KR101995821B1 - Array Substrate For Reflective Display Device And Method Of Fabricating The Same - Google Patents

Array Substrate For Reflective Display Device And Method Of Fabricating The Same Download PDF

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KR101995821B1
KR101995821B1 KR1020120107402A KR20120107402A KR101995821B1 KR 101995821 B1 KR101995821 B1 KR 101995821B1 KR 1020120107402 A KR1020120107402 A KR 1020120107402A KR 20120107402 A KR20120107402 A KR 20120107402A KR 101995821 B1 KR101995821 B1 KR 101995821B1
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South Korea
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reflective
layer
scattering particles
reflected
reflection
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KR1020120107402A
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Korean (ko)
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KR20140040553A (en
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권오남
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엘지디스플레이 주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention, the substrate; A switching element formed on the substrate; A protective layer formed on the switching element; A reflection layer formed on the protective layer and including a base and scattering particles scattered on the base; An array substrate for a reflective display device is formed on the reflective layer and includes a pixel electrode connected to the switching device.

Description

Array substrate for reflective display device and manufacturing method thereof {Array Substrate For Reflective Display Device And Method Of Fabricating The Same}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an array substrate for a reflective display device, and more particularly to an array substrate for a reflective display device including a reflective layer composed of scattering particles and an organic material and a manufacturing method thereof.

A flat panel display (FPD) can be classified into a light emitting type for displaying an image by emitting light by itself and a light receiving type for displaying an image using an external light source. plasma panel display (PDP), field emission display (FED), organic light emitting diode (OLED), etc., and the light-receiving display device is a liquid crystal display (Liquid Crystal Display: LCD).

Among them, liquid crystal displays are widely applied to notebooks and desktop monitors because of their excellent resolution, color display, and image quality.

A liquid crystal display device is disposed by facing two substrates, called array substrates and color filter substrates, forming a liquid crystal layer between the two substrates, and then applying an electric voltage generated by applying a voltage to two electrodes respectively formed on the two substrates. It is a device that displays an image by adjusting the light transmittance by moving the liquid crystal molecules.

However, a liquid crystal display device, which is a light receiving display device, generally requires a separate light source, and thus, a backlight unit is disposed on the back of the liquid crystal panel, and the light of the backlight unit is supplied to the liquid crystal panel to be used for image display. .

A liquid crystal display device including a backlight unit is called a transmissive liquid crystal display device. Since the liquid crystal display device uses an artificial light source such as a backlight unit, a bright image can be realized even in a dark external environment, but the power consumption of the backlight unit is large. There is this.

In order to make up for the disadvantages of the transmissive liquid crystal display, a reflective liquid crystal display has been proposed.

The reflective liquid crystal display device displays an image by allowing external natural light or artificial light to be incident on the image display area and then reflecting the light again, thereby reducing power consumption by using the backlight unit.

An array substrate of such a reflective liquid crystal display will be described with reference to the drawings.

1 is a view showing a conventional array substrate for a reflective liquid crystal display device.

As shown in FIG. 1, a conventional array substrate 10 for a reflective liquid crystal display device includes a substrate 20, a thin film transistor (T) T formed on the substrate 20, and a thin film transistor (T) T formed on the substrate 20. And a pixel electrode 52 connected to the thin film transistor T.

In detail, a gate wiring (not shown) and a gate electrode 32 connected to the gate wiring are formed on the substrate 20 including the pixel region P, and gate insulation is formed on the gate wiring and the gate electrode 32. Layer 34 is formed.

The semiconductor layer 36 is formed on the gate insulating layer 34 corresponding to the gate electrode 32, and the source electrode 42 and the drain electrode 44 which face each other and are spaced apart from each other above the semiconductor layer 36. Is formed.

In addition, a data wiring 40 connected to the source electrode 42 is formed on the gate insulating layer 34.

Here, the gate electrode 32, the semiconductor layer 36, the source electrode 42, and the drain electrode 44 constitute a thin film transistor T.

