KR102046293B1 - Method of fabricating the conductive transparent layer - Google Patents

Method of fabricating the conductive transparent layer Download PDF

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KR102046293B1
KR102046293B1 KR1020120048327A KR20120048327A KR102046293B1 KR 102046293 B1 KR102046293 B1 KR 102046293B1 KR 1020120048327 A KR1020120048327 A KR 1020120048327A KR 20120048327 A KR20120048327 A KR 20120048327A KR 102046293 B1 KR102046293 B1 KR 102046293B1
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transparent conductive
conductive film
pedot
pss
teos
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KR1020120048327A
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Korean (ko)
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KR20130124865A (en
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이재익
박귀홍
고유선
김길석
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엘지디스플레이 주식회사
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

The present invention comprises the steps of coating a transparent first solution, a first solvent, a solid solution composed of TEOS, PEDOT and PSS on a substrate to form a first transparent conductive film; Selectively etching the surface of the first transparent conductive film to form a plurality of fine protrusions of TEOS material; Coating a solution having hydrophobicity on the plurality of micro-projections to form a hydrophobic material pattern at each end of each of the plurality of micro-projections; Forming a second transparent conductive film having a flat surface by coating a transparent second solution in which a second solvent, PEDOT, and PSS are mixed in the spaced area between the plurality of fine protrusions to fill the spaced area. Provided are methods for preparing the membrane.

Description

Method of fabricating the transparent conductive layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive film used for a liquid crystal display device, an organic light emitting device, or the like, and more particularly, to a method for manufacturing a transparent conductive film that can suppress an increase in internal resistance even with elapse of time.

In recent years, as the society enters the full-scale information age, the display field that processes and displays a large amount of information has been rapidly developed. In recent years, as a flat panel display device having excellent performance of thinning, light weight, and low power consumption, Liquid crystal displays or organic light emitting diodes have been developed to replace existing cathode ray tubes (CRTs).

Among the liquid crystal display devices, an active matrix liquid crystal display device including an array substrate having a thin film transistor, which is a switching element capable of controlling voltage on and off, is realized in each pixel. Excellent ability is attracting the most attention.

In addition, the organic light emitting diode has a high brightness and low operating voltage characteristics, and because it is a self-luminous type that emits light by itself, it has a high contrast ratio, an ultra-thin display, and a response time of several microseconds ( Iii) It is easy to implement a moving image, there is no limit of viewing angle, it is stable even at low temperature, and it is attracting attention as a flat panel display device because it is easy to manufacture and design a driving circuit because it is driven at a low voltage of DC 5 to 15V.

In such a liquid crystal display and an organic light emitting device, an array substrate including a thin film transistor, which is essentially a switching element, is configured to remove each of the pixel areas on and off.

In the array substrate, a thin film transistor is provided as a switching or driving element for each pixel region, and a transparent electrode connected to one electrode of the thin film transistor and made of a transparent conductive material is formed.

In addition, according to a model of the liquid crystal display device, a transparent conductive material is deposited on the outer surface of the substrate to prevent destruction of the device due to the inflow of static electricity, thereby forming a transparent back electrode.

The transparent conductive material is also used as a touch electrode of a touch screen introduced into a display device, and is also used as one electrode of a solar cell.

Meanwhile, indium tin oxide (ITO) or indium zinc oxide (IZO) is the most widely used transparent conductive material forming one electrode of the transparent electrode, the transparent back electrode, the touch electrode, and the solar cell. As the cost of indium has recently risen, new transparent conductive materials are required to reduce the manufacturing cost of products. Among them, recently, TEOS (Tetraethoxysilane), PEDOT (poly (3,4-ethylenedioxythiophene)) and PSS (poly (styrenesulfonate) A mixture of)) is used.

However, the transparent conductive film made of a mixture of TEOS / PEDOT / PSS has a weakness of absorbing moisture present in the surroundings during or after the manufacturing process due to the high hydrophilicity of the constituent components.

The high moisture hygroscopicity of the transparent conductive film made of a mixture of TEOS / PEDOT / PSS causes problems such as degradation of its own properties and corrosion of peripheral components such as electrodes made of metal materials. As a result, a liquid crystal display device using a transparent conductive film made of a mixture of TEOS / PEDOT / PSS as a transparent electrode, a transparent back electrode or a touch electrode, or a solar cell using an organic light emitting device and one electrode thereof has its own electro-optical performance. The situation is falling.

