KR102082969B1 - Plasma Processed Mask For Fine Dust Blocking - Google Patents

Abstract

The present invention relates to a plasma-treated mask for blocking fine dust. According to the present invention, the plasma-treated mask for blocking fine dust comprises: a mask body (10) including an upper body (11), a middle body (12), and a lower body (13); an upper part (30) connected to the upper end of the mask body (10) to be closely attached to the nose ridge of a mask wearer in order to suppress access of air coming out during breathing; a lower part (20) connected to the lower end of the mask body (10) to surround the jaw of the mask wearer; and an ear strap (40) connected to both end parts of the mask body (10). Each of the upper, middle, and lower bodies (11, 12, 13) comprises: an outer filter layer (300) made of plasma-treated non-woven fabric; an electrostatic filter layer (200) made of non-woven fabric electrostatically treated by a current of 25,000 V to be attached on the inner surface of the outer filter layer (300); and an inner filter layer (100) made of antibacterial and deodorized natural cotton fabric to be attached on the inner surface of the electrostatic filter layer (200). A portion adjacent to the central part of the mask body (10) protrudes to the outside to surround the nose of the mask wearer. In addition, the present invention can maintain the same fine dust capturing performance as that before washing even after washing.

Description

Plasma Processed Mask For Fine Dust Blocking}

The present invention comprises a mask body (10) consisting of an upper body (11), an intermediate body (12), and a lower body (13); An upper portion 30 connected to an upper end of the mask body 10 to be in close contact with a nose of a mask wearer so as to suppress the inflow and outflow of air emitted during breathing; A lower portion 20 connected to a lower end of the mask body 10 to cover a chin of a mask wearer; And earring straps 40 connected to both ends of the mask body 10, wherein the upper body 11, the middle body 12, and the lower body 13 are each made of a plasma-treated nonwoven fabric. An outer filter layer 300 configured; An electrostatic filter layer 200 composed of a nonwoven fabric electrostatically treated with a current of 25,000 volts and attached to an inner surface of the outer filter layer 300; And an inner filter layer 100 composed of a natural cotton cloth treated with an antibacterial deodorant and attached to an inner surface of the electrostatic filter layer 200, wherein a portion adjacent to the center portion of the mask body 10 surrounds a nose of a mask wearer. The present invention relates to a plasma mask for preventing fine dust, which protrudes outward and is capable of maintaining the same fine dust collection performance as before cleaning even when reused after cleaning.

Hereinafter, the background art together with the accompanying drawings will be described.

In general, yellow sand is a fine dust originating from regions such as China and Mongolia, and mainly composed of silicon, iron, manganese, aluminum, etc., but due to industrialization in China, in recent years, yellow dust and heavy metals such as lead, cadmium, and dioxin Due to the high content of the same harmful chemicals, the harm and seriousness is increasing day by day.

Representative heavy metal concentrations in yellow sand are 2-15 times higher than normal air, 13 times lead, 14 times cadmium, and 21 times more chromium, lead paralyzes nerves and muscles, and cadmium lung cancer In addition to chromium, chromium is known to increase the risk of kidney disease and bronchitis.

In addition, the ultrafine dust contained in the yellow dust is more severely adversely affecting the human body, so it accumulates in the lungs through the respiratory barriers such as the nose and bronchus, penetrates directly to the kidneys and liver as well as blood vessels, and damages the alveoli (COPD). ) And fatal to asthma patients.

According to a recently published paper, ultrafine dust of 0.1 ㎛ or less enters blood vessels directly through blood vessels to clump blood and disrupt blood circulation, and the incidence of cardiovascular disease increases when the concentration of fine dust increases by 10㎍ / ㎥. It is known to increase by 24% and increase the chance of dying from a double cardiovascular disease by 76%.

Various masks have been proposed as a solution for solving the above problems.

As one embodiment of the prior art for such a mask, an electrostatic filter that collects high dust particles by charging constituent fibers and collecting dust by an electrostatic action is known, but such an electrostatic filter is used as a primary filter. As a result, there is a problem in that it is not possible to filter out harmful dust or bacteria except ultra-fine dust.

