KR102105790B1 - Device and method for managing fine particle concentration - Google Patents

Abstract

One aspect of the present invention relates to a device configured to supply an electric charge to a target region to manage fine particle concentration in the target region. The device comprises: a container storing liquid; at least one nozzle outputting the liquid; a pump supplying the liquid to the at least one nozzle from the container; a power supply supplying power to the device; and a controller supplying an electric charge to a target region through the at least one nozzle using the power supply. The controller uses the power supply to apply a voltage equal to or greater than a reference value to at least one nozzle, and provides electric force in a direction away from the device to fine particles in the target region charged by the supplied charge.

Description

 DEVICE AND METHOD FOR MANAGING FINE PARTICLE CONCENTRATION}

The present invention relates to an apparatus for managing the concentration of fine particles, and more particularly, to an apparatus for managing the concentration of fine particles by applying an electric force to a target region.

Recently, the risk of harmful components in the air has emerged due to the development of manufacturing industry and the increase of industrial waste. Particularly, in the case of fine dust or ultrafine dust moving on the wind, even wearing a mask is not sufficiently filtered, which can cause serious respiratory diseases to vulnerable groups such as children and the elderly.

The conventional air circulation and collection method has a problem of low energy efficiency due to non-selective treatment by inhaling ambient air containing fine dust. In addition, purified clean air is mixed with contaminated air, so that only the same air is purified in the same place. When a high density filter is used, the fine dust removal rate is increased, but the pressure loss is large.

Conventional reaction material spraying methods include a sprinkling method and an artificial rainfall method. The sprinkling method provides a low ultra-fine dust reduction effect even if a large amount of water is sprayed. In addition, in the conventional artificial rainfall method, a fine dust removal effect is exhibited only when there is a lot of precipitation. In this specification, a method of reducing the concentration of harmful substances in the air while overcoming these problems is proposed.

One object of the present invention is to provide an apparatus and method for efficiently managing air quality in a wide area.

Another object of the present invention is to provide an apparatus and method for reducing the concentration in the air of particles having a certain size or less.

The problem to be solved by the present invention is not limited to the above-described problems, and the problems not mentioned will be clearly understood by those having ordinary knowledge in the technical field to which the present invention pertains from this specification and the accompanying drawings. .

According to an aspect of the present invention, an apparatus for managing a concentration of fine particles in a target region by supplying electric charge to the target region, a container for storing liquid, at least one nozzle for outputting liquid, liquid from the container to at least one nozzle It includes a pump for supplying power, a power supply for supplying power to the device, and a controller for supplying electric charges to the target region through at least one nozzle by using a power supply. A voltage is applied, and an electric force in a direction away from the device is provided to the microparticles of the target region charged by the supplied charge, and the electric force provided to the microparticles is provided by an electric field formed by the electric charge supplied to the target region , The fine particles in the target region are charged with the same polarity as the supplied charge by the supplied charge It can be provided.

According to another aspect of the invention, in the apparatus for managing the concentration of the fine particles in the target area by supplying charge to the target area, the container for storing the liquid, at least one nozzle for outputting the liquid, the at least from the container A pump for supplying the liquid to one nozzle, a power supply for supplying power to the device, a controller for supplying a material that charges the target region through the at least one nozzle using the power supply, and the charge Includes a particle dispersing unit that provides a non-electrical force to a material, and the controller applies a voltage equal to or greater than a first reference value to at least one nozzle using the power source to charge electric charges through the at least one nozzle. An apparatus for outputting droplets may be provided.

According to another aspect of the present invention, in a method of managing a concentration of fine particles in a target region using a charge supply device, the device includes a container for storing liquid, at least one nozzle for outputting the liquid, A pump for supplying the liquid from the container to the at least one nozzle, a power supply for supplying power and a controller for supplying electric charge to the target region through the at least one nozzle using the power supply, the method comprising: , The controller using the power, applying a voltage of a first reference value or more to the at least one nozzle, the controller using the pump, supplying the liquid to the at least one nozzle, the The controller uses the power source and the pump to drop droplets charged through the at least one nozzle. Generating, supplying charge to the target region and the controller to form a space charge in the target region, charging the fine particles in the target region, and the supplied charge by the charge supplied to the target region A method may be provided that includes providing an electric force including at least a portion of a direction component away from the device to the fine particles charged with the same polarity.

According to another aspect of the present invention, in a method of managing a concentration of fine particles in a target region using a charge supply device, the device includes a container for storing liquid, at least one nozzle for outputting the liquid, A pump for supplying the liquid from the container to the at least one nozzle, a power supply for supplying electric power, a controller for supplying a material having a charge to the target region through the at least one nozzle using the power supply, and the electric charge And a particle dispersing unit that provides a non-electrical force to a substance having a weight, wherein the method includes applying the voltage to the at least one nozzle by the controller using the power source, and the controller using the pump Thus, the step of supplying the liquid to the at least one nozzle, the controller is connected to the power supply and the pump Thus, generating a chargeable droplet through the at least one nozzle, and supplying charge to the target region through the charged droplet, and the controller using the particle dispersing unit, the nozzle of the nozzle A method can be provided that includes providing a non-electric force in a direction away from the one end to the chargeable material located near the one end where droplets are produced.

The solving means of the subject matter of the present invention is not limited to the above-mentioned solving means, and the solving means not mentioned will be clearly understood by those skilled in the art from the present specification and the accompanying drawings. Will be able to.

According to the present invention, an apparatus and method for efficiently managing air quality in a wide area can be provided.

According to the present invention, an apparatus and a method for managing outdoor air quality may be provided.

According to the present invention, an apparatus and method for environmentally managing air quality may be provided.

According to the present invention, an apparatus and method for reducing the concentration in the air of particles having a size of a certain level or less can be provided.

The effects of the present invention are not limited to the above-described effects, and effects not mentioned will be clearly understood by those skilled in the art from the present specification and the accompanying drawings.

1 is a view for explaining the particle concentration reduction operation described herein.
2 is a view for explaining the particle concentration reduction operation described herein.
3 is a view for explaining the particle concentration reduction operation described herein.
4 is a view for explaining the particle concentration reduction operation described herein.
5 is a view for explaining the particle concentration reduction operation described herein.
6 is a view for exemplarily explaining an apparatus according to an embodiment of the present invention described herein.
7 shows some examples of nozzles that can be used in the invention described herein.
8 is a view for illustratively explaining the end of the nozzle.
9 is a view for explaining a nozzle array according to an embodiment.
10 is a view for explaining a nozzle array according to an embodiment.
11 is a view for explaining an embodiment of the nozzle array.
12 is a view for explaining an embodiment of a nozzle array.
13 is a conceptual diagram illustrating an apparatus according to an embodiment.
14 is a flow chart for explaining an embodiment of a method for reducing the concentration of fine particles in air.
15 is a flow chart for explaining an embodiment of a method for reducing the concentration of fine particles in air.
16 is a view for explaining a method for reducing the concentration of fine particles according to an embodiment of the present invention.
17 is a view for explaining a method for reducing the concentration of fine particles according to an embodiment of the present invention.
18 is a flowchart illustrating a method of reducing the concentration of fine particles according to an embodiment.
19 is a flowchart illustrating a method of reducing the concentration of fine particles according to an embodiment.
20 is a flowchart illustrating an embodiment of a method of managing a device for reducing the concentration of fine particles in air.
21 is a flowchart illustrating an embodiment of a method of managing a device for reducing the concentration of fine particles in air.
22 is a flow chart for explaining an embodiment of a method for managing the spatial charge density around the nozzle in the air.
23 is a diagram for describing a device control method according to time.
24 is a flowchart illustrating a method of reducing the concentration of fine particles according to an embodiment.
25 is a view for explaining an embodiment of a voltage applied to a nozzle of a device and a current output from a nozzle at a first time point t1 and a second time point t2.
26 is a view for explaining an embodiment of a voltage applied to a nozzle of a device and a current output from a nozzle at a first time point t1 and a second time point t2.
27 is a view for explaining a method for managing the concentration of fine particles in the air.
28 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein.
29 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein.
30 is a view for explaining the operation of the fine particle concentration reduction system according to an embodiment of the present specification.
31 is a view for explaining the operation of the fine particle concentration reduction system according to an embodiment of the present specification.
32 is a view for explaining the operation of the fine particle concentration reduction system according to an embodiment of the present specification.
33 is a view for explaining the operation of the fine particle concentration reduction system according to an embodiment of the present specification.
34 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein.
35 is a view for explaining a system for reducing fine particle concentration according to an embodiment of the present invention described herein.
36 is a view for explaining an embodiment of a system for reducing the concentration of fine particles in a room.
37 is a flowchart for explaining an embodiment of a method of managing a device for reducing fine particle concentration described in the present specification.
38 is a flowchart for explaining an embodiment of a method for managing a device for reducing fine particle concentration described herein.
39 is a flow chart for explaining an embodiment of a method for reducing fine particle concentration described herein.
40 is a flowchart for explaining an embodiment of a method for reducing fine particle concentration described herein.
41 is a flowchart for explaining an embodiment of a method for managing fine particle concentrations described herein.
42 is a flow chart for explaining an embodiment of a method for managing fine particle concentrations described herein.
43 is a flow chart for explaining an embodiment of a method for managing fine particle concentrations described herein.

The above-mentioned objects, features and advantages of the present invention will become more apparent through the following detailed description in conjunction with the accompanying drawings. However, the present invention can be modified in various ways and can have various embodiments. Hereinafter, specific embodiments will be illustrated in the drawings and described in detail.

In the drawings, the thickness of the layers and regions are exaggerated for clarity, and also referred to as "on" or "on" the element or layer of another component or layer. This includes all cases in which other layers or other components are interposed in the middle as well as directly above other components or layers. Throughout the specification, the same reference numbers refer to the same components in principle. In addition, elements having the same function within the scope of the same idea appearing in the drawings of each embodiment will be described using the same reference numerals.

If it is determined that a detailed description of known functions or configurations related to the present invention may unnecessarily obscure the subject matter of the present invention, the detailed description will be omitted. In addition, numbers (for example, first, second, etc.) used in the description process of the present specification are only identification symbols for distinguishing one component from other components.

In addition, the suffixes “module” and “part” for components used in the following description are given or mixed only considering the ease of writing the specification, and do not have meanings or roles distinguished from each other in themselves.

The method according to the embodiment may be implemented in the form of program instructions that can be executed through various computer means and recorded on a computer readable medium. The computer-readable medium may include program instructions, data files, data structures, or the like alone or in combination. The program instructions recorded on the medium may be specially designed and configured for the embodiments or may be known and usable by those skilled in computer software. Examples of computer-readable recording media include magnetic media such as hard disks, floppy disks, and magnetic tapes, optical media such as CD-ROMs, DVDs, and magnetic media such as floptical disks. -Hardware devices specially configured to store and execute program instructions such as magneto-optical media, and ROM, RAM, flash memory, and the like. Examples of program instructions include high-level language code that can be executed by a computer using an interpreter, etc., as well as machine language codes produced by a compiler. The hardware device described above may be configured to operate as one or more software modules to perform the operations of the embodiments, and vice versa.

1. Outline

1.1 Purpose

In the present specification, some embodiments of the invention related to a method, apparatus, system, etc. for reducing the concentration of particles floating in the air in the target region using an electric field will be described. Hereinafter, some embodiments of a method, apparatus, system, and the like for emitting charged particles to reduce the concentration of the target particles in the target region will be described.

When microparticles are suspended in the air in a wide target area, it may be difficult to remove them by chemical or physical methods. For example, when fine dust having a certain size (eg, 2.5 PM) or less is distributed in a target area over a certain concentration, the purifying effect of ultrafine dust through water treatment is very small. The efficiency of purification used can be very poor. Hereinafter, some embodiments will be described with reference to methods, apparatus, and systems that can be used for wide area air quality management in various environments, including the cases exemplified herein.

1.2 Operation Overview

The method, apparatus, system, etc. for reducing the density of particles floating in the air in the target region described in this specification can achieve the desired density reduction effect by forcibly moving the particles from the target region using electrostatic phenomena. have. Here, the operation of reducing the particle concentration will be described as an example.

The operation of reducing the particle concentration described in this specification may include releasing a fine droplet charged with charge to the target region in order to reduce the distribution concentration of the target particle in the target region (or target space). The operation of reducing the particle concentration may include emitting a fine droplet having a charge in the target region to form an electric field in the target region. The operation of reducing the particle concentration may include maintaining an electric field in the target region such that the target particle having the same charge as the droplet is pushed away from the target region.

1 to 5 are views for explaining the particle concentration reduction operation described herein. 1 to 5, the operation of reducing the particle concentration described in this specification may be performed by the apparatus 100 for forming an electric field.

Referring to FIG. 1, the particle concentration reduction operation described herein may include the device 100 supplying a charged material CS. The device 100 may emit or generate a charged material CS. The device 100 supplying the charged material CS may be performed using various methods.

For example, the device 100 may spray or spray a droplet carrying a charge. The device 100 may spray a droplet having a charge to the outside using electrostatic repulsive force or physical force. As an example, the device 100 may generate droplets having a charge by using an electrospray or an electrostatic spray.

As another example, the device 100 may supply a material CS having a charge using discharge means such as a corona discharge electrode. The device 100 may also generate charged droplets using discharge means such as a corona discharge electrode.

The droplets generated by the device 100 may be created to have a size within a certain range. For example, droplets can be created with an average diameter between tens of nm to hundreds of nm.

The droplet generated by the device 100 may mean a liquid that has been separated from the liquid bulk discharged from the nozzle of the device 100 and has a droplet shape. The size of the droplet generated by the device 100 may mean the size immediately after the droplet is generated. In other words, the device 100 may generate droplets having an average diameter of several μm immediately after their creation. The droplets produced by the device 100 may be changed in size by evaporation. For example, droplets produced by the device 100 may be reduced in diameter from approximately several μm to several nm.

The device 100 may supply a material CS that is charged to the atmosphere. According to one embodiment, the device 100 may emit droplets charged with air. The device 100 may emit liquid droplets charged at the external interface. The liquid and the external interface may be an interface where the liquid and the space outside the device 100 meet. The liquid and the external interface may be an interface between the liquid and the interior space of the chamber provided inside the device 100.

The material CS having a charge supplied to the device 100 may be a charge supplied from the device 100, ions, or a liquid or solid material containing the same. For example, the charged material CS may be an ion having a negative or positive charge. Alternatively, the material CS having a charge supplied to the device 100 may include a charge transfer material that acquires the charge supplied by the device and transfers it to the fine particles FP.

According to an embodiment, the device 100 may output droplets having a charge.

The droplet generated in the device 100 may be in a charged state. The charged droplet may mean a liquid droplet having a negative or positive charge. The charged droplet may refer to a droplet containing a substance that carries a negative or positive charge. The charged droplet may be a droplet of a solution containing a negative or positively charged material.

The droplets produced in the device 100 may be liquid droplets including a charged material and a liquid (or solvent). The droplets may be liquid droplets containing charged ions and a solvent. Droplets can be negatively and / or positively charged. The droplet may contain negatively and / or positively charged ions. The droplet includes both negative and positive charges, but may further contain negative or positive charges.

The droplets generated from the device may explode. For example, droplets containing a charged substance and a solvent may be reduced in size (or volume or mass) by evaporation. As the size of the droplets becomes smaller, the electric force may be greater than the surface tension of the droplets. As the size of the droplets decreases, the electrostatic repulsive force may offset the surface tension of the droplets, causing the droplets to fission. When the droplets split, a number of smaller sized droplets can be created.

The particle concentration reduction operation described herein may include the device 100 directly or indirectly transferring charge to the fine particles FP suspended in the air through the charged material CS. .

According to one embodiment, the device 100 may transfer at least a portion of the charge to the charge transfer material or fine particles (FP) in the air through droplets charged by the charge. The droplet may indirectly provide charge to the fine particles FP through the charge transfer material. The droplets can provide charge directly to the fine particles (FP). Indirect or direct transfer of droplets or the aforementioned charges can occur in combination.

The apparatus 100 may charge at least a portion of the fine particles FP in the target region TR to have a negative or positive charge through droplets that are charged. For example, when a droplet discharged from the device 100 has a negative charge, the droplet may directly or indirectly transfer the negative charge to the fine particles FP. For example, the droplet may directly transfer the negative charge by contacting the microparticles FP, or may transfer the charge to the charge transfer material that transfers the negative charge by contacting the microparticles FP.

The fine particles FP are negative charges from the charge transfer component in the air, which is charged by a chargeable material CS supplied by the device 100, for example, a chargeable droplet or a chargeable droplet. Alternatively, a positive charge may be received and charged.

The charge transfer material may mean an electron or a material that carries charge. The charge transfer material may mean a material that receives the charge contained in the discharged droplet and directly or indirectly transfers the charge to the fine particles (FP). According to an embodiment, the charge transfer material may be a gaseous phase material constituting the air in the target region TR, or the charge transfer material may be a material that obtains a droplet or a material carrying a charge contained in the droplet. You can. The charge transfer material can be a material that is not provided by the device 100. Alternatively, the charge transfer material may be provided separately by the device 100. The charge transfer material may mean a material, particle, molecule, ion, etc. included in the target region TR. For example, the charge transfer material may be a molecule of a predetermined material (eg, an oxygen molecule) floating in a target region.

The target region TR may mean a region or space that is a target for reducing the distribution concentration of the fine particles FP. The target area TR may mean a three-dimensional space. The target area TR may be a space determined by a physical boundary example. The target area TR may be a space defined by a virtual boundary. The target area TR may be an area determined to have a predetermined geometric shape around the device. For example, the target region TR may be a hemisphere or a deformed hemisphere region having a predetermined radius around the device.

The distribution concentration of the fine particles (FP) may mean the mass of the fine particles (FP) contained in the unit volume of air. Alternatively, the distribution concentration of the fine particles (FP) may mean the volume of the fine particles (FP) contained in the unit volume of air. The distribution concentration of the fine particles FP may be replaced with other parameters indicating the degree to which the fine particles FP are included in a predetermined volume.

According to one embodiment, the operation of reducing the concentration of fine particles described herein may include spraying a droplet in the form of an electrospray by the device 100. Hereinafter, spraying of droplets through electric spraying will be described with reference to FIG. 2.

Referring to FIG. 2, liquid is supplied to a nozzle of the apparatus 100 according to an embodiment, and as a voltage is applied to the nozzle, an electrostatic repulsive force may act on the liquid at the end of the nozzle. In other words, as voltage is applied to the nozzle, polarization occurs in the liquid (or a substance contained in the liquid) inside the nozzle, and repulsive force may be applied between the polarized substances in proportion to the degree of polarization. For example, when a -voltage is applied to the nozzle, polarization occurs with respect to ions in the liquid, so that + ions approach the nozzle face by attractive force and-ions can move in a direction away from the nozzle face by repulsive force. As the repulsive force becomes stronger, the liquid containing ions can be separated into droplets.

As voltage is applied to the nozzle, a Taylor cone may be formed at the end of the nozzle by electrostatic repulsive force. As a voltage is applied to the nozzle, if a repulsive force of a certain level or more is applied to the polarized liquid at the end of the nozzle, liquid separated from the end may form droplets. The separated droplets can be accelerated by an electric field to form a jet.

Referring to FIG. 2, when the volume of the droplet discharged from the nozzle is decreased by evaporation, a large number of child droplets or fine droplets (FD) may be generated by coulomb fission. In other words, if the droplet reaches the Rayleigh limit as the size of the droplet decreases, the droplet can be split by the Coulomb fission. The droplets can be split to form a fine droplet (FD) spray.

The droplet or fine droplet (FD) may transfer at least a portion of the charge to the charge transfer material or fine particles (FP) in the air. In one example, the droplet may transfer at least a portion of the negative charge to a charge transport material in the air, eg, oxygen molecules in the air. The oxygen molecule can receive a negative charge from the droplet, and at least partially transfer the negative charge to the fine particles (FP) in the air. Alternatively, the droplets or child droplets may directly transfer negative charges to the fine particles (FP).

Meanwhile, the electric spray described in FIG. 2 is only an example, and the contents of the invention described herein are not limited thereto. The invention described in this specification may be implemented using other types of charge release methods other than electrospray.

According to one embodiment, the device may emit droplets in the form of an electrostatic spray. For example, unlike the electric spray in the form in which droplets are released by electrical repulsive force, exemplified above, droplets may be produced by electrostatic spraying in which droplets are formed by non-electrical forces, such as physical force. Even in the case of using electrostatic spraying, a high voltage is applied to the nozzle so that the liquid is charged, but the formation of the droplets may be caused by vibration by ultrasonic waves, gas injection, or the like.

According to another embodiment, the device 100 may emit a material having a charge in a form other than a droplet. The material discharged from the device 100 is sufficient as long as it can form an electric field, and is not necessarily discharged in the form of fine droplets. The material emitted from the device 100 may have a form other than droplets that transfer charge to the fine particles FP distributed in space with charge and affect the fine particles FP. For example, the material emitted from the device 100 may be discharged charge or ions having charge.

The particle concentration reduction operation described in this specification may include the device 100 outputting a current to the target area TR. The device FP may output current to the target area TR through the above-described droplet. When the device 100 outputs a current, it may mean that negative or positive charges are discharged from the device 100. For example, when the device 100 outputs a current, it may mean that droplets discharged from the device 100 are discharged with a negative or positive charge.

According to an embodiment, the apparatus 100 may output a current to the target area TR using the electric spray illustrated in FIG. 2. The device 100 may output a current having a positive or negative value by outputting a droplet having a negative or positive charge through electrospray.

The particle concentration reduction operation described in this specification may include charging at least a portion of the fine particles FP in the target region TR. The microparticles FP in the target region TR may directly or indirectly acquire at least a portion of charges emitted from the device.

Fine particles (FP) may be understood as a term encompassing particles of small size. The fine particles FP may mean specific types of particles to be removed. The fine particles FP may be dust particles floating in the air in the target area TR. The fine particles (FP) may mean total dust (TSP, Total Suspended Particles), fine dust (PM, Particulate Matter) and / or ultra fine dust (PM2.5 or less). The fine particles (FP) may be understood as ultrafine dust having a predetermined size or less (eg, PM2.5 or a diameter of 2.5 μm or less). The fine particle FP may be understood as a suspended substance that is intended to reduce the concentration as a harmful substance in the target region TR.

The fine particle (FP) may include one or more of an ionic component, a carbon component, and a metal component. For example, the fine particles (FP) may include ionic components such as chlorine ion (Cl-), nitrate (NO3-), ammonium (NH4 +), sulfate (SO4 2-), sodium ion (Na +). The fine particles (FP) may include metal components such as chromium (Cr), beryllium (Be), arsenic (As), cadmium (Cd), iron (Fe), zinc (Zn), and titanium (Ti).

The microparticles FP may be in contact with or bonded to a chargeable material, a charge transfer material, or fine droplets. The microparticles FP may receive charges from a chargeable material, a charge transfer material, or fine droplets.

The device 100 may charge fine particles FP. The fine particles (FP) may be charged by a fine dust field charging mechanism (field charging mechanism) or diffusion charging mechanism (diffusion charging mechanism). In other words, the fine particles FP may be charged by a field charging mechanism in which charged particles moving by an electric field meet fine dust and charge fine dust. Alternatively, the fine particles FP may be charged by a diffusion charging mechanism that charges fine dust by a random motion of the charged particles.

Referring to FIG. 3, the particle concentration reduction operation described herein may include the device 100 forming a space charge or an electric field in the target region TR.

The device 100 may continuously or repeatedly release droplets with charge to form a space charge in the target region TR. The device 100 may emit droplets having electric charges to form spatial electric charges having a non-uniform charge density on the target region TR. The charge density may mean the volume charge density, that is, the amount of charge (C / m ³ ) present per unit volume. The space charge can affect the behavior of the fine particles (FP) from the device (100). For example, the device 100 may continuously discharge electric charges to form a space charge having a high charge density around the device and a lower charge density as the distance from the device increases. The space charge formed by the device 100 may form an electric field in the target area TR.

The device 100 may continuously or repeatedly release droplets having electric charges, thereby forming an electric field in the target region TR. For example, the device 100 may form an electric field from the ground GND to the device. For example, the device 100 may operate to generate an electric field between the generated charges and the ground GND by continuously generating negative or positive charges. The device 100 may form an electric field in a direction from the ground GND to the device by emitting a droplet having a negative charge.

For example, the device 100 may continuously discharge electric charges to form an electric field having a high intensity around the device and a lower intensity as the distance from the device increases. The device 100 may form an electric field by emitting charge to form a space charge.

The device 100 may adjust the intensity, direction, characteristics, distribution range, and the like of the electric field formed in the target area TR. For example, the apparatus 100 may control the amount of droplets discharged to the outside and the current (or charge) emitted through the droplets so that an electric field of an appropriate intensity is formed in an appropriate range. As a specific example, the apparatus 100 may control the characteristics of the electric field by controlling the current discharged into the air by adjusting the voltage applied to the nozzle through which the droplet is discharged.

