KR101791111B1 - Liquid crystal display device and apparatus for fabricating the same - Google Patents

Abstract

A liquid crystal display device comprising: a liquid crystal panel including an array substrate, a color filter substrate and a liquid crystal layer; A first polarizer attached to an outer surface of the array substrate; A backlight unit positioned on an outer surface of the first polarizer; A second polarizer attached to an outer surface of the color filter substrate; And a selective reflection layer of a multilayer structure formed on the outer surface of the second polarizer plate, the manufacturing equipment for a liquid crystal display comprising: a chamber; An electron beam evaporation source located at a lower one side of the inside of the chamber; A substrate support means for supporting and rotating a substrate to be processed, the substrate support means being located at an upper end of the chamber interior; And a second region having a plurality of stripe-type openings in the first region, the first region being located between the electron beam evaporation source and the substrate supporting means and having at least one chamfer structure in a rectangular shape, 1 shield, it is possible to reduce the occurrence of thickness variations of the deposited thin film and to improve the thickness uniformity.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display device,

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device and a manufacturing apparatus for the same which can realize a monochromatic color in a display area even when the backlight is off.

The liquid crystal display device is attracting attention as a display device with low power consumption, high portability, and high technology value.

Of these liquid crystal display devices, an active matrix type liquid crystal display device including a thin film transistor, which is a switching device capable of controlling ON / OFF of each pixel, is widely used because of its excellent resolution and video realization capability.

In general, a liquid crystal display device forms an array substrate and a color filter substrate through an array substrate manufacturing process for forming thin film transistors and pixel electrodes, and a color filter substrate manufacturing process for forming color filters and common electrodes, And a liquid crystal interposed therebetween.

The structure of a general liquid crystal display device will be described in more detail with reference to FIG. 1 is a cross-sectional view schematically showing a general liquid crystal display device.

As shown in the figure, a general liquid crystal display device 1 includes an array substrate 10, a color filter substrate 20, and a liquid crystal layer (not shown) interposed between the two substrates 10 and 20.

The lower array substrate 10 includes a plurality of gate wirings and data wirings crossing each other and defining pixel regions, thin film transistors, which are switching elements, are formed at intersections of the two wirings, A pixel electrode connected to the drain electrode of the TFT is formed.

An upper color filter substrate 20 disposed at a predetermined distance from the array substrate 10 includes a black matrix having an opening corresponding to each pixel region and a color filter layer formed corresponding to each opening, A transparent common electrode is formed over the entire surface of the matrix and the color filter layer.

First and second polarizing plates 31 and 32 having polarization axes orthogonal to each other are disposed on the outer surfaces of the two substrates 10 and 20, respectively. The first and second polarizing plates 31 and 32 are disposed on the outer surface of the array substrate 10, A backlight unit 40 is located outside the first polarizer 31, that is, below the first polarizer 31.

In the liquid crystal display device 1 having such a configuration, when the backlight unit 40 is turned on, the light emitted from the backlight unit 40 is adjusted in brightness by driving liquid crystal molecules in each pixel region And passes through the color filter layer, the liquid crystal display device 1 displays a colorful image, and when the backlight unit 40 is turned off, a black image is displayed.

In recent years, such a liquid crystal display device 1 has been used in various IT application products and household appliances such as TVs, multivision, notebooks, monitors, portable telephones, portable multimedia devices, and the like.

Meanwhile, recent IT products and home appliances are designed with their own functions and design aspects, and in particular, they are designed to harmonize the surrounding environment with the environment where these IT products and household appliances are located .

Therefore, in accordance with this tendency, a product which can display various colors other than black in a state that the backlight unit is turned off is also being studied and developed in the liquid crystal display device.

An object of the present invention is to provide a liquid crystal display device in which a selective reflection layer is formed on an outer surface of a polarizing plate so that a color image other than black can be displayed in an off mode of a backlight unit.

Another object of the present invention is to provide a manufacturing equipment for a liquid crystal display device capable of improving the thickness uniformity of the selective reflection layer.

