KR102353181B1 - Peracetic acid aqueous solution and method for producing the same - Google Patents
Peracetic acid aqueous solution and method for producing the same Download PDFInfo
- Publication number
- KR102353181B1 KR102353181B1 KR1020190135797A KR20190135797A KR102353181B1 KR 102353181 B1 KR102353181 B1 KR 102353181B1 KR 1020190135797 A KR1020190135797 A KR 1020190135797A KR 20190135797 A KR20190135797 A KR 20190135797A KR 102353181 B1 KR102353181 B1 KR 102353181B1
- Authority
- KR
- South Korea
- Prior art keywords
- acid
- weight
- peracetic acid
- peracetic
- bis
- Prior art date
Links
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 title claims abstract description 220
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000007864 aqueous solution Substances 0.000 title abstract description 39
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 96
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 61
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000002738 chelating agent Substances 0.000 claims abstract description 28
- 150000007524 organic acids Chemical class 0.000 claims abstract description 24
- 230000001954 sterilising effect Effects 0.000 claims abstract description 17
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 claims abstract description 14
- 125000001841 imino group Chemical group [H]N=* 0.000 claims abstract description 12
- -1 phosphonomethyl Chemical group 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 10
- LMHAGAHDHRQIMB-UHFFFAOYSA-N 1,2-dichloro-1,2,3,3,4,4-hexafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(Cl)C1(F)Cl LMHAGAHDHRQIMB-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000243 solution Substances 0.000 claims description 21
- 239000011259 mixed solution Substances 0.000 claims description 12
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 claims description 10
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 7
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 239000000645 desinfectant Substances 0.000 claims description 5
- 238000001223 reverse osmosis Methods 0.000 claims description 5
- TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 4
- 229940116269 uric acid Drugs 0.000 claims description 4
- 235000014655 lactic acid Nutrition 0.000 claims description 3
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000004310 lactic acid Substances 0.000 claims 2
- 239000003599 detergent Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 21
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 239000003206 sterilizing agent Substances 0.000 abstract description 8
- 239000012459 cleaning agent Substances 0.000 abstract description 7
- 235000013305 food Nutrition 0.000 abstract description 6
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 abstract description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 abstract description 3
- YACKEPLHDIMKIO-UHFFFAOYSA-N methylphosphonic acid Chemical compound CP(O)(O)=O YACKEPLHDIMKIO-UHFFFAOYSA-N 0.000 abstract description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 244000005700 microbiome Species 0.000 description 5
- 235000019645 odor Nutrition 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Natural products OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229960001484 edetic acid Drugs 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000000813 microbial effect Effects 0.000 description 4
- 239000005708 Sodium hypochlorite Substances 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 3
- 235000013361 beverage Nutrition 0.000 description 3
- 239000003139 biocide Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 3
- KVZLHPXEUGJPAH-UHFFFAOYSA-N 2-oxidanylpropanoic acid Chemical compound CC(O)C(O)=O.CC(O)C(O)=O KVZLHPXEUGJPAH-UHFFFAOYSA-N 0.000 description 2
- 244000063299 Bacillus subtilis Species 0.000 description 2
- 235000014469 Bacillus subtilis Nutrition 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- 241000187479 Mycobacterium tuberculosis Species 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- 241000191967 Staphylococcus aureus Species 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 239000008235 industrial water Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 239000008234 soft water Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- KFWOECANWDPTID-UHFFFAOYSA-N 2-[hydroperoxy(hydroxy)phosphoryl]acetic acid 2-hydroxy-2-phosphonoacetic acid Chemical compound OOP(=O)(O)CC(=O)O.OC(C(=O)O)P(=O)(O)O KFWOECANWDPTID-UHFFFAOYSA-N 0.000 description 1
- ULHLNVIDIVAORK-UHFFFAOYSA-N 2-hydroxybutanedioic acid Chemical compound OC(=O)C(O)CC(O)=O.OC(=O)C(O)CC(O)=O ULHLNVIDIVAORK-UHFFFAOYSA-N 0.000 description 1
- OORRCVPWRPVJEK-UHFFFAOYSA-N 2-oxidanylethanoic acid Chemical compound OCC(O)=O.OCC(O)=O OORRCVPWRPVJEK-UHFFFAOYSA-N 0.000 description 1
- UEKNCNFRPQZKHQ-UHFFFAOYSA-N 2-phosphonobutane-1,2,4-tricarboxylic acid Chemical compound P(=O)(O)(O)C(CC(=O)O)(CCC(=O)O)C(=O)O.P(=O)(O)(O)C(CC(=O)O)(CCC(=O)O)C(=O)O UEKNCNFRPQZKHQ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KBIWNQVZKHSHTI-UHFFFAOYSA-N 4-n,4-n-dimethylbenzene-1,4-diamine;oxalic acid Chemical compound OC(=O)C(O)=O.CN(C)C1=CC=C(N)C=C1 KBIWNQVZKHSHTI-UHFFFAOYSA-N 0.000 description 1
- 241000222122 Candida albicans Species 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- 241000233866 Fungi Species 0.000 description 1
- 241000588747 Klebsiella pneumoniae Species 0.000 description 1
- 241000589517 Pseudomonas aeruginosa Species 0.000 description 1
- 241000293869 Salmonella enterica subsp. enterica serovar Typhimurium Species 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000013334 alcoholic beverage Nutrition 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000012431 aqueous reaction media Substances 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 230000031018 biological processes and functions Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- OVYQSRKFHNKIBM-UHFFFAOYSA-N butanedioic acid Chemical compound OC(=O)CCC(O)=O.OC(=O)CCC(O)=O OVYQSRKFHNKIBM-UHFFFAOYSA-N 0.000 description 1
- 229940095731 candida albicans Drugs 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001631 haemodialysis Methods 0.000 description 1
- 230000000322 hemodialysis Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000007794 irritation Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N37/00—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids
- A01N37/16—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom having three bonds to hetero atoms with at the most two bonds to halogen, e.g. carboxylic acids containing the group; Thio analogues thereof
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N25/00—Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application, e.g. seed treatment or sequential application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests
- A01N25/22—Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application, e.g. seed treatment or sequential application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests containing ingredients stabilising the active ingredients
-
- A—HUMAN NECESSITIES
- A23—FOODS OR FOODSTUFFS; TREATMENT THEREOF, NOT COVERED BY OTHER CLASSES
- A23L—FOODS, FOODSTUFFS, OR NON-ALCOHOLIC BEVERAGES, NOT COVERED BY SUBCLASSES A21D OR A23B-A23J; THEIR PREPARATION OR TREATMENT, e.g. COOKING, MODIFICATION OF NUTRITIVE QUALITIES, PHYSICAL TREATMENT; PRESERVATION OF FOODS OR FOODSTUFFS, IN GENERAL
- A23L3/00—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs
- A23L3/34—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs by treatment with chemicals