Alternatively, the device 100 may adjust the range, density, and intensity of space charges distributed in the target region TR. The device can control the amount of droplets discharged to the outside, the current emitted through the droplets, and the like. For example, the device 100 may adjust the voltage applied to the nozzle to control the characteristics of the space charges distributed in the target area TR.

Referring to FIG. 4, the particle concentration reduction operation described herein may further include reducing the concentration of fine particles FP in the target region TR. The particle concentration reduction operation may include reducing the concentration of the fine particles FP in the target region TR by at least a portion by forming an electric field (or space charge) in the target region TR.

The particle concentration reduction operation may include that the apparatus 100 directly or indirectly participates in the movement of the charged fine particles FP to decrease the density of the fine particles FP in the target region TR. For example, the apparatus 100 may reduce the density of the fine particles FP by forming and maintaining an electric field in the target region TR. The device 100 may continuously or repeatedly release droplets to maintain the electric field.

The particle concentration reduction operation may include reducing the concentration of fine particles FP in the target region TR by maintaining an electric field in the target region TR. Maintaining the electric field may include maintaining a state in which an electric field having a predetermined intensity or more is formed in the target region TR. Maintaining the electric field may mean maintaining a state in which a gradient of charge density exists in the target region TR by emitting charged particles. The device 100 may continuously or repeatedly release droplets to maintain an electric field in the target area TR.

As the device 100 maintains an electric field in the target area TR, the density of the fine particles FP in the target area TR may decrease with time. As the device 100 maintains an electric field in the target area TR, the density of the fine particles FP in the target area TR may be maintained below a certain level.

The device 100 may adjust the maintenance state of the electric field. The apparatus 100 may maintain an electric field for a predetermined time or more in order to reduce the density of the fine particles FP in the target region TR. For example, the device 100 may adjust the retention time of the electric field according to the concentration of the fine particles FP in the target region TR. The apparatus 100 may adjust the maintenance state of the electric field in consideration of external conditions. For example, the apparatus 100 may adjust the maintenance time and the maintenance period of the electric field in consideration of environmental conditions such as temperature, humidity, and altitude of the target area TR.

The particle concentration reduction operation may include that the apparatus 100 pushes at least a part of the charged fine particles FP in the target region TR out of the target region TR. For example, the apparatus 100 may form an electric field by continuously outputting a negative or positive charge to the target region TR so that the negative or positively charged fine particles FP are pushed out by the repulsive force.

As a specific example, when the device 100 continuously or repeatedly releases a droplet having a negative charge to form an electric field, at least some charged fine particles FP are formed by the negative charge emitted from the device 100 It may be moved outside the target area TR along the electric field. The device 100 may continuously output negative or positive charges, thereby moving the fine or negatively charged fine particles FP in a direction away from the device.

The electric field (or space charge) formed by the device 100 may affect the behavior characteristics of the fine particles FP. For example, the strength of the formed electric field may affect the movement speed of the fine particles (FP). The strength of the electric field may weaken as you move away from the device. At this time, the charged fine particles (FP) may move under the influence of an electric field or a space charge, and may move faster than at a location far away from the device, near a device having a strong electric field strength (or a high density of space charge). In other words, the fine particles FP close to the device may be pushed out at a faster moving speed than the fine particles FP far away from the device. As another example, the direction of the formed electric field may affect the direction of movement of the fine particles (FP).

Referring to FIG. 5, the particle concentration reduction operation described herein may further include removing floating fine particles (FP). In the particle concentration reduction operation, the device 100 releases electric charges in the target region TR, maintains the distribution of the space charges, and at least partially removes the fine particles FP floating in the target region TR through the space charges. And removing.

As a specific example, the device 100 may discharge a charged droplet, thereby maintaining a state in which a space charge is formed in the target region TR for a predetermined time or longer. Accordingly, the charged fine particles FP of the target region TR may be affected by electric force due to the space charge formed by the device 100. The charged fine particles FP may be moved by electric force, gravity, etc. by the device 100.

The charged fine particles FP may be pushed out of the target area TR. The charged fine particles FP may be moved out of the target area TR or toward the ground GND or an object (eg, the outer wall of a building in the target area). The charged fine particles FP may reach the ground GND or the target object, and may be grounded to lose charge. The fine particles FP may be changed to an electrical neutral state by contacting the ground GND or an object. In the fine particle reduction operation, the ground (GND) or a target object connected to the ground (GND) may function as a main loss channel.

In the above, for the operation of reducing the particle concentration, the fine particles FP are charged by the current emitted from the device, and the charged electric particles FP are formed in the target region TR by the current emitted from the device. The case where it is pushed out from the target area TR due to the influence of has been described as an example. However, the operation of reducing the particle concentration described in the present specification is not limited thereto.

The operation of reducing the particle concentration described in the present specification is various forms in which the electric field is maintained in the target region TR by emitting electric current, and at least part of the fine particles FP in the target region TR are moved by the influence of the electric field Can be implemented as Hereinafter, some embodiments will be described in more detail with reference to an apparatus, system, and method for performing a reduction operation of the particle concentration exemplified above.

2. Fine particle concentration reduction device

2.1 Definition

Here, as an embodiment of the invention described herein, an apparatus for reducing the concentration of fine particles will be described. According to one embodiment, the device may output a negative or positive charge to reduce the concentration of fine particles in the target region, thereby forming an electric field around the device.

The apparatus may perform the above-described fine dust reduction operation. The device can output a negative or positive charge in the target region, form an electric field in the target region, and reduce the concentration of fine dust in the target region.

2.2 Device Configuration

2.2.1 Composition of the device for reducing the concentration of fine particles

According to the invention described herein, an apparatus 100 for reducing the concentration of fine particles may be provided.

6 is a view for exemplarily explaining an apparatus according to an embodiment of the present invention described herein. Referring to FIG. 6, the device according to an embodiment includes a water storage unit 110, a water supply unit 120, a water discharge unit 130, a communication unit 140, a sensor unit 150, a power supply unit 160, and a control unit 170 ).

The reservoir 110 may store liquid. The reservoir 110 may store a liquid supplied from the outside or a pre-stored liquid. The reservoir 110 may prevent the liquid from escaping or prevent deterioration.

The reservoir 110 may include a storage container for storing liquid. The reservoir 110 may include an inlet hose that receives liquid from the outside and / or an outlet hose that supplies liquid to the outlet 130.

The reservoir 110 may be provided to prevent deterioration of the liquid or to prevent denaturation by the liquid. For example, the reservoir 110 may be coated (eg, anti-corrosion coating) to prevent deterioration of the liquid and denaturation of the reservoir. In addition, for example, the reservoir 110 may include a heat insulating material, a heat resistant material, a heat insulating material, a refractory material, and the like so that the liquid does not deteriorate according to the external environment. The reservoir 110 may include a ceramic heat insulating material formed outside the reservoir.

The reservoir 110 may store a liquid having electrical conductivity. The reservoir 110 may store a liquid containing a specific component. The liquid stored in the reservoir 110 may include one or more types of ions. According to one embodiment, the liquid stored in the reservoir 110 may include an ionic component. An ionic component may be added to the liquid stored in the reservoir 110 as needed. The liquid may contain anionic or positive ionic components. The reservoir 110 may store a liquid having a viscosity higher than a reference value. For example, the liquid stored in the reservoir 110 may be distilled water, household water, industrial water, ground water, or the like.

The reservoir 110 may be connected to the outlet 130. The reservoir 110 may be connected to the outlet 130 through an outlet hose and supply liquid to the outlet 130. The reservoir 110 may supply liquid to the outlet 130 by a water supply unit. The reservoir 110 may be implemented in the form of a cartridge in which the liquid is pre-stored, a cartridge in which the liquid can be stored, or a reservoir in which the liquid supplied from the outside can be stored.

The water supply unit 120 may cause movement of the liquid. The water supply unit 120 may allow liquid to flow using hydraulic, pneumatic, or mechanical motors. The water supply unit 120 may transfer liquid from one location to another location. For example, the water supply unit 120 may move the liquid at a constant flow rate. The water supply unit 120 may deliver liquid at a predetermined flow rate or flow rate. The water supply unit 120 may provide a movement path of the liquid. For example, the water supply unit 120 may provide a path for the liquid to be moved by gravity or to flow by capillary force, in addition to generating liquid movement by consuming additional power as described above. You can. As a specific example, the water supply unit 120 may include a liquid container and a discharge port formed so that liquid stored in the container is discharged by a predetermined amount by air pressure or gravity from the container.

The water supply unit 120 may include a pump module. The pump module may include a syringe pump, a hydraulic pump, a pneumatic pump, and the like.

According to an embodiment, the water supply unit 120 may supply the liquid stored in the water storage unit 110 to the water discharge unit 130. The water supply unit 120 may supply the liquid stored in the water storage unit to the water discharge unit 130 at a predetermined flow rate under the control of the control unit. The water supply unit 120 may supply liquid at a flow rate of several μL / min to several hundred μL / min. For example, the water supply unit 120 may supply liquid at a rate of 20 μL / min or less.

The water outlet 130 may output liquid. The water discharge unit 130 may discharge liquid supplied from the water storage unit through the water supply unit. The water outlet unit 130 may be connected to the power unit. The water outlet 130 may receive power from the power source. A high voltage may be applied to the water outlet unit 130 by the power supply unit. As the high voltage is applied, the outlet 130 may discharge charged droplets to the outside.

The water outlet unit 130 may include at least one nozzle that ejects liquid. The water outlet unit 130 may include at least one nozzle for spraying droplets. The water outlet unit 130 may include at least one nozzle to which a high voltage is applied. The water outlet 130 may include at least one nozzle provided to electrospray the liquid located therein as high voltage is applied. A high voltage may be applied to the nozzle by the power supply unit. The nozzle may be formed of metal, glass, fused silica, or the like, such as stainless steel.

The nozzle may have an easy shape for electric spraying or electrostatic spraying. The nozzle may be formed to have an inner diameter of tens to hundreds of μL, and an outer diameter of several hundred μm or more. For example, a nozzle having an outer diameter of 0.3 mm and an inner diameter of 0.1 mm may be used.

The nozzle can have an outer surface and an inner surface. The nozzle can have an end face. The nozzle may have a tapered tip shape that narrows toward the end. The outer surface of the nozzle may be provided in a cylindrical shape or a tapered shape that narrows toward the end. The inner surface of the nozzle may be provided in a cylindrical or tapered shape.

Each side of the nozzle can be hydrophilic or hydrophobic. Each side of the nozzle may be formed of a hydrophilic or hydrophobic material, or coated with a hydrophilic or hydrophobic material. Each side of the nozzle can have different properties. For example, the outer surface and the end surface of the nozzle may have hydrophobicity, and the inner surface of the nozzle may be provided to have hydrophilicity.

7 shows some examples of nozzles that can be used in the invention described herein.

Referring to Figure 7 (a), the nozzle may have a cylindrical outer surface and a cylindrical inner surface. Referring to FIG. 7B, the nozzle may have a cylindrical inner surface and a tapered outer surface. Referring to Figure 7 (c), the nozzle may have a conical outer surface and a conical inner surface. Referring to FIG. 7D, the nozzle may have a linear nozzle, for example, a slit-shaped nozzle. The nozzle may have a complex shape in which the shapes shown in FIGS. 7A to 7D are mixed. For example, the nozzle may have a cylindrical inner surface and a polygonal columnar shape and a tapered shape.

7 (a) to (d), the nozzle may have an end. The end of the nozzle may be blunt or sharp depending on the shape of the nozzle. In the case of the cylindrical nozzle illustrated in Figure 7 (a) it may have a blunt end. In the case of the conical nozzle illustrated in Figure 7 (c) it can have a sharp end.

The nozzle used in the apparatus described in this specification may have an inner diameter and an outer diameter. At this time, the ratio of the outer diameter to the inner diameter of the nozzle may vary depending on the length direction of the nozzle. For example, in the case of the nozzle illustrated in (b) or (c) of FIG. 7, the ratio of the outer diameter to the inner diameter may become smaller toward the end.

At the end of the nozzle, the shape of the nozzle end may vary depending on the ratio of the outer diameter to the inner diameter. For example, a nozzle having a large ratio of the outer diameter to the inner diameter may have a blunt end. In addition, for example, a nozzle having a small ratio of the outer diameter to the inner diameter at the end may have a narrow end face.

8 is a view for illustratively explaining the end face of the nozzle. 8 (a) and 8 (b) show a plan view observed in the longitudinal direction of the nozzle.

8A is a view for explaining a nozzle having a blunt end surface. 8 (a), the ratio of the outer diameter r2 to the inner diameter r1 of the nozzle having the blunt end surface may have a relatively large value. For example, the ratio of the outer diameter r2 to the inner diameter r1 may be 1.5 to 2 times.

8B is a view for explaining a nozzle having a narrow end face. Referring to FIG. 8 (b), the nozzle may have a tapered shape in which the outer diameter becomes smaller toward the end. For example, the outer diameter r4 at the end face of the nozzle may be smaller than the outer diameter r5 at a position spaced apart from the end face of the nozzle. 8 (b), the ratio of the outer diameter r4 to the inner diameter r3 of the nozzle may have a relatively large value. For example, the ratio of the outer diameter r4 to the inner diameter r3 having a narrow end face is 1.001 to 1.01 times.

The water outlet unit 130 may include a plurality of nozzles. The water outlet 130 may include a nozzle array in which a plurality of nozzles are arranged. The nozzle array may include a plurality of nozzles arranged side by side. The nozzle array may include a plurality of nozzles arranged in different directions. For example, a plurality of nozzles can be arranged radially. The plurality of nozzles may be arranged to face different directions so that mutual influence due to the current emitted from each nozzle is minimized.

9 is a view for explaining the nozzle array 1000 according to an embodiment.

Referring to FIG. 9, the nozzle array 1000 according to an embodiment may include a base and a plurality of nozzles positioned on the base. The nozzle array 1000 may include a plurality of nozzles 1030 fixed to the base. The nozzle array 1000 may include a plurality of through holes to which the nozzles are fixed, and may include a nozzle 1030 formed in each through hole. The plurality of nozzles may be positioned to have a predetermined distance d. The distance d between the nozzles may be determined in consideration of the voltage applied to the nozzle.

10A and 10B are views illustrating nozzle arrays 1001 and 1002 according to some embodiments. Referring to FIG. 10, the nozzle array 1001 may be provided in the form of a substrate including a plurality of nozzles 1031 and a control electrode 1051. The plurality of nozzles 1031 may be formed to have a predetermined distance d. The distance d between the nozzles may be determined in consideration of the voltage applied to the nozzle.

The control electrode may be located on one surface of the substrates 1011 and 1012. The control electrode can be located on the side from which the liquid is released. The control electrodes may be located on both surfaces of the substrates 1011 and 1012, for example, upper and lower surfaces. The control electrode can be positioned such that it is not connected to the nozzle.

A high voltage may be applied to the control electrodes formed on the substrates 1011 and 1012 or the plurality of nozzles 1031 and 1032. When a high voltage is applied to the control electrode or the plurality of nozzles 1031 and 1032, liquid discharged from the distal end of the through hole may be charged. In particular, by varying the voltage applied to each of the separated control electrodes, the direction in which the liquid is discharged can be controlled.

Referring to FIG. 10A, a control electrode surface 1051 may be formed on one surface of the nozzle array. Referring to FIG. 10B, a control electrode pattern 1052 may be formed around a through hole on one surface of the nozzle array.

According to one embodiment, the nozzle array may be provided in the form of a printed circuit board (PCB). The nozzle array may include a through hole formed through a via process, and may be provided in the form of a printed circuit board in which an electrode is patterned in the vicinity of the through hole.

The electrode patterned on the substrate may be used for pattern control for a plurality of nozzles. For example, when the substrate includes a plurality of patterned electrodes, the apparatus 100 may control the electric spray output or the direction of electric spray of each nozzle by varying the voltage applied to each electrode. For another example, the plurality of electrodes may be controlled by being divided into one or more nozzle groups. The apparatus 100 may control an electric spraying operation for each group by adjusting a voltage value applied to an electrode corresponding to each group.

When droplets that continuously charge at the same time are discharged from all the outlets of the nozzle array, the voltage for outputting the target current value is raised by increasing the density of the space charges near the outlets, and unintended side effects may occur. You can. For example, unintentional corona discharge due to an increase in the required voltage may occur. A similar problem may occur when emitting droplets that are charged in the same direction at all discharge ports of the nozzle array. To prevent this, a plurality of nozzle groups included in the nozzle array may be separated and controlled. In one example, the device 100 applies voltages sequentially or alternately to individual nozzle groups in order to offset the voltage increase effect caused by the space charge near the discharge port (for example, one end of the nozzle or through hole) through which the droplet is discharged. can do. Alternatively, the device 100 may change the direction in which the individual nozzle groups emit the charged droplets, and manage the nozzle voltage near the discharge port.

11A and 11B are diagrams for describing some embodiments of electrodes patterned on a substrate.

Referring to FIG. 11A, a plurality of through holes and linear control electrodes may be formed on the substrate. The linear (ie, rod-shaped) control electrode may be formed to correspond to a through-hole column or row. The linear control electrode may be formed to surround a through-hole column or row. One linear control electrode can be used to control electrospray at a group of nozzles comprising a plurality of nozzles. The apparatus 100 may individually control the electric spraying of the through-hole groups by individually controlling the linear control electrodes.

According to an embodiment, the nozzle array may include a first electrode LE1, a second electrode LE2, a third electrode LE3, and a fourth electrode LE4. The first to fourth electrodes LE1, LE2, LG3, and LE4 may be formed to surround the first to fourth nozzle groups LGL, LG2, LG3, and LG4, respectively.

The device 100 may apply different voltages to the first to fourth electrodes LE1, LE2, LG3, and LE4. The device 100 may sequentially apply voltages to the first to fourth electrodes LE1, LE2, LG3, and LE4. The apparatus 100 applies a first voltage to the first and third electrodes LE1 and LG3, applies a second voltage to the second and fourth electrodes LE2 and LE4, and then applies the first electrode and The second voltage may be applied to the third electrodes LE1 and LG3, and the first voltage may be applied to the second and fourth electrodes LE2 and LE4.

Referring to FIG. 11B, the nozzle array may include a substrate 1012, a plurality of nozzles 1032, and a plurality of control electrodes 1032 having a concentric shape. The plurality of control electrodes 1032 may be formed in the form of multiple rings having the same spacing. The ring electrode may be formed in a shape surrounding a plurality of through holes arranged in a circle. Individual ring electrodes can be used to control electrospray in a group of through-holes comprising a plurality of through-holes arranged in a circle.

According to an embodiment, the nozzle array may include a first ring electrode RE1, a second ring electrode RE2, and a third ring electrode RE3. The first to third electrodes RE1, RE2, and RE3 may be formed to surround the first to third through hole groups RG1, RG2, and RG3, respectively.

The apparatus 100 individually controls the first ring electrodes to the third electrodes RE1, RE2, and RE3 to individually control the electrospray operation in the first to third through hole groups RG1, RG2, and RG3. can do. The apparatus 100 may sequentially apply voltages to the first ring electrode RE1, the second ring electrode RE2, and the third ring electrode RE3. The apparatus 100 applies the first voltage, the second voltage, and the third voltage to the first ring electrode RE1, the second ring electrode RE2, and the third ring electrode RE3, respectively, to determine whether or not to emit fine droplets. , Emission direction, etc. can be adjusted. The apparatus 100 applies a first voltage to the first ring electrode RE1 and the third ring electrode RE3, applies a second voltage to the second ring electrode RE2, and then applies the first ring electrode RE1. ) And applying the second voltage to the third ring electrode RE3 and applying the first voltage to the second ring electrode RE2.

Meanwhile, in (a) and (b) of FIG. 11, the nozzle array is described as an example of a plan view, but the surfaces formed by the respective nozzle groups or control electrodes included in the nozzle array may be different from each other. For example, the end of each nozzle included in the first nozzle group and the end of each nozzle included in the second nozzle group may have different heights protruding from the base of the nozzle array. Alternatively, the first electrode and the second electrode may have different heights protruding with respect to the base of the nozzle array. Alternatively, the ends of each nozzle included in the first electrode and the first nozzle group corresponding to the first electrode may have different heights protruding with respect to the base of the nozzle array.

In FIGS. 9 to 11, description has been made based on a nozzle array or the like for generating droplets through electrospray, but this is only an example, and the content of the present invention is not limited thereto. The nozzle array or the like further includes a separate droplet generating means (eg, a gas blowing unit or a vibration unit), and can generate droplets by electrostatic spraying.

According to an embodiment, the reservoir 110 and the outlet 130 may be provided as an integral body. For example, the apparatus according to an embodiment may be implemented in the form of spraying charged droplets using a cartridge including a reservoir for storing liquid and a nozzle connected to the reservoir.

The communication unit 140 may communicate with an external device by wire or wireless. The communication unit 140 may perform bi-directional or unidirectional communication. For example, the communication unit 140, a local area network (LAN, Local Area Network), a wireless local area network (WLAN, Wireless Local Area Network), Wi-Fi (WIFI), ZigBee (ZigBee), WiGig, Bluetooth (Bluetooth) ) Can communicate with external devices. The communication unit 140 may include a wired or wireless communication module.

The communication unit 140 may acquire information from an external device or transfer information to the external device. For example, the communication unit 140 may obtain a control command from an external device and transmit it to a control unit or a corresponding unit. Alternatively, the communication unit 140 may transmit device information, status information, etc. acquired by the sensor unit to an external device. The communication unit 140 may communicate with external devices such as a user terminal, a control device, a control server, and / or other devices. For example, the communication unit 140 may communicate with an external server or the like, and obtain environmental information including weather information of the target area.

The sensor unit 150 may acquire information. The sensor unit 150 may obtain environmental information including measurement values of measurement parameters. For example, the sensor unit 150 may acquire status information inside the device, operation information of the device, and / or environmental information outside the device.

For example, the sensor unit 150 stores the state information of the parts constituting the device, such as the water storage unit 110, the water supply unit 120, the water discharge unit 130, the communication unit 140, the gas injection unit, the power supply unit 160, etc. Can be obtained. For example, the sensor unit, the temperature of the water stored in the water storage unit 110, the amount of water, the operating state of the water supply unit 120, the water discharge efficiency of the water discharge unit 130 (for example, whether nozzle clogging occurs), the temperature inside the device , It is possible to obtain state information such as the temperature of the water outlet 130 and the temperature of the reservoir 110.

According to an embodiment, when the device 150 includes a gas injection unit, the sensor unit 150 may obtain state information such as strength and temperature of the gas output from the gas injection unit.

As another example, the sensor unit 150 may obtain environmental information such as temperature information, humidity information, airflow (eg, wind speed), and air quality (eg, concentration of fine dust). The environment information may be information measured by the sensor unit 150 or information obtained from the outside. For example, the sensor unit 150 may receive environmental information from an external survey center.

As another example, the sensor unit 150 may acquire operation information related to operation of the device. The sensor unit 150 may obtain operation information used to determine whether the device is operating properly according to a control command. For example, the sensor unit 150 may obtain a current output from the device, a voltage applied to a nozzle of the device, a charge density around the device, an electric field intensity around the device, and a concentration of fine particles around the device.

According to an embodiment, when the sensor unit 150 includes a particle dispersion unit, operation information such as charge density and electric field strength of a region in which particles are dispersed by the particle dispersion unit may be obtained.

The sensor unit 150 is a specific parameter (for example, environmental information), the sensor unit 150 is located around the device is located around the measured value, the average value representing the average value of the target area or a specific value indicating a specific location The position value can be obtained.

The sensor unit 150 may include a sensor module that acquires information. Alternatively, the sensor unit 150 may acquire a measurement value from an external device including a sensor module and directly obtaining information.

The sensor module may be located inside the device or exposed outside the device. For example, a sensor module that obtains status information or operation information about a device may be fixed inside the device. Further, for example, a sensor module that obtains environmental information or operation information about the outside of the device may be located outside the device.

The information obtained through the sensor unit 150 may be used for control of the device. For example, status information or environmental information can be used to determine an operation command. The operation information and the like may be used to generate a user notification when abnormal operation information occurs. When the information obtained through the sensor unit 150 is sufficiently accumulated, history control of the device may be performed. Regarding the control of the device, the operation of the control unit will be described later in more detail.

The power supply unit 160 may supply power required for the operation of the device. The power supply unit 160 may supply power to each part constituting the device. The power supply unit may supply power to the water discharge unit, the water supply unit, the water storage unit, the communication unit, the sensor unit, and / or the control unit. The power supply unit 160 may supply DC or AC power. The power supply unit 160 may supply power to each unit in different forms.

