KR102143432B1 - Swing nozzle unit - Google Patents

Abstract

The present invention relates to a swing nozzle unit, wherein the swing nozzle unit according to an embodiment of the present invention includes a processing fluid supply tube through which processing fluid is supplied, a nozzle body penetrating through the processing fluid supply tube, and the processing fluid supply tube. A nozzle tip penetrated by and fastened to the nozzle body, a ferrol provided between the nozzle body and the nozzle tip and penetrated by the treatment fluid supply tube, and provided between the ferrol and the nozzle tip and supplying the treatment fluid It is penetrated by the tube, and includes a ferrol receiving portion for fixing the treatment fluid supply tube by pressing the ferrol according to the degree of fastening of the nozzle tip and the nozzle body.

Description

Swing nozzle unit {SWING NOZZLE UNIT}

The present invention relates to a swing nozzle unit, and more particularly, to a swing nozzle unit for spraying a processing fluid to clean a substrate.

In general, as semiconductor devices become high-density, high-integration, and high-performance, circuit patterns are rapidly miniaturized. As a result, contaminants such as particles, organic contaminants, and metal contaminants remaining on the substrate surface are largely affected by the characteristics of the device and production yield. Will have an effect. For this reason, a cleaning process that removes various contaminants or unnecessary films adhering to the surface of the substrate is becoming very important in the semiconductor manufacturing process, and a process of cleaning the substrate is carried out in steps before and after each unit process of manufacturing a semiconductor. .

Currently, the cleaning method used in the semiconductor manufacturing process is largely divided into dry cleaning and wet cleaning, and wet cleaning is a bath that removes contaminants by immersing a substrate in a chemical solution and chemical dissolution. It is divided into a type and a single-leaf type that removes contaminants by supplying a chemical solution to the surface of the substrate while rotating the substrate by placing the substrate on the spin chuck.

In the single-leaf type cleaning apparatus, various types of cleaning liquids are used according to the kind of contaminants and film quality to be removed from the substrate, and the cleaning liquid is selectively provided to the substrate by a swing nozzle and a fixed nozzle.

In the case of a swing nozzle, a processing fluid supply tube through which processing fluid is supplied is disposed inside the nozzle tip of the swing nozzle. The processing fluid may be supplied at different temperatures and sprayed onto the substrate through the processing fluid supply tube.

According to Patent Application No. 10-2009-0089121, the treatment fluid supply tube is fixed to the nozzle tip of the swing nozzle by force fitting. When the processing fluid supply tube is fixed to the nozzle tip by force fitting, the processing fluid supply tube may be deteriorated by the processing fluid supplied at different temperatures or by repeated driving of the swing nozzle. Accordingly, the processing fluid supply tube may flow from the nozzle tip, causing process failure.

An object of the present invention is to provide a swing nozzle unit capable of preventing a flow of a processing fluid supply tube within a nozzle tip despite deterioration of the processing fluid supply tube.

A swing nozzle unit according to an embodiment of the present invention for achieving the above object includes: a processing fluid supply tube through which processing fluid is supplied; A nozzle body penetrated by the treatment fluid supply tube; A nozzle tip penetrated by the processing fluid supply tube and fastened to the nozzle body; A ferrol provided between the nozzle body and the nozzle tip and penetrated by the treatment fluid supply tube; And a ferrol receiving part provided between the ferrole and the nozzle tip, penetrated by the treatment fluid supply tube, and pressurizes the ferrole according to the fastening degree of the nozzle tip and the nozzle body to fix the treatment fluid supply tube. do.

In addition, in an embodiment, the ferrol receiver may be integrally formed with the nozzle tip.

In addition, in an embodiment, a spring may be provided between the nozzle tip and the ferrole receiving portion to press the ferrole receiving portion in the ferrole direction.

In addition, in an embodiment, the ferrol may have an inclined cylindrical shape cut in the longitudinal direction of the processing fluid supply tube.

In the swing nozzle unit according to an embodiment of the present invention, the treatment fluid supply tube may be fixed to the nozzle tip of the swing nozzle using a ferrule and a ferrule receiving part.

