to the adhesion coating layer 100 located at the top.

그리고 본 실시예에서 복수 개의 밀착 코팅층(100)은, 단일 Cr 성분으로 이루어지는 제1밀착 코팅층(110)과, CrN 성분으로 이루어지는 제2밀착 코팅층(120)으로 구성될 수 있다. 즉 제2밀착 코팅층(120)은 제1밀착 코팅층(110)보다 구성 원소가 많으며, 이와 같은 밀착 코팅층(100)은 후술할 중간 코팅층(200) 및 최종 코팅층(300)이 대상 모재(10)에 보다 안정적으로 증착되도록 밀착성을 증가시키는 역할을 수행한다.In this embodiment, the plurality of adhesion coating layers 100 may be composed of a first adhesion coating layer 110 made of a single Cr component and a second adhesion coating layer 120 made of a CrN component. That is, the second adhesion coating layer 120 has more constituent elements than the first adhesion coating layer 110, and such an adhesion coating layer 100 serves to increase adhesion so that the intermediate coating layer 200 and the final coating layer 300, which will be described later, are more stably deposited on the target base material 10.

다음으로, 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막은 (b)단계에 의해 밀착 코팅층(100) 상에 Cr 성분 및 Al 성분을 포함하되, 밀착 코팅층(110)을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층(200)이 적층된다.Next, in the high-temperature, low-friction property multi-component thin film to which vanadium is added according to the present invention, an intermediate coating layer 200 having a number of constituent elements including a Cr component and an Al component constituting the adhesion coating layer 110 or more is laminated on the adhesion coating layer 100 in step (b).

이때 (b)단계는, 이와 같은 중간 코팅층(200)을 복수 개 적층하되, 하부에 위치된 중간 코팅층(200)에서 상부에 위치된 중간 코팅층(200)으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행할 수 있다.At this time, in step (b), a plurality of such intermediate coating layers 200 are laminated, but the number of constituent elements increases from the lower intermediate coating layer 200 to the upper intermediate coating layer 200. Lamination can be performed.

이에 따라 복수 개의 중간 코팅층(200)은 하부에 위치된 중간 코팅층(100)에서 상부에 위치된 중간 코팅층(200)으로 갈수록 구성 원소의 개수가 많아지도록 형성된다.Accordingly, the plurality of intermediate coating layers 200 are formed such that the number of constituent elements increases from the lower intermediate coating layer 100 to the upper intermediate coating layer 200 .

그리고 본 실시예에서 복수 개의 중간 코팅층(200)은, CrAlN 성분으로 이루어지는 제1중간 코팅층(210)과, CrAlSiN 성분으로 이루어지는 제2중간 코팅층(220)으로 구성된다. 즉 제2중간 코팅층(220)은 제1중간 코팅층(210)보다 구성 원소가 많다.And, in this embodiment, the plurality of intermediate coating layers 200 are composed of a first intermediate coating layer 210 made of a CrAlN component and a second intermediate coating layer 220 made of a CrAlSiN component. That is, the second intermediate coating layer 220 has more constituent elements than the first intermediate coating layer 210 .

또한 제1중간 코팅층(210)은 제2밀착 코팅층(120)보다 구성 원소가 많게 형성되어, 중간 코팅층(200) 전체는 밀착 코팅층(100)보다 많은 구성 원소를 가지게 된다.In addition, the first intermediate coating layer 210 is formed with more constituent elements than the second adhesion coating layer 120, so that the entire intermediate coating layer 200 has more constituent elements than the adhesion coating layer 100.

다음으로, 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막은 (c)단계에 의해 중간 코팅층(200) 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 중간 코팅층(200)을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층(300)이 적층된다.Next, in the high-temperature, low-friction multi-component thin film to which vanadium is added according to the present invention, a final coating layer 300 having a number of elements equal to or greater than the number of elements constituting the intermediate coating layer 200, including Cr, Al, and V, is laminated on the intermediate coating layer 200 in step (c).