- A23L3/3454—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs by treatment with chemicals in the form of liquids or solids
- A23L3/3463—Organic compounds; Microorganisms; Enzymes
- A23L3/34635—Antibiotics
-
- A—HUMAN NECESSITIES
- A23—FOODS OR FOODSTUFFS; TREATMENT THEREOF, NOT COVERED BY OTHER CLASSES
- A23L—FOODS, FOODSTUFFS, OR NON-ALCOHOLIC BEVERAGES, NOT COVERED BY SUBCLASSES A21D OR A23B-A23J; THEIR PREPARATION OR TREATMENT, e.g. COOKING, MODIFICATION OF NUTRITIVE QUALITIES, PHYSICAL TREATMENT; PRESERVATION OF FOODS OR FOODSTUFFS, IN GENERAL
- A23L3/00—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs
- A23L3/34—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs by treatment with chemicals
- A23L3/3454—Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs by treatment with chemicals in the form of liquids or solids
- A23L3/3463—Organic compounds; Microorganisms; Enzymes
- A23L3/3481—Organic compounds containing oxygen
- A23L3/3499—Organic compounds containing oxygen with doubly-bound oxygen
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/16—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using chemical substances
- A61L2/18—Liquid substances or solutions comprising solids or dissolved gases
- A61L2/186—Peroxide solutions
-
- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
- D21H21/00—Non-fibrous material added to the pulp, characterised by its function, form or properties; Paper-impregnating or coating material, characterised by its function, form or properties
- D21H21/14—Non-fibrous material added to the pulp, characterised by its function, form or properties; Paper-impregnating or coating material, characterised by its function, form or properties characterised by function or properties in or on the paper
- D21H21/36—Biocidal agents, e.g. fungicidal, bactericidal, insecticidal agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- A—HUMAN NECESSITIES
- A23—FOODS OR FOODSTUFFS; TREATMENT THEREOF, NOT COVERED BY OTHER CLASSES
- A23V—INDEXING SCHEME RELATING TO FOODS, FOODSTUFFS OR NON-ALCOHOLIC BEVERAGES AND LACTIC OR PROPIONIC ACID BACTERIA USED IN FOODSTUFFS OR FOOD PREPARATION
- A23V2002/00—Food compositions, function of food ingredients or processes for food or foodstuffs
-
- A—HUMAN NECESSITIES
- A23—FOODS OR FOODSTUFFS; TREATMENT THEREOF, NOT COVERED BY OTHER CLASSES
- A23V—INDEXING SCHEME RELATING TO FOODS, FOODSTUFFS OR NON-ALCOHOLIC BEVERAGES AND LACTIC OR PROPIONIC ACID BACTERIA USED IN FOODSTUFFS OR FOOD PREPARATION
- A23V2200/00—Function of food ingredients
- A23V2200/10—Preserving against microbes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2202/00—Aspects relating to methods or apparatus for disinfecting or sterilising materials or objects
- A61L2202/20—Targets to be treated
- A61L2202/24—Medical instruments, e.g. endoscopes, catheters, sharps
Abstract
각종 의료장비의 살균 세척제, 식품 생산 공정의 살균 세척제, 제지 공정의 살균제, 반도체 에칭제 등의 다양한 분야에서 이용될 수 있으며, 생산성 및 안정성이 우수한 과초산 수용액 및 그 제조방법이 개시된다. 상기 과초산 수용액은, 1 내지 25 중량%의 과초산; 0.5 내지 15 중량%의 초산; 1 내지 30 중량%의 과산화수소; 1 내지 15 중량%의 유기산; 1 내지 5 중량%의 킬레이트제; 및 나머지 물을 포함하며, 상기 킬레이트제는 [[(포스포노메틸)이미노]]비스 [[2,1-에틴디일 니트로비스(메틸렌)테트라키스 포스포닉에시드, [비스(포스포노메틸)아미노]메틸 포스포닉 에시드, 2-포스포노 부탄-1,2,4-트리카복시릭에시드, 2-하이드록시 포스포노아세틱 에시드 및 이들의 혼합물로 이루어지는 군으로부터 선택된다. Disclosed are an aqueous solution of peracetic acid that can be used in various fields such as sterilizing and cleaning agents for various medical equipment, sterilizing and cleaning agents for food production processes, sterilizing agents for papermaking processes, semiconductor etchants, and the like, and having excellent productivity and stability, and a method for manufacturing the same. The aqueous solution of peracetic acid, 1 to 25% by weight of peracetic acid; 0.5 to 15% by weight of acetic acid; 1 to 30% by weight of hydrogen peroxide; 1 to 15% by weight of an organic acid; 1 to 5% by weight of a chelating agent; and the remainder of water, wherein the chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethyndiyl nitrobis(methylene)tetrakis phosphonic acid, [bis(phosphonomethyl)amino] ]methyl phosphonic acid, 2-phosphono butane-1,2,4-tricarboxylic acid, 2-hydroxy phosphonoacetic acid and mixtures thereof.
Description
본 발명은 과초산 수용액 및 그 제조방법에 관한 것으로서, 더욱 상세하게는 각종 의료장비의 살균 세척제, 식품 생산 공정의 살균 세척제, 제지 공정의 살균제, 반도체 에칭제 등의 다양한 분야에서 이용될 수 있으며, 생산성 및 안정성이 우수한 과초산 수용액 및 그 제조방법에 관한 것이다.The present invention relates to an aqueous solution of peracetic acid and a method for manufacturing the same, and more particularly, it can be used in various fields such as a sterilizing and cleaning agent for various medical equipment, a sterilizing and cleaning agent for a food production process, a sterilizing agent for a papermaking process, and a semiconductor etchant, It relates to an aqueous solution of peracetic acid having excellent productivity and stability and a method for preparing the same.
과초산은 다양한 적용분야에서 살균제 및 소독제로 사용되고 있다. 과초산은 미생물에 대해 광범위한 활성 스펙트럼을 가지기 때문에, 의료장비 살균 세척, 냉각탑 용수, 채광 공정 용수, 식품 가공 용수, 펄프 및 제지 공장(paper mill) 용수 등을 포함하는 산업용수의 살균 세척에 유용하게 이용될 뿐만 아니라, 반도체 장비의 에칭제로도 이용되고 있다. 종래에는 의료장비의 세척 및 소독을 위하여, 글루타르알데히드, 차아염소산나트륨, 포르말린, 초산 등이 일반적으로 사용되었다. 그러나 글루타르알데히드는 자극적인 냄새와 함께, 피부, 눈 등의 인체 조직에 대하여 독성을 나타내고, 살균시 장시간이 소요되는 단점이 있다. 또한 차아염소산나트륨과 초산은 어느 정도의 살균력과 스케일 제거력을 가지고 있으나, 스케일 제거를 목적으로 사용된 고농도의 초산은 차아염소산나트륨과 함께 기기 부식의 주된 원인이 될 뿐 아니라, 의료기기의 고장을 유발하여 기기의 수명을 단축시키는 원인이 된다. 따라서, 이와 같은 단점이 없는 과초산이 의료장비의 세척에 사용되기 시작했으며, 예를 들면 외과용 및 치과용 기구의 살균에 과초산을 이용하는 방법(일본 특허 2523085호), 과초산, 초산, 과산화수소, 인산, 1,1-디포스폰산 및 역삼투압수를 혼합하여 의료기기 세척제에 이용하는 방법(대한민국 특허출원 10-2000-0021215호) 등이 알려져 있다. 또한 미국특허 제5,624,634호에는, 과초산을 포함하는 제l 수용액을, 부식저해제, 과산화수소 안정제 및/또는 과초산 안정제를 포함하는 제2 수용액과 혼합함으로써 금속성분을 포함하는 의료장치 소독 조성물을 제조하는 방법이 개시되어 있다.Peracetic acid is used as a disinfectant and disinfectant in a variety of applications. Because peracetic acid has a broad spectrum of activity against microorganisms, it is useful for sterilization and cleaning of industrial water, including medical equipment sterilization and cleaning, cooling tower water, mining process water, food processing water, pulp and paper mill water, etc. Not only that, but it is also used as an etchant for semiconductor equipment. Conventionally, for cleaning and disinfecting medical equipment, glutaraldehyde, sodium hypochlorite, formalin, acetic acid, etc. have been generally used. However, glutaraldehyde is toxic to human tissues such as skin and eyes, along with a pungent odor, and has disadvantages in that it takes a long time to sterilize. In addition, sodium hypochlorite and acetic acid have a certain degree of sterilization and scale removal power, but the high concentration of acetic acid used for the purpose of scale removal is the main cause of device corrosion along with sodium hypochlorite, as well as causing malfunction of medical devices. cause to shorten the lifespan of Therefore, peracetic acid without such disadvantages has started to be used for cleaning medical equipment, for example, a method of using peracetic acid for sterilization of surgical and dental instruments (Japanese Patent No. 2523085), peracetic acid, acetic acid, hydrogen peroxide , a method of mixing phosphoric acid, 1,1-diphosphonic acid and reverse osmosis water in a medical device cleaning agent (Korean Patent Application No. 10-2000-0021215) is known. In addition, U.S. Patent No. 5,624,634 discloses that a first aqueous solution containing peracetic acid is mixed with a second aqueous solution containing a corrosion inhibitor, a hydrogen peroxide stabilizer and/or a peracetic acid stabilizer to prepare a medical device disinfection composition containing a metal component. A method is disclosed.