The present invention has been made to solve the conventional problems, while forming a transparent conductive film consisting of a mixture of TEOS / PEDOT / PSS, while the transparent conductive film suppresses the hygroscopic characteristics, even if time passes the internal resistance of the internal characteristics of the transparent conductive film It is an object of the present invention to provide a transparent conductive film made of a mixture of TEOS / PEDOT / PSS, which hardly occurs, and whose lifespan can be improved.

In order to achieve the above object, a method of manufacturing a transparent conductive film according to an embodiment of the present invention includes a first solvent, TEOS (Tetraethoxysilane), PEDOT (poly (3,4-ethylenedioxythiophene)), and PSS (poly (styrenesulfonate)). Forming a first transparent conductive film by coating a transparent first solution having a solid content mixed thereon on a substrate; Selectively etching the surface of the first transparent conductive film to form a plurality of fine protrusions of TEOS material; Coating a solution having hydrophobicity on the plurality of micro-projections to form a hydrophobic material pattern at each end of each of the plurality of micro-projections; Forming a second transparent conductive film having a flat surface by coating a second transparent solution containing a mixture of a second solvent, PEDOT, and PSS in the spaced area between the plurality of fine protrusions.

At this time, before the coating of the solution having the hydrophobic characteristics, the cleaning process comprises a step of removing foreign matter in the spaced area between the fine projections.

In addition, forming a hydrophobic material pattern on the end of each of the plurality of micro-projections by coating a solution having a hydrophobic property over the plurality of micro-projections, coating a solution having a hydrophobic property over the plurality of micro-projections layer Forming a; Allowing the tip of the microprojections and the hydrophobic material layer to react for a few seconds to several hours at a temperature of 0 to 100 ° C .; Performing a cleaning process to remove a layer of hydrophobic material that has not reacted with the microprojections, thereby forming a pattern having hydrophobic properties corresponding to the ends of each of the plurality of microprojections.

The solution having the hydrophobic property is characterized in that the solution containing any one material of a halogen alkyl group or an organic silicon group containing fluorine or chlorine.

In addition, the first and second solvents are characterized by consisting of any one or two or more of alcohol, toluene, ethylene glycol (EG), methylene chloride (MC).

In addition, the first solution is characterized in that the first solvent has a volume ratio of 30 to 80%, the remaining volume ratio of the solid content consisting of the TEOS, PEDOT and PSS, wherein the TEOS and PEDOT and The content ratio of PSS is characterized by 10 to 200 to 1 to 20 to 1 to 100.

In addition, the first transparent conductive film has a first thickness of several nm to several mm, and each of the plurality of micro-projections is smaller than the first thickness and has a first height of several nm to several hundred nm. The spacing of each microprojection is characterized by several nanometers to several tens of nm.

In addition, the second solution has a volume ratio of 30 to 80% of the second solvent, the remaining volume ratio of the solid content consisting of the PEDOT and PSS, the content ratio of the PEDOT and PSS constituting the solid content is 10 to 200 units It is characterized by 1 to 20 to 1 to 100.

In addition, the substrate is a glass or plastic substrate, or a silicon wafer is characterized in that.

The present invention is made of a mixture of TEOS / PEDOT / PSS which is inexpensive compared to indium-tin-oxide (ITO) or indium-zinc-oxide containing expensive indium and has moisture resistance, thereby absorbing ambient moisture. Otherwise, even if time passes, changes in internal characteristics are hardly generated, and there is an effect of providing a transparent conductive film having a longer life surface than the conventional one.

In addition, when the transparent conductive film having such a characteristic is formed as a transparent electrode or a transparent back electrode of a liquid crystal display device or an organic light emitting device, it does not adversely affect corrosion of components made of metal materials by moisture resistance. As a result, the electro-optical performance of the liquid crystal display device or the organic light emitting diode is suppressed, and further, since it is cheaper than indium tin oxide (ITO) or indium zinc oxide, the final product manufacturing cost is reduced. have.

1A to 1J are cross-sectional views of steps in manufacturing a transparent conductive film using a mixture of TEOS / PEDOT / PSS according to an embodiment of the present invention.
Figure 2 is a TEOS and PEDOT and PSS transparent conductive film prepared according to the present invention and a conventional transparent conductive film of TEOS, PEDOT and PSS materials exposed to high humidity (100% humidity) after a period of electricity Graph of resistance measurement.

Hereinafter, a method of manufacturing a transparent conductive film using a mixture of TEOS (Tetraethoxysilane) and PEDOT (poly (3,4-ethylenedioxythiophene)) and PSS (poly (styrenesulfonate)) according to an embodiment of the present invention will be described with reference to the drawings. .

