KR102141410B1 - Liquid crystal display device and fabricating method of the same - Google Patents

Abstract

The present invention discloses a liquid crystal display device. The disclosed liquid crystal display device of the present invention and a method of manufacturing the same include: a first substrate; A first black matrix defining red, green, blue and white subpixels formed on the first substrate; A second black matrix formed in the white subpixel region; A color filter layer formed on the red, green and blue sub-pixels; And an insulating layer formed on the first and second black matrices and the red, green, and blue color filter layers, wherein a height of the upper surface of the second black matrix is larger than that of the upper surface of the first black matrix. .
Therefore, the liquid crystal display device according to the present invention and a method of manufacturing the same, even though the white sub-pixel region is not provided with a white color filter, the step difference between the insulating layer formed on the red, green and blue sub-pixels and the insulating layer formed on the white sub-pixels To improve. In addition, the liquid crystal display device and method for manufacturing the same according to the present invention can simplify the process and reduce costs by forming a first substrate including a white subpixel without forming a separate white resin and adding a photolithography process. .

Description

Liquid crystal display device and its manufacturing method {Liquid crystal display device and fabricating method of the same}

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device capable of improving a cell gap defect occurring in a white sub-pixel and a manufacturing method thereof

A liquid crystal display device (LCD), which is actively used in TVs, monitors, etc., consists of a liquid crystal display panel in which a liquid crystal layer is injected and bonded between two parallel substrates as a component. An image is displayed by adjusting the transmittance by changing the arrangement direction of liquid crystal molecules using an electric field in the display panel.

To this end, the liquid crystal display device includes a liquid crystal display panel in which liquid crystal cells are arranged in a matrix, and a driving circuit for driving the liquid crystal display panel. The liquid crystal display panel is provided with pixel electrodes for applying an electric field to each of the liquid crystal cells and a reference electrode, that is, a common electrode.

In general, the pixel electrode is a plurality of gate lines and data lines cross-arranged on the lower substrate to define a pixel, and a thin film transistor (TFT) is provided at each intersection to be connected to the pixel electrode formed in each pixel. do.

Each of the pixel electrodes is connected to a thin film transistor (TFT) used as a switching element. The pixel electrode drives the liquid crystal cell together with the common electrode according to the data signal supplied through the thin film transistor.

Here, the gate line and the data line cross to define red (R), green (G), and blue (B) subpixels. The subpixels are provided in a vertical stripe manner that is sequentially arranged in the horizontal direction. And three sub-pixels of red, green, and blue form one pixel. In this case, one pixel made of the R, G, and B sub-pixels has only about 27 to 33% of the amount of light emitted to the upper substrate through the color filter when the amount of light emitted from the backlight is 100%. The luminance of is lowered.

In order to solve this problem, white subpixels (W) are added to the three subpixels of red (R), green (G), and blue (B), and four subpixels are formed of one pixel. A liquid crystal display using a method has been proposed. In the white sub-pixel, when the amount of light emitted from the backlight unit is 100%, the amount of light emitted to the upper substrate through the color filter is higher than 85%. Accordingly, the average value of the light emission amount of each pixel composed of red, green, blue, and white subpixels is relatively high, thereby improving the luminance of the liquid crystal display.

The liquid crystal display device used as the red (R), green (G), blue (B), and white subpixel (W) has a reduced manufacturing efficiency due to the addition of a photolithography process for forming the white subpixel. Accordingly, a structure in which a white resin is left empty without using a white resin is proposed. In this case, a gap between the white sub-pixel and the red, green, and blue sub-pixels occurs, resulting in a cell gap, and there is a problem in that gap-like stains are generated. Is required.

The present invention provides a liquid crystal display device having a white color filter in a white sub-pixel region and improving the step difference between the insulating layer formed in the red, green and blue sub-pixels and the insulating layer formed in the white sub-pixel, and a method for manufacturing the same There is a purpose.