최종 코팅층(300) 역시 밀착 코팅층(100) 및 중간 코팅층(200)과 마찬가지로, (c)단계에서 최종 코팅층(300)을 복수 개 적층하되, 하부에 위치된 최종 코팅층(300)에서 상부에 위치된 최종 코팅층(300)으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행하게 된다.Like the adhesion coating layer 100 and the intermediate coating layer 200, the final coating layer 300 also laminates a plurality of final coating layers 300 in step (c), but from the lower final coating layer 300 to the upper final coating layer 300. Lamination is performed so that the number of constituent elements increases.

그리고 본 실시예에서 복수 개의 최종 코팅층(300)은, CrAlVN 성분으로 이루어지는 제1최종 코팅층(310)과, CrAlVSiN 성분으로 이루어지는 제2최종 코팅층(320)으로 구성된다. 즉 최종 코팅층(300)은 바나듐(V) 성분을 더 포함하는 특징을 가지며, 이때 제2최종 코팅층(320)은 제1최종 코팅층(310)보다 구성 원소가 많다.And, in this embodiment, the plurality of final coating layers 300 are composed of a first final coating layer 310 made of a CrAlVN component and a second final coating layer 320 made of a CrAlVSiN component. That is, the final coating layer 300 has a feature of further including a vanadium (V) component, and in this case, the second final coating layer 320 has more constituent elements than the first final coating layer 310 .

또한 제1최종 코팅층(310)은 제2중간 코팅층(320)보다 구성 원소가 많게 형성되어, 최종 코팅층(300) 전체는 중간 코팅층(200)보다 많은 구성 원소를 가지게 된다.In addition, the first final coating layer 310 is formed with more constituent elements than the second intermediate coating layer 320, so that the entire final coating layer 300 has more constituent elements than the intermediate coating layer 200.

이상과 같이, 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 전체는 한 가지~두 가지 구성 원소가 혼합된 밀착층(100), 세 가지~네 가지 구성 원소가 혼합된 중간 코팅층(200), 네 가지~다섯 가지의 구성 원소가 합성된 최종 코팅층(300)으로 구분될 수 있으며, 각 코팅층들은 증착 시 확산 반응을 통하여 계면 간의 구분없이 연속적으로 이루어질 수 있다.As described above, the entire multicomponent thin film with high temperature and low friction characteristics to which vanadium is added according to the present invention can be divided into an adhesion layer 100 in which one or two constituent elements are mixed, an intermediate coating layer 200 in which three to four constituent elements are mixed, and a final coating layer 300 in which four to five constituent elements are synthesized, and each coating layer can be continuously formed without distinction between interfaces through a diffusion reaction during deposition.

이때 각 코팅층의 성분에 따라 FE-SEM으로 단면 관찰 시 계면 관찰은 가능하나 결함은 관찰되지 않는다.At this time, depending on the components of each coating layer, when observing the cross section with FE-SEM, it is possible to observe the interface, but no defects are observed.

그리고 이하 첨부한 표 1 및 표 2는, 바나듐이 첨가된 다성분계 박막의 합성 공정 조건을 나타낸다.In addition, Table 1 and Table 2 attached below show synthesis process conditions of the multi-component thin film to which vanadium is added.

각 표에 나타난 바와 같이, 본 발명에 의해 형성된 다성분계 코팅막은 바나듐(V)의 함량이 전체 박막의 0~25at.% 범위에 있으며, 크롬(Cr)의 함량이 20~40at.%, 나머지 성분들이 적절히 분포된다. 본 실시예서는 박막의 구성 성분 중, Cr의 함량이 가장 높은 분포를 가지는 것으로 한다.As shown in each table, the multicomponent coating film formed by the present invention has a vanadium (V) content in the range of 0 to 25 at.% of the entire thin film, a chromium (Cr) content of 20 to 40 at.%, and the remaining components are properly distributed. In this embodiment, it is assumed that the content of Cr among the components of the thin film has the highest distribution.

또한 박막의 합성은 아크 캐소드 소스와 이온 소스를 복합하여 사용할 수 있다. 이는 아크 이온 플레이팅 공정에 의하여 발생된 이온들과 대형 입자들을 이온 소스를 이용하여 플라즈마의 밀도를 높이는 역할을 함으로써 박막의 합성 및 특성을 향상시키 위한 것이다.In addition, the synthesis of the thin film may be used in combination with an arc cathode source and an ion source. This is to improve the synthesis and properties of the thin film by increasing the density of plasma using ions and large particles generated by the arc ion plating process as an ion source.

