KR102456500B1 - Method of manufacturing wire using conductive aramid fiber - Google Patents

Method of manufacturing wire using conductive aramid fiber Download PDF

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KR102456500B1
KR102456500B1 KR1020220030564A KR20220030564A KR102456500B1 KR 102456500 B1 KR102456500 B1 KR 102456500B1 KR 1020220030564 A KR1020220030564 A KR 1020220030564A KR 20220030564 A KR20220030564 A KR 20220030564A KR 102456500 B1 KR102456500 B1 KR 102456500B1
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layer
bromide
plating layer
forming
graphene oxide
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박준영
공병태
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주식회사 포엠비
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/22Sheathing; Armouring; Screening; Applying other protective layers
    • H01B13/225Screening coaxial cables
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1689After-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/83Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • H01B7/0009Details relating to the conductive cores
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • H01B7/17Protection against damage caused by external factors, e.g. sheaths or armouring
    • H01B7/28Protection against damage caused by moisture, corrosion, chemical attack or weather
    • H01B7/2806Protection against damage caused by corrosion
    • DTEXTILES; PAPER
    • D10INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10BINDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
    • D10B2401/00Physical properties
    • D10B2401/16Physical properties antistatic; conductive
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A30/00Adapting or protecting infrastructure or their operation

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  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Textile Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

According to the present invention, disclosed is a wire using conductive aramid fibers using aramid fibers. The wire using conductive aramid fibers comprises: a core layer made of aramid fibers; a first plating layer formed on the outside of the core layer; and a graphene coating layer for coating graphene on the first plating layer. An embodiment of the present invention provides the wire using conductive aramid fibers, a coaxial cable, and a manufacturing method thereof which form a first plating layer on an aramid fiber and form a second plating layer after forming a graphene coating layer thereon so as to increase conductive efficiency of a signal.

Description

도전성 아라미드섬유를 이용한 와이어의 제조방법{Method of manufacturing wire using conductive aramid fiber}Method of manufacturing wire using conductive aramid fiber

본 발명은 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법에 관한 것으로, 특히 아라미드섬유에 제1 도금층을 형성하고, 그 위에 그래핀층을 형성 후에 다시 제2 도금층을 형성함으로써 전도성을 향상하여 EMI 차폐 효율을 올리고 솔더성을 향상한 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법에 관한 것이다.The present invention relates to a wire using a conductive aramid fiber, a coaxial cable using the same, and a method of manufacturing a wire using the same. In particular, a first plating layer is formed on an aramid fiber, a graphene layer is formed thereon, and then a second plating layer is formed again to improve conductivity. It relates to a wire using a conductive aramid fiber having improved EMI shielding efficiency and improved solderability, a coaxial cable using the same, and a method of manufacturing the wire.

이하에 기술되는 내용은 단순히 본 발명과 관련되는 배경 정보만을 제공할 뿐 종래기술을 구성하는 것이 아니다.The content described below merely provides background information related to the present invention and does not constitute the prior art.

일반적으로 케이블 텔레비전 신호 및 셀룰러폰 방송신호와 같은 RF 신호의 전송용으로 동축 케이블이 많이 사용되고 있다.In general, a coaxial cable is widely used for transmission of an RF signal such as a cable television signal and a cellular phone broadcast signal.

동축케이블은 중심도체, 상기 중심도체를 감싸며 일정 두께를 가진 유전층, 상기 유전층을 감싸며, 상기 중심도체와 동축상에 형성된 1차 쉴드층, 2차 쉴드층 및 상기 2차 쉴드층을 감싸는 외피를 포함한다.The coaxial cable includes a central conductor, a dielectric layer having a predetermined thickness surrounding the central conductor, a primary shield layer formed coaxially with the central conductor, a secondary shield layer, and a shell surrounding the secondary shield layer surrounding the dielectric layer do.

상기 1차 쉴드층은 구리동박에 은도금을 한 것으로 유전층을 오버랩하여 감아주면서 형성하며, 2차 쉴드층은 구리선에 은도금한 것으로 직조하여 1차 쉴드층을 감싸는 형태로 형성된다.The first shield layer is formed by overlapping and winding a dielectric layer with silver plating on copper foil, and the second shield layer is formed by wrapping the first shield layer by weaving it with silver plating on a copper wire.

그런데 상기와 같은 동축케이블을 이용하여 신호를 전송할 경우, 중심도체 및 1차 쉴드층의 도전율과 유전층의 유전율에 의하여 전송 신호의 손실이 발생되는 바, 동축케이블의 제조시, 이를 고려하여 전송손실을 효과적으로 줄이는 것이 무엇보다 중요하다.However, when a signal is transmitted using the coaxial cable as described above, transmission signal loss occurs due to the conductivity of the central conductor and the primary shield layer and the permittivity of the dielectric layer. Effective reduction is paramount.

종래기술에서는 전송손실을 줄이기 위한 방법으로 차폐성능을 개선하는 방법이 주로 사용되었으며, 구체적으로, 유전층의 유전율을 낮추기 위하여 중심도체와 1차 쉴드층 사이의 치수 구조를 개선하여 설계하거나, 유전체의 유전특성을 개선하거나, 또는 1차 쉴드층의 차폐특성을 보강하는 것이 대부분이다.In the prior art, a method of improving shielding performance has been mainly used as a method for reducing transmission loss. Specifically, in order to lower the dielectric constant of the dielectric layer, the dimensional structure between the central conductor and the primary shield layer is improved and designed, or the dielectric of the dielectric layer is improved. In most cases, the characteristics are improved or the shielding characteristics of the primary shield layer are reinforced.

