KR102426352B1 - Multi-stage baffle type gas-liquid contact apparatus - Google Patents

Abstract

The present invention relates to a gas-liquid contact device within a chemical solution contact-type deodorizer, wherein the efficiency of contact between gas containing odor and a chemical solution absorbing odor components is improved to enhance an effect of deodorizing odor components included in gas occurring in a sewage treatment plant, a livestock excreta treatment plant, an excreta treatment plant, a wastewater treatment plant, and the like. The multi-stage baffle-type gas-liquid contact device (A) of the present invention comprises: a gas inlet pipe (10) having an inlet (11) into which gas containing odor components to be treated is introduced, and an outlet (12) through which the introduced gas is discharged, wherein the outlet (12) is vertically disposed to face downward; a primary gas-liquid contact unit (13) injecting a chemical solution to an inside of the gas inlet pipe (10) so that the chemical solution comes in contact; a tertiary gas-liquid contact unit (30) injecting the chemical solution to gas to make the chemical solution come in contact while the gas passes through a secondary gas-liquid contact unit (31-1) which generates bubbles within the chemical solution in a primary chemical solution storage tank to make the chemical solution come in contact with the gas discharged through the outlet (12) and at the same time, turns the gas, and then is discharged through a gas channel; and a quinary gas-liquid contact unit (104) disposed coaxially on a lower side of the tertiary gas-liquid contact unit (30) to inject the chemical solution through a third chemical solution spraying nozzle (N3) while the gas discharged from the tertiary gas-liquid contact unit (30) comes in contact with the chemical solution in the quaternary after bubbles are generated within the chemical solution and is discharged through the gas channel.

Description

Multi-stage baffle type gas-liquid contact device {MULTI-STAGE BAFFLE TYPE GAS-LIQUID CONTACT APPARATUS}

The present invention relates to a gas-liquid contact device in a chemical-liquid contact deodorizer, and to improve the deodorizing effect of odor components contained in gas generated in a sewage treatment plant, livestock excreta treatment plant, excreta treatment plant, or wastewater treatment plant, etc. Gas containing odor And it relates to a gas-liquid contact device that improves the contact efficiency of the chemical solution for absorbing the odor component.

Basic environmental facilities such as sewage treatment plants, incinerators, food waste treatment facilities, and landfills generate air pollutants and odors. The odor generated in the environmental infrastructure refers to a gas component that stimulates the mind and nervous system of a person and causes pain in terms of emotional life and health. , acetaldehyde, styrene, etc., and the concentration of these substances is regulated and controlled by law.

In order to remove such odors, various gas-liquid contact deodorizing devices and methods are currently being researched and developed. As a representative method, the chemical cleaning method is a method of cleaning odorous substances that are not very soluble in water but react with an aqueous solution of acid or alkali or that react with a specific chemical with an acid or alkali cleaning solution. In this method, ammonia, amines, Removes odorous substances such as hydrogen sulfide and methyl mercaptan.

In the gas-liquid contact deodorizing device, various gas-liquid contact devices have been developed and proposed to increase the contact efficiency between a gas component including an odor and a liquid to absorb the odor component (see Patent Document 1).

In the case of the gas-liquid contact device of Patent Document 1, in order to evenly spread the cleaning solution over the entire cross-sectional area of the gas-liquid contact space, a sponge (a kind of filler) dripping method or an even distribution module 6 of a perforated plate method is used. . However, in this uniform distribution module (6) method, the contact efficiency is reduced because the partition walls between the holes of the sponge tissue or the perforated plate block the passage (channel) through which the gases to be cleaned pass, thereby reducing the contact area between the gas and the liquid. low. In addition, since the total cross-sectional area of the passage (channel) through which the gases pass is reduced to generate pressure, there is a disadvantage in that the scale of the facility increases, such as having to use a high-output blower for the passage of the gas.

In addition, the gas-liquid contact device of Patent Document 1 has a disadvantage in that the overall scale of the facility increases because a plurality of bulky fillers are arranged and used.

KR10-1512459B

Accordingly, the present invention increases the contact area between the gas and the liquid by preventing the total cross-sectional area of the flow passage through which the gas passes from being reduced, and increases the contact efficiency between the gas and the liquid by increasing the contact area between the gas and the liquid within a predetermined space. An object of the present invention is to provide a multi-stage baffle type gas-liquid contact device capable of increasing efficiency.

