KR102358587B1 - Heat treatment apparatus and microscope system comprising the same - Google Patents

Abstract

The heat treatment apparatus according to the embodiment is connected to a cleaning unit providing a space for cleaning a sample, a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit, and the cleaning unit, and is connected to the inside of the cleaning unit The contaminants of the sample can be efficiently cleaned in a more uniform cleaning environment before observing the experimental sample, including the temperature control unit that can control the temperature of the space. The microscope system including the heat treatment device according to the embodiment may prevent the sample from being re-contaminated by fixing the heat treatment device to the fixing plate and cleaning the cleaning unit, then separating the components other than the cleaning unit and transferring the cleaning unit to the microscope.

Description

Heat treatment apparatus and microscope system including the same

The following description relates to a heat treatment device for cleaning a sample used for observation experiments through a microscope in a uniform environment and preventing recontamination of the cleaned sample, and a microscope system including the same.

An electron microscope is a high-resolution image analysis equipment that uses an accelerated electron beam as a light source to observe the microstructure in a material. Examples of electron microscopes include a transmission electron microscope (TEM), a scanning transmission electron microscope (STEM), a scanning microscope (SEM), and a focused ion beam (FIB).

Since the electron microscope is used for the main purpose of observing a local area at high magnification, the sample used for observation is generally prepared through a miniaturization process. In particular, samples typically used for transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM) are processed to a very thin thickness of about 100 nm or less, and the electron beam of the electron microscope must be able to penetrate the sample. As seen in the process of processing the sample to a thin thickness, the sample for an electron microscope is small and thin, so it is easy to be sensitive to impact.

Hydrocarbon contaminants may remain on the sample surface due to organic substances such as ethanol, acetone, or epoxy, which are essential in the process of preparing samples for electron microscopy, and hydrocarbons on the sample surface even while the sample is exposed to air. contamination may occur.

When an electron beam is irradiated to the sample surface for sample observation, the remaining contaminants diffuse along the sample surface and accumulate in the area where the electron beam is irradiated. If contaminants are accumulated on the surface of the sample due to the diffusion of contaminants, the accumulated contaminants may absorb or block the light source and cause noise during experiments, and the accumulated contaminants may become serious analysis obstacles such as degradation of resolution when using an electron microscope. In order to solve the problem caused by the accumulation of such contaminants, the cleaning of the analyte sample has become a big issue.

Rinsing, liquid nitrogen cold trap, UV/ozone cleaning, plasma cleaning, ion beam milling, milling) and vacuum heating. In rinsing, alcohol or methanol used for rinsing the sample may remain in the form of a thin film on the sample surface, so alcohol or methanol may again become a type of contamination, liquid nitrogen freezing trap, UV/ozone cleaning, plasma cleaning Alternatively, methods such as ion beam milling are expensive equipment, so they are difficult to handle and cost-effective. In the case of vacuum heat treatment, if a small sample is heat treated using a general furnace, the volume of the furnace is too large compared to the sample, so the heating area is widened and the temperature uniformity is low, so the high vacuum inside the furnace and the uniform gas flow are not smooth. it may not be There is a need for a device capable of uniformly controlling the temperature inside the furnace and stably cleaning a small sample with a relatively simple structure.

In addition, in the case of furnaces that require high vacuum and uniform gas flow, most of them are fixed in a designated location for stable use of the device. may be exposed to the environment. There is a need for a method of preventing contamination of a cleaned sample by minimizing exposure from the external environment.

In this regard, Korean Patent Registration No. 10-20140003006 discloses an invention related to a sample cleaning device.

The above-mentioned background art is possessed or acquired by the inventor in the process of derivation of the present invention, and cannot necessarily be said to be a known art disclosed to the general public prior to the filing of the present invention.

An object of the embodiment is a cleaning unit providing a space for cleaning a sample, a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit, and the temperature inside the cleaning unit connected to the cleaning unit It is to provide a heat treatment device that can remove contaminants in the sample before observation through a temperature control unit that can control the temperature.