In the swing nozzle unit according to an embodiment of the present invention, even when the processing fluid supply tube is deteriorated, the processing fluid supply tube can be prevented from flowing from the nozzle tip of the swing nozzle by using a spring.

1 is a plan view showing the configuration of a single wafer substrate processing apparatus according to the present invention.
2 is a side view showing the configuration of a single wafer substrate processing apparatus according to the present invention.
3 is a side cross-sectional view showing a container in the substrate processing apparatus shown in FIG. 1.
4 is an exploded perspective view illustrating a coupling relationship between a nozzle body of a nozzle unit and a nozzle tip.
5 is a cross-sectional view illustrating a coupling relationship between the nozzle body and the nozzle tip shown in FIG. 4.
6 is a perspective view showing various forms of ferrol.

Hereinafter, a sheet-fed substrate processing apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. First of all, in adding reference numerals to elements of each drawing, it should be noted that the same elements are assigned the same numerals as possible even if they are indicated on different drawings. In addition, in describing the present invention, when it is determined that detailed descriptions of related well-known structures or functions may obscure the subject matter of the present invention, detailed descriptions thereof will be omitted.

In the examples below, the treatment fluid is, for example, hydrofluoric acid (HF), sulfuric acid (H3SO4), nitric acid (HNO3), phosphoric acid (H3PO4), and an SC-1 solution (ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2) and water ( A mixture of H2O)), ozone water, reduced water, ionized water, an aqueous solution such as an alkaline solution, or a mixture thereof.

1 is a plan view showing the configuration of a single wafer substrate processing apparatus according to the present invention. 2 is a side view showing the configuration of a single wafer substrate processing apparatus according to the present invention. 3 is a side cross-sectional view showing a container in the substrate processing apparatus shown in FIG. 1.

In this embodiment, a semiconductor substrate is illustrated and described as an example as a substrate processed by the single wafer substrate processing apparatus 1, but the present invention is not limited thereto, and can be applied to various types of substrates such as a liquid crystal display device and a glass substrate. have.

1 to 3, a single wafer substrate processing apparatus 1 according to the present invention is an apparatus for removing foreign substances and film quality remaining on the substrate surface by using various processing fluids, and includes a chamber 10 and a processing container. 100), a substrate support member 200, a first swing nozzle unit 300, a fixed nozzle 500, a second swing nozzle unit 700 and an exhaust member 400.

The chamber 10 provides a sealed inner space, and a fan filter unit 12 is installed on the upper side. The fan filter unit 12 generates vertical airflow in the chamber 10.

The fan filter unit 12 is a device in which a filter and an air supply fan are modularized into one unit, and is a device that filters clean air and supplies it into the chamber. Clean air passes through the fan filter unit 12 and is supplied into the chamber to form a vertical airflow. This vertical airflow of air provides a uniform airflow over the substrate, and pollutants (fumes) generated in the process of treating the substrate surface by the processing fluid are exhausted together with air through the suction ducts of the processing vessel 100. By being discharged to and removed from the member 400, a high degree of cleanliness inside the processing container is maintained.

The chamber 10 is divided into a process area 16 and a maintenance area 18 by horizontal partition walls 14. Although only a part is shown in the drawing, in addition to the discharge lines 141, 143, and 145 connected to the processing vessel 100 and the sub-exhaust line 410, the driving part of the lifting unit and the driving part of the first swing nozzle unit 300 are in the maintenance area 18. It is a space in which 300b, a supply line, etc. are located, and such maintenance area 18 is preferably isolated from a process area in which substrate processing is performed.

The processing container 100 has a cylindrical shape with an open top, and provides a process space for processing the substrate w. The opened upper surface of the processing container 100 is provided as a passage for carrying out and carrying in the substrate w. A substrate support member 200 is positioned inside the processing container 100. The substrate support member 200 supports the substrate W during the process and rotates the substrate.

Hereinafter, the processing container 100 and the substrate support member 200 will be described in detail with reference to the drawings.