그러나, 상기와 같은 방법을 이용하여 차폐성능을 개선함으로써 동축케이블의 전송손실을 줄일 수는 있으나, 중심도체와 1차 쉴드층의 전송특성을 직접 개선하지는 못한다. 또한 1차 쉴드층이 구리동박에 은도금한 것으로 오버랩하여 테프론을 감아준다 하더라도 완벽하게 감기는 불가능하며, 얇은 동축 케이블의 경우 1차 쉴딩을 하기에 더욱 어려움이 있으며, 동축 케이블을 구부리는 경우 오버랩 된 부분이 벌어지면서 공차가 형성되어 고주파저손실의 동축케이블에 높은 신뢰성을 가지기는 매우 어려운 실정이다.However, although the transmission loss of the coaxial cable can be reduced by improving the shielding performance using the above method, the transmission characteristics of the central conductor and the primary shield layer cannot be directly improved. In addition, even if the primary shield layer overlaps copper copper foil with silver plating and wraps Teflon, it is impossible to completely wind it. In the case of a thin coaxial cable, it is more difficult to perform primary shielding. It is very difficult to have high reliability in high-frequency, low-loss coaxial cables because tolerances are formed as the parts are widened.

한편, 이동통신 분야에도 5G 시대가 도래하면서 더욱더 저손실 고주파 동축케이블의 좋은 신호특성이 요구되고 있다.On the other hand, with the advent of the 5G era in the mobile communication field, better signal characteristics of low-loss high-frequency coaxial cables are required.

또한, 이러한 RF용 동축 케이블은 항공기 또는 전기자동차용으로 무게를 줄이는 것에 효과적으로 적용될 수도 있다.In addition, this RF coaxial cable may be effectively applied to reduce weight for use in aircraft or electric vehicles.

이러한 종래의 문제점을 해결하고자 하는 것으로, 국내공개특허 2017-0142556호에 동축 케이블의 접지를 균일하게 형성하여 임피던스 및 손실을 안정화하고 전자파 차폐성능을 개선할 수 있는 고주파 저손실 알에프 동축케이블을 제공하고 있다.In order to solve this conventional problem, Korean Patent Publication No. 2017-0142556 provides a high-frequency low-loss RF coaxial cable that can uniformly form the ground of the coaxial cable to stabilize the impedance and loss and improve the electromagnetic wave shielding performance. .

그러나 이러한 선행기술은 도 1을 참조하면, 실버도금 구리 호일층(140)을 감싸는 실버도금 구리 브레이드(braid)층(145)이 실버도금된 구리 와이어 또는 주석도금된 구리 와이어로 이루어지는데, 비교적 무게가 무겁고 전자파 차폐성능이 좀 부족한 면이 있다.However, in this prior art, referring to FIG. 1 , a silver-plated copper braid layer 145 surrounding the silver-plated copper foil layer 140 is made of a silver-plated copper wire or a tin-plated copper wire. It is heavy and lacks electromagnetic wave shielding performance.

대한민국 공개특허 제10-2017-0142556호: 2017.12.28. 공개Republic of Korea Patent Publication No. 10-2017-0142556: 2017.12.28. open

본 발명이 이루고자 하는 과제는 종래의 문제를 해결하고자 하는 것으로, 아라미드섬유에 제1 도금층을 형성하고, 그 위에 그래핀층을 형성 후에 다시 제2 도금층을 형성함으로써 전도성을 향상하여 EMI 차폐 효율을 올리고 솔더성을 향상한 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공하는 것이다.The problem to be achieved by the present invention is to solve the conventional problem, by forming a first plating layer on aramid fiber, forming a graphene layer thereon, and then forming a second plating layer again to improve conductivity to increase EMI shielding efficiency and solder It is to provide a wire using an improved conductive aramid fiber, a coaxial cable using the same, and a method of manufacturing the wire.

또한, 본 발명이 이루고자 하는 과제는 종래의 문제를 해결하고자 하는 것으로, 무게를 줄이면서도 전자파 차폐의 영향을 줄인, 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공하는 것이다.In addition, the object to be achieved by the present invention is to solve the conventional problems, while reducing the weight while reducing the effect of electromagnetic wave shielding, to provide a wire using a conductive aramid fiber, a coaxial cable and a method of manufacturing the wire using the same.

또한, 본 발명이 이루고자 하는 과제는 종래의 문제를 해결하고자 하는 것으로, 아라미드 섬유에 도금된 와이어를 은도금된 구리와이어 또는 주석도금된 구리 와이어 대신해서 사용함으로써 무게도 가벼워지고 와이어 형태여서 유연성이 있어서 전자기파폐 특성도 좋아지는, 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공하는 것이다.In addition, the problem to be achieved by the present invention is to solve the conventional problems, and by using a wire plated on aramid fiber instead of a silver-plated copper wire or a tin-plated copper wire, the weight is reduced and the wire is flexible because it is flexible. It is to provide a wire using a conductive aramid fiber, which also improves lung properties, a coaxial cable using the same, and a method of manufacturing the wire.

이러한 기술적 과제를 이루기 위한 본 발명의 특징에 따른 아라미드섬유를 이용한 와이어는,Wire using aramid fiber according to the features of the present invention for achieving this technical problem,

아라미드섬유로 이루어지는 코어층;A core layer made of aramid fibers;

상기 코어층의 외부에 형성되는 제1 도금층;a first plating layer formed outside the core layer;

상기 제1 도금층에 그래핀으로 코팅되는 그래핀 코팅층;a graphene coating layer coated with graphene on the first plating layer;

상기 그래핀 코팅층에 형성되는 제2 도금층을 포함한다.and a second plating layer formed on the graphene coating layer.

상기 제2 도금층에 형성되는 산화방지제층을 더 포함한다.It further includes an antioxidant layer formed on the second plating layer.