A passivation layer 46 is formed on the thin film transistor T. The passivation layer 46 includes a contact hole 50 exposing the drain electrode 44, and protrudes upward on the passivation layer 46. A plurality of embossed patterns 48 are formed.

The pixel electrode 52 connected to the drain electrode 44 through the contact hole 50 is formed on the passivation layer 46 and the plurality of embossed patterns 48. The pixel electrode 52 has a reflectance such as a metal material. It is formed of a relatively high material and serves as a reflective layer, and has a shape protruding upward along a plurality of embossed patterns 48.

The planarization layer 54 is formed on the pixel electrode 52, and the planarization layer 54 serves to planarize the protruding shape of the lower pixel electrode 52.

In the conventional reflective liquid crystal display array substrate 10, the external light passing through the color filter substrate (not shown) and the liquid crystal layer (not shown) is reflected by the pixel electrode 52, and the liquid crystal layer and the color filter are again. The image is displayed by passing through the substrate to the user.

The reason why the pixel electrode 52 has a protruding shape is to prevent specular reflection such as reflection from a mirror and to improve viewing angle characteristics by allowing the incident light to be diffusely reflected in the protruding shape of the pixel electrode 52. .

When the pixel electrode is formed not to have a protruding shape, specular reflection occurs at the pixel electrode, and as a result, the reflective liquid crystal display does not have a Lambertian reflection characteristic (paper-like characteristic) and the viewing angle characteristic is deteriorated. .

However, in the reflective liquid crystal display array substrate 10 including the protruding pixel electrode 52, the protective layer 46, the plurality of embossed patterns 48, and the planarization layer 54 are separately provided. Since it should be formed, there is a problem that the manufacturing process is complicated.

In addition, the reflectance and luminance of the reflective liquid crystal display are relatively low due to the protruding pixel electrode 52, and as a result, the contrast ratio is relatively low.

SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and by providing a reflective layer including scattering particles, it is possible to provide an array substrate for a reflective display device having improved reflectivity and contrast ratio and having Lambertian reflection characteristics and a method of manufacturing the same. The purpose.

Another object of the present invention is to provide an array substrate for a reflective display device having a reflectance, a contrast ratio and a light efficiency, and having a Lambertian reflection characteristic by using a reflection layer and a reflection plate including scattering particles, and a method of manufacturing the same. do.

In order to solve the above problems, the present invention, the substrate; A switching element formed on the substrate; A protective layer formed on the switching element; A reflection layer formed on the protective layer and including a base and scattering particles scattered on the base; An array substrate for a reflective display device is formed on the reflective layer and includes a pixel electrode connected to the switching device.

Here, the base may be made of an organic material, and the scattering particles may be made of white metal oxide.

The scattering particles may include at least one of titanium oxide (TiO 2) and barium oxide (BaO 2).

In addition, the scattering particles may have a composition ratio of 15wt% to 50wt%.

The array substrate for a reflective display device may further include a reflective plate formed between the protective layer and the reflective layer.

In addition, the reflector may be made of a metal material.

On the other hand, the present invention, forming a switching element on the substrate; Forming a reflective layer including a base and scattering particles on the switching device; A method of manufacturing an array substrate for a reflective display device includes forming a pixel electrode connected to the switching element on the reflective layer.

The forming of the reflective layer may include dispersing scattering particles in a solution containing an organic material; It may comprise the step of coating the solution on the protective layer.

The organic material may be a photosensitive organic material, and the method of manufacturing an array substrate for a reflective display device may further include forming a contact hole exposing the switching element by exposing, developing, and etching the coated solution. Can be.

According to the present invention, by forming a reflective layer including scattering particles under the pixel electrode, reflectance and contrast ratio can be improved and Lambertian reflection characteristics can be ensured.

In addition, the present invention has the effect of improving the reflectance and contrast ratio as well as the light efficiency by forming a reflective layer and a reflecting plate including scattering particles under the pixel electrode.