In addition, the present invention provides a liquid crystal display device and a method of manufacturing the same by forming a first substrate including a white subpixel without forming a separate white resin and adding a photolithography process to simplify the process and reduce costs. It has its purpose.

A liquid crystal display device of the present invention for solving the problems of the prior art as described above, the first substrate; A first black matrix defining red, green, blue and white subpixels formed on the first substrate; A second black matrix formed in the white subpixel region; A color filter layer formed on the red, green and blue sub-pixels; And an insulating layer formed on the first and second black matrices and the red, green, and blue color filter layers, wherein a height of the upper surface of the second black matrix is larger than that of the upper surface of the first black matrix. .

In addition, in the method of manufacturing a liquid crystal display device of the present invention, red, green, blue, and white subpixels are defined on the substrate, and the first, second, 3, and 4 openings respectively correspond to the red, green, blue, and white subpixels. Disposing a first black matrix and a second black matrix in the fourth opening; Forming red, green, and blue color filter layers corresponding to the first, second, and third openings, respectively; And forming an insulating layer on the red, green, and blue color filter layers and on the first and second black matrices, wherein the height of the first and second black matrices is greater than the height of the first black matrices. It is characterized by forming.

The liquid crystal display according to the present invention and a method of manufacturing the same improve the step difference between the insulating layer formed on the red, green and blue subpixels and the insulating layer formed on the white subpixels, even though the white subpixel region is not provided with a white color filter. It has the first effect.

In addition, the liquid crystal display device and the manufacturing method according to the present invention can form a first substrate including white sub-pixels without forming a separate white resin and adding a photolithography process, simplifying the process and reducing costs. There is a second effect.

1 is a view showing a first array substrate of a liquid crystal display device according to a first embodiment of the present invention.
2 is a view showing a part of a liquid crystal display according to a first embodiment of the present invention.
3 is a view showing a first array substrate of a liquid crystal display according to a second embodiment of the present invention.
4 is a diagram illustrating a first array substrate of a liquid crystal display device according to a third embodiment of the present invention.
5 is a view showing a method of manufacturing a first array substrate of a liquid crystal display device.
6 is a view showing a pattern form of the second black matrix of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The following embodiments are provided as examples to ensure that the spirit of the present invention is sufficiently conveyed to those skilled in the art. Accordingly, the present invention is not limited to the embodiments described below and may be embodied in other forms. And in the drawings, the size and thickness of the device may be exaggerated for convenience. Throughout the specification, the same reference numbers refer to the same components.

1 is a view showing a first array substrate of a liquid crystal display device according to a first embodiment of the present invention.

Referring to FIG. 1, the first array substrate 10 of the liquid crystal display device of the present invention may be a color filter array substrate. The first array substrate 10 includes a red sub-pixel (R) that implements red, a green sub-pixel (G) that implements green, a blue sub-pixel (B) that implements blue, and a white sub-pixel that implements white ( W).

Further, the first substrate 100 of the liquid crystal display includes a first black matrix 110 defining the red, green, blue, and white subpixels R, G, B, and W. That is, the first black matrix 110 includes openings corresponding to the red, green, and blue subpixels R, G, and B.

The red color filter layer 120a, the green color filter layer 120b, and the blue color filter layer 120c are repeatedly formed corresponding to the opening. The red, green, and blue color filter layers 120a, 120b, and 120c may have the same thickness.

In addition, the color filter layer may be omitted in the white sub-pixel W. A second black matrix 130 may be formed in the white sub-pixel W. In addition, an insulating layer 140 is formed on the first black matrix 110, the second black matrix 130, the red color filter layer 120a, the green color filter layer 120b, and the blue color filter layer 120c. The insulating layer 140 may be an overcoat layer.

The second black matrix 130 may be formed of the same material as the first black matrix 110. Here, the first and second black matrices 110 and 130 may be formed of a material having an optical density of 0.5/µm to 4.5/µm. The optical density of the black matrix prevents color mixing between different colors disposed adjacent to each other, and the luminance of white in the white sub-pixel W may not fall.

