KR101833888B1 - Optical apparatus, high efficiency optical detection apparatus and plasma processing apparatus having the same - Google Patents

Abstract

An optical apparatus, a high-efficiency spectroscopic measuring instrument having the same, and a plasma processing apparatus are disclosed. An optical apparatus according to an embodiment of the present invention includes a first light emitted from an object plane of a plasma light source, a second light emitted from a front region of the object plane, and a third light emitted from a rear region of the object plane A focusing optical focusing lens; And a blocking plate disposed on an image forming surface of the first light beam focused by the light focusing lens and having a blocking surface formed in an area surrounding the imaging point of the first light beam and blocking the focusing beam of the second light beam and the focusing beam of the third light beam at the same time And an aperture for passing and diffracting the focusing light of the first light through the blocking plate to be formed at the imaging point of the first light; A lens unit for collecting the first light diffracted through the aperture; And an optical fiber into which the first light collected by the lens unit is incident. According to the embodiments of the present invention, the optical signal collection efficiency can be adaptively improved for various changes of the plasma light source.

Description

TECHNICAL FIELD [0001] The present invention relates to an optical device, a high-efficiency spectrometer having the same, and a plasma processing apparatus using the same. BACKGROUND ART [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical apparatus, a spectroscopic instrument and a plasma processing apparatus having the same, and more particularly, to an optical apparatus having high light collection efficiency, a high sensitivity spectroscopic instrument and a plasma processing apparatus having the same.

2. Description of the Related Art [0002] In the course of manufacturing semiconductors or display devices, a plasma processing apparatus is used to perform etching or the like. A plasma processing apparatus is a device for processing a substrate by applying a high-frequency energy to generate plasma in a chamber. BACKGROUND OF THE INVENTION [0002] Plasma diagnostic techniques using spectroscopic measurements emitted from atoms or molecules have been widely used in semiconductor manufacturing processes. Spectroscopy technology can measure light emitted from various sources (atoms, radicals, molecules) in a plasma process and has the advantages of non-penetration, real-time and simple measurement.

Conventionally, there is a case where the optical fiber approaches the vicinity of the chamber or a lens is installed in front of the optical fiber, but the consideration of the light collection efficiency is not properly made. Particularly in recent years, as semiconductor feature sizes have become smaller, process conditions such as small etch areas, low pressure, low RF power have been preferred. However, in such process conditions, since the intensity of the light emitted from the process plasma is low, the spectral measurement signal is reduced, which makes it difficult to measure the plasma characteristics.

The present invention provides an optical device capable of increasing optical signal collection efficiency, a high-efficiency spectroscopic measuring instrument having the same, and a plasma processing apparatus.

The present invention also provides an optical apparatus capable of adaptively increasing optical signal collection efficiency with respect to various changes of a plasma light source, a high-efficiency spectroscopic measurement apparatus having the same, and a plasma processing apparatus.

The problems to be solved by the present invention are not limited to the above-mentioned problems. Other technical subjects not mentioned will be apparent to those skilled in the art from the description below.

An optical apparatus according to an aspect of the present invention includes a first light emitted from a predetermined objective plane of a plasma light source, a second light emitted from a front region of the predetermined object plane, and a second light emitted from a rear side of the predetermined object plane A light focusing lens for focusing the third light emitted from the region; A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light; A lens unit for collecting the first light diffracted through the opening; And an optical fiber into which the first light collected by the lens unit is incident.

The optical device may further include a lens moving unit that moves the light focusing lens in a direction of an optical axis of the light focusing lens.

The predetermined object surface may be located on an end face of the plasma light source far from the light focusing lens.

The diameter of the opening may depend on the size of the plasma light source or the size of the substrate processed by the plasma light source.

The optical device may include a plurality of light transmitting portions including the light selecting portion, the lens portion, and the optical fiber, and the plurality of light transmitting portions may have different diameters of the openings.

Wherein the plurality of light transmitting portions are provided so as to correspond one-to-one with the sizes of the plurality of different plasma light sources, wherein the plurality of light transmitting portions have a diameter of the lens portion, a distance between the opening portion and the optical fiber from the lens portion They may be formed to be different from each other.

The optical device may be installed in a translucent window of a plasma processing chamber and the plurality of optical transmissive portions may be installed at different locations surrounding the plasma processing chamber.