산업 용수 시스템 내에 미생물이 존재하면, 미생물이 증식하여 퇴적물이 생성되고, 이러한 퇴적물은 시스템의 부식, 파손, 가동 중지 기간 증가, 수율 저하, 화학 약품 비용 증가, 악취 등의 문제점을 발생시킨다. 예를 들어, 제지 산업체에 있어서, 미생물 생장에 의해 형성된 점액성 퇴적물(slime deposit)은 제품의 불량, 파손, 폐색 및 펌프 고장의 주원인이 되고 있다(Tackling the Slime Problem in a Paper Mill, PTI, pp280, 1988). 따라서 미생물 생장을 억제하기 위한 방법으로 산화성 및 비-산화성 살생물제(biocide)를 사용하고 있지만, 가격이 고가이며, 살생물 효과의 지속 시간이 짧아, 제지 공장 시스템에 연속적이고 빈번하게 첨가해 주어야 하는 단점이 있다. 또한 이러한 화학약품 살생물제들이 미생물 집단을 효과적으로 억제하기 위해서는 일정량 이상을 사용하여야 하지만, 이들이 지닌 독성 때문에 환경 규제에 의하여 주변에 안전하게 배출될 수 있는 살생물제의 양이 제한될 뿐만 아니라, 가습기 살균제 피해 이후 생활용품에는 사용이 금지되고 있다. 따라서 산업 공정용수 내의 미생물의 생장을 억제하기 위하여 과초산이 사용되고 있다. 예를 들어, 미국특허 4,051,059호는 과초산, 초산, 과산화수소 및 음이온계 계면활성 화합물을 함유한 살균제를 식품 및 음료 산업에 이용하는 것을 개시하고 있고, 핀란드 특허 974575호 및 982735호에서는 과초산이 제지 공정에서 펄프의 표백 및 살균에 사용됨을 개시하고 있다.When microorganisms are present in industrial water systems, microorganisms multiply to form sediments, and these sediments cause problems such as system corrosion, damage, increased downtime, reduced yield, increased chemical costs, and bad odors. For example, in the paper industry, slime deposits formed by microbial growth are a major cause of product failure, breakage, blockage, and pump failure (Tackling the Slime Problem in a Paper Mill, PTI, pp280). , 1988). Therefore, although oxidative and non-oxidative biocides are used as methods to inhibit microbial growth, they are expensive and the duration of the biocidal effect is short, so they must be added continuously and frequently to the paper mill system. There is a downside to In addition, although more than a certain amount of these chemical biocides must be used to effectively suppress the microbial population, the amount of biocides that can be safely discharged to the environment is limited by environmental regulations due to their toxicity, and humidifier disinfectants After the damage, the use of household items is prohibited. Therefore, peracetic acid is used to suppress the growth of microorganisms in industrial process water. For example, U.S. Patent 4,051,059 discloses the use of disinfectants containing peracetic acid, acetic acid, hydrogen peroxide and anionic surfactants in the food and beverage industry, and Finnish Patent Nos. 974575 and 982735 disclose that peracetic acid is used in the papermaking process. discloses its use in the bleaching and sterilization of pulp.
과초산 수용액을 제조하는 방법으로는, 과산화수소, 초산, 과초산 및 산 촉매를 함유하는 수용성 반응 매질 내에, 과산화수소 및 초산을 연속적으로 공급하고, 반응 매질로부터 과초산이 농축된 증류액을 연속적으로 증류하여 과초산을 제조하는 방법이 일반적으로 알려져 있다(Degussa의 미국특허 3,264,346호, DGS의 영국특허 949,094호, FMG의 영국특허 1,014,361호, Degussa의 유럽특허 296,328호, Eka 케미칼스의 유럽특허 789,016호, Solvay의 유럽특허 1,004,576호). 또한, 미국특허 5,489,706호에는 0.1 내지 5 %의 지방족 알콜 에톡시레이트를 첨가하는 공정을 포함하는 과초산의 안정화법이 개시되어 있다. 또한, 대한민국 특허 10-0597902호에는 특정 유기산 및 킬레이트를 이용하여, 생성된 과초산의 안정성을 향상시키면서, 과초산의 생성을 촉진하는 과초산의 제조 방법이 개시되어 있다. As a method for preparing an aqueous solution of peracetic acid, hydrogen peroxide and acetic acid are continuously supplied into an aqueous reaction medium containing hydrogen peroxide, acetic acid, peracetic acid and an acid catalyst, and a distillate in which peracetic acid is concentrated from the reaction medium is continuously distilled A method for producing peracetic acid is generally known (Degussa's U.S. Patent 3,264,346, DGS' British Patent 949,094, FMG's British Patent 1,014,361, Degussa's European Patent 296,328, Eka Chemicals' European Patent No. 789,016, European Patent No. 1,004,576 to Solvay). In addition, U.S. Patent No. 5,489,706 discloses a method for stabilizing peracetic acid including a step of adding 0.1 to 5% aliphatic alcohol ethoxylate. In addition, Korean Patent No. 10-0597902 discloses a method for producing peracetic acid that promotes the production of peracetic acid while improving the stability of the produced peracetic acid by using a specific organic acid and a chelate.
본 발명의 목적은, 생산성 및 안정성, 살균성이 우수한 과초산 수용액 및 그 제조방법을 제공하는 것이다. An object of the present invention is to provide an aqueous solution of peracetic acid excellent in productivity, stability, and sterilization properties, and a method for producing the same.
본 발명의 다른 목적은 생산성 및 안정성이 우수한 과초산 수용액 및 그 제조방법을 제공하는 것이다. Another object of the present invention is to provide an aqueous solution of peracetic acid excellent in productivity and stability, and a method for preparing the same.
상기 목적을 달성하기 위하여, 본 발명은, 1 내지 25 중량%의 과초산; 0.5 내지 15 중량%의 초산; 1 내지 30 중량%의 과산화수소; 1 내지 15 중량%의 유기산; 1 내지 5 중량%의 킬레이트제; 및 나머지 물을 포함하며, 상기 킬레이트제는 [[(포스포노메틸)이미노]]비스[[2,1-에틴디일니트로비스 (메틸렌)테트라키스 포스포닉에시드, [비스(포스포노메틸)아미노]메틸 포스포닉 에시드, 2-포스포노 부탄-1,2,4-트리카복시릭에시드, 2-하이드록시포스포노아세틱 에시드 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 것인 과초산 수용액을 제공한다. In order to achieve the above object, the present invention, 1 to 25% by weight of peracetic acid; 0.5 to 15% by weight of acetic acid; 1 to 30% by weight of hydrogen peroxide; 1 to 15% by weight of an organic acid; 1 to 5% by weight of a chelating agent; and the remainder of water, wherein the chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitrobis(methylene)tetrakisphosphonic acid, [bis(phosphonomethyl)amino] It provides an aqueous solution of peracetic acid selected from the group consisting of ]methyl phosphonic acid, 2-phosphono butane-1,2,4-tricarboxylic acid, 2-hydroxyphosphonoacetic acid, and mixtures thereof. .
