KR102208303B9 - 유기금속 화합물 공급 장치 - Google Patents
유기금속 화합물 공급 장치Info
- Publication number
- KR102208303B9 KR102208303B9 KR1020190117845A KR20190117845A KR102208303B9 KR 102208303 B9 KR102208303 B9 KR 102208303B9 KR 1020190117845 A KR1020190117845 A KR 1020190117845A KR 20190117845 A KR20190117845 A KR 20190117845A KR 102208303 B9 KR102208303 B9 KR 102208303B9
- Authority
- KR
- South Korea
- Prior art keywords
- organometallic compound
- supplying organometallic
- supplying
- compound
- organometallic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020190117845A KR102208303B1 (ko) | 2019-09-25 | 2019-09-25 | 유기금속 화합물 공급 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020190117845A KR102208303B1 (ko) | 2019-09-25 | 2019-09-25 | 유기금속 화합물 공급 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR102208303B1 KR102208303B1 (ko) | 2021-01-28 |
KR102208303B9 true KR102208303B9 (ko) | 2022-04-15 |
Family
ID=74239128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020190117845A KR102208303B1 (ko) | 2019-09-25 | 2019-09-25 | 유기금속 화합물 공급 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR102208303B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102407768B1 (ko) | 2021-07-01 | 2022-06-10 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
WO2023059827A1 (en) * | 2021-10-08 | 2023-04-13 | Entegris, Inc. | Modular tray for solid chemical vaporizing chamber |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09246194A (ja) * | 1996-03-05 | 1997-09-19 | Sony Corp | 有機金属化合物原料用容器、有機金属化合物原料用複合容器および有機金属化学気相成長装置 |
TW451275B (en) * | 1999-06-22 | 2001-08-21 | Tokyo Electron Ltd | Metal organic chemical vapor deposition method and apparatus |
JP4585182B2 (ja) * | 2003-07-11 | 2010-11-24 | 東ソー・ファインケム株式会社 | トリメチルインジウムの充填方法および充填容器 |
JP4571787B2 (ja) | 2003-07-08 | 2010-10-27 | 東ソー・ファインケム株式会社 | 固体有機金属化合物用充填容器およびその充填方法 |
JP2008218760A (ja) * | 2007-03-06 | 2008-09-18 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法および半導体装置の製造装置 |
KR102027179B1 (ko) * | 2018-05-08 | 2019-10-02 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
-
2019
- 2019-09-25 KR KR1020190117845A patent/KR102208303B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR102208303B1 (ko) | 2021-01-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB201917727D0 (en) | Apparatus | |
IL288201A (en) | Dental care device | |
PL4065497T3 (pl) | Maszyna do automatycznego pozycjonowania przedmiotów | |
GB201904079D0 (en) | Apparatus | |
GB202016842D0 (en) | Multi-Gym apparatus | |
EP3606757C0 (en) | DEVICE FOR SPRAY SEPARATION | |
GB202007971D0 (en) | Hair0styling apparatus | |
KR102208303B9 (ko) | 유기금속 화합물 공급 장치 | |
KR102342082B9 (ko) | 양액미립자층을 구비하는 식물 재배 수단 | |
IL304508A (en) | Processes for the preparation of aniline-pyrrolopyridine compounds | |
EP3969638C0 (de) | Verfahren zum beschichten von teilen | |
FI3683184T3 (fi) | Parannettu laitteisto | |
GB202111099D0 (en) | Light-emiting apparatus | |
GB201909178D0 (en) | Methods for preparing compounds | |
GB201914997D0 (en) | Apparatus | |
GB2587872B (en) | Mounting apparatus | |
GB201909538D0 (en) | Deposition apparatus | |
KR102280296B9 (ko) | 내시경 유도를 통한 흉관 삽관술 장치 | |
GB201909188D0 (en) | Methhods for preparing compounds | |
GB201918942D0 (en) | Plasma deposition apparatus | |
EP3982704A4 (en) | PARTS FEED DEVICE | |
GB201918864D0 (en) | Apparatus | |
GB201907188D0 (en) | Apparatus | |
GB201905243D0 (en) | Radiotherepy apparatus | |
PL3856477T3 (pl) | Urządzenie do doprowadzania taśm obrzeżowych oraz instalacja do oklejania obrzeży z takim urządzeniem |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
G170 | Re-publication after modification of scope of protection [patent] |