According to an aspect of the present invention, there is provided a manufacturing apparatus for a liquid crystal display device, including: a liquid crystal panel including an array substrate, a color filter substrate, and a liquid crystal layer; A first polarizer attached to an outer surface of the array substrate; A backlight unit positioned on an outer surface of the first polarizer; A second polarizer attached to an outer surface of the color filter substrate; And a selective reflection layer of a multilayer structure formed on the outer surface of the second polarizer plate, the manufacturing equipment for a liquid crystal display comprising: a chamber; An electron beam evaporation source located at a lower one side of the inside of the chamber; A substrate support means for supporting and rotating a substrate to be processed, the substrate support means being located at an upper end of the chamber interior; And a second region having a plurality of stripe-type openings in the first region, the first region being located between the electron beam evaporation source and the substrate supporting means and having at least one chamfer structure in a rectangular shape, 1 shield.

The first region has a chamfered structure in a curved shape on both sides of the upper portion adjacent to the substrate holding means.

In addition, the first region may have a straight-line chamfer structure on both lower sides, or may have a curved-line chamfer structure on both lower sides.

The area of the second area is 1/2 of the first shield area.

Here, the plurality of openings of the second region have a width and an interval of 2 mm to 3 mm.

The first shield may be located on both sides of the chamber, or may be located at four equal intervals within the chamber.

And a second shield disposed between the first shields at an upper end of the chamber.

The selective reflection layer has a multilayer structure in which a first inorganic film of a first material having a different refractive index and a second inorganic film of a second material are alternately stacked, and the electron beam evaporation source includes the first material and the second material.

The liquid crystal display device according to the present invention forms a selective reflection layer having a multilayer structure on the outer surface of a polarizing plate provided on the outer surface of a color filter substrate to selectively reflect external light of a specific wavelength band even when the backlight unit is turned off, It can be displayed, and there is an advantage that it can be harmonized with the external environment.

In addition, the polarizing plate is hard-coated to prevent lifting of the selective reflection layer, to prevent fingerprints and the like from being stained on a user's touch, and to prevent moisture from flowing into the selective reflection layer.

Further, by stabilizing the electron beam by changing the shield structure of the electron beam evaporation apparatus for forming the selective reflection layer, even when the area of the substrate is enlarged, it is possible to reduce the thickness deviation by position of the thin film to be formed, and to improve the thickness uniformity of the thin film.

1 is a cross-sectional view schematically showing a general liquid crystal display device.
2 is a cross-sectional view showing a part of a display region of a liquid crystal display device according to the present invention.
Fig. 3 is an enlarged view of area A in Fig.
4 is a schematic view illustrating an electron beam evaporation apparatus according to a first embodiment of the present invention.
5A and 5B are diagrams illustrating shields for electron beam evaporation devices according to a first embodiment of the present invention.
6A to 6C are diagrams illustrating shields for electron beam evaporation devices according to a second embodiment of the present invention.
FIG. 7 is a schematic view of an electron beam evaporation apparatus according to a second embodiment of the present invention.

Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the drawings.

FIG. 2 is a cross-sectional view showing a part of a display region of the liquid crystal display device according to the present invention, and FIG. 3 is an enlarged view of region A of FIG.

2 and 3, a liquid crystal display device 101 according to an embodiment of the present invention includes a first substrate 110 and a second substrate 150, and a liquid crystal layer between the two substrates 110 and 150, Layer 180 and first and second polarizers 185 and 187 disposed on the outer surfaces of the liquid crystal panel, that is, the outer surfaces of the first and second substrates 1101 and 150, A selective reflection layer 190 having a multilayer structure formed on the outer surface of the second polarizer 187, and a backlight unit disposed on the outer surface of the first polarizer 185.

The liquid crystal panel is composed of a first substrate 110 and a second substrate 150 and a liquid crystal layer 180 interposed between the two substrates 110 and 150.

A plurality of gate wirings (not shown) and data wirings (not shown) are formed on the inner surface of the first substrate 110, and gate wirings and data wirings cross each other to define a plurality of pixel regions P .

In each of the plurality of pixel regions P, a thin film transistor Tr which is connected to the gate wiring (not shown) and the data wiring (not shown) and is a switching element is formed. At this time, the thin film transistor Tr includes a gate electrode 115, a gate insulating film 117, an active layer 120a of pure amorphous silicon, and an ohmic contact layer 120b of impurity amorphous silicon, which are sequentially stacked. Layer 120 and source and drain electrodes 133 and 136 that are spaced apart from one another. The gate electrode 115 is connected to the gate wiring (not shown), and the source electrode 133 is connected to the data wiring (not shown).