1 is a view showing a conventional array substrate for a reflective liquid crystal display device.
2 is a plan view showing an array substrate for a reflective liquid crystal display device according to a first embodiment of the present invention;
3 is a cross-sectional view taken along the line III-III of FIG. 2.
4 is a cross-sectional view showing an array substrate for a reflective liquid crystal display device according to a second embodiment of the present invention.
5 is an enlarged view of a portion A of FIG. 4;

Hereinafter, an array substrate for a reflective display device according to the present invention will be described with reference to the accompanying drawings.

2 is a plan view illustrating an array substrate for a reflective liquid crystal display device according to a first exemplary embodiment of the present invention, and FIG. 3 is a cross-sectional view taken along the line III-III of FIG. 2.

2 and 3, the array substrate 110 for a reflective liquid crystal display device according to the first embodiment of the present invention includes a substrate 120 and a thin film transistor formed on the substrate 120. thin film transistor: TFT (T) and a pixel electrode 156 connected to the thin film transistor (T).

In detail, a gate electrode 132 connected to the gate wiring 130 and the gate wiring 130 is formed on the substrate 120 including the plurality of pixel regions P, and the gate wiring 130 and the gate electrode are formed. A gate insulating layer 134 is formed on the upper portion of 132.

The semiconductor layer 136 is formed on the gate insulating layer 134 corresponding to the gate electrode 132, and the source electrode 142 and the drain electrode 144 are spaced apart from each other while facing each other above the semiconductor layer 136. Is formed.

The data line 140 connected to the source electrode 142 is formed on the gate insulating layer 134.

Here, the gate electrode 132, the semiconductor layer 136, the source electrode 142, and the drain electrode 144 constitute a thin film transistor T, and the data line 140 crosses the gate line 130 to form a pixel. Define the area P.

The thin film transistor T serves as a switching element that transfers the data signal supplied to the data line 140 to the pixel electrode 156 according to the gate signal supplied to the gate line 130.

The passivation layer 146 is formed on the thin film transistor T, and the reflective layer 150 is formed on the passivation layer 146.

The reflective layer 150 includes a base 151 and scattering particles 152 scattered in the base 151.

The base 151 may be made of an organic material. In particular, when the base 151 is made of a photosensitive organic material such as photo acryl, a coating process of a separate photoresist may be omitted.

The scattering particles 152 may be formed of a metal oxide having a white color such as titanium oxide (TiO 2 ) and barium oxide (BaO 2 ).

In the first exemplary embodiment, the reflective layer 150 is integrally connected to the front surface of the substrate 120, but in another exemplary embodiment, the reflective layer 150 is formed for each of the plurality of pixel areas P of the substrate 120. It may be formed in a separate type to be separated.

The reflective layer 150 and the protective layer 146 include a contact hole 154 exposing the drain electrode 144.

The process of forming the reflective layer 150 will be described briefly. After the scattering particles 152 are dispersed in a solution containing an organic material, the organic material solution in which the scattering particles 152 are dispersed is coated on the protective layer 146. (coating) and heat treatment to cure (curing).

For example, the scattering particles 152 may have a composition ratio of about 15 wt% to about 50 wt% with respect to the organic material solution, and the organic material and the scattering particles 152 may be determined in consideration of refractive index matching.

Thereafter, the contact hole 154 is formed through a photolithography process including photoresist coating, exposure, development, and etching.

In this case, when the base 151 is formed of the photosensitive organic material, since the contact hole 154 is formed by exposing, developing and etching the coated photosensitive organic material, the photoresist coating step may be omitted.

In addition, a pixel electrode 156 connected to the drain electrode 144 through the contact hole 154 is formed on the reflective layer 150, and the pixel electrode 156 is indium-tin oxide (ITO). ) Or a transparent conductive material such as indium-zinc-oxide (IZO).

In the array substrate 110 for a reflective liquid crystal display device according to the first embodiment of the present invention, external light passing through the color filter substrate (not shown), the liquid crystal layer (not shown), and the pixel electrode 156 is a reflective layer. Reflected at 150, the image is displayed by being passed back to the user through the pixel electrode 156, the liquid crystal layer, and the color filter substrate.

