KR102550897B1 - Flow type reaction device - Google Patents

Abstract

A flow-type reaction device for continuously reacting two or more kinds of raw materials, with the object of providing a flow-type reaction device capable of maintaining reaction efficiency and productivity sufficient for practical use for a long time, and further miniaturizing and reducing the cost of the reaction equipment ( As 1), a mixing unit 10 for mixing two or more types of raw materials, and a reaction unit 20 formed on the secondary side of the mixing unit 10 and reacting the raw materials to obtain a product, mixing The section 10 has a mixer 13 for mixing two or more kinds of raw materials, and two or more supply paths L11 and L12 for supplying each raw material to the mixer 13, and a supply path to the mixer 13 While (L11, L12) are respectively connected, the supply path L11 moves the fluid from the mixer 13 to the supply path L11 in the vicinity of the connection portion between the supply path L11 and the mixer 13. A flow type reaction device (1) having a restraining mechanism for restraining is provided.

Description

Flow type reaction device

The present invention relates to a flow type reaction device. This application claims priority based on Japanese Patent Application No. 2017-233618 for which it applied to Japan on December 5, 2017, and uses the content here.

A flow-type reaction apparatus that continuously supplies raw materials to a reaction field and continuously chemically reacts them has attracted attention. Compared to so-called batch-type reaction devices, the flow-type reaction device has advantages such as being able to produce a target material with high production efficiency and artificially controlling chemical reactions so that the reaction equipment is compact and safe.

However, the flow-type reactor has a problem in that the supply pipe for supplying raw materials to the reaction site is easily clogged with solids or the like generated as a by-product in a chemical reaction. Accordingly, Patent Literatures 1 to 3 disclose techniques for coping with the obstruction.

Japanese Unexamined Patent Publication No. 2012-228666 Japanese Unexamined Patent Publication No. 2004-344877 Japanese Unexamined Patent Publication No. 2006-181525

However, in the devices described in Patent Literatures 1 to 3, when a sudden pressure fluctuation or the like occurs in the reaction field due to the progress of a chemical reaction, liquid backflow frequently occurs in the device. Owing to this reverse flow, liquid adheres to the supply piping and precipitation of solids occurs, resulting in a problem of obstruction of the supply piping.

For this reason, in the apparatuses disclosed in Patent Literatures 1 to 3, when the apparatus is operated for a long time, blockage of supply piping or the like due to reverse flow occurs, making it impossible to supply raw materials to the reaction field. Therefore, in the devices described in Patent Literatures 1 to 3, the reaction efficiency decreases with the progress of the chemical reaction, and sufficient operation time and high productivity for practical use cannot be secured. In addition, due to the decrease in reaction efficiency, unreacted raw materials are mixed into the final product, and quality such as purity of the target material is lowered.

In addition, since the apparatus described in Patent Literature 1 has an essential configuration of an ultrasonic vibrator or the like that applies ultrasonic vibration to a supply pipe, it is not suitable for miniaturization and cost reduction of reaction equipment.

The present invention has been made in view of the above circumstances, and an object thereof is to provide a flow-type reactor capable of maintaining reaction efficiency and productivity sufficient for practical use for a long period of time, and further reducing the size and cost of reaction equipment.

In order to solve the above problems, the present invention provides the following flow type reaction apparatus.

[1] A flow-type reactor for continuously reacting two or more kinds of raw materials, a mixing section for mixing two or more kinds of raw materials, and formed on the secondary side of the mixing section, and reacting the raw materials to produce a product A reaction unit for obtaining, wherein the mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer, and the supply pipes are respectively connected to the mixer; In addition, at least one of the supply piping has a restraining mechanism for suppressing movement of the fluid from the mixer to the supply piping in the vicinity of a connection portion between the supply piping and the mixer.

[2] A flow-type reactor for continuously reacting two or more kinds of raw materials, a mixing section for mixing two or more kinds of raw materials, and formed on the secondary side of the mixing section, and reacting the raw materials to produce a product The mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer, and the supply pipes are connected to the mixer, respectively. , A flow type reaction device in which at least one of the supply pipes is connected to the mixer from above with respect to a plane on which the mixer is installed.

[3] A flow-type reactor for continuously reacting two or more kinds of raw materials, a mixing section for mixing two or more kinds of raw materials, and formed on the secondary side of the mixing section, and reacting the raw materials to produce a product A reaction unit for obtaining, wherein the mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer, and the supply pipes are connected to the mixer, respectively, At least one of the supply piping has a restraining mechanism for suppressing the movement of the fluid from the mixer to the supply piping near a connection portion between the supply piping and the mixer, and at least one of the supply piping, A flow type reaction device connected to the mixer from above with respect to a plane on which the mixer is installed.

[4] The flow-type reactor according to any one of [1] to [3], wherein the two or more of the raw materials are a combination of one or more gaseous raw materials and one or more liquid raw materials.

[5] The two or more kinds of the raw materials are a combination of one or more kinds of gas raw materials and one or more kinds of liquid raw materials, and at least one of the supply piping for supplying the gas raw materials to the mixer is disposed relative to the plane on which the mixer is installed. While connected to the mixer from above, at least one of the supply piping for supplying the liquid raw material to the mixer is connected to the mixer in parallel with respect to the plane on which the mixer is installed Flow type of [2] or [3] reaction device.

[6] The flow type reaction device according to any one of [1] to [5], further comprising a separator formed on a secondary side of the reaction unit and separating a target substance from the product.

According to the flow-type reactor of the present invention, reaction efficiency and productivity sufficient for practical use can be maintained for a long time, and reaction equipment can be miniaturized and reduced in cost.

1 is a system diagram schematically showing an example of the configuration of a flow type reaction device according to a first embodiment to which the present invention is applied.
Fig. 2 is a cross-sectional view in the direction of an xy plane showing a mixer included in the flow-type reaction device according to the first embodiment.
Fig. 3 is a system diagram schematically showing an example of the configuration of a flow type reaction device according to a second or third embodiment to which the present invention is applied.
Fig. 4 is a cross-sectional view in the xz plane direction showing a mixer included in the flow-type reaction device according to the second embodiment.
Fig. 5 is a cross-sectional view in the xz plane direction showing a mixer included in the flow type reaction device according to the third embodiment.
Fig. 6 is a diagram showing the change with time in the supply amount of the gas raw material in Example 1;
Fig. 7 is a diagram showing the change with time in the supply amount of the gas raw material in Example 2;
Fig. 8 is a diagram showing the change over time in the supply amount of the gas raw material in Example 3;
Fig. 9 is a graph showing the change over time in the supply amount of the gas raw material in Comparative Example 1;

EMBODIMENT OF THE INVENTION Hereinafter, the flow type reaction apparatus of embodiment concerning this invention is demonstrated in detail, referring drawings. On the other hand, in the drawings used in the following description, in order to make the characteristics easier to understand, there are cases where characteristic parts are enlarged and shown for convenience, and the size ratio of each component is not limited to the same as the actual one.