또한 본 발명은, 전체 과초산 수용액에 대하여 1 내지 15 중량%의 유기산과 물을 혼합하는 단계; 상기 혼합 용액에, 전체 과초산 수용액에 대하여 1 내지 5 중량%의 킬레이트제를 투입하는 단계; 상기 단계에서 얻어진 혼합 용액에, 초산을 투입하는 단계; 상기 단계에서 얻어진 혼합 용액에 과산화수소수를 투입하는 단계; 및 상기 단계에서 얻어진 혼합용액을 상온에서 숙성하여 초산의 농도가 0.5 내지 15 중량%이고, 과산화수소의 농도가 1 내지 30 중량%이며, 과초산의 농도가 1 내지 25 중량%가 되도록 하는 단계를 포함하며, 상기 킬레이트제는 [[(포스포노메틸)이미노]]비스[[2,1-에틴디일니트로비스 (메틸렌)테트라키스 포스포닉에시드, [비스(포스포노메틸)아미노]메틸 포스포닉 에시드, 2-포스포노부탄-1,2,4-트리카복시릭에시드, 2-하이드록시포스포노아세틱 에시드 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 것인 과초산 수용액의 제조방법을 제공한다.The present invention also comprises the steps of mixing 1 to 15% by weight of an organic acid and water with respect to the total aqueous peracetic acid solution; adding a chelating agent in an amount of 1 to 5% by weight based on the total aqueous peracetic acid solution to the mixed solution; adding acetic acid to the mixed solution obtained in the above step; adding hydrogen peroxide solution to the mixed solution obtained in the above step; and aging the mixed solution obtained in the above step at room temperature so that the concentration of acetic acid is 0.5 to 15% by weight, the concentration of hydrogen peroxide is 1 to 30% by weight, and the concentration of peracetic acid is 1 to 25% by weight. and the chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitrobis(methylene)tetrakis phosphonic acid, [bis(phosphonomethyl)amino]methyl phosphonic acid , 2-phosphonobutane-1,2,4-tricarboxylic acid, 2-hydroxyphosphonoacetic acid and provides a method for preparing an aqueous solution of peracetic acid that is selected from the group consisting of mixtures thereof.
본 발명에 따른 과초산 수용액은 생산성 및 안정성, 살균성이 우수하여, 다양한 상업적 용도에 이용될 수 있다. 또한, 본 발명에 따른, 유기산 및 킬레이트제를 이용한 과초산의 제조방법은 과초산의 생산성 및 안정성을 향상시키고, 안정적인 생산 및 공급을 보장한다.The aqueous peracetic acid solution according to the present invention has excellent productivity, stability, and sterilization properties, and can be used for various commercial applications. In addition, the method for producing peracetic acid using an organic acid and a chelating agent according to the present invention improves the productivity and stability of peracetic acid, and ensures stable production and supply.
이하, 본 발명을 상세히 설명한다. Hereinafter, the present invention will be described in detail.
본 발명에 따른 과초산 수용액에 포함되는 과초산(peracetic acid)의 분자식은 CH3C(=O)OOH이며, 탄화수소 말단(tail)은 과초산이 박테리아 등의 미생물 세포로 쉽게 침투하여 미생물의 내부 및 외부의 S-S 및 S-H 결합을 절단시킬 수 있는 구조를 가지고 있다. 따라서 과초산은 마이코박테리움 튜베르쿨로시스 (Mycobacterium tuberculosis), 이스케리치아 콜라이(Escherichia coli), 스타필로코쿠스 아우레우스 (Staphylococcus aureus), 바실러스 서브틸리스(Bacillus subtilis), 크렙시엘라 뉴모니에(Klebsiella pneumoniae), 살모넬라 타이피뮤리움 (Salmonella typhimurium), 슈도모나스 아루기노사 (Pseudomonas aeruginosa) 등의 다양한 박테리아 뿐만 아니라, 캔디다 알비칸스 (Candida albicans) 등의 진균 및 바이러스에 대하여 신속하고 효과적인 항균활성을 가지고 있다. 본 발명에 있어서는, 초산(acetic acid)과 과산화수소를 반응시켜 과초산 수용액을 얻으며, 그 반응식은 다음과 같다.The molecular formula of peracetic acid contained in the aqueous peracetic acid solution according to the present invention is CH 3 C(=O)OOH, and the hydrocarbon tail is the end of the hydrocarbon, where peracetic acid easily penetrates into microbial cells such as bacteria, so that the inside of the microorganism and a structure capable of cleaving external SS and SH bonds. Therefore, peracetic acid is Mycobacterium tuberculosis ( Mycobacterium tuberculosis ), Escherichia coli ( Escherichia coli ), Staphylococcus aureus ( Staphylococcus aureus ), Bacillus subtilis ( Bacillus subtilis ), Krebsiella new Fast and effective antibacterial activity against various bacteria, such as Klebsiella pneumoniae , Salmonella typhimurium , and Pseudomonas aeruginosa , as well as Candida albicans, fungi and viruses such as has a In the present invention, an aqueous solution of peracetic acid is obtained by reacting acetic acid with hydrogen peroxide, and the reaction formula is as follows.
[반응식 1][Scheme 1]
CH3COOH + H2O2 ↔ CH3COOOH + H2OCH 3 COOH + H 2 O 2 ↔ CH 3 COOOH + H 2 O
상기 반응식 1에서, 초산, 과산화수소, 과초산 및 물은 각 성분이 일정 비율로 혼합되어 화학적 평형상태를 유지하고 있다. In Scheme 1, each component of acetic acid, hydrogen peroxide, peracetic acid and water is mixed in a certain ratio to maintain a chemical equilibrium.
이때 과초산과 과산화수소는 과산화물(-O-O-)이고, 유기물과 접촉하는 것에 의해 하기 반응식 2에서와 같이 원자상의 산소(발생기 산소: O)를 발생시키고, 산화에 의한 살균효과를 발휘한다. 과초산은 단시간에 살균효과를 발휘하며, 과산화수소는 장시간 살균효과를 얻는 동시에 유기물을 박리(剝離)하여 세척하는 작용을 한다.At this time, peracetic acid and hydrogen peroxide are peroxides (-O-O-), and by contacting with an organic material, atomic oxygen (generated oxygen: O) is generated as in the following Reaction Formula 2, and a sterilizing effect by oxidation is exerted. Peracetic acid exerts a sterilization effect in a short time, and hydrogen peroxide has a long-term sterilization effect and at the same time removes organic matter and washes it.