In addition, as another embodiment of the prior art for the mask, it is known to treat the compound by applying or dipping it on a nonwoven fabric to impart antimicrobial and deodorizing function, but most of the compound used is an artificial compound, It was harmful and also had a low antibacterial and deodorizing efficiency.

In addition, as another embodiment of the prior art with respect to the mask, when the wearer wearing a mask on the face there was a problem that the fog occurs in the glasses, to prevent the misting of the glasses, Attempts have been made to add nanoparticles, but when silver nanoparticles are added to the deodorizing particles, the electrospinning properties are deteriorated, which makes it impossible to manufacture fibers using electrospinning. .

In addition, as another embodiment of the prior art for the above mask, a disposable mask has been proposed, but such a disposable mask has a problem that can not be reused after one use and the fine dust collection performance is lowered upon reuse.

Republic of Korea Patent Publication No. 10-2015-0117014 (2015.10.19.)

Plasma treatment mask for fine dust blocking according to the present invention is to solve the following.

SUMMARY OF THE INVENTION An object of the present invention is to provide a plasma mask for blocking fine dust, which can primarily filter out harmful dust and bacteria in addition to ultrafine dust.

It is another object of the present invention to provide a fine dust blocking plasma treatment mask that is harmless to the human body and has improved antibacterial and deodorizing efficiency as compared with the prior art.

Still another object of the present invention is to provide a plasma mask for preventing fine dust, which can prevent the fabric itself from fogring on the glasses without the addition of a functional material that increases in cost when a person wearing the glasses wears a mask on the face. It is.

It is a further object of the present invention to provide a fine dust blocking plasma treatment mask capable of maintaining the same fine dust collection performance as before cleaning even upon reuse after cleaning.

In order to solve the above problems, the plasma mask for fine dust blocking according to the present invention is configured as follows.

A mask body 10 composed of an upper main body 11, an intermediate main body 12, and a lower main body 13; An upper portion 30 connected to an upper end of the mask body 10 to be in close contact with a nose of a mask wearer so as to suppress the inflow and outflow of air emitted during breathing; A lower portion 20 connected to a lower end of the mask body 10 to cover a chin of a mask wearer; And earring straps 40 connected to both ends of the mask body 10, and the upper body 11, the middle body 12, and the lower body 13 are each composed of a non-woven fabric treated with plasma. An outer filter layer 300; An electrostatic filter layer 200 composed of a nonwoven fabric electrostatically treated with a current of 25,000 volts and attached to an inner surface of the outer filter layer 300; And an inner filter layer 100 composed of a natural cotton cloth treated with an antibacterial deodorant and attached to an inner surface of the electrostatic filter layer 200, wherein a portion adjacent to the center portion of the mask body 10 surrounds a nose of a mask wearer. It protrudes outward, and even when reused after washing, it is possible to maintain the same fine dust collection performance as before washing.

The plasma treatment for the nonwoven fabric is characterized in that it is made for 3 seconds at atmospheric pressure and room temperature.

The inner filter layer 100 is characterized in that it is immersed for 10 seconds at 70 ℃ in a natural product solution for antibacterial deodorization.

The natural product solution, in the mixed solution with water, the concentration of lacquer extract is 20% by weight, the concentration of ocher is 1% by weight, or the concentration of lacquer extract is 20% by weight and the concentration of ocher is 1% by weight. It features.

The upper portion 30 is characterized in that it includes a wire to keep in close contact with the top of the mask wearer's nose, etc. when wearing the mask.

The upper main body 11 has a left contour having an intersection angle of 25 ° to 35 ° when viewed from the side with respect to the vertical line, and the middle main body 12 has an upper half of the upper half when viewed from the side with respect to the vertical line. The part has a vertical line, the lower half part of the upper half part has a left contour having an intersection angle of 2 ° to 4 °, and the lower half part has a left contour having an intersection angle of 15 ° to 25 °, The main body 13 is characterized by having a left outline having an angle of intersection of 15 ° to 25 ° when viewed from the side with respect to the vertical line.

The upper side 30 is characterized in that it comprises a sweat-absorbent quick-drying fabric padded on the inner side.