상기 제1 도금층은 도전성을 높이기 위해서는 무전해 구리 로 형성하는 것을 특징으로 한다.The first plating layer is characterized in that it is formed of electroless copper in order to increase the conductivity.

상기 제1 도금층은 내부식성 및 환경특성을 높이기 위해서 무전해 니켈 도금으로 형성하는 것을 특징으로 한다.The first plating layer is characterized in that it is formed by electroless nickel plating in order to improve corrosion resistance and environmental characteristics.

이러한 기술적 과제를 이루기 위한 본 발명의 특징에 따른 와이어를 이용한 동축 케이블은,A coaxial cable using a wire according to the features of the present invention for achieving this technical problem,

중심도체;central conductor;

상기 중심도체를 감싸며 일정 두께를 가진 유전층;a dielectric layer surrounding the central conductor and having a predetermined thickness;

상기 유전층을 감싸며, 상기 중심도체와 동축상에 형성된 1차 쉴드층;a primary shield layer surrounding the dielectric layer and formed coaxially with the central conductor;

2차 쉴드층;secondary shield layer;

상기 2차 쉴드층을 감싸는 외피를 포함하고,and an outer skin surrounding the secondary shield layer,

상기 2차 쉴드층은 복수의 케이블을 감는 구조로 이루어지고,The secondary shield layer has a structure in which a plurality of cables are wound,

상기 케이블은,The cable is

아라미드섬유로 이루어지는 코어층;A core layer made of aramid fibers;

상기 코어층의 외부에 형성되는 제1 도금층;a first plating layer formed outside the core layer;

상기 제1 도금층에 그래핀으로 코팅되는 그래핀 코팅층;a graphene coating layer coated with graphene on the first plating layer;

상기 그래핀 코팅층에 형성되는 제2 도금층을 포함한다.and a second plating layer formed on the graphene coating layer.

이러한 기술적 과제를 이루기 위한 본 발명의 특징에 따른 아라미드섬유를 이용한 와이어의 제조방법은,A method of manufacturing a wire using an aramid fiber according to the features of the present invention for achieving this technical problem,

아라미드섬유로 된 코어층의 표면을 알카리로 표면식각을 하고 양이온 부착하는 단계;Surface-etching the surface of the core layer made of aramid fibers with alkali and attaching cations;

양이온이 부착된 코어층을 Pd/Sn 콜로이드 용액 처리 후에 Pd 금속화 처리하여 도금을 진행하여 제1 도금층을 형성하는 단계;forming a first plating layer by plating the core layer to which the cations are attached by Pd metallization after treatment with a Pd/Sn colloidal solution;

상기 제1 도금층 위에 양이온을 코팅하는 단계;coating a cation on the first plating layer;

상기 양이온이 코팅된 제1 도금층에 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시키는 단계;forming a graphene oxide layer on the cation-coated first plating layer and reducing the graphene oxide;

상기 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시켜 형성된 그래핀 코팅층에 전기 도금으로 제2 도금층을 형성하는 단계를 포함한다.and forming a second plating layer by electroplating on the graphene coating layer formed by forming the graphene oxide layer and reducing the graphene oxide.

상기 방법은,The method is

상기 제2 도금층에 형성되는 산화방지제층을 형성하는 단계를 더 포함한다.The method further includes forming an antioxidant layer formed on the second plating layer.

상기 제1 도금층을 형성하는 단계는,The step of forming the first plating layer,

상기 금속층에 도금되는 제1 도금층은 도전성을 높이기 위해서는 무전해 구리 로 형성하는 것을 특징으로 한다.The first plating layer plated on the metal layer is characterized in that it is formed of electroless copper in order to increase conductivity.

상기 제1 도금층을 형성하는 단계는,The step of forming the first plating layer,

상기 금속층에 도금되는 제1 도금층은 내부식성 및 환경특성을 높이기 위해서 무전해 니켈 도금으로 형성하는 것을 특징으로 한다.The first plating layer plated on the metal layer is characterized in that it is formed by electroless nickel plating in order to improve corrosion resistance and environmental characteristics.

개시된 기술의 실시 예들은 다음의 장점들을 포함하는 효과를 가질 수 있다. 다만, 개시된 기술의 실시 예들이 이를 전부 포함하여야 한다는 의미는 아니므로, 개시된 기술의 권리범위는 이에 의하여 제한되는 것으로 이해되어서는 아니 될 것이다. Embodiments of the disclosed technology may have effects including the following advantages. However, since it does not mean that the embodiments of the disclosed technology should include all of them, the scope of the disclosed technology should not be understood as being limited thereby.

본 발명의 실시예에서는, 아라미드섬유에 제1 도금층을 형성하고, 그 위에 그래핀층을 형성 후에 다시 제2 도금층을 형성함으로써 전도성을 향상하여 EMI 차폐 효율을 올리고 솔더성을 향상한 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공할 수 있다.In an embodiment of the present invention, a first plating layer is formed on an aramid fiber, and a second plating layer is formed again after forming a graphene layer thereon. It is possible to provide a wire, a coaxial cable using the same, and a method of manufacturing the wire.

또한, 본 발명의 실시예에서는, 무게를 줄이면서도 전자파 차폐의 영향을 줄인, 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공할 수 있다.In addition, in an embodiment of the present invention, it is possible to provide a method of manufacturing a wire using a conductive aramid fiber, a coaxial cable and a wire using the same, reducing the effect of electromagnetic wave shielding while reducing the weight.