그리고 아크 이온 플레이팅 장치에서는 Cr, Al, Si, V 타겟을 사용하고, N2, Ar 가스를 유입시켜 공정을 진행할 수 있다. 각각의 타겟은 단일 타겟일 수도 있고, 2개 이상의 물질이 섞여 있는 혼합물 타겟일 수도 있다.Further, in the arc ion plating apparatus, the process may be performed by using Cr, Al, Si, and V targets and introducing N 2 and Ar gas. Each target may be a single target or a mixture target in which two or more materials are mixed.

타겟에 인가되는 전류는 50~120A의 범위에서 진행되며, 챔버 내부 공정 진공도는 8x10-3~2x10-3torr 범위이다. 초기 진공도는 8~3x10-5torr 범위까지 설정한다.The current applied to the target proceeds in the range of 50 to 120 A, and the process vacuum inside the chamber is in the range of 8x10 -3 to 2x10 -3 torr. The initial degree of vacuum is set to the range of 8 to 3x10 -5 torr.

이온 소스는 Ar 가스를 소스 바디 내부로 유입시키게 될 경우 자기장과 전기장의 영향으로 챔버 내부로 이온빔을 분사하게 되고, 이와 같이 분사된 이온빔이 매크로 파티클 및 이온들과 재충돌하여 플라즈마 전체 밀도를 높이는 결과를 가져오게 된다. 이때 이온빔에 인가되는 전압은 1,000~2,100V 범위일 수 있다.When the ion source introduces Ar gas into the source body, an ion beam is injected into the chamber under the influence of a magnetic field and an electric field, and the injected ion beam re-collides with macro particles and ions, resulting in an increase in the overall density of the plasma. At this time, the voltage applied to the ion beam may be in the range of 1,000 to 2,100V.

합성된 코팅막은 상온에서 보다 고온(700℃이상)에서 더욱 낮은 마찰계수를 나타내고, 30GPa 이상의 표면경도를 가지게 된다.The synthesized coating film exhibits a lower coefficient of friction at a high temperature (700 ° C. or more) than at room temperature, and has a surface hardness of 30 GPa or more.

보다 구체적으로 본 발명의 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 제조 공정에 대해 설명하면 다음과 같다.More specifically, the manufacturing process of the high-temperature, low-friction multi-component thin film to which vanadium is added according to the present invention will be described.

먼저, 대상 모재(10)를 아세톤 및 IPA 용액에 세척한 뒤, 이를 챔버에 장입하여 이온 소스를 이용하여 플라즈마 에칭 공정을 거치게 된다. 플라즈마 에칭 공정은 표면 상태를 여기시켜 밀착력을 향상시키는 효과를 주게 된다.First, after washing the target base material 10 in acetone and IPA solution, it is loaded into a chamber and subjected to a plasma etching process using an ion source. The plasma etching process excites the surface state to give an effect of improving adhesion.

이어서 같은 챔버에서 Cr, CrN의 밀착 코팅층(100), 그리고 CrAlN, CrAlSiN 성분으로 중간 코팅층(200)을 형성한다. 이러한 중간 코팅층(200)은 아크 이온 플레이팅 방식을 이용하여 진행하며, 아크 캐소드(Arc Cathode) 중 Cr, Cr4Si, 그리고 CrAl2에 60~90A의 전류를 가하여 5~8x10-3torr의 진공도에서 증착을 수행한다. 이때 공정온도는 200~300℃에서, 약 30분에서 1시간 정도 진행하게 되며, 바이어스 전압(Bias Voltage)은 -100V로 설정한다.Then, in the same chamber, an adhesion coating layer 100 of Cr and CrN and an intermediate coating layer 200 of CrAlN and CrAlSiN are formed. The intermediate coating layer 200 is performed using an arc ion plating method, and a current of 60 to 90 A is applied to Cr, Cr 4 Si, and CrAl 2 of an arc cathode to perform deposition at a vacuum of 5 to 8x10 -3 torr. At this time, the process temperature is at 200 ~ 300 ℃, about 30 minutes to 1 hour, and the bias voltage (Bias Voltage) is set to -100V.