The power supply unit 160 may apply a high voltage to components of the device, such as the water outlet unit 130. For example, the power supply unit 160 may apply a high voltage to the water outlet unit 130 through the connector. The power supply unit 160 may apply a high voltage to the nozzle so that the liquid discharged through the water outlet unit 130 is ejected in the form of droplets with charge. The power supply unit 160 may apply a voltage having a strength sufficient to cause electric spraying to occur in the nozzle. The power supply unit 160 may apply a voltage having a large potential difference to the ground GND to the nozzle. The power supply unit 160 may apply a positive voltage or a negative voltage to the ground GND to the nozzle. For example, the power supply unit 160 may apply a high voltage of -1 kV or less to the unit nozzle.

Although not illustrated in FIG. 6, the device may further include a gas injection unit. The gas injection unit may inject gas into a position where droplets are ejected by the water discharge unit 130.

The gas injection unit may release gas toward the droplet ejected from the water outlet unit 130 to promote evaporation of the droplet. The gas injection part can promote the evaporation of the droplets, so that the fragmentation of the droplets can occur more stably. The gas injection part promotes the evaporation of the droplets, so that the space charge can be stably distributed in the target region.

The gas injection unit may locally reduce the spatial charge density in the vicinity of the discharge port by blowing gas near the discharge port where the droplets are ejected and pushing charged particles near the discharge port. The gas injection unit can perform the function of the particle dispersing unit described later by reducing the density of the space charge in the vicinity of the discharge port.

The gas injection unit may expel gas near the discharge port through which the liquid is discharged, thereby promoting the formation of droplets. The gas injection unit may act as a physical force to eject the gas toward the discharge port through which the liquid is discharged, so that droplets can be separated from the liquid. The gas injection unit may release gas toward the liquid or the generated droplets so that droplets of a smaller size are produced.

The gas injection portion may provide a path for droplets to travel. The gas injection unit may induce a gas to be ejected near a discharge port through which a liquid is discharged, so that the discharged droplets or particles move toward a specific direction.

The gas injection unit may include an air nozzle and an air pump. According to one embodiment, the air pump may be formed integrally with a pump that supplies liquid. The gas injection unit may include an inlet through which gas is introduced. The gas injection unit may include a flow regulator that controls the blowing of gas.

The gas injection unit may include a plurality of air nozzles. The plurality of air nozzles may be provided side by side or may be provided to face different directions. According to an embodiment, a plurality of air nozzles may be provided to face an area where droplets are discharged by the water outlet unit 130. According to an embodiment, the gas injection unit may be provided in the above-described water outlet unit 130. The gas injection unit may be provided as an integral part with the water outlet unit 130 described above.

The gas injection unit may further include a heating module, if necessary. The heating module may include heating means such as an electric heating coil, an induction heating coil, or a thermoelectric element. According to an embodiment, the gas injection unit may include an air nozzle, an air pump, and a heating module, and inject heated gas.

The gas injection unit may inject a gas having low reactivity. For example, the gas injection unit may inject nitrogen gas, argon gas, compressed air, or the like. The gas injection unit may inject an inert gas.

The gas injection unit may inject a gas containing a charge transfer material. The gas injection unit may release a gas containing a charge transfer material that acquires charge from a material carrying a charge contained in a droplet. For example, the gas injection unit may release a gas containing an oxygen (O 2) component.

12A is a view for explaining an embodiment of a nozzle array.

Referring to FIG. 12A, the nozzle array 1003 may further include a gas ejection port 1073. The gas outlet 1073 may be provided to have a coaxial structure with the nozzle. The gas outlet 1073 may be formed between the nozzle and the nozzle. The gas ejection port 1073 may be provided as a separate through hole formed around the nozzle. The gas outlet 1073 is formed in parallel with the nozzle, and can push charged droplets ejected from the nozzle. The plurality of gas outlets 1073 may be supplied with gas from one air pump.

Although not illustrated in FIG. 6, the device may further include a particle dispersion unit. The particle dispersing unit may adjust the voltage applied to the nozzle as necessary by adjusting the space charge density near the discharge port where the charged droplets are ejected.

For example, the particle dispersing unit may disperse charged particles near the nozzle end where the droplet is discharged by acting a non-electromotive force on the region where the droplet charged by the outlet 130 is discharged. The particle dispersing unit can lower the space charge density near the nozzle end by dispersing charged particles near the nozzle end. The particle dispersing portion may decrease the reference voltage that must be applied to the nozzle in order to discharge the reference current through the nozzle by reducing the space charge density near the nozzle end. The particle dispersion portion may drop the reference voltage so that the voltage applied to the nozzle end is maintained within an appropriate range.

For example, the voltage applied to the nozzle end may be maintained at a value in the range of 10 kV to 15 kV. The proper range of the voltage applied to the nozzle end may vary depending on the shape of the nozzle end. Depending on the shape of the nozzle end portion, a voltage value at which direct discharge, such as corona discharge, occurs from the nozzle may vary, and accordingly, an appropriate range of a voltage applied to the nozzle end may vary. For example, when a sharp edge is included in the nozzle, the proper range of voltage may have a lower upper limit.

For a specific example, the reference voltage to be applied to the nozzle in order to discharge the reference current 1mA through a droplet charged with charge at one nozzle of the device 100 may vary according to the space charge density around the discharge port of the nozzle. For example, when the device 100 starts operating, the reference voltage for discharging the reference current 1 mA in the state where there is little space charge around the discharge port may be 8 kV. At a point in time after the device has been continuously operated for a certain period of time or more, the discharge periphery may have a high spatial charge density, and the reference voltage may be 9 kV or more. The particle dispersing unit may lower the space charge density of the discharge port by pushing particles having charge around the discharge port, and lower the reference voltage to a value lower than 9 kV, for example, 8.5 kV.

The particle dispersing portion can keep the reference voltage within an appropriate range by lowering the reference voltage. The particle dispersing unit can improve the energy efficiency of the device 100 by maintaining the reference voltage within an appropriate range. The particle dispersing portion can prevent unnecessary discharge or generation of substances that may occur at the nozzle end. Particle dispersion can improve the stability and safety of the device.

The particle dispersing unit may be implemented in the form of the above-described gas injection unit.

Although not illustrated in FIG. 6, the device may further include a heating unit.

The heating unit may heat the configuration of the device 100 or the liquid or gas discharged from the device 100. The heating section can be used to heat one or more of each section of the device. For example, the heating unit may heat a portion of the reservoir, the outlet 130, or the gas injection unit.

For example, the heating unit may be located around the reservoir. The heating unit surrounds the water storage container of the water storage unit and may heat the water storage container and the liquid stored in the water storage container. The heating unit is located around the nozzle of the water outlet unit 130 and may heat the nozzle and the liquid passing through the nozzle. The heating unit may be positioned around the air nozzle of the gas injection unit and heat the air nozzle and the gas passing through the nozzle. The heating unit may heat an area where droplets are discharged. For example, the heating unit may heat the gas injected into the region where the droplet is discharged, thereby heating the region where the droplet is discharged.

The heating unit may include heating means such as an electric heating coil, an induction heating coil, or a thermoelectric element.

12B is a view for explaining an embodiment of the nozzle array 1004.

Referring to (b) of FIG. 12, the nozzle array 1004 may further include a heating module 1094. The heating module 1094 may be disposed around the nozzle. The heating module 1094 may be disposed between the nozzle and the nozzle. The heating module 1094 may be arranged to surround a plurality of nozzles. The heating module 1094 may be formed to have a coaxial structure with the nozzle. The heating module 1094 may be provided in the form of a coil. The heating module 1094 may be provided in a coil shape surrounding the gas ejection port and may be arranged to heat the ejected gas. The heating module 1094 is provided in a coil shape surrounding the nozzle, and can heat the sprayed liquid.

Although not illustrated in FIG. 6, the device 100 may include an interface unit.

The interface unit may be implemented as a space connecting the outside air and the water outlet unit 130. The interface unit may provide a space at least partially blocked from the outside so that the influence of changes in the external environment on the formation of space charges by droplets emitted from the device is minimized.

The interface unit may provide an environment required for droplets discharged from the water outlet unit 130. For example, the interface unit may provide temperature or humidity to allow evaporation or fragmentation of droplets to occur sufficiently.

The interface portion may include a reaction space, for example, a chamber. The chamber may include a configuration for weakening the influence of the external environment, for example, an insulating material, an insulating material, a heat-resistant material, a waterproof material, a water repellent material, and the like. The interface unit may include a cover for blocking external influences. The cover may be opened and closed according to the operating state of the device 100.

The interface unit may be formed in connection with the water outlet unit 130. The interface part may be formed in connection with a gas injection part, a particle dispersion part, or a heating part.

The control unit may control the operation of the device and / or each unit. The control unit may generate a control command and control each unit of the device. The control unit may obtain a control command through the communication unit and control the corresponding unit based on the obtained control command.

The control unit may control the operation of the water storage unit, the water supply unit, the water discharge unit 130, the communication unit, the sensor unit, the power supply unit, and / or other device configurations. For example, the control unit may control on / off of the water supply operation of the water supply unit. The amount of water supplied per hour can be controlled by the water supply unit. In addition, for example, the control unit may control the information acquisition operation of the sensor unit.

The control unit may control a power supply operation of the power unit. The control unit may control the voltage or current output by the power supply unit. The control unit may apply a voltage to a specific configuration through the power supply unit. For example, the control unit may control the voltage applied to the water outlet unit 130 through the power supply unit. The control unit may be controlled to generate electric spray in the water outlet unit 130 through the power supply unit. The control unit may control the current output from the water outlet unit 130 through the power supply unit.

The control unit may apply a high voltage to the nozzle so that charged droplets are discharged from the nozzle using the power supply unit. The control unit may apply a high voltage to the nozzle to generate electric spray at the nozzle using the power supply unit. The control unit may apply a high voltage to the nozzle so that the fine particles in the air are charged by acquiring at least a portion of the negative charge from the charged droplets using the power supply unit. The control unit may apply a high voltage to the nozzle by using the power supply unit so that the charged fine particles are pushed by the electric field formed by the negative charge emitted from the device.

The control unit may apply a high voltage to some components of the device through the power supply unit. For example, the control unit may apply a voltage below the reference value or above the reference value to the nozzle through the power supply unit. For example, the control unit may control the power supply unit to apply a voltage of 2 kV or more to the unit nozzle. The control unit may control the power supply unit to apply a voltage of 20 kV or less to the unit nozzle. The control unit may control the power supply unit to apply an average voltage of 20 kV or less to the nozzle array.

Although not illustrated in FIG. 6, the device 100 may include an output unit. The output unit may include output means for outputting operation information or status information of the device. The output unit may include visual information display means such as a display or LED bulb, or audio information display means such as a speaker.

On the other hand, the devices and configurations described in FIGS. 6 to 12 are only examples, and the structures described in FIGS. 6 to 12 may be omitted, and a configuration not shown in FIGS. 6 to 12 may be further included in the device 100 have.

13 is a conceptual diagram illustrating an apparatus according to an embodiment.

Referring to FIG. 13, an apparatus according to an embodiment includes a control module 171, a power module 161, a sensor module 151, a communication module 141, a water supply pump 121, an air pump 181, and water storage A container 111 and a nozzle array 131 may be included.

The control module 171 may receive power from the power module 161. The control module 171 can control the power module 161. The control module 171 may be connected to the sensor module 151 and / or the communication module 141. The control module 171 may control the water supply pump 121 and the air pump 181. The control module 171 may control the water supply pump 121 to supply the liquid stored in the water storage container to the nozzle array 131. The control module 171 may control the air pump 181 to supply gas to the nozzle array 131.

The power module 161 may supply power to the control module 171. The power module 161 may supply power to the nozzle array 131. The power module 161 may apply a high voltage to individual nozzles included in the nozzle array 131.

The water supply pump 121 may provide the liquid stored in the water storage container 111 to the nozzle array 131. The air pump 181 may discharge gas through an air nozzle formed in the nozzle array 131.

2.2.2 Examples

2.2.2.1 First embodiment

According to an embodiment of the invention described herein, the apparatus for managing the concentration of the fine particles in the target area by supplying charge to the target area, the container for storing the liquid, at least one nozzle for outputting the liquid, at least from the container A device including a pump for supplying liquid to one nozzle, a power supply for supplying power to a device, and a controller for supplying electric charge to a target region through at least one nozzle using a power supply may be provided. Here, with respect to the device, the contents of the device described herein may be applied.

The device can supply charge to the target area. The controller may supply a charge to the target region by applying a voltage to at least one nozzle using a power source.

The device can supply a negative charge to the target area. The controller may apply a negative voltage to at least one nozzle using a power source. For example, the controller may supply a negative charge to the target area using a power source, and the controller may apply a negative voltage to the at least one nozzle using a power source to emit a negatively charged droplet through the at least one nozzle. have.

The controller may apply a voltage greater than or equal to the first reference value to the at least one nozzle using a power source. The first reference value may be a threshold value that is determined such that sufficient current is discharged through the liquid provided to the nozzle to the target region.

The controller may apply power greater than or equal to the first reference value determined in consideration of a predetermined effective radius value to the at least one nozzle using the power source. The predetermined effective radius may be a distance to a point at which the concentration of the reference time fine particles is reduced by the reference ratio. In other words, the device can operate according to a predetermined effective radius. The effective radius may be determined in consideration of the time to drive the device, the target reduction ratio of the concentration of fine particles, the voltage applied to the nozzle and / or the current output through the nozzle.

For example, when the effective radius is the first radius, the device may output the first current during the reference time such that the concentration of the fine particles at a position away from the device within the reference time is reduced by a reference ratio. The device outputs a second current greater than the first current during the reference time, such that when the effective radius is a second radius greater than the first radius, the microparticle concentration at a position away from the device within a reference time is reduced by a reference ratio. can do.

Also, for example, when the effective radius is the first radius, the device may output a first current for a first time such that the concentration of the fine particles at a position away from the device is reduced by a reference ratio. If the effective radius is a second radius greater than the first radius, the device may output a first current for a second time longer than the first time so that the concentration of the fine particles at a position away from the second radius is reduced by a reference ratio. have.

The controller may apply a voltage equal to or greater than a first reference value determined to output a current of 100 μA to 10 mA through the at least one nozzle to the at least one nozzle using a power source.

The controller may apply a voltage equal to or less than the second reference value to the at least one nozzle using a power source. The second reference value may be determined to prevent discharge of charge from the nozzle. The second reference value may be determined to prevent discharge, eg corona discharge, from occurring directly from the nozzle. The second reference value may be determined such that the amount of current discharged directly from the nozzle does not exceed the amount of current output through the liquid discharged from the nozzle.

When the apparatus includes a plurality of nozzles, the controller can collectively apply a voltage equal to or greater than a first reference value to the plurality of nozzles. Alternatively, the controller may individually apply a plurality of voltage values selected within a range exceeding the plurality of nozzle first reference values.

The device can form a space charge. The controller may supply a charge to the target region by applying a voltage to at least one nozzle by using a power source, and form a space charge in the target region. The controller can form a space charge that forms an electric field in the target region using a power source.

The device can form a negative space charge in the target region. The controller may form negative space charges in the target region by supplying negative charges to the target region through at least one nozzle using a power source.

The device can charge fine particles in the target area. The fine particles in the target region may be charged with the same polarity as the charge supplied by the supplied charge. When the device outputs a negative charge, the fine particles in the target region can be charged with a negative charge.

The device can provide electrical power to the fine particles. The device can charge the fine particles in the target area and provide electrical power to the charged fine particles. The controller may supply a charge to the target region by applying a voltage to at least one nozzle using a power source, and provide electric force in a direction away from the device to fine particles in the target region charged by the supplied charge. .

 The electric force provided to the charged fine particles may be provided by an electric field formed by electric charges supplied to at least some target regions. The device may form a negative space charge in the target region, and the electric force provided to the fine particles may be provided by an electric field due to at least some negative space charge.

The controller may provide electric power in the predetermined direction to the fine particles, thereby providing power to the fine particles. The controller may use a power source to provide electric power including the component facing the ground to the fine particles in the target area. For example, the controller may maintain a space charge for a predetermined time or longer so that a charged material is supplied to the target region for a predetermined time or longer, so that the charged fine particles are supplied with electric force and moved in the direction of the ground to be removed.

The electric force provided to the fine particles may include a first direction component perpendicular to the ground. The electric force provided to the fine particles may include a first directional component facing the ground. The electric force provided to the fine particles may include a second direction component horizontal to the ground. The electric force provided to the fine particles may include a second directional component that is horizontal to the ground and away from the device.

2.2.2.2 Second Example

According to another embodiment of the invention described herein, the apparatus for managing the concentration of the fine particles in the target area by supplying charge to the target area, the container for storing the liquid, at least one nozzle for outputting the liquid, from the container A pump for supplying liquid to at least one nozzle, a power source for supplying power to a device, a controller for supplying a material that charges a target region through at least one nozzle using a power source, and a ratio for a material that is charged -An apparatus comprising a particle dispersing unit providing electrical force can be provided.

With respect to the device, contents relating to the device described throughout this specification may be selectively applied.

The controller may output a droplet having a charge through at least one nozzle by applying a voltage equal to or greater than a first reference value to the at least one nozzle using a power source.

The controller may generate a space charge in the target region by supplying a material having a charge through at least one nozzle using a power source. The controller may apply a voltage to at least one nozzle by using a power source, output a liquid charged with charge through at least one nozzle, supply charge to the target region, and form space charge in the target region.

 The particle dispersing unit may be configured to provide a non-electric force by spraying a material that is electrically charged with an electrically neutral material. For the particle dispersing portion, the contents of the particle dispersing portion or gas injection portion described herein may be applied.

The particle dispersing unit includes at least one air nozzle for injecting gas, and may inject gas in a direction away from the nozzle with respect to the charged material.

The at least one nozzle may include a stage through which charged droplets are discharged. One end at which the droplet is discharged may mean an end at which a discharge port through which the liquid of the nozzle is output is located.

At this time, the controller may provide a non-electric force in a direction away from the one end for the material carrying the charge near the one end by using the particle dispersing unit so that the density of the space charge is reduced at least partially in the vicinity of the one end. The neighborhood of one end may mean an area within a predetermined distance from the end of the nozzle. The neighborhood of one end may be a region in which space charges that exert a significant amount of electric force are distributed on the liquid located in the nozzle. The neighborhood of one end may mean an area within 10 cm from the end of the nozzle.

The controller may manage so that the space charge density in the vicinity of one end does not exceed a threshold, so that the electric force acting on the liquid located at one end of the space charge formed near the nozzle is reduced. The controller includes a directional component away from one end of the nozzle in a material having a charge distributed around one end of the nozzle so that the required voltage applied to the nozzle does not exceed the reference voltage to output the reference current through the nozzle. Can provide a non-electric force.

For example, as the device releases electric current, the spatial charge density around the outlet of the nozzle can be raised. When the space charge density around the discharge port is increased, the electric current exerted through the nozzle may be reduced when the voltage applied to the nozzle is constant (that is, when constant voltage control is performed) by the electric force exerted by the space charge on the liquid in the nozzle. Alternatively, when constant current control is performed such that the current output through the nozzle is constant, the voltage applied to the nozzle may be increased. When a voltage above a certain level is applied to the nozzle, problems such as direct discharge through the nozzle may occur. In order to minimize this problem, the apparatus can reduce the electric force that the space charge acts on the liquid at the nozzle end by applying a non-electric force by spraying gas or the like near the end of the nozzle.

2.3 Device Operation

According to the invention described in the present specification, a method for reducing the concentration of fine particles using a device or a control method for a device for reducing the concentration of fine particles is provided. Hereinafter, some embodiments will be described with reference to a method for controlling the apparatus, a method for reducing the concentration of fine particles, a method for effectively operating the apparatus for reducing the concentration of fine particles, and the like.

In the flowchart illustrated in connection with the following embodiments, the order of each displayed step is not absolute, and the position of each step may be changed according to embodiments.

2.3.1 General: Method for reducing fine particle concentration

The apparatus 100 may perform a method of reducing the concentration of fine particles in the air. The device or the controller of the device may perform a method of reducing the concentration of fine particles in the air for the target area using each part.

14 is a flowchart for explaining an embodiment of a method for reducing the concentration of fine particles in air.

Referring to FIG. 14, a method of reducing the concentration of fine particles in the air may include applying a high voltage to the nozzle (S101) and supplying liquid to the nozzle (S103).

The method of reducing the concentration of fine particles in the air can be performed by the apparatus described herein. For example, a method of reducing the concentration of fine particles in the air may be performed by an apparatus including a power supply unit, a water storage unit, a water supply unit, a water extraction unit, and a control unit.

Step (S101) of applying a high voltage to the nozzle may include applying a voltage of a predetermined value or more to the nozzle. For example, the step of applying a high voltage to the nozzle (S101) may include applying a voltage sufficient for generating electric spray to the nozzle by the controller using the power source. Step (S101) of applying a high voltage to the nozzle may include applying a voltage of a predetermined value or less to the nozzle. For example, the step of applying a high voltage to the nozzle (S101) may include applying a voltage in a range in which discharge from the nozzle (eg, direct discharge such as corona discharge) does not occur using the power supply unit.

The step of applying a high voltage to the nozzle (S101) may include applying a high voltage to the nozzle so that the control unit uses a power source to discharge the charged droplets from the nozzle. The step of applying a high voltage to the nozzle (S101) may include applying a high voltage to the nozzle so that the controller generates an electric spray using the power supply unit. The step of applying a high voltage to the nozzle (S101) may include applying a high voltage to the nozzle so that the control unit uses a power source to discharge droplets having a negative charge from the nozzle and transfer at least a portion of the negative charge to the fine particles in the air. have. The step of applying a high voltage to the nozzle (S101) may include applying a high voltage to the nozzle so that the controller obtains and charges at least a portion of the negative charge from the charged droplets by using the power supply unit. The step of applying a high voltage to the nozzle (S101) may include applying a high voltage to the nozzle so that the control unit uses the power source to push the charged fine particles by the electric field formed by the negative charge emitted from the device.

For example, the step of applying a high voltage to the nozzle (S101), the control module includes applying a high voltage above a reference value to the plurality of nozzles, so that the charged droplets are discharged from the plurality of nozzles included in the nozzle array through the power supply You can.

Step S103 of supplying liquid to the nozzle may include supplying liquid having conductivity. Step (S103) of supplying the liquid to the nozzle may include the control unit providing the liquid stored in the water storage unit at a predetermined flow rate through the water supply unit to the water outlet unit. The step (S103) of supplying liquid to the nozzle may include providing, by the control unit, the liquid stored in the reservoir to the outlet so that a predetermined volume of liquid is discharged from the nozzle through the water supply.

For example, the step (S103) of supplying liquid to the nozzle may include the control module supplying the liquid stored in the reservoir to the nozzle array at a predetermined flow rate through the pump.

The device may further include a gas injection unit. At this time, the method for reducing the concentration of fine particles in the air may further include a step of releasing gas. The step of discharging the gas may include the control unit jetting the gas through the gas injection unit to a region in which droplets are discharged. The step of discharging the gas may include the control unit blowing the gas through the gas injection unit to the region where the droplet is ejected. The step of discharging the gas may include the control unit blowing the gas in the first direction through the gas injection unit to provide a movement path to the ejected droplets. The first direction may be a direction away from the position where the droplets are generated. The step of discharging the gas may include the control unit discharging the gas to the region where the droplet is ejected, so that evaporation and / or fragmentation of the ejected droplet is promoted through the gas injection unit.

The device may further include a heating unit. At this time, the method for reducing the concentration of fine particles in the air may further include heating the liquid. The step of heating the liquid may include the control unit heating the nozzle through the heating unit. The step of heating the liquid may include heating the nozzle through which the control unit discharges the liquid to a predetermined temperature or higher through the heating unit. The step of heating the liquid may include heating the nozzle through which the control unit discharges the liquid to a predetermined temperature or higher through the heating unit. The step of heating the liquid may include the control unit heating the nozzle through which the liquid is discharged so as to promote evaporation and / or fragmentation of the ejected droplets through the heating unit. The step of heating the liquid may include the control unit heating the storage container in which the liquid is stored, a space in which the liquid is ejected, and the like through the heating unit.

The device may further include a heating portion and a gas injection portion. At this time, the method for reducing the concentration of fine particles in the air may further include the step of releasing the heated gas to the gas. The step of discharging the heated gas may include the control unit heating a gas injection port (for example, an air nozzle) through which the gas is discharged through the heating unit, and discharging the heated gas above a reference temperature through the gas injection unit.

Meanwhile, the order of applying a high voltage to the nozzle (S101) and supplying liquid to the nozzle (S103) may be changed. However, in order to secure the stability of the voltage applied to the nozzle or the current output through the nozzle, the apparatus may provide liquid to the nozzle after applying the voltage to the nozzle.

15 is a flow chart for explaining an embodiment of a method for reducing the concentration of fine particles in air.

According to one embodiment, the method for reducing the concentration of fine particles includes the steps of outputting a droplet carrying a charge (S201), forming a space charge (S203) and charging the fine particles in the air (S205). It can contain.

The method of reducing the concentration of fine particles may be performed by the apparatus described herein. For example, a method of reducing the concentration of fine particles in the air may be performed by an apparatus including a power supply unit, a water storage unit, a water supply unit, a water extraction unit, and a control unit.