A driving unit for driving the plurality of light transmitting units to move the light transmitting unit corresponding to the size of the plasma light source or the size of the substrate in the plasma processing chamber to a position for light collection among the plurality of light transmitting units, As shown in FIG.

The optical fiber may transmit the first light to an analyzer for analyzing a spectrum of the first light and measuring a plasma state.

The optical device may further include a moving unit that moves the light transmitting unit including the light selecting unit, the lens unit, and the optical fiber in the optical axis direction of the light focusing lens.

According to another aspect of the present invention, there is provided an optical apparatus including: an optical device for collecting and transmitting light emitted from a plasma light source; And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state, the optical apparatus comprising: a first light emitted from a predetermined objective plane of the plasma light source; A light focusing lens for focusing the second light emitted from the front region of the object plane and the third light emitted from the rear region of the predetermined object plane; A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light; A lens unit for collecting the first light diffracted through the opening; And an optical fiber for receiving the first light collected by the lens unit and transmitting the incident first light to the analyzing unit.

According to another aspect of the present invention, there is provided a plasma processing apparatus comprising: a plasma processing chamber for forming a plasma light source to plasma process a substrate; An optical device for collecting and transmitting light emitted from the plasma light source; And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state, the optical apparatus comprising: a first light emitted from a predetermined objective plane of the plasma light source; A light focusing lens for focusing the second light emitted from the front region of the object plane and the third light emitted from the rear region of the predetermined object plane; A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light; A lens unit for collecting the first light diffracted through the opening; And an optical fiber that receives the first light collected by the lens unit and transmits the incident first light to the analysis unit.

According to the embodiment of the present invention, an optical apparatus capable of increasing optical signal collection efficiency, a high-efficiency spectroscopic measurement apparatus having the same, and a plasma processing apparatus are provided.

According to an embodiment of the present invention, there is provided an optical device capable of adaptively increasing optical signal collection efficiency with respect to various changes of a plasma light source, a high-efficiency spectroscopic measuring instrument including the same, and a plasma processing apparatus.

The effects of the present invention are not limited to the effects described above. Unless stated, the effects will be apparent to those skilled in the art from the description and the accompanying drawings.

1 is a cross-sectional view schematically showing a plasma processing apparatus 10 including a spectroscope 100 according to an embodiment of the present invention.
FIG. 2 is an enlarged cross-sectional view showing an optical apparatus constituting the spectroscopic instrument 100 according to an embodiment of the present invention.
3 is a perspective view of a light selection unit 140 constituting an optical device according to an embodiment of the present invention.
4 is a view for explaining the action of the light focusing lens 110 and the light selecting unit 140 constituting the optical device according to the embodiment of the present invention.
5 is a diagram illustrating an object plane OP of the spectroscope 100 and the plasma light source P according to the embodiment of the present invention.
6 is a graph showing a change in light collection efficiency depending on the position of an object plane of a spectroscope according to an embodiment of the present invention.
7 is a cross-sectional view of an optical device according to another embodiment of the present invention.
8 is a graph illustrating an example of the efficiency of light collection according to the diameter of the aperture constituting the optical device according to the embodiment of the present invention.
9 is a view for explaining optical conditions of the light transmitting portion 120 constituting the optical device according to the embodiment of the present invention.
10 is a plan view of a plasma processing apparatus 10 according to another embodiment of the present invention.
11 and 12 are plan views of a plasma processing apparatus 10 according to another embodiment of the present invention.

Other advantages and features of the present invention and methods for accomplishing the same will be apparent from the following detailed description of embodiments thereof taken in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and the present invention is only defined by the scope of the claims. Although not defined, all terms (including technical or scientific terms) used herein have the same meaning as commonly accepted by the generic art in the prior art to which this invention belongs. A general description of known configurations may be omitted so as not to obscure the gist of the present invention. In the drawings of the present invention, the same reference numerals are used as many as possible for the same or corresponding configurations. To facilitate understanding of the present invention, some configurations in the figures may be shown somewhat exaggerated or reduced.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprises", "having", or "having" are intended to specify the presence of stated features, integers, steps, operations, components, Steps, operations, elements, parts, or combinations thereof, whether or not explicitly described or implied by the accompanying claims.