A protective layer 140 is formed on the upper portion of the thin film transistor Tr. The passivation layer 140 is formed on the entire surface of the first substrate 110 including the thin film transistor Tr and includes a drain region 136 covering the thin film transistor Tr and exposing the drain electrode 136 of the thin film transistor Tr, And has a contact hole 143. A pixel electrode 145 is formed in each pixel region P above the passivation layer 140 to contact the drain electrode 136 through the drain contact hole 143.

The first substrate 110 on which the gate wiring, the data wiring, the thin film transistor Tr and the pixel electrode 145 are formed is referred to as an array substrate.

A second substrate 150 is disposed on the upper portion of the array substrate corresponding to the array substrate having such a configuration and the gate wiring (not shown), the data wiring (not shown) and the thin film A black matrix 153 in a lattice shape surrounding the edge of each pixel region P so as to cover the transistor Tr and having an opening corresponding to each pixel region P is formed. A color filter layer 155 is formed in the opening of the black matrix 153. The color filter layer 155 is formed by sequentially and repeatedly arranging the red, green, and blue color filter patterns 155a , 155b, 155c. As shown in the figure, the color filter layer 155 covers the black matrix 153, and the boundary of the color filter patterns 155a, 155b and 155c may be located above the black matrix 153. [

A transparent common electrode 158 is formed on the entire surface of the second substrate 150 to cover the color filter layer 155.

The second substrate 150 on which the black matrix 153, the color filter layer 155, and the common electrode 158 are formed is referred to as a color filter substrate.

2 illustrates a structure in which a pixel electrode 145 is formed on a first substrate 110 and a common electrode 158 is formed on a second substrate 150. For example, a twisted nematic (TN) Mode liquid crystal display device, a structure in which a pixel electrode and a common electrode are formed on the first substrate 110, for example, an in-plane switching (IPS) mode liquid crystal display device may be used, Mode liquid crystal display device may be used.

In such an IPS mode liquid crystal display device, the pixel electrodes and the common electrodes are formed in a plurality of bar shapes in each pixel region of the first substrate 110, and are arranged alternately. In this case, common wirings may be further included to connect the common electrodes of adjacent pixel regions.

Further, in the IPS mode liquid crystal display, the common electrode may be omitted on the color filter layer of the second substrate, and an overcoat layer may be further formed to cover the color filter layer.

A liquid crystal layer 180 is positioned between the array substrate having the above-described structure and the color filter substrate. Although not shown in the figure, a seal pattern is formed along the edges between the two substrates so as to prevent leakage of the liquid crystal layer 180 and keep the array substrate and the color filter substrate bonded together.

Next, the first polarizing plate 185 and the second polarizing plate 187 are positioned on the outer surface of the liquid crystal panel having the above-described configuration. That is, a first polarizer 185 having a polarization axis in a first direction is attached to the outer surface of the first substrate 110, and a second polarizer 185 having a polarization axis in the second direction is attached to the outer surface of the second substrate 150. [ (Not shown). The polarizing axis of the first polarizing plate 185 is perpendicular to the polarizing axis of the second polarizing plate 187.

A backlight unit 189 for supplying light to the liquid crystal panel is disposed outside the first polarizing plate 185, that is, below the first polarizing plate 185 in the drawing.

Although not shown in the drawing, each of the first polarizing plate 185 and the second polarizing plate 187 includes a polyvinyl alcohol (PVA) layer that selectively transmits only light oscillating in a predetermined direction, and a polyvinyl alcohol And a first and a second TAC (Tri-Acetate Cellulose) layer provided for layer protection.

Here, each of the first and second polarizing plates 185 and 187 may further include a protective film and an adhesive layer forming a base. The protective film may be made of a UV curable acrylic material such as polyester, acrylate, urethane acrylate, and epoxy acrylate.

Meanwhile, the second polarizer 187 may have a hard-coated structure. That is, in order to improve surface hardness and abrasion resistance, a coating liquid containing colloidal silica particles may be applied on the protective film of the second polarizing plate 187 to form a coating film.