Here, the external light incident on the reflective layer 150 is reflected by the scattering particles 152 scattered on the base 151, the scattering particles 152 in various positions, such as the top, middle, bottom of the base 151 Since the external light is reflected at various positions of the scattering particles 152, and the external light reflected by one scattering particle 152 may be reflected by the other scattering particles 152, the reflected light of the external light may have various directions. Is diffusely reflected.

As a result of measuring the reflection characteristics of the reflective layer 150 using a diffused light source, an average reflectance of about 56.4% was obtained, which is an average of about 49.8% of the conventional protruding pixel electrode 52 of FIG. 1. It was found that the value was improved by about 13% compared to the reflectance.

Accordingly, the reflectance and contrast ratio are improved, mirror reflection such as reflection from the mirror is prevented, and the reflective liquid crystal display device can secure Lambertian paper-like characteristics, and the viewing angle characteristics are improved. .

Meanwhile, in order to improve the light efficiency, a reflector may be further formed below the reflective layer 150, which will be described with reference to the accompanying drawings.

4 is a cross-sectional view illustrating an array substrate for a reflective liquid crystal display device according to a second exemplary embodiment of the present invention, corresponding to cutting line III-III of FIG. 2, and FIG. 5 is an enlarged view of portion A of FIG. 4. It is a figure for demonstrating a reflection path.

As shown in FIG. 4, the array substrate 210 for a reflective liquid crystal display device according to the second embodiment of the present invention includes a substrate 220 and a thin film transistor formed on the substrate 220. : TFT) (T) and a pixel electrode 256 connected to the thin film transistor (T).

In detail, a gate wiring (not shown) and a gate electrode 232 connected to the gate wiring are formed on the substrate 220 including the plurality of pixel regions P, and on the gate wiring and the gate electrode 232. The gate insulating layer 234 is formed.

The semiconductor layer 236 is formed on the gate insulating layer 234 corresponding to the gate electrode 232, and the source electrode 242 and the drain electrode 244 which face each other and are spaced apart from each other above the semiconductor layer 236. Is formed.

The data wiring 240 connected to the source electrode 242 is formed on the gate insulating layer 234.

Here, the gate electrode 232, the semiconductor layer 236, the source electrode 242, and the drain electrode 244 constitute a thin film transistor T, and the data wiring 240 crosses the gate wiring so that the pixel region P is crossed. ).

The thin film transistor T serves as a switching element that transfers the data signal supplied to the data line 240 to the pixel electrode 256 according to the gate signal supplied to the gate line.

The passivation layer 246 is formed on the thin film transistor T, and the reflective plate 248 is formed on the passivation layer 246.

The reflector 248 may be made of a metal material having a relatively high reflectance such as aluminum alloys such as aluminum (Al) and aluminum-neodymium (AlNd), silver (Ag), and silver alloy (Ag alloy).

In the second embodiment, the reflective plate 248 is spaced apart from the pixel electrode 256 and is integrally connected to the front surface of the substrate 220. However, in another embodiment, the reflective plate 248 may include a plurality of substrates 220. Each of the pixel regions P may be formed in a separate type, and the reflecting plate 248 may be connected to the pixel electrode 256 of each pixel region P in contact with each other.

The reflective plate 248 is used to improve reflection efficiency (ie, light efficiency) by a recycling process of reflecting external light not reflected in the upper direction of the reflective layer 250 back to the reflective layer 250. The specific principle is explained later.

The reflective layer 250 is formed on the reflective plate 248.

The reflective layer 250 includes a base 251 and scattering particles 252 dispersed in the base 251.

The base 251 may be made of an organic material. In particular, when the base 251 is made of a photosensitive organic material such as photo acryl, a coating process of a separate photoresist may be omitted.

The scattering particles 252 may be formed of a metal oxide having a white color such as titanium oxide (TiO 2 ) and barium oxide (BaO 2 ).