The plasma filter mask for blocking fine dust according to the present invention can achieve the following effects by the above-mentioned solution.

First, there is an effect of providing a plasma mask for blocking fine dust that can filter out harmful dust or bacteria in addition to ultra-fine dust.

Second, there is an effect of providing a plasma mask for fine dust blocking harmless to the human body and also improved antibacterial and deodorizing efficiency compared to the prior art.

Third, when the wearer wears a mask on the face, the fabric itself has an effect of providing a plasma mask for blocking fine dust, which can prevent the fabric from becoming fogged without the addition of a functional material.

Fourth, there is an effect of providing a fine dust blocking plasma treatment mask that can maintain the same fine dust collection performance even after cleaning and reuse.

1 is a right side view of a fine dust blocking plasma processing mask according to an embodiment of the present invention.
2 is a perspective view of FIG. 1.
3 is a perspective view of a plasma mask for blocking fine dust according to another embodiment of the present invention.
4 is a cross-sectional view taken along line AA of FIG. 1.
5 is a cross-sectional view taken along line BB ′ of FIG. 3.

Hereinafter, various embodiments of the present disclosure will be described with reference to the accompanying drawings. However, this is not intended to limit the techniques described in this document to specific embodiments, but should be understood to cover various modifications, equivalents, and / or alternatives to the embodiments of this document. In connection with the description of the drawings, similar reference numerals may be used for similar components.

In addition, the expressions "first," "second," and the like used in this document may modify various components in any order and / or importance, and may distinguish one component from another. Used only and do not limit the components. For example, the 'first part' and the 'second part' may indicate different parts regardless of the order or importance. For example, without departing from the scope of rights described in this document, the first component may be referred to as a second component, and similarly, the second component may be renamed to the first component.

Also, the terminology used herein is for the purpose of describing particular embodiments only and may not be intended to limit the scope of other embodiments. Singular expressions may include plural expressions unless the context clearly indicates otherwise. The terms used herein, including technical or scientific terms, may have the same meaning as commonly understood by one of ordinary skill in the art. Among the terms used in this document, terms defined in the general dictionary may be interpreted to have the same or similar meaning as the meaning in the context of the related art, and ideally or excessively formal meanings are not clearly defined in this document. Not interpreted as In some cases, even if terms are defined in the specification, they may not be interpreted to exclude embodiments of the present disclosure.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

1 is a right side view of a fine dust blocking plasma processing mask according to an embodiment of the present invention, FIG. 2 is a perspective view of FIG. 1, and FIG. 3 is a fine dust blocking plasma processing mask according to another embodiment of the present invention. 4 is a cross-sectional view taken along line AA of FIG. 1, and FIG. 5 is a cross-sectional view taken along line BB ′ of FIG. 3.

1 to 5, the plasma mask for blocking dust according to an embodiment of the present invention, the mask body 10, the upper portion 30, the lower portion 20, and the earring strap 40 Include.

The mask main body 10 includes an upper main body 11, an intermediate main body 12, and a lower main body 13, and the upper main body 11, the middle main body 12, and the lower main body 13. ) Includes an outer filter layer 300, an electrostatic filter layer 200, and an inner filter layer 100, respectively.

The outer filter layer 300 is composed of a plasma-treated nonwoven fabric and is disposed outside the mask, and the plasma treatment of the nonwoven fabric is performed for 3 seconds at atmospheric pressure and room temperature. Adhesion with surrounding molecules or atoms is increased, and harmful dust (eg, yellow dust or fine dust) which is not filtered by a general filter layer is completely different due to chemical bonding force of molecules or atoms of surrounding fine dust of the atom. While changing, it can filter out harmful dust and bacteria as the primary except ultra fine dust.

The electrostatic filter layer 200 is composed of a nonwoven fabric electrostatically treated with a current of 25,000 volts is attached to the inner surface of the outer filter layer 300, according to this configuration ultra-fine dust and bacteria by the outer filter layer 300 Except the harmful dust is filtered primarily, but may pass through the outer filter layer 300 unfiltered ultrafine dust may remain, such ultrafine dust can be captured and filtered by the electrostatic force of the electrostatically treated nonwoven fabric.

