KR102407388B1 - Antenna structure for generating inductively coupled plasma - Google Patents

Abstract

The present invention provides a first antenna unit including an antenna formed in a rectangular spiral outward from a central point; and a second antenna unit including the first antenna unit and an antenna forming a symmetrical structure with respect to the central point, wherein each loop at each corner of the quadrangular spiral of the antenna included in the first antenna unit and the second antenna unit is included. It provides an antenna structure for generating an inductively coupled plasma, characterized in that it comprises a (loop).
The present invention provides a first antenna unit including an antenna formed in a rectangular spiral outward from a central point; a second antenna unit including the first antenna unit and an antenna forming a symmetrical structure with respect to the central point; a power unit connected to a center point of an antenna of the first antenna unit and the second antenna unit; a ground portion connected to an outer end point of an antenna of the first antenna unit and the second antenna unit; and an antenna support for supporting the antenna so that plasma formed with the antennas of the first antenna unit and the second antenna unit maintains a preset distance, wherein the preset distance is between the antenna, the power unit, and the ground unit. It provides an antenna structure for generating inductively coupled plasma, characterized in that it is determined based on the distance of.

Description

Antenna structure for generating inductively coupled plasma

The present invention relates to an antenna structure for generating inductively coupled plasma.

The content described in this section merely provides background information for the present embodiment and does not constitute the prior art.

In general, the plasma refers to an ionized gas state composed of ions, electrons, radicals, etc., and the plasma is generated by a very high temperature, a strong electric field, or a high frequency electromagnetic field (RF Electromagnetic Fields).

The plasma process is used as one of the essential manufacturing processes used in the semiconductor, display or solar industries. Accordingly, various plasma processing apparatuses have been developed for plasma processing, and as the plasma processing apparatus, a capacitively coupled plasma source, an inductively coupled plasma source and It is classified into a microwave coupled plasma source and the like.

In this case, the inductively coupled plasma source can generate a higher density plasma than the capacitively coupled plasma source, and since the electron temperature is relatively low, it is widely used in various industries.

However, since the antenna structure of the conventional inductively coupled plasma source generates a circular plasma in a circular spiral structure, it is difficult to perform a uniform plasma process for a rectangular substrate. In addition, when the existing spiral structure is deformed into a quadrangle, the distance between the antennas at the corners increases, thereby weakening the strength of the induced electric field.

Accordingly, the present invention intends to propose an antenna structure for generating a rectangular inductively coupled plasma that can be used on a rectangular substrate and has an induced electric field of uniform intensity.

An embodiment of the present invention has an object to provide an antenna structure for generating a rectangular inductively coupled plasma having an induced electric field of uniform intensity.

According to one aspect of the present invention, the first antenna unit including an antenna formed in a rectangular spiral toward the outside from the center point; and a second antenna unit including an antenna forming a symmetrical structure with respect to the first antenna unit and the central point, wherein each loop at each corner of a quadrangular spiral of the antenna included in the first antenna unit and the second antenna unit is provided. It provides an antenna structure for generating an inductively coupled plasma, characterized in that it comprises a (loop).

In addition, according to an aspect of the present invention, the loop is characterized in that it is formed in a rectangular or curved shape.

In addition, according to an aspect of the present invention, the antenna included in the first antenna unit and the second antenna unit is characterized in that it is placed on the same plane.

In addition, according to an aspect of the present invention, the antennas included in the first antenna unit and the second antenna unit are parallel in portions except for the corners and maintain the same distance.

According to one aspect of the present invention, the first antenna unit including an antenna formed in a rectangular spiral toward the outside from the center point; a second antenna unit including the first antenna unit and an antenna forming a symmetrical structure with respect to the central point; a power unit connected to a center point of an antenna of the first antenna unit and the second antenna unit; a ground portion connected to an outer end point of an antenna of the first antenna unit and the second antenna unit; and an antenna support for supporting the antenna so that plasma formed with the antennas of the first antenna unit and the second antenna unit maintains a preset distance, wherein the preset distance is between the antenna, the power unit, and the ground unit. It provides an antenna structure for generating inductively coupled plasma, characterized in that it is determined based on the distance of.

In addition, according to one aspect of the present invention, it is characterized in that it includes a loop (loop) for each corner of the quadrangular spiral of the antenna included in the first antenna unit and the second antenna unit.

In addition, according to an aspect of the present invention, the preset distance is characterized in that the closer the antenna is to the power unit, the shorter.