<First Embodiment>

First, the configuration of the flow type reaction device 1 according to the first embodiment, which is an embodiment to which the present invention is applied, will be described.

1 is a system diagram schematically showing an example of the configuration of a flow type reaction device 1. In Fig. 1, the vertical direction is the z-axis direction. As shown in FIG. 1, the flow type reaction device 1 includes a mixing section 10 for mixing two or more types of raw materials, and a reaction section 20 in which the raw materials mixed in the mixing section 10 react. , It is provided with a separation unit 30 that separates the target material from the product generated in the reaction unit 20.

Each component of the flow type reaction device 1 will be described in detail below.

The configuration of the mixing unit 10 is not particularly limited as long as two or more kinds of raw materials can be mixed and a mixture containing each raw material can be supplied to the reaction unit 20 . The two or more kinds of raw materials may be a combination of one or more kinds of gas raw materials and one or more kinds of liquid raw materials, a combination of two or more kinds of gas raw materials, or a combination of two or more kinds of liquid raw materials.

Hereinafter, the configuration of the mixing unit 10 will be described taking a case in which two or more raw materials are a combination of one or more gas raw materials and one or more liquid raw materials, and the target material is diborane gas as an example.

The mixing unit 10 includes a supply source 11 of one or more gas raw materials (BF ₃ , BCl ₃ boron trihalide gas, etc.), and one or more liquid raw materials (Ethylene glycol dimethyl containing reducing agents such as NaH and NaBH ₄ ). ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether and other ether-based solvents) supply source 12, gas raw material supply route L11, liquid raw material supply route L12, and two supply routes It has a mixer (mixer) 13 connected to (L11, L12).

A pressure regulating valve 16 and a mass flow controller 17 are formed in the supply path L11 from the primary side (upstream side). A liquid feed pump 18 and a mass flow controller 19 are formed in the supply path L12 from the primary side (upstream side).

The supply path L11 is a path for supplying the gas raw material to the mixer 13. The supply path (L12) is a path for supplying the liquid raw material to the mixer (13).

The material of the piping constituting the supply passages L11 and L12 is not particularly limited as long as it is in a form that is not corroded by the gas raw material or the liquid raw material, and can be appropriately selected according to the properties of each raw material. Examples of the material of the piping include resin piping such as PTFE (polytetrafluoroethylene) and metal piping such as SUS.

The diameter of the piping constituting the supply paths L11 and L12 is not particularly limited, and can be appropriately selected depending on the supply amount of each raw material to the mixer 13. For example, as piping constituting the supply paths L11 and L12, piping having an outer diameter of 6 to 7 (mm) and an inner diameter of 4 to 5 (mm) can be used.

The mixer 13 is installed horizontally on the xy plane shown in FIG. The mixer 13 is not particularly limited as long as it can mix the raw materials (combination of a gas raw material and a liquid raw material) respectively supplied through the two supply paths L11 and L12. As the mixer 13, a mixer or the like is exemplified.

The mixer 13 is connected to the supply path L21 of the reaction part 20 . Thereby, the mixing unit 10 may supply a mixture of each raw material to the reaction unit 20 .

In 1st Embodiment, as a connection part with the mixer 13 of the supply path L11, the primary side part L11A with respect to the mixer 13 is installed horizontally on the xy plane shown in FIG. Similarly, as a connection part of the supply path L12 with the mixer 13, the primary side part L12A with respect to the mixer 13 is installed horizontally on the xy plane shown in FIG. That is, in 1st Embodiment, the primary side part L11A, L12A of the connection part with the mixer 13 of supply path|route L11, L12 is installed horizontally on the same plane as the mixer 13.

2 is a cross-sectional view in the xy plane direction showing the mixer 13 included in the flow type reaction device 1.

The white arrows shown in FIG. 2 show the direction of each raw material flowing through each supply path L11, L12 and the mixture of the raw material flowing through the supply path L21.

As shown in FIG. 2, in 1st Embodiment, the supply path L11 has the diaphragm S in the vicinity of the connection part of the said supply path L11 and the mixer 13.

The diaphragm S is for narrowing at least a part of the gas raw material flow path (raw material flow path) in the piping which comprises the supply path L11. By forming the diaphragm S in the supply path L11A near the connection portion with the mixer 13, a part of the flow path of the gas raw material is narrowed, and a fluid such as liquid flows from the mixer 13 toward the supply path L11. backflow can be prevented. In this way, the diaphragm S is an example of a restraining mechanism that suppresses the movement of the fluid in the mixer 13 from the mixer 13 toward the supply path L11.

The shape of the diaphragm S is not particularly limited as long as it can prevent the reverse flow of the liquid in the mixer 13. The diaphragm S can be appropriately selected according to the properties of the raw material and the internal structure of the piping constituting the supply path L11. As the diaphragm S, an orifice and a T-joint of a rear diameter are exemplified.

In Fig. 2, S1 represents the inner diameter of the pipe constituting the supply path L21, and S2 represents the diameter of the passage where the passage is locally narrowed by the diaphragm S.

In the first embodiment, the diaphragm ratio (S2/S1) is preferably about 0.1 to 0.75. When the diaphragm ratio is equal to or greater than the lower limit, the gas raw material supply pressure is easily stabilized, and each raw material is easily supplied to the mixer 13 continuously. When the diaphragm ratio is equal to or less than the upper limit value, it is easy to suppress the reverse flow of the liquid due to the pressure fluctuation in the reaction section 20, and it becomes easy to prevent clogging of the pipe constituting the supply path L11.

In Fig. 2, S3 represents the length of the diaphragm S in the supply direction of the gas raw material. In the first embodiment, the length S3 of the diaphragm is preferably about 0.1 to 10 mm. When the length S3 of the diaphragm is equal to or greater than the lower limit value, the physical strength of the diaphragm S is easily maintained and damage to the diaphragm S is difficult to occur. When the length S3 of the diaphragm is equal to or less than the upper limit value, clogging of the piping constituting the supply path L11 is less likely to occur, and the reaction efficiency can be easily maintained for a long time.