또한, 본 발명의 실시예에서는, 아라미드 섬유에 도금된 와이어를 은도금된 구리와이어 또는 주석도금된 구리 와이어 대신해서 사용함으로써 무게도 가벼워지고 와이어 형태여서 유연성이 있어서 전자기파폐 특성도 좋아지는, 도전성 아라미드섬유를 이용한 와이어, 그를 이용한 동축 케이블 및 와이어의 제조방법을 제공할 수 있다.In addition, in the embodiment of the present invention, by using the wire plated on the aramid fiber instead of the silver-plated copper wire or the tin-plated copper wire, the weight is lighter and the wire shape is flexible so that the electromagnetic shielding properties are also improved. It is possible to provide a wire using the same, a coaxial cable using the same, and a method of manufacturing the wire.

도 1은 일반적인 동촉 케이블을 나타낸 도면이다.
도 2는 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 단면을 보인 도면이다.
도 3은 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 제조방법을 보인 도면이다.
도 4 내지 도 8은 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 제조 단계에 따른 상태를 보인 도면이다.
1 is a view showing a general synchronous cable.
2 is a view showing a cross-section of a wire using a conductive aramid fiber according to an embodiment of the present invention.
3 is a view showing a method of manufacturing a wire using a conductive aramid fiber according to an embodiment of the present invention.
4 to 8 are views showing the state according to the manufacturing step of the wire using the conductive aramid fiber according to an embodiment of the present invention.

본 발명은 다양한 변경을 가할 수 있고 여러 가지 실시예를 가질 수 있는 바, 특정 실시예들을 도면에 예시하고 상세한 설명에 상세하게 설명하고자 한다. 그러나, 이는 본 발명을 특정한 실시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변경, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다.Since the present invention can have various changes and can have various embodiments, specific embodiments are illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and should be understood to include all modifications, equivalents and substitutes included in the spirit and scope of the present invention.

제 1, 제 2, A, B 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 해당 구성요소들은 상기 용어들에 의해 한정되지는 않으며, 단지 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로만 사용된다. 예를 들어, 본 발명의 권리 범위를 벗어나지 않으면서 제 1 구성요소는 제 2 구성요소로 명명될 수 있고, 유사하게 제 2 구성요소도 제 1 구성요소로 명명될 수 있다. 및/또는 이라는 용어는 복수의 관련된 기재된 항목들의 조합 또는 복수의 관련된 기재된 항목들 중의 어느 항목을 포함한다.Terms such as first, second, A, and B may be used to describe various components, but the components are not limited by the above terms, and only for the purpose of distinguishing one component from other components. used only as For example, without departing from the scope of the present invention, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component. and/or includes a combination of a plurality of related listed items or any of a plurality of related listed items.

본 명세서에서 사용되는 용어에서 단수의 표현은 문맥상 명백하게 다르게 해석되지 않는 한 복수의 표현을 포함하는 것으로 이해되어야 한다. 그리고 "포함한다" 등의 용어는 설시된 특징, 개수, 단계, 동작, 구성요소, 부분품 또는 이들을 조합한 것이 존재함을 의미하는 것이지, 하나 또는 그 이상의 다른 특징들이나 개수, 단계 동작 구성요소, 부분품 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 배제하지 않는 것으로 이해되어야 한다.A singular expression in terms used herein should be understood to include a plural expression unless the context clearly dictates otherwise. And terms such as "comprising" mean that the specified feature, number, step, operation, component, part, or a combination thereof exists, but one or more other features or number, step operation component, part It is to be understood that this does not exclude the possibility of the presence or addition of or combinations thereof.

도면에 대한 상세한 설명을 하기에 앞서, 본 명세서에서의 구성부들에 대한 구분은 각 구성부가 담당하는 주기능 별로 구분한 것에 불과함을 명확히 하고자 한다. 즉, 이하에서 설명할 2개 이상의 구성부가 하나의 구성부로 합쳐지거나 또는 하나의 구성부가 보다 세분화된 기능별로 2개 이상으로 분화되어 구비될 수도 있다. Prior to a detailed description of the drawings, it is intended to clarify that the classification of the constituent parts in the present specification is merely a division according to the main function that each constituent unit is responsible for. That is, two or more components to be described below may be combined into one component, or one component may be divided into two or more for each more subdivided function.

그리고 이하에서 설명할 구성부 각각은 자신이 담당하는 주기능 이외에도 다른 구성부가 담당하는 기능 중 일부 또는 전부의 기능을 추가적으로 수행할 수도 있으며, 구성부 각각이 담당하는 주기능 중 일부 기능이 다른 구성부에 의해 전담되어 수행될 수도 있음은 물론이다. 따라서, 본 명세서를 통해 설명되는 각 구성부들의 존재 여부는 기능적으로 해석되어야 할 것이다.In addition, each of the constituent units to be described below may additionally perform some or all of the functions of other constituent units in addition to the main function it is responsible for. Of course, it can also be performed by being dedicated to it. Therefore, the existence or non-existence of each component described through the present specification should be interpreted functionally.

도 2는 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 단면을 보인 도면이다.2 is a view showing a cross-section of a wire using a conductive aramid fiber according to an embodiment of the present invention.

도 2를 참조하면, 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어는,2, the wire using a conductive aramid fiber according to an embodiment of the present invention,

아라미드섬유로 이루어지는 코어층(210);A core layer 210 made of aramid fibers;

상기 코어층(210)의 외부에 형성되는 제1 도금층(220);a first plating layer 220 formed outside the core layer 210;

상기 제1 도금층(220)에 그래핀으로 코팅되는 그래핀 코팅층(230);a graphene coating layer 230 coated with graphene on the first plating layer 220;

상기 그래핀 코팅층(230)에 형성되는 제2 도금층(240);a second plating layer 240 formed on the graphene coating layer 230;

상기 제2 도금층(240)에 형성되는 산화방지제층(250)를 포함한다.and an antioxidant layer 250 formed on the second plating layer 240 .

