KR102225301B1 - Touch screen panel - Google Patents

Abstract

A touch screen panel is provided. The touch screen panel includes a substrate, a first buffer layer made of a ternary oxide having a refractive index of 1.8 to 2.9 disposed on the substrate, a second buffer layer made of an insulator having a refractive index of 1.3 to 1.8 disposed on the first buffer layer, and And a transparent electrode layer disposed on the second buffer layer.

Description

Touch screen panel}

The present invention relates to a touch screen panel, and more particularly, to a buffer layer of a capacitive touch screen panel.

Recently, as electronic devices such as computers and portable mobile communication terminals become common, a touch screen is widely used as a means for inputting data. Touch screens are classified into a resistive type, a capacitive type, an ultrasonic type, and an infrared type. Among them, the capacitive method is the most effective for manufacturing a high-transmission sensor while enabling multi-touch, which is the basis of emotional touch.

In the capacitive touch screen, when a conductor such as a finger touches the transparent electrode on the substrate, a certain capacitance is formed in the insulating layer by static electricity generated from the finger, and a signal is transmitted through this part to determine the size of the signal. Calculate and locate.

In the capacitive touch screen, when the difference in reflectance between the portion where the transparent electrode is formed and the portion where the transparent electrode is not formed is large, the transparent electrode pattern becomes conspicuous to a person. To prevent this, visibility must be secured through index-matching.

The problem to be solved by the present invention is to provide a touch screen panel that is inexpensive, has a fast process, and has excellent optical properties.

The problem to be solved by the present invention is not limited to the problems mentioned above, and other problems that are not mentioned will be clearly understood by those skilled in the art from the following description.

In order to achieve the problem to be solved, a touch screen panel according to an embodiment of the present invention includes a substrate; A first buffer layer made of a ternary or higher oxide having a refractive index of 1.8 to 2.9 disposed on the substrate; A second buffer layer made of an insulator having a refractive index of 1.3 to 1.8 disposed on the first buffer layer; And a transparent electrode layer disposed on the second buffer layer.

Details of other embodiments are included in the detailed description and drawings.

According to the touch screen panel of the present invention, it is possible to lower the production cost.

According to the touch screen panel of the present invention, the process time can be shortened because the deposition rate of the ternary oxide or more is fast.

According to the touch screen panel of the present invention, transmittance and index matching may be improved.

1 is a cross-sectional view of a touch screen panel according to embodiments of the present invention.
2 is a graph showing transmittance and reflectance of a touch screen panel according to an embodiment of the present invention.
Figure 3 is SiO ₂ /Nb ₂ O ₅ It is a graph showing the transmittance and reflectance of a touch screen panel having a buffer layer.
4 is a cross-sectional view of a touch screen panel made of only a transparent electrode layer and a substrate without a buffer layer.
5 is a graph showing transmittance and reflectance of a touch screen panel composed of only a transparent electrode layer and a substrate without a buffer layer.

Advantages and features of the present invention, and a method of achieving them will become apparent with reference to the embodiments described later in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms. It is provided to completely inform the scope of the invention to the possessor, and the invention is only defined by the scope of the claims. The same reference numerals refer to the same constituent elements throughout the entire specification.

The terms used in the present specification are for describing exemplary embodiments and are not intended to limit the present invention. In this specification, the singular form also includes the plural form unless specifically stated in the phrase. As used in the specification,'comprises' and/or'comprising' refers to the presence of one or more other elements, steps, actions and/or elements, and/or elements, steps, actions and/or elements mentioned. Or does not preclude additions.

Further, the embodiments described in the present specification will be described with reference to sectional views and/or plan views, which are ideal exemplary diagrams of the present invention. In the drawings, thicknesses of films and regions are exaggerated for effective description of technical content. Accordingly, the shape of the exemplary diagram may be modified due to manufacturing techniques and/or tolerances. Accordingly, embodiments of the present invention are not limited to the specific form shown, but also include a change in form generated according to the manufacturing process. For example, the etched area shown at a right angle may be rounded or may have a shape having a predetermined curvature. Accordingly, regions illustrated in the drawings have schematic properties, and the shapes of regions illustrated in the drawings are intended to illustrate a specific shape of a device region and are not intended to limit the scope of the invention.