In Fig. 2, S4 represents the length of the supply path L11 after the diaphragm is released. In the first embodiment, the length S4 after release of the diaphragm on the gas pipe side is preferably 0 to 10 mm. When the length S4 is within the above range, a decrease in synthesis yield is unlikely to occur. The length S4 of the supply path L11A after the diaphragm is released is more preferably 0 mm.

That is, "the supply path L11 has a diaphragm S near the connection portion between the supply path L11 and the mixer 13", the length S4 of the supply path L11A after the diaphragm is released is It means that the supply path L11 has the diaphragm S at the connection part of the said supply path L11 and the mixer 13 so that it may become 0-10 mm.

Each parameter of S1, S2, S3, and S4 described above can be appropriately selected depending on the chemical reaction system to which the flow type reaction apparatus 1 is applied. That is, each of the above parameters can be appropriately selected according to a combination of two or more raw materials.

The mixing unit 10 having the above configuration continuously supplies the gas raw material and the liquid raw material to the mixer 13 and mixes them in the mixer 13 to produce a mixture containing the gas raw material and the liquid raw material in the reaction unit 20 can be supplied continuously. In this way, the mixing unit 10 is an example of an apparatus for mixing two or more types of raw materials continuously supplied.

On the other hand, temperature control means, such as a heater, may be provided in supply path|route L11, L12. Thereby, the temperature of the supply paths L11 and L12 can be adjusted to the temperature suitable for the chemical reaction of the raw material.

The reaction unit 20 is formed on the secondary side of the mixing unit 10. The reaction unit 20 includes a supply path L21 of the mixture of raw materials mixed in the mixing unit 10, a reaction field 21 formed in the supply path L21, a reaction field 21 and a separation unit 30 ) has a back pressure valve 22 formed in the supply path L21 between them.

The supply path L21 is a path connecting the mixing unit 10 and the separating unit 30 . The piping constituting the supply path L21 has a first end connected to the mixer 13 and a second end connected to the separator 30 . Accordingly, the reaction unit 20 can supply the fluid flowing through the supply path L21 to the separation unit 30 .

The material of the piping constituting the supply path L21 is not particularly limited, and the same material as the above-mentioned supply paths L11 and L12 can be applied.

The diameter of the pipe constituting the supply path L21 can be appropriately selected according to the supply amount of the mixture to the separator 30. Specifically, for example, a pipe having an outer diameter of 1 to 30 mm can be used.

The reaction field 21 is a field in which two or more kinds of raw materials (a gas raw material and a liquid raw material) chemically react. The reaction field 21 is not particularly limited as long as it can control the reaction time of the chemical reaction. For example, in this embodiment, the reaction field 21 is constituted by a spiral pipe.

The length of the pipe constituting the reaction field 21 can be appropriately selected depending on various factors such as raw materials, target materials, and reaction efficiency of chemical reactions. For example, when the reaction time is set to a long time, the length of the pipe of the reaction field 21 may be increased. In the case of setting the reaction time to a short time or in the case of producing a chemically unstable reaction intermediate as a target material, the length of the pipe of the reaction field 21 may be shortened. The material of the pipe constituting the reaction field 21 can be appropriately selected according to various factors such as temperature and pressure during chemical reaction.

The inner diameter of the pipe constituting the reaction field 21 is preferably 2 mm or more. When the inner diameter is equal to or greater than the lower limit, it is easy to prevent clogging in the reaction field 21, so that the feed amount of raw materials can be sufficiently maintained and high productivity can be easily realized.

The inner diameter of the pipe constituting the reaction field 21 is preferably 30 mm or less. When the inner diameter is equal to or less than the upper limit, the reaction efficiency of the chemical reaction in the reaction field 21 tends to increase.

The back pressure valve 22 is a valve that controls the pressure of the reaction field 21 . As a result, the pressure in the reaction field 21 can be maintained at an optimal pressure for the chemical reaction of the raw materials, and the product generated in the reaction field 21 can be supplied to the separator 30 at a stable flow rate. In addition, by forming the back pressure valve 22 on the primary side (upstream side) of the separator 30, the product is supplied to the gas-liquid separator ( 31) can be supplied continuously.

According to the reaction unit 20 having the above structure, a product can be obtained by continuously chemically reacting the raw materials mixed in the mixing unit 10. In addition, the reaction unit 20 may continuously supply a product of the chemical reaction (a mixture including diborane gas and a solvent in a gas-liquid coexistence state) to the separation unit 30 . In this way, the reaction unit 20 is an example of a device that controls continuous chemical reactions of raw materials.

Separation unit 30 is formed on the secondary side of reaction unit 20 . The separator 30 includes a gas-liquid separator 31 connected to the supply path L21, a gas recovery path L31 for discharging the gas in the gas-liquid separator 31 to the outside of the gas-liquid separator 31, and a gas-liquid separator ( 31) has a liquid recovery path L32 for discharging the liquid inside the gas-liquid separator 31 to the outside, and a control device 32.

The gas-liquid separator 31 is a container that separates a mixture containing gas and liquid in a gas-liquid coexistence state into gas and liquid and stores them in an airtight space formed inside.

The inner space of the gas-liquid separator 31 communicates with the supply path L21. As a result, the mixture is supplied into the gas-liquid separator 31 through the supply path L21. In addition, the airtight space in the gas-liquid separator 31 is separated into a gas phase 31A and a liquid phase 31B.

The gas-liquid separator 31 may be, for example, a container made of metal such as SUS. In addition, it is preferable that the gas-liquid separator 31 can withstand a reduced pressure state (for example, 20 to 40 kPa abs.).

The volume, inner diameter, and height of the gas-liquid separator 31 can be appropriately selected depending on factors such as the yield of the target material and the size of the flow type reaction device 1.

In this embodiment, the internal diameter of the gas-liquid separator 31 is preferably 50 to 200 mm. When the inner diameter is equal to or greater than the lower limit, gas-liquid separation proceeds sufficiently, and the yield of the target substance is easily improved. Moreover, if the said inner diameter is below the said upper limit, it is easy to downsize the flow type reaction apparatus 1.

In this embodiment, the height of the gas-liquid separator 31 is preferably 200 to 800 mm. When the height is equal to or greater than the lower limit, gas-liquid separation proceeds sufficiently, and the yield of the target substance is likely to be improved. Moreover, if the said height is below the said upper limit, it is easy to downsize the flow type reaction apparatus 1.