Plasma processing conditions such as small etch areas, low pressure, low RF power, and the like have been preferred due to miniaturization of semiconductor devices, semiconductor feature size and line width reduction. In the case of such a plasma process condition, since the intensity of light emitted from the process plasma is low, it is necessary to collect the optical signal required for spectroscopic measurement with high efficiency in order to accurately analyze the plasma characteristics (state). The embodiments described below relate to an optical apparatus capable of collecting plasma light with high efficiency, a spectrometer equipped with the apparatus, and a plasma processing apparatus to provide a high-efficiency spectrometer.

An optical apparatus according to an embodiment of the present invention includes a first light emitted from an object plane of a plasma light source, a second light emitted from a front region of the object plane, and a third light emitted from a rear region of the object plane A focusing optical focusing lens; And a blocking plate which has an aperture for passing and diffracting the focusing light of the first light beam focused by the light focusing lens and blocking the focusing beam of the second beam and the focusing beam of the third beam which are converged by the beam focusing lens part; A lens unit for collecting the first light diffracted through the aperture; An optical fiber into which the first light collected by the lens unit is incident; And an analyzer for analyzing the spectrum of the first light transmitted through the optical fiber and measuring the plasma state.

In one embodiment, the light focusing lens, the light selecting unit, and the lens unit may be provided so that the first light emitted from the object surface located on the end surface of the plasma light source far from the light focusing lens is incident on the optical fiber . In one embodiment, the diameter of the aperture through which the first light is diffracted depends on the size of the plasma light source or the size of the substrate processed by the plasma light source.

In another embodiment of the present invention, a plurality of light transmitting portions including a light selecting portion, a lens portion, and an optical fiber may be provided. In one embodiment, the plurality of light transmitting portions may be provided so as to correspond one-to-one to the sizes of the plurality of different plasma light sources so that the plasma light can be collected with high efficiency adaptively to various changes of the plasma light source to be measured. The plurality of light transmitting portions may be formed so that the diameter of the opening, the diameter of the lens portion, the distance between the lens portion and the opening, and the distance between the optical fiber and the lens portion are different from each other.

1 is a cross-sectional view schematically showing a plasma processing apparatus 10 including a spectroscope 100 according to an embodiment of the present invention. 1, the plasma processing apparatus 10 includes a plasma processing chamber 11 for processing a substrate W by generating a plasma light source, and a condenser lens 11 for collecting light emitted from a plasma light source in the plasma processing chamber 11, And a spectrometer 100 for analyzing the plasma state in the plasma processing chamber 11 by optical emission spectroscopy. Examples of the substrate W include, but are not limited to, a semiconductor substrate for manufacturing a semiconductor device, a glass substrate for manufacturing a flat panel display device, and the like. Examples of the substrate W treatment include, but are not limited to, an etching process, a chemical vapor deposition process, an ashing process, and a cleaning process.

The plasma processing apparatus 10 may be provided as a capacitive coupled plasma (CCP) facility, an inductively coupled plasma (ICP) facility, a microwave plasma facility, or various other plasma substrate processing apparatuses. A plasma processing chamber 11 (hereinafter abbreviated as a " chamber ") provides a space in which the processing of the substrate W is performed. The chamber 11 may be provided with a closed structure so as to maintain a vacuum. As an example, the chamber 11 may have a hollow cube or hollow cylinder, or some other shape.

The chamber 11 includes a supply port (not shown) for introducing a process gas for processing the substrate W by forming a plasma, and a discharge port (not shown) for discharging a by-product of the unreacted source gas and the substrate W processing process ). In the chamber 11, a showerhead (not shown) for uniformly supplying the process gas to the substrate W may be provided.

The stage 12 is provided on an inner bottom surface of the chamber 11 to support the substrate W. [ The stage 12 may have a plate shape. For example, the stage 12 may have an electrostatic chuck for fixing the substrate W by an electrostatic force. The RF power supply unit 13 is provided to apply a radio frequency (RF) power for generating and controlling plasma to the upper electrode. The RF power source unit 13 may be provided with one or a plurality of power sources. The upper electrode may be arranged to face the stage 12 at the upper inside of the chamber 11. The upper electrode is parallel to the stage 12 and can be spaced apart at a predetermined interval.

A high frequency energy is applied to the chamber 11 by the RF power supply unit 13 so that an electric field is formed between the stage 12 and the upper electrode 14 in accordance with the potential difference between the stage 12 and the upper electrode 14, The plasma light source P may be formed in the chamber 11. The density of the plasma formed on the substrate W may vary depending on the potential difference between the stage 12 and the upper electrode 14 and the plasma state in the chamber 11 may be controlled by controlling the high frequency of the RF power source 13 .