In addition, according to an aspect of the present invention, the preset distance is characterized in that the closer the antenna to the ground portion is longer.

In addition, according to an aspect of the present invention, the antenna support is characterized in that it has a different length for each part of the antenna in order to maintain the determined predetermined distance.

In addition, according to one aspect of the present invention, the antenna structure for generating inductively coupled plasma is characterized in that it further comprises an antenna shield on which the antenna support for supporting the antenna is installed.

As described above, according to an aspect of the present invention, even when the antenna structure has a quadrangle, there is an advantage that the intensity of the induced electric field of the inductively coupled plasma is constantly maintained throughout the quadrangle.

In addition, according to one aspect of the present invention, since the inductively coupled plasma is used, there is an advantage that a high-density plasma capable of processing a rectangular substrate can be formed.

In addition, according to an aspect of the present invention, when the antenna structure is manufactured in a rectangular shape, there is an advantage in that power distribution is easier compared to an antenna structure manufactured in a circular shape.

In addition, according to one aspect of the present invention, there is an advantage that the density of plasma generated in the rectangular antenna structure is uniform in any part.

1 is a plan view illustrating a general antenna structure.
2 is a view for explaining the intensity of an induced electric field according to an antenna structure formed in a rectangular spiral.
3 is a view for explaining an embodiment of an antenna structure according to an embodiment of the present invention.
4 is a view for explaining the strength of an induced electric field according to an antenna structure according to an embodiment of the present invention.
5 is a plan view illustrating an antenna structure according to an embodiment of the present invention.
6 is a cross-sectional view illustrating a side of an antenna structure according to an embodiment of the present invention.
7 is a view for explaining a change in the density of plasma according to the antenna structure according to the distance between the antenna and the plasma.

Since the present invention can have various changes and can have various embodiments, specific embodiments are illustrated in the drawings and described in detail. However, this is not intended to limit the present invention to specific embodiments, and it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In describing each figure, like reference numerals have been used for like elements.

Terms such as first, second, A, and B may be used to describe various elements, but the elements should not be limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component. and/or includes a combination of a plurality of related listed items or any of a plurality of related listed items.

When a component is referred to as being “connected” or “connected” to another component, it may be directly connected or connected to the other component, but it is understood that other components may exist in between. it should be On the other hand, when a certain element is referred to as being “directly connected” or “directly connected” to another element, it should be understood that no other element is present in the middle.

The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise. It should be understood that terms such as “comprise” or “have” in the present application do not preclude the possibility of addition or existence of features, numbers, steps, operations, components, parts, or combinations thereof described in the specification in advance. .

Unless defined otherwise, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.

Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

In addition, each configuration, process, process or method included in each embodiment of the present invention may be shared within a range that does not technically contradict each other.

1 is a plan view illustrating a general antenna structure.

Referring to FIG. 1 , in a typical antenna structure 100 , two antennas having a circular spiral are formed in a symmetrical structure with respect to central points 110a and 110b. Inductively coupled plasma generating high-density plasma is generated by an induced magnetic field generated by a current flowing in the antenna structure. If the antenna structure is asymmetric, the flowing current becomes asymmetric, so it is difficult to generate a uniform plasma.

In addition, the diameter of the two antennas may be formed to be constant w, and the distance between the antennas forming a circular spiral may be formed to be constant to s. The distance from the center points 110a and 110b of the antenna to the outer end points 120a and 120b of the circular spiral may be formed by r.

That is, in order to maintain the intensity of the generated induced electric field uniformly, the antenna structure must be formed in a circular spiral shape. However, if the antenna structure is formed with a circular spiral, circular plasma is generated, so it cannot be used for a rectangular substrate. Accordingly, the present invention intends to propose an antenna structure that can be used on a rectangular substrate and has a uniform intensity of an induced electric field. Hereinafter, it will be described in detail with reference to FIGS. 3 to 5 .

In addition, the center points 110a and 110b of the two antennas are connected to the RF power source 130 , and the outer end points 120a and 120b are grounded to the ground. The RF power of the RF power source 130 delivers power to the antenna structure 100 through the impedance matching network 140 . In this case, the frequency of the RF power source 130 may be several MHz to several hundreds of MHz. Accordingly, the antenna structure 100 may generate an induced magnetic field or an induced electric field. In this case, the inductive electric field may form an inductively coupled plasma. That is, an inductively coupled plasma may be generated under the antenna structure 100 by the induced electric field.