Here, the gas-liquid separator 31 is not particularly limited to the shape of a container as long as it can separate a mixture containing gas and liquid in a gas-liquid coexistence state into gas and liquid and store each in an airtight space formed inside. For example, it is good also as a structure which forms an airtight space by making a part of the pipe which connects between the supply path L21 and the liquid recovery path L32 have a diameter larger than at least the supply path L21. With this configuration, a mixture containing gas and liquid in a gas-liquid coexistence state can be separated into gas and liquid and stored in the airtight space formed inside.

A level gauge 33 is formed in the gas-liquid separator 31 . The liquid level gauge 33 can detect the height of the interface (ie liquid level) between the gas phase 31A and the liquid phase 31B in the inner space of the gas liquid separator 31 . Here, the level gauge 33 is not particularly limited as long as it can detect the height of the liquid level in the gas-liquid separator 31 . As the level gauge 33, a level gauge such as a float type, a reflection type, a tube type, or a see-through type is exemplified.

The gas recovery path L31 is a pipe communicating with the gas phase 31A of the gas-liquid separator 31 . Moreover, the opening control valve 34 and the pressure reducing device 35 are formed in this order from the primary side (upstream side) in the gas recovery path|route L31.

The opening degree adjustment valve 34 is a valve which adjusts the opening degree of the piping constituting the gas recovery path L31. Thereby, the flow rate of the gas flowing through the gas recovery path L31 can be adjusted. Although not particularly limited as the opening control valve 34, an automatic needle valve, a butterfly valve, and the like are exemplified.

The decompression device 35 is a device that depressurizes the inside of the gas recovery path L31. Although it does not specifically limit as decompression device 35, A decompression pump etc. are illustrated. The decompression device 35 is provided in the gas recovery path L31 in order to suck in and recover the target substance (diborane gas) from the gas phase 31A in the gas-liquid separator 31.

The ability of the decompression device 35 is not particularly limited as long as it can depressurize the gas phase 31A of the gas-liquid separator 31 to a required pressure (for example, about 50 to 500 hPa abs.). The pressure reducing device 35 can be appropriately selected depending on the components of the mixture supplied into the gas-liquid separator 31 . As the pressure reducing device 35, a vacuum/pressure reducing pump (for example, "BA-106F" manufactured by Iwaki, etc.) and the like are exemplified.

According to the flow type reaction device 1, by operating the pressure reducing device 35, the pressure of the gas phase 31A of the gas-liquid separator 31 is, for example, 50 to 500 hPa abs. It can be made into a constant reduced pressure state of about. Then, the target substance (diborane gas) can be recovered from the secondary side of the decompression device 35.

In this way, the gas recovery path L31 can discharge the target substance or the like continuously supplied to the gas phase 31A of the gas-liquid separator 31 from the gas-liquid separator 31 while adjusting the flow rate.

The material of the pipe constituting the gas recovery path L31 is not particularly limited, and the same material as that of the supply paths L11, L12, and L21 can be applied. In addition, the diameter of the pipe constituting the gas recovery path L31 is not particularly limited, and a pipe having the same diameter as the supply paths L11, L12, and L21 may be used.

On the other hand, on the secondary side of the decompression device 35 of the gas recovery path L31, a flowmeter for measuring the quantity of the recovered target substance (diborane gas), a container for storing the target substance, and a purifier for purifying the target substance Alternatively, an analyzer (for example, FT-IR, etc.) for analyzing the concentration of the target substance may be appropriately provided as necessary. In addition, the gas recovery path L31 may be connected to a reaction device or the like at a later stage on the secondary side of the decompression device 35 .

The liquid recovery path L32 is a pipe communicating with the liquid phase 31B of the gas-liquid separator 31 . An opening/closing valve (opening/closing device) 36 is formed in the liquid recovery path L32.

The opening/closing valve 36 is not particularly limited as long as it switches opening/closing of the pipe constituting the liquid recovery path L32. As the opening/closing valve 36, a manual diaphragm valve, a ball valve, and the like are exemplified.

By setting the open/close valve 36 to an open state, discharge of the liquid from the inside of the gas-liquid separator 31 to the liquid recovery path L32 can be started. On the other hand, by closing the on-off valve 36, the discharge of the liquid from the gas-liquid separator 31 to the liquid recovery path L32 can be stopped. Accordingly, the liquid recovery path L32 can discharge the liquid continuously supplied to the gas-liquid separator 31 .

The material of the pipe constituting the liquid recovery path (L32) is not particularly limited, and the same material as the supply path (L11, L12, L21) or the gas recovery path (L31) can be applied. In addition, the diameter of the pipe constituting the liquid recovery path L32 is not particularly limited, and a pipe having the same diameter as that of the supply paths L11, L12, and L21 or the gas recovery path L31 may be used.

On the other hand, a purification device capable of condensing the solvent, such as an evaporator, may be provided on the secondary side of the on-off valve 36 of the liquid recovery path L32. In this way, the ether-based solvent discharged from the inside of the gas-liquid separator 31 is introduced into the purification device. In this way, the condensed and purified ether-based solvent can be reused as a liquid raw material. Solids entrained in the solvent are separated from the solvent and discarded as solids.

Further, in the purifier, diborane gas dissolved in the ether solvent is separated from the liquid and recovered. Thereby, the target substance (diborane gas) can be recovered with higher efficiency.

The control device 32 includes a controller that drives each driving unit and a control unit that controls each controller as an operation control system. Each controller is composed of, for example, a PID controller, etc., and is electrically connected to actuators provided with the liquid level gauge 33, the opening adjustment valve 34, the opening/closing valve 36, etc. to start, stop, adjust, etc. do As a result, each controller can control conditions such as the pressure in the gas-liquid separator 31 and the height of the liquid surface to be constant.

According to the separation unit 30 having the above structure, diborane gas, which is a target substance, can be separated from the product generated in the reaction unit 20 (a mixture containing diborane gas and a solvent in a gas-liquid coexistence state). . In this way, the separation unit 30 is an example of a device that separates gas and liquid from a mixture containing at least gas and liquid in a gas-liquid coexistence state and recovers each of them.

Hereinafter, an example of the operation method of the flow type reaction device 1 will be described.

First, in the mixing unit 10, the mixer ( 13) is continuously supplied with an ether-based solvent.

Next, boron trihalide gas, such as BF ₃ and BCl ₃ , is supplied from the gas raw material supply source 11 through the supply path L11 to the mass flow controller 17 at a pressure by the pressure regulating valve 16 . The flow rate is supplied to the mixer 13 while being adjusted by each.