An opening 11a is formed in one side of the wall of the chamber 11 so as to provide the light in the chamber 11 to the spectroscopic measuring instrument 100. The opening 11a is provided with a quartz A window may be provided. The space between the light transmitting window and the opening 11a can be sealed so that no impurities are introduced into the chamber 11 and the vacuum state in the chamber 11 can be maintained.

FIG. 2 is an enlarged cross-sectional view showing an optical apparatus constituting the spectroscopic instrument 100 according to an embodiment of the present invention. 1 and 2, the spectrometer 100 includes optical devices 110 and 120 for collecting and transmitting light emitted from a plasma light source, and optical emission spectroscopy And an analyzer 130 for measuring a plasma state. The optical device may include a light focusing lens 110 and a light transmitting portion 120. The light focusing lens 110 may be provided as a lens for focusing the light emitted from the plasma light source P, for example, a convex lens.

The optical transmission unit 120 may include a light selection unit 140, a lens unit 150, and an optical fiber 160. The light focusing lens 110, the light selecting unit 140 and the lens unit 150 may be incorporated in the outer case 112 provided outside the opening 11a. The outer case 112 is opened on the side of the opening 11a and the surfaces except for the side of the opening 11a are shielded so that light from the outside is not introduced.

The optical selection unit 140 and the lens unit 150 may be incorporated in the inner case 122 provided inside the outer case 112. [ The surface of the inner case 122 facing the light focusing lens 110 is open and the surface facing the light focusing lens 110 is removed so that light reflected from the inner surface of the outer case 112 is not introduced. The sides are shielded.

3 is a perspective view of a light selection unit 140 constituting an optical device according to an embodiment of the present invention. The optical selection unit 140 may include a blocking plate 142. The blocking plate 142 may be provided on the opening face of the inner case 122 facing the light focusing lens 110 side. The blocking plate 142 is provided to pass only the first light emitted from the specific object plane OP among the plasma light sources P and to block the light emitted from the region excluding the object plane OP. To this end, the blocking plate 142 is disposed on the image plane of the first light focused by the light focusing lens 110, and an aperture 144 through which the first light passes is diffracted to the imaging point of the first light Respectively. The opening 144 may be provided in a circular shape. The blocking plate 142 also has a blocking surface 1421 that shields the light emitted from the region excluding the object plane OP in the region surrounding the opening 144.

4 is a view for explaining the action of the light focusing lens 110 and the light selecting unit 140 constituting the optical device according to the embodiment of the present invention. 1 to 4, a first light O1 emitted from an object plane OP of a plasma light source, a second light O2 emitted from a front region of an object plane OP by the light focusing lens 110, And the third light O3 emitted from the rear region of the object plane OP are focused.

The aperture 144 of the blocking plate 142 is formed at the imaging point at which the focused light of the first light O1 is formed so that the focused light of the first light O1 passes through the aperture 144 and diffracts. Since the blocking surface 1421 is formed in the region surrounding the emission point of the first light O1 of the blocking plate 142, the focused light of the second light O2 emitted from the front region of the object plane OP, The focused light of the third light O3 emitted from the rear region of the object plane OP is blocked by the blocking face 1421 at the same time.

When a diaphragm is provided at the front and rear of the light focusing lens 110 to block the second light O2 and the third light O3, the first light O1 is diffracted by the diaphragm, The light emitted from the object plane OP can not be collected with high efficiency. However, according to the embodiment of the present invention, the single light (O1) Only the first light O1 emitted from the object plane OP can be accurately selected and passed through the blocking plate 142 as an optical element and the first light O1 emitted from the object plane OP can be passed through the high efficiency As shown in FIG. The first light O1 diffracted through the opening 144 is collected by the lens unit 150 and is incident on the optical fiber 160 and transmitted to the analysis unit 130. [ In one embodiment, the lens portion 150 may be provided with one or a plurality of convex lenses.

