KR102373941B1 - 반도체 웨이퍼의 결함 자동 분류를 위한 결정 트리 구성 - Google Patents

반도체 웨이퍼의 결함 자동 분류를 위한 결정 트리 구성 Download PDF

Info

Publication number
KR102373941B1
KR102373941B1 KR1020167014743A KR20167014743A KR102373941B1 KR 102373941 B1 KR102373941 B1 KR 102373941B1 KR 1020167014743 A KR1020167014743 A KR 1020167014743A KR 20167014743 A KR20167014743 A KR 20167014743A KR 102373941 B1 KR102373941 B1 KR 102373941B1
Authority
KR
South Korea
Prior art keywords
defects
floating
trees
class
floating trees
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020167014743A
Other languages
English (en)
Korean (ko)
Other versions
KR20160083055A (ko
Inventor
치엔-후에이 아담 첸
크리스토퍼 마허
패트릭 휴에트
타이-캄 응
존 알. 조단 Iii
Original Assignee
케이엘에이 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 케이엘에이 코포레이션 filed Critical 케이엘에이 코포레이션
Publication of KR20160083055A publication Critical patent/KR20160083055A/ko
Application granted granted Critical
Publication of KR102373941B1 publication Critical patent/KR102373941B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H10P74/203
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00Pattern recognition
    • G06F18/20Analysing
    • G06F18/24Classification techniques
    • G06F18/243Classification techniques relating to the number of classes
    • G06F18/24323Tree-organised classifiers
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00Pattern recognition
    • G06F18/20Analysing
    • G06F18/24Classification techniques
    • G06F18/245Classification techniques relating to the decision surface
    • G06K9/6282
    • G06K9/6285
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H10P74/23

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Data Mining & Analysis (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Evolutionary Biology (AREA)
  • Evolutionary Computation (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Artificial Intelligence (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Quality & Reliability (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020167014743A 2013-11-03 2014-11-03 반도체 웨이퍼의 결함 자동 분류를 위한 결정 트리 구성 Active KR102373941B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361899220P 2013-11-03 2013-11-03
US61/899,220 2013-11-03
US201461972418P 2014-03-31 2014-03-31
US61/972,418 2014-03-31
US14/257,921 US9489599B2 (en) 2013-11-03 2014-04-21 Decision tree construction for automatic classification of defects on semiconductor wafers
US14/257,921 2014-04-21
PCT/US2014/063668 WO2015066602A1 (en) 2013-11-03 2014-11-03 Decision tree construction for automatic classification of defects on semiconductor wafers

Publications (2)

Publication Number Publication Date
KR20160083055A KR20160083055A (ko) 2016-07-11
KR102373941B1 true KR102373941B1 (ko) 2022-03-11

Family

ID=53005249

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167014743A Active KR102373941B1 (ko) 2013-11-03 2014-11-03 반도체 웨이퍼의 결함 자동 분류를 위한 결정 트리 구성

Country Status (5)

Country Link
US (1) US9489599B2 (enExample)
JP (1) JP6576342B2 (enExample)
KR (1) KR102373941B1 (enExample)
TW (1) TWI617799B (enExample)
WO (1) WO2015066602A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6162909B2 (ja) * 2015-07-31 2017-07-12 楽天株式会社 木構造データ編集装置、木構造データ編集方法、及びプログラム
WO2017024065A1 (en) * 2015-08-05 2017-02-09 Kla-Tencor Corporation Range-based real-time scanning electron microscope non-visual binner
TWI737659B (zh) 2015-12-22 2021-09-01 以色列商應用材料以色列公司 半導體試樣的基於深度學習之檢查的方法及其系統
US10204290B2 (en) * 2016-10-14 2019-02-12 Kla-Tencor Corporation Defect review sampling and normalization based on defect and design attributes
US10185728B2 (en) * 2016-12-19 2019-01-22 Capital One Services, Llc Systems and methods for providing data quality management
TWI660322B (zh) 2018-05-17 2019-05-21 國立成功大學 考慮機台交互作用之辨識良率損失原因的系統與方法
US11321633B2 (en) * 2018-12-20 2022-05-03 Applied Materials Israel Ltd. Method of classifying defects in a specimen semiconductor examination and system thereof
US12038802B2 (en) 2019-10-14 2024-07-16 Pdf Solutions, Inc. Collaborative learning model for semiconductor applications
CN113298166A (zh) * 2021-06-01 2021-08-24 中科晶源微电子技术(北京)有限公司 缺陷分类器和缺陷分类方法、装置、设备及存储介质
WO2023166584A1 (ja) * 2022-03-02 2023-09-07 株式会社アドバンテスト 半導体試験結果分析装置、半導体試験結果分析方法およびコンピュータプログラム
WO2023166585A1 (ja) * 2022-03-02 2023-09-07 株式会社アドバンテスト 半導体試験結果分析装置、半導体試験結果分析方法およびコンピュータプログラム
US20250117915A1 (en) * 2023-10-06 2025-04-10 Applied Materials, Inc. Optical inspection-based automatic defect classification