[반응식 2][Scheme 2]
CH3COOOH + H2O ↔ CH3COOH + 1/2 O2 CH 3 COOOH + H 2 O ↔ CH 3 COOH + 1/2 O 2
본 발명에 따른 과초산 수용액에 포함되고, 또한 과초산 수용액의 제조에 사용되는 초산은 강한 자극성의 냄새가 나는 무색 액체이며, 과산화수소는 강한 산화력을 지니는 무색 액체이다. 본 발명에 따른 과초산 수용액에 있어서, 상기 과산화 수소의 함량은 전체 과초산 수용액에 대하여 1 내지 30 중량%, 바람직하게는 3 내지 29 중량%, 더욱 바람직하게는 20 내지 25 중량%이고, 상기 초산의 함량은 0.5 내지 15 중량%, 바람직하게는 3 내지 14 중량%, 더욱 바람직하게는 8 내지 12 중량%이다. 상기 과초산의 함량은 전체 과초산 수용액에 대하여 1 내지 25 중량%이며, 바람직하게는 1 내지 10 중량%, 더욱 바람직하게는 1 내지 8중량%, 가장 바람직하게는 2 내지 5 중량%이다. 여기서, 상기 과초산의 함량이 너무 작거나, 초산 및 과산화수소의 함량이 너무 많으면, 단시간 내에 충분한 살균, 소독, 및 반도체 에칭의 효과를 얻을 수 없다. 상기 과초산의 함량이 너무 많거나, 초산 및 과산화수소의 함량이 너무 작으면, 악취 및 자극성이 강해져 사용하는데 있어 바람직하지 못하며 안정성이 저하될 우려가 있다. Acetic acid included in the aqueous peracetic acid solution according to the present invention and used for the preparation of the aqueous peracetic acid solution is a colorless liquid with a strong irritating odor, and hydrogen peroxide is a colorless liquid having a strong oxidizing power. In the aqueous peracetic acid solution according to the present invention, the content of hydrogen peroxide is 1 to 30% by weight, preferably 3 to 29% by weight, more preferably 20 to 25% by weight, based on the total aqueous solution of peracetic acid, and the acetic acid The content of is 0.5 to 15% by weight, preferably 3 to 14% by weight, more preferably 8 to 12% by weight. The content of the peracetic acid is 1 to 25% by weight based on the total aqueous solution of peracetic acid, preferably 1 to 10% by weight, more preferably 1 to 8% by weight, and most preferably 2 to 5% by weight. Here, if the content of the peracetic acid is too small, or the content of acetic acid and hydrogen peroxide is too large, sufficient sterilization, disinfection, and semiconductor etching effects cannot be obtained within a short time. If the content of the peracetic acid is too large, or the content of acetic acid and hydrogen peroxide is too small, the odor and irritation are strong, which is undesirable for use and there is a risk of lowering stability.
본 발명에 따른 과초산 수용액에 포함되는 유기산은 평형반응(과산화수소 + 초산 ↔ 과초산 + 물)을 촉진시키는 역할을 수행하는 산 촉매로써, 2-하이드록시-1,2,3-프로판트리카르복실산(2-hydroxy-1,2,3-propanetricarboxylic acid, 시트릭산), 하이드록시부탄디오익산 (hydroxybutanedioic acid, 말릭산), 하이드록시에탄오익산 (Hydroxyethanoic acid, 글리콜릭산), 에탄디오익산 (ethanedioic acid, 옥살산), 부탄디오익산 (butanedioic acid, 숙신산), 포름산 (formic acid), 2-하이드록시프로파노익산 (2-Hydroxy propanoic acid, 락트산(lactic acid)), 2,6,8-트리옥시퓨린 (2,6,8-Trioxypurine, 요산(uric acid)) 등을 사용할 수 있고, 바람직하게는 2-하이드록시프로파노익산 또는 2,6,8-트리옥시퓨린을 사용할 수 있다. 상기 락트산(2-하이드록시프로파노익산) 또는 요산(2,6,8-트리옥시퓨린)은 다른 유기산과 비교하여, 금속이온에 대한 킬레이트 능력 및 항균력을 갖는 장점이 있다. 상기 유기산의 바람직한 함량은 과초산의 생산이 최대로 달성되는 함량으로써, 과산화수소와 초산이 반응 혼합물 내에 첨가되어, 과초산과 물이 생성될 때, 산 촉매인 유기산은 상기 평형 반응을 과초산의 생성 방향으로 촉진시킨다. 상기 유기산의 함량은 과초산 수용액에 대하여 1 내지 15 중량%인 것이 바람직하며, 만일 상기 유기산의 함량이 1 중량% 미만일 경우에는 과초산의 생성 반응을 충분히 촉진시키지 못하여, 과초산 수용액 내의 과초산 함량이 감소할 우려가 있고, 유기산의 함량이 15 중량%를 초과하여도 특별한 이익이 없이 경제적으로 불리할 뿐이다. 상기 유기산은 과초산 제조에 통상적으로 사용되는 인산, 황산 등의 무기산에 비하여, 인체에 무해하며, 각종 의료기기, 장비 등에 잔류하더라도, 기기의 부식을 유발하지 않고, 침전물을 형성하지 않으므로 바람직하다. 특히, 상기 과초산 수용액이 반도체 기판의 에칭 등에 사용될 경우, 인산, 황산 등의 무기산이 반도체 회로에 잔류하면, 반도체 회로의 전기적 특성에 악영향을 미치게 되나, 본 발명에 사용되는 유기산은 반도체 회로의 전기적 특성에 영향을 미치지 않는 장점이 있다.The organic acid contained in the aqueous peracetic acid solution according to the present invention is an acid catalyst that promotes the equilibrium reaction (hydrogen peroxide + acetic acid ↔ peracetic acid + water), and is 2-hydroxy-1,2,3-propanetricarboxyl. Acid (2-hydroxy-1,2,3-propanetricarboxylic acid, citric acid), hydroxybutanedioic acid (malic acid), hydroxyethanoic acid (glycolic acid), ethanedioic acid acid, oxalic acid), butanedioic acid (succinic acid), formic acid, 2-Hydroxy propanoic acid (lactic acid), 2,6,8-trioxy Purine (2,6,8-Trioxypurine, uric acid) may be used, and preferably 2-hydroxypropanoic acid or 2,6,8-trioxypurine may be used. The lactic acid (2-hydroxypropanoic acid) or uric acid (2,6,8-trioxypurine) has the advantage of having chelating ability and antibacterial activity against metal ions, compared to other organic acids. The preferred content of the organic acid is a content at which the production of peracetic acid is maximized. When hydrogen peroxide and acetic acid are added into the reaction mixture to produce peracetic acid and water, the organic acid as an acid catalyst causes the equilibrium reaction to produce peracetic acid promote in the direction The content of the organic acid is preferably 1 to 15% by weight based on the aqueous peracetic acid solution. If the content of the organic acid is less than 1% by weight, the peracetic acid production reaction cannot be sufficiently promoted, and the peracetic acid content in the peracetic acid aqueous solution There is a risk of this decrease, and even if the content of the organic acid exceeds 15% by weight, there is no special benefit and it is only economically disadvantageous. The organic acid is harmless to the human body compared to inorganic acids such as phosphoric acid and sulfuric acid commonly used in the production of peracetic acid, and even if it remains in various medical devices, equipment, etc., it does not cause corrosion of the device and does not form a precipitate, so it is preferable. In particular, when the aqueous peracetic acid solution is used for etching of semiconductor substrates, if inorganic acids such as phosphoric acid and sulfuric acid remain in the semiconductor circuit, the electrical characteristics of the semiconductor circuit are adversely affected, but the organic acid used in the present invention is the electrical property of the semiconductor circuit. It has the advantage of not affecting the characteristics.
