KR102225335B9 - Oled용 메탈 마스크 시트 제조 방법 - Google Patents

Oled용 메탈 마스크 시트 제조 방법

Info

Publication number
KR102225335B9
KR102225335B9 KR1020200016859A KR20200016859A KR102225335B9 KR 102225335 B9 KR102225335 B9 KR 102225335B9 KR 1020200016859 A KR1020200016859 A KR 1020200016859A KR 20200016859 A KR20200016859 A KR 20200016859A KR 102225335 B9 KR102225335 B9 KR 102225335B9
Authority
KR
South Korea
Prior art keywords
oled
metal mask
mask sheet
menufacturing method
menufacturing
Prior art date
Application number
KR1020200016859A
Other languages
English (en)
Other versions
KR102225335B1 (ko
Inventor
이재훈
김태성
Original Assignee
풍원정밀(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 풍원정밀(주) filed Critical 풍원정밀(주)
Priority to KR1020200016859A priority Critical patent/KR102225335B1/ko
Application granted granted Critical
Publication of KR102225335B1 publication Critical patent/KR102225335B1/ko
Publication of KR102225335B9 publication Critical patent/KR102225335B9/ko

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020200016859A 2020-02-12 2020-02-12 Oled용 메탈 마스크 시트 제조 방법 KR102225335B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020200016859A KR102225335B1 (ko) 2020-02-12 2020-02-12 Oled용 메탈 마스크 시트 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200016859A KR102225335B1 (ko) 2020-02-12 2020-02-12 Oled용 메탈 마스크 시트 제조 방법

Publications (2)

Publication Number Publication Date
KR102225335B1 KR102225335B1 (ko) 2021-03-10
KR102225335B9 true KR102225335B9 (ko) 2021-11-12

Family

ID=75149013

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200016859A KR102225335B1 (ko) 2020-02-12 2020-02-12 Oled용 메탈 마스크 시트 제조 방법

Country Status (1)

Country Link
KR (1) KR102225335B1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023096187A1 (ko) * 2021-11-29 2023-06-01 주식회사 볼트크리에이션 건식 식각을 이용한 미세 금속 마스크 제조방법 및 그 방법에 의해 제조된 미세 금속 마스크
KR102380239B1 (ko) * 2021-12-15 2022-03-29 주식회사 핌스 Oled용 오픈 메탈 마스크 제조 방법
KR20230173545A (ko) * 2022-06-17 2023-12-27 김용석 대전체를 이용한 고해상도 oled 패널 제조용 파인 메탈 마스크 제조 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101918551B1 (ko) * 2018-10-17 2019-02-08 주식회사 핌스 박막 공정용 오픈 마스크 시트 및 그 제조방법

Also Published As

Publication number Publication date
KR102225335B1 (ko) 2021-03-10

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Legal Events

Date Code Title Description
AMND Amendment
E601 Decision to refuse application
X091 Application refused [patent]
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]