3 is a cross-sectional view showing a processing container and a substrate support member shown in FIG. 1.

Referring to the drawing, the processing vessel 100 is divided by an upper space 132a in which the spin head 210 is located and a spin head 210 from the upper space 132a, and is exhausted at the lower end so that forced exhaust is performed. It provides a lower space (132b) to which the duct 190 is connected. In the upper space 132a of the processing vessel 100, the first, second, and third annular suction ducts 110, 120, 130 in the form of a multi-stage for introducing and inhaling the processing fluid, gas, and fumes scattered on the rotating substrate. Is placed as. The annular first, second, and third suction ducts 110, 120 and 130 have exhaust ports H communicating with one common annular space (corresponding to the lower space of the container). An exhaust duct 190 connected to the exhaust member 400 is provided in the lower space 132b.

Specifically, the first to third suction ducts 110, 120, and 130 each have a bottom surface having an annular ring shape and a side wall extending from the bottom surface and having a cylindrical shape. The second suction duct 120 surrounds the first suction duct 110 and is spaced apart from the first suction duct 110. The third suction duct 130 surrounds the second suction duct 120 and is spaced apart from the second suction duct 120.

The first to third suction ducts 110, 120, and 130 provide first to third recovery spaces RS1, RS2, and RS3 into which the gas containing the fume and the processing fluid scattered from the substrate w are introduced. . The first recovery space RS1 is defined by the first suction duct 110, and the second recovery space RS2 is defined by the spaced space between the first suction duct 110 and the second suction duct 120. , The third recovery space RS3 is defined by a space between the second suction duct 120 and the third suction duct 130.

Each of the upper surfaces of the first to third suction ducts 110, 120, and 130 is formed of an inclined surface having a central portion opening and gradually increasing a distance from the connected sidewall to the corresponding bottom surface toward the opening. Accordingly, the processing fluid scattered from the substrate w flows into the recovery spaces RS1, RS2, and RS3 along the upper surfaces of the first to third suction ducts 110, 120, and 130.

The first treatment liquid introduced into the first recovery space RS1 is discharged to the outside through the first recovery line 141. The second treatment liquid introduced into the second recovery space RS2 is discharged to the outside through the second recovery line 143. The third treatment liquid introduced into the third recovery space RS3 is discharged to the outside through the third recovery line 145.

On the other hand, the processing container 100 is coupled with an elevating unit 600 that changes the vertical position of the processing container 100. The lifting unit 600 linearly moves the processing container 100 in the vertical direction. As the processing container 100 is moved up and down, the relative height of the processing container 100 with respect to the spin head 210 is changed. When the substrate W is loaded onto the spin head 210 or unloaded from the spin head 210, the processing vessel 100 descends so that the spin head 210 protrudes above the processing vessel 100.

In addition, during the process, the height of the processing container 100 is adjusted so that the processing liquid can be introduced into the predetermined suction ducts 110, 120, and 130 according to the type of the processing liquid supplied to the substrate W. Accordingly, the relative vertical position between the processing container 100 and the substrate w is changed. Accordingly, the treatment vessel 100 may have different types of the treatment liquid and the polluted gas recovered for each of the recovery spaces RS1, RS2, and RS3.

In this embodiment, the substrate processing apparatus 1 vertically moves the processing vessel 100 to change the relative vertical position between the processing vessel 100 and the substrate support member 200. However, the substrate processing apparatus 1 may vertically move the substrate supporting member 200 to change a relative vertical position between the processing vessel 100 and the substrate supporting member 200.

The substrate support member 200 is installed inside the processing container 100. The substrate support member 200 supports the substrate W during a process, and may be rotated by a driver 240 to be described later while the process is in progress. The substrate support member 200 has a spin head 210 having a circular upper surface, and support pins 212 and chucking pins 214 supporting the substrate W are provided on the upper surface of the spin head 210. Have. The support pins 212 are arranged in a predetermined arrangement at a predetermined distance apart from the edge of the upper surface of the spin head 210 and are provided to protrude upward from the spin head 210. The support pins 212 support the lower surface of the substrate W so that the substrate W is supported in a state spaced from the spin head 210 in the upward direction. The chucking pins 214 are disposed outside the support pins 212, respectively, and the chucking pins 214 are provided to protrude upward. The chucking pins 214 align the substrate W such that the substrate W supported by the plurality of support pins 212 is placed in a proper position on the spin head 210. During the process, the chucking pins 214 are in contact with the side of the substrate W to prevent the substrate W from being separated from the original position.

