KR101961688B1 - Coloring structure and method for manufacturing coloring structure - Google Patents

Coloring structure and method for manufacturing coloring structure Download PDF

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Publication number
KR101961688B1
KR101961688B1 KR1020170027751A KR20170027751A KR101961688B1 KR 101961688 B1 KR101961688 B1 KR 101961688B1 KR 1020170027751 A KR1020170027751 A KR 1020170027751A KR 20170027751 A KR20170027751 A KR 20170027751A KR 101961688 B1 KR101961688 B1 KR 101961688B1
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South Korea
Prior art keywords
thin film
porosity
coloring structure
coloring
deposition
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KR1020170027751A
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Korean (ko)
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KR20180101044A (en
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송영민
유영진
주건우
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광주과학기술원
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Priority to KR1020170027751A priority Critical patent/KR101961688B1/en
Priority to PCT/KR2018/002513 priority patent/WO2018160025A1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/007—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Astronomy & Astrophysics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

A coloring structure using a porous medium according to an exemplary embodiment of the present invention includes a reflector and a thin film that is obliquely deposited on the reflector. The thin film has a porous extinction coefficient formed by the oblique deposition, / RTI >

Description

TECHNICAL FIELD [0001] The present invention relates to a coloring structure and a method for manufacturing a coloring structure,

The present invention relates to a coloring structure and a method for producing the coloring structure.

More particularly, the present invention relates to a coloring structure including a thin film made of a porous dielectric material on a reflector, and a method of manufacturing the same.

Korean Patent Laid-Open Publication No. 2016-0114030 discloses a technique of widening the range of color expression by changing the refractive index using a dielectric material having a high dielectric constant. That is, a reflective display device including a photonic crystal in which nanoparticles of a high-refractive index dielectric are distributed in a crystal form is disclosed.

Also, in the case of U.S. Patent Publication No. 2013-0170044, an optical film having a crystallized porous layer is disclosed. In this patent, an optical filter comprises a light-transmissive substrate and an optical coating, which is deposited on a light-transmissive substrate and has at least one layer of crystallized nano-numerals. Such a nano-numerical layer is deposited using high temperature oblique deposition and has a lower refractive index than the refractive index of the light transmissive substrate.

Conventional methods have many difficulties in fabrication due to complicated multi-layer structure or photonic crystal structure. Recently, a dielectric material having absorption properties is coated on a metal layer, and a simple and effective coloring structure is proposed using the interference effect of light reflected from each interface.

However, in general, it is difficult to control the thickness in the actual fabrication process and the range of color expression is limited because the color change according to the thickness of the dielectric material having absorbing property which can be used in the proposed structure is abrupt.

The present invention has been devised to overcome the above-mentioned problems, and it is an object of the present invention to provide a porous medium capable of adjusting a color change according to thickness by applying a porosity to a dielectric material layer having absorption properties in the structure of the prior art, And a method for producing the color-forming structure.

Specifically, a method of fabricating a coloring structure and a coloring structure using a porous medium in which a change in color is exhibited by changing the refractive index by applying porosity to a medium and varying the reflection effect by interference by varying the thickness of the medium to which the porosity is applied It has its purpose.

A coloring structure according to an embodiment of the present invention includes a reflector; And a thin film of a porous medium deposited on the reflector and having an extinction coefficient.

The reflector may be a metal capable of reflecting light.

The porous medium having the extinction coefficient may be made of a dielectric material.

The dielectric material may comprise at least one of germanium or amorphous silicon.

The porosity of the thin film may be 0 to 80%.

The thickness of the thin film may be 5 to 100 nm.

The porosity of the thin film may differ depending on the deposition angle at the time of depositing the thin film.

The change in color emitted from the coloring structure may be slower as the porosity of the thin film is higher than when the porosity of the thin film is lower than the lower porosity of the thin film.

The higher the porosity of the thin film, the lower the extinction coefficient at the same wavelength.

The higher the porosity of the thin film, the lower the refractive index at the same wavelength.

A method of fabricating a coloring structure according to another embodiment of the present invention may include depositing a thin film made of a porous medium having an extinction coefficient on the reflector.

In the deposition step, the porosity of the thin film is adjusted by changing the deposition angle.

In the deposition step, the thickness of the thin film is adjusted by changing the deposition time.

According to an embodiment of the present invention, the color change can be controlled by adjusting the thickness of the thin film made of the porous dielectric material, the range of the color expression can be widened, and the material having a narrow color expression range can be expanded through the porosity have.

In addition, it can be applied as a flexible device because it can express colors in an ultra thin film form.

In addition, the process for producing the color-forming structure is simple, and manpower and cost required for manufacturing the color-forming structure can be reduced.