5 is a diagram illustrating an object plane OP of the spectroscope 100 and the plasma light source P according to the embodiment of the present invention. 6 is a graph showing a change in light collection efficiency depending on the position of an object plane of a spectroscope according to an embodiment of the present invention. 5 and 6, Z ₀ represents the position in the optical axis direction Z of the object plane OP. 1 to 6, the position of the object plane OP observed by the light focusing lens 110 greatly affects the optical signal collection efficiency. The light collecting efficiency shows the highest value when the object plane OP of the light focusing lens 110 coincides with the end portion of the plasma light source P remote from the light focusing lens 110. [

6, when the focus of the light converging lens 110 is adjusted to the object plane OP and the optical signal is measured, the light converging lens 110 is moved in accordance with the position of the focal plane (object plane, OP) The size of the image is greatly changed. That is, irrespective of the size (for example, 100 mm, 200 mm, or 300 mm) of the plasma light source P, the optical signal collection efficiency gradually increases as the position of the object plane OP increases from infinity to the farther interface of the plasma light, The closer to the light converging lens 110, the farther from the far-side interface. Therefore, the focal plane (object plane, OP) of the light focusing lens 110 is set at the end of the plasma light source P (right end portion of the plasma light source in Fig. 5) When it is aligned with the boundary surface farther from the light source 110, the largest optical signal intensity can be obtained.

This shows a collecting efficiency as high as about 3 times as high as that in the conventional emission spectrometer when the fiber is focused on the objective lens. Therefore, in order to maximize the light collection efficiency, the optical device collects the first light O1 emitted from the object plane OP located at the end face farther from the light focusing lens 110 of the plasma light source P . For this purpose, the light focusing lens 110 and the light transmission unit 120 are capable of collecting the first light O1 emitted from the object plane OP located at the far interface of the plasma light source P with high efficiency Position and distance, and can be provided with a focal length at which a focal plane is formed on the object plane OP.

7 is a cross-sectional view of an optical device according to another embodiment of the present invention. In describing the embodiment of Fig. 7, redundant descriptions may be omitted for the same or corresponding components as those described above. 7, the optical apparatus includes a lens moving unit 170 installed in the outer case 112 to move the light focusing lens 110, and a lens moving unit 170 for moving the light transmitting unit 120 in the direction of the optical axis of the light focusing lens 110 And a moving unit 180 for moving the moving unit 180 to a predetermined position.

The pressure and the RF power of the process gas vary depending on the size of the substrate, and the size of the plasma light source changes accordingly. The position of the object plane (OP1, OP2, OP3) which can increase the light collection efficiency according to the change of the size of the plasma light source also changes. Therefore, in order to collect the plasma light with high efficiency irrespective of the size of the plasma light source or the size of the substrate, the lens moving unit 170 and the moving unit 180 are moved by the size of the plasma light source or by the plasma light source The light focusing lens 110 and the light transmitting portion 120 are moved in the optical axis direction according to the size of the substrate to be processed. As the driving method of the lens moving part 170 and the moving part 180, various systems such as a motor, a gear / speed reducer, and a cylinder can be applied.

In one embodiment, when a size of a substrate to be plasma-processed is inputted through a user interface unit (for example, a touch pad, a button, a keyboard, a mouse, etc.), a plasma light source is formed on the substrate according to the size of the substrate, Power supply, etc. can be controlled. The lens moving unit 170 and the moving unit 180 move the light focusing lens 110 and / or the light transmitting unit 120 such that the object plane is formed at the far interface of the plasma light source according to the size of the input substrate . In another embodiment, a sensor unit (image sensor, laser sensor, etc.) for measuring the size of the substrate to be plasma-processed may be provided. When the size of the substrate is measured by the sensor unit, the light focusing lens 110 and / or the light transmitting unit 120 can be moved according to the measured substrate size.

8 is a graph illustrating an example of the efficiency of light collection according to the diameter of the aperture constituting the optical device according to the embodiment of the present invention. Light refers to light that is emitted and collected from the object plane in the plasma light source. The light collection efficiency was calculated according to the following equation (1). In Formula 1, c is the speed of light, ε ₀ is the permittivity of air, [E (x, y, z, λ)] 2 is the intensity of light emitted from the object plane of the plasma light source, T (x, y, z , λ) is the optical transfer function corresponding to the transmittance of the optical system, and S (λ) is the spectrometer signal sensitivity.

