KR101887212B1 - Novel silazane copolymer, composition for forming silica layer and method for manufacturing silica layer, and silica layer - Google Patents
Novel silazane copolymer, composition for forming silica layer and method for manufacturing silica layer, and silica layer Download PDFInfo
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- KR101887212B1 KR101887212B1 KR1020150140510A KR20150140510A KR101887212B1 KR 101887212 B1 KR101887212 B1 KR 101887212B1 KR 1020150140510 A KR1020150140510 A KR 1020150140510A KR 20150140510 A KR20150140510 A KR 20150140510A KR 101887212 B1 KR101887212 B1 KR 101887212B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/16—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
Abstract
There is provided a silazane copolymer comprising a structural unit represented by the formula (1) and a structural unit represented by the formula (2). The present invention also provides a composition for forming a silica film containing the copolymer, a method for producing a silica film, and a silica film produced therefrom.
The definitions of the above formulas (1) and (2) are as described in the specification.
Description
The present invention relates to a novel silazane copolymer, a composition for forming a silica film containing the copolymer, a production method of the silica film, and a silica film produced thereby.
In a flat panel display device, a thin film transistor (TFT) including a gate electrode, a source electrode, a drain electrode, and a semiconductor is used as a switching element, and a gate line for transmitting a scanning signal for controlling the thin film transistor And a data line for transmitting a signal to be applied to the pixel electrode are provided in the flat panel display. In addition, an insulating film for separating the semiconductor and the various electrodes is formed.
The insulating film can be obtained from a composition containing a silicon-containing polymer such as polysilazane. If a film is formed using a polymer such as perhydro-polysilazane, a crack may occur after curing at a thickness above a certain thickness, which may adversely affect the yield and reliability of the device.
One embodiment provides a novel silazane copolymer capable of implementing dense films.
Another embodiment provides a composition for forming a silica film which is excellent in porosity and capable of forming a stable film.
Another embodiment provides a method for producing a silica film using the composition for forming a silica film.
Another embodiment provides a silica film with minimized cracking and stress.
According to one embodiment, there is provided a silazane copolymer comprising a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2).
[Chemical Formula 1]
(2)
In the above Formulas 1 and 2,
R 1 to R 3 are each independently and independently hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted A substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, An unsubstituted alkoxy group, a carboxyl group, an aldehyde group, a hydroxy group, or a combination thereof,
R 4 to R 7 are each independently hydrogen, a substituted or unsubstituted C1 to C3 alkyl group, a substituted or unsubstituted C6 to C10 aryl group, or a combination thereof,
R 8 to R 11 are each independently hydrogen, a hydroxy group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted C1 to C10 alkyl group, or a combination thereof,
* Is the connection point.
In Formula 2, at least one of R 4 and R 6 is a substituted or unsubstituted methyl group, and at least one of R 5 and R 7 may be a substituted or unsubstituted methyl group.
The copolymer may include the structural unit represented by Formula 1 and the structural unit represented by Formula 2 at a weight ratio of 50:50 to 99: 1.
According to another embodiment, there is provided a composition for forming a silica film comprising the above-described silazane copolymer, and a solvent.
The solvent is selected from the group consisting of benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydronaphthalene, dipentene, pentane, hexane, heptane, At least one selected from the group consisting of ethyl cyclohexane, methyl cyclohexane, cyclohexane, cyclohexene, p-menthane, dipropyl ether, dibutyl ether, anisole, butyl acetate, amyl acetate, methyl isobutyl ketone, . ≪ / RTI >
The silazane copolymer may be contained in an amount of 0.1 to 30% by weight based on the total amount of the composition.
According to still another embodiment, there is provided a method for producing a silica film, comprising the steps of: applying a composition for forming a silica film described above on a substrate; drying the substrate coated with the composition for forming a silica film; and curing in an atmosphere containing an inert gas at 150 DEG C or higher The method comprising the steps of:
According to another embodiment, there is provided a silica film formed according to the above-described manufacturing method.
It is possible to provide a silica film which can realize a thin thickness while minimizing cracking and stress.