In addition, the area of the second black matrix 130 on the plan view may occupy 10% to 30% of the area of the white subpixel (W). When the second black matrix 130 is formed with an area smaller than 10%, there is a problem in that the step A of the insulating layer 140 is not sufficiently reduced. In addition, when the second black matrix 130 is formed with an area larger than 30%, there is a problem in that the luminance of the white sub-pixel W decreases due to the second black matrix 130.

The height of the upper surface 130a of the second black matrix may be higher than the height of the upper surface 110a of the first black matrix. The height of the upper surface is defined as the length of the surface in contact with the first substrate and the corresponding surface of the surface in contact with the first substrate.

In addition, the height of the upper surface 110a of the first black matrix may be the same as the thickness h2 of the first black matrix. In addition, the height of the upper surface 130a of the second black matrix may be equal to the thickness h3 of the second black matrix. The thickness is defined as the length from the top surface to the bottom surface.

The thickness h3 of the second black matrix may be formed to be thicker than the thickness h2 of the first black matrix. In addition, the thickness h3 of the second black matrix may be formed equal to or smaller than the thickness h1 of the color filter layer.

Subsequently, an insulating layer 140 is formed on the red, green, and blue color filter layers 120a, 120b, and 120c and the first black matrix 110 and the second black matrix 130. The insulating layer 140 is formed to planarize the first substrate 10 of the liquid crystal display device on which the color filter layer 120 is formed, and may be a transparent organic material. For example, it may be made of an acrylic-based material.

The thickness of the insulating layer 140 may be about 1 μm to 4 μm. When the thickness of the insulating layer 140 is 4 µm or less, it is possible to prevent the luminance degradation of the liquid crystal display device due to the insulating layer.

Conventionally, when the white color filter layer is omitted, a large difference between the insulating layers located in the red, green and blue sub-pixels and the insulating layers located in the white sub-pixels is formed. Due to this, a problem in a cell gap defect of the liquid crystal display device occurs.

On the other hand, in the liquid crystal display according to the present invention, the second black matrix 130 is formed on the white sub-pixel W to form an insulating layer located on the red, green and blue sub-pixels R, G, and B ( 140) and the step A between the insulating layer 140 located in the white sub-pixel may be reduced. That is, the step A due to the thickness h1 of the color filter layer 120 may be reduced. At this time, the step (A) may be 0 or more and 0.3 μm or less. When the step A is 0.3 µm or less, it is possible to prevent a cell gap defect of the liquid crystal display device.

Next, a liquid crystal display using the first array substrate will be described with reference to FIG. 2 as follows. 2 is a view showing a part of a liquid crystal display according to a first embodiment of the present invention.

Referring to FIG. 2, the liquid crystal display 30 is interposed between the first array substrate 10, the second array substrate 20, and the first array substrate 10 and the second array substrate 20. It includes a liquid crystal layer 170. The second array substrate 20 may be a substrate including a thin film transistor. That is, the second array substrate 20 may be a thin film transistor array substrate.

In addition, the liquid crystal display device 30 may include a backlight unit 60 that supplies light from the rear surface of the second array substrate 20. The backlight unit 60 may include a light source. In addition, the light source may be a fluorescent lamp or LED.

At this time, a plurality of gate lines and a plurality of data lines perpendicular to the gate lines are formed on the second substrate 101. A pixel area may be defined by intersecting the gate line and the data line.

At this time, at least one thin film transistor Tr is formed in the pixel region. The thin film transistor Tr includes a gate electrode 211, a gate insulating film 213, a semiconductor layer 215, a source electrode 217 and a drain electrode 219.

For example, the gate electrode 211 is formed on the second substrate 20. The gate insulating layer 213 is formed on the gate electrode 211 and the second substrate 20. The semiconductor layer 215 is formed on the gate electrode 211 and the gate insulating layer 213. The source electrode 217 and the drain electrode 219 are formed on the semiconductor layer 215 to be spaced apart from each other.