상기 제1 도금층(220)은 도전성을 높이기 위해서는 무전해 구리로 형성하는 것을 특징으로 한다.The first plating layer 220 is characterized in that it is formed of electroless copper in order to increase conductivity.

필요에 따라 상기 제1 도금층(220)은 내부식성 및 환경특성을 높이기 위해서 무전해 니켈 도금으로 형성하는 것을 특징으로 한다.If necessary, the first plating layer 220 is characterized in that it is formed by electroless nickel plating to improve corrosion resistance and environmental characteristics.

이러한 구성을 가진 본 발명의 실시예에 따른 아라미드섬유를 이용한 도전성 아라미드섬유를 이용한 와이어, 및 와이어의 제조방법을 설명하면 다음과 같다.A wire using a conductive aramid fiber using an aramid fiber according to an embodiment of the present invention having such a configuration, and a method of manufacturing the wire will be described as follows.

도 3은 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 제조방법을 보인 도면이고, 도 4 내지 도 8는 본 발명의 실시예에 따른 도전성 아라미드섬유를 이용한 와이어의 제조 단계에 따른 상태를 보인 도면이다.3 is a view showing a method of manufacturing a wire using a conductive aramid fiber according to an embodiment of the present invention, FIGS. 4 to 8 are a state according to the manufacturing step of a wire using a conductive aramid fiber according to an embodiment of the present invention the drawing shown.

도 3을 참조하면, 먼저, 아라미드섬유로 된 코어층(210)의 표면을 알카리로 표면식각을 하고 양이온 부착하는 단계(S210)를 수행한다.Referring to FIG. 3 , first, the surface of the core layer 210 made of aramid fibers is etched with alkali and a step (S210) of attaching cations is performed.

여기서 양이온 부착하는 과정은 도 4와 같은 코어층(210)을 양이온성을 나타내는 폴리에틸렌이민(Polyethyleneimine, PEI) 용액에 담궈 건조시킬 수 있다. Here, in the process of attaching the cations, the core layer 210 as shown in FIG. 4 may be immersed in a polyethyleneimine (PEI) solution exhibiting cationic properties and dried.

다음, 양이온이 부착된 코어층(210)을 팔라듐 /주석(Pd/Sn) 콜로이드 용액 처리 후에 팔라듐(Pd) 금속화 처리하고, 제1 도금층(220)을 형성하는 단계(S220)를 수행한다.Next, the cation-attached core layer 210 is treated with a palladium/tin (Pd/Sn) colloidal solution, followed by palladium (Pd) metallization, and a step (S220) of forming the first plating layer 220 is performed.

여기서, 아라미드섬유 등에 제1 도금층(220)을 형성시키기 위해서 표면에 팔라듐-주석 콜로이드 촉매(이하, "Pd/Sn 콜로이드 촉매"라고 한다.)를 석출시키는 이른바 캐타라이징 처리를 행하고, 그런 다음, 필요에 따라 무전해도금 또는 메타라이징 처리 등의 도전화 처리를 가한 후, 금속 전기도금을 시행할 수 있다.Here, in order to form the first plating layer 220 on the aramid fiber or the like, a so-called catalizing treatment of precipitating a palladium-tin colloidal catalyst (hereinafter referred to as "Pd/Sn colloidal catalyst") on the surface is performed, and then, as necessary In accordance with the present invention, after a conductive treatment such as electroless plating or metallizing treatment is applied, metal electroplating may be performed.

여기서, Pd/Sn 콜로이드 촉매 흡착 촉진제를 가함으로서 아라미드 섬유 등의 표면에 Pd/Sn 콜로이드 촉매의 흡착량을 증가시킬 수 있다. 그 결과, 추후의 전기도금에서의 석출성을 향상시켜 양호한 도금을 시행할 수 있다.Here, by adding a Pd/Sn colloidal catalyst adsorption accelerator, it is possible to increase the adsorption amount of the Pd/Sn colloidal catalyst on the surface of aramid fibers or the like. As a result, good plating can be performed by improving precipitation in subsequent electroplating.

상기 팔라듐 /주석(Pd/Sn) 콜로이드 촉매 흡착 촉진제는 브롬화리튬, 브롬화나트륨, 브롬화알루미늄, 브롬화칼륨, 브롬화칼슘, 브롬화스트론튬, 브롬화주석(II), 브롬화 세슘, 브롬화바륨, 브롬화수소산, 브롬화규소(IV), 브롬화바나듐(III), 브롬화망간(II), 브롬화철(II), 브롬화 코발트(II), 브롬화니켈(II), 브롬화팔라듐(II) 및 브롬화금(III)으로 이루어진 군에서 선택된 화합물의 어느 하나인, 브롬이온을 생성하는 브롬화합물을 유효성분으로서 함유할 수 있다. 상기 브롬화합물의 양은 브롬이온 농도로서 1∼100g/L이다.The palladium/tin (Pd/Sn) colloidal catalyst adsorption promoter is lithium bromide, sodium bromide, aluminum bromide, potassium bromide, calcium bromide, strontium bromide, tin(II) bromide, cesium bromide, barium bromide, hydrobromic acid, silicon bromide ( IV), vanadium (III) bromide, manganese (II) bromide, iron (II) bromide, cobalt (II) bromide, nickel (II) bromide, palladium (II) bromide and gold (III) bromide Any one of the bromine compounds that generate bromine ions may be contained as an active ingredient. The amount of the bromine compound is 1-100 g/L as a bromine ion concentration.

필요에 따라 제1 도금층(220)은 도전성을 높이기 위해서 무전해 구리로 형성할 수 있다.If necessary, the first plating layer 220 may be formed of electroless copper to increase conductivity.