Another object of the present invention is to provide a multi-stage baffle-type gas-liquid contacting device that increases the contact efficiency with the liquid by forming a vortex in the gas in contact with the liquid.

A multi-stage baffle type gas-liquid contact device of the present invention for achieving the above object,

a gas inlet pipe having an inlet through which a gas containing a malodorous component to be treated is introduced and an outlet through which the introduced gas is discharged, the gas inlet pipe being vertically disposed such that the outlet faces vertically downward;

A transverse swirl flow baffle plate and a vane are installed on the path through which the gas inside the gas inlet pipe passes, and the transverse swirl flow baffle plate inside the gas inlet pipe through the first chemical solution injection nozzle of the primary chemical solution supply pipe and a primary gas-liquid contact unit for introducing a chemical liquid rotating in the transverse direction by being sprayed onto the vane into the gas inlet pipe and contacting the gas flowing toward the outlet;

A secondary gas-liquid contact part 31-1 disposed coaxially on the lower side of the primary gas-liquid contacting part, causing the gas passing through the primary gas-liquid contacting part to flow into the stored chemical to generate bubbles in the chemical, and contacting the gas and the chemical. ;

a primary chemical solution supply pipe for supplying a chemical solution to the first gas-liquid contact part;

a tertiary gas-liquid contact unit 30 for spraying and contacting the gas with a chemical liquid while the gas passing through the secondary gas-liquid contact unit is discharged along the gas flow path;

The tertiary gas-liquid contact part is disposed coaxially on the lower side of the tertiary gas-liquid contacting part 30, and the gas passing through the tertiary gas-liquid contacting part 30 flows into the stored chemical to generate bubbles in the chemical and at the same time swirl to make contact with the chemical. (40); and

It is characterized in that it includes an error gas-liquid contact part 104 for contacting the chemical liquid injected from the third chemical liquid injection nozzle (N3) while discharging the gas that has passed through the quaternary gas-liquid contact part through the gas passage.

The secondary gas-liquid contact portion,

The chemical liquid injected from the primary gas-liquid contact part is stored, and the gas inlet pipe is disposed coaxially below the outlet port of the gas inlet pipe so that the outlet of the gas inlet pipe is immersed in the stored chemical solution, and the gas passing through the primary gas-liquid contact unit is the gas a primary chemical storage tank flowing into the stored chemical through the outlet of the inlet pipe to generate bubbles in the stored chemical;

a primary baffle plate provided at the bottom of the primary chemical storage tank and having a plurality of orbiting guide vanes for guiding the gas bubbles to swing in the chemical in the primary chemical storage tank; and

a downward gas flow path for guiding a gas discharged from the chemical of the primary chemical storage tank through an upward gas flow path downward to an upper cover and guiding it to an outlet at a lower end; and

and an upper casing in which the gases of the upward gas passage and the downward gas passage come into contact with the chemical liquid sprayed from the second chemical liquid injection nozzle provided on the upper cover.

The quaternary gas-liquid contact part,

The chemical liquid injected from the tertiary gas-liquid contact part is stored, and the outlet of the downward gas flow path of the upper casing is disposed coaxially below the outlet of the upper casing so as to be submerged in the stored chemical, so that the gas passes through the outlet of the upper casing a secondary chemical storage tank flowing into the chemical to generate bubbles in the stored chemical; and

a secondary baffle plate provided at the bottom of the secondary chemical storage tank and having a plurality of rotation guide vanes for guiding the bubbles to swing in the chemical solution; including,

and an error gas-liquid contact part in which the gas discharged upwardly from the chemical liquid of the secondary chemical liquid storage tank to the outside contacts the chemical liquid sprayed from the third chemical liquid injection nozzle of the tertiary chemical liquid supply pipe.

The present invention includes a main body housing, wherein the main body housing has a perforated plate installed in the transverse direction on the lower side of the secondary chemical solution storage tank to form a chemical solution storage space on the lower side, and in this chemical solution storage space, the first chemical solution supply pipe and the second The chemical solution supply pipe and the third chemical solution supply pipe store the falling chemical solution after contacting the gas, and the chemical solution stored in the chemical solution storage space is circulated to the first chemical solution supply pipe, the second chemical solution supply pipe, and the third chemical solution supply pipe. It is characterized in that the chemical liquid circulation pump is connected.