Here, the supply conditions of the liquid raw material are not particularly limited and can be appropriately selected according to various factors. For example, in the supply of the liquid raw material, conditions such as a pressure of 0.1 to 1.5 MPaG, a flow rate of 50 to 2000 ml/min, and a concentration of 0.25 to 2 mol/L can be applied. Similarly, supply conditions of the gas raw material are not particularly limited and can be appropriately selected according to various factors. For example, in the supply of the gas raw material, the conditions of a pressure of 0.1 to 1.5 MPaG, a flow rate of 1.5 to 3 L/min, and a concentration of 100 mol% can be applied.

In the mixer 13, gas raw materials and liquid raw materials are mixed. The mixing mode of the gas raw material and the liquid raw material is not particularly limited. For example, the gas raw material and the liquid raw material may be alternately and continuously supplied to form plugs in which the gas raw material and the liquid raw material are alternately divided into small segments and mixed. In this way, the gas raw material and the liquid raw material can be immediately mixed, and high mixing uniformity can be realized.

In the reaction unit 20, the mixed gas raw material and liquid raw material continuously react. As a result, a product containing diborane gas, which is a target substance, and an ether-based solvent in a gas-liquid coexistence state is continuously produced. On the other hand, there are cases where by-products of the reaction are contained in the above products.

The product is continuously supplied at a stable flow rate into the gas-liquid separator 31 through the back pressure valve 22 formed in the supply path L21. During this time, a pressure-reduced state is maintained in the gas-liquid separator 31 by the back pressure valve 22 .

Here, the reaction conditions of the reaction unit 20 are not particularly limited and can be appropriately selected according to various factors. For example, in the production of the product, conditions such as a residence time of 1 second to 10 minutes in the reaction field 21 and a pressure of 0.01 to 1 MPaG in the reaction field 21 can be applied.

The product supplied into the gas-liquid separator 31 is separated into diborane gas and an ether-based solvent, forming a gas phase 31A and a liquid phase 31B in the gas-liquid separator 31, respectively. Inside the gas-liquid separator 31, the pressure is reduced by the pressure reducing device 35 provided in the gas recovery path L31 communicating with the gas phase 31A.

The pressure-reduced state in the gas-liquid separator 31 is controlled by the control device 32 to be kept constant. Conditions such as the pressure in the gas-liquid separator 31 and the height of the liquid surface are not particularly limited and can be appropriately selected according to various factors. For example, conditions such that the pressure in the gas-liquid separator 31 is 20 to 40 kPa abs. and the height of the liquid level in the gas-liquid separator 31 is 70 to 100 mm from the bottom of the gas-liquid separator 31 can be applied. there is.

Here, the diborane gas in the gas-liquid separator 31 is recovered from the secondary side of the decompression device 35.

On the other hand, the recovered diborane gas may be recovered after being purified by a purifier or the like provided at the later stage, or may be supplied to a reaction device or the like provided at the later stage.

When diborane gas is recovered by continuously supplying a product into the gas-liquid separator 31, the liquid phase 31B in the gas-liquid separator 31 increases and the liquid level rises. When the position of the liquid surface reaches a predetermined set value input to the liquid level gauge 33, the signal value is transmitted to the control device 32.

Then, an open signal is transmitted from the control device 32 to the on/off valve 36 . The open/close valve 36 receiving the signal is opened, and the ether-based solvent in the gas-liquid separator 31 is discharged to the liquid recovery path L32. In this way, the ether-based solvent containing by-products is recovered. On the other hand, the discharged ether-based solvent and by-products may be recovered after being purified by a purifier or the like formed at a later stage, or may be supplied to the liquid raw material supply source 12 and reused.

When the ether-based solvent is recovered, the liquid phase 31B in the gas-liquid separator 31 is reduced and the liquid level is lowered. When the position of the liquid level reaches a predetermined set value input to the level gauge 33, the signal value is transmitted to the control device 32, and a closing signal is sent from the control device 32 to the opening/closing valve 36. . The on-off valve 36 receiving the signal is closed, and the discharge of the ether-based solvent from the gas-liquid separator 31 to the liquid recovery path L32 is stopped.

As described above, the flow type reaction device 1 can continuously produce diborane gas as a target substance by continuously supplying a gaseous raw material and a liquid raw material, and continuously reacting these raw materials. On the other hand, in the present embodiment, the flow type reaction device 1 has been described using diborane gas production as an example, but it can also be applied to the production of other chemical substances.

For example, the flow-type reactor 1 may be configured to produce hydrogen using an acid such as acetic acid or hydrochloric acid and a metal hydride such as NaH or NaBH ₄ as raw materials. Moreover, it is good also as a structure which manufactures carbon dioxide using calcium carbonate and hydrochloric acid as a raw material. Moreover, it is good also as a structure which manufactures chlorine gas using perchloric acid and hydrochloric acid as raw materials. On the other hand, the compound exemplified here is an example, and the application of the flow type reaction device 1 is not limited to these examples.

According to the flow-type reaction device 1 according to the first embodiment described above, even if the pressure in the reaction field 21 suddenly fluctuates due to a chemical reaction and the liquid tries to flow backward in the mixer, the liquid is passed through the diaphragm ( S) can be pushed back. For this reason, in the flow type reaction device 1, it is difficult for the liquid to flow backward in the mixer, and blockage of the supply path due to the reverse flow can be prevented. Therefore, since the flow type reaction device 1 can continuously supply the gas raw material to the mixer, even if the device is operated for a long period of time, the reaction efficiency is unlikely to decrease, and high productivity can be maintained.

In addition, the flow type reaction device 1 can prevent clogging of the pipe by forming the diaphragm S inside the supply path L11. Since the diaphragm S does not require a complicated structure such as an ultrasonic transducer or other device, miniaturization and cost reduction of the device can be realized.

The flow-type reaction device 1 according to the first embodiment can be suitably applied to a chemical reaction system in which the reaction efficiency of the chemical reaction is hardly affected even if the supplied raw materials remain in the mixer 13.

(Modification 1 of the first embodiment)

Hereinafter, a flow type reaction apparatus according to Modification 1 of the first embodiment will be described. In Modification 1 of the first embodiment, the diaphragm S is formed in the supply path L12A near the connection portion between the supply path L12 and the mixer 13, and the supply path L11 and the mixer 13 It differs from the flow type reaction device 1 in that the diaphragm S is not formed in the supply path L11A near the connection portion of the are equipped

Also in the flow-type reaction device according to Modification 1 of the first embodiment, the same effects as those of the flow-type reaction device 1 can be obtained.