The embodiments of the present invention will be described in detail so that those skilled in the art can easily carry out the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
In the drawings, the thicknesses are enlarged to clearly indicate layers and regions. Like parts are designated with like reference numerals throughout the specification. Whenever a portion of a layer, film, region, plate, or the like is referred to as being "on" another portion, it includes not only the case where it is "directly on" another portion, but also the case where there is another portion in between. Conversely, when a part is "directly over" another part, it means that there is no other part in the middle.
Unless otherwise defined herein, "substituted" means that the hydrogen atom in the compound is a halogen atom (F, Br, Cl, or I), a hydroxy group, an alkoxy group, a nitro group, a cyano group, an amino group, A carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, an alkyl group, an alkenyl group of C2 to C16, a C2 to C16 alkenyl group, An aryl group, C7 to C13 arylalkyl, C1 to C4 oxyalkyl, C1 to C20 heteroalkyl, C3 to C20 heteroarylalkyl, cycloalkyl, C3 to C15 cycloalkenyl, C6 to C15 Substituted by a substituent selected from a cycloalkynyl group, a heterocycloalkyl group, and combinations thereof.
In addition, unless otherwise defined herein, "hetero" means containing 1 to 3 heteroatoms selected from N, O, S and P.
In the present specification, "*" means the same or different atom or part connected to a chemical formula.
Hereinafter, the silazane copolymer according to one embodiment of the present invention will be described.
The silazane copolymer according to one embodiment includes a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2).
[Chemical Formula 1]
(2)
In the above Formulas 1 and 2,
R 1 to R 3 are each independently and independently hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted Or a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C7 to C30 arylalkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, An unsubstituted alkoxy group, a carboxyl group, an aldehyde group, a hydroxy group, or a combination thereof,
R 4 to R 7 are each independently hydrogen, a substituted or unsubstituted C1 to C3 alkyl group, a substituted or unsubstituted C6 to C10 aryl group, or a combination thereof,
R 8 to R 11 are each independently hydrogen, a hydroxyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted C1 to C10 alkyl group, or a combination thereof,
* Is the connection point.
The silazane copolymer includes both the structural unit represented by the formula (1) and the structural unit represented by the formula (2). Accordingly, even when a film having a thickness of 1 占 퐉 or less is formed, cracks are hardly generated on the surface of the film, and film stress can be minimized.
In Formula 1, any one of R 1 to R 3 may be, for example, hydrogen, or a substituted or unsubstituted C1 to C30 alkyl group, for example, R 2 may be hydrogen.
In Formula 2, at least one of R 4 and R 6 may be, for example, a substituted or unsubstituted methyl group, and at least one of R 5 and R 7 may be a substituted or unsubstituted methyl group. For example, the structural unit represented by the formula (2) may have a symmetrical structure. For example, R 4 and R 5 may be the same group, and R 6 and R 7 may be the same group.
The silazane copolymer includes both the structural unit represented by the formula (1) and the structural unit represented by the formula (2), but the content ratio thereof is not particularly limited. For example, the content of the structural unit represented by the formula (2) may be less than the content of the structural unit represented by the formula (1). For example, the content of the structural unit represented by the formula (1) May be included in a weight ratio of 50:50 to 99: 1. In this case, the structural unit represented by the general formula (2) plays the role of a kind of crosslinking agent and the crack resistance of the film formed can be further secured.
The silazane copolymer may be obtained by copolymerizing a compound having a moiety represented by the formula (1) and a compound having a moiety represented by the formula (2). For example, the compound having a moiety represented by Formula 1 may be a polymer having a weight average molecular weight ranging from 800 to 2,500 g / mol and a weight average molecular weight ranging from 3,000 to 8,000 g / mol. For example, the compound having a moiety represented by Formula 1 may be a polymer having a weight average molecular weight (Mw) / number average molecular weight (Mn) ratio (Mw / Mn) of 6 to 12, no.
The silazane copolymer may have a weight average molecular weight of, for example, 3,000 to 160,000 g / mol, but is not limited thereto.
According to another embodiment, there is provided a composition for forming a silica film comprising the above-described silazane copolymer and a solvent.