The method for manufacturing a transparent conductive film according to an embodiment of the present invention is characterized by largely four steps. In this case, the fourth step is to prepare a transparent conductive film having a certain range of internal resistance per unit area as an example of a specific characteristic required by appropriately adjusting the content ratio of TEOS, PEDOT and PSS, and the transparent made of TEOS, PEDOT, PSS Selectively removing PEDOT and PSS by etching the surface of the conductive film to a certain thickness to leave only a portion made of TEOS on the surface of the transparent conductive film, and giving a hydrophobic function to the portion made of TEOS exposed on the surface; Filling the PEDOT and PSS to the end of the TEOS only portion to complete the transparent conductive film with improved hydrophobic function.

The transparent conductive film prepared by the manufacturing method according to the embodiment of the present invention including the four steps of the electrical conductivity of the transparent conductive film itself due to the absorption of moisture over time by improving the moisture absorption resistance of the body while maintaining the conductivity as it is In addition, it is possible to have an effect of suppressing the deterioration of the optical characteristics, and even if the final products such as a liquid crystal display device, an organic light emitting device, a touch screen, and a solar cell having such a transparent conductive film are exposed to outdoor environments for a long time, It has an effect that does not occur to lower the electro-optical properties and the display quality.

Hereinafter, a method of manufacturing a transparent conductive film using a mixture of TEOS / PEDOT / PSS according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1A to 1J are cross-sectional views illustrating manufacturing steps of a transparent conductive film using a mixture of TEOS / PEDOT / PSS according to an exemplary embodiment of the present invention.

First, as shown in FIG. 1A, a container containing TEOS, PEDOT, and PSS in a solid state in a solvent composed of any one or two or more substances of alcohol, toluene, ethylene glycol (EG) and methylene chloride (MC) is suitable. Mixing to have a content ratio to prepare a transparent conductive material solution 103 for forming a transparent conductive film.

The transparent conductive material solution 103 is characterized in that the solvent having a volume ratio of 30 to 80%, and the solid content consisting of the TEOS, PEDOT and PSS has the remaining volume ratio.

At this time, the content ratio of TEOS, PEDOT and PSS constituting the solid is characterized in that 10 ~ 200 to 1 ~ 20 to 1 ~ 100.

Next, as shown in FIG. 1B, the transparent conductive material solution 103 prepared as described above is coated with a coating device 190, for example, a spin coating device, a slit coating device, and a bar coating. 1 having a thickness of about several nm to several mm by coating on a substrate 101 or a silicon wafer using any one of a (bar coating) device, an inkjet printing device, and a drop casting device. A differential transparent conductive material layer 105 is formed.

In this case, the substrate 101 may be a glass substrate or a plastic substrate, and what is referred to as the upper portion of the substrate 101 may be the surface of the substrate 101 itself, or is formed on the substrate 101. It may be the surface of another component.

On the other hand, the component may be a metal layer of an insulating layer or a metallic material made of an insulating material.

Next, as shown in FIG. 1C, the solvent is dried by performing a predetermined heat treatment on the first transparent conductive material layer (105 of FIG. 1B) coated on the substrate 101, and then the first transparent conductive material is cured by curing. A film 107 is formed.

In this step, the primary transparent conductive film 107 formed on the substrate 101 is made of TEOS, PEDOT, and PSS.

Next, as shown in FIGS. 1D and 1E, sodium hydroxide reacts only with PEDOT and PSS without reacting with TEOS on the surface of the first transparent conductive film 107 made of a mixture of TEOS, PEDOT, and PSS. Spray or apply an etching solution (not shown) including a single solvent composed of any one of NaOH), ethylene glycol (Ethylene Glycol), and DBE (Dibasic Ester) or a mixed solution of two or more thereof, or silver (Ag), The reaction layer 110 is formed by coating a metal paste (not shown) including any one or two of gold (Au) and copper (Cu).

Thereafter, the reaction layer 110 and the primary transparent conductive film 107 are allowed to react by being left for several seconds to several hours (for example, 1 second to 9 hours) in a temperature atmosphere of 0 to 100 ° C. On the surface of the transparent conductive film 107, a plurality of fine protrusions 108 having a height of several nm to several hundred nm made of TEOS alone are formed by removing portions of only the PEDOT and PSS except for the portion made of TEOS.

On the other hand, only the portion formed of TEOS material as a micro-projection 108 is because the TEOS is a material having a very high hydrophilic property to express a substantially hygroscopic property is to give a hydrophobic characteristic selectively only to this.