According to the present invention, after the gas in the gas inlet pipe is in primary contact with the chemical liquid injected by the injection nozzle, it flows into the stored chemical liquid in the primary chemical liquid storage tank to generate bubbles, and at the same time, the gas in the bubble state is generated in the stored chemical liquid. Since it comes into contact with the liquid while flowing in a swirling flow by the orbiting guide vanes of the baffle plate, the efficiency of contact with the liquid is increased, thereby increasing the efficiency of removing odors contained in the gas.

In addition, as described above, the gas-liquid contacting part that comes into contact with the chemical sprayed by the chemical liquid injection nozzle and the bubble-gas-liquid contacting part for contacting the gas and liquid by flowing into the chemical liquid stored in the chemical liquid storage tank to form bubbles are coaxially located at the lower end of the gas inlet. By the structure arranged in multiple stages, it is possible to reduce the installation area and make the equipment size compact, so that the odor removal device can be installed without limitation in the place.

1 shows a schematic configuration diagram of a deodorizing device installed with a multi-stage baffle-type gas-liquid contact device of the present invention.
2 is a partial detailed view showing the configuration of the swirl flow generating baffle mechanism installed in the gas inlet pipe of the gas-liquid contact device of the present invention.
3 is a plan view of the swirl flow generating baffle mechanism of FIG. 2 installed in the gas inlet pipe.
4 is a longitudinal cross-sectional view showing the configuration of a multi-stage baffle type gas-liquid contact device of the present invention.
5 is a partial longitudinal cross-sectional view showing in detail the primary chemical liquid storage tank and the secondary chemical liquid storage tank in the multi-stage baffle type gas-liquid contact device of the present invention shown in FIG.
6 is a partially cut-away perspective view of a multi-stage baffle type gas-liquid contact device according to the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Hereinafter, 'upper', 'lower', 'upper', and 'lower' used to indicate directions and positions are used for convenience of description of the present invention, and are not intended to limit the scope of the present invention. .

As used herein, 'gas' refers to a gas containing a malodorous component that is removed by reaction with an aqueous solution of acid or alkali, and 'chemical' refers to a liquid supplied to react with the malodorous component.

Figure 1 shows a schematic configuration diagram of a deodorization device installed with a multi-stage baffle-type gas-liquid contact device of the present invention, Figure 2 shows a swirl flow generating baffle mechanism installed in a gas inlet pipe, Figure 4 is a multi-stage baffle-type gas-liquid device of the present invention It is a longitudinal cross-sectional view showing the schematic configuration of the contact device.

As shown in FIG. 1 , the deodorization device 100 installed with the multi-stage baffle type gas-liquid contact device of the present invention includes a body housing 108 . The inner space of the main body housing 108 includes an upper error gas-liquid contact portion 104 and a lower chemical liquid storage space 102 divided by a lower diaphragm 101 made of a perforated plate. A sidewall of the main body housing 108 is provided with an outlet 103 through which the gas processed in the error gas-liquid contact portion 104 is discharged.

A gas inlet pipe 10 is installed in the error gas-liquid contact portion 104 of the main body housing 108 in a vertical direction. The gas inlet pipe 10 has an inlet 11 at the upper end and an outlet 12 at the lower end.

As shown in FIG. 1 , on the upper side of the error gas-liquid contact part 104 of the main body housing 108 , a third chemical solution supply pipe PL3 for supplying a liquid for contacting the gas flowing into the error gas-liquid contact part 104 ) is installed, and the third chemical liquid supply pipe PL3 is provided with a plurality of third chemical liquid injection nozzles N3 for injecting chemical liquid into the error gas-liquid contact part 104 .

A multi-stage baffle type gas-liquid contact device (A) of the present invention is provided at the lower end of the gas inlet pipe 10 .

As shown in FIGS. 1 and 4, the multi-stage baffle type gas-liquid contacting device (A) of the present invention includes a secondary gas-liquid contacting part 31-1 installed coaxially at the outlet 12 of the gas inlet pipe 10; and a quaternary gas-liquid contact part 40 coaxially provided below the secondary gas-liquid contact part 31-1.

As shown in FIG. 4 , the secondary gas-liquid contact part 31-1 includes a primary chemical liquid storage tank 31 disposed coaxially below the outlet 12 of the gas inlet pipe 10, and the primary chemical liquid storage tank A primary baffle plate 32 installed on the bottom of the ) is configured to include an upper casing 34 installed to cover the upper side.

As shown in FIGS. 4 and 5, the primary chemical storage tank 31 stores the chemical, and the outlet of the gas inlet pipe 10 so that the outlet 12 of the gas inlet pipe 10 is submerged in the chemical solution. (12) is arranged coaxially on the underside. In the primary chemical storage tank 31 , gas flows into the stored chemical through the outlet of the gas inlet pipe 10 to generate bubbles in the stored chemical and to form turbulence while turning.