The purpose of the embodiment includes a heat treatment device capable of observing the sample cleaned in the cleaning unit through a microscope by separating the fixed plate fixed to the cleaning unit, the pump connected to the gas pipe, and the temperature control unit connected to the cleaning unit It is to provide a microscope system that does this.

The heat treatment apparatus according to the embodiment is connected to a cleaning unit providing a space for cleaning a sample, a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit, and the cleaning unit and may include a temperature control unit capable of adjusting the temperature of the internal space of the cleaning unit.

The cleaning unit may include a housing and a heating member installed inside the housing to heat the sample under the control of the temperature controller and fix the sample.

The heating member may include a mounting groove in which the sample is fixed and a ventilation groove allowing the gas to flow in a lower portion of the mounting groove.

The mounting groove may include a shape corresponding to the outer shape of the sample plate for placing the sample on the upper surface in order to observe the sample.

The cleaning unit may further include a heat sink installed around the heating member and dissipating heat around the heating member to the outside of the housing through a plurality of heat sinks.

The cleaning unit may further include a fixing cover positioned on the heating member and fixing the sample plate to the heating member so that the sample is exposed to the inner space.

The fixing cover may include an opening for exposing the sample to the inner space, and the opening may have a size smaller than an upper area of the sample plate.

The heat treatment apparatus according to the embodiment may further include a vacuum pump connected to the gas pipe to suck the gas in the inner space to make the inner space a vacuum state.

The heat treatment apparatus according to the embodiment may further include a gas inlet pump connected to the gas pipe to introduce a cleaning gas into the inner space.

A microscope system including a heat treatment apparatus according to an embodiment includes a cleaning unit providing a space for cleaning a sample, a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit, the It may include a temperature control unit connected to the cleaning unit to adjust the temperature of the interior space of the cleaning unit, and a fixing plate capable of fixing the cleaning unit.

A microscope system including a heat treatment apparatus according to an embodiment is connected to the gas pipe, and is connected to a vacuum pump and the gas pipe for sucking the gas in the internal space to make the internal space a vacuum state, and cleaning the internal space It may further include a gas inlet pump capable of introducing a gas for use.

A microscope system including a heat treatment device according to an embodiment is separated from one of the vacuum pump or the gas inlet pump connected to the gas pipe after the cleaning action of the cleaning unit, and the cleaning unit is separated from the temperature control unit and the fixed plate, , the cleaning unit can be transferred to the microscope.

The cleaning unit is installed in the housing and the housing and performs heating of the sample under the control of the temperature control unit and is located above the heating member and the heating member for fixing the sample, and the sample is disposed in the inner space and In order to observe the sample to be exposed, it may include a fixing cover for fixing the sample plate on the upper surface of the sample to the heating member.

The fixing plate may include a plurality of connection grooves, and the cleaning unit may be fixed to any one of the plurality of connection grooves.

The heat treatment apparatus according to the embodiment is connected to a cleaning unit providing a space for cleaning a sample, a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit, and the cleaning unit, and is connected to the inside of the cleaning unit By cleaning the sample through the temperature control unit that can control the temperature of the cleaning unit, it may be possible to clean the sample in a uniform and stable environment inside the cleaning unit. In addition, the heat treatment apparatus according to the embodiment may change the state of the sample by blocking the sample from the external environment and adjusting the atmosphere inside the cleaning unit.

The microscope system including the heat treatment device according to the embodiment separates the fixed plate fixed to the cleaning unit, the pump connected to the gas pipe, and the temperature control unit connected to the cleaning unit, and observes the sample cleaned in the cleaning unit through a microscope By doing so, it is possible to prevent re-contamination of the cleaned sample by blocking the cleaned sample from the external environment.

1 is a diagram illustrating a state of use of a heat treatment apparatus according to an embodiment.
2 is a perspective view of a cleaning unit according to an embodiment.
3 is a perspective view of a heating member and a fixed cover according to the embodiment.
4 is a state diagram of a microscope system including a heat treatment apparatus according to an embodiment.
The following drawings attached to the present specification illustrate a preferred embodiment of the present invention, and serve to further understand the technical idea of the present invention together with the detailed description of the present invention, so the present invention is limited to the matters described in those drawings It should not be construed as being limited.