In this case, the fine protrusions 108 of the TEOS material may be sprayed or the metal paste is applied, and then the height may be adjusted by appropriately adjusting the reaction temperature and the reaction time.

A spacing interval between the fine protrusions 108 adjacent to each other is a few kW to several nm. This is attributable to the fact that the content of TEOS is greater than the content of PEDOT and PSS in the solids of the three materials forming the primary transparent conductive film 107.

That is, in the solution for forming the primary transparent conductive film, the content ratio of TEOS, PEDOT, and PSS is 10 to 200 to 1 to 20 to 1 to 100, and TEOS is about 2 to 10 times higher than PEDOT and PSS on average. Since the primary transparent conductive film was formed using a mixed solution having a large content ratio, a portion made of TEOS material on the surface has a larger area than a portion made of PEDOT and PSS material.

In this case, by appropriately adjusting the content ratio of TEOS, PEDOT, and PSS constituting the primary transparent conductive film 107, after the selective etching proceeds, it is possible to adjust the spacing interval of the fine stone period of the TEOS material.

In the exemplary embodiment of the present invention, the spacing between the fine protrusions 108 of the TEOS material is about several micrometers to several tens of nm, which becomes a very important factor in a later step. This is because the micro-projections 108 express the lotus effect. If the spacing between the micro-projections 108 is greater than several tens nm, because the lotus leaf effect is not implemented, it is because the selective hydrophobicity is not provided. This will be explained in more detail in later steps.

Next, as shown in FIG. 1F, a surface of the first transparent conductive film 107 on which the plurality of fine protrusions 108 of the TEOS material are formed is cleaned to perform the cleaning process on the reaction layer (110 in FIG. 1E) and the foreign matter. By removing the plurality of fine protrusions 108 are exposed.

Next, as shown in Figure 1g, a solution having a hydrophobic property, such as fluorine or chlorine is contained on the surface of the primary transparent conductive film 107 on which a plurality of fine protrusions 108 of the TEOS material is formed A coating device 191, for example, a spin coating device, a slit coating device, a bar coating device, is coated with a solution 115 containing a material of either a halogen alkyl group or an organic silicon group. The hydrophobic material layer 120 is formed by coating using any one of an inkjet printing apparatus and a drop casting apparatus.

In this case, the hydrophobic material layer 120 made of the hydrophobic solution 115 is a spaced area between the microprotrusions 108 due to the lotus leaf effect due to the structural characteristics of the plurality of microprotrusions 108 made of TEOS material having a hydrophilic property. With respect to the non-coated, it is in contact with only the end surface of the micro-projections 108.

The lotus leaf effect (lotus effect) is a phenomenon that the lotus leaf does not get wet and dirty. Numerous nano-sized projections are formed on the surface of the lotus leaf, and the lotus leaf itself is not wetted by water droplets due to the nano-sized projections.

Meanwhile, the primary transparent conductive film 107 having a plurality of fine protrusions 108 formed on the surface thereof contacts only the ends of the plurality of fine protrusions 108 by the lotus effect as described above. The hydrophobic material layer 120 is formed, and this state is maintained for several seconds to several hours in a temperature atmosphere of 0 to 100 ° C. so that the ends of the plurality of fine protrusions 108 and the hydrophobic material layer 120 are formed. Let it react.

In this case, an end of each of the microprojections 108 in contact with the hydrophobic material layer 120 is in a state in which the hydrophobic material layer 120 is attached to each of the microprotrusions to which the hydrophobic material layer 108 is attached. (108) The end is hydrophobic.

 Next, as shown in FIG. 1H, the hydrophobic material layer (120 of FIG. 1G) is sufficiently reacted with the plurality of fine protrusions 108, and then washed to perform a plurality of fine protrusions of the TEOS material. (108) By removing the layer of hydrophobic material (120 in FIG. 1G) that is not bonded to the tip, the microprojections 108 of TEOS material imparted hydrophobicity to only the tip are exposed. In this case, the hydrophobic material pattern 125 is attached to the end of each of the micro-projections 108 so that the ends of the plurality of micro-projections 108 have hydrophobic characteristics.

Next, as illustrated in FIG. 1I, a transparent solution 130 made of PEDOT, PSS, and a solvent is coated on the plurality of fine protrusions 108 on which a hydrophobic material pattern 125 having end hydrophobic properties is formed. For example, coating using any one of a spin coating apparatus, a slit coating apparatus, a bar coating apparatus, an ink jet printing apparatus, and a drop casting apparatus By filling in the spaced area between the fine protrusions 108 to make the surface having the plurality of fine protrusions 108 is a flat state.