The copolymer may be contained in an amount of 0.1 to 30% by weight based on the total amount of the composition. When it is included in the above-mentioned range, an appropriate viscosity can be maintained and it can be formed evenly and without voids at the time of film formation.
The solvent contained in the composition for forming a silica film is not particularly limited as long as it is a solvent capable of dissolving polysilazane, polysiloxazane, and polysiloxane in addition to the silazane copolymer. Specific examples thereof include benzene, toluene, xylene, ethylbenzene, di But are not limited to, ethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydronaphthalene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethylcyclohexane, methylcyclohexane, cyclohexane, at least one selected from the group consisting of p-menthane, dipropyl ether, dibutyl ether, anisole, butyl acetate, amyl acetate, methyl isobutyl ketone, and combinations thereof.
The composition for forming a silica film may further include a thermal acid generator (TAG).
The thermal acid generator is an additive for improving the developability of the composition for forming a silica film, and can be developed at a relatively low temperature.
The thermal acid generator is not particularly limited as long as it is a compound capable of generating acid (H + ) by heat, but it can be activated at 90 DEG C or higher to generate sufficient acid and have low volatility.
The thermal acid generators may be selected from, for example, nitrobenzyl tosylate, nitrobenzyl benzene sulfonate, phenol sulfonate, and combinations thereof.
The thermal acid generator may be included in an amount of 0.01 to 25% by weight based on the total amount of the composition for forming a silica film, and if it is included in the range, it can be developed at a relatively low temperature and the coating property can be improved.
The composition for forming a silica film may further comprise a surfactant.
The surfactant is not particularly limited, and examples thereof include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether and polyoxyethylene oleyl ether, polyoxyethylene nonylphenol ether And polyoxyethylene alkyl allyl ethers such as polyoxyethylene alkyl allyl ether, polyoxyethylene / polyoxypropylene block copolymers, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, polyoxyethylene sorbitol Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan tristearate; polyoxyethylene sorbitan fatty acid esters such as Flax EF301, EF303 and EF352 Manufactured by Dainippon Ink and Chemicals, Inc.), Megafac F171 and F173 (manufactured by Dainippon Ink and Chemicals, Inc.), Prorad FC430 and FC431 (manufactured by Sumitomo 3M Ltd.) Fluorine surfactants such as Asahi Guard AG710, SHAPLON S-382, SC101, SC102, SC103, SC104, SC105 and SC106 (manufactured by Asahi Glass Co., Ltd.), organosiloxane polymer KP341 (Shinetsu Kagaku Kogyo Co., Ltd.) and other silicone surfactants.
The surfactant may be included in an amount of 0.001 to 10% by weight based on the total amount of the composition for forming a silica film. When the surfactant is included in the above range, the dispersibility of the solution can be improved and the uniformity of the film thickness can be increased.
According to another embodiment of the present invention, there is provided a method of manufacturing a semiconductor device, comprising: applying a composition for forming a silica film described above onto a substrate; Drying the substrate coated with the composition for forming a silica film; And curing under an inert gas atmosphere at about 150 ° C or higher.
The composition for forming a silica film can be applied by a solution process, and can be applied by a method such as spin-on coating, slit coating, inkjet printing or the like.
The substrate may be, for example, a device substrate such as semiconductor or liquid crystal, but is not limited thereto.
According to another embodiment of the present invention, there is provided a silica film produced according to the above-described method. The silica film may be, for example, an insulating film, a separation film, a hard coating film, or the like, but is not limited thereto.
According to another embodiment of the present invention, there is provided an electronic device including a silica film produced according to the above-described method. The electronic device may be a display device such as an LCD or an LED, or a semiconductor device.
Hereinafter, embodiments of the present invention will be described in detail with reference to embodiments. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention.
Synthetic example
Synthetic example 1: 1,4-bis ( dimethylsilyl ) benzene synthesis
In a three-necked flask (100 ml) equipped with a stopper, a reaction stirrer, a thermometer and a rubber septum, 50 ml of anhydrous tetrahydrofuran (THF), 1,4-dibromobenzene ) And 1.1 g of magnesium turnings, and the reaction solution was stirred at the temperature of about 65 캜 for 1 hour.