In the second exemplary embodiment, the reflective layer 250 is formed integrally connected to the front surface of the substrate 220. However, in another exemplary embodiment, the reflective layer 250 is formed for each pixel area P of the substrate 220. It may be formed in a separate type to be separated.

The reflective plate 248, the reflective layer 250, and the protective layer 246 include a contact hole 254 exposing the drain electrode 244.

Briefly describing the formation process of the reflective layer 250, after the scattering particles 252 are dispersed in a solution containing an organic material, the organic material solution in which the scattering particles 252 are dispersed is coated on the protective layer 246. (coating) and heat treatment to cure (curing).

For example, the scattering particles 252 may have a composition ratio of about 15 wt% to about 50 wt% with respect to the organic material solution, and the organic material, the scattering particles 252, and the reflecting plate 248 in consideration of refractive index matching. It is possible to determine the metal material of.

Thereafter, the contact hole 254 is formed through a photolithography process including photoresist coating, exposure, development, and etching.

In this case, when the base 251 is formed of the photosensitive organic material, since the contact hole 254 is formed by exposing, developing, and etching the coated photosensitive organic material, the photoresist coating step may be omitted.

In addition, a pixel electrode 256 connected to the drain electrode 244 through the contact hole 254 is formed on the reflective layer 250, and the pixel electrode 256 is formed of indium-tin oxide (ITO). ) Or a transparent conductive material such as indium-zinc-oxide (IZO).

In the reflective liquid crystal display array substrate 210 according to the second embodiment of the present invention, external light passing through the color filter substrate (not shown), the liquid crystal layer (not shown), and the pixel electrode 256 is reflected. Reflected by the 250 and the reflective plate 248, the image is displayed by being passed back to the user through the pixel electrode 256, the liquid crystal layer, and the color filter substrate.

Here, the external light incident on the reflective layer 250 is reflected by the scattering particles 252 and the reflecting plate 248 scattered on the base 251, the scattering particles 252 is the top, middle, Existing light is present at various locations such as the lower part, and external light is reflected at various positions of the scattering particles 252, and external light reflected from one scattering particle 252 may be reflected again at another scattering particle 252. Reflected light of light is diffusely reflected in various directions.

In addition, external light that is not reflected in the upper direction of the reflective layer 250 is reflected by the reflector 248, and is incident on the reflective layer 250 to be reflected by the scattering particles 252.

That is, as shown in FIG. 5, when the first to third incident lights IL1 to IL3 having the same incident angle enter the upper surface of the reflective layer 250, the first incident light IL1 is formed at the lower portion of the reflective layer 250. Reflected by the first scattering particles 252a and emitted as the first reflection light RL1 having a first reflection angle a1 with respect to the normal line N of the upper surface of the reflection layer 250, the second incident light IL2 is the reflection layer 250. Is reflected by the second scattering particles 252b on the upper side of the light emitting element 252b and is emitted as the second reflection light RL2 having a second reflection angle a2 greater than the first reflection angle a1 with respect to the normal line N of the upper surface of the reflective layer 250. The third incident light IL2 is reflected by the third to sixth scattering particles 252c to 252f of the reflective layer 250 and then reflected again by the reflective plate 248 to the normal line N of the upper surface of the reflective layer 250. It is emitted to the third reflection light RL3 having a third reflection angle a3 that is larger than the first reflection angle a1 and smaller than the second reflection angle a2.

Therefore, the first to third incident lights IL1 to IL3 having the same incident angle are reflected by the reflective layer 250 and the reflector 248 and are emitted to the first to third reflected lights RL1 to RL3 having different reflection angles.

As a result of measuring the reflection characteristics of the reflective layer 250 using the diffused light source, an average reflectance of about 57.8% was obtained, which is an average of about 49.8% of the conventional protruding pixel electrode 52 of FIG. 1. It was found that the value was improved by about 16% compared to the reflectance.

Accordingly, reflectance and contrast ratio are improved, and specular reflection such as reflection from a mirror is prevented, so that a reflective liquid crystal display device can obtain Lambertian reflection characteristics (paper-like characteristics), and viewing angle characteristics are improved. At the same time, the light efficiency and the reflection efficiency are improved by recycling.