Hereinafter, a touch screen panel according to embodiments of the present invention will be described with reference to FIGS. 1 to 5.

1 is a cross-sectional view of a touch screen panel according to embodiments of the present invention. Referring to FIG. 1, a touch screen panel according to embodiments of the present invention may include a substrate 100, a buffer layer 200, and a transparent electrode layer 300.

The substrate 100 is a tempered glass substrate, a soda-lime glass substrate, a reinforced plastic substrate, a polycarbonate (PC) substrate coated with a reinforced film, or a reinforced polyethylene terephthalate (PET) substrate. Can be

The buffer layer 200 may be disposed on the substrate 100. The buffer layer 200 may include a first buffer layer 210 and a second buffer layer 220. The first buffer layer 210 and the second buffer layer 220 are selected from among a screen printing method, a physical vapor deposition method, a chemical vapor deposition method, or an atomic layer deposition method. It can be formed sequentially by any one method.

The first buffer layer 210 may be disposed on the substrate 100. The first buffer layer 210 may have a thickness of about 2 nm to about 20 nm. The first buffer layer 210 is a material having a higher index of refraction than the second buffer layer 220 and may be a ternary or higher oxide having a refractive index between about 1.8 to about 2.9. For example, the first buffer layer 210 is zinc-tin oxide (Zn-Sn-Oxide), zinc-tin-indium oxide (Zn-Sn-In-Oxide), zinc-sulfur-oxide (Zn-S-Oxide) , Zinc-titanium-oxide (Zn-Ti-Oxide), zinc-titanium-indium oxide (Zn-Ti-In-Oxide), indium-gallium-zinc-oxide (In-Ga-Zn-Oxide), zinc-indium -It may be made of any one selected from oxide (Zn-In-Oxide) or zinc-tin-titanium oxide (Zn-Sn-Ti-Oxide).

The second buffer layer 220 may be disposed on the first buffer layer 210. The second buffer layer may have a thickness of about 20 nm to about 100 nm. The second buffer layer 220 is a material having a lower index of refraction than the first buffer layer 210 and may be an insulator having a refractive index between about 1.3 and about 1.8. For example, the second buffer layer 220 may be formed of any one selected _{from SiO 2} , SiN _x , MgF ₂ , or SiO _x N _y.

The transparent electrode layer 300 may be disposed on the buffer layer 200. For example, the transparent electrode layer 300 is a plurality of first electrode cells arranged in a first direction, a plurality of second electrode cells arranged in a second direction, and a first electrode cell formed in isolation between the first electrode cells A plurality of first connection electrodes disposed while connecting the cells in a first direction, a plurality of insulation patterns disposed on each of the first connection electrodes, and a second electrode cell adjacent to and disposed on each of the insulation patterns A plurality of second connection electrodes connecting them in a second direction may be included.

2 is a graph showing transmittance and reflectance of a touch screen panel according to an exemplary embodiment of the present invention.

Referring to FIG. 2, transmittance and reflectance of the touch screen panel according to an embodiment of the present invention can be checked. In this embodiment, the first buffer layer 210 is made of zinc-tin oxide (Zn-Sn-Oxide), and the second buffer layer 220 is made _{of SiO 2.} According to this embodiment, the transmittance of the light (T _{0 ) passing through the region where the transparent electrode layer is formed and the light (T 1} ) passing through the region where the transparent electrode layer is not formed is 89.0% or more at a wavelength of 550 nm. _{, The difference in reflectance (ΔR) between the light (R 0} ) reflected from the region where the transparent electrode layer is formed _{and the light (R 1} ) reflected from the region where the transparent electrode layer is not formed is less than 1% at 412 nm to 700 nm.

Figure 3 is SiO ₂ /Nb ₂ O ₅ It is a graph showing the transmittance and reflectance of a touch screen panel having a buffer layer.