A protective layer 216 is formed on the entire surface of the second substrate 20 on which the thin film transistor Tr is formed. A contact hole 220 exposing the drain electrode 219 is formed in the passivation layer 216. In addition, a pixel electrode 214 is formed on the passivation layer 216, and the pixel electrode 214 is electrically connected to the drain electrode 219 of the thin film transistor Tr through the contact hole 220.

Further, the common wiring may be further formed in parallel with the gate wiring. In addition, a common electrode 212 connected to the common wiring may be formed. The common electrode 212 may be alternately disposed with the pixel electrode 214 on the same layer as the gate electrode 211 to generate a transverse electric field. However, the position and shape of the common electrode 212 are not limited thereto. Depending on the driving method of the liquid crystal layer 170, the common electrode 212 may be formed on the entire pixel area. Further, the common electrode 212 may be formed on the insulating layer 140 in the first array substrate 10.

Although not illustrated in the drawing, a spacer for maintaining a constant cell gap between the two substrates 100 and 101 may be further formed between the first substrate 100 and the second substrate 101. In addition, an alignment layer may be formed at a boundary between the first substrate 100 and the liquid crystal layer 170. In addition, an alignment layer may be formed at a boundary between the second substrate 101 and the liquid crystal layer 170. In addition, although not shown in the drawings, a seal pattern may be further formed for bonding of the first substrate 100 and the second substrate 101.

As described above, the liquid crystal display device 10 of the present invention can obtain high white luminance by using red (R), green (G), blue (B), and white subpixels (W). In addition, by forming the second black matrix 130, the insulating layer 140 formed on the red, green, and blue subpixels (R, G, B) and the insulating layer formed on the white subpixel (W) ( The step (A) of 140) can be reduced.

Hereinafter, a first array substrate of a liquid crystal display device according to a second embodiment of the present invention will be described with reference to FIG. 3. 3 is a view showing a first array substrate of a liquid crystal display according to a second embodiment of the present invention. Descriptions of parts similar to those of the liquid crystal display according to the first embodiment described above may be omitted.

Referring to FIG. 3, the first array substrate 40 according to an embodiment may include red, green, blue, and white subpixels R, G, B, and W on the first substrate 102. . Red, green, and blue color filter layers 121a, 121b, and 121c may be formed in the red, green, and blue subpixels R, G, and B. A first black matrix 112 may be formed between the color filter layers 121a, 121b, and 121c.

A color filter pattern 122 may be formed on the white sub-pixel W. In addition, a second black matrix 136 may be formed on the color filter pattern 122 formed on the white sub-pixel W. At this time, the thickness h7 of the color filter pattern may be formed to be the same as the thickness h6 of the color filter layer.

The color filter pattern 122 may be a red, green or blue color filter pattern. The color filter pattern 122 may be formed together with the red color filter layer 121a, the green color filter layer 121b, or the blue color filter layer 121c.

The second black matrix 136 may be formed of the same material as the first black matrix 112. The first and second black matrices 112 and 136 may be formed of a material having an optical density of 0.5/µm to 4.5/µm. The optical density of the black matrix prevents color mixing between different colors disposed adjacent to each other, and the luminance of white in the white sub-pixel W may not fall.

In addition, the area of the color filter pattern 122 and the second black matrix 136 on a plan view may occupy 10% to 30% of the area of the white subpixel W. When the second black matrix 136 is formed with an area smaller than 10%, the level difference of the insulating layer 141 may not be sufficiently reduced later. In addition, when the second black matrix 136 is formed with an area larger than 30%, there is a problem in that the luminance of the white sub-pixel W decreases due to the second black matrix 136. In addition, the height of the upper surface of the second black matrix 136a may be higher than the height of the upper surface of the first black matrix 112a. In addition, the thickness h5 of the second black matrix may be formed to be the same as the thickness h4 of the first black matrix. That is, the sum of the thickness h7 of the color filter pattern formed in the white subpixel W and the thickness h5 of the second black matrix may be higher than the thickness h6 of the color filter layer.