The coating layer prevents the selective reflection layer 190 of the multi-layer structure formed on the second polarizing plate 187 from being lifted from the second polarizing plate 187. When the selective reflection layer 190 is directly formed on the outer surface of the second polarizing plate 187, that is, on the protective film of the second polarizing plate 187, the protective film of the second polarizing plate 187 and the selective reflection layer 190 The bonding strength may be poor, and the selective reflection layer 190 may float from the end of the second polarizer 187 over time. In this case, in order to prevent lifting of the selective reflection layer 190, a separate protective substrate may be formed on the selective reflection layer 190. This increases the thickness and weight of the liquid crystal display device 101, There is a problem of rising.

Accordingly, the surface of the second polarizing plate 187 is hard-coated to prevent lifting of the selective reflection layer 190, thereby realizing a lightweight thin shape of the liquid crystal display device 101 and preventing an increase in manufacturing cost.

Next, as described above, a selective reflection layer 190 having a multilayer structure is formed on the outer surface of the second polarizing plate 187. The selective reflection layer 190 has a structure in which a first inorganic film 190a and a second inorganic film 190b are alternately stacked and made of titanium oxide (TiO ₂ ) and silicon oxide (SiO ₂ ), which are inorganic insulating materials. Here, the selective reflection layer 190 is formed by laminating the first inorganic film 190a and the second inorganic film 190b at least once to have a laminate structure of a minimum of two or more layers, and preferably the first and second inorganic films 190a And 190b are stacked two or more times to have a laminated structure of four or more layers. 2, the selective reflection layer 190 includes a first inorganic film 190a and a second inorganic film 190b, a first inorganic film 190a, a second inorganic film 190b, and a first inorganic film 190a ) In this order.

The selective reflection layer 190 is formed by a first inorganic film 190a made of titanium oxide (TiO ₂ ) and a second inorganic film 190b contacting the second polarizer 187. The first inorganic film 190a and the second inorganic film 190b And the uppermost layer of the selective reflection layer 190 is preferably a first inorganic film 190a made of titanium oxide (TiO ₂ ).

As described above, the first inorganic film 190a made of titanium oxide (TiO ₂ ) is formed on the second polarizing plate 187 before the second inorganic film 190b made of silicon oxide (SiO ₂ ) (TiO ₂ ) and the second polarizing plate 187 are superior to the bonding force between the silicon oxide (SiO ₂ ) and the second polarizing plate 187, the lifting of the selective reflective layer 190 is further prevented .

In addition, forming the top layer of the selected reflection layer 190, a first inorganic film (190a) made of titanium oxide (TiO _2), a film made of titanium oxide (TiO ₂₎ than the film made of silicon oxide (SiO ₂₎ So that it is possible to minimize the occurrence of stains or the like when the user touches the display area.

On the other hand, the selective reflection layer 190 formed on the second polarizing plate 187 selectively adjusts the thickness of the selective reflection layer 190 and the number of layers of the first and second inorganic layers 190a and 190b, Absorbs and reflects light. By this characteristic, only light of a specific wavelength band is reflected, and monochromatic light is displayed when the backlight unit 189 is off.

The refractive index of the first inorganic film 190a made of titanium oxide (TiO ₂ ) is 2.46 and the refractive index of the second inorganic film 190b made of silicon oxide (SiO ₂ ) is 1.49. Therefore, when external light is incident on the selective reflection layer 190, selective absorption and reflection proceed due to the refractive index difference at the boundary between the first and second inorganic films 190a and 190b, and ultimately, light having a specific wavelength band It is possible to reflect only.

At this time, the first and second inorganic films 190a and 190b have a thickness of several nm to several hundreds of nm, all may have the same level of thickness, or may have different thicknesses in the above-mentioned range .

The liquid crystal display device 101 according to the embodiment of the present invention having such a configuration realizes a full color image when the backlight unit 189 is driven in an on state and the backlight unit 189 The light of a specific wavelength range is selectively reflected to the external light incident on the display region of the liquid crystal display device 101 so that a single color, for example, red, green, blue or silver By displaying any one of them, it is possible to make the colors match well with the colors of the liquid crystal display device and the peripheral devices.