The step of outputting the charged droplet (S201) includes the control unit providing the liquid stored in the reservoir through the water supply unit to the outlet unit, and applying a high voltage to the outlet unit through the power supply unit to output the charged droplet. can do. The step of outputting the charged droplet (S201) may include applying a high voltage to the nozzle such that the controller discharges a predetermined amount of current (charge amount per hour) from the nozzle. For example, the controller may output a current of 0.1 mA or more through the nozzle or the nozzle array. For example, the controller may include applying a high voltage to the nozzle or nozzle array such that 4.16 * 10 ^ 18 charges are released per second (ie, 0.67mA current is output) through the nozzle or the nozzle array.

The step of forming the space charge (S203) may include forming a space charge distribution in the target region by emitting a droplet having a charge through the water outlet. The step of forming the space charge (S203) may include forming a space charge distribution in the target region by continuously releasing a negatively charged droplet for a predetermined time or more. The step of forming the space charge (S203) may include forming a space charge distribution such that an electric field is formed in the target region by emitting a droplet having a charge through the water outlet.

The step of charging the fine particles in the air (S205) may include charging at least a portion of the fine particles in the target region by emitting a droplet having a charge through the water outlet. The step of charging the fine particles in the air (S205) may include charging the fine particles floating in the air in the target region with at least some negative charge by continuously releasing a negatively charged droplet over a predetermined time. For example, when the concentration of the fine particles (eg, ultrafine dust of PM2.5 or less) in the target region is 35 μg / m ³ , the device may output droplets having a charge of 1 hour or more.

The method of reducing the concentration of fine particles may further include a step of assisting the formation (or maintenance) of space charges. The step of assisting the formation of the space charge may further include the control unit assisting the formation of the space charge so that the charge contained in the charged droplet is sufficiently dispersed to form a sufficient space charge density in the target region.

The step of assisting the formation of the space charge may include the control unit assisting the formation of the space charge by the droplets discharged from the water outlet using a gas injection unit or a heating unit. The step of assisting the formation of the space charge may further include the control unit ejecting the gas to the region through which the droplet is discharged through the gas injection unit. The step of assisting the formation of the space charge may further include the control unit ejecting the heated gas through the gas injection unit and / or the heating unit to the region where the droplet is discharged. The step of assisting the formation of the space charge may further include the control unit heating the nozzle through which the liquid is injected through the heating unit.

Although not illustrated in FIG. 15, the method for reducing the concentration of fine particles may further include reducing the concentration of fine particles in the target region and / or removing the fine particles in the target region. The method of reducing the concentration of fine particles may include maintaining the space charge formed in the target region. The operation of removing fine particles in the target region of the device or reducing the concentration of fine particles in the target region may be performed using a space charge formed by the device or an electric field formed by the space charge.

A method of reducing the concentration of fine particles may include the device maintaining the state of formation of space charges, thereby providing electrical power to the charged fine particles. In the method of reducing the concentration of the fine particles, the device forms a space charge and maintains the formation of the space charge, so that the charged fine particles are discharged from the device in a direction away from the device (e.g., a substance with charge from the device is released) It may include reducing the concentration of fine particles in the target region by providing electric force in a direction away from the discharge port. In the method of reducing the concentration of fine particles, the device maintains a space charge to provide electric force to charged fine particles in the target area, and the fine particles move toward the ground or structure based at least in part on the electric force by the device, It may include removing at least a portion of the fine particles in the target area by being attached to the ground or the structure.

According to an embodiment, a method of reducing the concentration of fine particles may include applying power to a nozzle in consideration of characteristics of a target region. For example, the control unit may consider the size, radius (for example, the radius of the target region having a hemispherical shape around the device), the width or height of the target area, and the voltage applied to the water outlet through the power supply or the power supply. The current value output from the negative can be controlled. As a specific example, when the target region has a first radius, the controller controls the current value output from the water outlet through the power supply unit to be the first current value, and when the target region has a second radius greater than the first radius, It is possible to control the current value output from the water outlet unit to be the second current value through the power supply unit.

16 is a flow chart for explaining an embodiment of a method for reducing the concentration of fine particles in air. The method for reducing the concentration of fine particles in the air may be performed by a device described herein, for example, a device including a power supply unit, a water storage unit, a water supply unit, a water discharge unit, and a control unit.

According to an embodiment, a method of reducing the concentration of fine particles in a predetermined target region may be provided. According to an embodiment, the method of reducing the concentration of fine particles may include applying a determined voltage in consideration of characteristics of a target region to the nozzle (S301) and supplying liquid to the nozzle (S303).

The step of supplying liquid to the nozzle (S303) may be implemented similarly to the embodiment described above with reference to FIG. 15.

The step of applying a high voltage to the nozzle in consideration of characteristics of the target region (S301) may include applying a voltage to the nozzle in consideration of the size of the target region. The voltage applied to the nozzle can be determined based on the radius of the target area, which is determined around the position of the device. The voltage applied to the nozzle can be determined based on the radius of the target area of the device and the time required to reduce the fine particles to a reference concentration. The voltage applied to the nozzle may be determined according to a reference current determined based on the radius of the target area of the device and / or the radius of the target area and the time required to reduce the fine particles to a reference concentration.

For example, the radius (or effective radius) R of the target region may have a positive correlation with the output power. The radius R of the target area may be determined in proportion to the log value of the output power. (The current output through the nozzle or the voltage applied to the nozzle can be determined according to the output power. The output power can be expressed as the product of the voltage applied to the nozzle and the current output through the nozzle.) Target Area The radius R of may have a positive correlation with the time T during which the device is operated. In other words,

As a specific example, when the radius R of the target region is 50 m, the operating time of the device may be determined according to the output of the device. For example, when the radius R of the target region is 50 m and the output of the device is 300 W, the time required for the concentration of the fine particles to be reduced by 50% at the point 50 m from the device (ie, the operating time of the device) is It can be determined in 2 hours 30 minutes. Alternatively, when the radius R of the target region is 50 m and the output of the device is 1 kW, the time required until the concentration of the microparticles is reduced by 50% at a point 50 m from the device may be determined as 1 hour 30 minutes. . When the radius R of the target area is 50 m and the output of the device is 10 kW, the time required for the concentration of the fine particles to be reduced by 50% at a point 50 m from the device may be determined to be less than 1 hour, for example, 50 minutes. have.

As another specific example, when the operating time of the device is 2 hours, the effective radius R of the device may be determined according to the output of the device. For example, when the operating time of the device is 2 hours and the output of the device is 300 W, the radius of the target area to reduce the concentration of the fine particles (or the distance from the device to the point where the concentration of the fine particles is reduced by 50%) R may be determined to be 50 m or less, for example, about 45 m. When the operating time of the device is 2 hours and the output of the device is 1 kW, the radius R of the target region to reduce the concentration of fine particles may be determined to be 50 m or more, for example, about 52 m. When the operating time of the device is 2 hours and the output of the device is 10 kW, the radius R of the target region to reduce the concentration of fine particles may be determined to be 60 m or more, for example, about 65 m.

When the target region is predetermined from the device to the region having a radius R, the voltage applied to the nozzle may be a value determined according to the radius. When the radius of the target region is changed, the voltage applied to the nozzle may be changed. For example, in a first target region having a first radius, a first voltage applied to a nozzle to decrease a first ratio of the fine particle concentration for a first time in a second target region having a second radius greater than the first radius May be less than a second voltage to decrease the first concentration of the fine particle during the first time

16B is a view for explaining a method of reducing the concentration of fine particles according to another embodiment. According to an embodiment, a method of reducing the concentration of fine particles may include supplying liquid to the nozzle (S401) and outputting a predetermined current in consideration of characteristics of a target region through the nozzle (S403). .

In step S403 of outputting a current through a nozzle in consideration of a characteristic of a predetermined target region, the control unit outputs a nozzle current (amount of charge emitted per hour from the nozzle) determined based on a radius R of the preset target region. It can contain. The nozzle current may be determined as a current value that must be output from the device for a reference time so that the concentration of the fine particles in the target region having a radius R within the reference time is reduced through the nozzle (or nozzle array) of the device.

The nozzle current may be differently determined according to the radius of the target region when the device continuously outputs a constant current to decrease the concentration of the fine particles in the target region for a reference time over a reference time. For example, the first current for reducing the first ratio of the fine particle concentration for the first time in the first target region having the first radius is the first current in the second target region having the second radius greater than the first radius It may be less than the second current to reduce the fine particle concentration by the first ratio.

The reference current may be the average current output from the nozzle during the reference time. In other words, the device does not necessarily have to continuously output a constant current value, and can output a variable current while maintaining the average current value within a reference current range.

In other words, the voltage V applied to the nozzle or the current I output through the nozzle is the number of nozzles (if the device includes a nozzle array), the radius R of the target area (or equivalent size to volume parameter), fine dust It can be determined taking into account the target reduction rate of concentration and / or the reference time T.

The step of applying a voltage to the nozzle in consideration of the characteristics of the target region (S301) or the step of outputting the current in consideration of the characteristics of the target region (S403) includes: concentration of fine particles in the target region, temperature of the target region, target region It may include applying a voltage or outputting a current to the nozzle in consideration of the humidity of the.

For example, the control unit may apply a voltage determined in proportion to the concentration of the fine particles in the target region, or output a current determined through the nozzle having a positive correlation with the concentration of the fine particles in the target region. In addition, for example, the control unit may apply a voltage determined in proportion to the humidity of the target area to the nozzle or output a current determined in proportion to the humidity of the target area through the nozzle.

17 is a flow chart for explaining an embodiment of a method for reducing the concentration of fine particles in air. The method for reducing the concentration of fine particles in the air may be performed by a device described herein, for example, a device including a power supply unit, a water storage unit, a water supply unit, a water discharge unit, and a control unit.

Referring to FIG. 17, a method of reducing the concentration of fine particles according to an embodiment is based on applying a high voltage to the nozzle (S501), supplying liquid to the nozzle (S502), and the concentration of fine particles in the target region It may include the step of reducing the ratio (S503).

In the step of reducing the microparticle concentration by a reference ratio (S503), the control unit continues to charge droplets so that the microparticle concentration of the target region is reduced from the first concentration to a second concentration reduced by the reference ratio from the first concentration. Or continuous release. In the step (S503) of reducing the concentration of the fine particles by the reference ratio, the control unit continuously or continuously discharges the charged droplets such that the concentration of the fine particles in the target region is reduced to the reference concentration reduced by the reference ratio compared to the initial concentration. It can contain.

The step of reducing the concentration of the fine particles in the target region by the reference ratio (S503) may include applying a voltage to the nozzle so that the control unit reduces the concentration of the fine particles in the target region by the reference ratio. The voltage applied to the nozzle may be determined such that, when a predetermined reference time elapses from the time the device is driven, the concentration of the fine particles in the target region is reduced by the reference ratio.

In the step S503 of reducing the concentration of the fine particles in the target region by the reference ratio, the controller obtains the concentration of the fine particles in the target region by using the sensor unit, and if the concentration of the fine particles in the target region does not decrease the reference ratio, it is applied to the nozzle. It may include maintaining the high voltage.

The fine particle concentration in the target region may mean an average fine particle concentration in the target region. The concentration of fine particles in the target region may mean a concentration of fine particles sampled at a specific point in the target region.

18 is a flowchart illustrating a method of reducing the concentration of fine particles according to an embodiment.

Referring to FIG. 18, a method for reducing the concentration of fine particles includes driving a device when the concentration of the fine particles in the target area is the first concentration (S601) and when the concentration of the fine particles in the target area is the second concentration It may include the step of stopping the driving (S603).

 The step of driving the device when the concentration of the fine particles in the target region is the first concentration (S601) may include obtaining the concentration of the fine particles in the target region. The step of driving the device when the concentration of the fine particles in the target region is the first concentration (S601) may include determining whether the concentration of the fine particles is equal to or greater than the first concentration. The step of driving the device when the concentration of the fine particles in the target area is the first concentration (S601) is to obtain the concentration of the fine particles in the target area and to start the operation of fine particle management of the device when the concentration of the fine particles is greater than or equal to the first concentration It can contain.

The step of stopping the operation of the device when the concentration of the fine particles in the target area is the second concentration (S603) may include obtaining the concentration of the fine particles in the target area while maintaining the operation of the device. The step of stopping the operation of the device when the concentration of the fine particles in the target region is the second concentration (S603) may include determining whether the concentration of the fine particles is equal to or less than the second concentration. The step of stopping the operation of the device when the concentration of the fine particles in the target region is the second concentration (S603) may include stopping the operation of managing the fine particles of the device when the concentration of the fine particles is less than or equal to the second concentration. The second concentration may be a value reduced by a predetermined ratio or value compared to the first concentration.

19 is a flowchart illustrating an embodiment of a method for reducing the concentration of fine particles in air. According to an embodiment, the method for reducing the concentration of fine particles may include supplying liquid to the nozzle (S701) and outputting a current within a predetermined range through the nozzle (S703).

The method for reducing the concentration of fine particles in the air may be performed by a device described herein, for example, a device including a power supply unit, a water storage unit, a water supply unit, a water discharge unit, and a control unit.

The step of outputting a current within a predetermined range through the nozzle (S703) may include the controller outputting a reference current through the nozzle by using a water supply unit and / or a power supply unit. The reference current can have a value within the reference range. The reference range may be determined in consideration of the size of the target region, time for outputting current, and the like. When the apparatus includes a nozzle array, the current applied to individual nozzles can be determined by considering the number of nozzles included in the nozzle array.

For example, a predetermined range of currents can be between tens of μA to hundreds of mA. For example, the range of the predetermined current may range from 100 μA to 10 mA. The range of the predetermined current may be in the range of 2 mA at 500 μA. When the device includes the nozzle array, the control unit may control the power supply so that the current output through the droplets charged in the nozzle array is within a predetermined range. .

As a specific example, when the device includes a single nozzle, a predetermined range of current may be determined within 1 uA to 1 mA. Alternatively, when the device includes a nozzle array, a predetermined range of current may be determined within 10 uA to 10 mA.

2.3.2 Device Management Operations

According to one embodiment, a method for managing a device performing a method for reducing the concentration of fine particles in air may be provided.

The apparatus for reducing the concentration of fine particles in the air described in this specification may perform a method for managing the state of the device or the operation of reducing the concentration of fine particles in the device. The management method of the device described below may be performed by a device described in this specification, for example, a device including a power supply unit, a water storage unit, a water supply unit, a water supply unit, and a control unit.

The method of managing the device may be performed using a device having a fine particle reduction mode in which a space charge is formed in a target region by emitting a droplet carrying a charge and a nozzle cleaning mode in which the nozzle is cleaned.

According to one embodiment, the device outputs a droplet having a charge at a low flow rate to form an electric field in a target region in the fine particle reduction mode, and outputs a droplet at a larger flow rate in the nozzle cleaning mode compared to the fine particle reduction mode. The inner surface of the nozzle can be cleaned.

The apparatus described in this specification includes a nozzle, and can discharge droplets charged by the nozzle by applying a high voltage to the nozzle. At this time, due to the high voltage applied to the nozzle, some components included in the liquid may be attached to the inner surface of the nozzle. For example, when a-voltage is applied to the nozzle, a + ion component may be attached to the inner surface of the nozzle. In order to remove the material attached to the inner surface of the nozzle, a method for managing the nozzle, etc. may be provided.

20 is a flowchart illustrating an embodiment of a method of managing a device for reducing the concentration of fine particles in air.

Referring to FIG. 20, a method of managing a device includes applying a first voltage to a nozzle (S801), supplying liquid at a first flow rate to the nozzle (S803), and applying a faster than a first flow rate to the nozzle. It may include the step of supplying the liquid at a flow rate (S805).

The step of applying a first voltage to the nozzle (S801) may include the controller providing a first voltage according to the fine particle reduction mode to the nozzle through a power source. The step of applying a first voltage to the nozzle (S801) may include applying, by the controller, a voltage sufficient to generate droplets that are charged with the nozzle. The first voltage may be a voltage for electric spraying to occur at the discharge port of the nozzle. The step of applying the first voltage to the nozzle may be implemented similarly to the embodiments of the step of applying the voltage to the illustrated nozzle in relation to a method of reducing the concentration of fine particles.

The step of supplying the liquid at the first flow rate to the nozzle (S803) may include supplying the liquid to the nozzle at the first flow rate according to the fine particle reduction mode through the power source. For example, the step of supplying the liquid to the nozzle at a first flow rate may include the control unit supplying the liquid to the nozzle at a flow rate of several μL to several mL per minute through a power source.

The step (S803) of supplying the liquid at a second flow rate faster than the first flow rate to the nozzle may include supplying the liquid to the nozzle at a second flow rate according to the nozzle washing mode through the water supply unit or the pump. The step of supplying the liquid at a second flow rate faster than the first flow rate to the nozzle may include the control part supplying the liquid to the nozzle at a second flow rate for removing foreign matter deposited or attached to the nozzle through a water supply part or a pump. You can. For example, the step of supplying the liquid at the second flow rate may include the control unit supplying the liquid at a flow rate of tens of mL or more per hour through the water supply unit or the pump.

On the other hand, the step of supplying the liquid at a first flow rate to the nozzle (S803) may include supplying the liquid at a first flow rate to the nozzle, and may include supplying the liquid at a second flow rate greater than the first flow rate to the nozzle have.

The nozzle cleaning mode may be initiated when the current value output from the device is less than or equal to a predetermined value, or the amount of liquid discharged per unit time from the device is less than or equal to a predetermined amount.

The device outputs a charged droplet to form an electric field in the target region in the fine particle reduction mode, and the nozzle cleaning mode provides a faster flow rate (or more flow rate than in the fine particle reduction mode) compared to the fine particle reduction mode. By outputting a small current, it is possible to clean the inner surface of the nozzle.

The method of managing the device may further include applying a second voltage less than the first voltage to the nozzle. The method of managing the device may further include stopping applying the voltage to the nozzle.

In the step of supplying the liquid at a second flow rate faster than the first flow rate, in a state in which the control unit applies a second voltage smaller than the first voltage to the nozzle through the water supply unit and the power source, the second flow rate greater than the first flow rate to the nozzle And supplying liquid at a flow rate. The step of supplying the liquid at a second flow rate that is faster than the first flow rate may include stopping the application of power to the nozzle and supplying the liquid at a second flow rate that is greater than the first flow rate.

On the other hand, the device can manage the nozzle while maintaining the formation of an electric field or a space charge in the target region. In other words, even when operating in the nozzle cleaning mode, a voltage can be applied to the nozzle so that a sufficient current is output through the nozzle. The method of managing the nozzle may include managing the nozzle while performing a fine particle reduction function of the device by increasing the flow rate of the liquid supplied to the nozzle while maintaining the current (or the amount of charge output per hour) output from the device. have.

According to another embodiment, the apparatus may include a nozzle washing mode for washing the inner surface of the nozzle by outputting gas through a nozzle through which droplets are output.

The device described in this specification may include an air pump for outputting gas. In some cases, the air pump may be connected to an air nozzle through which gas is output or a nozzle to discharge liquid. The device may provide gas to the nozzle that discharges the liquid through an air pump to clean the inner surface of the nozzle through which the liquid passes.

The method of managing the device includes applying a first voltage to the nozzle, providing a first fluid at a first flow rate (or second flow rate) to the nozzle, and a second flow rate (or second flow rate) to the nozzle. 2 providing a fluid. The second flow rate may be faster than the first flow rate (or, the second flow rate may be greater than the first flow rate).

The step of applying the first voltage to the nozzle can be implemented similarly to the embodiment described above.

The step of providing a first fluid at a first flow rate to the nozzle may include supplying a liquid material at the first flow rate to the nozzle. It may include supplying a liquid substance to the nozzle while the first voltage is applied to the nozzle. The step of providing the first fluid at the first flow rate to the nozzle may be implemented similar to the step of supplying the liquid at the first flow rate to the nozzle described above.

Providing the second fluid at a second flow rate to the nozzle may include providing gas to the nozzle. The step of providing the second fluid at the second flow rate to the nozzle may include supplying gas to the nozzle at a second flow rate according to the nozzle washing mode through the water supply unit or the pump. The step of providing the second fluid at the second flow rate to the nozzle may further include providing the second fluid to the nozzle while the first voltage is applied to the nozzle.

For example, the method of managing the device may further include applying a second voltage smaller than the first voltage to the nozzle. The method of managing the device may further include stopping applying the voltage to the nozzle. In this case, the step of providing the second fluid at the second flow rate to the nozzle may further include providing the second fluid to the nozzle in a state in which a second voltage smaller than the first voltage is applied to the nozzle. The step of providing the second fluid at a second flow rate to the nozzle may further include providing the second fluid to the nozzle while no voltage is applied to the nozzle.

In the above, the method of removing the foreign matter of the nozzle by increasing the flow rate and the method of washing the nozzle using air have been described, but the invention described herein is not limited thereto. For example, in the nozzle cleaning mode, the control unit may clean or manage the nozzle by heating the nozzle, changing the property of the liquid supplied to the nozzle, or changing the property of the voltage applied to the nozzle.

The method of managing the device may include obtaining state information or operation state information of the device, and transmitting the device to the management device. The device can generally be located remote from the management device (or management server). Accordingly, in order for the user or the administrator to recognize whether the internal state of the device or the fine particle reduction operation state of the device is a normal state, information needs to be transmitted to the management device.

The management device may be implemented as an external control device or an external control server. The management device may acquire and store the state information of the device over time and manage it.

21 is a flowchart illustrating an embodiment of a method of managing a device for reducing the concentration of fine particles in air. The method of managing the device may be performed by a device including a sensor unit and a communication unit.

Referring to FIG. 21, a method for managing a device may include a step (S901) of obtaining a state information by the device and a step (S903) of transmitting state information to the management device.

The step (S901) of the device acquiring the state information may include the controller acquiring the state information of each part constituting the device through the sensing unit. The status information may include whether the module constituting the device is normally operated, whether the fine particle reduction operation is normally performed, and the like.

The step of transmitting the status information by the device to the management device (S903) may include transmitting the acquired status information to the external management device by the control unit through the communication unit. The step of transmitting the status information to the management device may include the controller generating a user guide based on the acquired state information and outputting the generated guide to the management device.

Instead of outputting status information to an external management device, the device may output status information through an output unit provided in the device.

2.3.3 Charge density management behavior

As the device continuously releases charge to form space charge, the space charge density near the nozzle of the device can be high. When the space charge density increases around the nozzle, when the same voltage is applied to the nozzle, droplets that are electrosprayed through the nozzle may be reduced. Alternatively, if the spatial charge density increases around the nozzle, the voltage applied to the voltage to output the same current through the nozzle may be increased. In this case, problems such as the space charge not sufficiently covering the target region, the efficiency of the device being reduced, or the discharge generated from the nozzle may occur.

In relation to the above problem, a space charge density around the nozzle, a voltage applied to the nozzle, or a method for managing the amount of current emitted from the nozzle may be provided.

The apparatus for reducing the concentration of fine particles in the air described in this specification may perform an operation for managing the spatial charge density around the nozzle. The method described below may be performed by an apparatus described herein, for example, a device including a power supply unit, a water storage unit, a water supply unit, a water supply unit, and a control unit.

According to one embodiment, the method of managing the spatial charge density around the nozzle includes managing the charge density around the outlet of the nozzle so that the voltage applied to the nozzle does not exceed a threshold to output a current above a reference value can do.

22 is a flow chart for explaining an embodiment of a method for managing the spatial charge density around the nozzle in the air. The method of managing the voltage may be performed by an apparatus including a particle dispersion portion (or gas injection portion).

Referring to FIG. 22, the method of managing the spatial charge density around the nozzle includes applying a high voltage to the nozzle (S1001), supplying liquid to the nozzle (S1003), and dispersing particles (S1005). can do. The step of applying a high voltage to the nozzle (S1001) and the step of supplying liquid to the nozzle (S1001) may be implemented similarly to the embodiments described above.

The step of dispersing the particles (S1005) may include dispersing the charged particles by applying a non-electrical force to the control unit using the particle dispersing unit. The charged particles may include any of droplets discharged from the nozzle, child droplets generated by the droplets splitting, or charges generated from droplets. The step of dispersing the particles may include dispersing the charged particles by applying a non-electric force in a direction away from the discharge port of the nozzle by the control unit using the particle dispersing unit. The step of dispersing the particles may include applying a non-electric force around the discharge port, such that the control unit uses the particle distribution section to lower the charge density around the discharge port of the nozzle. Non-electrical force can mean a physical force that does not have an electrical or magnetic effect on the charges emitted by the device. Near the discharge port, the non-electric force acting on the material charged by the particle dispersing portion may be greater than the electric force acting on the material being charged. In other words, the repulsive force caused by the space charge and the physical force caused by the particle dispersion portion may act on the material having a charge located near the discharge port. At this time, in the vicinity of the discharge port, the magnitude of the physical force by the particle dispersion unit acting on the charged material may be greater than the repulsive force caused by the spatial charge acting on the charged material.