(Modification 2 of the first embodiment)

Hereinafter, a flow type reaction device according to Modification 2 of the first embodiment will be described. In the modified example 2 of the first embodiment, the supply path L11A near the connection portion between the supply path L11 and the mixer 13 and the supply path near the connection portion between the supply path L12 and the mixer 13 It differs from the flow type reaction device 1 in that the diaphragm S is formed on both sides of (L12A), and has the same configuration as the above-mentioned flow type reaction device 1 except for this.

Also in the flow type reaction device according to Modification Example 2 of the first embodiment, the same effect as the flow type reaction device 1 can be obtained.

<Second Embodiment>

Hereinafter, the configuration of the flow type reaction device 2 according to the second embodiment of the present invention will be described.

3 is a system diagram schematically showing an example of the configuration of the flow type reaction device 2. In FIG. 3 , the z-axis direction is the vertical direction as in FIG. 1 . As shown in FIG. 3 , the flow type reaction device 2 according to the second embodiment includes a mixer 14 instead of a mixer 13 . Moreover, in 2nd Embodiment, as a connection part with the mixer 14 of the supply path L11, the primary side part L11A with respect to the mixer 14 connects the mixer 14 from above with respect to the xy plane shown in FIG. is connected to

The flow reactor 2 according to the second embodiment differs from the flow reactor 1 in the configuration described above, and has the same configuration as the flow reactor 1 described above except for these. Hereinafter, descriptions of components identical to those of the flow type reaction device 1 are omitted.

4 is a cross-sectional view in the xz plane direction showing the mixer 14 included in the flow type reaction device 2. As shown in FIG. 4 , in the second embodiment, as a connection portion of the supply path L11 with the mixer 14, the primary side portion L11A with respect to the mixer 14 is z-axis from above with respect to the xy plane. It is connected to the mixer 14 in the direction, that is, vertically upward. On the other hand, in the second embodiment, a diaphragm is not formed in each supply path in the vicinity of the connection portion between the mixer 14 and the supply path L11 and near the connection portion between the mixer 14 and the supply path L12.

In the second embodiment, the gas raw material is introduced from above the mixer 14 (z-axis direction) via the supply path L11. Thereby, even if the liquid tries to flow backward toward the supply path L11, the liquid can be pushed back from above by the supply of the gaseous raw material. Moreover, even if the liquid in the mixer 14 tries to flow backward toward the supply path L11, in addition to the supply of the gaseous raw material, the action of gravity makes it difficult for the liquid to flow backward.

According to the flow type reaction device 2 according to the second embodiment described above, it is difficult for the liquid in the mixer 14 to flow backward, and even if the liquid flows backward, the liquid receives the action of gravity and the supply path L11 ), it is easy to quickly lead out from the pipe constituting the pipe, and it is difficult to stay in the pipe for a long time. This makes it difficult to cause clogging due to drying of the liquid and precipitation of the solid. Therefore, the flow-type reaction device 2 has the same effect as the flow-type reaction device 1 according to the first embodiment.

The flow-type reactor 2 according to the second embodiment can be suitably applied to a chemical reaction system in which there is little difference in compressibility between two or more raw materials during a chemical reaction, a chemical reaction system in which pressure fluctuation due to a chemical reaction is small, and the like. there is.

(Modification of the second embodiment)

Hereinafter, a flow type reaction device according to a modification of the second embodiment will be described. In a modification of the second embodiment, as a connection portion of the supply path L11 with the mixer 14, the primary side portion L11A to the mixer 14 forms an angle of ω ° with respect to the z axis, It differs from the flow type reaction device 2 in that it is connected to the mixer 14 from above with respect to the xy plane, and has the same configuration as the flow type reaction device 2 described above except for this.

The ω is preferably set within the range of 0 to 45°. If ω is equal to or less than the upper limit value, even if the liquid in the mixer 14 flows backward, the liquid tends to be quickly led out from the piping constituting the supply path L11.

Also in the flow type reaction device according to the modified example of the second embodiment, the same effect as the flow type reaction device 2 can be obtained.

<Third Embodiment>

Hereinafter, the configuration of the flow type reaction device 3 according to the third embodiment of the present invention will be described.

3 is a system diagram schematically showing an example of the configuration of the flow type reaction device 3. As shown in FIG. 3 , the flow type reaction device 3 according to the third embodiment includes a mixer 15 instead of the mixers 13 and 14 . Moreover, in 3rd Embodiment, as a connection part with the mixer 15 of the supply path L11, the primary side part L11A with respect to the mixer 15 connects the mixer 15 from above with respect to the xy plane shown in FIG. is connected to

The flow reactor 3 according to the third embodiment differs from the flow reactor 1 in the configuration described above, and has the same configuration as the flow reactor 1 described above except for these. Hereinafter, descriptions of components identical to those of the flow type reaction device 1 are omitted.

5 is a cross-sectional view in the xz plane direction showing the mixer 15 included in the flow type reaction device 3. As shown in FIG. 5, in 3rd Embodiment, the diaphragm S is formed in the supply path L11A of the vicinity of the connection part of the supply path L11 and the mixer 15.

In Fig. 5, S4 represents the length of the supply paths L11A and L11 after the diaphragm is released. In the third embodiment, the length S4 after release of the diaphragm on the gas pipe side is preferably 0 to 10 mm. When the length S4 is within the above range, a decrease in synthesis yield is unlikely to occur. The length S4 of the supply path L11A after the diaphragm is released is more preferably 0 mm.

That is, "the diaphragm S is formed in the supply path L11A near the junction between the supply path L11 and the mixer 15", the length (S4) of the supply path L11A, L11 after the diaphragm is released. It means that the supply path L11A has the diaphragm S at the connection part of the said supply path L11A and the mixer 15 so that becomes 0-10 mm.

By forming the diaphragm S in the supply path L11A near the connection portion with the mixer 15, it is possible to prevent the liquid from flowing backward from the mixer 15 toward the supply path L11. On the other hand, detailed configurations such as the shape and type of the diaphragm S, the diaphragm ratio (S2/S1), the length of the diaphragm (S3), and the length after release of the diaphragm (S4) are the same as those described in the first embodiment. can

As shown in FIG. 5, in 3rd Embodiment, the primary side part L11A of the connection part with the mixer 15 of the supply path L11 is a mixer from the z-axis direction from above with respect to the xy plane, ie, vertically upwards. It is connected to (15). As a result, even if the liquid flows backward toward the supply path L11, the flowing liquid can be pushed back from above by supplying the gaseous raw material. In addition, even if the liquid in the mixer 15 flows backward toward the supply path L11, the liquid that has flowed back is quickly led out of the supply path L11 under the action of gravity.