The selective reflection layer 190 may be formed before the second polarizing plate 187 is attached to the liquid crystal panel. That is, after the selective reflection layer 190 is formed on the second polarizing plate 187, the second polarizing plate 187 on which the selective reflection layer 190 is formed can be attached to the liquid crystal panel. Alternatively, after attaching the second polarizing plate 187 to the liquid crystal panel, the selective reflective layer 190 may be formed on the second polarizing plate 187 attached to the liquid crystal panel. In the former case, during the process of forming the selective reflection layer 190 on the second polarizing plate 187, the second polarizing plate 187 may bend, and the second polarizing plate (including the selective reflection layer 190) 187 may be difficult to attach to the liquid crystal panel. On the other hand, in the latter case, since the selective reflection layer 190 is formed in a state in which the second polarizing plate 187 is attached to the liquid crystal panel, the warping of the second polarizing plate 187 can be suppressed.

Meanwhile, the selective reflection layer 190 may be formed through an e-beam evaporation method.

FIG. 4 is a schematic view illustrating an e-beam evaporator according to a first embodiment of the present invention. FIGS. 5A and 5B are views showing a shield for electron beam evaporation apparatus according to the first embodiment of the present invention shield.

As shown in FIG. 4, the electron beam evaporation apparatus includes a vacuum chamber 210 for providing a closed reaction space, and an electron beam evaporation source 220 is disposed at a lower end of the chamber 210. Here, the electron beam evaporation source 220 is contained in a container such as a crucible. In order to form first and second inorganic films 190a and 190b, which are different from each other as in the present invention, (Not shown). ≪ / RTI > Also, in order to selectively deposit the first and second materials, a shutter (not shown) may be located above the port to selectively open and close the port containing the first or second material. Therefore, when only the first material is to be deposited, the shutter covers the port containing the second material, and when the shutter is intended to deposit only the second material, the shutter covers the loading port of the first material.

Although not shown, an electron beam source that emits an electron beam is disposed adjacent to the electron beam evaporation source 220, and the electron beam evaporation source 220 is melted and evaporated by the electron beam emitted from the electron beam source.

An exhaust port (not shown) for exhausting gas inside the chamber 210 is formed on a lower wall or a side wall of the chamber 210, and a gas inlet (not shown) for injecting gas or the like may be formed .

A substrate support 230 is positioned on top of the chamber 210. The substrate support 230 rotates about the axis of rotation 232 across the center while supporting the substrate 240 lying on the underside to rotate the substrate 240 while the substrate 240 is being processed.

In the present invention, a substrate 240 and a polarizing plate 242 attached thereto are disposed on a lower surface of the substrate support 230, and the substrate 240 and the polarizing plate 242 are positioned such that the polarizing plate 242 faces the evaporation source 220 . Here, the substrate 240 may be the liquid crystal panel of Fig. 2, and the polarizer 242 corresponds to the second polarizer 187 of Fig.

The distance between the electron beam evaporation source 220 and the substrate support 230 may vary depending on the area of the substrate 240, the size of the chamber 210, and the deposition rate.

A shield 250 is positioned between the evaporation source 220 and the substrate support 230, and more particularly between the evaporation source 220 and the polarizer 242. The shield 250 is disposed at one side of the inside of the chamber 210 and disposed obliquely with respect to the lower wall of the chamber 210 by a shield supporting portion 252 fixed to the lower wall of the chamber 210. The shield support 252 may be fixed to the side wall of the chamber 210.

The shield 250 is disposed to suppress the diffuse reflection of the electron beam and to uniformize the thickness of the thin film deposited on the polarizing plate 242.

As shown in Fig. 5A, the shield 250 may have a rectangular shape not including the opening portion, or may have a rectangular shape having an opening portion 250a therein, as shown in Fig. 5B.

Therefore, the process of forming the selective reflection layer (190 in FIG. 2) using the equipment having such a structure is as follows.

First, an electron beam evaporation source 220 including a port for containing first and second materials is disposed in the chamber 210 and a polarizer 242 is attached to the electron beam evaporation source 220, The substrate 240 is placed on the bottom surface of the substrate support 230. Here, the first material may be titanium oxide (TiO ₂ ), the second material may be silicon oxide (SiO ₂ ), and two substrates 240 may be placed on the bottom surface of the substrate support 230.

Next, the chamber 210 is sealed, and internal air is discharged through an exhaust port (not shown), thereby evacuating the inside of the chamber 210.