본 발명에 따른 과초산 수용액은 과초산의 생물학적 작용, 세정 성능 및 안정성을 향상시키기 위한 킬레이트제를 더욱 포함한다. 본 발명에 있어서, 상기 킬레이트제로는, [[(포스포노메틸)이미노]]비스[[2,1-에탄디일니트로비스(메틸렌) 테트라키스-포스포닉에시드 ([[(Phosphonomethyl)imino]]bis[[2,1-ethanediyl nitrilobis(methylene)]] tetrakis-phosphonic acid), [비스(포스포노메틸)아미노] 메틸포스포닉에시드 ([Bis(phosphonomethyl)amino]methylphosphonic acid), 2- 포스포노부탄-1,2,4- 트리카복시릭에시드 (2-Phosphonobutane -1,2,4-Tricarboxylic Acid), 2-하이드록시 포스포노아세틱에시드(2-Hydroxy phosphonoacetic acid)을 단독 또는 혼합하여 사용한다. 본 발명에 사용되는 킬레이트제에 있어서, 특히 [[(포스포노메틸)이미노]]비스[[2,1-에탄디일니트로비스(메틸렌)테트라키스- 포스포닉에시드 및 [비스(포스포노메틸)아미노]메틸포스포닉에시드는 -P(O)(OH)2 기와 3차 아민기를 동시에 포함하여, 부식방지 및 스케일 생성 방지 능력이 우수한 장점이 있다. 또한, 2-포스포노부탄-1,2,4- 트리카복시릭에시드 및 2-하이드록시 포스포노 아세틱에시드는 -P(O)(OH)2 기와 아세틱에시드기(-CH2COOH)를 동시에 포함하여, 금속염에 의한 스케일 생성 방지능력 및 산, 알카리에 안정하고 산화제에 안정성이 우수한 장점이 있다. 상기 킬레이트제의 함량은 전체 과초산 수용액에 대하여 1 내지 5 중량%, 바람직하게는 1.5 내지 3 중량%이며, 만일 상기 킬레이트제의 함량이 너무 작으면, 과초산의 안정화 효과를 충분히 얻을 수 없으며, 너무 많으면 (부식성) 폐액의 T-N, T-P 농도가 높아지거나, 경제적으로 바람직하지 못하다. 한편, 종래의 킬레이트제로서 사용되는 1-하이드록시에틸리덴 비스포스포닉산, {[(카르복시메틸) 이미노]비스(에틸렌니트릴로)}테트라아세트산, EDTA (ethylene diamine tetraacetic acid)) 등은 용해도가 낮아 과초산 용액의 조성에 따라 불용물이 발생할 우려가 있다.The aqueous solution of peracetic acid according to the present invention further includes a chelating agent for improving the biological action, cleaning performance and stability of peracetic acid. In the present invention, the chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethanediylnitrobis(methylene)tetrakis-phosphonic acid ([[(Phosphonomethyl)imino]] bis[[2,1-ethanediyl nitrilobis(methylene)]] tetrakis-phosphonic acid), [bis(phosphonomethyl)amino]methylphosphonic acid ([Bis(phosphonomethyl)amino]methylphosphonic acid), 2-phosphonobutane -1,2,4-Tricarboxylic acid (2-Phosphonobutane -1,2,4-Tricarboxylic Acid) and 2-hydroxy phosphonoacetic acid (2-Hydroxy phosphonoacetic acid) are used alone or in combination. In the chelating agent used in the present invention, in particular [[(phosphonomethyl)imino]]bis[[2,1-ethanediylnitrobis(methylene)tetrakis-phosphonic acid and [bis(phosphonomethyl) Amino] methyl phosphonic acid has the advantage of having an excellent ability to prevent corrosion and scale formation by simultaneously including a -P(O)(OH) 2 group and a tertiary amine group. In addition, 2-phosphonobutane-1,2,4-tricarboxylic acid and 2-hydroxy phosphono acetic acid are -P (O) (OH) 2 group and acetic acid group (-CH 2 COOH) At the same time, it has the advantage of preventing the formation of scale by metal salts, being stable to acids and alkalis, and having excellent stability to oxidizing agents. The content of the chelating agent is 1 to 5% by weight, preferably 1.5 to 3% by weight, based on the total aqueous solution of peracetic acid. If the content of the chelating agent is too small, the stabilizing effect of peracetic acid cannot be sufficiently obtained, If too much (corrosive), the TN, TP concentration of the waste liquid becomes high, or it is economically undesirable. On the other hand, 1-hydroxyethylidene bisphosphonic acid, {[(carboxymethyl) imino] bis (ethylenenitrilo)} tetraacetic acid, EDTA (ethylene diamine tetraacetic acid)) used as conventional chelating agents, etc. The solubility is low, and there is a possibility that insoluble substances may be generated depending on the composition of the peracetic acid solution.
본 발명에 따른 과초산 수용액의 나머지 성분을 구성하는 물로는 이온 교환수, 역삼투막 생산수, 연수 등을 사용할 수 있으나, 연수는 증발 잔류물이 남고 과초산 수용액의 안정성을 저하시킬 우려가 있다. 따라서, 본 발명에 사용되는 물로는 전기전도도 1μS/㎝ 이하(1,000,000Ω 이상)의 물, 구체적으로 이온 교환수나 역삼투막 생산수를 사용하는 것이 바람직하다. 상기 물의 함량은 전체 과초산 수용액에 대하여 10 내지 95.5 중량%인 것이 바람직하며, 10 내지 40 중량%이면 더욱 바람직하다. 상기 물의 함량이 10 중량% 미만일 경우 과초산의 농도가 너무 높아 악취 및 기기부식이 발생될 우려가 있고, 95.5 중량%를 초과하면 항균활성 및 에칭 능력이 떨어지는 문제가 발생한다.As water constituting the remaining components of the aqueous peracetic acid solution according to the present invention, ion-exchange water, reverse osmosis membrane production water, soft water, etc. may be used, but the soft water may leave an evaporation residue and reduce the stability of the aqueous peracetic acid solution. Therefore, as the water used in the present invention, it is preferable to use water having an electrical conductivity of 1 μS/cm or less (1,000,000 Ω or more), specifically, ion exchange water or reverse osmosis membrane production water. The content of water is preferably 10 to 95.5 wt%, more preferably 10 to 40 wt%, based on the total aqueous peracetic acid solution. If the water content is less than 10% by weight, the concentration of peracetic acid is too high, there is a risk of odor and device corrosion, and when it exceeds 95.5% by weight, the antibacterial activity and etching ability are deteriorated.