또한, 필요에 따라 상기 제1 도금층(220)은 내부식성 및 환경특성을 높이기 위해서 무전해 니켈 도금으로 형성할 수도 있다.In addition, if necessary, the first plating layer 220 may be formed by electroless nickel plating in order to improve corrosion resistance and environmental characteristics.

다음, 상기 제1 도금층(220) 위에 양이온을 코팅하는 단계(S230)를 수행한다. 여기서, 보통은 하기 단계에서 산화그래핀(GO)용액에 처리하기 전에 산화그래핀(GO)가 마이너스를 띄고 있기 때문에 미리 제1 도금층(220) 표면에 양이온부착 공정을 미리 수행한다.Next, a step (S230) of coating the cations on the first plating layer 220 is performed. Here, since the graphene oxide (GO) is negative before processing in the graphene oxide (GO) solution in the following step, a cation attachment process is performed in advance on the surface of the first plating layer 220 in advance.

예를 들어, 제1 도금층(220)을 양이온성을 나타내는 폴리에틸렌이민(Polyethyleneimine, PEI) 용액에 담궈 코팅되게 한 후 건조시킬 수 있다. For example, the first plating layer 220 may be immersed in a cationic polyethyleneimine (PEI) solution to be coated, and then dried.

다음, 상기 양이온이 코팅된 제1 도금층(220)에 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시키는 단계(S240)를 수행한다.Next, a step (S240) of forming a graphene oxide layer on the cation-coated first plating layer 220 and reducing the graphene oxide is performed.

이 단계는 RGO로 환원하는 과정에 의해 도 7의 그래핀 코팅층(230)을 형성하는 것으로서, 여기서 사용되는 환원제는 여러 가지가 있다.In this step, the graphene coating layer 230 of FIG. 7 is formed by the process of reduction to RGO, and there are various reducing agents used here.

구체적으로 상기 양이온이 코팅된 제1 도금층(220)을 아민계용액과 접촉시키되, 농도는 0.1~3g/L, 온도는 40~80도, 시간은 3~10분으로 한다.Specifically, the cation-coated first plating layer 220 is brought into contact with an amine-based solution, the concentration is 0.1 to 3 g/L, the temperature is 40 to 80 degrees, and the time is 3 to 10 minutes.

그리고나서, 그래핀옥사이드 용액에 접촉시키되, pH3~6, 5~10분, 35~80도, 0.1~1g/L이다. 이때, 그래핀산화물은 아민화합물에 흡착된다.Then, it is brought into contact with the graphene oxide solution, pH 3 to 6, 5 to 10 minutes, 35 to 80 degrees, 0.1 to 1 g/L. At this time, the graphene oxide is adsorbed to the amine compound.

그리고나서, 환원용액이 산화그래핀층을 환원시킨다. 이때, pH3~10, 5~10분, 60~90분, 0.5~2M이다. Then, the reducing solution reduces the graphene oxide layer. At this time, the pH is 3 to 10, 5 to 10 minutes, 60 to 90 minutes, 0.5 to 2M.

그리고 환원제는 GO를 rGO로 환원시켜 환원된 층을 갖게 한다. 이때, 환원제는 SnCl2, NaHPO4, Hl, HN2NH2, 아스코르빈산 우레아, 헤파린, 아미노산, 갈산, 티오펜, 아닐린 중 하나일 수 있다.And the reducing agent reduces GO to rGO to have a reduced layer. In this case, the reducing agent may be one of SnCl2, NaHPO4, Hl, HN2NH2, urea ascorbate, heparin, amino acid, gallic acid, thiophene, and aniline.

필요에 따라 그래핀 코팅층(230)은 화학기상증착방법(Chemical Vapor Deposition: CVD)에 의해서 합성될 수 있다. 예컨대, 제1 도금층(220) 등의 촉매 금속선과 탄소를 포함하는 가스(CH4, C2H2, C2H4, CO 등)을 챔버에 넣고 가열함으로써, 촉매 금속선에 탄소가 흡수되도록 한다. 이어, 급속히 냉각을 수행하여 탄소를 결정화시키는 방법으로 그래핀 코팅층(230)을 합성할 수도 있다.If necessary, the graphene coating layer 230 may be synthesized by chemical vapor deposition (CVD). For example, the catalyst metal wire such as the first plating layer 220 and a gas (CH4, C2H2, C2H4, CO, etc.) containing carbon are put into the chamber and heated, so that carbon is absorbed by the catalyst metal wire. Then, the graphene coating layer 230 may be synthesized by rapidly cooling to crystallize carbon.

다음, 상기 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시켜 형성된 상기 그래핀 코팅층(230)에 전기 도금으로 제2 도금층(240)을 형성하는 단계(S250)를 수행한다.Next, a step (S250) of forming the second plating layer 240 by electroplating on the graphene coating layer 230 formed by forming the graphene oxide layer and reducing the graphene oxide is performed.

여기서, 전자기 차폐용(EMI shield)으로만 사용한다면 RGO로 표면을 마무리하는 상기 단계(S240)까지만 수행해도 되며, 접지(Ground)에 연결해야 한다면 납땜이 필요하기 때문에 본 단계(S250)를 수행하는 것이 바람직하다.Here, if it is used only as an electromagnetic shield (EMI shield), it is only necessary to perform only the above step (S240) of finishing the surface with RGO, and if it needs to be connected to the ground, soldering is required, so performing this step (S250) it is preferable

본 단계(S250)는 도 7과 같은 제2 도금층(240)으로 주석 또는 은(Silver)으로 도금을 진행한다.In this step ( S250 ), plating is performed with tin or silver as the second plating layer 240 as shown in FIG. 7 .

다음, 상기 제2 도금층(240)에 형성되는 산화방지제층(250)을 형성하는 단계(S260)를 수행한다.Next, the step of forming the antioxidant layer 250 formed on the second plating layer 240 (S260) is performed.