The inner filter layer 100 is composed of a natural cotton cloth treated with antibacterial and deodorant is attached to the inner surface of the electrostatic filter layer 200, according to this configuration is still remaining through the outer filter layer 300 and the electrostatic filter layer 200 Antibacterial deodorization treatment can be performed while completely trapping and filtering harmful dust and bacteria.

In addition, the inner filter layer 100 is a natural cotton cloth that is in contact with the face and the material is 100% cotton, 30 water, anti-silicone treated natural cotton cloth, immersed for 10 seconds in 70 ℃ natural water solution for antibacterial deodorization, The natural product solution, in the mixed solution with water, the concentration of the lacquer extract is 20% by weight, the concentration of the ocher is 1% by weight, or the concentration of the lacquer extract is 20% by weight and the concentration of the ocher is 1% by weight. According to this configuration, the natural cotton cloth can be secured more than 99.9% antibacterial, deodorant 80% or more.

According to the above configuration, the portion adjacent to the central portion of the mask body 10 protrudes outward so as to surround the nose of the mask wearer. The nose may be wrapped around the protruding nose.

The upper portion 30 is connected to the upper end of the mask body 10 to suppress the inflow of air coming out of the breathing may be in close contact with the nose of the mask wearer, according to this configuration, the air flows out of the mask wearer when breathing The inflow and outflow of can be suppressed or blocked.

In addition, the upper portion 30 includes a sweat-absorbent quick-drying fabric padded on the inner side, according to this configuration it can prevent the fog of the glasses caused by the wearer of the mask wearer.

In addition, the upper portion 30 may be configured to include a wire in the upper side to keep in close contact with the top of the mask wearer's nose when wearing the mask, in this case the mask body 10 is the face of the mask wearer The mask can be brought into close contact with the face by bending the wire in accordance with the shape of the face (for example, the nose).

The lower part 20 may be connected to the lower end of the mask body 10 to surround the mask wearer's chin. According to this configuration, the mask wearer can easily wear the mask by hanging on the chin.

The earring strap 40 is connected to both ends of the mask body 10 to be hooked to the ear, and provided with a length adjusting device capable of adjusting the length, and accordingly, the earring strap 40 is hooked to the ear of the mask wearer. It is possible to wear a mask and at the same time to adjust the length of the earring strap 40 with the length adjusting device to maintain the adhesion to the size of the mask to the desired size to the desired size.

In addition, the mask main body 10 includes an upper main body 11, an intermediate main body 12, and a lower main body 13, and an upper main body 11, an intermediate main body 12, and a lower main body ( 13 is sewn in the upper or lower edge portion adjacent to each other are connected to each other, the lower edge portion of the upper portion 30 and the upper edge portion of the upper body 11 is also sewn and connected to each other and the lower portion 20 The upper edge part of the top and bottom edges of the lower main body 13 are also sewn and connected to each other. According to such a configuration, the upper part 30, the upper main body 11, the intermediate main body 12, the lower main body 13, and the lower main part 20 are sewn and connected to each other to form a mask. have.

The upper main body 11 has a left contour having an intersection angle of 25 ° to 35 ° when viewed from the side with respect to the vertical line, and the middle main body 12 has an upper half of the upper half when viewed from the side with respect to the vertical line. The part has a vertical line, the lower half part of the upper half part has a left contour having an intersection angle of 2 ° to 4 °, and the lower half part has a left contour having an intersection angle of 15 ° to 25 °, The main body 13 has a left outline having an intersection angle of 15 ° to 25 ° when viewed from the side with respect to the vertical line. According to this configuration, the face mask or contour of the mask wearer is treated with the plasma mask for masking fine dust according to the present invention. By configuring to fit the mask to the face when wearing the mask it is possible to wear.

In the above embodiment, the bottom side of the upper portion 30 when viewed from the side has a length of 1/3 of the length of the upper end of the upper body 11, the bottom side of the lower portion 20 is the lower body It has a length shorter than the length of the bottom of (12) and longer than 1/1 of the length of the bottom of the lower body 12, according to this configuration wraps the nose of the mask wearer with the upper portion 30 and the The side portion 20 can wrap the jaw of the mask wearer and facilitate wearing of the mask.