100 ml of anhydrous tetrahydrofuran (THF) and 4.1 g of chlorodimethylsilane were placed in another three-necked flask (250 ml) equipped with a stirrer, a thermometer and a rubber septum in a nitrogen atmosphere, Lt; / RTI >
Then, while stirring the 250 ml flask in an iced water bath, 50 ml of the reaction solution stirred in a 100 ml flask is taken out and added to the 250 ml flask over 1 hour. The temperature of the reaction solution is maintained at about 65 DEG C and the mixture is vigorously stirred for 2 hours.
After stirring, 50 ml of ammonium chloride aqueous solution was added, followed by further stirring for 20 minutes. Thereafter, the organic layer was separated, washed twice with 50 ml of distilled water and once with 50 ml of saturated brine. This was purified by silica gel column chromatography to obtain 2.9 g of a colorless liquid of 1,4-bis (dimethylsilyl) benzene represented by the following Chemical Formula 2-1.
[Formula 2-1]
Synthetic example 2: Synthesis of 1,4-bis (methyl (phenyl) silyl) benzene
The synthesis was carried out in the same manner as in Synthesis Example 1, except that 6.7 g of chloromethylphenylsilane (chloromethylphenylsilane) was used instead of 4.1 g of chlorodimethylsilane in Synthesis Example 1, 4.6 g of a colorless liquid of 1,4-bis (methyl (phenyl) silyl) benzene was obtained.
[Formula 2-2]
Silazan Synthesis of Copolymer
Synthetic example 3
A reactor having a capacity of 2 L and equipped with a temperature control device was replaced with dry nitrogen. Then, 1,500 g of dry pyridine was poured into the reactor, and the mixture was kept at 20 ° C. Subsequently, 100 g of dichlorosilane was slowly added over 1 hour. Then, 70 g of ammonia was gradually added thereto over 3 hours while stirring. Next, dry nitrogen was injected for 30 minutes to remove ammonia remaining in the reactor. The resulting white slurry product was filtered through a 1 mu m teflon filter in a dry nitrogen atmosphere to obtain 1,000 g of a filtrate. The filtered filtrate was added to a 2 L stirred vessel and stirred. Subsequently, 5 wt% of 1,4-bis (dimethylsilyl) benzene prepared in Synthesis Example 1 was gradually added over 3 hours and further stirred for 5 hours. 1,000 g of dry xylene was added thereto, and the operation of replacing the solvent with xylene in pyridine using a rotary evaporator was repeated three times in total to adjust the solid content concentration to 20%. Finally, the pore size was adjusted to 0.03 탆 Of a Teflon filter. The obtained silazane copolymer had SiH 3 / SiH (total) of 0.22 and a weight average molecular weight of 4,000.
Synthetic example 4
A silazane copolymer having SiH 3 / SiH (total) of 0.24 and a weight average molecular weight of 4,200 was obtained in the same manner as in Synthesis Example 3 except that 10 wt% of 1,4-bis (dimethylsilyl) benzene was used.
Synthetic example 5
A silazane copolymer having a SiH 3 / SiH (total) of 0.27 and a weight average molecular weight of 4,400 was obtained in the same manner as in Synthesis Example 3 except that 30 wt% of 1,4-bis (dimethylsilyl) benzene was used.
Synthetic example 6
A silazane copolymer having SiH 3 / SiH (total) of 0.28 and a weight-average molecular weight of 4,600 was obtained in the same manner as in Synthesis Example 3 except that 50 wt% of 1,4-bis (dimethylsilyl) benzene was used.
Synthesis Example 7
Using 1,4-bis (dimethylsilyl) in the same manner as in Synthesis Example 3 except that 5 wt% with a 1,4-bis (methyl (phenyl) silyl) benzene prepared from benzene instead of Synthesis Example 2 3 SiH / A silazane copolymer having SiH (total) of 0.29 and a weight average molecular weight of 4,500 was obtained.