Next, the substrate support table 230 is rotated to rotate the substrate 240, and the electron beam evaporation source 220 is melted and evaporated by the electron beam to form a selective reflection layer on the surface of the polarizer 242. At this time, a first inorganic film made of a first material is formed on the polarizing plate 242 by using a shutter so as to cover the port containing the second material, and then the shutter is used to cover the port containing the first material. Thereby forming a second inorganic film made of the second material on the first inorganic film. By repeating this process, a selective reflection layer in which the first inorganic film and the second inorganic film are alternately deposited can be formed.

However, recently, as the size of the liquid crystal display device has become larger, when the thin film is formed on a large-sized substrate of, for example, 32 inches or more by using the electron beam evaporation apparatus of Fig. 4, the electron beam in the electron beam evaporation apparatus is uniformly And the uniformity of the thin film to be formed may be lowered. Particularly, the selective reflection layer is formed by alternately stacking the first inorganic film of titanium oxide (TiO ₂ ) and the second inorganic film of silicon oxide (SiO ₂ ), and the color reflected by the number and thickness of these layers is controlled, If a deviation occurs, the reflected color may be deformed and color defect may occur.

In the second embodiment of the present invention, the structure of the electron beam evaporation equipment and the shield capable of improving the uniformity of the thin film formed on the large area substrate is presented.

6A to 6C are diagrams illustrating shields for electron beam evaporation devices according to a second embodiment of the present invention.

6A to 6C, the shield 350 according to the second embodiment of the present invention includes a first region 350a having at least one chamfer structure in a rectangular shape, and a second region 350b having a first chamfer structure in the first region 350a And a second region 350b having a plurality of stripe-type openings. It is preferable that the area of the second area 350b is about 1/2 of the area of the first shield 350. [ Here, the length L of the shield 350 is about 2/3 of the length of the substrate 340, and the width W of the shield 350 may be about 1/2 of the length L of the shield 350 . Further, the plurality of openings in the second region 350b may have a width and an interval of 2 mm to 3 mm.

The chamfer structure of the first region 350a of the shield 350 may have a curved shape or may have a straight shape. 6A, the first region 350a of the shield 350 may have a chamfered structure 350c in a curved shape on both sides of the top portion adjacent to the substrate support (not shown). 6B, the first region 350a of the shield 350 has a chamfer structure 350c having a curved shape on both sides of the upper portion adjacent to the substrate support, and has a straight chamfer structure 350d), so that a fan shape can be obtained. Alternatively, as shown in Fig. 6C, the first region 350a of the shield 350 may have chamfered chamfer structures 350c and 350d on both upper and lower sides.

Therefore, by forming the thin film on the large-area substrate by using the shield having such a structure, it is possible to reduce the occurrence of variation in the thickness of the thin film and to improve the uniformity.

FIG. 7 is a schematic view of an electron beam evaporation apparatus according to a second embodiment of the present invention.

7, the electron beam evaporation apparatus includes a vacuum chamber 310 for providing a closed reaction space, and an electron beam evaporation source 320 is disposed at a lower side of the inside of the chamber 310. Here, the electron beam evaporation source 320 is contained in a container such as a crucible. In order to form first and second inorganic films 190a and 190b, which are different from each other as in the present invention, (Not shown). ≪ / RTI > Also, in order to selectively deposit the first and second materials, a shutter (not shown) may be located above the port to selectively open and close the port containing the first or second material. Therefore, when only the first material is to be deposited, the shutter covers the port containing the second material, and when the shutter is intended to deposit only the second material, the shutter covers the loading port of the first material.

Although not shown, an electron beam source for emitting an electron beam is located adjacent to the electron beam evaporation source 320, and the electron beam evaporation source 320 is melted and evaporated by the electron beam emitted from the electron beam source.

An exhaust port (not shown) for discharging gas inside the chamber 310 is formed on a lower wall or a side wall of the chamber 310, and a gas inlet (not shown) for injecting gas may be formed .

A substrate support 330 is positioned at the top of the chamber 310. The substrate support 330 rotates about a rotation axis 332 that intersects the center while supporting the substrate 340 that is placed on the lower surface and rotates the substrate 340 while the substrate 340 is being processed.