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004047939A (ja) * 2002-05-23 2004-02-12 Hitachi High-Technologies Corp 欠陥分類器の生成方法および欠陥自動分類方法
JP2009103508A (ja) * 2007-10-22 2009-05-14 Hitachi Ltd 欠陥分類方法及びその装置
JP2011254084A (ja) * 2011-06-27 2011-12-15 Hitachi High-Technologies Corp 欠陥分類方法及びその装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6148099A (en) 1997-07-03 2000-11-14 Neopath, Inc. Method and apparatus for incremental concurrent learning in automatic semiconductor wafer and liquid crystal display defect classification
US6922482B1 (en) * 1999-06-15 2005-07-26 Applied Materials, Inc. Hybrid invariant adaptive automatic defect classification
US7602962B2 (en) 2003-02-25 2009-10-13 Hitachi High-Technologies Corporation Method of classifying defects using multiple inspection machines
JP4908995B2 (ja) 2006-09-27 2012-04-04 株式会社日立ハイテクノロジーズ 欠陥分類方法及びその装置並びに欠陥検査装置
JP4616864B2 (ja) 2007-06-20 2011-01-19 株式会社日立ハイテクノロジーズ 外観検査方法及びその装置および画像処理評価システム
US8233494B2 (en) 2008-01-22 2012-07-31 International Business Machines Corporation Hierarchical and incremental multivariate analysis for process control
US8315453B2 (en) 2010-07-27 2012-11-20 Applied Materials Israel, Ltd. Defect classification with optimized purity
US8502146B2 (en) 2011-10-03 2013-08-06 Kla-Tencor Corporation Methods and apparatus for classification of defects using surface height attributes
TWI574136B (zh) * 2012-02-03 2017-03-11 應用材料以色列公司 基於設計之缺陷分類之方法及系統
TW201339572A (zh) * 2012-03-21 2013-10-01 Optivu Vision System Corp 元件內部缺陷之檢測裝置及方法
US8948494B2 (en) 2012-11-12 2015-02-03 Kla-Tencor Corp. Unbiased wafer defect samples

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004047939A (ja) * 2002-05-23 2004-02-12 Hitachi High-Technologies Corp 欠陥分類器の生成方法および欠陥自動分類方法
JP2009103508A (ja) * 2007-10-22 2009-05-14 Hitachi Ltd 欠陥分類方法及びその装置
JP2011254084A (ja) * 2011-06-27 2011-12-15 Hitachi High-Technologies Corp 欠陥分類方法及びその装置

Also Published As

Publication number Publication date
TW201525450A (zh) 2015-07-01
KR20160083055A (ko) 2016-07-11
TWI617799B (zh) 2018-03-11
US20150125064A1 (en) 2015-05-07
JP2017502500A (ja) 2017-01-19
US9489599B2 (en) 2016-11-08
JP6576342B2 (ja) 2019-09-18
WO2015066602A1 (en) 2015-05-07

Similar Documents

Publication Publication Date Title
KR102373941B1 (ko) 반도체 웨이퍼의 결함 자동 분류를 위한 결정 트리 구성
KR102220437B1 (ko) 결함 분류기들 및 뉴슨스 필터들의 생성
US6718526B1 (en) Spatial signature analysis
US9518934B2 (en) Wafer defect discovery
CN109583465A (zh) 对半导体样本中的缺陷进行分类的方法和其系统
US8826200B2 (en) Alteration for wafer inspection
TW201545253A (zh) 複合式缺陷分類器
WO2006039584A1 (en) Flexible hybrid defect classification for semiconductor manufacturing
US10204290B2 (en) Defect review sampling and normalization based on defect and design attributes
TW201721784A (zh) 調適性自動缺陷分類
CN104838423A (zh) 无偏差的晶片缺陷样本
WO2018075547A1 (en) Optimizing training sets used for setting up inspection-related algorithms
US20140303921A1 (en) Dynamic design attributes for wafer inspection
IL265744A (en) Optimizing training sets used for setting up inspection-related algorithms
CN108020561A (zh) 用于在检查对象时自适应采样的方法和其系统
JP4209156B2 (ja) 検査条件データ管理方法及びシステム並びにプログラム、コンピュータ読取り可能な記録媒体
Lee et al. Machine learning approaches for nuisance filtering in inline defect inspection
EP4200897B1 (en) Unsupervised pattern synonym detection using image hashing
CN120872939A (zh) 大批量数据处理方法、装置、设备及介质

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000