At this time, when the power supply terminal (110a, 110b in FIG. 1) and the ground terminal (120a, 120b in FIG. 1) supplying power to the antenna by the inductance component of the antenna are near each other, between the power supply terminal and the ground terminal A strong electric field may be generated to create an unintended capacitively coupled plasma, which may increase non-uniformity in the plasma. Accordingly, the present invention is to propose a method for maintaining the density uniformity of plasma

2 is a view for explaining the intensity of an induced electric field according to an antenna structure formed in a rectangular spiral. Hereinafter, descriptions overlapping with those described above in FIG. 1 will be omitted.

FIG. 2(a) is a diagram illustrating an antenna structure formed in a rectangular spiral, and FIG. 2(b) is a graph illustrating the strength of an induced electric field generated in the antenna structure of FIG. 2(a).

Referring to FIG. 2A , when the antenna structure is manufactured in a rectangular spiral shape for use on a rectangular substrate, the distance between the antennas is changed.

More specifically, in the case of a quadrangular spiral, the distance between the antennas is d1 on the side of the antenna, whereas the distance between the antennas is d2 in the corner portions 151 to 158 of the antenna. That is, in the corner portions 151 to 158 of the quadrangular spiral, the distance d2 between the antennas is greater than d1.

Referring to FIG. 2B , it can be seen that when the distances between the antennas are different, the intensity of the generated induced electric field is not uniform. More specifically, it can be seen that the intensity of the induced electric field generated in the corner portions 151 to 158 of the antenna is weaker than the intensity of the induced electric field generated in other portions.

That is, when the conventional circular spiral antenna structure is simply changed to a rectangular spiral, the distance d2 between the antennas becomes farther from the corner portions 151 to 158 . Accordingly, a portion in which the induced electric field is weakly generated occurs, and the generated plasma is not uniform. In order to supplement this, in the present invention, a method of forming a loop in the corner portions 151 to 158 is proposed.

Hereinafter, it goes without saying that the general matters of the antenna structure described above with reference to FIGS. 1 and 2 may be applied in describing the present invention. Therefore, a description that overlaps with the above in FIGS. 1 and 2 will be omitted.

3 is a view for explaining an embodiment of an antenna structure according to an embodiment of the present invention.

Referring to (a) of FIG. 3, the antenna structure 200 for generating inductively coupled plasma includes a first antenna unit 210a including an antenna formed in a rectangular spiral outward from a first central point 220a and a second central point. It may include a second antenna unit 210b including an antenna formed in a rectangular spiral toward the outside from 220b.

In one embodiment of the present invention, the antenna structure 200 for generating inductively coupled plasma is loops 230a, 230b, 240a, 240b) may be included.

More specifically, the first antenna unit 210a and the second antenna unit 210b may be formed in a rectangular spiral as a single coil, and each corner of the rectangular spiral may include loops 230a, 230b, 240a, 240b. can In this case, the loops 230a, 230b, 240a, and 240b may be formed in such a way that the single coil of the antenna turns once.

That is, by forming the loops 230a , 230b , 240a , and 240b at each corner of the square spiral, the intensity of the induced electric field generated in the corner portion may be strengthened. Accordingly, the intensity of the rectangular plasma generated in an embodiment of the present invention may be uniformly generated in the entire area.

In addition, in another embodiment of the present invention, the loops 230a, 230b, 240a, 240b included in the first antenna unit 210a and the second antenna unit 210b are different from the coils constituting the side of the antenna. can be formed.

In an embodiment of the present invention, the loops 230a, 230b, 240a, and 240b may be formed in a rectangular or curved shape. That is, although the loops 230a, 230b, 240a, and 240b are shown in a circular shape in the drawing, it is needless to say that they may be formed in a rectangular or curved shape.

In one embodiment of the present invention, the antennas included in the first antenna unit 210a and the second antenna unit 210b may be placed on the same plane.

In addition, in another embodiment of the present invention, the antenna structure 200 for generating inductively coupled plasma may be implemented on the same plane, and may be formed in three dimensions in a rectangular helical structure such as a DNA structure.

In an embodiment of the present invention, the antennas included in the first antenna unit 210a and the second antenna unit 210b may be parallel to each other except for corners and maintain the same distance. That is, in the portion corresponding to the side except for the corner among the antennas included in the first antenna unit 210a and the second antenna unit 210b, the distance between the antennas is maintained in parallel and at the same distance to uniformly maintain the intensity of the induced electric field. can be obtained

Referring to FIG. 3(b), FIG. 3(b) is a view for explaining an antenna structure 250 for generating inductively coupled plasma in which the number of square spirals is increased, compared to FIG. 3(a).