In the above description, an array substrate for a reflective liquid crystal display device has been described as an example, but the reflective layer including the base layer and the scattering particles of the organic material and the reflective plate under the reflective layer may be a reflective electrowetting display (EWD) or a reflective type. It can be applied to both reflective display devices such as electrofluidic display (EFD).

Although the above has been described with reference to a preferred embodiment of the present invention, those skilled in the art various modifications and changes of the present invention without departing from the spirit and scope of the present invention described in the claims below I can understand that you can.

120: substrate 130: gate wiring
T: thin film transistor 140: data wiring
150: reflective layer 156: pixel electrode

Claims (11)

A substrate including a plurality of pixel regions;
A switching element formed in each of the plurality of pixel regions on the substrate;
A protective layer formed on the switching element;
A reflection layer formed on the protective layer and including a base and scattering particles scattered on the base;
A pixel electrode formed in each of the plurality of pixel regions on the reflective layer and connected to the switching element
Including,
The reflective layer is separated for each of the plurality of pixel regions,
External light incident to the reflective layer through the pixel electrode is reflected by the scattering particles,
The scattering particles are reflective substrate having a composition ratio of 15wt% to 50wt%.
The method of claim 1,
And the base is made of an organic material, and the scattering particles are made of a white metal oxide.
The method of claim 2,
The scattering particles include at least one of titanium oxide (TiO 2 ) and barium oxide (BaO 2 ).
delete The method of claim 1,
And a reflective plate formed between the protective layer and the reflective layer.
The method of claim 5,
The reflective plate is an array substrate for a reflective display device made of a metal material.
Forming a switching element on the substrate including a plurality of pixel regions;
Forming a protective layer on the switching element;
Forming a reflective layer including a base and scattering particles on the protective layer;
Forming a pixel electrode connected to the switching element in each of the plurality of pixel regions on the reflective layer;
Including,
The reflective layer is separated for each of the plurality of pixel regions,
External light incident to the reflective layer through the pixel electrode is reflected by the scattering particles,
The scattering particles are a manufacturing method of the array substrate for a reflective display device having a composition ratio of 15wt% to 50wt%.
The method of claim 7, wherein
Forming the reflective layer,
Dispersing scattering particles in a solution containing an organic material;
Coating the solution on top of the protective layer
Method of manufacturing an array substrate for a reflective display device comprising a.
The method of claim 8,
The organic material is a photosensitive organic material,
And forming a contact hole for exposing the switching element by exposing, developing, and etching the coated solution. The method of claim 5,
The reflective plate is divided into each of the plurality of pixel areas, the array substrate for a reflective display device connected in contact with the pixel electrode.
The method of claim 5,
First to third incident light having the same incident angle is incident on the reflective layer,
The first incident light is reflected by the scattering particles and emitted as a first reflection light having a first reflection angle with respect to the normal of the reflection layer,
The second incident light is reflected by the scattering particles and emitted as a second reflection light having a second reflection angle greater than the first reflection angle with respect to the normal of the reflection layer,
The third incident light is reflected by the scattering particles and reflected by the reflecting plate again to be reflected by the third reflecting light having a third reflecting angle greater than the first reflecting angle and smaller than the second reflecting angle with respect to the normal of the reflecting layer. Array board for display devices.
KR1020120107402A 2012-09-26 2012-09-26 Array Substrate For Reflective Display Device And Method Of Fabricating The Same KR101995821B1 (en)

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KR100959683B1 (en) * 2001-12-28 2010-05-26 엘지디스플레이 주식회사 reflective liquid crystal display devices and manufacturing method of the same
JP2009524083A (en) * 2006-01-13 2009-06-25 エヌテラ リミテッド Reflective display device
JP4932421B2 (en) * 2006-10-13 2012-05-16 株式会社 日立ディスプレイズ Liquid crystal display device and manufacturing method thereof

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