Thereafter, an insulating layer 141 may be formed on the front surface of the first substrate 102. The insulating layer 141 is formed to planarize the first substrate 102. The insulating layer 141 may be formed of an insulating material, for example, a transparent organic material. For example, it may be made of an acrylic-based material.

In addition, the amount of insulating material formed on the white sub-pixel W and the amount of insulating material formed on the red, green and blue sub-pixels R, G and B may be the same. That is, the insulating material forming the insulating layer 141 may be filled in a space in which the color filter pattern 122 and the second black matrix 136 are not formed on the white sub-pixel W. Due to this, although the sum of the thickness h7 of the color filter pattern 122 and the thickness h5 of the second black matrix 136 is formed higher than the thickness h6 of the color filter layer 121, The insulating layer 141 may be formed flat on the first substrate 102.

As described above, the first array substrate 40 applies the color filter pattern 122 and the second black matrix 136 to the white sub-pixel unit W, so that the insulating layer 141 is the first It may be formed flat on the front surface of the array substrate 40.

Hereinafter, a first array substrate of a liquid crystal display according to a third embodiment of the present invention will be described with reference to FIG. 4. 4 is a diagram illustrating a first array substrate of a liquid crystal display device according to a third embodiment of the present invention. Descriptions of parts similar to those of the liquid crystal display according to the above-described embodiments may be omitted.

Referring to FIG. 4, the first array substrate 50 may be a color filter on transistor (COT) structure having red, green, blue, and white subpixels (R, G, B, W). The first array substrate 50 may include a thin film transistor Tr formed on the first substrate 103.

The thin film transistor Tr includes a gate electrode 311, a gate insulating layer 313, a semiconductor layer 315, a source electrode 317, and a drain electrode 319. For example, a gate electrode 311 may be formed on the first substrate 103, and a gate insulating layer 313 may be formed on the front surface of the first substrate 103 on the gate electrode 311. . Thereafter, a semiconductor layer 315 is formed to overlap the gate electrode 311 and the gate insulating layer 313. In addition, the source electrode 317 and the drain electrode 319 may be formed to be spaced apart from each other on the semiconductor layer 315. Thereafter, a protective layer 316 may be formed on the thin film transistor Tr and the gate insulating layer 313.

Thereafter, a color filter layer 123 may be formed on the protective layer 316. In addition, a first black matrix 113 may be formed on the thin film transistor Tr to block light coming from below the first substrate 103. At the same time, a second black matrix 137 may be formed in the white sub-pixel W. The second black matrix 137 may be formed of the same material as the first black matrix 113.

Here, the shape of the second black matrix 137 is sufficient as long as the step of reducing the level difference in the insulating layer 350 is sufficient. In addition, the height of the upper surface of the second black matrix 137a may be higher than the height of the upper surface of the first black matrix 113a.

Subsequently, the insulating layer 350 may be formed on the first black matrix 113, the second black matrix 137, and the color filter layer 123. The insulating layer 350 may include a contact hole 320 exposing the drain electrode 319. In addition, the color filter layer 123 or the first black matrix 113 may be etched to expose the drain electrode 319 as necessary.

When a contact hole 320 is formed on the insulating layer 350, a pixel electrode 314 may be formed on all regions of the first substrate 103. The pixel electrode 314 may be formed to contact the drain electrode 319 through the contact hole 320.

Although not illustrated in the drawing, the liquid crystal display device may further include a second substrate spaced apart from the first substrate 103. In addition, the liquid crystal display device may include a liquid crystal layer between the first substrate 103 and the second substrate. In addition, a common electrode may be further formed on the first substrate 103 or the second substrate.

As described above, the liquid crystal display device 30 can reduce the cost of the white resin by omitting the process of forming the white resin in the white (W) subpixel. In addition, by forming the second black matrix 137, the insulating layer 350 formed on the red, green, and blue subpixel portions R, G, and B and the white subpixel portion W are formed. The level difference of the insulating layer 350 may be overcome.