On the other hand, the transparent solution is characterized by consisting of a solvent having a volume ratio of 30 to 80%, and a solid content consisting of the PEDOT and PSS having a volume ratio of 20 to 80%. The solvent is characterized by consisting of any one or two or more of alcohol, toluene, ethylene glycol (EG), methylene chloride (MC).

In addition, the content ratio of PEDOT and PSS constituting the solid having a volume ratio of 20 to 80% is 1 to 20 to 1 to 100.

On the other hand, in the case of the transparent solution 130, except for the components constituting the primary transparent conductive film and TEOS, the remaining components are the same to overcome the lotus leaf effect to fill the spaced area between the plurality of fine protrusions 108 A second transparent conductive material layer 135 having a flat surface including fine protrusions is formed.

In this state, as shown in FIG. 1J, the second conductive material layer (135 of FIG. 1I) is dried and cured by performing a heat treatment process, thereby including a plurality of fine protrusions 108 of the TEOS material therein. A secondary transparent conductive film 140 having a surface is formed.
That is, the transparent conductive film of the present invention is located on the upper surface of the primary transparent conductive film 140 (base transparent film) made of TEOS, PEDOT, PSS, and the primary transparent conductive film 140, and a plurality of fine protrusions made of TEOS ( 108, a hydrophobic material pattern 125 formed on the central surface of each of the plurality of micro-projections 108, and a filling portion formed of PEDOT and PSS while filling the plurality of micro-projections 108. By forming the hydrophobic material pattern 125 on the central surface of the fine protrusions 108, the hygroscopic property of the transparent conductive film made of TEOS, PEDOT, and PSS is suppressed.
In other words, the transparent conductive film of the present invention has a hydrophilic first portion (a portion composed of PEDOT and PSS while filling between the fine protrusions 108), and a second portion (hydrophobic material pattern) positioned between the first portion and having hydrophobicity. (125), and the moisture absorption characteristic of a transparent conductive film is suppressed by a 2nd part.

The secondary transparent conductive film 140 has the same content ratio of TEOS, PEDOT, and PSS as the primary transparent conductive film 107, and thus has conductive characteristics as an example of desired internal characteristics.

In addition, the second transparent conductive layer 140 is characterized in that the hygroscopic property is suppressed by selectively forming a hydrophobic material pattern 125 on the surface of only the portion of the TEOS having a strong hydrophilic property.

Therefore, as described above, the second transparent conductive film 140 finally made of TEOS, PEDOT, and PSS materials has a portion made of TEOS having hydrophilicity when compared with a transparent conductive film made of conventional TEOS, PEDOT, and PSS. Since the hydrophobic property is selectively provided, the moisture absorption is suppressed, so that a problem such as a rapid increase in internal resistance even after elapse of time does not occur.

Figure 2 is a transparent conductive film made of TEOS, PEDOT and PSS material prepared according to the present invention and a conventional transparent conductive film made of TEOS, PEDOT and PSS material exposed to high temperature and high humidity environment (temperature 70 ℃, 100% humidity environment) After that time is a graph measuring the electrical resistance.

As shown, in the case of the conventional transparent conductive film of TEOS, PEDOT, and PSS material that is not provided with selective hydrophobicity, it can be seen that the electrical resistance increases rapidly with time, but is manufactured according to an embodiment of the present invention The transparent conductive film made of TEOS, PEDOT, and PSS has no rapid change in electrical resistance even with time in a high humidity environment.

The change in the internal electrical resistance of the transparent conductive film is caused by moisture absorption. When the internal electric resistance becomes large, the conductive property is weakened. When used as one electrode of the solar cell is to quickly reduce the role as an electrode shortens the life of the product, the change in the resistance of the electrode adversely affects the display quality in the case of the display device.

The transparent conductive film made of TEOS, PEDOT, and PSS material according to the present invention is selectively hydrophobic in response to a portion composed of TEOS having strong hydrophilic properties, so that moisture absorption is suppressed, thereby extending the life of a product using the electrode. In addition, it has the effect of ensuring the reliability.

The present invention described above is not limited to the above-described embodiment and the accompanying drawings, and it is obvious that various forms of substitution, modification and change can be made without departing from the spirit of the present invention.