이후 최종 코팅층(300)으로, 바나듐이 포함된 다성분계 코팅막을 증착하게 된다. 최종 코팅층(300)은 Cr(20~40at.%)을 바탕으로 하고, 바나듐이 첨가되어 있는 조건(2~11at.%)으로 합성된다. 이와 같은 최종 코팅층(300)은 Cr-Al-V-N, 그리고 Cr-Al-V-Si-N 으로 구성된다.Then, as the final coating layer 300, a multi-component coating film containing vanadium is deposited. The final coating layer 300 is based on Cr (20 to 40 at.%) and is synthesized under the condition that vanadium is added (2 to 11 at.%). Such a final coating layer 300 is composed of Cr-Al-V-N and Cr-Al-V-Si-N.

최종 코팅층(300)을 형성하는 과정에서 캐소드는 CrAl2, Cr4Si, V과 같은 물질과 합성 물질을 이용하며, 각 캐소드에는 공정 시 60~90A의 전류값이 인가된다.In the process of forming the final coating layer 300, the cathode uses materials such as CrAl 2 , Cr 4 Si, and V, and synthetic materials, and a current value of 60 to 90 A is applied to each cathode during the process.

이때 바이어스 전압은 -100V를 유지하고, 공정 진공도는 5~8x10-3torr로 유지되고, 챔버 분위기 온도는 350~450℃를 유지한다. 또한 공정 가스는 Ar과 N2를 사용하며 조건 별로 각각 300~400sccm을 유입시킬 수 있다.At this time, the bias voltage is maintained at -100V, the process vacuum is maintained at 5 to 8x10 -3 torr, and the chamber atmosphere temperature is maintained at 350 to 450 °C. In addition, Ar and N 2 are used as process gases, and 300 to 400 sccm can be introduced for each condition.

이러한 조건으로 증착시킨 CrAlVN의 최종 코팅층(300)은 바나듐 타겟 전류 인가에 따라, 두께 0.5~1.0㎛, 경도 27~32GPa, 탄성계수 450~490의 값을 갖는다. 또한 CrAlVSiN의 최종 코팅층(300)은 두께 1.0~1.5㎛, 경도 32~39GPa, 탄성계수 460~520의 값을 갖는다.The final coating layer 300 of CrAlVN deposited under these conditions has a thickness of 0.5 to 1.0 μm, a hardness of 27 to 32 GPa, and a modulus of elasticity of 450 to 490 according to the application of a vanadium target current. In addition, the final coating layer 300 of CrAlVSiN has a thickness of 1.0 to 1.5 μm, a hardness of 32 to 39 GPa, and a modulus of elasticity of 460 to 520.

도 3은 본 발명의 일 실시예에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막의 특성 분석 결과를 나타낸 도면이다.3 is a view showing the results of characterization of a high-temperature, low-friction multi-component thin film to which vanadium is added according to an embodiment of the present invention.

도 3에 나타난 특성 분석을 위해, 마찰 계수와 관련해서 볼 온 디스크 형식(Ball-On-Disk Type)의 마모시험기를 사용하였다.For the characteristic analysis shown in FIG. 3, a ball-on-disk type wear tester was used in relation to the friction coefficient.

볼 온 디스크 형식의 마모시험기는 상대재에 Al2O3 성분의 볼을 장착하고, 본 발명의 다성분계 박막이 적용된 원판 디스크 형태로 되어있는 샘플을 준비한다. 이후 회전속도, 거리, 선형속도, 시간 등을 셋팅하고 분석을 진행한다.The ball-on-disc type wear tester mounts a ball of Al 2 O 3 component to the counter material, and prepares a sample in the form of a disc to which the multi-component thin film of the present invention is applied. Then, set the rotational speed, distance, linear speed, time, etc. and proceed with the analysis.

결과적으로, 본 발명의 다성분계 박막은 일반적인 상온 상태에서 0.5~0.7 정도의 마찰계수를 나타낸다.As a result, the multi-component thin film of the present invention exhibits a friction coefficient of about 0.5 to 0.7 in a normal room temperature state.