Next, a method of manufacturing the first array substrate of the liquid crystal display device to which the second black matrix is applied will be described with reference to FIG. 5. 5(a) to 5(g) are views showing a method of manufacturing a first array substrate of a liquid crystal display device.

5A and 5B, first, a black resin material 111 is formed on the first substrate 100 on the front surface. Thereafter, a photoresist 150 is formed on the black resin material 111 for patterning the black resin material 111. In this case, the photoresist 150 may be a negative photoresist. The negative photoresist is a photosensitive material that is a material that cures when light is irradiated.

Subsequently, the black resin material 111 may be patterned by the first mask 160. In this case, the first mask 160 may be a halftone mask.

A first mask 160 is put on the photoresist 150 and light is irradiated. The first mask 160 includes a semi-transmissive part 160a, a transmissive part 160b, and a blocking part 160c, the transmissive part 160b transmits light as it is, and the semi-transmissive part 160a transmits the transmissive part ( Less light passes than B), and the blocking part 160c completely blocks light.

Therefore, the photoresist 150 facing the semi-transmissive portion 160a of the first mask 160 is semi-cured by the irradiated light. In addition, the photoresist 150 facing the transmissive portion 160b of the first mask 160 is cured by irradiated light.

For this reason, the photoresist 150 facing the semi-transmissive portion 160a of the first mask 160 is later formed in the first black matrix forming region as a first stepped photoresist pattern 150a having a low step. In addition, the photoresist 150 facing the transmissive portion 160b of the first mask 160 is later formed as a photoresist pattern 150b having a high step in the second black matrix formation region. The photoresist 150 facing the blocking portion 160c of the first mask 160 is removed to expose the black resin material 111. Therefore, the semi-transmissive portion 160a of the first mask 160 is removed. The first photoresist pattern 150a formed in the region corresponding to and is formed thinner than the second photoresist pattern 150b formed in the region corresponding to the transmissive portion 160b.

The photoresist 150 may be formed using a positive photoresist. In this case, the pattern of the halftone mask, which is the first mask 160, should be manufactured in reverse.

Referring to FIG. 5C, the exposed black resin material 111 is etched using the first photoresist pattern 150a and the second photoresist pattern 150b as masks. The black resin material 111 may be etched to form a first black resin pattern 111a and a second black resin pattern 111b. The first black resin pattern 111a may be formed under the first photoresist pattern 150a, and the second black resin pattern 111b may be formed under the second photoresist pattern 150b. The black resin pattern 111b may be the same as the second black matrix.

Referring to FIG. 5D, the first photoresist pattern 150a may be removed through an ashing process. At this time, a part of the second photoresist pattern 150b may also be removed together to form a third photoresist pattern 150c thinner than the second photoresist pattern 150b. Due to this, the first black resin pattern 111a formed under the first photoresist pattern 150a is exposed. In addition, the second black resin pattern 111b formed under the second photoresist pattern 150b is not exposed due to the third photoresist pattern 150c. That is, the second black resin pattern 111b is disposed under the third photoresist pattern 150c.

Referring to FIG. 5E, a part of the exposed first black resin pattern 111a is etched using the third photoresist pattern 150c as a mask. Accordingly, a first black matrix 110 having a lower step than the first black resin pattern 111a may be formed.

The third photoresist pattern 150c formed on the second black resin pattern 111b is removed. Through this, the second black resin pattern 111b becomes the second black matrix 130. The height of the upper surface 130a of the second black matrix 130 may be higher than the height of the upper surface 110a of the first black matrix 110.

Referring to FIG. 5F, the first black matrix patterns 110 are formed to be spaced apart from each other to have openings corresponding to red (R), green (G), blue (B), and white subpixels (W). At this time, the second black matrix pattern 130 is formed on the white sub-pixel W. In addition, red, green, and blue color filter layers 120a, 120b, and 120c are formed in red (R), green (G), blue (B), and white subpixels (W). At this time, the color filter layer 120 may be formed flat. In addition, the thickness h1 of the color filter layer 120 may be formed to be equal to or higher than the thickness h3 of the second black matrix.