The step of dispersing the particles (S1005) may include the control unit using a gas injection unit, to jet the gas toward the discharge port through which the droplets of the nozzle are discharged. The step of dispersing the particles (S1005) may include the control unit using the gas injection unit to jet the gas in a direction away from the nozzle. The step of dispersing the particles may include the control unit spraying the gas using an air nozzle arranged in a direction parallel to the nozzle from which the droplet is discharged.

2.3.4 Time series control operation

According to an embodiment, in the method of managing the concentration of fine particles, when the device is operated for a predetermined time or more, a method of performing different control over time for effective concentration management of fine particles may be provided. The following method, etc., may be performed by an apparatus described herein, such as a water discharge unit, a water supply unit, a power supply unit, a control unit, and the like, and a device for ejecting fine droplets having a charge.

The device described in this specification releases a droplet carrying a charge, forms a space charge in the target region, charges the fine particles in the target region, and the charged fine particles influence the electric field due to the space charge or space charge. Can be pushed out. The operation or effect of such a device may be sequentially performed over time. In other words, the device may operate differently over time. The device can be controlled differently over time.

23 is a diagram for describing a device control method according to time.

FIG. 23 (a) simply shows the device and the device surroundings immediately after starting the driving of the device or at a point in time after starting the driving of the device.

Referring to (a) of FIG. 23, the apparatus may apply a first voltage V1 to the nozzle to generate a fine droplet FD having a negative charge. The device may supply a material CS that is charged to the target region where the fine particles FP are distributed.

Referring to (a) of FIG. 23, in the vicinity of a point in time at which the device is driven, the total amount of charge emitted from the device is small, and thus the spatial charge density may be formed very low in the periphery or the target region.

FIG. 23 (b) is a simplified view of a device when the device is driven for a predetermined time, for example, a few seconds after the device is driven.

Referring to (b) of FIG. 23, the apparatus may apply a second voltage V2 to the nozzle to generate a fine droplet FD having a negative charge.

Referring to (b) of FIG. 23, when a certain time elapses after driving the device, space charges may be formed around the device and in a target region by charges emitted from the device. At this time, the spatial charge density distribution may be maintained by the charges emitted from the device, and the formed space charge may have a high density around the device and become lower as it moves away from the device. In addition, when a certain time elapses after driving the device, the fine particles in the target region may be at least partially charged. The fine particles can be charged by colliding with a charged material (droplets, child droplets or charge transfer materials).

Fig. 23 (c) simply shows the time when the device is sufficiently driven, for example, the device and its surroundings after several tens of minutes have passed since the device was driven.

Referring to (c) of FIG. 23, the apparatus may apply a third voltage V3 to the nozzle to generate a fine droplet FD having a negative charge.

Referring to (c) of FIG. 23, as the device supplies charge for a sufficient period of time, the space charge formed around the device is maintained, and fine particles in the target region may be pushed out under the influence of the space charge maintained.

Hereinafter, a method for managing the concentration of fine particles and the like will be described with reference to FIGS. 23A to 23C.

24 is a view for explaining a method for managing the concentration of fine particles according to an embodiment. Referring to FIG. 24, the method for managing the concentration of fine particles includes applying a first voltage to a nozzle at a first time and performing a first spray to spray a droplet having a charge (S1101) and a nozzle at a second time It may include the step of applying a second voltage and performing a second spray (S1103) spraying a droplet carrying a charge.

At the first time point, the device and its surroundings may be in the state described with respect to FIG. 23 (a). At the second time point, the device and its surroundings may be in the state described with respect to FIG. 23B.

Applying a first voltage to the nozzle at a first time and performing a first spray to spray a droplet having a charge (S1101), the control unit uses a power supply unit to cause electric spraying at the nozzle end, high voltage to the nozzle It may include applying. In the first point of time, applying the first voltage to the nozzle and performing the first spraying to spray the droplets having a charge (S1101), the control unit uses a power source, and the amount of charge discharged per hour from the nozzle (ie, nozzle current) ) May include applying a first voltage to the nozzle to make the first current or more. The step of performing the first spraying (S1101) may include spraying droplets having a charge so that the amount of charge discharged from the nozzle per hour is the first amount of charge.

Applying a second voltage to the nozzle at a second time and performing a second spray to spray a droplet having a charge (S1103), the control unit uses a power supply unit, at a second time later than the first time, the nozzle It may include applying a second voltage smaller than the first voltage.

Applying a second voltage to the nozzle at a second time and performing a second spray to spray a droplet having a charge (S1103), the control unit uses a power supply unit, at a second time later than the first time, the nozzle It may include applying a second voltage greater than the first voltage. In the step of performing the second spraying, a second voltage greater than the first voltage is applied to the nozzle so that the current output through the nozzle at the second time point is not less than the first current, which is the current output through the nozzle at the first time point. It may include.

Applying a second voltage to the nozzle at a second time and performing a second spray to spray a droplet having a charge (S1103) is discharged by the device in the vicinity of the droplet discharge port at a second time later than the first time It may include applying a second voltage to the nozzle so as to overcome the potential caused by the space charge formed based at least in part on the charged charge and to spray the charged droplet. The second voltage may be greater than the first voltage such that the amount of charge per hour (ie, nozzle current) discharged from the nozzle at the first time point and the second time point is the same.

Applying a second voltage to the nozzle at a second time and performing a second spray to spray a droplet having a charge (S1103), the control unit uses a power supply unit, at a second time later than the first time, the nozzle It may include performing a second spray so that a second current smaller than the first current output from the first time point is output.

The second step of applying a second voltage to the nozzle at the second time point and performing the second spraying to spray the charged droplet (S1103), the control unit using the water outlet, at a second time point later than the first time point, It may include performing a second spray so that the droplets produced by the two sprays move at a faster rate than the droplets produced by the first spray.

The method of managing the concentration of fine particles according to an embodiment includes applying a first voltage to a nozzle in a first time period and performing a first spray to spray droplets having a charge, and a second time period that is later than the first time period. And applying a second voltage to the nozzle in the liver and performing a second spray to spray the charged droplet.

The step of performing the first spray in the first time period may include releasing the first amount of charge. The step of performing the first spraying in the first time period may include discharging droplets having a charge so that the average amount of charge released per unit time through the nozzle during the first time period is the first amount of charge.

The step of performing the second spray in the second time period may include releasing a second amount of charge greater than the first amount of charge. In the step of performing the second spraying in the second time period, the second charge amount is greater than the first charge amount, which is the average discharge charge amount discharged per unit time through the nozzle during the first time period, It may include releasing a droplet that is charged as much as possible.

25 is a view for explaining an embodiment of a voltage applied to a nozzle of a device and a current output from a nozzle at a first time point t1 and a second time point t2.

Referring to FIG. 25, a method of controlling a device may emit a first current I1 through a nozzle at a first time point and a second time point, and apply a first voltage V1 to the nozzle at a first time point. It may include applying a second voltage V2 to the nozzle at two time points.

The control method of the apparatus may include increasing the voltage applied to the nozzle at the second time point than at the first time point to maintain a constant current output through the nozzle at the first time point and the second time point. The control method of the device is to apply a higher voltage at the second time point than at the first time point to the nozzle, in order to overcome a problem such as a decrease in the amount of charge discharged from the device as the charge density around the nozzle increases. It may include.

26 is a view for explaining an embodiment of a voltage applied to a nozzle of a device and a current output from a nozzle at a first time point t1 and a second time point t2.

Referring to FIG. 26, a method of controlling a device includes applying a first voltage V1 to a nozzle at first and second time points, releasing a first current I1 through the nozzle at a first time point, and a second It may include emitting a second current (I2) through the nozzle at the time point.

The control method of the apparatus may include outputting a lower current than the first time point at the second time point in order to maintain a constant voltage applied to the nozzle at the first time point and the second time point. The control method of the device may include maintaining the voltage value so that the voltage applied to the nozzle does not exceed the reference value, but the amount of current output through the device can be maximized.

2.3.5 Feedback control operation

According to an embodiment, a method of controlling a device for managing the concentration of fine particles in air performs feedback control based on information obtained during operation, for example, feedback control changing a control state using the obtained information It may include. The method for controlling the device described below may be performed by the device described in the present specification, for example, a device including a control unit, a water storage unit, a water supply unit, a water supply unit, a power supply unit, a sensor unit, and a gas injection unit. .

27 is a view for explaining a method for managing the concentration of fine particles in the air. Referring to FIG. 27, a method of managing the concentration of fine particles in air includes controlling a device according to a first control condition (S1201), obtaining information (S1203), and a device according to a second control condition It may include the step of controlling (S1205).

Controlling the device according to the first control condition (S1201) may include applying a first voltage to the nozzle of the device by the controller. Controlling the device according to the first control condition (S1201) may include the controller outputting a first current through the nozzle of the device. Controlling the device according to the first control condition (S1201) may include injecting the gas at a first speed through the gas injection unit. Controlling the device according to the first control condition (S1201) may include the control unit discharging the liquid at the first flow rate through the water supply unit.

The step of obtaining information (S1203) may include that the control unit acquires state information of a unit constituting the device using the sensor unit. For example, the step of acquiring information (S1203) may include obtaining a temperature of the nozzle, a voltage applied to the nozzle, the amount of liquid contained in the reservoir, the temperature of the liquid, the power supplied to the device, and the like.

The step of acquiring information (S1203) may include the control unit acquiring operation information related to the operation of the device using the sensor unit. For example, the step of acquiring information (S1203) may include obtaining current emitted from the nozzle, charge density around the nozzle outlet, electric field strength of the target region, charge density of the target region or fine particle concentration of the target region. .

The step of obtaining information (S1203) may include the controller obtaining environmental information about the environment in a specific area. For example, the step of acquiring information (S1203) may include acquiring temperature, humidity, wind speed, air flow, weather, or air pressure of the target area.

The step of obtaining information (S1203) may include the control unit obtaining information from an external device using the communication unit. For example, the step of acquiring information (S1203) may include acquiring environmental information from an external sensor device, an external server, or the like by the controller using a communication unit.

Controlling the device based on the acquired information (S1205) may include controlling the device based on the acquired information.

Controlling the device based on the obtained information (S1205) may include the controller notifying the external device in consideration of the acquired state information or operation information. The control unit may transmit status information or operation information to an external server or an external control device through the communication unit. The control unit may transmit the status information to an external device when the obtained status information or operation information is out of a normal range.

For example, the control unit may obtain state information of a predetermined amount or less of the liquid stored in the water storage unit, and output a notification indicating that the stored water is insufficient to an external device. Or, the control unit, when the power is not properly supplied to the device, or when the voltage applied to the nozzle is out of the appropriate range, the current output from the nozzle is out of the appropriate range, and the like, an external device notification of the device status Can be output as

Controlling the device based on the acquired information (S1205) may include changing, by the control unit, the operating state according to the second condition in consideration of the acquired operating information. When the obtained operation information is different from the predicted operation information, the control unit may control the device according to a second control condition different from the first condition.

For example, controlling the device according to the second condition may include, when the current value output from the nozzle is smaller than the predicted value, the control unit raising the voltage applied to the nozzle higher than the voltage according to the first control condition. Controlling the device according to the second condition may include, when the charge density of the target region is smaller than the predicted charge density, the control unit increasing the current output through the nozzle than the current according to the first control condition.

The control unit may transmit the operation information to the external control device and control the device according to the second control command generated based on the operation information. For example, the control unit transmits the obtained nozzle current value to the external control device, and the external control device generates a second control command by comparing the obtained nozzle current value with the predicted nozzle current value, and the device generates a second control command from the external control device. 2 Obtain a control command, and operate according to the second control command.

Controlling the device based on the obtained information (S1205) may include controlling the device according to the second control condition in consideration of the acquired environmental information. The control unit may control the device according to the second control condition determined differently from the first control condition in consideration of the acquired environmental information.

For example, the controller may control the apparatus by changing control conditions such as the flow rate of the liquid supplied to the nozzle, the voltage applied to the nozzle, and the amount of gas discharged per hour in consideration of the humidity of the target region. When the humidity of the target region is greater than or equal to the reference value, controlling the device according to the second control condition means that the control unit reduces the flow rate of the liquid supplied to the nozzle than the first control condition, or the nozzle It may include increasing the applied voltage or increasing the amount of gas released per hour than the first condition.

As a specific example, the control unit may control the power supply unit according to the environment information. For example, the control unit may control the power supply unit in consideration of temperature information, humidity information, or fine particle concentration in the target region. As a specific example, if the concentration of the fine particles in the target area is the first value, the control unit controls the power source to output the first current through the water extraction unit, and when the concentration of the fine particles in the target area is greater than the first value, the water extraction The power supply unit may be controlled to output a second current greater than the first current through the unit.

Meanwhile, when the device includes an output unit, the step of controlling the device may further include outputting status information obtained by the control unit through the output unit. Outputting the information may include the controller outputting status information, operation information, environment information, etc. of the device in the form of visual information or voice information through a display screen or a speaker.

Meanwhile, the step of obtaining information (S1203) may include obtaining the first information at the first time point and obtaining the second information at the second time point. At this time, in the controlling of the device according to the second control condition (S1205), the control unit compares the first information obtained at the first time point and the second information obtained at the second time point according to the second control condition determined. And controlling the device.

For example, acquiring information (S1203) includes obtaining a first value that is the spatial charge density of the target region at the first time point and obtaining a second value that is the spatial charge density of the target region at the second time point. can do. At this time, if the second value is less than the first value, controlling the device according to the control condition (S1205), the controller applies a second voltage higher than the first voltage applied to the nozzle according to the first control condition to the nozzle It may include applying.

The method of controlling the device may include performing history control based on the obtained information. If the measured value over time is sufficiently secured, history control may be possible. The control unit may perform history control using a time-series change of the measurement value obtained through the sensor unit or the communication unit.

For example, the control unit may acquire external humidity information over time through a sensor unit or a communication unit. The control unit may perform history control using humidity information over time and control information over time. For example, the control unit may obtain a relationship of a control operation (eg, a control command obtained from a user or an external control device) according to a predetermined humidity change pattern based on the accumulated humidity information for each time and control information over time. The control unit may perform a control operation according to the measured humidity value based on the relationship between the humidity change pattern and the control operation.

2.3.6 Examples

2.3.6.1 Third Example

According to an embodiment of the invention described herein, in a method for managing the concentration of fine particles in a target region using a charge supply device, a reservoir (for example, a container) storing liquid, outputting liquid Charge to the target area through at least one nozzle by using a water outlet (for example, at least one nozzle), a water supply unit (for example, a pump) for supplying liquid from a container to at least one nozzle, and a power supply and power supply for supplying electric power A method of managing the concentration of fine particles in a target region using a device including a controller (for example, a controller of a device) for supplying a can be provided. The following method can be performed by various types of devices described herein.

39 is a view for explaining an embodiment of a method for reducing fine particle concentration. Referring to FIG. 39, the method according to an embodiment includes applying a voltage equal to or higher than a first reference value to the nozzle (S1501), supplying liquid to the nozzle (S1503), and applying droplets charged through the nozzle. It may include the step of generating, supplying electric charge to the target region (S1505) and charging the fine particles of the target region, and providing an electric force to the charged microparticles (S1507).

In FIG. 39, the steps are sequentially performed, but this is only for convenience of description, and the order of each step may be changed.

The step of applying a voltage above the first reference value to the nozzle (S1501) may include applying a voltage above the first reference value to at least one nozzle by using a power source by the controller. The controller may apply a negative voltage to at least one nozzle using a power source. With respect to the controller applying a voltage to at least one nozzle using a power source, the contents described in the first embodiment and throughout this specification can be similarly applied.

Step of supplying the liquid to the nozzle (S1503) may include supplying the liquid to the at least one nozzle by the controller using a pump. The step of supplying the liquid to the at least one nozzle may be performed after voltage is applied to the at least one nozzle. For example, the control method of the apparatus may include supplying a liquid after applying a voltage to the nozzle in order to improve stability of a current output through at least one nozzle and stability of a voltage applied to the nozzle.

In step S1505 of generating a chargeable droplet through the nozzle and supplying charge to the target region, the controller generates a droplet charging through the at least one nozzle using a power source and a pump, and the target region It may include supplying a charge to the. With regard to supplying electric charges to the target region, the above-described first embodiment and contents described throughout this specification can be similarly applied.

In the step (S1505) of generating a droplet having a charge through a nozzle and supplying a charge to a target region, the controller applies a voltage to at least one nozzle using a power source, and discharges liquid through the at least one nozzle By doing so, it is possible to generate a droplet that is charged, and to supply charge through the droplet that is charged to the target region.

In the step of generating a droplet having a charge through the nozzle and supplying charge to the target region (S1505), the controller supplies electric charge to the target region by using a power source and spatial charge having the same polarity as the charge supplied to the target region It may include forming a.

The controller may form a negative space charge in the target region by supplying a negative charge to the target region through at least one nozzle using a power source.

In step S1507, the microparticles of the target region are charged and the electric power is supplied to the charged microparticles, the controller forms space charges in the target region, charges the microparticles in the target region, and the charges supplied to the target region. It may include providing an electric force including at least a portion of the directional component away from the device to the fine particles charged with the same polarity as the charge supplied by.

The controller providing electric power to the microparticles may include forming a space charge in the target region to form an electric field between the ground and the device in the target region, and providing electric power to the microparticles through the formed electric field.

The electric force provided to the fine particles may be provided by an electric field due to at least some negative space charge.

With regard to providing the electric force to the charged fine particles, the above-described first embodiment and contents described throughout this specification can be similarly applied.

For example, the controller may use a power source to provide an electric force including the component facing the ground to the fine particles in the target area. The controller may provide electric power in the predetermined direction to the fine particles, thereby providing power to the fine particles. The electric force provided to the fine particles may include a first direction component perpendicular to the ground and / or a second direction component horizontal to the ground.

According to one embodiment, the method for reducing the concentration of fine particles, the controller, by supplying a material having a charge to the target region for a certain period of time or more, so that the charged fine particles receive electric power and move to the ground direction to be removed, space charge It may further include the step of maintaining a predetermined time or more.

The step of maintaining the space charge for a predetermined time or more may include the controller generating a continuously or repeatedly charged droplet through the at least one nozzle using a power source and supplying the charge to the target region.

The time at which the space charge is maintained can be determined based on the target area of the device or the effective radius of the device. For example, the time at which the space charge is maintained can be determined based on the current output from the device and the effective radius of the device.

As a specific example, when the effective radius of the device is the first radius and the current output from the device is the first current, the space charge may be maintained for the first time. At this time, when the effective radius of the device is a second radius smaller than the first radius, and the current output from the device is the first current, the space charge may be maintained for a second time smaller than the first time.

As another specific example, when the effective radius of the device is the first radius and the current output from the device is the first current, the space charge may be maintained for the first time. At this time, when the effective radius of the device is the second radius and the current output from the device is the second current smaller than the first current, the space charge may be maintained for a second time longer than the first time.

2.3.6.2 Fourth Example

According to an embodiment of the invention described herein, in a method for managing the concentration of fine particles in a target region using a charge supply device, a container for storing a liquid, at least one nozzle for outputting a liquid, a container A pump for supplying liquid from at least one nozzle, a power supply for supplying power, a controller for supplying a material that charges a target region through at least one nozzle using a power source, and a non-charged material A method of managing the concentration of fine particles in a target region using a device including a particle dispersing unit that provides electric power may be provided.

The method described below may be performed by an apparatus according to various embodiments described herein. With respect to the following method, contents according to various embodiments described in this specification may be applied.

40 is a view for explaining an embodiment of a method for reducing fine particle concentration. Referring to FIG. 40, in a method according to an embodiment, a step of applying a voltage to a nozzle (S1601), a step of supplying liquid to a nozzle (S1603), generating a charged droplet, and charging the target region It may include the step of supplying (S1605) and providing a non-electric force to the charged material (S1607).

In FIG. 40, for convenience of explanation, each step is sequentially arranged, but this does not limit the invention described by the present specification, and the order of each step may be changed.

The step of applying a voltage to the nozzle (S1601) may include applying a voltage to at least one nozzle by the controller using a power source. The controller may apply a voltage greater than or equal to the first reference value to at least one nozzle by using a power source, and provide electric force in a direction away from the device to fine particles in a target region charged by the supplied charge.

The electric force provided to the fine particles may be provided by an electric field formed by electric charges supplied to at least some target regions. The fine particles in the target region may be charged with the same polarity as the charge supplied by the supplied charge.

Step of supplying the liquid to the nozzle (S1603) may include supplying the liquid to the at least one nozzle by the controller using a pump.

In the step of generating a chargeable droplet and supplying charge to the target region (S1605), the controller generates a droplet with charge through at least one nozzle using a power supply and a pump, and the chargeable liquid And supplying charge to the target region through the enemy. The controller supplying electric charges to the target region may include the controller supplying electric charges to the target region to form a spatial charge that forms an electric field in the target region.

Regarding the step of applying a voltage to the nozzle (S1601), the step of supplying liquid to the nozzle (S1603), and the step of generating a charged droplet and supplying charge to the target region (S1605), Examples 1 to 3 And contents described throughout the present specification may be selectively applied.

In the step S1607 of providing a non-electrical force to the charged material, the controller uses a particle dispersing unit, so that the charged material located near the end where droplets of the nozzle are generated is turned away from the end. -May include providing electrical power. With respect to the step (S1607) of providing a non-electric force to the charged material, the contents described in Example 2 and throughout the specification may be selectively applied.

The step of applying a non-electric force to the charged material (S1607) may further include spraying an electrically neutral material to the charged material to provide a non-electrical force. The particle dispersing unit includes an air nozzle that injects an electrically neutral gas, and the step of providing a non-electric force to the charged material (S1607) is a controller using an air nozzle, from the nozzle to the charged material And providing a physical force that includes a distant direction component.

The controller providing the non-electrical force further includes the controller providing a non-electrical force comprising a directional component away from the one to the charged material, in order to lower the density of distribution of space charges near one end. You can. The controller providing non-electrical force means that the controller provides a non-electrical force to a material carrying a charge near one end in order to reduce the electrical force at which the space charge near one end acts on the liquid at the nozzle end. It can contain.

2.3.6.3 Fifth Example

According to an embodiment of the invention described herein, as a method of managing fine particle concentration using a device for supplying electric charge to a target region, a container for storing liquid, at least one nozzle for outputting liquid, at least one from a container A pump for supplying liquid to the nozzle, a power supply for supplying power, and a voltage applied to at least one nozzle using a power supply to output a liquid charged with charge through at least one nozzle to supply and supply charge to a target region A method for managing the concentration of fine particles using a device including a controller that provides a first electric force in a direction away from the device to the fine particles in the target region charged by the charged electric charge may be provided.

The method described below may be performed by an apparatus according to various embodiments described herein. With respect to the following method, contents according to various embodiments described in this specification may be applied.

41 is a view for explaining an embodiment of a method for managing the concentration of fine particles. Referring to FIG. 41, in a method according to an embodiment, a step of supplying a liquid stored in a container to a nozzle (S1701), at a first time point, applying a first voltage to the nozzle to apply a material that charges the target region In the step of supplying (S1703) and at the second time point, a step of supplying a material having a charge to the target region by applying a second voltage to the nozzle (S1705) may be included.

The step of supplying the liquid stored in the container to the nozzle (S1701) may include the controller supplying the liquid stored in the container to the at least one nozzle using a pump.

At a first time, applying a first voltage to the nozzle to supply a material having a charge to the target region (S1703) applies a first voltage to at least one nozzle by using a power source at one time, at least one It may include supplying a material that is charged through the nozzle of the target region.

The controller supplying a material that is charged at the first time point to the target region may further include a controller supplying a material that is charged with charge to the target region by using a power source to form a space charge in the target region. .

The formed spatial charge may form an electric field in the target region, thereby providing a first electric force to the fine particles in the target region.

The controller may discharge a droplet having a negative charge through the at least one nozzle by applying a negative voltage to the at least one nozzle using a power source. The controller may form a negative space charge in the target region by applying a negative voltage to at least one nozzle using a power source.

At a second time point, the step of supplying a material having a charge to the target region by applying a second voltage to the nozzle (S1705), the controller, at a second time point later than the first time point, the second voltage to the at least one nozzle By applying, it may include supplying a material having a charge through at least one nozzle to the target region.

When the controller supplies a material that is charged at a second time point to the target region, the second electric charge applied to the liquid included in the at least one nozzle is applied to the space in which the controller is formed. It may include maintaining a space charge formed by applying a voltage to a chargeable material to a target region.

The first voltage and the second voltage are greater than a first reference voltage determined to discharge a current equal to or greater than a first current through the at least one nozzle, and an amount of electric charge discharged directly from the at least one nozzle is output through the liquid It may be determined to be less than the second reference voltage determined not to exceed the amount of.

According to one embodiment, when the controller applies the first voltage to the at least one nozzle at the first time point, the first voltage is applied to the at least one nozzle to discharge the first current through the at least one nozzle at the first time point. It may include applying.