3, SiO ₂ /Nb ₂ O ₅ The transmittance and reflectance of the touch screen panel having the buffer layer can be checked. In this case, the transmittance of the light (T _{0 ) passing through the area where the transparent electrode layer is formed and the light (T 1} ) passing through the area where the transparent electrode layer is not formed is 88.8% or more at a wavelength of 550 nm, and the transparent electrode layer _{The difference in reflectance (ΔR) between the light R 0} reflected in the formed region _{and the light R 1} reflected in the region where the transparent electrode layer is not formed is less than 1% at a wavelength of 413 nm to 700 nm.

Comparing the transmittance and reflectance of the touch screen panel according to an embodiment of the present invention (Fig. 2) and _{the transmittance and reflectance of the touch screen panel having a SiO 2} /Nb ₂ O ₅ buffer layer (Fig. 3), one embodiment of the present invention It can be seen that the transmittance of the touch screen panel according to the example is higher at a wavelength of 550 nm, and that index matching of the touch screen panel according to an embodiment of the present invention is performed better.

4 is a cross-sectional view of a touch screen panel made of only a transparent electrode layer and a substrate without a buffer layer. 5 is a graph showing transmittance and reflectance of a touch screen panel composed of only a transparent electrode layer and a substrate without a buffer layer.

Referring to FIGS. 4 and 5, transmittance and reflectance of a touch screen panel made of only a transparent electrode layer and a substrate without a buffer layer can be checked. _{In this case, the difference in reflectance (ΔR) between the light (R 0} ) reflected from the region where the _{transparent electrode layer is formed and the light (R 1} ) reflected from the region where the transparent electrode layer is not formed is 1% in the visible region (400 nm to 700 nm) That's it.

When comparing the transmittance and reflectance of the touch screen panel according to an embodiment of the present invention (FIG. 2) and the transmittance and reflectance of the touch screen panel consisting of only a transparent electrode layer and a substrate without a buffer layer (FIG. 5), an embodiment of the present invention It can be seen that the index matching of the touch screen panel according to is performed well.

In the above, embodiments of the present invention have been described with reference to the accompanying drawings, but those of ordinary skill in the art to which the present invention pertains can be implemented in other specific forms without changing the technical spirit or essential features. You can understand that there is. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not limiting.

100: substrate
200: buffer layer
210: first buffer layer
220: second buffer layer
300: transparent electrode layer
R ₀ : Light reflected from the area where the transparent electrode layer is formed
R ₁ : Light reflected from the area where the transparent electrode layer is not formed
T ₀ : Light passing through the area where the transparent electrode layer is formed
T ₁ : Light passing through the area where the transparent electrode layer is not formed

Claims (6)

Board;
A first buffer layer disposed on the substrate and having a refractive index of 1.8 to 2.9;
A second buffer layer disposed on the first buffer layer and having a refractive index of 1.3 to 1.8; And a transparent electrode layer disposed on the second buffer layer,
The first buffer layer includes a ternary oxide or more,
The ternary oxides are zinc-tin oxide (Zn-Sn-Oxide), zinc-tin-indium oxide (Zn-Sn-In-Oxide), zinc-sulfur-oxide (Zn-S-Oxide), and zinc-titanium. -Oxide (Zn-Ti-Oxide), zinc-titanium-indium oxide (Zn-Ti-In-Oxide), indium-gallium-zinc-oxide (In-Ga-Zn-Oxide), zinc-indium-oxide (Zn -In-Oxide), or zinc-tin-titanium oxide (Zn-Sn-Ti-Oxide),
The second buffer layer includes any one _{of SiO 2} , SiN _x , MgF ₂ , or SiO _x N _y,
The first buffer layer and the second buffer layer are in contact with each other, and the second buffer layer and the transparent electrode layer are in contact with each other.

delete delete The method of claim 1,
The thickness of the first buffer layer is 2nm to 20nm,
The thickness of the second buffer layer is 20nm to 100nm touch screen panel.
delete delete

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