Hereinafter, embodiments will be described in detail with reference to exemplary drawings. In adding reference numerals to the components of each drawing, it should be noted that the same components are given the same reference numerals as much as possible even though they are indicated on different drawings. In addition, in the description of the embodiment, if it is determined that a detailed description of a related known configuration or function interferes with the understanding of the embodiment, the detailed description thereof will be omitted.

In addition, in describing the components of the embodiment, terms such as first, second, A, B, (a), (b), etc. may be used. These terms are only for distinguishing the elements from other elements, and the essence, order, or order of the elements are not limited by the terms. When it is described that a component is "connected", "coupled" or "connected" to another component, the component may be directly connected or connected to the other component, but another component is between each component. It will be understood that may also be "connected", "coupled" or "connected".

Components included in one embodiment and components having a common function will be described using the same names in other embodiments. Unless otherwise stated, descriptions described in one embodiment may be applied to other embodiments as well, and detailed descriptions within the overlapping range will be omitted.

Before observing the sample through a microscope, the process of removing contaminants from the sample may be an essential process for observing the sample. Specimens are usually very small and thin compared to the observation table of a microscope, so they can be sensitive to impact. Therefore, the process of decontamination of the sample may require sophisticated decontamination work. Considering that the sample is very small and thin, the heat treatment apparatus can be made compact. The heat treatment device may be manufactured in a small size and may be easily gripped.

1 is a diagram illustrating a state of use of a heat treatment apparatus according to an embodiment.

Referring to FIG. 1 , the heat treatment apparatus 1 may provide a space for cleaning a sample. The heat treatment apparatus 1 may remove contaminants from the sample in the heat treatment apparatus 1 by introducing or discharging gas into the cleaning space and controlling the temperature. The heat treatment apparatus 1 may include a cleaning unit 11 , a gas pipe 12 , and a temperature control unit 13 .

Figure 2 is a perspective view of the cleaning unit according to the embodiment, Figure 3 is a perspective view of the heating member and the fixing cover according to the embodiment.

Referring to FIG. 2 , the cleaning unit 11 may provide a space for cleaning the sample and fix the sample. Before the sample is observed through a microscope, contaminants of the sample may be removed through the cleaning action of the cleaning unit 11 . A sample from which contaminants are removed can be observed more clearly and clearly when observed through a microscope. The cleaning unit 11 may include a housing 111 , a heating member 112 , a heat sink 113 , and a fixed cover 114 .

The housing 111 may separate the inner space of the cleaning unit 11 from the outer space. The sample may be stably cleaned in the inner space of the housing 111 . For example, the housing 111 may be a frame in which the cleaning unit 11 is sealed to secure an internal space for cleaning the sample. By securing the internal space where the sample is cleaned, the influence of the external space can be blocked. In particular, it is possible to prevent re-contamination of the sample to be cleaned from contaminants introduced from the external space.

The heating member 112 is installed inside the housing 111 and can heat the sample under the control of the temperature control unit 113 . The heating member 112 and the temperature control unit 113 are connected, and the heating member 112 can be heated up to 1000 degrees. The heating member 112 can withstand high temperatures by using a material having stronger heat resistance and fire resistance than the housing 111 . For example, the heating member 112 may not melt or decompose even at a high temperature of up to 1000 degrees using a ceramic material. By manufacturing the heating member 112 of a ceramic material, stable temperature control may be possible. In addition, the uniformity and precision of the heating temperature in the local area of the upper surface of the heating member 112 can be secured, so that a more efficient heating operation can be performed.