Comparative Synthetic Example One
A reactor having a capacity of 2 L and equipped with a temperature control device was replaced with dry nitrogen. Then, 1,500 g of dry pyridine was poured into the reactor, and the mixture was kept at 20 ° C. Subsequently, 100 g of dichlorosilane was slowly added over 1 hour. Then, 70 g of ammonia was gradually added thereto over 3 hours while stirring. Next, dry nitrogen was injected for 30 minutes to remove ammonia remaining in the reactor. The resulting white slurry product was filtered through a 1 mu m teflon filter in a dry nitrogen atmosphere to obtain 1,000 g of a filtrate. 1,000 g of dry xylene was added thereto, and the operation of replacing the solvent with xylene in pyridine using a rotary evaporator was repeated three times in total to adjust the solid content concentration to 20%. Finally, the pore size was adjusted to 0.03 탆 Of a Teflon filter. The obtained polysilazane had an oxygen content of 3.8%, SiH 3 / SiH (total) of 0.22, and a weight average molecular weight of 4,000.
Preparation of composition for silica film formation
Example 1 to 5
The silazane copolymers obtained in Synthesis Examples 3 to 7 were mixed with xylene to have a solid content of 20% by weight to prepare silica film forming compositions.
Comparative Example One
The polysilazane obtained in Comparative Synthesis Example 1 was mixed with xylene so as to have a solid content of 20% by weight to prepare a composition for forming a silica film.
Silica film crack Confirmation of occurrence
3 ml of each of the compositions for forming a silica film obtained in Examples 1 to 5 and Comparative Example 1 was coated on a silicon wafer by spin coating and pre-baked at 150 ° C for 3 minutes and wet-cured at 300 ° C (wet-curing) was performed to form a thin film. The cracks of the thin film formed thereafter were confirmed by naked eye and optical microscope, and the film thickness was measured.
The analysis and evaluation apparatus used are as follows.
* Thickness: Reflectometry film thickness meter manufactured by K-MAC, ST-4000
* Spin coating: MS-A200 manufactured by MIKASA
* Curing: SJF-1000 manufactured by Sungjinsemitec
The evaluation results are shown in Table 1.
The presence or absence
Referring to Table 1, no cracks were observed in both the naked eye and the optical microscopic observation of the thin films according to Examples 1 to 5. On the other hand, cracks were observed in both the naked eye and the optical microscopic observation of the thin film according to Comparative Example 1.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. And falls within the scope of the present invention.
Claims (10)
[Chemical Formula 1]
(2)
In the above formulas (1) and (2)
R 1 to R 3 are all hydrogen,
R 4 to R 7 are each independently hydrogen, a C1 to C3 alkyl group, or a C6 to C10 aryl group,
R 8 to R 11 are each independently hydrogen or a C1 to C10 alkyl group,
* Is the connection point,
However, the copolymer contains the structural unit represented by Formula 1 and the structural unit represented by Formula 2 at a weight ratio of 50:50 to 99: 1.
Wherein at least one of R 4 and R 6 in Formula 2 is a methyl group and at least one of R 5 and R 7 is a methyl group.
[Chemical Formula 1]
(2)
In the above formulas (1) and (2)
R 1 to R 3 are all hydrogen,
R 4 to R 7 are each independently hydrogen, a C1 to C3 alkyl group, or a C6 to C10 aryl group,
R 8 to R 11 are each independently hydrogen or a C1 to C10 alkyl group,
* Is the connection point,
However, the copolymer contains the structural unit represented by Formula 1 and the structural unit represented by Formula 2 at a weight ratio of 50:50 to 99: 1.
At least one of R 4 and R 6 in Formula 2 is a methyl group, and at least one of R 5 and R 7 is a methyl group.
The solvent is selected from the group consisting of benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, decahydronaphthalene, dipentene, pentane, hexane, heptane, At least one selected from the group consisting of ethyl cyclohexane, methyl cyclohexane, cyclohexane, cyclohexene, p-menthane, dipropyl ether, dibutyl ether, anisole, butyl acetate, amyl acetate, methyl isobutyl ketone, Wherein the silica film forming composition comprises:
Wherein the silazane copolymer is contained in an amount of 0.1 to 30% by weight based on the total amount of the composition.
Drying the substrate coated with the composition for forming a silica film, and
Curing in an atmosphere containing an inert gas at 150 DEG C or higher
≪ / RTI >
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