In the above embodiment, when the controller applies the second voltage to the at least one nozzle at the second time point, the controller cancels the second electric force acting on the liquid at the second time point and the first current through the at least one nozzle. It may include applying a second voltage greater than the first voltage to the at least one nozzle, so that the second current is not smaller.

The first current can be determined according to the effective radius of the device. The effective radius may be the distance from the device at the point where the concentration of the microparticles is reduced below the reference ratio when the controller releases a charged material for a reference time through the at least one nozzle as a first current. In other words, when the device outputs a constant current for a reference time, the first current may be determined as a current value to be output in order to decrease the reference concentration of the fine particles within a predetermined effective radius.

According to one embodiment, when the controller applies the first voltage to the at least one nozzle at the first time point, the first current is applied through the at least one nozzle at the first time point by applying the first voltage to the at least one nozzle. And releasing.

In the above embodiment, when the controller applies the second voltage to the at least one nozzle at the second time point, the controller may apply the first current through the at least one nozzle corresponding to the second electric force acting on the liquid at the second time point. It may include applying a first voltage equal to the first voltage to the at least one nozzle so that a smaller second current is emitted.

According to an embodiment of the invention disclosed herein, an apparatus for managing the concentration of fine particles may be provided.

For example, in a device for managing the concentration of fine particles using a device for supplying electric charge to a region, a container for storing liquid, at least one nozzle for outputting liquid, a pump for supplying liquid from the container to at least one nozzle , Applying a voltage to at least one nozzle by using a power source for supplying electric power and a power source to output a liquid charged with charge through at least one nozzle to supply electric charges to the target region and charged target region by the supplied charge A device including a controller that provides a first electric force in a direction away from the device to the fine particles of may be provided.

The controller may supply the liquid stored in the container to at least one nozzle using a pump.

The controller may apply a first voltage to the at least one nozzle by using a power source at a first time point, and supply a material having a charge through the at least one nozzle to the target region.

The controller may apply a second voltage to the at least one nozzle at a second time point that is later than the first time point, to supply a material having a charge through the at least one nozzle to the target region.

The controller supplying a material that is charged at the first time point to the target region, the controller further comprises forming a space charge in the target region by supplying the charged material to the target region using power. The supplying of the material that is charged at the second time point to the target region is performed by taking into account the second electric force acting on the liquid included in the at least one nozzle where the space charge is formed by the controller, and applying the second voltage to the at least one nozzle. It may include maintaining a space charge formed by supplying a material with a charge to the target region by applying.

The formed spatial charge may form an electric field in the target region, thereby providing a first electric force to the fine particles in the target region.

2.3.6.4 Sixth Example

According to an embodiment of the invention described herein, as a method of managing fine particle concentration using a device for supplying electric charge to a target region, a container for storing liquid, at least one nozzle for outputting liquid, at least one from a container A pump for supplying liquid to the nozzle, a power supply for supplying power, and a voltage applied to at least one nozzle using a power supply to output a liquid charged with charge through at least one nozzle to supply and supply charge to a target region A method for managing the concentration of fine particles using a device including a controller that provides a first electric force in a direction away from the device to the fine particles in the target region charged by the charged electric charge may be provided.

The method described below may be performed by an apparatus according to various embodiments described herein. With respect to the following method, contents according to various embodiments described in this specification may be applied.

The method of managing the concentration of fine particles according to an embodiment may include outputting a first current to a target area through a nozzle and outputting a second current greater than a first current to the target area through a nozzle. .

At this time, outputting the first current includes outputting the first current at the first time point, and outputting the second current includes outputting the second current at a second time point that is later than the first time point. You can. Alternatively, the step of outputting the first current includes outputting the first current in the first time period, and the step of outputting the second current outputs the second current in the second time period that is later than the first time period. It may include. Hereinafter, a method including outputting the first current and / or the second current at a predetermined time interval or time will be described with reference to some embodiments.

42 is a view for explaining an embodiment of a method for managing the concentration of fine particles. Referring to FIG. 42, the method according to an embodiment includes supplying a liquid stored in a container to a nozzle (S1801), and outputting a first current to a target area through the nozzle in a first time period (S1803) And outputting a second current to the target region through the nozzle in the second time period (S1805).

The step of supplying the liquid stored in the container to the nozzle (S1801) may include the controller supplying the liquid stored in the container to the at least one nozzle using a pump.

In the first time period, the step of outputting the first current to the target region through the nozzle (S1803), the controller outputs the first current in the first time period through at least one nozzle using power. It may include.

The step of outputting the first current through the nozzle to the target region in the first time period (S1803) may include outputting the first charge amount per unit time in the first time period. In the first time period, the step of outputting the first current through the nozzle to the target region (S1803), the controller supplies a material with charge through at least one nozzle using power to form a space charge in the target region. It may include.

The formed spatial charge may form an electric field in the target region, thereby providing a first electric force to the fine particles in the target region.

In the second time period, the step of outputting the first current to the target region through the nozzle (S1805), the controller, using the power, in the second time period after the first time period, through at least one nozzle And outputting a second current per unit time.

In the step of discharging the second current in the second time period, the space charge is applied to the target region by outputting a second current different from the first current in consideration of the electric force of the formed space charge to the liquid supplied to the at least one nozzle. And maintaining.

According to one embodiment, when the controller outputs the first current through the at least one nozzle in the first time period, the controller applies a first voltage to the at least one nozzle, thereby applying a first reference from the at least one nozzle. It may further include outputting a first current greater than the current.

In the above embodiment, the controller outputs the second current through the at least one nozzle in the second time period, the amount of charge that the controller discharges directly from the at least one nozzle is the amount of charge output through the liquid. In order not to exceed, it may further include outputting a second current greater than the first reference current through the at least one nozzle.

According to one embodiment, the controller outputs the first current through the at least one nozzle in the first time period, so that the controller is applied with the first voltage to the at least one nozzle in the first time period, the at least one nozzle It may include outputting the first current through.

In the above embodiment, when the controller outputs the second current through the at least one nozzle in the second time period, the controller applies a second voltage greater than the first voltage to the at least one nozzle in the second time period to liquid. It may further include a second electric force acting on and outputting a second current not smaller than the first current.

The first current can be determined according to the effective radius of the device. The effective radius may be the distance from the device at the point where the concentration of the microparticles is reduced below the reference ratio when the controller releases a charged material for a reference time through the at least one nozzle as a first current.

According to one embodiment, the controller outputs the first current through the at least one nozzle in the first time period, by applying a first voltage to the at least one nozzle through the at least one nozzle in the first time period It may include emitting a current.

In the above embodiment, the controller outputs the second current through the at least one nozzle in the second time period, the controller, in response to the second electric force acting on the liquid in the second time period, the at least one nozzle The first voltage may be applied to output a second current smaller than the first current through the at least one nozzle.

The controller may release a droplet having a negative charge through the at least one nozzle by applying a negative voltage to the at least one nozzle. The controller may discharge a negative charge through the at least one nozzle by applying a negative voltage to the at least one nozzle. The controller may form a negative space charge in the target region by applying a negative voltage to at least one nozzle.

According to an embodiment of the invention disclosed herein, an apparatus for managing a fine particle concentration using an apparatus for supplying electric charge to a target region may be provided.

The apparatus includes a container for storing liquid, at least one nozzle for outputting the liquid, and a pump for supplying the liquid from the container to the at least one nozzle;

A power supply that supplies electric power and a voltage applied to the at least one nozzle using the power supply to output a liquid charged with charge through at least one nozzle to supply electric charges to the target region and charge by the supplied charge It may include a controller that provides a first electric force in a direction away from the device to the fine particles in the target area.

The controller supplies a liquid stored in the container to the at least one nozzle by using a pump, and outputs a first current in a first time period through the at least one nozzle by using a power source. A second current per unit time may be output through the at least one nozzle in a second time period that is later than the first time period by using a power source.

The controller outputs the amount of the first charge per unit time in the first time period, wherein the controller supplies the material carrying the charge through the at least one nozzle by using the power source to provide space charge to the target region It may include forming a.

The controller, in the step of releasing the second current in the second time period, taking into account the electric force applied to the liquid supplied to the at least one nozzle by the formed space charge, the second different from the first current And outputting a current to maintain the space charge in the target region.

The formed space charge may form an electric field in the target region, thereby providing the first electric force to the fine particles in the target region.

Outputting a specific current in a specific time period may mean not only outputting a constant current of a specific value during a specific time period, but also outputting a specific average current during a specific time period. The time period described in this specification may mean a sufficiently short time period. For example, the first or second time period may be a minimum time required to measure the output current in the corresponding time period.

The method of managing fine particle concentration described in the sixth embodiment may be applied based on a time point other than a time period.

For example, the method according to an embodiment may include supplying a liquid stored in a container to a nozzle, outputting a first current through the nozzle at a first time point to a target area, and providing a target area through the nozzle at a second time point. And outputting 1 current.

The step of supplying the liquid stored in the container to the nozzle can be implemented similarly to that described above.

The step of outputting the first current to the target region through the nozzle at the first time point may be implemented similarly to the step of outputting the first current to the target region through the nozzle in the first time period (S1803). The step of outputting the first current to the target region through the nozzle at the first time may further include outputting the first current through the nozzle by applying the first voltage to the nozzle at the first time.

The step of outputting the first current to the target region through the nozzle at the second time point may be implemented similarly to the step of outputting the second current to the target region through the nozzle in the second time period (S1805). The step of outputting the second current to the target region through the nozzle at the second time point may further include outputting the first current through the nozzle by applying a second voltage to the nozzle at a second time point that is later than the first time point. .

The first current output at the first time point and / or the second current output at the second time point may be greater than the first reference current or less than the first reference current. For example, the first current and / or the second current may be determined to be a lower limit value that is determined in consideration of the target region and the operation time of the device, that is, the first reference current or more. In addition, for example, the first current and / or the second current may be set to an upper limit value that does not directly discharge through the nozzle, that is, less than or equal to the second reference current. The first voltage applied to the nozzle to output the first current and / or the second voltage applied to the nozzle to output the second current may be determined according to the upper and / or lower limits described above.

In the above embodiment, outputting the current at a specific time point may mean outputting an instantaneous current at a specific time point. The value of the current output at a specific point in time can be obtained through the current value measured near the nozzle of the device at a specific point in time.

2.3.6.5 Seventh Example

According to an embodiment of the invention described herein, as a method of managing fine particle concentration using a device for supplying electric charge to a target region, a container for storing liquid, at least one nozzle for outputting liquid, at least one from a container A pump for supplying liquid to the nozzle, a power supply for supplying power, and a voltage applied to at least one nozzle using a power supply to output a liquid charged with charge through at least one nozzle to supply and supply charge to a target region A method for managing the concentration of fine particles using a device including a controller that provides a first electric force in a direction away from the device to the fine particles in the target region charged by the charged electric charge may be provided.

The method described below may be performed by an apparatus according to various embodiments described herein. With respect to the following method, contents according to various embodiments described in this specification may be applied.

43 is a view for explaining an embodiment of a method for managing the concentration of fine particles. Referring to Figure 43, the method according to an embodiment, the step of supplying the liquid stored in the container to the nozzle (S1901), by supplying a material that charges the target region, to form a distribution of space charges in the target region Step S1903 and supplying a material having a charge to the target region may include the step of maintaining the distribution of the space charge in the target region for a first time (S1905).

The step of supplying the liquid stored in the container to the nozzle (S1901) may include supplying the liquid stored in the container to the at least one nozzle by using a pump. For the step of supplying the liquid stored in the container to the nozzle (S1901), the contents of the above-described embodiments may be similarly applied.

In the step of forming a distribution of space charges in the target region by supplying a material having a charge to the target region (S1903), the controller applies a voltage to the at least one nozzle using a power source, thereby subjecting the target through at least one nozzle. It may include forming a distribution of space charges in the target region by supplying a material having a charge to the region.

The controller may apply a negative voltage to the at least one nozzle to supply negative charge to the target region through the at least one nozzle, and form a spatial charge including negative charge in the target region.

In the step of maintaining a distribution of the space charge in the target region for a first time by supplying a material having a charge to the target region (S1905), the controller applies a voltage to at least one nozzle by using a power source and applies at least one nozzle to the voltage. The method may include maintaining a distribution of space charges in the target region for a first time by supplying a material having a charge to the target region through the nozzle.

When the controller supplies a material that is charged at a second time point to the target region, the second electric charge applied to the liquid included in the at least one nozzle is applied to the space in which the controller is formed. And applying a voltage to supply a charged material to the target region to maintain the spatial charge formed,

The formed spatial charge may form an electric field in the target region, thereby providing a first electric force to the fine particles in the target region. The first electric force may mean an electric force provided by the space charge formed by the device to charged fine particles in the target region. The first electric force may act on the fine particles in a direction away from the device.

According to one embodiment, forming the distribution of the space charge in the target region, the controller applies a first voltage to the at least one nozzle by using a power source, and outputs a droplet having a charge through the at least one nozzle And forming a space charge in the target region.

In the above embodiment, the controller maintains the distribution of the space charge in the target region, considering that the controller uses a power source and the formed space charge acts on the liquid included in the at least one nozzle, at least one. The method may include maintaining a space charge in the target region by applying a second voltage greater than the first voltage to the nozzle of, and outputting droplets having a charge through at least one nozzle.

The second electric force means an electric force that the space charge formed in the target region by the device, in particular, the space charge around the nozzle of the device, provides to the liquid in the nozzle (liquid before being separated from the nozzle) or to the charged component in the liquid. You can. For example, when the device supplies a negative charge to the target area, negative space charges may be formed in the target area. At this time, the second electric force may be a repulsive force acting on a material having a negative charge in the nozzle and a negative space charge formed in the target region.

According to one embodiment, the controller to form the distribution of space charges in the target region includes the controller outputting a first current through at least one nozzle using a power source to form space charges in the target region. ,

In the above embodiment, the controller maintains the distribution of the space charge in the target region, the controller using a power source, the space charge formed at least one corresponding to the second electric force acting on the liquid contained in the at least one nozzle And outputting a first current smaller than the first current through the nozzle to form a space charge in the target region.

The first time may be determined according to the effective radius of the device. The effective radius may be the distance from the device at the point where the concentration of the microparticles is reduced below the reference ratio when the controller releases a charged material for a reference time through the at least one nozzle as a first current.

According to an embodiment of the invention described herein, as a device for managing the fine particle concentration using a device for supplying electric charge to the target region, a container for storing liquid, at least one nozzle for outputting liquid, from the container A voltage is supplied to the at least one nozzle by using a pump for supplying the liquid to the at least one nozzle, a power source for supplying power, and a power source to supply electric charges to the target region through the at least one nozzle, and the supplied It may include a controller that provides a first electrical force in a direction away from the device to the fine particles of the target region charged by the charge.

The controller supplies the liquid stored in the container to the at least one nozzle using the pump, and applies the voltage to the at least one nozzle using the power source to apply the voltage to the target through the at least one nozzle. By supplying a material having a charge to a region, a distribution of space charges can be formed in the target region.

The controller may apply a voltage to the at least one nozzle to supply a chargeable material to the target region through the at least one nozzle, thereby maintaining the distribution of space charges in the target region for a first time.

According to the invention described herein, a method, apparatus, or the like for reducing the concentration of fine particles in a target region belonging to various environments can be provided. In this case, the fine particle concentration reducing device may operate in conjunction with other devices (eg, a fine particle concentration reducing device, a control device, other functional devices, etc.).

2.4 Outdoor fine particle concentration reduction system

2.4.1 Outdoor installation

According to an embodiment of the invention described herein, the operation of reducing the concentration of fine particles may be used to lower the concentration of fine particles in an outdoor space.

In the present specification, the outdoor space may mean a space having substantially the same environmental conditions as the atmosphere. The outdoor space described in this specification may be understood to correspond to an outdoor space when the effects of temperature, humidity, and wind act in the same way as in the air, even in the case of a space surrounded by structures such as some wall ceilings. .

The operation of reducing the concentration of fine particles described in this specification may be performed by an apparatus installed in an outdoor space. The device installed in the outdoor space can reduce the fine particle concentration in the outdoor target area. For example, the apparatus described in this specification is installed in an apartment complex, a playground, an outdoor performance hall, a school, an industrial park, a park, etc., so that the concentration of fine particles can be reduced.

2.4.2 Single device system

28 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein. Referring to FIG. 28, a system for reducing fine particles according to an embodiment may include a first device, a second device, a server, and a user device.

The first device may be a device for reducing fine particle concentration described herein. The first device may be a device for reducing the concentration of fine particles to reduce the concentration of fine particles in a target region.

The first device can communicate with the server. The first device may receive a control command from the server and operate based on the received control information. The first device may receive environmental information from the server, and the first device may receive control information determined according to the environmental information from the server and operate based thereon. The first device may transmit device information to the server. The first device may transmit device information to the server. For example, the first device may transmit status information or operation information to a server.

The first device may communicate directly with the second device. The first device may obtain information (eg, environmental information) from the second device and operate based on the obtained information.

The first device has a sensor unit, and can acquire status information, operation information, or environmental information.

The second device may be a device that performs a different function from the first device. The second device may be a device installed in or around the target area of the first device. For example, the second device may be a sensor device that acquires environmental information in a target area or a device vicinity corresponding to the first device.

The second device may include a sensor unit and obtain environmental information of a target area or a device nearby. For example, the second device may acquire charge density, humidity, temperature, or weather information of the target region. Alternatively, the second device may acquire charge density, humidity, or temperature information around the first device.

The second device may transmit environmental information to the first device, the user device, or the server. The second device may transmit environment information in response to the request of the first device or the server.

The fine particle concentration reduction system may include a plurality of sensor devices (i.e., the second device in FIG. 28).

For example, the fine particle concentration system may include a first sensor device positioned at a first distance from the first device and a second sensor device positioned at a second distance from the first device. Alternatively, the system may include a first sensor device spaced a first distance from the ground and a second sensor device spaced a second distance from the ground. The system may include a first sensor device that acquires first information and a second sensor device that acquires second information. In one example, the first sensor device acquires a spatial charge density or a concentration of fine particles at a first distance from the first device, and the second sensor device a spatial charge density at a second distance from the first device. Alternatively, it is possible to obtain a concentration of fine particles. According to an embodiment, the first information and the second information may be distinguished from each other. For example, the first sensor device may acquire charge density and concentration of fine particles on the ground, and the second sensor device may acquire weather information such as temperature, humidity, air pressure, and wind at a location tens of meters away from the ground. .

The server may manage the operation of reducing the fine particle concentration of the first device. The server can store programs or data and communicate with external devices. The server may be a cloud server. The server may communicate with devices not shown in FIG. 27.

The server can store device information.

The server may store first device identification information for identifying the first device. The server may store first location information for identifying a location where the first device is installed. The server may store first installation environment information regarding characteristics of the installation environment of the first device. For example, the server may store first installation environment information indicating whether the location where the first device is installed is indoor or outdoor, or whether the location where the first device is installed is a residential or industrial complex.

The server can communicate with the first device, the second device and / or the user device. The server may mediate the user device and the first device and / or the second device. The server may store information obtained from the first device or the second device or deliver the information to the user device.

For example, the server may obtain status information or operation information of the device from the first device. The server may deliver status information or operation information obtained from the first device to the user device. The server may deliver the guide message generated based on the status information or operation information obtained from the first device to the user device.

As another example, the server may obtain environment information of the target area or the first device from the second device. The server can deliver the acquired environmental information to the user device. The server may deliver the guide message generated based on the acquired environment information to the user device.

As another example, the server may obtain control information or control commands for the first device and / or the second device from the user device. The server may transmit control information or control commands obtained from the user device to the first device or the second device. The server may identify a destination based on the control information or control command obtained from the user device, and transmit the control information or control command to the identified destination.

As another example, the server may obtain status information or operation information from the first device. The server may transmit control information or control commands generated based on the obtained information to the second device. The server can obtain environmental information from the second device. The server may transmit control information or control commands generated based on the environment information to the first device.

The server may control the fine particle concentration reduction system to manage the fine particle concentration in the target region. The server may generate a control command that controls the device or control information that is the basis of the control command.

The server may store programs, applications, web applications, web pages, etc. (hereinafter referred to as applications) for managing the fine particle concentration. The server may generate control information or control commands through an application. Through the application, the server may generate control command information or control commands that cause the first device to perform a fine particle concentration reduction operation, a device management operation, a charge density management operation, a time series control operation, and / or a feedback control operation.

The server may generate control information or control commands for controlling the first device or the second device. The server may generate control information or control commands based on information obtained from the first device, the second device, or the user device.

The server may generate control information or control commands for controlling the first device based on the information obtained from the first device. For example, the server may obtain status information or operation information of the device from the first device, and generate control information or control commands in consideration of the obtained information. As an example, the server may obtain status information regarding the amount of water discharged from the nozzle of the device, and when the amount of water discharged is less than the reference value, the server may generate a control command to initiate the nozzle cleaning mode.

The server may generate control information or control commands for controlling the first device based on the information obtained from the second device. For example, the server may generate a control command that obtains the charge density of the target region from the second device and applies a voltage higher than the default value to the nozzle of the first device when the charge density is below a reference value.

The server may acquire control information and generate a control command based on the control information. For example, the server may obtain first control information for the first device from the user device, and generate a first control command based on the first control information. The server may obtain control information for the first target area from the user device and generate a first control command for controlling the first device corresponding to the first target area. As a specific example, the server obtains control information including a target particle concentration reduction level of the target area, and based on the control information, a control value for controlling the device, for example, a control including nozzle applied voltage, gas discharge amount, etc. You can generate commands.

The server may transmit control information or control commands to the first device or the second device.

For example, the server may transmit control information to the first device so that the first device generates a control command based on the control information and operates according to the control command. Alternatively, the server may transmit control information to the first device so that the first device operates according to a control command.

As another example, the server may transmit control information to the second device so that the second device generates a control command based on the control information and operates according to the control command. Alternatively, the server may transmit control information to the first device so that the second device operates according to the control command. For example, the server may transmit a control command to the second device to control the second device to acquire environmental information of the target area.

The server can store the acquired information. The server may store information obtained from the first to second devices, control information generated by the server, control commands, control information obtained from user devices, and / or control commands.

The server may store information obtained from the first device or the second device.

The server may store status information, operation information, and the like of the first device obtained from the first device. The server may store environment information or the like obtained from the second device. The server may store information obtained from the first device or the second device together with the time point of acquiring the information. For example, the server may store the temperature information of the target area obtained from the second device together with the time when the second information measures the temperature or the time when the server acquires the temperature information from the second information.

The server may store control information generated by the server, control commands, or control information obtained from a user device or control commands. For example, the server may store the first control information and the first control command for the first device together with the information of the first device.

The server can match and store and manage heterogeneous information.

The server may store information obtained from each device in association.

For example, the server may store information obtained from the first device in association with environment information obtained from the first area. The server may store and store the nozzle state information of the device obtained from the first device and the charge density information of the target region obtained from the second device.

The server may store information obtained from the device in association with a control command.

For example, the server may store information obtained from the first device in association with a first control command (or first control information) for the first device. As a specific example, the server may associate and store the first state information obtained from the first device and the first control command generated based at least in part on the first state information.

As another example, the server may store the environment information obtained from the first device or the second device in association with a control command. The server may store the first environment information obtained from the target area where the first device is located and the first control command generated based at least in part on the first environment information.

The server may provide a control command to the first device using the matched information.

The server may predict the second information according to the first information by using a database in which the first information and the second information are stored. The server predicts a change with time of the second information based on a change with time of the first information, using a database in which a change pattern with time of the second information according to a change pattern with time of the first information is stored. You can. The server may predict the second information using a logic algorithm or a neural network model.

The server uses the database stored in association with information obtained from the first device and a control command for the first device (eg, a control command for the first device obtained from the user device), to the information obtained from the first device. Based on this, a control command can be generated.

The server uses information stored from the second device by using a database in which environment information obtained from the second device and a control command for the first device (eg, a control command for the first device obtained from the user device) are stored in association. Based on the control command can be generated.

The server may predict the second information based on the first information obtained from the first device or the second device, and generate a control command according to the second information. For example, the server predicts the operation information (eg, the amount of current output) of the device based on the environment information (eg, humidity information) obtained from the first device or the second device, and controls commands according to the predicted motion information (E.g., a control command related to the nozzle voltage).

On the other hand, in FIG. 28, although the server is illustrated on the basis of a separate physical device, the server may be included in the first device. For example, the first device may include a server and perform the above-described operation of the server. In other words, the first device stores information obtained from the first device and / or the second device, communicates with the user device, transfers the information to the user device, obtains control information from the user device, and operates the first device It is possible to perform the operation of the above-described server device, such as generating or managing control commands for and controlling operation of the first device.

The user device may acquire user input and communicate with each device of the server or the fine particle concentration reduction system to manage the fine particle concentration in the target area.

The user device may drive a program, application, web application, web page, etc. (hereinafter referred to as an application) for managing the fine particle concentration. The user device may provide information obtained from the first device or the second device to the user through the application, and obtain user input information.