The antenna structure 250 for generating inductively coupled plasma of FIG. 3B also includes a symmetrical antenna formed in a rectangular spiral, and may include a loop at each corner of the rectangular spiral. At this time, since the number of square spirals increases, the number of loops to be formed also increases. Hereinafter, other descriptions are the same as the antenna structure 200 for generating inductively coupled plasma of FIG. 3A.

Referring to (c) of FIG. 3, (c) of FIG. 3 is an antenna structure 260 for generating inductively coupled plasma in which the number of square spirals is increased and the length of the antenna side is shortened as compared to (a) of FIG. 3 . is a diagram for explaining

The antenna structure 260 for generating inductively coupled plasma of FIG. 3C also includes a symmetrical antenna formed in a rectangular spiral, and may include a loop at every corner of the rectangular spiral. In addition, since the number of square spirals increases, the number of loops formed also increases. Hereinafter, other descriptions are the same as the antenna structure 200 for generating inductively coupled plasma of FIG. 3A.

In addition, although not shown in the drawings, when a rectangular plasma is to be generated using a circular spiral antenna structure, a plurality of circular spiral antenna structures must be disposed in a rectangular substrate. In this case, it is difficult to arrange the power electrodes in multiple stages in order to supply power to the plurality of antenna structures.

However, when the antenna structure of the rectangular spiral according to the embodiment of the present invention is used, since a single rectangular spiral antenna structure can be used, there is an advantage in that it is very easy to arrange an electrode for supplying power.

In more detail, by adjusting the number of spirals, the length of the side of the antenna, and the overall size of the antenna on a single rectangular spiral antenna structure as shown in FIGS. can create Therefore, since only one quadrangular spiral antenna structure is used, it is very easy to arrange the electrode for power supply.

4 is a view for explaining the strength of an induced electric field according to an antenna structure according to an embodiment of the present invention.

Figure 4 (a) is a view for explaining the antenna structure formed in a rectangular spiral according to an embodiment of the present invention, Figure 4 (b) is the intensity of the induced electric field generated in the antenna structure of Figure 4 (a) is a graph representing

Referring to (a) of FIG. 4 , in the antenna structure formed in a rectangular spiral, as described above with reference to FIG. 3 , the antenna structure including loops at the corners of the rectangular spiral is characterized.

That is, when the antenna structure is manufactured in a rectangular spiral, the distance between the antennas when the antennas are parallel to each other and the distance between the antennas at the corners are different. However, we want to keep the intensity of the induced electric field uniform by adding loops to the corners of the square spiral of the antenna.

Referring to (b) of Figure 4, it can be seen that in the case of the antenna structure for generating inductively coupled plasma according to an embodiment of the present invention, the intensity of the generated induced electric field is uniform.

More specifically, in the case of a rectangular helix, the strength of the induced electric field generated by adding a loop at the corner is reduced even though the distance between the antennas when the antennas are parallel and the distance between the antennas at the corner are different. can be adjusted uniformly.

5 is a plan view illustrating an antenna structure according to an embodiment of the present invention.

Referring to FIG. 5 , the antenna structure 400 according to an embodiment of the present invention includes two antennas in a quadrangular spiral directed outward from central points 410a and 410b. In this case, the two antennas may correspond to a symmetric structure with respect to the central points 410a and 410b.

In one embodiment of the present invention, the length of the antenna from the center point 410a, 410b of the antenna to the outer end points 420a, 420b of the rectangular spiral and the number of rectangular spirals are based on the size of the target product. can be determined by That is, the size of the antenna structure 400 for generating inductively coupled plasma may be determined based on the size of the rectangular plasma to be generated.

The center points 410a and 410b of the two antennas are connected to the RF power source 430, and the outer end points 420a and 420b are grounded to the ground. Accordingly, the antenna structure 400 for generating inductively coupled plasma may generate an inductively coupled plasma under the plate 450 by generating an induced electric field. Here, the plate 450 may include quartz, but is not limited thereto.

In this case, induced electromotive force may be generated differently according to a distance between the antenna and the plate 450 . In consideration of this, it is intended to propose a method for maintaining the density uniformity of plasma in the present invention.

6 is a cross-sectional view illustrating a side of an antenna structure according to an embodiment of the present invention.