A support shaft 220 supporting the spin head 210 is connected to a lower portion of the spin head 210, and the support shaft 220 rotates by a driving unit 230 connected to the lower end thereof. The driving unit 230 may be provided with a motor or the like. As the support shaft 220 rotates, the spin head 210 and the substrate W rotate.

The exhaust member 400 is for providing an exhaust pressure (suction pressure) to the first to third intake ducts 110, 120, and 130 during a process. The exhaust member 400 includes a sub-exhaust line 410 and a damper 420 connected to the exhaust duct 190. The sub-exhaust line 410 receives exhaust pressure from an exhaust pump (not shown) and is connected to a main exhaust line buried in a floor space of a semiconductor production line (fab).

The fixed nozzle units 500 are fixedly installed on the top of the processing container 100 to supply ultrapure water, ozone water, nitrogen gas, etc. to the center of the substrate, respectively.

The second swing nozzle unit 700 is moved to the upper center of the substrate through the swing movement to supply a fluid for drying the substrate on the substrate. The fluid for drying may include isopropyl alcohol and hot nitrogen gas.

The first swing nozzle units 300 are located outside the processing container 100. A processing fluid (acidic liquid, alkaline liquid, neutral liquid, drying gas) for cleaning or etching the substrate w with the substrate placed on the spin head 210 while rotating in the boom swing method of the first swing nozzle units 300 Supply. As shown in FIG. 1, the first swing nozzle units 300 are arranged side by side, and each of the first swing nozzle units 300 has a different distance from the processing container 100, so that the length of each of the first swing nozzle units 300 is different according to their respective rotation radius. You can see that they are different.

Each of the first swing nozzle units 300 includes a nozzle unit 300a located in a process area and a driving unit 300b for rotating the θ axis and moving up and down the z axis located in the maintenance area.

The driving unit 300b includes a support shaft 382 connected to the flange 340 of the nozzle unit 300a, a swing driving unit 384 and an elevation driving unit 386, and the swing driving unit 384 is a nozzle unit 300a The nozzle part 300a connected to the support shaft 382 is rotated so as to swing to the center of the substrate. The swing drive unit 384 may be formed by an assembly having a motor, a belt, and a pulley. The elevating driving unit 386 provides a driving force for linearly moving the nozzle unit 300a in the vertical direction. The elevating driver 386 may be formed of a linear driving device such as a cylinder or a linear motor. When the nozzle unit 300a is rotated, the elevating driving unit 386 lifts the nozzle unit 300a to prevent collision with the adjacent nozzle unit 300a.

Hereinafter, a coupling relationship between the nozzle body 310 of the nozzle unit 300a and the nozzle tip 330 will be described in detail with reference to FIGS. 4 to 5.

4 is an exploded perspective view for explaining the coupling relationship between the nozzle body and the nozzle tip of the nozzle portion, Figure 5 is a cross-sectional view for explaining the coupling relationship between the nozzle body and the nozzle tip shown in FIG.

The nozzle unit 300a includes a treatment fluid supply tube 302, a nozzle body 310, a fixing member 320, and a nozzle tip 330.

The nozzle body 310 has a long rod shape that provides an inner passage in which the treatment fluid supply tube 302 is located, and is penetrated by the treatment fluid supply tube 302. The nozzle body 310 is made of a metal material or a resin material, and in order to reduce corrosion by a treatment fluid which is a chemical agent, the nozzle body 310 is preferably made of a resin material having strong corrosion resistance.