[Equation 1]

Referring to FIGS. 7 and 8, as the size of the opening 144 of the blocking plate 142 increases, the collection efficiency of the first light increases in proportion to the square of the opening diameter and is saturated. Therefore, in order to avoid the noise signal in the periphery and increase the light collection efficiency, the size of the opening 144 of the blocking plate 142 may be determined to be a value at which the collection efficiency of the first light starts to be saturated. The magnitude of the opening diameter at which the optical signal begins to saturate increases in proportion to the size (C1, C2, C3) of the plasma light source. Therefore, it is preferable that the size (diameter) of the opening 144 is set differently in consideration of the size of the substrate or the size (C1, C2, C3) of the plasma light source. In one embodiment, the smaller the size of the substrate or the size of the plasma light source, the smaller the diameter of the opening 144 of the blocking plate 142 is designed to be.

9 is a view for explaining optical conditions of the light transmitting portion 120 constituting the optical device according to the embodiment of the present invention. The first light condensed by the light focusing lens 110 is diffracted at the aperture 144 and diffracted at the diffraction angle?. Assuming that the wavelength of the first light emitted from the object plane of the plasma light source is 200 nm to 800 nm, the maximum diffraction angle can be calculated by substituting the ultraviolet wavelength band of 200 nm. The diameter D of the lens unit 150 of the optical transmission unit 120 should be sufficiently large enough to efficiently capture the optical signal emitted at the maximum diffraction angle. The diameter D of the lens unit 150 can be calculated by the following equation (2).

[Equation 2]

D = 2a * tan {sin ^-1 (2.44? / D)}

a and b are respectively a distance from the lens part 150 at the opening 144 and a shortest wavelength of light emitted from the lens part 150 at the optical fiber 150. [ (160) is the distance determined by the lens formula. The characteristics of the optical system must be considered in order to efficiently introduce the light collected by the lens unit 150 into the optical fiber 160. [

The converging angle of the lens unit 150 may be set to a light receiving angle a of the optical fiber 160 to be used for efficient transmission of the light collected by the lens unit 150, And the size of the image formed by the lens unit 150 should be smaller than the diameter? Of the optical fiber 160. In addition, Therefore, the optical transmission unit 120 must be configured to satisfy such a condition.

[Equation 3]

alpha > tan ^-1 {D / (2b)}

[Equation 4]

?> d * (b / a)

10 is a plan view of a plasma processing apparatus according to another embodiment of the present invention. In describing the embodiment of FIG. 10, redundant explanations may be omitted for the same or corresponding components as described above. 10, a plurality of openings 11a and 11b are formed in the plasma processing chamber 11 and a plurality of spectroscopic instruments 100a and 100b are installed at different positions surrounding the plasma processing chamber 11 . The plurality of spectrometers 100a and 100b may be provided so as to correspond one-to-one to the sizes of the plurality of different plasma light sources P4 and P5.

The first spectroscope 100a may be provided to collect light emitted from the first object surface OP4 located on the end face of the first plasma light source P4. The second spectroscope 100b may be provided to collect light emitted from the second object plane OP5 located at the far end surface (interface) of the second plasma light source P5. When the diameter of the aperture is changed in order to change the position of the object surface depending on the size of the plasma light source, the focusing angle of the lens unit 150 and the imaging position by the lens unit 150 may change, It is preferable that the entire optical system structure of the objective lens 120 is also changed so as to satisfy the above equations (3) and (4).

For this purpose, the first spectroscopic measuring instrument 100a and the second spectroscopic measuring instrument 100b are arranged so that the diameter and focal length of the light focusing lenses 110a and 110b, the mounting position (distance to the object surface), the light focusing lenses 110a and 110b The diameter of the opening portions 144a and 144b and the distance between the opening portions 144a and 144b and the lens portions 150a and 150b and the diameter of the lens portions 150a and 150b, The distances between the optical fibers 150a and 150b and the optical fibers 160a and 160b may be independently determined and may have different values.

The plurality of spectroscopic instruments 100a and 100b may be selectively operated depending on the size of the substrate or the size of the plasma light source, or may be operated in parallel to simultaneously collect light of different areas. Although FIG. 10 shows an embodiment in which two spectroscopic instruments 100a and 100b are installed, it is also possible to provide three or more spectroscopic instruments depending on various sizes of the substrate or the plasma light source.

11 and 12 are plan views of a plasma processing apparatus according to another embodiment of the present invention. In describing the embodiments of Figs. 11 and 12, redundant explanations may be omitted for the same or corresponding components as those described above. 11 and 12, a plurality of light focusing lenses 110c and 110d and a plurality of light transmitting portions 120c and 120d, light focusing lenses 110c and 110d, and a light transmitting portion 120c, and 120d. The plurality of light focusing lenses 110c and 110d and the light transmitting portions 120c and 120d may be provided so as to correspond one-to-one to the sizes of the plurality of different plasma light sources P6 and P7.