본 발명에 따른 과초산 수용액을 제조하는 방법으로는 과산화수소, 초산, 유기산, 킬레이트제 등을 혼합하는 다양한 방법이 사용될 수 있다. 본 발명에 따른 과초산 수용액을 제조하는 바람직한 방법은 전체 과초산 수용액에 대하여 1 내지 15 중량%의 유기산과 물을 혼합하는 단계; 상기 혼합 용액에, 전체 과초산 수용액에 대하여 1 내지 5 중량%의 킬레이트제를 투입하는 단계; 상기 단계에서 얻어진 혼합 용액에, 초산을 투입하는 단계; 상기 단계에서 얻어진 혼합 용액에 과산화수소수를 서서히 투입하는 단계; 및 상기 단계에서 얻어진 혼합용액을 상온에서 숙성하는 단계를 포함한다. 구체적으로, 희석제 역할을 하는 물과 유기산을 교반기에 투입하여 일정하게 혼합한 후, 안정된 조건에서 과초산이 생성될 수 있도록 킬레이트제, 초산을 차례로 혼합하고, 과산화수소를 서서히 투입하는 과정을 거친 후, 상온에서 숙성시켜 일정한 함량의 과초산을 형성할 수 있다. 본 발명에 따른 과초산 수용액의 제조에 사용되는 초산은 비한정적으로 70 내지 99 중량%, 바람직하게는 80 내지 90 중량%, 더욱 바람직하게는 83 내지 87 중량% 농도의 초산 수용액인 것이 바람직하고, 과산화수소는 비한정적으로 32 내지 50 중량%, 바람직하게는 32 내지 40 중량%, 더욱 바람직하게는 35 내지 38 중량%의 과산화수소수인 것이 바람직하다. 상기 초산 및 과산화수소의 사용량은, 최종 과초산 수용액 내에서의 초산의 농도가 0.5 내지 15 중량%이고, 과산화수소의 농도가 1 내지 30 중량%이며, 과초산의 농도가 1 내지 25 중량%가 되도록, 반응 조건에 따라 적절히 조절하여 첨가할 수 있으며, 예를 들면, 최종 과초산 수용액 내의 목적하는 과초산 함량에 대하여 몰비로 약 1.5 내지 3배의 과산화수소와 몰비로 약 2 내지 3배의 초산이 사용될 수 있다. 만일 상기 과산화수소 및 초산의 사용량이 상기 범위를 벗어날 경우, 반응 온도, 유기산의 함량 등을 변경시켜, 최종 생성물 내의 과초산 함량을 조절하여야 하므로 바람직하지 못하다. 이와 같은 과초산 수용액의 제조 반응은 글래스 라이닝(glass lining) 용기, 테프론 코팅(tefron coating) 용기, SUS 316 등의 스테인레스 용기 등에서 수행될 수 있고, 반응 온도는 상온인 것이 바람직하다.As a method for preparing the aqueous peracetic acid solution according to the present invention, various methods of mixing hydrogen peroxide, acetic acid, an organic acid, a chelating agent, and the like may be used. A preferred method for preparing an aqueous peracetic acid solution according to the present invention comprises the steps of mixing 1 to 15% by weight of an organic acid and water with respect to the total aqueous peracetic acid solution; adding a chelating agent in an amount of 1 to 5% by weight based on the total aqueous peracetic acid solution to the mixed solution; adding acetic acid to the mixed solution obtained in the above step; slowly adding hydrogen peroxide solution to the mixed solution obtained in the above step; and aging the mixed solution obtained in the above step at room temperature. Specifically, water and organic acid serving as a diluent are added to a stirrer and uniformly mixed, and then a chelating agent and acetic acid are sequentially mixed so that peracetic acid can be produced under stable conditions, and hydrogen peroxide is slowly added. It can be aged at room temperature to form a certain amount of peracetic acid. Acetic acid used in the preparation of the aqueous solution of peracetic acid according to the present invention is preferably, but not limited to, 70 to 99% by weight, preferably 80 to 90% by weight, more preferably 83 to 87% by weight of acetic acid aqueous solution, hydrogen peroxide is, but is not limited to, 32 to 50% by weight, preferably 32 to 40% by weight, more preferably 35 to 38% by weight of hydrogen peroxide. The amount of acetic acid and hydrogen peroxide used is such that the concentration of acetic acid in the final aqueous solution of peracetic acid is 0.5 to 15% by weight, the concentration of hydrogen peroxide is 1 to 30% by weight, and the concentration of peracetic acid is 1 to 25% by weight, According to the reaction conditions, it can be appropriately adjusted and added. For example, hydrogen peroxide in a molar ratio of about 1.5 to 3 times and acetic acid in a molar ratio of about 2 to 3 times with respect to the desired peracetic acid content in the final aqueous solution of peracetic acid can be used. have. If the amount of hydrogen peroxide and acetic acid used is out of the above range, it is not preferable to change the reaction temperature, the content of organic acid, etc., so that the content of peracetic acid in the final product must be adjusted. The reaction for preparing such an aqueous solution of peracetic acid may be performed in a glass lining container, a Teflon coating container, a stainless container such as SUS 316, and the like, and the reaction temperature is preferably room temperature.
본 발명에 따른 과초산 수용액은 다양한 용도로 이용될 수 있다. 예를 들면 의료장비 및 기구의 살균 세척제, 식품, 음료, 주류 생산공정의 살균 세척제, 산업용 냉각탑의 냉각수 살균제, 제지 공정의 살균제, 역삼투막의 세정제 및 반도체 에칭제 등에 이용될 수 있다. 더욱 상세히 용도를 살펴보면 의료 장치 및 기구로는 내시경, 기관지경과 같이 렌즈가 부착된 의료장치, 신장 투석장치, 혈액 투석장치 및 매스, 핀셋, 가위 등의 의료기구를 예시할 수 있으며, 식품, 음료, 주류 생산 공정에서는 파이프라인, 탱크, 혼합기 등과 같은 가공설비 및 계속적으로 작동하는 균질화 또는 저온 살균기구를 예시할 수 있다.The aqueous solution of peracetic acid according to the present invention can be used for various purposes. For example, it can be used as a sterilizing and cleaning agent for medical equipment and instruments, a sterilizing agent for food, beverage, and alcoholic beverage production processes, a coolant sterilizer for an industrial cooling tower, a sterilizer for a papermaking process, a cleaning agent for reverse osmosis membranes, and a semiconductor etchant. Looking at the use in more detail, medical devices and instruments may include medical devices with lenses attached such as endoscopes and bronchoscopes, renal dialysis devices, hemodialysis devices, and medical devices such as masses, tweezers, scissors, and food, beverage, In a liquor production process, processing equipment such as pipelines, tanks, mixers, etc. and continuously operating homogenizers or pasteurizers may be exemplified.
이하, 구체적인 실시예를 통하여 본 발명을 더욱 상세히 설명한다. 하기 실시예는 본 발명을 예시하기 위한 것으로서, 본 발명이 하기 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail through specific examples. The following examples are intended to illustrate the present invention, but the present invention is not limited by the following examples.
[실시예 1] 과초산 수용액 제조 [Example 1] Preparation of aqueous solution of peracetic acid
이온 교환수 686 g과 2,6,8-트리옥시퓨린 168 g (1 mol)을 테프론 용기에 첨가 후 혼합시켰다. 제조된 물과 유기산의 혼합액에 킬레이트제로 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g을 첨가하고, 초산 120 g을 첨가한 후 혼합시켰다. 최종적으로 과산화수소수 68 g를 서서히 투입하고 상온에서 3일간 숙성시켜 7.6 중량% 과초산 수용액을 제조하였다.686 g of ion-exchanged water and 168 g (1 mol) of 2,6,8-trioxypurine were added to a Teflon container and then mixed. 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent was added to the prepared mixture of water and organic acid, and 120 g of acetic acid was added, followed by mixing. Finally, 68 g of hydrogen peroxide solution was slowly added and aged at room temperature for 3 days to prepare a 7.6 wt% aqueous solution of peracetic acid.
[실시예 2] 과초산 수용액 제조 [Example 2] Preparation of aqueous solution of peracetic acid
킬레이트제로서 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g 대신, 2-하이드록시 포스포노 아세틱에시드 30 g을 사용한 것을 제외하고는, 실시예 1과 동일한 방법으로 과초산 수용액을 제조하였다.Peracetic acid in the same manner as in Example 1, except that 30 g of 2-hydroxyphosphono acetic acid was used instead of 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent. An aqueous solution was prepared.
[실시예 3] 과초산 수용액 제조 [Example 3] Preparation of aqueous solution of peracetic acid
킬레이트제로서 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g 대신, [[(포스포노메틸)이미노]]비스[[2,1-에틴디일니트로비스(메틸렌)테트라키스- 포스포닉에시드 30 g을 사용한 것을 제외하고는, 실시예 1과 동일한 방법으로 과초산 수용액을 제조하였다.Instead of 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent, [[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitrobis(methylene)tetrakis - An aqueous solution of peracetic acid was prepared in the same manner as in Example 1, except that 30 g of phosphonic acid was used.
[실시예 4] 과초산 수용액 제조 [Example 4] Preparation of aqueous solution of peracetic acid
킬레이트제로서 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g 대신, [비스(포스포노메틸)아미노]메틸포스포닉에시드 30 g을 사용한 것을 제외하고는, 실시예 1과 동일한 방법으로 과초산 수용액을 제조하였다.The same as in Example 1, except that 30 g of [bis(phosphonomethyl)amino]methylphosphonic acid was used instead of 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent. An aqueous solution of peracetic acid was prepared by this method.
[비교예 1] 과초산 수용액 제조 [Comparative Example 1] Preparation of aqueous solution of peracetic acid
킬레이트제로서 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g 대신, {[(카르복시메틸) 이미노]비스(에틸렌니트릴로)}테트라아세트산 30 g을 사용한 것을 제외하고는, 실시예 1과 동일한 방법으로 과초산 수용액을 제조하였다.Except for using 30 g of {[(carboxymethyl) imino] bis (ethylenenitrile)} tetraacetic acid instead of 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent, An aqueous solution of peracetic acid was prepared in the same manner as in Example 1.