As shown in FIG. 5G, an insulating layer 140 is formed on the color filter layer 120, the first black matrix 110, and the second black matrix 130. Here, the thickness of the insulating layer 140 may be about 1 μm to 4 μm. When the thickness of the insulating layer 140 is 4 µm or less, it is possible to prevent the luminance degradation of the liquid crystal display device due to the insulating layer. At this time, the step (A) of the insulating layer on the color filter layer 120 and the insulating layer on the second black matrix 130 may be formed to 0.3 μm or less. When the step is 0.3 µm or less, a defect in the cell gap of the liquid crystal display device can be prevented.

As described above, in the liquid crystal display device of the present invention, even though the second black matrix 130 is formed in the white sub-pixel W, no mask process is added. For this reason, it is possible to improve productivity by reducing process time and production cost.

Subsequently, a possible form of the second black matrix pattern will be described with reference to FIG. 6 as follows. However, the present invention is not limited thereto, and a form capable of reducing the step difference of the insulating layer formed on the white sub-pixel is sufficient. 6A to 6F are diagrams showing a pattern shape of the second black matrix of the present invention.

Referring to FIG. 6A, the second black matrix may include a closed curve pattern. The shape of the closed curve is not limited to the drawings, and may be in various shapes. For example, it may be a polygon such as a circle or triangle.

For example, the second black matrix includes a second closed curve pattern 131b disposed inside the first closed curve pattern 131a, and extends in a first direction inside the second closed curve pattern 131b. It may be in a form including a straight pattern 131c to be disposed. At this time, a distance from one side of the first closed curve 130b to the opposite side may be greater than a distance from one side of the second closed curve 130c to the opposite side.

In addition, the second black matrix may include only one closed curve pattern 131a. Further, the second black matrix may have a shape including one or more second closed curve patterns 131b disposed inside the first closed curve pattern 131a. That is, the second black matrix is not limited to the drawings, and may include one or more closed curve patterns.

Referring to FIG. 6B, the second black matrix may include a pattern 132a extending in one direction. The pattern 132a may be formed by one or more. For example, one to five patterns 132a may be formed in the one direction. At this time, the distance d1 between the plurality of patterns 132a may be variously formed.

In addition, although only a straight line pattern 132a is illustrated in the drawing, the second black matrix may include a curved pattern extending in one direction.

Referring to FIG. 6C, the second black matrix may include a pattern in which a pattern 133a extending in a first direction and a pattern 133b extending in a second direction different from the first direction intersect. In this case, the first direction and the second direction may be perpendicular to each other.

One or more patterns 133a extending in the first direction may be formed. For example, the pattern 133a extending in the first direction may be 1 to 3 patterns. Also, one or more patterns 133b extending in the second direction may be formed. For example, the pattern 133b extending in the second direction may be 1 to 3 patterns.

At this time, the plurality of patterns 133a disposed in the direction extending in the first direction may be formed at various intervals. Further, the plurality of patterns 133b disposed in the direction extending in the second direction may be formed at various intervals. In addition, although only the straight patterns 133a and 133b are illustrated in the drawing, the second black matrix may include a curved pattern.

Referring to FIG. 6D, the second black matrix may include a pattern in which a pattern 134a extending in a first direction and a pattern 134b extending in a second direction different from the first direction intersect and an intersection is empty. Can. In this case, the first direction and the second direction may be perpendicular to each other.

One or more patterns 134a extending in the first direction may be formed. For example, the pattern 134a extending in the first direction may be 1 to 3 patterns. Further, one or more patterns 134b extending in the second direction may be formed. For example, the pattern 134b extending in the second direction may be 1 to 3 patterns.

At this time, the plurality of patterns 134a disposed in a direction extending in the first direction may be formed at various intervals. Also, the plurality of patterns 134b disposed in the direction extending in the second direction may be formed at various intervals. In addition, although only the straight patterns 134a and 134b are illustrated in the drawing, the second black matrix may include a curved pattern.