When RF power is supplied to a general antenna structure, the density of plasma is different between the antenna part connected to the power supply generating power supply and the antenna part connected to the grounding part grounded to the ground.

In this case, the plasma density of the capacitively coupled plasma source is lower than that of the inductively coupled plasma source. Accordingly, capacitively coupled plasma is generated in the antenna portion located close to the power unit, and the density of the generated plasma is lowered. On the other hand, the density of plasma generated in the antenna portion located close to the grounded portion to the ground is relatively high.

In order to solve this problem, in an embodiment of the present invention, the density of plasma generated is uniformly maintained by setting different distances between the antenna located close to the power unit and the antenna located close to the ground unit and the plasma.

Referring to FIG. 6 , the antenna structure 500 for generating inductively coupled plasma according to an embodiment of the present invention is configured so that the first to sixth antennas 510a to 510f and the formed plasma 520 maintain a preset distance. It may include first to sixth antenna supports 530a to 530f supporting the first to sixth antennas 510a to 510f. In this case, the first to sixth antenna supports 530a to 530f may be made of a dielectric material.

Also, the first to sixth antennas 510a to 510f may mean a certain part of the antenna, not a separate coil. For example, the third and fourth antennas 510c and 510d may refer to antennas in the portion closest to the power unit, and the first and sixth antennas 510a and 510f are antennas in the portion closest to the ground unit. can mean

In an embodiment of the present invention, the preset distance may be determined based on the distance between the power unit and the ground unit connected to the first to sixth antennas 510a to 510f. In this case, the preset distances d1 to d6 are shorter as the first to sixth antennas 510a to 510f are closer to the power unit, and longer as they are closer to the ground unit.

For example, the lengths of the third and fourth antenna supports 530c and 530d supporting the third and fourth antennas 510c and 510d are the third and fourth antennas 510c and 510d positioned close to the power unit. and the distances d3 and d4 between the plasma 520 and the plasma 520 formed and the first, second, fifth and sixth antennas 510a, 510b, 510e, 510f positioned close to the ground portion. It can be made to keep the distances shorter than d1, d2, d5 and d6.

More specifically, the density of plasma generated from the third and fourth antennas 510c and 510d located close to the power unit is determined by the first, second, fifth, and sixth antennas 510a, 510b, 510e, and 510f) are lower than the density of the plasma.

To compensate for this, the third and fourth antennas 510c and 510d located close to the power unit are maintained closest to the plasma 520 to be formed.

That is, the lengths of the third and fourth antenna supports 530c and 530d supporting the third and fourth antennas 510c and 510d located close to the power unit are the first, second, and second antennas located close to the ground unit. The length of the first, second, fifth, and sixth antenna supports 530a, 530b, 530e, and 530f for supporting the fifth and sixth antennas 510a, 510b, 510e, and 510f may be longer than the length.

Similarly, since the lengths of the first and sixth antenna supports 530a and 530f supporting the first and sixth antennas 510a and 510f are located closest to the ground portion, the first and sixth antennas 510a and 510f. Since the density of the plasma generated from the antenna is high, it can be made the shortest in order to keep the density uniform with other antennas.

That is, although the third and fourth antennas 510c and 510d have been described as an example, the first to sixth antennas 510a to 510f may be equally applied. Accordingly, the lengths of the first to sixth antenna supports 530a to 530f may be sequentially determined differently according to the distances between the first to sixth antennas 510a to 510f and the power unit and the ground unit.

Through this, the plasma generated from the antenna portion connected to the power unit and the antenna portion connected to the ground may have a uniform density.

In addition, in an embodiment of the present invention, the antenna structure 500 for inductively coupled plasma generation further includes an antenna shield 540 on which antenna supports 530a to 530f for supporting the antennas 510a to 510f are installed. can That is, the upper portions of the antenna supports 530a to 530f may be attached to the antenna shield 540 to fix the antenna structure 500 for generating inductively coupled plasma to the lower portion.

7 is a view for explaining a change in the density of plasma according to a distance between an antenna and a plasma.

The first view of FIG. 7(a) is a first antenna structure 610 in which a 1 cm-thick ceramic plate 610a exists between the antenna and the plasma, and the second view is a 2 cm-thick quartz space between the antenna and the plasma ( A second antenna structure 620 in which a quartz plate 620a is present, and the third figure is a view showing a third antenna structure 630 in which an air layer of 2 cm between the antenna and plasma and a quartz plate 630a having a thickness of 2 cm exist. to be.