본 단계(S260)에서는 산화를 방지하기 위해 산화방지제를 이용하여 제2 도금층(240)에 산화방지제를 도포하여 도 8과 같은 산화방지제층(250)을 형성한다.In this step (S260), an antioxidant is applied to the second plating layer 240 using an antioxidant to prevent oxidation, thereby forming the antioxidant layer 250 as shown in FIG. 8 .

필요에 따라 산화 방지제는 금속 크롬 분말 20-70중량%, 알루미나 분말 1-20중량%, 점결제 2.5-25중량%, 용매 10-50중량% 및 소포제 0.5-1.5중량%,로 이루어진 산화 방지제를 사용하여 고온에서 특히 산화를 방지할 수 있다. 이외에도 다양한 산화방지제츨 이용할 수 있다. Optionally, the antioxidant is an antioxidant consisting of 20-70% by weight of metallic chromium powder, 1-20% by weight of alumina powder, 2.5-25% by weight of a binder, 10-50% by weight of a solvent and 0.5-1.5% by weight of an antifoaming agent. It can be used to prevent oxidation, especially at high temperatures. In addition, various antioxidants are available.

이렇게 제조된 와이어는 도 1의 동축 케이블에 사용될 수 있다.The wire thus manufactured may be used in the coaxial cable of FIG. 1 .

본 발명의 실시예에 따른 동축 케이블은,A coaxial cable according to an embodiment of the present invention,

중심도체(110);central conductor 110;

상기 중심도체를 감싸며 일정 두께를 가진 유전층(120);a dielectric layer 120 surrounding the central conductor and having a predetermined thickness;

상기 유전층을 감싸며, 상기 중심도체와 동축상에 형성된 1차 쉴드층(130, 140);a primary shield layer (130, 140) surrounding the dielectric layer and formed coaxially with the central conductor;

2차 쉴드층(145);secondary shield layer 145;

상기 2차 쉴드층(145)을 감싸는 외피(150)를 포함하고,and an outer shell 150 surrounding the secondary shield layer 145,

상기 2차 쉴드층(145)은 복수의 와이어를 감는 구조로 이루어지고,The secondary shield layer 145 has a structure in which a plurality of wires are wound,

상기 와이어는,The wire is

아라미드섬유로 이루어지는 코어층(210);A core layer 210 made of aramid fibers;

상기 코어층(210)의 외부에 형성되는 제1 도금층(220);a first plating layer 220 formed outside the core layer 210;

상기 제1 도금층(220)에 그래핀으로 코팅되는 그래핀 코팅층(230);a graphene coating layer 230 coated with graphene on the first plating layer 220;

상기 그래핀 코팅층(230)에 형성되는 제2 도금층(240);a second plating layer 240 formed on the graphene coating layer 230;

상기 제2 도금층(240)에 형성되는 산화방지제층(250)를 포함한다.and an antioxidant layer 250 formed on the second plating layer 240 .

본 발명의 실시예에서는, 아라미드섬유에 제1 도금층을 형성하고, 그 위에 그래핀층을 형성 후에 다시 제2 도금층을 형성함으로써 전도성을 향상하여 EMI 차폐 효율을 올리고 솔더성을 향상할 수 있다.In an embodiment of the present invention, a first plating layer is formed on the aramid fiber, and a second plating layer is formed again after forming a graphene layer thereon to improve conductivity, thereby increasing EMI shielding efficiency and improving solderability.

또한, 본 발명의 실시예에서는, 아라미드 섬유에 도금된 와이어를 은도금된 구리와이어 또는 주석도금된 구리 와이어 대신해서 사용함으로써 무게도 가벼워지고 와이어 형태여서 유연성이 있어서 전자기파폐 특성도 좋아진다.In addition, in an embodiment of the present invention, by using a wire plated on an aramid fiber instead of a silver-plated copper wire or a tin-plated copper wire, the weight is lightened and the electromagnetic shielding properties are also improved because it is flexible in the form of a wire.

또한, 본 발명의 실시예에서는, 내부식성 및 환경 특성을 높일 수 있다.In addition, in the embodiment of the present invention, corrosion resistance and environmental characteristics can be improved.

또한, 본 발명의 실시예에서는, 무게를 줄이면서도 전자파 차폐의 영향을 줄일 수 있다.In addition, in the embodiment of the present invention, it is possible to reduce the influence of electromagnetic wave shielding while reducing the weight.

본 발명에서 개시된 기술의 일실시예는 이해를 돕기 위하여 도면에 도시된 실시예를 참고로 설명되었으나, 이는 예시적인 것에 불과하며, 당해 분야에서 통상적 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 타 실시예가 가능하다는 점을 이해할 것이다. 따라서, 개시된 기술의 진정한 기술적 보호범위는 첨부된 특허청구범위에 의해 정해져야 할 것이다.One embodiment of the technology disclosed in the present invention has been described with reference to the embodiment shown in the drawings for better understanding, but this is only exemplary, and those of ordinary skill in the art may make various modifications and equivalents therefrom. It will be appreciated that embodiments are possible. Accordingly, the true technical protection scope of the disclosed technology should be defined by the appended claims.