In another embodiment, although not shown, the mask is of a configuration in which the upper, upper, lower and lower portions are sewn and connected together without the intermediate body, wherein the upper body is viewed from the side with respect to the vertical line. It has a left contour having an intersection angle of ˜7˚, and the upper portion is triangular or fan-shaped, and is connected to the upper center portion of the upper body at the bottom side, and has an intersection angle of 25 to 35˚ when viewed from the side with respect to the vertical line. It has a left contour, the lower body has a left contour having a cross angle of 15 to 25 degrees when viewed from the side with respect to the vertical line, the lower portion is formed in a triangular or fan shape of the lower side connected to the lower center of the lower body The left side with 45 to 55˚ cross angle A configuration having side contours is also possible. Even with such a configuration, it is possible to wear the mask to be closely adhered to the face when the mask is worn on the face by configuring the plasma mask for blocking the fine dust according to the appearance or contour of the mask wearer.

In another embodiment, the lower side of the upper portion has a length shorter than the length of the upper end of the upper body and longer than 1/2 of the length of the upper end of the upper body, the lower side of the lower portion of the lower body It has a length shorter than the length and longer than half of the length of the bottom of the lower body, by this configuration it is also possible to surround the mask wearer's nose with the upper part and to wrap the mask wearer's chin with the lower part and also to wear the mask. This becomes easy.

As mentioned above, although this invention was demonstrated in detail using the Example, the scope of the present invention is not limited to a specific Example, Comprising: It should be interpreted by the attached Claim. In addition, those of ordinary skill in the art should understand that many modifications and variations are possible without departing from the scope of the present invention.

10: mask body
11: upper body
12: main body
13: lower body
20: lower part
30: upper side
40: earring strap
100: inner filter layer
200: electrostatic filter layer
300: outer filter layer

Claims (7)

A mask body 10 composed of an upper main body 11, an intermediate main body 12, and a lower main body 13;
An upper portion 30 connected to an upper end of the mask body 10 so as to suppress inflow and outflow of air emitted during breathing, and being in close contact with a nose of a mask wearer;
A lower portion 20 connected to a lower end of the mask body 10 to cover a chin of a mask wearer; And
Earring strap 40 is connected to both ends of the mask body 10,
The upper main body 11, the intermediate main body 12, and the lower main body 13, respectively,
An outer filter layer 300 composed of a plasma-treated nonwoven fabric;
An electrostatic filter layer 200 composed of a nonwoven fabric electrostatically treated with a current of 25,000 volts and attached to an inner surface of the outer filter layer 300; And
It consists of an antibacterial deodorized natural cotton cloth comprises an inner filter layer 100 attached to the inner surface of the electrostatic filter layer 200
The portion adjacent to the central portion of the mask body 10 to surround the wearer's nose mask and is projected outward,
The plasma treatment of the nonwoven fabric is made for 3 seconds at atmospheric pressure and room temperature ,
The inner filter layer 100 is immersed for 10 seconds at 70 ℃ in a natural product solution for antibacterial deodorization,
The natural liquid is fine dust blocking mask, characterized in that the concentration of the lacquer extract in the mixed solution with water is 20% by weight . delete delete delete The method of claim 1,
The upper side portion 30 is a fine dust blocking plasma treatment mask, characterized in that the upper side, the wire to maintain a close contact in close contact with the nose of the mask wearer when wearing the mask. The method of claim 1,
The upper main body 11 has a left contour having an intersection angle of 25 degrees to 35 degrees when viewed from the side with respect to the vertical line,
The middle main body 12 has a vertical line in the upper half of the upper half when viewed from the side with respect to the vertical line, and has a left contour having a crossing angle of 2 ° to 4 ° in the lower half of the upper half. The lower half has a left contour with an angle of intersection of 15 ° to 25 °,
The lower main body 13 has a left dust outline having a cross angle of 15 ° to 25 ° when viewed from the side with respect to the vertical line. The method of claim 1,
The upper portion 30 is a plasma mask for fine dust blocking, characterized in that it comprises a sweat-absorbent quick-drying fabric padded on the inner surface.

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