7B is a graph illustrating a change in plasma density according to a distance between an antenna and a plasma. That is, the density change according to the distance between the antenna and the plasma described in FIG. 6 will be investigated.

More specifically, the plasma density 610b for the first antenna structure 610 with a 1 cm-thick ceramic plate 610a between the antenna and the plasma exists between the second antenna structure 620 and the third antenna structure ( It can be seen that the plasma density for 630 is higher than that of 620b and 630b. That is, it can be seen that the shorter the distance between the antenna and the plasma, the higher the density of the generated plasma.

In addition, the density 630b of plasma for the third antenna structure 630 in which an air layer of 2 cm between the antenna and the plasma and a quartz plate 630a of 2 cm in thickness exist is the second in which only the quartz plate 620a of 2 cm in thickness exists. It can be seen that the plasma density 620b for the two-antenna structure 630 is lower compared to the plasma density 620b. That is, it can be seen that the density of the generated plasma is low even if the distance between the antenna and the plasma is increased by the air layer rather than the plate.

Accordingly, in FIG. 6 , it is possible to maintain a uniform density of plasma generated by adjusting the distance between the antenna and the plasma by manufacturing a different length of the antenna support for each part of the antenna.

The above description is merely illustrative of the technical idea of this embodiment, and various modifications and variations will be possible without departing from the essential characteristics of the present embodiment by those skilled in the art to which this embodiment belongs. Accordingly, the present embodiments are intended to explain rather than limit the technical spirit of the present embodiment, and the scope of the technical spirit of the present embodiment is not limited by these embodiments. The protection scope of this embodiment should be interpreted by the following claims, and all technical ideas within the scope equivalent thereto should be interpreted as being included in the scope of the present embodiment.

200, 250, 260: antenna structure for generating inductively coupled plasma
210a: first antenna unit
210b: second antenna unit
220a: first center point
220b: second center point
230a, 230b, 240a, 240b: loop

Claims (10)

A first antenna unit including an antenna formed in a rectangular spiral toward the outside from the center point; and
and a second antenna unit including an antenna forming a symmetrical structure with respect to the first antenna unit and the central point,
Each of the corners of the quadrangular spiral of the antenna included in the first antenna unit and the second antenna unit includes a loop,
The loop is formed in such a way that the coil forming the antenna turns (Turn), characterized in that to strengthen the intensity of the induced electric field of the corner portion, the antenna structure for inductively coupled plasma generation. The method of claim 1,
The loop is an antenna structure for generating inductively coupled plasma, characterized in that formed in a rectangular or curved shape. The method of claim 1,
Antenna structure for generating inductively coupled plasma, characterized in that the antennas included in the first antenna unit and the second antenna unit are placed on the same plane. The method of claim 1,
Antenna structure for generating inductively coupled plasma, characterized in that the antennas included in the first antenna unit and the second antenna unit are parallel in portions except for the corners and maintain the same distance. a first antenna unit including an antenna formed in a rectangular spiral toward the outside from the center point;
a second antenna unit including the first antenna unit and an antenna forming a symmetrical structure with respect to the central point;
a power unit connected to a center point of an antenna of the first antenna unit and the second antenna unit;
a ground portion connected to an outer end point of an antenna of the first antenna unit and the second antenna unit; and
and an antenna support for supporting the antenna so that the plasma formed with the antenna of the first antenna unit and the second antenna unit maintains a preset distance,
The predetermined distance is an antenna structure for generating inductively coupled plasma, characterized in that determined based on the distance between the antenna and the power unit and the ground unit. 6. The method of claim 5,
Antenna structure for generating inductively coupled plasma, characterized in that it comprises a loop (loop) for each corner of the quadrangular spiral of the antenna included in the first antenna unit and the second antenna unit. 6. The method of claim 5,
The predetermined distance, characterized in that the shorter the closer the antenna to the power unit, the inductively coupled plasma generating antenna structure. 6. The method of claim 5,
The predetermined distance, characterized in that the longer the closer the antenna to the ground, the antenna structure for inductively coupled plasma generation. 6. The method of claim 5,
The antenna support is an antenna structure for generating inductively coupled plasma, characterized in that it has a different length for each part of the antenna in order to maintain the determined predetermined distance. 6. The method of claim 5,
The antenna structure for generating inductively coupled plasma further comprises an antenna shield on which the antenna support for supporting the antenna is installed, the antenna structure for generating inductively coupled plasma.

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