The upper casing 34 passes through the upper cover 35 for diverting the gas discharged from the chemical of the primary chemical liquid storage tank 31 through the upward gas passage S1 downward, and the upward gas passage S1. It has a downward gas flow path S2 for guiding one gas to an outlet at the bottom, and a second chemical liquid injection nozzle N2 connected to a second chemical liquid supply pipe PL2 is installed on the upper cover 35, and the second The chemical liquid injection nozzle N2 injects the chemical liquid toward the gas passing through the upward gas passage S1 and the downward gas passage S2.

The quaternary gas-liquid contact part 40,

A chemical solution is stored, and a secondary chemical solution storage tank 41 disposed coaxially below the outlet of the upper casing 34, is provided at the bottom of the secondary chemical solution storage tank 41, and a plurality of turning guide lower vanes on the upper surface ( 43) with a secondary baffle plate (42).

The secondary chemical liquid storage tank 41 is disposed under the upper casing 34 so that the lower end having the outlet of the upper casing 34 is immersed in the chemical liquid of the secondary chemical liquid storage tank 41, so that the gas is in the upper casing ( 34) is introduced into the chemical solution through the outlet to generate bubbles in the stored chemical solution.

The gas discharged upward from the chemical liquid in the secondary chemical liquid storage tank 41 is brought into contact with the chemical liquid sprayed from the third nozzle N3 to remove odors contained in the gas.

1 to 3, a first chemical solution supply pipe PL1 for supplying a chemical solution to the gas introduced therein is connected to the gas inlet pipe 10, and the lower side of the first chemical solution supply pipe PL1 In the vortex flow generating mechanism 20 is provided. The swirl flow generating mechanism 20 includes a swirl flow baffle plate 21 installed in the transverse direction of the first chemical solution supply pipe PL1 and a plurality of vanes 22 provided on the upper surface of the swirl flow baffle plate 21 . is composed of The swirl flow generating mechanism 20 causes the chemical solution supplied from the first chemical solution supply pipe PL1 to the inside of the gas inlet pipe 10 to collide with the vane 22 to form a swirl flow.

In the chemical storage space 102 , the chemical solution supplied from the first chemical solution supply pipe PL1 to the second chemical solution supply pipe PL2 and the third chemical solution supply pipe PL3 and in contact with the gas falls and is stored. In the chemical solution storage space 102, the chemical solution stored in the chemical solution storage space 102 is circulated to the first chemical solution supply pipe (PL1), the second chemical solution supply pipe (PL2), and the third chemical solution supply pipe (PL3). The pump P1 is connected.

A: Multi-stage baffle type gas-liquid contact device N1: First chemical liquid injection nozzle
N2: second chemical liquid injection nozzle N3: third chemical liquid injection nozzle
P1: chemical liquid circulation pump PL1: first chemical liquid supply pipe
PL2: second chemical solution supply pipe PL3: third chemical solution supply pipe
S1: Upstream gas flow path
S2: Downward gas flow path 10: Gas inlet pipe
11: inlet 12: outlet
13. Primary gas-liquid contact
20: swirl flow generating mechanism 21: swirl flow baffle plate
22: vane 30: tertiary gas-liquid contact
31: primary chemical liquid storage tank 31-1: secondary gas-liquid contact part
32: primary baffle plate
33: slewing guide vane 34: upper casing
35: top cover 40: quaternary gas-liquid contact part
41: secondary chemical storage tank 42: secondary baffle plate
43: swivel guide lower vane 100: deodorization device
101: lower diaphragm 102: chemical storage space
103: outlet 104: error gas-liquid contact portion
108: body housing

Claims (6)