또한 고온 상태에서의 마찰계수는 700℃까지 챔버를 가열시킨 후, 디스크를 회전시켜서 측정한다. 나머지 조건은 상온에서의 테스트와 동일하게 진행한다.In addition, the coefficient of friction in the high temperature state is measured by rotating the disk after heating the chamber to 700 ℃. The rest of the conditions are the same as the test at room temperature.

테스트 결과, CrAlVN 과 CrAlVSiN의 최종 코팅층(300)의 경우, 바나듐의 함량에 따라 0.3~0.6 정도의 마찰계수를 나타냄을 확인할 수 있었으며, 상온보다 고온에서 더 낮은 마찰계수를 나타내는 것을 알 수 있다.As a result of the test, it was confirmed that the final coating layer 300 of CrAlVN and CrAlVSiN exhibited a friction coefficient of about 0.3 to 0.6 depending on the content of vanadium, and showed a lower friction coefficient at a high temperature than at room temperature. It can be seen.

이상과 같이 본 발명에 따른 바람직한 실시예를 살펴보았으며, 앞서 설명된 실시예 이외에도 본 발명이 그 취지나 범주에서 벗어남이 없이 다른 특정 형태로 구체화될 수 있다는 사실은 해당 기술에 통상의 지식을 가진 이들에게는 자명한 것이다. 그러므로, 상술된 실시예는 제한적인 것이 아니라 예시적인 것으로 여겨져야 하고, 이에 따라 본 발명은 상술한 설명에 한정되지 않고 첨부된 청구항의 범주 및 그 동등 범위 내에서 변경될 수도 있다.As described above, the preferred embodiments according to the present invention have been reviewed, and the fact that the present invention can be embodied in other specific forms in addition to the above-described embodiments without departing from the spirit or scope is common knowledge in the art. It is obvious to those who have. Therefore, the embodiments described above are to be regarded as illustrative rather than restrictive, and thus the present invention is not limited to the above description, but may vary within the scope of the appended claims and their equivalents.

10: 대상 모재
100: 밀착 코팅층
110: 제1밀착 코팅층
120: 제2밀착 코팅층
200: 중간 코팅층
210: 제1중간 코팅층
220: 제2중간 코팅층
300: 최종 코팅층
310: 제1최종 코팅층
320: 제2최종 코팅층
10: target base material
100: adhesion coating layer
110: first adhesion coating layer
120: second adhesion coating layer
200: intermediate coating layer
210: first intermediate coating layer
220: second intermediate coating layer
300: final coating layer
310: first final coating layer
320: second final coating layer

Claims (11)