101: substrate
107: primary transparent conductive film
108: fine protrusion
125: hydrophobic material pattern
140: secondary transparent conductive film

Claims (12)

A first transparent conductive film was coated by coating a transparent first solution containing a first solvent and a solid content composed of TEOS (Tetraethoxysilane), PEDOT (poly (3,4-ethylenedioxythiophene)) and PSS (poly (styrenesulfonate)). Forming;
Selectively etching the surface of the first transparent conductive film to form a plurality of fine protrusions of TEOS material;
Coating a solution having hydrophobicity on the plurality of micro-projections to form a hydrophobic material pattern at each end of each of the plurality of micro-projections;
Forming a second transparent conductive film having a flat surface by coating a second transparent solution containing a mixture of a second solvent, PEDOT, and PSS in the spaced area between the plurality of fine protrusions.
Method for producing a transparent conductive film comprising a.
The method of claim 1,
Before the coating of the solution having the hydrophobic properties, a cleaning process comprising the step of removing foreign matter in the spaced area between the fine projections.
The method of claim 1,
Forming a hydrophobic material pattern on the end of each of the plurality of micro-projections by coating a solution having a hydrophobic property over the plurality of micro-projections,
Coating a solution having hydrophobic properties on the plurality of microprojections to form a hydrophobic material layer;
Allowing the tip of the microprojections and the hydrophobic material layer to react for a few seconds to several hours at a temperature of 0 to 100 ° C .;
Forming a pattern having hydrophobic properties corresponding to the ends of each of the plurality of microprotrusions by removing a layer of hydrophobic material not reacted with the microprotrusions by performing a washing process;
Method for producing a transparent conductive film comprising a.
The method of claim 1,
The solution having a hydrophobic characteristic is a method for producing a transparent conductive film, characterized in that the solution containing any one material of a halogen alkyl group or an organic silicon group containing fluorine or chlorine.
The method of claim 1,
The first and second solvent is a method for producing a transparent conductive film, characterized in that made of any one or two or more of alcohol, toluene, ethylene glycol (EG), methylene chloride (MC).
The method of claim 1,
The first solution is a method for producing a transparent conductive film, characterized in that the first solvent has a volume ratio of 30 to 80%, the remaining volume ratio of the solid content consisting of the TEOS, PEDOT and PSS.
The method of claim 6,
Method for producing a transparent conductive film, characterized in that the content ratio of TEOS, PEDOT and PSS constituting the solid content is from 10 to 200 to 1 to 20 to 1 to 100.
The method of claim 1,
The first transparent conductive film has a first thickness of several nm to several mm,
Wherein each of the plurality of microprojections is less than the first thickness and has a first height of several nm to several hundred nm,
The spacing interval of each of the plurality of micro-projections is a method of producing a transparent conductive film, characterized in that several nm to several tens of nm.
The method of claim 1,
The second solution has a volume ratio of 30 to 80% of the second solvent, the remaining volume ratio of the solid consisting of the PEDOT and PSS, the content ratio of the PEDOT and PSS constituting the solid content is 10 ~ 200 to 1 ~ The manufacturing method of the transparent conductive film characterized by being 20 to 1-100.
The method of claim 1,
The substrate is a glass or plastic substrate, or a silicon wafer, characterized in that the manufacturing method of the transparent conductive film. A base transparent film made of TEOS, PEDOT, and PSS;
A plurality of fine protrusions disposed on an upper surface of the base transparent film and formed of TEOS;
A hydrophobic material pattern formed on a central surface of each of the plurality of fine protrusions;
Filler made of PEDOT, PSS while filling between the plurality of fine protrusions
Transparent conductive film comprising a.
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KR20030057935A (en) * 2001-12-29 2003-07-07 주식회사 하이닉스반도체 Method For Manufacturing The Capacitor
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KR20050068860A (en) * 2003-12-30 2005-07-05 엘지.필립스 엘시디 주식회사 Upper substrate for use in dual-plate organic electroluminescent device and method for fabricating the same
KR101086162B1 (en) * 2004-10-29 2011-11-25 엘지디스플레이 주식회사 Method for fabricating thin film
KR101296651B1 (en) * 2006-12-20 2013-08-14 엘지디스플레이 주식회사 Method of manufacturing Organic Electroluminescent Device
KR101212672B1 (en) * 2008-12-26 2012-12-14 제일모직주식회사 Conductive polymer, polymer composition, film and organic photoelectric device comprising same
KR101886303B1 (en) * 2012-05-07 2018-08-07 엘지디스플레이 주식회사 Method of forming silica thin film layer having nano-structure patterns

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