The third light focusing lens 110c and the third light transmitting portion 120c are provided to collect light emitted from the third object surface OP7 located at the farther end face (interface) of the third plasma light source P7 . The fourth light focusing lens 110d and the fourth light transmitting portion 120d may be provided to collect light emitted from the fourth object plane OP6 located on the farther end surface of the fourth plasma light source P6 . The overall optical system structure of the light transmitting portions 120c and 120d considering the diameter of the apertures 144c and 144d and the focusing angles and imaging positions of the lens portions 150c and 150d and the like can be determined according to Equation 3, As shown in Fig.

The third light focusing lens 110c and the fourth light focusing lens 110d and the third light transmitting portion 120c and the fourth light transmitting portion 120d are arranged in the same direction as the diameter of the light focusing lenses 110c and 110d The distance between the light focusing lenses 110c and 110d and the object surface, the distance between the light focusing lenses 110c and 110d and the light selecting portions 140c and 140d, the diameter of the openings 144c and 144d, The distances between the lens units 150c and 150d and the lens units 150c and 150d and the distances between the lens units 150c and 150d and the optical fibers 160c and 160d are independently determined And can have different values.

11, the driving unit 160 may include a third light focusing lens 110c and a fourth light transmission unit 110c corresponding to the size (diameter or horizontal width) of the third plasma light source P7 120d to the light collecting position. Accordingly, the light emitted from the third object plane OP7 is collected and analyzed with high efficiency. 12, the driving unit 160 may include a fourth light focusing lens 110d and a fourth light transmitting unit 120d corresponding to the size of the fourth plasma light source P6 to the light collecting position . Thus, the light emitted from the fourth object plane OP6 is collected and analyzed with high efficiency.

The plurality of light focusing lenses 110c and 110d and the plurality of light transmitting portions 120c and 120d may be selectively operated according to the size of the substrate or the size of the plasma light source. As the driving method of the driving unit 190, various systems such as a motor, a gear / speed reducer, and a cylinder may be applied. The driving unit 190 may be provided with a plurality of light focusing lenses arranged along the circular perimeter and a structure for rotating the light transmitting unit to the light collecting position.

11 and 12 illustrate an embodiment in which two light condensing lenses 110c and 110d and light transmitting portions 120c and 120d are provided. However, in the case where three or more light condensing lenses 110c and 110d are provided according to various sizes of a substrate or a plasma light source It is possible. As a modification of Figs. 11 and 12, it is also possible to provide one light focusing lens, and move the plurality of light transmitting portions in the direction of the optical axis of the light focusing lens according to the size of the substrate or the plasma light source.

It is to be understood that the above-described embodiments are provided to facilitate understanding of the present invention, and do not limit the scope of the present invention, and it is to be understood that various modifications are possible within the scope of the present invention. It is to be understood that the technical scope of the present invention should be determined by the technical idea of the claims and the technical scope of protection of the present invention is not limited to the literary description of the claims, To the invention of the invention.

W: substrate P: plasma light source
OP: object surface O1: first light
O2: second light O3: third light
10: Plasma processing apparatus 11: Plasma processing chamber
11a: opening 12: stage
13: RF power supply unit 14: upper electrode
100: spectroscope 110: light focusing lens
112: outer case 120:
122: inner case 130:
140: optical selection unit 142:
1421: blocking surface 144: opening
150: lens portion 160: optical fiber
170: lens moving part 180: moving part
190:

Claims (16)