[비교예 2] 과초산 수용액 제조 [Comparative Example 2] Preparation of aqueous solution of peracetic acid
킬레이트제로서 2-포스포노부탄-1,2,4- 트리카복시릭에시드 30 g 대신, EDTA 30 g을 사용한 것을 제외하고는, 실시예 1과 동일한 방법으로 과초산 수용액을 제조하였다.An aqueous solution of peracetic acid was prepared in the same manner as in Example 1, except that 30 g of EDTA was used instead of 30 g of 2-phosphonobutane-1,2,4-tricarboxylic acid as a chelating agent.
과초산 수용액의 안정성 시험Stability test of aqueous peracetic acid solution
상기 실시예 및 비교예에서 제조된 과초산 수용액을 1개월간 상온에서 방치하면서 불용물의 침전발생 여부, 변색 및 가스 생성 여부를 관찰하여, 과초산 수용액의 안정성을 시험하였으며, 그 결과를 하기 표 1에 나타내었다. The peracetic acid aqueous solution prepared in Examples and Comparative Examples was left at room temperature for 1 month, and the stability of the peracetic acid aqueous solution was tested by observing whether insoluble matter was precipitated, discoloration, and gas generation, and the results are shown in Table 1 below. indicated.
실험 결과stability
Experiment result
방지됨scale
prevented
비스(메틸렌)테트라키스- 포스포닉에시드[[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitro
Bis(methylene)tetrakis-phosphonic acid
기능corrosion protection
function
방지됨scale
prevented
(에틸렌니트릴로)}테트라아세트산{[(carboxymethyl) imino] bis
(ethylenenitrilo)}tetraacetic acid
형성precipitate
formation
형성precipitate
formation
또한, 과초산 수용액을 미국 하크(HACH)사의 수용액중의 과초산 및 과산화수소 농도분석 방법(Determination of Peracetic Acid (PAA) and Hydrogen Peroxide (H2O2) in Water)으로 실험 및 평가하여, 시간에 따른 과초산의 농도(단위: 중량%) 변화를 관찰하였으며, 그 결과를 표 2에 나타내었다.In addition, the peracetic acid aqueous solution was tested and evaluated by the method for analyzing the concentration of peracetic acid (PAA) and Hydrogen Peroxide (H2O2) in Water by HACH of the United States, and peracetic acid according to time of the concentration (unit: wt%) was observed, and the results are shown in Table 2.
기간
term
상기 표 1 및 2에 나타낸 바와 같이, 과초산의 제조에 있어서, 유기산으로 2,6,8-트리옥시퓨린을 사용하고, 킬레이트제로서, [[(포스포노메틸)이미노]]비스 [[2,1-에틴디일니트로비스(메틸렌) 테트라키스-포스포닉에시드, [비스(포스포노메틸) 아미노]메틸포스포닉에시드, 2-포스포노부탄-1,2,4-트리카복시릭에시드, 또는 2-하이드록시 포스포노아세틱에시드를 사용하면, 부식 및 스케일 방지 기능이 향상되고 킬레이팅 능력이 향상되어 안정성이 우수하고, 세정 후 수세과정에서 스케일 생성에 의한 2차 오염을 방지할 수 있는 효과가 있다. As shown in Tables 1 and 2 above, in the production of peracetic acid, 2,6,8-trioxypurine was used as an organic acid, and as a chelating agent, [[(phosphonomethyl)imino]]bis[[ 2,1-ethyndiylnitrobis(methylene)tetrakis-phosphonic acid, [bis(phosphonomethyl)amino]methylphosphonic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, or When 2-hydroxy phosphonoacetic acid is used, corrosion and scale prevention function is improved, chelating ability is improved, so stability is excellent, and secondary contamination caused by scale generation in the washing process after washing can be prevented. there is
Claims (5)
0.5 내지 15 중량%의 초산;
1 내지 30 중량%의 과산화수소;
1 내지 15 중량%의 유기산;
1 내지 5 중량%의 킬레이트제; 및
나머지 물을 포함하며,
상기 킬레이트제는 [[(포스포노메틸)이미노]]비스[[2,1-에틴디일니트로비스 (메틸렌)]테트라키스포스포닉에시드, [비스(포스포노메틸)아미노]메틸 포스포닉 에시드, 2-포스포노부탄-1,2,4-트리카복시릭에시드, 2-하이드록시포스포노아세틱 에시드 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 것이며,
상기 유기산은 락트산, 요산 및 이들의 혼합물로 이루어진 군으로 선택되는 화합물인 것인 살균 세척제.1 to 25% by weight of peracetic acid;
0.5 to 15% by weight of acetic acid;
1 to 30% by weight of hydrogen peroxide;
1 to 15% by weight of an organic acid;
1 to 5% by weight of a chelating agent; and
contains the rest of the water,
The chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitrobis(methylene)]tetrakisphosphonic acid, [bis(phosphonomethyl)amino]methyl phosphonic acid, It is selected from the group consisting of 2-phosphonobutane-1,2,4-tricarboxylic acid, 2-hydroxyphosphonoacetic acid, and mixtures thereof,
The organic acid is a disinfectant cleaner that is a compound selected from the group consisting of lactic acid, uric acid, and mixtures thereof.
상기 혼합 용액에, 전체 과초산 수용액에 대하여 1 내지 5 중량%의 킬레이트제를 투입하는 단계;
상기 단계에서 얻어진 혼합 용액에, 초산을 투입하는 단계;
상기 단계에서 얻어진 혼합 용액에 과산화수소수를 투입하는 단계; 및
상기 단계에서 얻어진 혼합용액을 상온에서 숙성하여 초산의 농도가 0.5 내지 15 중량%이고, 과산화수소의 농도가 1 내지 30 중량%이며, 과초산의 농도가 1 내지 25 중량%가 되도록 하는 단계를 포함하며,
상기 킬레이트제는 [[(포스포노메틸)이미노]]비스[[2,1-에틴디일니트로비스 (메틸렌)테트라키스포스포닉에시드, [비스(포스포노메틸)아미노]메틸 포스포닉 에시드, 2-포스포노부탄-1,2,4-트리카복시릭에시드, 2-하이드록시포스포노아세틱 에시드 및 이들의 혼합물로 이루어지는 군으로부터 선택되며,
상기 유기산은 락트산, 요산 및 이들의 혼합물로 이루어진 군으로 선택되는 화합물인 것인 살균 세척제의 제조방법.Mixing 1 to 15% by weight of an organic acid and water with respect to the total aqueous peracetic acid solution;
adding a chelating agent in an amount of 1 to 5% by weight based on the total aqueous peracetic acid solution to the mixed solution;
adding acetic acid to the mixed solution obtained in the above step;
adding hydrogen peroxide solution to the mixed solution obtained in the above step; and
The mixed solution obtained in the above step is aged at room temperature so that the concentration of acetic acid is 0.5 to 15% by weight, the concentration of hydrogen peroxide is 1 to 30% by weight, and the concentration of peracetic acid is 1 to 25% by weight. ,
The chelating agent is [[(phosphonomethyl)imino]]bis[[2,1-ethyndiylnitrobis(methylene)tetrakisphosphonic acid, [bis(phosphonomethyl)amino]methyl phosphonic acid, 2 -phosphonobutane-1,2,4-tricarboxylic acid, 2-hydroxyphosphonoacetic acid and selected from the group consisting of mixtures thereof,
Wherein the organic acid is a compound selected from the group consisting of lactic acid, uric acid, and mixtures thereof.
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