The user device may include a display unit and / or an input unit. The user device may provide information obtained from the first device, the second device, and / or the server to the user through the display unit. The user device may obtain information related to the operation of the first device or the second device from the user through the input unit.

The user device can provide a user interface. The user device may acquire user input through a user interface and provide information obtained from the first device, the second device, or the server to the user.

The user device can communicate with the server device, the first device, and / or the second device. The user device communicates with the first device, the second device, and / or the server to obtain environment information such as device status information, device operation information, or a target area.

The user device can generate a control command. The user device may acquire control information and generate a control command based on the control information. For example, the user device obtains a nozzle output current value for the first device or a radius R value of a target area for the first device from the user through a user interface, and based on the obtained value, a control command, for example, a nozzle applied voltage And a control command including the like.

The user device may transmit the generated control command to the server, the first device, or the second device.

29 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein.

Referring to FIG. 29, the fine particle reduction system, the fine particle reduction system may include an apparatus 100 for managing the concentration of fine particles. The device 100 may emit droplets having a negative charge, thereby forming a negative space charge around the device.

Referring to FIG. 29, the device 100 may be installed on an object or structure OB. The installation location of the device may be determined in consideration of the space charge formed by the device 100 and the shape of the electric field thereby. The device 100 may be installed such that an area in which the device forms space charges covers an area in which concentration of fine particles is required to be reduced. For example, the device may be installed on a rooftop or outdoor structure of a building. When the device is installed on the structure OB, an insulating material may be used as needed. With respect to the installation method of the device, it will be described in more detail in the Device Installation Method section described later.

The device 100 can have an effective radius R. The effective radius may mean the radius of the target area TR of the device 100. The effective radius may mean a radius of a region in which the device can reduce the concentration of fine particles within a reference time by a reference ratio.

The device may have a dome-shaped target area TR. The target area TR may mean an area in which the device can reduce the concentration of the fine particles within a reference time by a reference ratio. The target area TR may be determined according to the height H and the effective radius R from the ground of the device. The shape of the target area TR of the device may be changed according to environmental factors. For example, when there is wind in the target area, it may have a dome shape biased along the direction of the wind.

The device may be installed at a position spaced apart from the ground (H). The height (H) or effective radius (R) from the ground of the device can be determined taking into account the operating efficiency of the device. The device can be installed in a position spaced apart from the ground by a predetermined ratio with respect to the effective radius R. For example, the device may be installed at a position spaced apart from the ground by a height H having a value between 1/2 and 2 times the effective radius R. For example, a device having an effective radius of 30m may be installed at a position 50m away from the ground.

Referring to FIG. 29, the system for reducing fine particles according to an embodiment may include a sensor device SD installed in a target area. The sensor device SD may be installed at one position in the target area TR. For example, the sensor device SD may be installed at a position spaced apart by an effective radius R from the point where the device (or the structure on which the device is installed) is located. As another example, the sensor device SD may be located near the device.

The sensor device may acquire environmental information of the target area TR. For example, the sensor device may acquire environmental information including any one of temperature, humidity, air pressure, air flow (eg, wind speed), air quality (eg, concentration of fine dust), and density of space charges within the target area. have. The sensor device may acquire environmental information at a location where the sensor device is installed. The sensor device may acquire environmental information and transmit the fine particle concentration reduction device to a server or a user device.

Meanwhile, the fine particle reduction system may include a plurality of sensor devices. For example, the fine particle abatement system is installed at a first distance from the device 100 and is installed at a second distance from the device 100 and the first sensor device and the first sensor device to obtain the second information. It may also include a second sensor device. The first information and the second information may be at least partially divided.

The first sensor device may be installed at a position spaced apart from the first distance from the ground GND. The second sensor device may be installed at a position spaced apart from the second distance from the ground GND. At this time, either the first distance or the second distance may be substantially the same as the height H at which the device is installed.

As an example, the first sensor device may obtain a space charge density or a concentration of fine particles at a position spaced apart from the device 100 by an effective radius R of the device. The second sensor device can obtain the spatial charge density in the vicinity of the device 100. As another example, the first sensor device acquires charge density and concentration of fine particles on the ground (GND), and the second sensor device temperature, humidity at a location tens of meters away from the ground (e.g., between H and 2H), Weather information such as air pressure and wind can be obtained.

The fine particle reduction system according to an embodiment may include a fine particle reduction device and a sensor device illustrated in FIG. 29. In addition, although not shown in FIG. 28, the fine particle abatement system further includes a server device and a user device, and may operate as described above with reference to FIG. 27.

29 to 32 are diagrams for explaining the operation of the fine particle concentration reduction system according to an embodiment of the present specification. 29 to 32, the system for reducing the concentration of fine particles can reduce the concentration of fine particles in the target region TR.

Referring to FIGS. 29 to 32, the system for reducing fine particle concentration may include a device 100 and a sensor device SD installed at a predetermined height H from the ground GND. Device 100 may have an effective radius R. The device 100 may be installed at a predetermined height (H). The fine particle concentration reduction system described with reference to FIGS. 29 to 32 can be constructed and operated similarly to the fine particle concentration reduction system described with reference to FIG. 28 unless otherwise specified.

Referring to FIG. 30, the device 100 may provide a material CS having a charge. For example, the device 100 may emit a negatively charged droplet. The device 100 may emit a negatively charged droplet, thereby providing a material CS that is charged into the atmosphere.

The device 100 may output a current within a predetermined range. The apparatus 100 may operate such that the amount of charge output per hour through the nozzle (or nozzle array) is within a predetermined range. For example, the device 100 may output a current between 100 μA and 10 mA through the nozzle. The device can output a first current.

The device 100 may initiate the release of a substance that is charged when the concentration of the fine particles FP in the target region TR is the first concentration. The first concentration may be the initial concentration of the fine particles (FP).

Referring to FIG. 30, the sensor device SD may acquire environmental information. For example, the sensor device SD may obtain temperature, humidity, air pressure, wind speed, wind direction, concentration of fine particles, or charge density. The sensor device SD may start acquiring environmental information in response to the device 100 initiating an operation. According to an embodiment, the sensor device SD may acquire environmental information and transmit it to the server or the device 100.

According to an embodiment, the device 100 may start driving based on environmental information obtained from the sensor device SD. For example, when the concentration information of the fine particles exceeding the reference value is obtained from the sensor device SD, it is possible to initiate the discharge of charged droplets.

The device 100 may operate based on environmental information obtained from the sensor device SD. For example, the device 100 provides physical quantity determined based on environmental information obtained from the sensor device SD, for example, environmental information such as humidity, temperature, air temperature, air pressure, and wind speed, for example, a voltage applied to the nozzle or a nozzle It can operate according to the flow rate (or flow rate) of the liquid, and the hourly discharge amount of the gas. As a specific example, when the humidity information acquired by the sensor device SD is higher than a reference value, the device 100 may apply a voltage higher than a default value to the nozzle.

Referring to FIG. 31, the system for reducing the concentration of fine particles may form a space charge in the target region TR.

Referring to FIG. 31, the device 100 may continuously or repeatedly output a droplet carrying a charge. The device 100 may continuously or repeatedly output a droplet carrying a charge, thereby forming a space charge in the target region TR. The device 100 has the highest charge density in the vicinity of the device (eg, near the outlet of the nozzle), and may form a space charge having a lower charge density as it moves away from the device 100.

The space charge formed can form an electric field. According to an example, the equipotential lines (EPL) and electric force lines (EFL) of the electric field formed by the device 100 may be formed as illustrated in FIG. 30. Referring to FIG. 30, the electric force line formed by the device 100 may be formed in a direction from the ground toward the device.

The device 100 may continuously or repeatedly output a droplet carrying a charge to charge at least a portion of the fine particles FD in the target region TR. For example, the fine particles FD in the target region TR may have a negative charge under the influence of the space charge formed by the device. The charging of the fine particles may be performed by charging due to electrons moving by the electric field colliding with the fine particles (Diffusion charging) by random motion of charge.

The apparatus 100 may supply a sufficient amount of electrons to the target region for charging of fine particles. The device 100 may supply electrons of tens to hundreds of thousands of fine particles to the target region. The number of electrons supplied by the device can be determined according to the effective radius of the device and / or the power supplied.

Here, an example will be described on the basis of the case where the ultrafine dust of PM2.5 or less is 35 μg / m ³ . The apparatus 100 may supply electrons 100,000 times or more the number of fine particles to the target region TR. In the case of 35 μg / m ³ of ultra-fine PM2.5 or less, 2.67 ultrafine particles per 1 cm ³ may be present. At this time, when the supply power of the device is 1kW, 286,000 charged particles may be supplied. Among them, 638 charges attached to fine dust can be calculated. 239 electrons are attached to each particle of fine dust, so the fine dust can take a negative charge. For example, if the device maintains an operating state for outputting 286,000 charged particles per unit time for 1 hour, the concentration of fine particles in a target region within a radius of 30 m from the device may be reduced by 90% or more. In other words, a device having an effective radius of 30 m can operate at a supply power of 1 kW in an environment in which ultra-fine dust of PM2.5 or less is 35 μg / m ³ .

The sensor device SD may acquire environmental information according to the operation of the device. For example, the device 100 may obtain a charge density value at a location of a target region according to the operation of the device. The sensor device SD may obtain a change in the charge density value at one position of the target area according to the operation of the device. The sensor device SD may acquire the charge density value of the device and transfer it to the server or device 100.

The device 100 may change an operating state based on environmental information obtained from the sensor device SD. For example, when the charge density value measured by the sensor device SD is smaller or larger than the predicted value, the device 100 may increase or decrease the output current.

Referring to FIG. 32, the system for reducing the concentration of fine particles can provide power to the fine particles FP in the target region TR.

Referring to FIG. 32, the device 100 continuously or repeatedly releases a droplet carrying a charge, thereby maintaining a spatial charge distribution in the target region TR at a predetermined level or more. The system for reducing the concentration of fine particles may form space charges in the target region TR and provide electric force to the fine particles FP charged through the space charges, thereby enabling the fine particles FP to behave. The system for reducing the concentration of fine particles may form an electric field in the target region TR, and provide electric force to the fine particles FP charged through the electric field.

The device 100 may push at least a portion of the fine particles FP in the target area TR. The device may maintain the space charge in the target region TR such that the fine particles FP are powered and away from the device 100. The device 100 is sufficiently pushed for the fine particles FP in the target area TR to be pushed out under the influence of the space charge, and the concentration of the fine particles FP in the target area TR is reduced below a reference value. It is possible to output droplets that are continuously or repeatedly charged.

For example, as the space charge and electric field are maintained by the device 100, the charged fine particles FD in the target region may receive electric force in a direction away from the device 100. The fine particles FP may be subjected to a ground direction component force under the influence of electric force. The fine particles FP may move in a direction away from the device under the influence of electric force. The fine particles FP may move outside the target region under the influence of electric force. For example, the fine particles FP may move in a direction away from the target device along the electric field line EFL of the electric field formed by the device 100. As the fine particles FP move in a direction away from the device, the concentration of fine particles in the target region TR may be reduced.

Referring to FIG. 32, the sensor device SD may acquire environmental information of the target area TR according to the operation of the device. The sensor device SD may acquire a change in environmental information according to the operation of the device.

The sensor device SD can acquire the charge density of the target region. For example, the sensor device SD may acquire the concentration of fine particles in the target region. The sensor device SD may transmit environmental information or changes in environmental information to the device 100, a server, or a user device.

The device 100 may change an operating state based on information obtained from the sensor device SD. When the concentration of the fine particles FP obtained in the sensor device SD is less than or equal to a reference value, the device 100 may stop the operation or reduce the output current value. Alternatively, when the concentration of the fine particles FP obtained from the sensor device SD is greater than or equal to a reference value, the device 100 may increase the amount of current output.

 Referring to FIG. 33, the system for reducing the concentration of fine particles may remove fine particles FP in the target region TR.

Referring to FIG. 33, the device 100 continuously or repeatedly releases droplets with charge, thereby maintaining the distribution of the space charge in the target region TR and the formation of an electric field. The apparatus 100 may maintain the state of formation of the electric field for a sufficient period of time such that charged particles move in the direction of the ground, contact the ground, lose charge and settle.

For example, as the space charge and electric field formed by the device 100 are maintained, the fine particles FP in the target region TR may move toward the ground GND under the influence of electric force. As the space charge and the electric field are maintained for a sufficient time, the fine particles FD may move along the electric force line EFL, and may contact the ground GND to lose charge. As the fine particles FD are attached to the ground, the concentration of the fine particles FP in the target region TR may be reduced.

Referring to FIG. 33, the sensor device SD may acquire environmental information, for example, a change in the concentration of fine particles or a concentration of fine particles in the target region TR. Referring to FIG. 32, the sensor device SD may acquire a concentration of fine particles and transmit it to the device 100, a server, or a user device.

The device 100 may change an operating state according to environmental information obtained from the sensor device SD. For example, when the concentration of the fine particles obtained from the sensor device SD is below a reference value, the device 100 may stop the operation or reduce the output current value. When the concentration of the fine particles FP obtained from the sensor device SD is higher than the reference value or higher than the reference value, the apparatus 100 may resume emission of the current or increase the emission current.

2.4.3 Multiple device systems

According to an embodiment, the microparticle reduction system may include a plurality of microparticle concentration reduction devices.

34 is a view for explaining a fine particle reduction system according to an embodiment of the present invention described herein.

Referring to FIG. 34, a system for reducing fine particles according to an embodiment may include a first device, a second device, a third device, a server, and a user device. Hereinafter, each of the first device and the second device may operate similar to that described above with respect to the first device of FIG. 28. The user device and the server may also operate similarly to those described with reference to FIG. 28, and the third device may operate similar to that described with respect to the second device in FIG.

The first device and the second device may be a device for reducing the concentration of fine particles for reducing the concentration of fine particles in a target region described herein. The first device may be a device for reducing the concentration of fine particles to reduce the concentration of fine particles in the first target region. The second device may be a device for reducing the concentration of fine particles to reduce the concentration of fine particles in the second target region. The first target region and the second target region may be at least partially different. Each of the first device and / or the second device includes a sensor unit, and may acquire status information, operation information, or environmental information.

The third device may be a device having at least some other function than the first device or the second device. For example, the third device may be a sensor device having one or more sensor units. The third device may be a sensor device that acquires environmental information and delivers it to the first device, the second device, the server, and / or the user device.

For example, the third device may be a sensor device that obtains first environment information for a first target area corresponding to the first device and / or second environment information for a second target area corresponding to the second device. . The third device may acquire environmental information around the first device and / or the second device. For example, the third device may acquire charge density, humidity, temperature, or weather information of the first target region and / or the second target region. Alternatively, the third device may acquire charge density, humidity, or temperature information around the first device and / or the second device.

The third device may transmit environmental information to the first device, the second device, and / or the server. The third device may transmit environment information in response to the request of the first device, the second device, and / or the server.

Meanwhile, although only one third device is illustrated in FIG. 34, the fine particle reduction system may include a plurality of third devices, for example, a plurality of sensor devices.

For example, the microparticle concentration reduction system may include a first sensor device corresponding to a first target area of the first device and a second sensor device corresponding to a second target area of the second device. The first sensor device may acquire environmental information of the first target area. The second sensor device may acquire environmental information of the second target area. Each sensor device may be located at a point on the corresponding corresponding area, or may be located near the corresponding device.

As another example, the system for reducing fine particle concentration may include a first sensor device corresponding to a first device and spaced a first distance from the first device, a second sensor device corresponding to a first device and spaced a second distance from the first device, And a third sensor device corresponding to the second device and spaced a third distance from the second device, and a fourth sensor device corresponding to the second device and spaced a fourth distance from the second device. Sensor devices corresponding to each fine particle concentration reducing device may operate similarly to those described above with reference to FIG. 27 and the like.

The server can manage the operation of reducing the fine particle concentration of the first device and the second device. The server can store programs or data and communicate with external devices. The server may be a cloud server. The server may communicate with devices not shown in FIG. 33.

The server can communicate with the first device, the second device, the third device and / or the user device. The server may mediate the user device and the first device, the second device, and / or the third device.

The server can store device information.

The server may include first device identification information for identifying the first device, first location information for identifying a location where the first device is installed, and / or first installation environment information regarding an installation environment characteristic of the first device, such as a server May store first installation environment information indicating whether the location where the first device is installed is indoor or outdoor, or whether the location where the first device is installed is a residential or industrial complex. The server may store second device identification information, second location information, second installation environment information, and the like for the second device.

The server may store information obtained from the first to third devices or deliver the information to the user device.

For example, the server may obtain the first status information or the first operation information from the first device, store it or deliver it to the user device. For example, the server can obtain the amount of liquid stored in the device from the first device, store it or deliver it to the user device. The server may store the information obtained from the first device together with the identification information of the first device, or deliver the identification information of the first device to the user device. Alternatively, the server may obtain the second status information or the second operation information from the second device, store it, or deliver it to the user device.

As another example, the server may obtain first environment information for the first target area or second environment information for the second target area from the third device. Alternatively, the server may acquire first environment information obtained in the vicinity of the first device or second environment information obtained in the second target area from the third device. The server may store the second environment information or the second environment information, or transmit it to the user device.

According to an embodiment, when the microparticle concentration reduction system includes a plurality of sensor devices, the server acquires first environmental information from the first sensor device, and acquires second environmental information from the second sensor device One environment information can be stored or delivered to a user device. The server may transmit the first environment information and the identification information of the first device to the user device together. The server may acquire first environmental information from the first sensor device and deliver the first environmental information to the first device or the second device.

The server may deliver the guide message generated based on the acquired environment information to the user device. The server may transmit a guide message including the acquired environmental information and identification information of the corresponding device to the user device.

The server may control a system including a plurality of fine particle concentration reducing devices to manage fine particle concentrations in a plurality of target regions. The server may generate a control command for controlling a plurality of devices or control information that is the basis of the control command, and transmit it to each device.

The server may store programs, applications, web applications, web pages, etc. (hereinafter referred to as applications) for managing the fine particle concentration. The server may generate control information or control commands through an application.

The server may generate a first control command or first control information for controlling the first device. The server may generate the first control information or the first control command based on the first state information or the first operation information obtained from the first device. For example, the server may generate a first control command to obtain a current value output by the first device and compare it with a reference current value to apply a current value higher or lower than the existing value. The server may generate a second control command or second control information for controlling the second device.

The server may generate a second control command for controlling the second device based on the first information obtained from the first device. The server may acquire status information of the first device from the first device and generate a second control command. For example, the server obtains an output current value from the first device, and when the current value output from the first device does not reach the reference value, generates a second control command that increases the output current value of the second device than the reference current value And can be delivered to the second device. When the first device fails to generate an appropriate output current due to a failure or the like, it is possible to reduce the concentration of fine particles in the first corresponding region corresponding to the first device by increasing the output of the second device.

The server may generate a control command for controlling the first device and / or the second device based on the environment information obtained from the third device. The server may obtain first environment information of the first target area from the third device, and generate a first control command based on the first environment information.

When the fine particle concentration reduction system includes a plurality of sensor devices, the server generates a first control command based on the first environment information obtained from the first sensor device, and the second environment information obtained from the second sensor device Based on the second control command can be generated. For example, the server generates a first control command for the first device whose first current is the nozzle current determined according to the first humidity value obtained from the first sensor device, and is obtained from the second sensor device and has the first humidity A second control command may be generated for the second device using the second current determined according to the second humidity value greater than the value as the nozzle current.

Alternatively, the server may generate the first control command and the second control command by considering the first environment information and the second environment information together. For example, the server determines the humidity value obtained from the first sensor device and the average value of the sensor values obtained from the second sensor device as a reference humidity value, and is determined according to the reference humidity value to the nozzle for the first device and the second device. The first control command and the second control command to apply the nozzle voltage may be generated and transmitted.

The server may acquire control information and generate a control command based on the control information. For example, the server may obtain control information for the first device or the second device from the user device and generate a control command for controlling the device according to the control information. The server may acquire first control information corresponding to the first device from the user device and generate a first control command. Alternatively, the server may obtain first control information for the first target region (eg, first control information including a target reduction ratio of the fine particle concentration in the first target region) and control the first device. 1 Control commands can be generated. Alternatively, the server acquires control information for a third region including the first target region and the second target region (eg, first control information including a target reduction ratio of the fine particle concentration in the third target region), A first control command for controlling the first device and a second control command for controlling the second device may be generated.

The server may obtain control information or control commands for the first device, the second device, and / or the third device from the user device. For example, the server may obtain a first control command for the first device from the user device. The server may obtain a second control command for the second device from the user device. The server may transmit the first control command to the first device and the second command to the second device. The server may transmit information acquired from the first to third devices to the user device, and may obtain control information or control commands from the user device in response.

The server can store the acquired information. The server may store information obtained from the first to third devices, control information generated by the server, control commands, control information obtained from a user device, or control commands.

 The server may store the acquired information together with identification information. The server may store the information obtained from the first device together with the identification information of the first device, and the information obtained from the second device together with the identification information of the second device. Alternatively, the server may store information obtained from the first sensor device together with the identification information of the first device, and information obtained from the second sensor device together with the identification information of the second device.

The server may store the acquired information together with time information. For example, the server may store the first information obtained at the first time point from the first device together with the first time point information, and the information obtained at the second time point from the first device together with the second time point information. .

The server can match and store and manage heterogeneous information. The server may store information obtained from each device in association.

The server can manage the environment information by matching the control command. For example, the server may match and store the first environment information obtained from the third device (or the first sensor device) and the first control information or the first control command generated from the user device in response to the first environment information. The server may match and store the second control information or the second control command generated from the user device in response to the second environment information and the second environment information obtained from the third device (or the second sensor device).

The server can manage by matching control commands and information. The server may match and store the first state information of the first device, the first operation information, or the first environment information of the first target area and the first control command obtained from the user. The server may match and store the second state information of the second device, the second operation information, or the second environment information of the second target area and the second control command obtained from the user.

The server may provide a control command to the first device using the matched information. The server may predict the second information according to the first information by using a database in which the first information and the second information are stored. Unless otherwise stated, the contents described in connection with FIG. 27 may be applied.

The server uses a first database stored in association with information obtained from the first device and a first control command for the first device (eg, a control command for the first device obtained from the user device), from the first device A control command may be generated based on the obtained information. The server uses the second database stored in association with the information obtained from the second device and the second control command for the second device (eg, the control command for the second device obtained from the user device), from the second device. A control command may be generated based on the obtained information.

The server uses the first database stored in association with the environment information obtained from the third device and the first control command for the first device (eg, the first control command for the first device obtained from the user device). A first control command may be generated based on information obtained from one device. Alternatively, the server may use the second database stored in association with the environment information obtained from the third device and the second control command for the second device (eg, the second control command for the second device obtained from the user device). , A second control command may be generated based on the information obtained from the second device.

The server may predict the second information based on the first information obtained from the first device, the second device, or the third device, and generate a control command according to the second information. For example, the server predicts the operation information (eg, the amount of current output) of the device based on the environment information (eg, humidity information) obtained from the first to third devices, and controls commands (eg, the amount of current output). , A control command for the nozzle voltage).

The server may use a database in which information obtained from the first device (or information obtained from the first sensor device) and information obtained from the second device (or information obtained from the second sensor device) are integrated. For example, the server stores the first fine particle concentration obtained from the first device and the first control command obtained from the user device in correspondence with the first fine particle concentration, and further stores the second fine particle obtained from the second device. A control command for the first device or the second device may be generated using a database in which the second control command obtained from the user device is matched and stored in correspondence with the fine particle concentration and the second fine particle concentration.

On the other hand, in FIG. 34, the server is illustrated based on a case configured as a separate and separate physical device, according to an embodiment, when the fine particle concentration reduction system includes a plurality of fine particle concentration reduction devices, any one The fine particle concentration reducing device of can function as a hub device including a server, and other fine particle concentration reducing device can function as a peripheral device.

For example, referring to FIG. 34, the first device may be a hub fine particle concentration management device including a server, and the second device may be a peripheral fine particle concentration management device in communication with the first device. For example, the first device may include a server and perform the above-described operation of the server. In other words, the first device stores information obtained from the first device, the second device, and / or the third device, communicates with the user device, transfers the information to the user device, and obtains control information from the user device. The operation of the above-described server device may be performed, such as generating or managing control commands for the operation of the first device and / or the second device, and controlling the operation of the first device and / or the second device. At this time, the second device may operate by communicating with the first device, transmitting status information, etc. to the first information, and obtaining a control command from the first device.

The user device may obtain a user input and communicate with each device of the server or the fine particle concentration reduction system to manage fine particle concentrations in a plurality of target areas.

The user device may drive a program, application, web application, web page, etc. for managing the fine particle concentration. The user device may manage fine particle concentrations for the first target region and the second target region, respectively.

The user device may include a display unit and / or an input unit. The user device may provide information obtained from the first device, the second device, the third device, and / or the server to the user through the display unit. The user device may obtain information related to the operation of the first device, the second device, or the third device from the user through the input unit.