According to the flow type reaction device 3 according to the third embodiment described above, in addition to obtaining the same operation and effect as the flow type reaction device 1 according to the first embodiment, productivity and reaction efficiency sufficient for practical use can be improved for a longer period of time. can keep In addition, since the flow-type reaction device 3 has a stronger effect of preventing reverse flow inside the mixer and an effect of suppressing retention than the flow-type reaction devices 1 and 2, even a target substance (diborane gas) at a high pressure of about 1 MPaG can be used. In addition to being able to be produced continuously, clogging due to drying of liquid and precipitation of solids is less likely to occur, so the flow type reaction device can be started and stopped any number of times.

(Modification 1 of the third embodiment)

Hereinafter, a flow type reaction device according to Modification 1 of the third embodiment will be described. In Modification 1 of the third embodiment, the diaphragm S is formed in the supply path L12A near the connection portion between the supply path L12 and the mixer 15, and the supply path L11 and the mixer 15 ) is different from the flow type reaction device 3 in that the diaphragm S is not formed in the supply path L11A near the connection portion, except for this, the same configuration as the flow type reaction device 3 described above. are equipped

Also in the flow-type reaction device according to Modification 1 of the third embodiment, the same effect as that of the flow-type reaction device 3 can be obtained.

(Modification 2 of the third embodiment)

Hereinafter, a flow type reaction device according to Modification 2 of the third embodiment will be described. In Modification 2 of the third embodiment, a supply path L11A near a connection portion between the supply path L11 and the mixer 15 and a supply path near a connection portion between the supply path L12 and the mixer 15 It differs from the flow type reaction device 3 in that the diaphragm S is formed on both sides of (L12A), and has the same configuration as the flow type reaction device 3 described above except for this.

Also in the flow type reaction device according to Modification Example 2 of the third embodiment, the same effect as the flow type reaction device 3 can be obtained.

<Other Embodiments>

Hereinafter, the configuration of a flow type reaction device according to another embodiment of the present invention will be described.

The flow-type reaction device of the present embodiment has the same configuration as the flow-type reaction device 1 described above, except that the separator 30 includes a second decompression device in addition to the decompression device 35.

The second pressure reducing device is formed in the liquid recovery path L32. Accordingly, the second pressure reducing device can reduce the pressure inside the liquid recovery path L32. Moreover, the 2nd pressure reduction device is electrically connected with the control device 32.

The capacity of the second decompression device is not particularly limited as long as it can reduce the pressure equal to or higher than the pressure in the gas-liquid separator 31 (the pressure of the gas phase 31A), and can be appropriately selected according to the ability of the decompression device 35. can In addition, the 2nd decompression device may be the same thing as the decompression device 35, and a different thing may be sufficient as it.

In this embodiment, when the liquid phase 31B of the gas-liquid separator 31 reaches a predetermined set value input to the level gauge 33, the signal value is transmitted to the control device 32, and the control device ( An operation signal is sent from 32) to the second pressure reducing device. Thereby, the 2nd pressure reduction device starts operation under the condition that the pressure in the liquid recovery path L32 becomes lower than the pressure in the gas-liquid separator 31.

According to the flow type reaction device according to the other embodiment described above, the liquid recovery path L32 can be brought into a reduced pressure state from the inside of the gas-liquid separator 31. For this reason, according to the present embodiment, while it is possible to easily recover the liquid from the liquid phase 31B in the gas-liquid separator 31 via the liquid recovery path L32, the gas-liquid separator 31 in a reduced pressure state It can make it difficult for air to get mixed in.

In the above, several embodiments of the present invention have been described, but the present invention is not limited to these specific embodiments. In addition, addition, omission, substitution, and other changes may be added to the structure within the scope of the gist of the present invention described in the claims.

For example, in the embodiment described above, the primary side part L12A of the connection part of the liquid raw material supply path L12 with the mixer is arranged on the xy plane and connected to the mixer, but the part L12 You may be connected to the mixer from above with respect to this xy plane.

In addition, the secondary side end of the supply path L11 and the secondary side end of the supply path L12 are connected, and the supply path L11 and the supply path L12 merge, without using a mixer such as a mixer. A configuration may be employed in which a portion is used instead of a mixer and two or more kinds of raw materials are mixed in the merging portion.

Example

Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by the following description.

(Example 1)

Diborane gas was continuously synthesized using the flow-type reactor 1 according to the first embodiment. As specific reaction conditions, BF ₃ was used as a gas raw material, and an ether-based solvent in which a reducing agent was dissolved in ether was used as a liquid raw material. Further, the diaphragm ratio (S2/S1) of the diaphragm S was 0.25, the length (S3) of the diaphragm was 1 mm, and the length after release of the diaphragm was 0 mm.

The used liquid raw material was distilled and purified by an evaporator (not shown) provided on the secondary side (downstream side) of L32, and was again introduced into the liquid raw material supply source 12, circulated, and reused. The flow rate of the diborane gas recovered from the gas recovery path L31 was measured with a floating flow meter (not shown) installed on the secondary side of the decompression device 35. In addition, the purity of the produced diborane gas was measured by FT-IR (not shown) installed on the secondary side of the pressure reducing device 35.

Fig. 6 is a graph showing the change over time in the supply amount of the gas raw material in Example 1; As shown in FIG. 6 , in Example 1, the BF ₃ gas could be continuously supplied for 35 minutes or more, and diborane gas could be continuously synthesized. In addition, as a result of measurement with a flow meter, the yield of diborane gas was about 85 to 90%. As a result of analyzing the obtained diborane gas by FT-IR, the purity of the diborane gas was 99 mol%.

On the other hand, in Example 1, the supply of the BF ₃ gas was stopped 40 minutes after the start of supply of the BF ₃ gas, the synthesis reaction was stopped, and then the synthesis reaction was started again. As a result, as shown by the peaks around 50 minutes on the horizontal axis in FIG. 1, the pipe of the supply path was blocked while the synthesis reaction was stopped in the flow type reactor of Example 1, and even if the synthesis reaction was to be restarted, BF ₃ gas was not supplied. could not supply

(Example 2)

Diborane gas was synthesized under the same conditions as in Example 1, except that the flow type reactor 2 according to the second embodiment was used.

Fig. 7 is a diagram showing the change with time in the supply amount of the gas raw material in Example 2; As shown in Fig. 7, in Example 2, the BF ₃ gas could be continuously supplied for about 20 minutes, and diborane gas could be continuously synthesized. However, after that, the supply amount of the BF ₃ gas rapidly decreased, suggesting that the piping of the supply path was clogged or the like. Further, as a result of measurement with a flow meter, the yield of diborane gas was about 85 to 90%. As a result of analyzing the obtained diborane gas by FT-IR, the purity of the diborane gas was 99 mol%.