One end of the nozzle body 310 is provided with a male screw portion 314 having a cylindrical groove 313 therein. The outer wall of the male screw part 314 is formed with a male screw thread for fastening with a female thread of the nozzle tip 330. The bottom surface of the groove 313 of the male screw portion 314 supports the ferrol 321 so that the ferrol 321 inserted into the inside does not push into the nozzle body 310. A through hole through which the processing fluid supply tube 302 passes is formed in the bottom surface of the groove 313 of the male screw part 314.

One end of the nozzle tip 330 is provided with a female threaded portion 334 having a cylindrical groove shape. The inner wall of the female screw portion 334 is formed with a female screw thread that can be fastened to the male screw thread. The bottom surface of the female threaded part 334 supports the ferrole receiving part 326 so that the ferrole receiving part 326 inserted into the groove by the fastening of the nozzle tip 330 can press the ferrole 321. A hole 332 through which the treatment fluid supply tube 302 passes is formed in the bottom surface of the female thread part 334. The hole 332 formed on the bottom surface of the female thread portion 334 has an inner diameter that is substantially the same as the outer diameter of the processing fluid supply tube 302. The treatment fluid supply tube 302 may pass through the hole 332 of the nozzle tip 330 and may be fitted and fixed in the hole 332 of the nozzle tip 330. One end of the processing fluid supply tube 302 protrudes from the nozzle tip 330 with a length suitable for processing.

The fixing member 320 includes a ferrole 321, a ferrole receiving part 326, and a spring 329.

The ferrole 321 is penetrated by the treatment fluid supply tube 302, and is provided between the nozzle body 310 and the nozzle tip 330, and in more detail, the ferrole 321 is a nozzle body 310 and a ferrole receiver. It is provided between the parts 326.

The ferrole 321 has an inclined cylindrical shape having a gap 323 cut in the longitudinal direction of the treatment fluid supply tube 302. Specifically, the ferrole 321 has a shape in which the diameter of the upper surface is larger than that of the lower surface, and the ferrole inclined surface 322 is formed so that the outer surface is inclined in one direction. The ferrole inclined surface 322 is in contact with the receiving part inclined surface 327 of the corresponding ferrole receiving part 326 and is pressed by the receiving part inclined surface 327 to fix the treatment fluid supply tube 302.

The upper surface of the ferrole 321 is inserted into the groove 313 inside the male screw portion 314 of the nozzle body 310. Since the upper surface of the ferrole 321 is caught on the bottom surface of the groove 313 inside the male screw portion 314, the ferrole 321 is no longer drawn into the nozzle body 310.

The lower surface of the ferrol 321 is disposed to face the ferrol receiving part 326. The ferrol inclined surface 322 is in contact with the receiving portion inclined surface 327 of the ferrol receiving portion 326 corresponding thereto.

The ferrol receiving part 326 is penetrated by the treatment fluid supply tube 302. The ferrole receiving part 326 is disposed between the ferrole 321 and the spring 329. The ferrole receiving part 326 has a receiving part inclined surface 327 corresponding to the ferrole inclined surface 322. The receiving portion inclined surface 327 pressurizes the ferrole inclined surface 322 while being moved forward in the direction of the nozzle body 310 by fastening the nozzle tip 330. As the ferrole inclined surface 322 is pressed, the gap 323 of the ferrole 321 is narrowed, and as the gap 323 of the ferrol 321 is narrowed, the ferrole 321 is transferred to the treatment fluid supply tube 302. 321) is fixed with a stronger force.

The ferrole receiving part 326 may be integrally formed with the nozzle body 310. In this case, the spring 329 may not be provided.

The spring 329 is disposed between the ferrole receiving part 326 and the nozzle tip 330 to push the ferrole receiving part 326 in the direction of the nozzle body 310 with a constant force. Accordingly, the receiving portion inclined surface 327 of the ferrole receiving portion 326 presses the ferrole inclined surface 322 with a constant force, so that the treatment fluid supply tube 302 is fixed. Any spring 329 may be used as long as it is an elastic member having an elastic restoring force.