The heating member 112 may fix the sample. The immobilized sample can be cleaned in a more stable environment. For example, gas is introduced into the cleaning unit 11 and the temperature of the interior space of the cleaning unit 11 is adjusted to a high temperature to clean the sample. When a chemical reaction occurs, the sample being cleaned may be shaken. If the sample is shaken during the cleaning process, the sample may be cracked or there may be an error in the dimensions of the original sample. The cleaning unit 11 can prevent the sample from being damaged by more effectively reducing the shaking of the sample by fixing the sample.

The heating member 112 may place the sample on the upper surface of the heating member 112 . By positioning and fixing the sample on the upper surface of the heating member 112 , the surface of the sample may be exposed to the cleaning gas in the internal space of the cleaning unit 11 . The sample located on the upper surface of the heating member 112 may be cleaned by the cleaning gas and the heat generated by the heating member 112 . For example, a cleaning gas, ie, hydrogen, argon, or nitrogen, may be injected into the internal space of the cleaning unit 11 through the gas pipe 12 . When the cleaning gas is filled in the internal space of the cleaning unit 11 and the temperature of the internal space is raised to a high temperature using the heat generated by the heating member 112, the cleaning gas chemically reacts with contaminants in the sample. can be removed. Alternatively, certain contaminants may be removed by high temperature without chemical reaction of the gas.

Referring to FIG. 3 , the heating member may include a mounting groove 1121 and a ventilation groove 1122 .

A sample may be fixedly positioned in the mounting groove 1121 . The mounting groove 1121 is a groove located on the upper surface of the heating member 112, and the sample is located in the mounting groove 1121, so that the heating member 112 can transfer heat generated by the heating member 112 to the sample. . The heating member 112 may intensively transfer heat to the sample through the mounting groove 1121 . For example, the upper surface of the heating member 112 is a relatively narrow area than the heat sink 113, and a mounting groove 1121 is dug in the upper surface of the heating member 112 to place the sample in the heating member 112. The generated heat can be effectively and intensively transferred to the sample.

The mounting groove 1121 may include a shape corresponding to the outer shape of the sample plate for placing the sample on the upper surface in order to observe the sample. That is, the sample plate on which the sample is placed varies according to the type of the sample, and the shape of the mounting groove 1121 can be manufactured differently depending on the outer shape of the sample plate. For example, the sample plate may be a TEM grid or a MEMS chip used for microscopic observation. The experimenter can place the sample for transmission electron microscope (TEM) on the TEM grid or the upper surface of the MEMS chip. Therefore, the mounting groove is manufactured to have a size corresponding to the outer shape of the TEM grid or MEMS chip, so that the TEM grid or MEMS chip can be fixed. That is, by manufacturing the mounting groove 1121 in a shape corresponding to the outer shape of the sample plate, the sample is fixed to the mounting groove 1121 and can be cleaned under more stable conditions.

The ventilation groove 1122 may allow the gas to flow in the lower portion of the mounting groove 1121 . The ventilation groove 1122 may include a long shape in a direction perpendicular to the longitudinal direction of the mounting groove 1121 . By designing a ventilation groove in the lower portion of the mounting groove 1121, the sample can be exposed to the cleaning gas in various ways. For example, since the sample is positioned in the mounting groove 1121 , the upper surface of the sample may be exposed to the internal space of the cleaning unit 11 , that is, the cleaning gas. In a situation in which the upper surface of the sample is exposed to the cleaning gas, not only the cleaning gas flows from the upper surface of the sample, but also the cleaning gas flows through the ventilation groove 1122 , so that the cleaning gas may also flow from the lower surface of the sample. Therefore, the sample can be exposed to the cleaning gas in various ways, and the sample can be cleaned more effectively.