(Example 3)

Diborane gas was synthesized under the same conditions as in Example 1, except that the flow type reactor 3 according to the third embodiment was used.

Fig. 8 is a diagram showing the change over time in the supply amount of the gas raw material in Example 3; As shown in Fig. 8, in Example 3, the BF ₃ gas could be continuously supplied for 160 minutes or longer, and diborane gas could be continuously synthesized. In addition, as a result of measurement with a flow meter, the yield of diborane gas was about 85 to 90%. As a result of analyzing the obtained diborane gas by FT-IR, the purity of the diborane gas was 99%. On the other hand, as a result of analyzing the solvent recovered by the evaporator by FT-IR, the residual of BF ₃ gas, which is a gas raw material, was not confirmed.

On the other hand, in Example 3, as in Example 1, after stopping the synthesis reaction, it was attempted to start the synthesis reaction again. As a result, during the stop of the synthesis reaction, there was no sign of obstruction of the piping of the supply path, etc., and the BF ₃ gas could be smoothly supplied in the same manner as before stopping the synthesis reaction.

(Comparative Example 1)

In the flow type reaction device shown in Fig. 1, the mixer 13 is replaced with a mixer without a diaphragm, and the primary side portion L11A of the connection portion between the supply path L11 and the mixer is vertically upward of the mixer. Diborane gas was synthesized in the same manner as in Example 1, except that it was installed horizontally on the xy plane instead of .

Fig. 9 is a graph showing the change over time in the supply amount of the gas raw material in Comparative Example 1; As shown in Fig. 9, in the comparative example, when 15 minutes passed from the start of operation, the supply amount of the gas raw material became unstable, and when 20 minutes passed, the gas raw material could not be supplied at all. When the inside of the supply path L11 was visually confirmed, precipitation of solvent and solid was confirmed, suggesting blockage of the pipe due to reverse flow. From the start of operation to 15 minutes or less, there was no significant difference in the purity and yield of diborane gas from those of each Example, but after 15 minutes, the amount of diborane gas decreased significantly, and the purity of diborane gas lowered

From the results of the above Examples and Comparative Examples, it was found that the flow type reaction apparatus of Examples 1 to 3 could be continuously operated for a long time. In addition, it was found that the flow-type reaction apparatus of Example 3 could repeat stopping and restarting the synthesis reaction.

On the other hand, the yield of diborane gas obtained in each example was at a level sufficient for practical use. In addition, the purity of diborane gas was high, and high-quality diborane gas was obtained.

1, 2, 3... Flow type reaction device, 10 . . . mixing part, 11 . . . source of gas raw material, 12 . . . Supply source of liquid raw material, 13, 14, 15... Mixer, 16 . . . pressure regulating valve, 17... mass flow controller, 18 . . . liquid feeding pump, 19 . . . mass flow controller, 20 . . . reaction part, 21 . . . reaction field, 22 . . . Back pressure valve, 30... Separation part, 31 . . . Gas-Liquid Separator, 31A... Wake up, 31B... liquid phase, 32 . . . control device, 33 . . . face gauge, 34 . . . Opening adjustment valve, 35... decompression device, 36 . . . On-off valve, L11, L12, L21… Supply path, L31… Gas return path, L32… liquid return path, S... Diaphragm, S1... inner diameter, S2... Flow path diameter, S3… The length of the diaphragm, S4... Length of supply path after diaphragm release

Claims (6)

A flow-type reaction device for continuously reacting two or more kinds of raw materials,
A mixing unit for mixing two or more kinds of the raw materials;
A reaction unit formed on the secondary side of the mixing unit and obtaining a product by reacting the raw material;
It is formed on the secondary side of the reaction unit and has a separation unit for separating the target material from the product,
The mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer,
While the supply pipes are respectively connected to the mixer,
At least one of the supply piping has a restraining mechanism for suppressing movement of fluid from the mixer to the supply piping near a connection portion between the supply piping and the mixer,
The separator has a gas-liquid separator, a gas recovery path, a liquid recovery path, and a control device,
A flow type reaction device, wherein a liquid level gauge is formed in the gas-liquid separator, and an on-off valve is formed in the liquid recovery path. A flow-type reaction device for continuously reacting two or more kinds of raw materials,
A mixing unit for mixing two or more kinds of the raw materials;
A reaction unit formed on the secondary side of the mixing unit and obtaining a product by reacting the raw material;
It is formed on the secondary side of the reaction unit and has a separation unit for separating the target material from the product,
The mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer,
While the supply pipes are respectively connected to the mixer,
At least one of the supply pipes is connected to the mixer from above with respect to a plane on which the mixer is installed;
The separator has a gas-liquid separator, a gas recovery path, a liquid recovery path, and a control device,
A flow type reaction device, wherein a liquid level gauge is formed in the gas-liquid separator, and an on-off valve is formed in the liquid recovery path. A flow-type reaction device for continuously reacting two or more kinds of raw materials,
A mixing unit for mixing two or more kinds of the raw materials;
A reaction unit formed on the secondary side of the mixing unit and obtaining a product by reacting the raw material;
It is formed on the secondary side of the reaction unit and has a separation unit for separating the target material from the product,
The mixing unit has a mixer for mixing two or more kinds of the raw materials, and two or more supply pipes for supplying each of the raw materials to the mixer,
The supply pipes are respectively connected to the mixer,
At least one of the supply piping has a restraining mechanism for suppressing the movement of the fluid from the mixer to the supply piping in the vicinity of the connection portion between the supply piping and the mixer,
At least one of the supply pipes is connected to the mixer from above with respect to a plane on which the mixer is installed;
The separator has a gas-liquid separator, a gas recovery path, a liquid recovery path, and a control device,
A flow type reaction device, wherein a liquid level gauge is formed in the gas-liquid separator, and an on-off valve is formed in the liquid recovery path. According to any one of claims 1 to 3,
A flow-type reactor in which two or more of the above raw materials are a combination of one or more gaseous raw materials and one or more liquid raw materials. According to claim 2 or 3,
two or more of the above raw materials are a combination of one or more gaseous raw materials and one or more liquid raw materials;
At least one of the supply piping for supplying the gas raw material to the mixer is connected to the mixer from above with respect to the plane on which the mixer is installed,
At least one of the supply pipes supplying the liquid raw material to the mixer is connected to the mixer in parallel with a plane on which the mixer is installed. delete

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