Claims (7)

삭제delete 삭제delete 삭제delete 삭제delete 삭제delete 아라미드섬유로 된 코어층의 표면을 알카리로 표면식각을 하고 양이온 부착하는 단계;
양이온이 부착된 코어층을 Pd/Sn 콜로이드 용액 처리 후에 Pd 금속화 처리하여 도금을 진행하여 제1 도금층을 형성하는 단계;
상기 제1 도금층 위에 양이온을 코팅하는 단계;
상기 양이온이 코팅된 제1 도금층에 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시키는 단계;
상기 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시켜 형성된 그래핀 코팅층에 전기 도금으로 제2 도금층을 형성하는 단계;
상기 제2 도금층에 산화방지제층을 형성하는 단계를 포함하며,

상기 제1 도금층을 형성하는 단계는,
상기 아라미드섬유에 상기 제1 도금층을 형성시키기 위해서 표면에 팔라듐-주석 콜로이드 촉매를 석출시키는 캐타라이징 처리를 행하고, 그런 다음, 무전해도금 또는 메타라이징 처리를 가한 후, 금속 전기도금을 시행하되,
상기 팔라듐-주석 콜로이드 촉매 흡착 촉진제를 가함으로서 아라미드 섬유 의 표면에 팔라듐-주석 콜로이드 촉매의 흡착량을 증가시키고,
상기 팔라듐-주석 콜로이드 촉매 흡착 촉진제는 브롬화리튬, 브롬화나트륨, 브롬화알루미늄, 브롬화칼륨, 브롬화칼슘, 브롬화스트론튬, 브롬화주석(II), 브롬화 세슘, 브롬화바륨, 브롬화수소산, 브롬화규소(IV), 브롬화바나듐(III), 브롬화망간(II), 브롬화철(II), 브롬화 코발트(II), 브롬화니켈(II), 브롬화팔라듐(II) 및 브롬화금(III)으로 이루어진 군에서 선택된 화합물의 어느 하나인, 브롬이온을 생성하는 브롬화합물을 유효성분으로서 함유할 수 있고,

상기 양이온이 코팅된 제1 도금층에 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시키는 단계는,
상기 양이온이 코팅된 상기 제1 도금층을 아민계용액과 접촉시키고 나서,
그래핀옥사이드 용액에 접촉시켜 산화그래핀층을 환원시키게 하는 것을 특징으로 하고,

상기 그래핀옥사이드층을 형성하고 그래핀옥사이드를 환원시켜 형성된 그래핀 코팅층에 전기 도금으로 제2 도금층을 형성하는 단계에서,
상기 제2 도금층은 주석 또는 은(Silver)으로 도금을 진행하고,

상기 제2 도금층에 산화방지제층을 형성하는 단계에서 사용되는,
산화 방지제는 금속 크롬 분말, 알루미나 분말, 점결제, 용매 및 소포제로 이루어지는 것을 특징으로 하는
도전성 아라미드섬유를 이용한 와이어의 제조방법.
Surface-etching the surface of the core layer made of aramid fibers with alkali and attaching cations;
forming a first plating layer by plating the core layer to which the cations are attached by Pd metallization after treatment with a Pd/Sn colloidal solution;
coating a cation on the first plating layer;
forming a graphene oxide layer on the cation-coated first plating layer and reducing the graphene oxide;
forming the graphene oxide layer and forming a second plating layer on the graphene coating layer formed by reducing the graphene oxide by electroplating;
Forming an antioxidant layer on the second plating layer,

The step of forming the first plating layer,
In order to form the first plating layer on the aramid fiber, the palladium-tin colloidal catalyst is deposited on the surface of the catalyzing treatment to precipitate, and then, electroless plating or metallizing treatment is applied, followed by metal electroplating,
By adding the palladium-tin colloidal catalyst adsorption accelerator to increase the adsorption amount of the palladium-tin colloidal catalyst on the surface of the aramid fiber,
The palladium-tin colloidal catalyst adsorption promoter is lithium bromide, sodium bromide, aluminum bromide, potassium bromide, calcium bromide, strontium bromide, tin(II) bromide, cesium bromide, barium bromide, hydrobromic acid, silicon(IV) bromide, vanadium bromide. (III), manganese (II) bromide, iron (II) bromide, cobalt (II) bromide, nickel (II) bromide, any one of a compound selected from the group consisting of palladium (II) bromide and gold (III) bromide, It may contain a bromine compound that generates bromine ions as an active ingredient,

The step of forming a graphene oxide layer on the cation-coated first plating layer and reducing the graphene oxide,
After contacting the first plating layer coated with the cations with an amine-based solution,
It is characterized in that the graphene oxide layer is reduced by contacting the graphene oxide solution,

In the step of forming the graphene oxide layer and forming a second plating layer by electroplating on the graphene coating layer formed by reducing the graphene oxide,
The second plating layer is plated with tin or silver,

Used in the step of forming an antioxidant layer on the second plating layer,
The antioxidant is characterized in that it consists of metal chromium powder, alumina powder, a binder, a solvent and an antifoaming agent.
A method of manufacturing a wire using conductive aramid fibers.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102630822B1 (en) * 2023-07-03 2024-01-29 다나눔패션 주식회사 Manufacturing method of conductive acrylic fiber and conductive acrylic fiber manufactured thereby

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160054103A (en) * 2014-11-05 2016-05-16 엘에스전선 주식회사 fiber braided cable
KR20170142556A (en) 2016-06-20 2017-12-28 박준영 RF coaxial cable
KR20200144529A (en) * 2018-12-10 2020-12-29 넥쌍 High-shielding light-weight cables including shielding layer of polymer-carbon composite

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Publication number Priority date Publication date Assignee Title
KR20160054103A (en) * 2014-11-05 2016-05-16 엘에스전선 주식회사 fiber braided cable
KR20170142556A (en) 2016-06-20 2017-12-28 박준영 RF coaxial cable
KR20200144529A (en) * 2018-12-10 2020-12-29 넥쌍 High-shielding light-weight cables including shielding layer of polymer-carbon composite

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102630822B1 (en) * 2023-07-03 2024-01-29 다나눔패션 주식회사 Manufacturing method of conductive acrylic fiber and conductive acrylic fiber manufactured thereby

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