The heat sink 113 may be installed around the heating member 112 , and may radiate heat around the heating member 112 to the outside of the housing 111 through a plurality of heat sinks. In other words, the heating member 112 is in a high temperature state by generating heat by the temperature control unit 13 , but the heat sink 113 has a configuration other than the heating member 112 at a relatively low temperature than the heating member 112 . state can be maintained. For example, in a situation where the heating member 112 generates heat and the surrounding of the heating member 112 becomes in a high-temperature state, the heat sink 113 may suck in high-temperature gas through the plurality of heat sinks. The sucked high-temperature gas may be discharged to the outside of the housing 111 . That is, the heat sink 113 sucks and discharges the gas in the inner space of the cleaning unit 11, so that the heat in the inner space of the cleaning unit 11 except for the periphery of the heating member 112 can be discharged through the plurality of heat sinks. . The heating member 112 is made of a ceramic material resistant to high temperature, but other components other than the heating member 112 may be made of a material that is relatively weak to high temperature than the ceramic material. Accordingly, the heat sink 113 can prevent other components other than the heating member 112 from being damaged by the high temperature.

Referring to FIG. 3 , the fixed cover 114 is located above the heating member 112 , and the fixed cover 114 attaches the sample plate to the heating member 112 so that the sample is exposed to the inner space of the cleaning unit 11 . can be fixed For example, the fixed cover 114 may be connected to the heating member 112 through a connection bolt. The fixed cover 114 may be connected to the heating member 112 to surround and press the upper surface of the sample located in the mounting groove 1121 . The specimen can be immobilized and fixed in various ways. The immobilized sample can be washed under more stable conditions.

The fixed cover 114 may include a material stronger than the heat of the housing. For example, the fixed cover 114 may be coated with a heat-resistant material. When the fixed cover 114 is manufactured, the surface of the fixed cover 114 is coated with a heat-resistant material such as copper, platinum and rhodium to maintain the shape without melting even at the high temperature of the heating member 112 . By coating the fixing cover 114 with a heat-resistant material, the fixing cover 114 can be prevented from being damaged and the sample can be fixed more stably.

The fixed cover 114 may include an opening for exposing the sample to the inner space of the cleaning unit 11 . The opening may have a size smaller than an upper area of the sample plate. For example, the fixing cover 114 may be manufactured to correspond to the outer shape of the sample plate. The opening corresponds to the outer shape of the TEM grid or MEMS chip, but may be made relatively smaller than the size of the upper area of the TEM grid or MEMS chip. Accordingly, the TEM grid or MEMS chip cannot pass through the opening and can be fixed by the fixing cover 114 .

The gas pipe 12 may be connected to the cleaning unit 11 and provide a passage through which gas enters and exits the internal space of the cleaning unit 11 . For example, the gas tube 12 may include a quick connect body and a quick connect stem. The quick connect can include an O-ring to increase the sealing force inside the quick connect. Therefore, when gas is introduced or released into the internal space of the cleaning unit 11, it is possible to prevent the gas introduced or discharged from leaking out of the quick connect tube. The O-ring includes a material that is relatively weak to high heat than a metal material, and by discharging heat from the internal space of the cleaning unit 11 of the discharge plate 113 to the external space of the cleaning unit 11, the O-ring ( O-ring) can be damaged.

The temperature control unit 13 is connected to the cleaning unit 11 , and may adjust the temperature of the interior space of the cleaning unit 11 . The temperature control unit 13 may sense a temperature inside the cleaning unit 11 , and adjust the temperature inside the cleaning unit 11 based on the sensed temperature information. That is, by controlling the degree of heat generation of the heating member 112 to adjust the temperature inside the cleaning unit 11, the temperature inside the cleaning unit 11 can be adjusted to a temperature required for cleaning. In addition, the temperature control unit 13 may supply power for the operation of the cleaning unit 11 to the cleaning unit 11 . For example, the temperature control unit 13 may be connected to a temperature control device and a power supply device existing outside the heat treatment device 1 using a TC connector.

The heat treatment apparatus 1 may make the internal space of the cleaning unit 11 into a vacuum state or inject a cleaning gas by introducing or discharging gas into or out of the internal space of the cleaning unit 11 . The heat treatment apparatus 1 may further include a vacuum pump and a gas inlet pump.