As described above, due to the wide color range of the color-forming structure and the manufacturing cost reduction, it can be applied to various fields such as a reflective display, a wearable device, and an application requiring metal coloring.

1 is a schematic view of a coloring structure using a porous medium according to an embodiment of the present invention.
FIG. 2 is a graph showing changes in the characteristics of the medium depending on the porosity.
FIG. 3 is a flowchart briefly showing a method of manufacturing a coloring structure according to this embodiment.
4 is a view showing a structure of a coloring structure using a porous medium according to the deposition angle manufactured according to the present embodiment.
5 is a view showing a coloring structure using a porous medium according to porosity produced according to the present embodiment.
FIG. 6 is a graph showing the coloring structure and the reflectance according to the structure of the coloring structure, the deposition angle and the thickness of the thin film according to the present embodiment.
FIG. 7 is a graph showing the reflectance of the coloring structure according to the material forming the reflector or the thin film according to the present embodiment.

Hereinafter, a coloring structure according to an embodiment of the present invention and a method of manufacturing the same will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It is to be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but on the contrary, is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are enlarged to illustrate the present invention in order to clarify the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a part or a combination thereof is described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

1 is a schematic view of a coloring structure using a porous medium according to an embodiment of the present invention.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

The coloring structure 100 according to an embodiment of the present invention may include a reflector 120 and a thin film 110 deposited on the reflector 120.

Here, the reflector 120 may be made of a material capable of reflecting light, and more specifically, may be made of a metal having a high light reflectivity.

For example, the reflector 120 of the coloring structure according to the present embodiment may be formed of one of gold (Au), silver (Ag), titanium (Ti), platinum (Pt), chromium (Cr) .

The thin film 110 deposited on the top of the reflector 120 may be made of a dielectric material having a light absorbing property. That is, the thin film 110 may be a semiconductor material having a porosity and a dielectric material having an extinction coefficient.

For example, the thin film 110 of the coloring structure according to the present embodiment may be made of one of germanium (Ge) or amorphous-silicon (a-Si).

Specifically, the dielectric material having the absorptive properties constituting the thin film 110 can be deposited on the reflector 120 to have porosity. That is, the porosity of the material constituting the thin film 110 can be adjusted by changing the deposition angle at the time of vapor deposition.

In addition, when the thickness of the thin film 110 is varied by adjusting the deposition time, the color change can be adjusted accordingly, and the color expression range can be expanded.

This effect is due to the change of the refractive index. When the porosity is applied to the medium, the refractive index of the medium changes, and the reflection effect due to interference due to the thickness of the medium changes due to the change of the refractive index. .

That is, such a coloring structure generally uses a metal having electric conductivity as a reflector, and thus can be used for color-forming a coating on a metal. In addition, it has the advantage of being capable of color coating while maintaining electrical conductivity.

FIG. 2 is a graph showing changes in the characteristics of the medium depending on the porosity.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

Referring to the refractive index graph 210 of the medium according to porosity, it can be seen that the refractive index gradually decreases as the porosity of the medium increases.

Referring to the reflectance graph 220 of the medium according to the porosity, it can be seen that the reflectance of light varies depending on the porosity of the medium. Since the reflectance of light differs depending on the wavelength, the reflectance of light gradually decreases with increasing wavelength, and the reflectance of light is increased again when a certain wavelength or more is applied.

Therefore, when the porosity of the medium is increased, the reflectivity of the medium with respect to the wavelength range of the medium is gradually decreased as the porosity of the medium is varied depending on the porosity of the medium according to an embodiment of the present invention. When the light having a specific wavelength or more is applied, the reflectance of light increases as the porosity of the medium increases.

Referring to the absorptivity graph 230 of the medium according to the porosity according to an embodiment of the present invention, it can be seen that the extinction coefficient gradually decreases as the porosity of the medium increases.

This phenomenon utilizes the property that the medium has a porosity and the effective refractive index changes. Since the reflection characteristic changes according to the porosity, fine color control is possible and the color expression range is improved.

That is, according to the present invention, it is possible to manufacture a coloring structure having a simple ultra thin film structure, capable of color adjustment, and capable of expressing various colors.

3 is a flowchart illustrating a method of fabricating a coloring structure using a porous medium according to an exemplary embodiment of the present invention.

Hereinafter, one embodiment of the present invention will be described with reference to FIG. 1 and FIG.

The method of fabricating a coloring structure using a porous medium according to an embodiment of the present invention may include depositing a thin film made of a porous medium having an extinction coefficient on the reflector.

In the deposition step, the porosity of the thin film may be adjusted by changing the deposition angle, or the thickness of the thin film may be adjusted by changing the deposition time.