대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계;
상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계; 및
상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계;
를 포함하며,
상기 (b)단계는,
상기 중간 코팅층을 복수 개 적층하되, 하부에 위치된 중간 코팅층에서 상부에 위치된 중간 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행하는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법.
(a) step of laminating an adhesion coating layer containing a Cr component on the surface of the target base material;
(b) laminating an intermediate coating layer on the adhesion coating layer, including a Cr component and an Al component, and having a number of elements equal to or greater than the number of elements constituting the adhesion coating layer; and
(c) laminating a final coating layer on the intermediate coating layer, including a Cr component, an Al component, and a V component, but having a number of constituent elements greater than or equal to the number of constituent elements constituting the intermediate coating layer;
Including,
In step (b),
A plurality of the intermediate coating layers are laminated, but the lamination is performed so that the number of constituent elements increases from the intermediate coating layer located at the bottom to the intermediate coating layer located at the top.
Manufacturing method of high-temperature, low-friction multi-component thin film with vanadium added.
제1항에 있어서,
상기 (a)단계는,
상기 밀착 코팅층을 복수 개 적층하되, 하부에 위치된 밀착 코팅층에서 상부에 위치된 밀착 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행하는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법.
According to claim 1,
In step (a),
A plurality of the adhesion coating layers are laminated, but the lamination is performed so that the number of constituent elements increases from the adhesion coating layer located at the bottom to the adhesion coating layer located at the top.
Manufacturing method of high-temperature, low-friction multi-component thin film with vanadium added.
삭제delete 제1항에 있어서,
상기 (c)단계는,
상기 최종 코팅층을 복수 개 적층하되, 하부에 위치된 최종 코팅층에서 상부에 위치된 최종 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 적층을 수행하는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법.
According to claim 1,
In step (c),
A plurality of the final coating layers are laminated, but the lamination is performed so that the number of constituent elements increases from the final coating layer located at the bottom to the final coating layer located at the top.
Manufacturing method of high-temperature, low-friction multi-component thin film with vanadium added.
대상 모재의 표면에 적층되며, Cr 성분을 포함하는 밀착 코팅층;
상기 밀착 코팅층 상에 적층되며, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층; 및
상기 중간 코팅층 상에 적층되며, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층;
을 포함하며,
상기 중간 코팅층은 복수 개가 구비되되, 하부에 위치된 중간 코팅층에서 상부에 위치된 중간 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
It is laminated on the surface of the target base material, the adhesion coating layer containing a Cr component;
an intermediate coating layer laminated on the adhesion coating layer, including a Cr component and an Al component, and having a number of constituent elements greater than or equal to the number of constituent elements constituting the adhesion coating layer; and
a final coating layer laminated on the intermediate coating layer, including a Cr component, an Al component, and a V component, and having a number of constituent elements greater than or equal to the number of constituent elements constituting the intermediate coating layer;
Including,
The intermediate coating layer is provided with a plurality, but the number of constituent elements increases from the intermediate coating layer located at the bottom to the intermediate coating layer located at the top,
High-temperature low-friction multi-component thin film with vanadium added.
제5항에 있어서,
상기 밀착 코팅층은 복수 개가 구비되되, 하부에 위치된 밀착 코팅층에서 상부에 위치된 밀착 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
According to claim 5,
The adhesion coating layer is provided with a plurality of pieces, and the number of constituent elements increases from the adhesion coating layer located at the bottom to the adhesion coating layer located at the top.
High-temperature low-friction multi-component thin film with vanadium added.
제6항에 있어서,
상기 복수 개의 밀착 코팅층은,
단일 Cr 성분으로 이루어지는 제1밀착 코팅층; 및
CrN 성분으로 이루어지는 제2밀착 코팅층;
으로 구성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
According to claim 6,
The plurality of adhesion coating layers,
a first adhesion coating layer made of a single Cr component; and
a second adhesion coating layer made of a CrN component;
consisting of,
High-temperature low-friction multi-component thin film with vanadium added.
삭제delete 제5항에 있어서,
상기 복수 개의 중간 코팅층은,
CrAlN 성분으로 이루어지는 제1중간 코팅층; 및
CrAlSiN 성분으로 이루어지는 제2중간 코팅층;
으로 구성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
According to claim 5,
The plurality of intermediate coating layers,
A first intermediate coating layer made of a CrAlN component; and
A second intermediate coating layer made of a CrAlSiN component;
consisting of,
High-temperature low-friction multi-component thin film with vanadium added.
제5항에 있어서,
상기 최종 코팅층은 복수 개가 구비되되, 하부에 위치된 최종 코팅층에서 상부에 위치된 최종 코팅층으로 갈수록 구성 원소의 개수가 많아지도록 형성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
According to claim 5,
The final coating layer is provided with a plurality of pieces, and the number of constituent elements increases from the final coating layer located at the bottom to the final coating layer located at the top.
High-temperature low-friction multi-component thin film with vanadium added.
제10항에 있어서,
상기 복수 개의 최종 코팅층은,
CrAlVN 성분으로 이루어지는 제1최종 코팅층; 및
CrAlVSiN 성분으로 이루어지는 제2최종 코팅층;
으로 구성되는,
바나듐이 첨가된 고온 저마찰 특성 다성분계 박막.
According to claim 10,
The plurality of final coating layers,
A first final coating layer made of a CrAlVN component; and
A second final coating layer made of CrAlVSiN component;
consisting of,
High-temperature low-friction multi-component thin film with vanadium added.
KR1020210095683A 2021-07-21 2021-07-21 High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method KR102559972B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020210095683A KR102559972B1 (en) 2021-07-21 2021-07-21 High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020210095683A KR102559972B1 (en) 2021-07-21 2021-07-21 High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method