The vacuum pump may be connected to the gas pipe 12 to suck the gas in the internal space of the cleaning unit 11 to make the internal space a vacuum state. For example, the vacuum pump may include a turbo pump. The turbo pump may suck the gas in the internal space of the cleaning unit 11 by using the pressure difference between the exhaust port and the intake port of the turbo pump. In other words, the turbo pump sucks the gas inside the cleaning unit 11 through the intake port through the rotation of the disk and the blades, moves it in the turbo pump chamber, and discharges it through the exhaust port. Accordingly, as the expansion of the inner container and the suction of the gas are repeated, the inner space may be changed to a vacuum state. Since the inner space is in a vacuum state, the sample can be cleaned in an environment where there is little flow and the cleaning conditions are uniform.

The gas inlet pump may be connected to the gas pipe 12 to introduce a cleaning gas into the internal space. For example, the gas inlet pump makes the inside of the pump container in a high pressure state and uses the pressure difference between the inside of the pump container and the inner space of the cleaning unit 11 to inject the cleaning gas into the cleaning unit 11 inner space. . The cleaning gas may include, for example, gases such as hydrogen, argon and nitrogen. The injected cleaning gas may have a chemical reaction depending on the temperature of the inner space adjusted by the temperature control unit 13 . The sample in the cleaning unit 11 may be cleaned by the chemical reaction of the cleaning gas.

As a result, while the heat treatment apparatus 1 cleans the sample, it is possible to increase the cleaning efficiency by creating a more uniform cleaning environment, and to prevent the sample from being damaged or cracked by fixing the sample.

In addition, the heat treatment apparatus 1 may provide an environment capable of analyzing a dynamical mechanism according to a state change of a sample through a non-real-time observation transmission electron microscope (ex-situ environment TEM) system. Specifically, the heat treatment apparatus 1 may change the sample to a state required for the observation experiment, and the changed state of the sample may be observed through a transmission electron microscope (TEM). For example, the heat treatment apparatus 1 may inject a specific reaction gas into the cleaning unit 11 containing the sample. The heat treatment apparatus 1 may heat a sample in a high vacuum atmosphere. By injecting a reaction gas into the cleaning unit 11 or heating the sample in a high vacuum atmosphere, the heat treatment apparatus 1 may change the microstructure of the sample or cause a phase transition of the sample. After the heat treatment device 1 changes the state of the sample, the sample can be observed through a transmission electron microscope in a state in which exposure to the external environment is blocked.

4 is a state diagram of a microscope system including a heat treatment apparatus according to an embodiment.

Referring to FIG. 4 , the microscope system including the heat treatment device can observe the sample through a microscope in a state in which a cleaning environment is created after cleaning the sample. By observing the sample in a state in which the cleaning environment is created, it is possible to prevent a problem that the sample may be recontaminated after cleaning. The microscope system including the heat treatment device may include a cleaning unit 11 , a gas pipe 12 , a temperature control unit 13 , a fixing plate F, a vacuum pump, and a gas inlet pump.

The cleaning unit 11 may remove contaminants from the sample by providing a space for cleaning the sample and fixing the sample. The cleaning unit may include a housing 111 , a heating member 112 , and a fixed cover 114 .

Since the housing 111 separates the inner space and the outer space of the cleaning unit 11 , the sample can be cleaned in the inner space of the housing 111 under a stable cleaning environment.

The heating member 112 is installed inside the housing 111 and can heat the sample and fix the sample under the control of the temperature controller 13 . The heating member 112 is connected to the temperature control unit 13 and the heating member 112 can be heated up to 1000 degrees. The heating member 112 can withstand high temperatures by using a material having stronger heat resistance and fire resistance than the housing 11 . The sample fixed by the heating member 112 may be cleaned in a more stable environment to be cleaned. By positioning and fixing the sample on the upper surface of the heating member 112 , the surface of the sample may be exposed to the cleaning gas in the internal space of the cleaning unit 11 . The cleaning gas may remove contaminants from the sample through chemical action.