A multi-stage baffle type gas-liquid contact device comprising:
A main body housing 108 provided with a discharge port 103 for discharging the cleaned gas to the outside at the upper end of the side wall, and a chemical storage space 102 at the lower end;
An inlet 11 through which the gas containing the odor component to be treated is introduced, and an outlet 12 through which the gas introduced through the inlet 11 flows out at a lower end, and the outlet 12 is connected to the body housing a gas inlet pipe 10 vertically disposed inside the body housing 108 so as to face the lower portion of the 108;
A primary gas-liquid contacting part ( 13);
A primary chemical liquid storage tank 31 for storing the chemical liquid is provided, and the outlet 12 of the gas inlet pipe 10 is immersed in the stored chemical of the primary chemical liquid storage tank 31, the gas inlet pipe 10 a secondary gas-liquid contacting part 31-1 for turning the gas flowing out through the outlet 12 of the primary chemical liquid storage tank while generating bubbles in the chemical liquid while in contact with the chemical;
After passing through the secondary gas-liquid contact part 31-1, the gas discharged along the gas flow path provided outside the primary chemical liquid storage tank 31 is supplied through the second chemical liquid supply pipe PL2, and the second chemical liquid is injected. a tertiary gas-liquid contact part 30 for contacting the chemical liquid sprayed from the nozzle N2; and
A secondary chemical liquid storage tank 41 disposed coaxially on the lower side of the tertiary gas-liquid contact part 30 and storing a chemical solution, and the gas passing through the tertiary gas-liquid contact part 30, the chemical solution of the secondary chemical liquid storage tank 41 The quaternary gas-liquid contact unit 40 for contacting the chemical with the chemical while generating bubbles in the chemical; and
An error gas-liquid contact part ( 104); a multi-stage baffle-type gas-liquid contact device comprising a. According to claim 1,
The primary chemical liquid storage tank 31 of the secondary gas-liquid contact part 31-1 is disposed coaxially below the outlet 12 of the gas inlet pipe 10,
At the bottom of the primary chemical storage tank 31, a plurality of turning guide vanes 33 are provided, and a primary baffle plate 32 is installed to guide gas bubbles generated in the chemical solution in the primary chemical storage tank 31 to turn. becomes,
A multi-stage baffle-type gas-liquid contact device in which an upper casing 34 covering the primary chemical liquid storage tank 31 is installed on the upper side of the primary chemical storage tank 31 . 3. The method of claim 2,
The upper casing 34 passes through the upper cover 35 for diverting the gas discharged from the chemical of the primary chemical liquid storage tank 31 through the upward gas passage S1 downward, and the upward gas passage S1. and a downward gas flow path (S2) for guiding one gas to the outlet at the bottom,
A second chemical liquid injection nozzle N2 of the second chemical liquid supply pipe PL2 is installed on the upper cover 35, and the second chemical liquid injection nozzle N2 includes an upward gas flow path S1 and a downward gas flow path S2. ) a tertiary gas-liquid contact unit 30 for contacting by spraying a chemical liquid toward the gas passing through; a multi-stage baffle type gas-liquid contacting device provided with. 3. The method of claim 2,
The quaternary gas-liquid contact part 40 is provided with a secondary baffle plate 42 having a plurality of turning guide lower vanes 43 at the bottom of the secondary chemical liquid storage tank 41,
The lower end of the upper casing 34 is disposed to be submerged in the chemical solution of the secondary chemical solution storage tank 41, and the gas passing through the lower end of the upper casing 34 flows into the chemical solution of the secondary chemical solution storage tank 41 and bubbles A multi-stage baffle-type gas-liquid contacting device for generating and turning the bubble into a turning guide lower vane (43) of the secondary baffle plate (42). According to claim 1,
In the primary gas-liquid contact part 13, the first chemical solution supply pipe PL1 is inserted, and a swirl flow generating mechanism 20 is provided at the lower end of the tip of the first chemical solution supply pipe PL1,
The swirl flow generating mechanism 20 is installed in the transverse direction inside the gas inlet pipe 10 and includes a swirl flow baffle plate 21 having a plurality of vanes 22 on its upper surface, and the first A multi-stage baffle-type gas-liquid contact device for generating a swirling flow by turning the chemical solution supplied from the chemical solution supply pipe (PL1) into the gas inlet pipe 10 while collided with the vane 22. According to claim 1,
A lower diaphragm 101 made of a perforated plate is installed on the lower side of the secondary chemical storage tank 41 in the transverse direction of the main body housing 108, and the lower diaphragm 101 includes the first chemical solution supply pipe (PL1), the The chemical solution supplied from the second chemical solution supply pipe PL2 and the third chemical solution supply pipe PL3 is passed through the falling chemical solution after contacting the gas to be stored in the chemical solution storage space 102, and the chemical solution storage space 102 has A multi-stage baffle-type gas-liquid contact device connected to a chemical liquid circulation pump (P1) for circulating the stored chemical to the first chemical solution supply pipe (PL1), the second chemical solution supply pipe (PL2), and the third chemical solution supply pipe (PL3), respectively.

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