The user device can communicate with the server, the first device, the second device, and / or the third device. The user device communicates with the server to obtain first state information of the first device, first operation information of the first device, or first environment information for the first target area. The user device may acquire information about the first device or the second device, and may transmit the first control command or the second control command generated based on the obtained information to the server device.

The user device may generate a second control command for the second device in consideration of the first state information for the first device. For example, the user device may generate a control command that increases the voltage applied to the nozzle of the second device, the current output from the second device, and the like, when the storage amount of the first device, the output current, or the like is less than the reference value. have.

The user device may generate a first control command and / or a second control command in consideration of the positions of the first device and the second device. The user device may generate a first control command and / or a second control command in consideration of the distance between the first device and the second device. For example, the user device may issue a first control command or a second control command in which the amount of output current is determined according to the interval between devices (eg, the amount of output current is determined to have a positive correlation with the interval between devices). Can be created.

The server or the user device may generate control commands to control the operation of the first device and the second device. The server or the user device may control the first device and the second device by interworking with each other.

The server or user device may control the first device and the second device to sequentially emit particles that are charged. The server or user device can control the first device and the second device to alternately emit charged particles.

The fine particle concentration reduction system may include a plurality of devices installed outdoors. Hereinafter, a fine particle reduction system including a plurality of devices will be described.

35 is a view for explaining a system for reducing fine particle concentration according to an embodiment of the present invention described herein. Referring to FIG. 35, the system for reducing fine particle concentration according to an embodiment may use a plurality of devices to manage the fine particle concentration in the system target region (or the entire target region, TRt).

Referring to FIG. 35, the system for reducing the concentration of fine particles according to an exemplary embodiment may include a first device 101 and a second device 102 that emit a charged material CS. The first device 101 and the second device 102 may emit droplets having a negative charge, thereby forming negative space charges around the device. Referring to FIG. 34, the fine particle reduction system may include a first device 101 and a second device 101 as two adjacent devices among a plurality of fine particle concentration reduction devices positioned apart from each other.

The first device 101 or the second device 102 may include a sensor unit. According to an embodiment, the first device 101 may include a first sensor unit, and the second device 102 may include a second sensor unit.

Each of the first device 101 and / or the second device 102 can be installed and used similarly to the device 100 described with respect to FIG. 28. Each of the first device 101 and / or the second device 102 can operate similarly to the device 100 described with respect to FIGS. 29-32. Hereinafter, the contents described in connection with FIGS. 28 to 32 may be applied unless otherwise specified.

35, the first device 101 and / or the second device 102 may be installed on a predetermined structure. The installation positions of the first device 101 and / or the second device 102 may be determined in consideration of the space charges formed by each device, the shape of the electric field formed thereby, and the surrounding terrain. The installation positions of the first device 101 and the second device 102 are the system target area TRt, the effective radius R1 of the first device 101, and the second device ( 102) may be determined in consideration of the effective radius R2.

Referring to FIG. 35, the first device and the second device may be installed at positions spaced apart from the ground. The first device may be installed at a position spaced apart from the ground by a first distance H1, and the second device may be installed at a position spaced apart from the ground by a second distance H2. The first distance and the second distance may be the same. Alternatively, the first distance and the second distance may have a predetermined difference according to the surrounding terrain.

The system for reducing the concentration of fine particles includes a first device 101 for reducing the concentration of fine particles in the first target area, and a second device 102 for reducing the concentration of fine particles in the second target area. It is possible to manage the fine particle concentration of TRt).

The first device 101 can reduce the concentration of fine particles in the first target region TR1. The second device 102 can reduce the concentration of fine particles in the second target region TR2. The first device 101 and the second device 102 can reduce the concentration of fine particles in the system target area TRt. The system target area TRt may be a target area in which the fine particle concentration is reduced by a fine particle concentration reduction system including a plurality of fine particle concentration reduction devices.

The first device 101 may be a device having a first effective radius R1. The second device 102 may be a device having a second effective radius R2. The fine particle concentration reduction system including the first device 101 and the second device 102 may make the total effective radius Rt an effective radius. The total effective radius Rt may be determined to be smaller than the first effective radius R1 and the second effective radius R2 added.

The first device 101 and the second device 102 may be installed spaced apart from the first interval D12. For example, the first interval D12 may be determined to be smaller than the first effective radius TR1 and the second effective radius TR2 added. For example, when the first effective radius TR1 and the second effective radius TR2 are 30 m each, the first interval D12 may be determined to be 50 m. The first effective area TR1 of the first device 101 and the second effective area TR1 of the second device 102 may overlap at least partially.

The effective radius of the first device 101 and the second device 102 and / or the distance D12 between the first device and the second device may be determined in consideration of the efficiency of the entire system.

According to an embodiment, the power consumed by the first device 101 and the second device 102 is a device for reducing fine particle concentration using a radius obtained by adding a first radius R1 and a second radius R2 as a radius. It can be less compared to. When the concentration of fine particles in a large area is to be reduced by using a single device, interference by an external structure may be severe, and a target area in the form of a dome may be formed around the device, so a dance area may be generated in the air. Therefore, in order to minimize unnecessary power consumption, a plurality of fine particle concentration reduction devices may be appropriately disposed in the system target area TRt.

Referring to FIG. 35, a system for reducing fine particles according to an embodiment may include a sensor device SD installed in a target area. The sensor device SD may be installed at a location in the system target area TRt. For example, the sensor device SD may be installed at a position spaced apart by a first effective radius R1 from a point where the first device (or a structure on which the device is installed) is located. The sensor device SD may be located near the first device 101. The sensor device SD may be located between the first device 101 and the second device 102. For example, the sensor device SD may be located at an intermediate point between the first device 101 and the second device 102.

The sensor device may acquire environmental information of the system target area TRt, the first target area TR1, or the second target area TR2. For example, the sensor device includes temperature, humidity, air pressure, airflow (eg, wind speed), air quality (eg, fine dust) in the system target area TRt, the first target area TR1, or the second target area TR2. ), Environmental information including any one of the density of the space charge. The sensor device may acquire environmental information and transmit it to the first device 101, the second device 102, a server, or a user device.

On the other hand, the fine particle concentration reduction system may include a plurality of sensor devices. For example, the fine particle abatement system is installed at a first distance from the first device 101 and is installed at a second distance from the first sensor device and the first device 101 to obtain the first information and the second It may also include a second sensor device for acquiring information. Alternatively, the fine particle reduction system may include a first sensor device and a second target area TR1 corresponding to the second device 102 that acquire environmental information of the first target area TR1 corresponding to the first device 101. It may include a second sensor device for obtaining the environmental information of the.

The system for reducing fine particle concentration shown in FIG. 34 can operate similarly to that described in FIGS. 30 to 33. The system for reducing the concentration of fine particles may form a space charge by supplying a material CS that is charged in the system target region TRt. The system for reducing the concentration of fine particles is for a sufficient period of time such that the fine particles FP located in the system target region TRt are charged by the space charge and pushed by the electric field formed by the space charge, and ultimately removed by contact with the ground A plurality of fine particle concentration reduction devices may be driven, and a state and environment of the fine particle concentration reduction operation may be managed using a sensor device.

2.5 Indoor fine particle concentration reduction system

2.5.1 Indoor installation

According to an embodiment of the invention described herein, the operation of reducing the concentration of fine particles may be used to lower the concentration of fine particles in an indoor space.

The indoor space described in this specification may mean a space having a different environment from the atmosphere. The indoor space described in the present specification does not mean only a room separated from the outside by having a ceiling, a floor, and a slope, and at least a part of the surface is opened to be understood as a semi-indoor space connected to the outside, which also corresponds to the indoor space. .

The operation of reducing the concentration of fine particles described in this specification may be performed by an apparatus installed in an indoor space. The apparatus installed in the indoor space can reduce the fine particle concentration in the indoor target area. For example, the apparatus described in this specification is installed in a home, a department store, a large shopping mall, a sports stadium, an indoor performance hall, a library, etc., to reduce the concentration of fine particles.

2.5.2 Single device system

36 is a view for explaining an embodiment of a system for reducing the concentration of fine particles in a room.

Referring to FIG. 36, the system for reducing the concentration of fine particles may include a device 100 for reducing the concentration of fine particles and a sensor device SD. In the system for reducing the concentration of fine particles in a room, the target area of the apparatus 100 for reducing the concentration of fine particles may be a unit indoor space.

The apparatus 100 for reducing the concentration of fine particles may be installed at one location in the indoor space. In FIG. 36, the case where it is installed close to the ceiling is illustrated as an example for convenience, but this does not constitute the content of the invention. The device 100 may be located in an area where a person mainly passes. For example, the device 100 may be installed in the air or may be installed on the floor of an indoor space. Alternatively, the device 100 may be located in a duct through which indoor air flow passes.

The apparatus 100 for reducing the concentration of fine particles may supply a material CS charged in the indoor space. The device 100 may discharge charged droplets to supply a material CS charged in the indoor space. The device 100 may supply a charged material CS to charge the fine particles FP in the indoor space. The device 100 may supply a charged material CS to induce charged microparticles FP to be collected by moving to a specific location indoors. The device 100 may supply a chargeable material CS to form a space charge, and provide electric power to lose and remove charge by attaching the fine particles FP charged through the space charge to the target location. have.

The sensor device SD may acquire environmental information of the indoor space. The sensor device SD may acquire temperature, humidity, charge density, and concentration of fine particles in the indoor space. The sensor device SD and the fine particle concentration management device 100 may be provided as a unit.

Referring to FIG. 36, the system for reducing fine particle concentration may further include a central control device 300. The central control device 300 may control the operation of the device 100, the sensor device SD, and other air quality control devices installed in the space. For example, the central control device 300 may control operations of the device 100 and an air conditioning facility, a cooling / heating device, a blower, and a ventilation fan. The central control device 300 may link the operation of the device 100 with the operation of another air quality control device. For example, the central control device 300 may stop the operation of the blower while the device 100 is operating.

The microparticle concentration reduction system according to an embodiment may include a dust collecting module. The dust collecting module may collect fine particles FP charged by the device 100. The dust collecting module may be installed at one location in the indoor space. The dust collection module can be installed in the duct of the air conditioning system embedded in the building. The dust collecting module may measure electrical characteristics opposite to charges emitted from the device 100. For example, when a negative charge is supplied by the device 100, the dust collecting module may take + charge. Alternatively, a + voltage may be applied to the dust collecting module. However, this does not limit the content of the invention according to the present specification, and the dust collecting module may have a grounded dust collecting part.

Fine particle concentration reduction system according to an embodiment may further include an air quality control device. The air quality control device may be a device for controlling humidity, temperature, and wind direction in indoor air. The central control device 300 may control the air quality control device to improve the operation efficiency of the fine particle concentration reduction device.

According to one embodiment, the air quality control device may be an air cleaning device having a filter. The air quality control device may inhale air in the space and exhaust air that has passed through the filter. At this time, the air quality management device has a dust collecting unit that functions similar to the dust collecting module, and can collect the fine particles charged by the fine particle concentration reducing device.

The fine particle concentration reduction system shown in FIG. 36 can operate similarly to that described in FIGS. 30 to 33. The system for reducing the concentration of fine particles shown in FIG. 36 can charge a fine particle located in an indoor space by supplying a material CS charged in the indoor area. The microparticle concentration reduction system can reduce the concentration of suspended microparticles in the indoor space by applying an electrical effect to the charged microparticles.

On the other hand, in FIG. 36, the indoor fine particle concentration reduction was described based on the indoor space having the sidewalls, the ceiling, and the floor of the four sides, but the indoor fine particle concentration reduction operation described herein is a partially open interior, That is, it can be applied to a semi-indoor space.

For example, the operation for reducing the concentration of fine particles may be applied to an indoor space with an open ceiling. Further, for example, the operation for reducing the concentration of fine particles may be applied to an indoor space in which at least one side of the side wall is open.

At this time, the system for reducing the concentration of fine particles may include at least one device for reducing the concentration of fine particles located close to an unopened surface. The system for reducing the concentration of fine particles is located close to an unopened surface, and charges fine particles in the indoor space, and forms electric charges to form charged electric charges so that the charged fine particles adhere to some structures of the indoor space or are pushed out of the indoor space. It may include a fine particle concentration reduction device providing a.

Alternatively, the fine particle concentration reduction system may include at least one fine particle concentration reduction device positioned close to an open surface. The system for reducing the concentration of fine particles is located close to an open surface, and charges fine particles in an indoor space, and generates electric charges by forming space charges so that the charged fine particles adhere to some structures of the indoor space or are pushed out of the indoor space. It may include a fine particle concentration reduction device provided.

3. How to use the device

Here, a method of using a device for reducing the concentration of fine particles described in this specification and the like will be described.

3.1 How to install the device

36 is a flow chart for explaining an embodiment of a method of installing a fine particle concentration reduction device described herein.

Referring to FIG. 36, a method of installing a device for reducing fine particle concentration according to an embodiment includes installing a structure for installing the device (S1301) and installing a device on the installed structure (S1303). You can.

Installing a structure for installing the device (S1301) may include determining an installation location of the device. Determining the installation location of the device may include determining a height from the ground of the location where the device is installed. For example, the installation location of the device can be determined based on the effective radius of the device.

Installing a structure for installing the device (S1301) may include providing a structure that provides electrical or magnetic stability. Considering that the device described herein releases a material having a charge to reduce the concentration of fine particles, the environment or structure in which the device is installed may be provided to have electrical or magnetically stable properties. For example, the structure may be provided to have at least some insulated sections. Alternatively, the structure may be made of at least some non-magnetic material.

According to an embodiment, installing the structure for installing the device (S1301) may include installing a structure for installing the fine dust reduction device at a first position spaced apart from the ground surface by a first distance.

According to one embodiment, the structure in which the device is installed may include a first end and a second end contacting the fine dust reduction device. The structure may include at least some electrically insulated sections between the first end and the second end. The structure can be electrically grounded in the first stage. The structure can abut the surface at the first stage. The structure may be fixed to a building or other object in the first stage. An insulated section may be located between the device and the second end that the device contacts. The first end and the second end may be spaced apart by a predetermined distance.

Installing the device on the structure may include installing the device such that the first side of the device contacts the structure. The device can include a first side on which the reservoir is located and a second side on which the nozzle is located. At this time, installing the device on the structure may include installing the first side on which the reservoir is located to contact the structure.

For example, in the case of installing the device on a structure in order to build an outdoor fine particle concentration system, the device has a first side in which a water reservoir is located relatively close to a building, and a second side in which a nozzle is located. It can be installed in a building, so as to be located away from the building.

As another example, when the device is installed on a structure in order to build an indoor fine particle concentration system, the device has a first side in which the reservoir is located relatively close to the inner wall, and a second side in which the nozzle is located. It can be installed in one location indoors, so as to be located away from the inner wall.

Installing the device on the structure may include positioning the device such that the nozzle of the device faces a direction perpendicular to the ground. Installing the device on the structure may include positioning the device such that the nozzle of the device faces the direction parallel to the ground. When the device includes a plurality of nozzles, the device may be positioned such that at least one of the plurality of nozzles is vertical from the ground or has a direction parallel to the ground.

Installing the device on the structure may include installing the device close to the second of the first and second ends of the structure. Installing the device on the structure may include installing the device on a second end facing the first end abutting the surface of the structure.

Installing the device on the structure may include installing the device to protrude from the structure. Installing the device on the structure may include installing the device to protrude on the sidewall of the structure (eg, the target building) in one direction, eg, perpendicular to the sidewall.

Installing the device on the structure may include installing the device on a plurality of structures. For example, installing a device may include installing the device on or between a plurality of structures, such that the device is supported by a plurality of structures.

According to one embodiment, a method of installing a device for reducing fine particle concentration may further include connecting water to the device. The apparatus for reducing the concentration of fine particles may use a cartridge in which a liquid is stored in advance, or may operate in a direct manner. When operating in a direct water method, the method of installing a device for reducing the fine particle concentration may further include connecting water supplied to the device via at least a portion of the structure.

3.2 Device Management Method

38 is a flowchart for explaining an embodiment of a method for managing a device for reducing fine particle concentration described herein.

Referring to FIG. 38, a method of managing a device for reducing fine particle concentration according to an embodiment includes installing a device (S1301), obtaining state information from the device (S1303), and configuring the device based on the state information It may include the step of at least partially changing (S1305).

Installing the device can be implemented similar to that described above with respect to FIG. 37. Installing the device may include installing the device in a first state. Installing the device may include inserting a first reservoir container containing a first volume of liquid into the device. Installing the device may include inserting a first cartridge containing a first dose of liquid into the device. Installing the device may include connecting a water pipe to the device and supplying liquid to the nozzle of the device through the water supply.

Obtaining status information from the device can include obtaining a liquid supply state of the device. Obtaining status information from the device may include obtaining the amount of liquid in the cartridge included in the device. Obtaining status information from the device may include obtaining the amount of liquid supplied to the nozzle of the device.

Changing at least a portion of the device configuration based on the status information may include changing the liquid supply status of the nozzle. For example, at least partially changing the device configuration based on the status information may include changing the first cartridge to the second cartridge when the amount of liquid contained in the first cartridge is equal to or less than a predetermined ratio of the first capacity. . Alternatively, at least partially changing the device configuration based on the status information may include supplying a liquid to the first reservoir container. Alternatively, changing at least a portion of the device configuration based on the status information may include replacing the nozzle or nozzle array of the device.

As described above, although the embodiments have been described by a limited embodiment and drawings, those skilled in the art can make various modifications and variations from the above description. For example, the described techniques are performed in a different order than the described method, and / or the components of the described system, structure, device, circuit, etc. are combined or combined in a different form from the described method, or other components Alternatively, even if replaced or substituted by equivalents, appropriate results can be achieved.

Therefore, other implementations, other embodiments, and equivalents to the claims are also within the scope of the following claims.

Claims (21)

In the apparatus for managing the fine particle concentration of the target region by supplying charge to the target region,
A container for storing liquid;
At least one nozzle for outputting the liquid;
A pump that supplies the liquid from the container to the at least one nozzle;
A power source that supplies power to the device; And
Includes; a controller for supplying electric charge to the target region through the at least one nozzle using the power source;
The controller outputs a charged droplet through the nozzle by applying a voltage equal to or greater than a first reference value to the at least one nozzle using the power source, and supplies the charge to the target region through the charged droplet, thereby Forming a space charge in the target region,
The controller outputs the charged droplet and charges the fine particles in the target region through the charged droplet, and provides the charged fine particles with electric force in a direction away from the device through the formed space charge, ,
The electric force provided to the fine particles is provided by an electric field formed by electric charges supplied to at least part of the target region,
The fine particles in the target region are charged with the same polarity as the supplied charge by the supplied charge
Device.
According to claim 1,
The controller maintains the space charge for the predetermined time or more so as to supply the material carrying the charge to the target region for a predetermined time or more, so that the charged fine particles are provided with the electric force and moved to the ground to be removed. ,
Device.
According to claim 1,
The controller supplies negative charge to the target region using the power source, and the controller applies a negative voltage to the at least one nozzle using the power source to take a negative charge through the at least one nozzle. Emitting droplets,
Device.
According to claim 1,
The controller supplies a charge to the target region through the at least one nozzle using the power source to form a negative space charge in the target region,
The electric force provided to the fine particles is provided by an electric field due to at least some of the negative space charges,
Device.
According to claim 1,
The controller uses the power source to provide an electric force including a component facing the ground to the fine particles in the target area,
Device.
According to claim 1,
The controller, by using the power, to apply the power to the at least one nozzle, the first reference value or more determined in consideration of a predetermined effective radius value,
The predetermined effective radius, the reference time is the distance to the point where the concentration of the fine particles is reduced by the reference ratio,
Device.
According to claim 1,
The controller, by using the power supply, applies a voltage equal to or greater than a first reference value determined to output a current of 10 μA to 10 mA through the at least one nozzle to the at least one nozzle,
Device.
According to claim 1,
The controller further includes applying a voltage equal to or less than a second reference value to the at least one nozzle using the power source, wherein the second reference value is determined to prevent discharge of electric charge from the nozzle,
Device.
In the apparatus for managing the fine particle concentration of the target region by supplying charge to the target region,
A container for storing liquid;
At least one nozzle for outputting the liquid;
A pump that supplies the liquid from the container to the at least one nozzle;
A power source that supplies power to the device;
A controller for supplying a material having a charge to the target region through the at least one nozzle using the power source; And
It includes; a particle dispersing unit for providing a non-electrical force in the vicinity of the nozzle for the charged material
The controller outputs a charged droplet through the at least one nozzle by applying a voltage equal to or greater than a first reference value to at least one nozzle using the power source, and supplies electric charge to the target region through the charged droplet A space charge is formed in the target region,
The controller provides electric force in a direction away from the device to the microparticles charged by the electric charge supplied to the target region through the space electric charge,
Device.
The method of claim 9,
The particle dispersing unit is configured to spray the electrically charged material to the electrically charged material to provide the specific electric force,
Device.
The method of claim 9,
The controller forms a space charge in the target region by supplying the material carrying the charge through the at least one nozzle using the power source,
Device.
The method of claim 11,
The at least one nozzle includes a stage through which the charged droplet is discharged,
The controller applies the non-electrical force in a direction away from the one end to the material carrying the charge near the one end using the particle dispersing unit so that the density of the space charge is reduced at least partially in the vicinity of the one end. Provided,
Device.
The method of claim 9,
The particle dispersing unit includes at least one air nozzle for injecting gas, and injecting the gas in a direction away from the nozzle with respect to the charged material,
Device.
In the method for managing the concentration of the fine particles in the target region by using a device that is located a predetermined distance from the ground to supply charge to the target region,
The device includes a container for storing liquid, at least one nozzle for outputting the liquid, a pump for supplying the liquid from the container to the at least one nozzle, a power supply for supplying power, and the at least one using the power supply It includes; a controller for supplying electric charge to the target region through the nozzle;
The above method,
Applying, by the controller, a voltage equal to or greater than a first reference value to the at least one nozzle using the power source;
Supplying the liquid to the at least one nozzle by the controller using the pump;
Forming a space charge in the target region by the controller outputting a charged droplet through the at least one nozzle using the power supply and the pump, and supplying charge to the target region through the charged droplet ; And
The controller charges the fine particles in the target region through the charged droplet, and the device is charged to the fine particles charged in the same polarity as the supplied charge by the electric charge supplied to the target region through the space charge. Providing an electrical force comprising at least a portion of the directional component away from the; Containing
Way.
The method of claim 14,
The controller provides the electric force to the microparticles by forming the electric charge in the target region to form an electric field between the ground and the device in the target region, and to the microparticles through the formed electric field Including providing electrical power,
Way.
The method of claim 14,
The controller maintains the space charge for the predetermined time or longer so that the chargeable material is supplied to the target region for a predetermined time or longer, so that the charged fine particles are provided with the electric force and moved to the ground to be removed. To do; Further comprising,
Way.
The method of claim 14,
The controller forms a negative space charge in the target region by supplying a negative charge to the target region through the at least one nozzle using the power source,
The electric force provided to the fine particles is provided by an electric field due to at least some of the negative space charges,
Way.
In the method of managing the concentration of the fine particles in the target region using a charge supply device,
The device includes a container for storing liquid, at least one nozzle for outputting the liquid, a pump for supplying the liquid from the container to the at least one nozzle, a power supply for power, and the at least one using the power And a controller for supplying a material that charges the target region through a nozzle and a particle dispersing unit that provides non-electricity to the chargeable material,
The above method,
Applying, by the controller, a voltage to the at least one nozzle using the power source;
Supplying the liquid to the at least one nozzle by the controller using the pump;
The controller generates the charged droplet through the at least one nozzle using the power source and the pump, outputs the charged droplet, and supplies electric charge to the target region through the charged droplet, thereby providing the target region Forming a space charge on the;
Providing, by the controller, electric power in a direction away from the device to the microparticles charged by the charge supplied to the target region through the space charge; And
Providing, by the controller, the non-electrical force in a direction away from the one end to the chargeable material located near one end where the droplet of the nozzle is generated by using the particle dispersing part; Containing
Way.
The method of claim 18,
The step of applying the non-electrical force further comprises spraying an electrically neutral material to the electrically charged material to provide the non-electrical power,
Way.
The method of claim 18,
The controller supplying the charge to the target region includes the controller supplying the charge to the target region to form a space charge forming an electric field in the target region,
The providing of the non-electrical force by the controller is such that the controller includes a directional component away from the one end to the material carrying the charge in order to lower the density of distribution of the spatial charge near the one end. Further comprising providing electrical power,
Way.
The method of claim 18,
The controller applies the voltage above a first reference value to at least one nozzle by using the power source, and provides electric force in a direction away from the device to fine particles in the target region charged by the supplied charge,
The electric force provided to the fine particles is provided by an electric field formed by electric charges supplied to at least part of the target region,
The fine particles in the target region are charged with the same polarity as the supplied charge by the supplied charge
Way.

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