The fixing cover 114 is located on the upper portion of the heating member 112 and fixes the sample plate on the upper surface of the heating member 112 to observe the sample so that the sample is exposed to the inner space of the cleaning unit 11 . can do it The fixed cover 114 may include a material stronger than the heat of the housing 111 . The fixed cover 114 may include an opening for exposing the sample to the inner space of the cleaning unit 11 , and the opening may have a size smaller than an upper area of the sample plate.

The gas pipe 12 is connected to the cleaning unit 11 , and may provide a passage through which gas enters and exits the internal space of the cleaning unit 11 using a quick connect. The gas pipe 12 may use an O-ring to prevent gas from leaking from the gas pipe 12 when the gas flows into or out of the internal space of the cleaning unit 11 .

The temperature control unit 13 is connected to the cleaning unit 11 , and may adjust the temperature of the interior space of the cleaning unit 11 . The temperature control unit 13 may sense a temperature inside the cleaning unit 11 , and adjust the temperature inside the cleaning unit 11 based on the sensed temperature information. In addition, the temperature control unit 13 may be connected to a power supply device existing outside the cleaning unit 11 to supply power required for the operation of the cleaning unit to the cleaning unit.

The fixing plate F may fix the cleaning unit 11 . If the cleaning operation is performed in the non-fixed cleaning unit 11 , the sample may be damaged. For example, when gas is introduced into the cleaning unit 11 and a high-temperature environment is created by the temperature control unit 13 and the gas undergoes a chemical reaction, the inside of the cleaning unit 11 may be shaken and unstable. In addition, a strong gas flow in the process of introducing or discharging gas may affect the sample to be cleaned. Since the fixing plate F fixes the cleaning unit 11 in the process of cleaning the sample, the sample can be cleaned in a stable environment, and damage to the sample can be prevented.

The fixing plate F includes a plurality of connection grooves, and the cleaning unit 11 may be fixed to any one of the plurality of connection grooves. For example, the cleaning unit 11 may be arbitrarily fixed to and separated from the plurality of connection grooves according to circumstances. The cleaning unit 11 may be fixed and separated from the fixing plate F more easily and conveniently by using a screw screw. A plurality of cleaning units may be fixed to the plurality of connection grooves. Accordingly, when there are a plurality of samples requiring cleaning, the plurality of cleaning units may be installed on the fixing plate F to clean the samples requiring cleaning at once.

The vacuum pump may be connected to the gas pipe 12, and may make the internal space of the cleaning unit 11 in a vacuum state by sucking the gas in the internal space. The vacuum pump may suck the gas in the inner space of the cleaning unit 11 by repeatedly using the volume expansion of the vacuum pump inner container. The gas inlet pump is connected to the gas pipe 12 and may introduce a cleaning gas into the inner space of the cleaning unit 11 . After the gas inlet pump makes the inside of the pump container in a high pressure state, the cleaning gas can be injected into the cleaning unit 11 inner space by using the pressure difference between the inside of the pump container and the cleaning unit 11 inner space.

After separating the cleaning unit 11 from the fixing plate F, the microscope system including the heat treatment device may observe the cleaned sample through the microscope. Specifically, after cleaning the sample in a state in which the cleaning unit 11 is connected to the pump, the temperature control unit 13 and the fixed plate F, one of the vacuum pump or the gas inlet pump connected to the gas pipe 12 is removed. can be separated In addition, the cleaning unit 11 can be separated from the temperature control unit 13 and the fixing plate (F). That is, after the cleaning operation is completed, the cleaning unit 11 is separated from other components to transfer the cleaning unit 11 and the sample inside the cleaning unit 11 to the microscope. The experimenter can observe the sample by picking up the cleaned sample from the cleaning unit 11 and immediately placing it on the observation table of the microscope.

Alternatively, the experimenter does not remove the cleaned sample from the cleaning unit 11 , and the cleaning unit 11 may maintain a vacuum state inside the cleaning unit 11 while fixing the sample to the cleaning unit 11 . Therefore, in the case of the electron microscope, since the sample must be observed in a vacuum state, the experimenter can observe the sample through the electron microscope in a state in which the sample is sealed in the cleaning unit 11 in a vacuum state.