In one embodiment, the oblique deposition process conditions are set according to the desired porosity of the thin film 110 to be deposited on the metal reflector 120, and then the angle of the sample holder and the deposition time are controlled And the thin film 110 is deposited.

The type of the thin film 110, the porosity of the thin film 110 to be deposited, or the porosity of the thin film 110 to be deposited can be expressed so as to express the color range to be expressed, since the color expressed in the coloring structure varies depending on the porosity of the thin film 110. [ The deposition angle and the deposition time can be adjusted accordingly.

Here, the thin film 110 may be made of a dielectric material having an absorption property, and may be one of germanium (Ge) or amorphous-silicon (a-Si). Depending on the nature of the deposited dielectric material or the porosity of the dielectric material, conditions for the oblique deposition process can be set.

The porosity of the thin film 110 can be adjusted according to the deposition angle of the thin film 110 and the deposition angle of the thin film 110 can be adjusted according to the set value of the angle of the sample holder.

Specifically, when the thin film 110 is deposited by setting the deposition angle of the thin film 110 to be large, the porosity of the thin film 110 can be increased. In contrast, when the thin film 110 is deposited by setting the deposition angle of the thin film 110 to be small, the porosity of the thin film 110 can be reduced.

The thickness of the thin film 110 can be adjusted according to the deposition time of the oblique deposition process. The thickness of the thin film 110 can be set according to the color to be formed by the coloring structure, and the thicker the thin film 110, the longer the deposition time.

That is, according to the method for producing a coloring structure, a color coating can be effected while maintaining electrical conductivity on a metal having electrical conductivity in general.

4 is a view showing a coloring structure using a porous medium according to the deposition angle manufactured according to the present embodiment.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

In the coloring structure 400 manufactured according to an embodiment of the present invention, the deposition angle at the time of thin film deposition is related to the porosity.

Specifically, the oblique deposition process can control porosity according to the deposition angle. As the deposition angle of the deposited thin film increases, the porosity of the material constituting the thin film can be increased.

More specifically, porosity 0%, 40%, 60%, and 75% may correspond to deposition angles 0 °, 30 °, 45 °, and 70 °, respectively.

Referring to FIG. 4, it can be seen that the porosity of the color-forming structure 410 having a deposition angle of 0 ° is 0%, and it is confirmed that the porosity of the thin film is also increased as the deposition angle of the thin film formed with the same medium gradually increases .

For example, when the deposition angle is 30 °, the porosity of the case where the deposition angle is 45 ° is higher than that when the deposition angle is 30 °, and when the deposition angle is 70 ° (440) 420 and a deposition angle of 45 degrees (430).

5 is a view showing a coloring structure using a porous medium according to porosity produced according to the present embodiment.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

FIG. 2 is a graph illustrating a color expression range according to a porosity difference of a thin film manufactured according to an embodiment of the present invention. FIG.

According to an embodiment of the present invention, germanium is vapor deposited on a reflector made of gold having a very high reflectance using an oblique deposition process to produce a coloring structure. The oblique deposition process is a process which can control the porosity according to the deposition angle, and the deposition angle is controlled by controlling the angle of the sample holder using an electron beam evaporator for the oblique deposition.

Referring to a graph 520 showing a color expression range according to a coloring structure 510 in which a thin film is deposited on a reflector with a porosity and a thickness different from each other, You can see that the color is different.

In other words, it can be seen that the color of the fabricated coloring structure varies depending on the thickness and the porosity of the thin film, and it is possible to finely control the color with the porosity rather than adjusting the color only with the conventional thin film thickness, Can be implemented.

In addition, a graph 520 showing a color expression range according to a coloring structure 510 in which a thin film is deposited on a reflector with a porosity and a thickness different from each other is shown. As the porosity of the thin film increases, .

FIG. 6 is a graph showing the coloring structure and the reflectance according to the structure of the coloring structure using the porous medium, the deposition angle and the thickness of the thin film according to the present embodiment.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

As a result of checking the color representation of each of the coloring structures 620 according to the deposition angle and the thickness of the thin film according to an embodiment of the present invention, as the deposition angle of the thin film is decreased, the color change is abruptly increased as the deposition thickness of the thin film is increased can confirm. It can be seen that the color change is slower as the deposition angle of the thin film increases and as the deposition thickness of the thin film increases.

It can be seen that the reflectance (630) of the color-forming structure depending on the deposition angle of the thin film gradually decreases as the deposition angle increases.

Also, it can be seen that as the wavelength of the light increases as the deposition angle of the thin film increases, the critical wavelength value at which the reflectance increases or decreases is decreased.

FIG. 7 is a graph showing the reflectance of the coloring structure according to the material forming the reflector or the thin film according to the present embodiment.

Hereinafter, one embodiment of the present invention will be described with reference to FIG.