In the present invention, a substrate 340 and a polarizing plate 342 attached thereto are disposed on a lower surface of the substrate support 330. The polarizing plate 342 and the substrate 340 are positioned such that the polarizing plate 342 faces the evaporation source 320 . 7 shows a structure in which two substrates 340 are simultaneously mounted on the lower surface of the substrate support 330. Alternatively, three or four substrates 340 may be mounted on the lower surface of the substrate support 330 at the same time. Here, the substrate 340 may be the liquid crystal panel of FIG. 2, and the polarizer 342 corresponds to the second polarizer 187 of FIG.

The distance between the electron beam evaporation source 320 and the substrate support 330 may vary depending on the area of the substrate 340, the size of the chamber 310, and the deposition rate.

A first shield 350 is positioned between the evaporation source 320 and the substrate support 330, and more particularly between the evaporation source 320 and the polarizer 342. Here, the first shield 350 has the structure shown in Figs. 6A to 6C. The first shield 350 is disposed obliquely with respect to the lower wall of the chamber 310 by a shield support portion 352 fixed to the lower wall of the chamber 310. The shield support portion 352 is fixed to the side wall of the chamber 310 It is possible. As shown in the figure, the first shields 350 may be located on both sides of the chamber 310, or may be disposed at four equal intervals in the four regions of the chamber 310, have.

In addition, the second shield 360 is positioned at one end of the rotation axis 360 inside the chamber 310. The second shield 360 is placed between the two first shields 350 and has a smaller area than the first shield 350. One side of the second shield 360 is fixed to the rotation axis 360, and the second shield 360 is fixed without being rotated when the thin film is deposited.

The electron beam evaporation apparatus according to the second embodiment of the present invention includes two first shields 350 and one second shield 360 so as to maximize the effect of thickness uniformity due to rotation of the substrate support 330 .

The present invention is not limited to the above-described embodiments, and various changes and modifications may be made without departing from the spirit of the present invention.

101: liquid crystal display device 110: first substrate
115: gate electrode 117: gate insulating film
120: semiconductor layer 120a: active layer
120b: ohmic contact layer 133: source electrode
136: drain electrode 140: protective layer
143: drain contact hole 145: pixel electrode
150: second substrate 153: black matrix
155: color filter layer 158: common electrode
180: liquid crystal layer 185: first polarizing plate
187: second polarizing plate 189: backlight unit
190: selective reflection layer 190a: first inorganic film
190b: second inorganic film Tr: thin film transistor
P: pixel area

Claims (10)

A liquid crystal panel including an array substrate, a color filter substrate, and a liquid crystal layer; A first polarizer attached to an outer surface of the array substrate; A backlight unit positioned on an outer surface of the first polarizer; A second polarizer attached to an outer surface of the color filter substrate; And a selective reflection layer of a multilayer structure formed on the outer surface of the second polarizer,
A chamber;
An electron beam evaporation source located at a lower one side of the inside of the chamber;
A substrate support means for supporting and rotating a substrate to be processed, the substrate support means being located at an upper end of the chamber interior;
A first region located between the electron beam evaporation source and the substrate holding means and having at least one chamfered structure in a rectangular shape and a second region having a plurality of openings in stripe type parallel to each other in the first region, The first shield
The manufacturing equipment for a liquid crystal display device.
The method according to claim 1,
Wherein the first region has a curved chamfer structure on both sides of the upper portion adjacent to the substrate holding means.
3. The method of claim 2,
Wherein the first region has a chamfer structure in a straight line or a curved shape on both lower sides thereof.
The method according to claim 1,
Wherein the plurality of openings extend along the width direction of the first shield and are spaced along the length direction of the first shield.
The method according to claim 1,
Wherein the area of the second area is 1/2 of the area of the first shield.
The method according to claim 1,
Wherein the plurality of openings in the second region have a width and an interval of 2 mm to 3 mm.
The method according to claim 1,
Wherein the first shield is located on both sides of the inside of the chamber.
8. The method of claim 7,
And a second shield disposed between the first shield and the upper end of the chamber.
The method according to claim 1,
Wherein the first shields are positioned at uniform intervals in four regions inside the chamber.
The method according to claim 1,
Wherein the selective reflection layer has a multilayer structure in which a first inorganic film of a first material having a different refractive index and a second inorganic film of a second material are stacked alternately and the electron beam evaporation source comprises a liquid crystal Manufacturing equipment for display devices.

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