As a result, after the cleaning operation is finished, the inside of the cleaning unit 11 can maintain a cleaning environment and a vacuum state. Accordingly, it is possible to prevent the sample from being re-contaminated by other contaminants until the sample is observed through a microscope after cleaning. In an experiment that analyzes a microscopic structure, the accuracy and precision of the experiment can be increased by preventing re-contamination of the sample.

As described above, although embodiments have been described with reference to the limited drawings, various modifications and variations are possible from the above description by those of ordinary skill in the art. For example, the described techniques are performed in an order different from the described method, and/or the described components of structures, devices, etc. are combined or combined in a different form than the described method, or other components or equivalents are used. Appropriate results can be achieved even if substituted or substituted by

1: Heat treatment device
11: cleaning department
12: gas tube
13: temperature control unit
111: housing
112: heating member
113: heat sink
114: fixed cover

Claims (14)

a cleaning unit providing a space for cleaning the sample;
a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit; and
It is connected to the cleaning unit and includes a temperature control unit capable of adjusting the temperature of the interior space of the cleaning unit,
The cleaning unit,
housing; and
and a heating member installed inside the housing to heat the sample under the control of the temperature controller and fix the sample,
The heating element is
a mounting groove in which the sample is fixed; and
A heat treatment apparatus comprising a ventilation groove allowing the gas to flow in a lower portion of the mounting groove. delete delete According to claim 1,
The mounting groove is
In order to observe the sample, the heat treatment apparatus comprising a shape corresponding to the outer shape of the sample plate on which the sample is placed on the upper surface. The method of claim 1,
The cleaning unit,
The heat treatment apparatus further comprising a heat sink installed around the heating member and dissipating heat around the heating member to the outside of the housing through a plurality of heat sinks. According to claim 1,
The cleaning unit,
The heat treatment apparatus further comprising: a fixing cover positioned above the heating member and fixing the sample plate on the upper surface of the sample to the heating member so that the sample is exposed to the inner space. 7. The method of claim 6,
The fixed cover,
and an opening exposing the sample to the inner space, wherein the opening has a size smaller than an upper area of the sample plate. The method of claim 1,
Further comprising a vacuum pump connected to the gas pipe to suck the gas in the inner space to make the inner space a vacuum state. The method of claim 1,
Further comprising a gas inlet pump connected to the gas pipe to introduce a cleaning gas into the inner space, the heat treatment apparatus. a cleaning unit providing a space for cleaning the sample;
a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit;
a temperature control unit connected to the washing unit and capable of adjusting the temperature of the internal space of the washing unit;
a fixing plate capable of fixing the cleaning unit;
a vacuum pump connected to the gas pipe and sucking the gas in the inner space to create a vacuum in the inner space; and
and a gas inlet pump connected to the gas pipe and capable of introducing a cleaning gas into the inner space,
After the cleaning action of the cleaning unit, one of the vacuum pump or the gas inlet pump connected to the gas pipe is separated and the cleaning unit is separated from the temperature control unit and the fixed plate, so that the cleaning unit can be transferred to the microscope, A microscope system comprising a heat treatment device. delete delete 11. The method of claim 10,
The cleaning unit,
housing; and
a heating member installed inside the housing to heat the sample under the control of the temperature controller and fix the sample; and
Microscope system including a heat treatment device, which is located above the heating member and includes a fixing cover for fixing the sample plate on the upper surface of the sample to the heating member in order to observe the sample so that the sample is exposed to the inner space . a cleaning unit providing a space for cleaning the sample;
a gas pipe connected to the cleaning unit and providing a passage through which gas enters and exits the interior space of the cleaning unit;
a temperature control unit connected to the washing unit and capable of adjusting the temperature of the internal space of the washing unit; and
and a fixing plate capable of fixing the cleaning unit,
The fixing plate is
A microscope system comprising a heat treatment apparatus comprising a plurality of connection grooves, wherein the cleaning unit can be fixed to any one of the plurality of connection grooves.

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