According to an embodiment of the present invention, the reflector may be made of titanium, platinum, chromium, gold, silver or copper, and the thin film may be made of germanium or amorphous silicon.

That is, it can be seen that various colors can be expressed in a fine and wide range according to the porosity of metals capable of reflecting light and dielectric materials having an extinction coefficient.

In addition, it can be seen that the coloring structure to which the porous structure is applied to each thin film has a wider color range than that of the coloring structure to which the porous structure is not applied.

In addition, it can be confirmed that the range of colors that can be expressed differs depending on the material constituting the thin film or the reflector.

The description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features presented herein.

100: coloring structure using a porous medium
110: Thin film
120: reflector
200: Graph of changes in properties of medium depending on porosity
210: Refractive index graph of medium with porosity
220: Reflectivity graph of medium with porosity
230: Extinction coefficient graph of medium with porosity
300: Method for producing a coloring structure using a porous medium
400: Structure of coloring structure using porous media according to deposition angle
410: a coloring structure having a deposition angle of 0
420: a coloring structure having an evaporation angle of 30 °
430: a coloring structure having a deposition angle of 45
440: a color developing structure having an evaporation angle of 70
500: Coloring structure using porous medium according to porosity
510: A color-forming structure in which a thin film is deposited by varying porosity and thickness at the top of a reflector
520: Graph showing the color expressing range according to the color-forming structure in which the thin film was deposited with different porosity and thickness at the upper part of the reflector
600: Graph of the coloring structure and reflectance according to the structure of the coloring structure using the porous medium, the deposition angle and the thickness of the thin film
610: Structure of coloring structure using porous media according to deposition angle
620: Coloring structure according to deposition angle and thickness of thin film
630: Reflectance of the coloring structure depending on the deposition angle of the thin film
700: Graph of the reflectance of the color-forming structure depending on the material constituting the reflector or the thin film
710: reflectance of a-Si / Ti coloring structure
720: reflectance of a-Si / Pt coloring structure
730: reflectance of a-Si / Cr coloring structure
740: Reflectance of a Ge / Au coloring structure
750: reflectance of a Ge / Ag coloring structure
760: Reflectance of a Ge / Cu coloring structure

Claims (13)

A reflector made of a metal capable of reflecting light; And
And a thin film made of germanium (Ge), which is a porous medium deposited on a reflector made of a metal capable of reflecting the light, and having an extinction coefficient based on the porosity of the thin film adjusted according to the deposition angle,
Wherein the thickness of the thin film is 5 to 100 nm,
Coloring structure.
delete The method according to claim 1,
Wherein the porous medium having the extinction coefficient is made of a dielectric material,
Coloring structure. The method of claim 3,
Wherein the dielectric material comprises amorphous silicon,
Coloring structure. The method according to claim 1,
Wherein the porosity of the thin film is 0 to 80%
Coloring structure. delete delete The method according to claim 1,
Wherein the change in color emitted from the coloring structure is slower as the porosity of the thin film is higher than when the porosity of the thin film is lower,
Coloring structure. The method according to claim 1,
The higher the porosity of the thin film, the lower the extinction coefficient at the same wavelength,
Coloring structure. The method according to claim 1,
The higher the porosity of the thin film, the lower the refractive index at the same wavelength,
Coloring structure. Depositing a thin film made of germanium (Ge), which is a porous medium having an extinction coefficient based on the porosity of the thin film, adjusted on the basis of the deposition angle, on a reflector composed of a metal capable of reflecting light,
Wherein the thickness of the thin film is 5 to 100 nm,
A method for producing a coloring structure.
delete 12. The method of claim 11,
In the depositing step,
And the thickness of the thin film is adjusted by changing the deposition time.
A method for producing a coloring structure.
KR1020170027751A 2017-03-03 2017-03-03 Coloring structure and method for manufacturing coloring structure KR101961688B1 (en)

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PCT/KR2018/002513 WO2018160025A1 (en) 2017-03-03 2018-03-02 Coloring structure and coloring structure manufacturing method

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KR102371554B1 (en) * 2019-12-17 2022-03-07 부산대학교 산학협력단 Large-area ultra-thin film color developing structure and method of preparing thereof
KR102608670B1 (en) * 2021-04-26 2023-12-04 주식회사 포엘 Color based virus detector

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EP0389274B1 (en) * 1989-03-22 1994-07-13 Alcan International Limited Optical interference structures incorporating porous films
KR100784338B1 (en) * 2005-08-04 2007-12-13 인하대학교 산학협력단 Manufacturing method for low refractive index thin film and antireflection coating method using it
KR100968208B1 (en) * 2008-05-30 2010-07-06 인하대학교 산학협력단 Circularly polarized light conversion element and brightness enhancing element and the fabrication method thereof
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