Referring to FIG. 6E, the second black matrix may be formed in a checkerboard shape. For example, the rectangular black matrix area 135a and the rectangular empty area 135b may be alternately arranged in directions extending in the first direction and the second direction. In addition, the black matrix area 135a or the empty area 135b is not limited to the drawing, and may be formed in a polygonal shape such as a circle or a triangle.

The second black matrix formed as described above may occupy 10% to 30% of the area of the white subpixel W in a plan view. Through this, even if a second black matrix is formed in the white sub-pixel W, the step of the insulating layer can be overcome without being affected by luminance and aperture ratio.

Through the above description, those skilled in the art will appreciate that various changes and modifications are possible without departing from the technical idea of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be determined by the scope of the claims.

100: first substrate 110: first black matrix
120: color filter layer 120a: red color filter layer
120b: green color filter layer 120c: blue color filter layer
130: second black matrix 140: insulating layer

Claims (15)

A first substrate;
A first black matrix defining red, green, blue and white subpixels formed on the first substrate;
A second black matrix formed in the white subpixel region;
A color filter layer formed on the red, green and blue sub-pixels; And
The first and second black matrix and an insulating layer formed on the red, green and blue color filter layers; include,
The height of the upper surface of the second black matrix is formed larger than the height of the upper surface of the first black matrix,
The second black matrix is a liquid crystal display device comprising a closed curve pattern.
According to claim 1,
The second black matrix has a thickness equal to or smaller than that of the red, green, and blue color filter layers.
According to claim 1,
And a color filter pattern formed under the second black matrix.
According to claim 3,
The thickness of the first black matrix and the second black matrix is a liquid crystal display device, characterized in that the same.
According to claim 1,
The area of the second black matrix occupies 10% to 30% of the area of the white sub-pixel.
delete delete A first substrate;
A first black matrix defining red, green, blue and white subpixels formed on the first substrate;
A second black matrix formed in the white subpixel region;
A color filter layer formed on the red, green and blue sub-pixels; And
The first and second black matrix and an insulating layer formed on the red, green and blue color filter layers; include,
The height of the upper surface of the second black matrix is formed larger than the height of the upper surface of the first black matrix,
The second black matrix includes a pattern in which a pattern extending in a first direction and a pattern extending in a second direction different from the first direction intersect.
The method of claim 8,
The second black matrix includes a pattern in which a pattern extending in a first direction and a pattern extending in a second direction intersect, and an intersection point is empty.
According to claim 1,
A liquid crystal display device characterized in that the step difference between the insulating layer formed on the red, green and blue color filter layers and the insulating layer formed on the second black matrix is 0.3 µm or less.
According to claim 1,
The second black matrix is a liquid crystal display device, characterized in that it is formed of a material having an optical density of 0.5/µm to 4.5/µm.
According to claim 1,
Further comprising a second substrate on which the first substrate and the thin film transistor are formed,
And a liquid crystal layer between the first substrate and the second substrate.
According to claim 1,
Further comprising a thin film transistor formed on the first substrate,
A liquid crystal display device, characterized in that the first black matrix, the second black matrix, the color filter layer and the insulating layer are formed on the thin film transistor.
Red, green, blue and white subpixels are defined on the substrate corresponding to the red, green, blue and white subpixels, respectively, in a first black matrix having first, 2, 3 and 4 openings and in the fourth opening Forming a second black matrix;
Forming red, green, and blue color filter layers corresponding to the first, second, and third openings, respectively; And
And forming an insulating layer on the red, green, and blue color filter layers and on the first and second black matrices.
The thickness of the second black matrix is formed larger than the thickness of the first black matrix,
The second black matrix is formed in a form in which a pattern extending in a first direction and a pattern extending in a second direction different from the first direction are formed to intersect.
The method of claim 14,
The second black matrix is formed using a halftone mask, characterized in that the liquid crystal display device manufacturing method.

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