When the cross-sectional area of the processing fluid supply tube 302 shrinks by a high or low temperature processing fluid in the processing fluid supply tube or by a repetitive processing process, the processing fluid supply tube 302 is fixed by a ferrol 321 The power to become can be weakened.

In the case of a swing nozzle unit provided with a spring 329 between the ferrole receiving portion 326 and the nozzle tip 330, even if the operator does not additionally rotate the nozzle tip 330, the ferrole receiving portion 326 is a spring ( By additionally pressurizing the ferrol 321 by 329 to fix the treatment fluid supply tube 302, the flow of the treatment fluid supply tube 302 from the nozzle tip 330 can be prevented.

In addition, even if the ferrol receiving part 326 is additionally pressed by the spring 329, the ferrole 321 only further fixes the treatment fluid supply tube 302, and the bottom surface of the groove 313 inside the male screw part 314 As a result, the length of the treatment fluid supply tube 302 protruding from the nozzle tip does not change because it is not pushed into the nozzle body 310.

On the other hand, unlike the above structure, the positions of the ferrol 321 and the ferrol receiving part 326 may be changed.

6 is a perspective view showing various forms of ferrol.

6, the gap 323 of the ferrol 321 may be formed along the longitudinal direction of the treatment fluid supply tube 302, or may be formed with an inclination angle in the longitudinal direction of the treatment fluid supply tube 302 There are, and can be formed in a “)” shape.

A guide member 324 may be formed along one end portion of the gap 323 of the ferrol 326, and a guide member groove 325 corresponding to the guide member 324 may be formed along the other end portion.

When the gap between the ferroles 326 is pressed and the gaps 323 are narrowed, the guide member 324 wraps the outside of the treatment fluid supply tube 302 so that the treatment fluid supply tube 302 is formed by the gap 323 of the ferrol. ) Can be prevented from being damaged.

In addition, the guide member groove 325 guides the guide member 324 and simultaneously presses the guide member 324 to further fix the treatment fluid supply tube 302.

In the swing nozzle unit according to an embodiment of the present invention, the treatment fluid supply tube may be fixed to the nozzle tip of the swing nozzle using a ferrule and a ferrule receiving part.

In the swing nozzle unit according to an embodiment of the present invention, even when the processing fluid supply tube is deteriorated, the processing fluid supply tube may be prevented from flowing from the nozzle tip of the swing nozzle by using a spring.

The embodiments of the present invention have been described in more detail with reference to the accompanying drawings, but the present invention is not necessarily limited to these embodiments, and may be variously modified without departing from the technical spirit of the present invention. Therefore, the embodiments disclosed in the present invention are not intended to limit the technical spirit of the present invention, but to explain, and the scope of the technical spirit of the present invention is not limited by these embodiments. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive. The scope of protection of the present invention should be interpreted by the following claims, and all technical ideas within the scope equivalent thereto should be construed as being included in the scope of the present invention.

300a: nozzle part 310: nozzle body
314: male thread 320: fixing member
321: ferrol 322: ferrol slope
323: gap 324: guide member
324: guide member groove 326: ferrole receiving portion
327: receiving portion slope 329: spring
330: nozzle tip

Claims (4)

In the swing nozzle unit,
A processing fluid supply tube through which processing fluid is supplied;
A nozzle body penetrated by the treatment fluid supply tube;
A nozzle tip penetrated by the processing fluid supply tube and fastened to the nozzle body;
A ferrol provided between the nozzle body and the nozzle tip and penetrated by the treatment fluid supply tube; And
A ferrol receiving part provided between the ferrol and the nozzle tip, penetrated by the treatment fluid supply tube, and pressurizes the ferrol according to the degree of fastening between the nozzle tip and the nozzle body to fix the treatment fluid supply tube. ,
A swing nozzle unit, characterized in that it further comprises a spring provided between the nozzle tip and the ferrole receiving part to press the ferrole receiving part in the ferrole direction. delete delete The method of claim 1,
The ferrol is a swing nozzle unit, characterized in that it has an inclined cylindrical shape cut in the longitudinal direction of the processing fluid supply tube.

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