Publications (2)

Publication Number Publication Date
KR20230014396A KR20230014396A (en) 2023-01-30
KR102559972B1 true KR102559972B1 (en) 2023-07-27

Family

ID=85106289

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210095683A KR102559972B1 (en) 2021-07-21 2021-07-21 High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method

Country Status (1)

Country Link
KR (1) KR102559972B1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108396292A (en) * 2018-03-12 2018-08-14 中国科学院力学研究所 A kind of die casting composite coating and preparation method thereof
CN108950480A (en) 2018-08-22 2018-12-07 中国科学院力学研究所 It a kind of high-ductility abrasion-proof composite coating and is deposited onto heat and makees method in convex mold
CN112708859A (en) 2020-12-21 2021-04-27 华南理工大学 Tool with anti-friction and anti-wear CrAlVN coating and preparation method thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1972699A1 (en) 2007-03-20 2008-09-24 ArcelorMittal France Method of coating a substrate under vacuum
KR102145948B1 (en) * 2018-11-30 2020-08-21 한국생산기술연구원 Deposition Method of Super Coating Flim Having High-Adhesion and High-Hardness

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108396292A (en) * 2018-03-12 2018-08-14 中国科学院力学研究所 A kind of die casting composite coating and preparation method thereof
CN108950480A (en) 2018-08-22 2018-12-07 中国科学院力学研究所 It a kind of high-ductility abrasion-proof composite coating and is deposited onto heat and makees method in convex mold
CN112708859A (en) 2020-12-21 2021-04-27 华南理工大学 Tool with anti-friction and anti-wear CrAlVN coating and preparation method thereof

Also Published As

Publication number Publication date
KR20230014396A (en) 2023-01-30

Similar Documents

Publication Publication Date Title
Neuville et al. A perspective on the optimisation of hard carbon and related coatings for engineering applications
Monaghan et al. Deposition of wear resistant coatings based on diamond like carbon by unbalanced magnetron sputtering
US8808858B2 (en) Diamondlike carbon hard multilayer film formed body and method for producing the same
EP1884978B1 (en) Process for the coating of substrates with diamond-like carbon layers
JP5393108B2 (en) Manufacturing method of hard multilayer film molded body
Drábik et al. Influence of substrate material and its plasma pretreatment on adhesion and properties of WC/aC: H nanocomposite coatings deposited at low temperature
Kabir et al. Designing multilayer diamond like carbon coatings for improved mechanical properties
Hovsepian et al. Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology
Mesquita et al. Tool steel coatings based on niobium carbide and carbonitride compounds
Ming'e et al. Morphology and mechanical properties of TiN coatings prepared with different PVD methods
Miletić et al. Influence of substrate roughness on adhesion of TiN coatings
JP2003171758A (en) Diamondlike carbon hard multilayer film formed body, and production method therefor
CN100362133C (en) Hard antiwear protecting film and its prepn
Weber et al. Influence of different interlayers and bias voltage on the properties of aC: H and aC: H: Me coatings prepared by reactive dc magnetron sputtering
KR102559972B1 (en) High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method
JP5145051B2 (en) Hard film covering member and method for manufacturing the same
Kuruppu et al. Monolithic and multilayer Cr/CrN, Cr/Cr 2 N, and Cr 2 N/CrN coatings on hard and soft substrates
Cooke et al. Multilayer nitride coatings by closed field unbalanced magnetron sputter ion plating
Petkov et al. Influence of Bias Voltage and CH 4/N 2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method
KR102240344B1 (en) Dlc coating with an abradable layer
JP4452641B2 (en) Sliding member
Guzman et al. Hard coating adhesion on ion implanted polymer surfaces
Knotek et al. Behaviour of CVD and PVD coatings under impact load
Lin et al. Effect of nitrogen content on mechanical properties and tribological behaviors of hydrogenated amorphous carbon films prepared by ion beam assisted chemical vapor deposition
Dejun et al. Interfacial bonding mechanism and bonding strength of AlTiCrN coating by cathodic arc ion plating

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right