A first light emitted from a predetermined objective plane of a plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane A light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening;
An optical fiber into which the first light collected by the lens unit is incident; And
And a moving unit that moves the light transmitting unit including the optical selecting unit, the lens unit, and the optical fiber in the optical axis direction of the light focusing lens. The method according to claim 1,
And a lens moving section for moving the light focusing lens in the optical axis direction of the light focusing lens. The method according to claim 1,
Wherein the predetermined object surface is located at an end face of the plasma light source far from the light focusing lens. The method according to claim 1,
Wherein the diameter of the aperture is dependent on the size of the plasma light source or the size of the substrate being processed by the plasma light source. A first light emitted from a predetermined objective plane of a plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane A light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening; And
And an optical fiber into which the first light collected by the lens unit is incident,
A plurality of optical transmission units including the optical selection unit, the lens unit, and the optical fiber,
And the plurality of light transmitting portions are formed such that the diameters of the openings are different from each other. 6. The method of claim 5,
The plurality of light transmitting parts are provided so as to correspond one-to-one to the sizes of the plurality of different plasma light sources,
Wherein the plurality of light transmitting portions are formed so that the diameter of the lens portion, the distance between the opening portion and the lens portion, and the distance between the optical fiber and the lens portion are different from each other. 6. The method of claim 5,
The optical device is installed in a translucent window of a plasma processing chamber,
Wherein the plurality of light transfer portions are installed at different locations surrounding the plasma processing chamber. 6. The method of claim 5,
And driving the plurality of light transmitting units to move the light transmitting unit corresponding to the size of the plasma light source or the size of the substrate in the plasma processing chamber for generating the plasma light source among the plurality of light transmitting units to a position for light collection, Further comprising a driving unit for maximizing efficiency. The method according to claim 1,
Wherein the optical fiber analyzes the spectrum of the first light and transmits the first light to an analyzer for measuring a plasma state. delete An optical device for collecting and transmitting the light emitted from the plasma light source; And
And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state,
The optical device comprising:
A first light emitted from a predetermined objective plane of the plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane, Belonging to a light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening;
An optical fiber for receiving the first light collected by the lens unit and transmitting the incident first light to the analysis unit; And
And a moving unit for moving the light transmitting unit including the optical selecting unit, the lens unit, and the optical fiber in the optical axis direction of the light focusing lens. 12. The method of claim 11,
Wherein the predetermined object surface is located on an end face of the plasma light source remote from the light focusing lens,
Wherein the diameter of the aperture is dependent on the size of the plasma light source or the size of the substrate being processed by the plasma light source. An optical device for collecting and transmitting the light emitted from the plasma light source; And
And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state,
The optical device comprising:
A first light emitted from a predetermined objective plane of the plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane, Belonging to a light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening; And
And an optical fiber for receiving the first light collected by the lens unit and transmitting the incident first light to the analyzing unit,
A plurality of optical transmission units including the optical selection unit, the lens unit, and the optical fiber,
And the plurality of light transmitting portions are formed such that the diameters of the openings are different from each other. A plasma processing chamber for plasma processing the substrate by forming a plasma light source;
An optical device for collecting and transmitting light emitted from the plasma light source; And
And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state,
The optical device comprising:
A first light emitted from a predetermined objective plane of the plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane, Belonging to a light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening;
An optical fiber for receiving the first light collected by the lens unit and transmitting the incident first light to the analysis unit; And
And a moving unit that moves the light transmitting unit including the optical selecting unit, the lens unit, and the optical fiber in the optical axis direction of the light focusing lens. 15. The method of claim 14,
Wherein the predetermined object surface is located on an end face of the plasma light source remote from the light focusing lens,
Wherein the diameter of the opening depends on a size of the plasma light source or a size of a substrate processed by the plasma light source. A plasma processing chamber for plasma processing the substrate by forming a plasma light source;
An optical device for collecting and transmitting light emitted from the plasma light source; And
And an analyzer for spectroscopically analyzing a spectrum of light transmitted from the optical device to measure a plasma state,
The optical device comprising:
A first light emitted from a predetermined objective plane of the plasma light source, a second light emitted from a front region of the predetermined object plane, and a third light emitted from a rear region of the predetermined object plane, Belonging to a light focusing lens;
A shielding surface which is disposed on an image plane of the first light beam focused by the light focusing lens and which is formed in an area surrounding the imaging point of the first light beam and which simultaneously shields the focused light beam of the second light beam and the focused light beam of the third light beam A light selecting unit including an aperture plate having an aperture for passing and condensing the light flux of the first light passing through the aperture plate and formed at an image point of the first light;
A lens unit for collecting the first light diffracted through the opening; And
And an optical fiber for receiving the first light collected by the lens unit and transmitting the incident first light to the analyzing unit,
A plurality of optical transmission units including the optical selection unit, the lens unit, and the optical fiber,
Wherein the plurality of light transmitting portions are formed such that the diameters of the openings are different from each other.

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