KR101786838B1 - Reflective Polarizer And Display Device Including The Same - Google Patents

Reflective Polarizer And Display Device Including The Same Download PDF

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Publication number
KR101786838B1
KR101786838B1 KR1020150152648A KR20150152648A KR101786838B1 KR 101786838 B1 KR101786838 B1 KR 101786838B1 KR 1020150152648 A KR1020150152648 A KR 1020150152648A KR 20150152648 A KR20150152648 A KR 20150152648A KR 101786838 B1 KR101786838 B1 KR 101786838B1
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South Korea
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layer
pattern
polarizing plate
polarizing
polarized light
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KR1020150152648A
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Korean (ko)
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KR20170050741A (en
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한지수
노현종
김영욱
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엘지디스플레이 주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133536—Reflective polarizers
    • H01L27/3232—
    • H01L51/5293—

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention relates to a polarizing plate comprising a base film and a plurality of polarizing patterns extending in a first direction on the base film and spaced apart from each other in a second direction, . The polarizing degree of the reflection type polarizing plate is increased by adjusting the pitch of the polarizing pattern and the reflection type polarizing plate of the present invention is applied to the liquid crystal display device or the organic light emitting diode display device to improve the brightness of the display device.

Description

Technical Field [0001] The present invention relates to a reflective polarizer and a display device including the reflective polarizer.

The present invention relates to a display device, and more particularly to a reflective polarizer and a display device including the same.

In view of the information age, the display field has also been rapidly developed. As a flat panel display device (FPD) having the advantages of thinning, light weight, and low power consumption in response to the information age, ) And an organic light emitting diode (OLED) display device (OLED) have been developed and widely used.

In the liquid crystal display, images are displayed by using optical anisotropy and dielectric anisotropy of liquid crystal molecules. When an artificial electric field is applied to the liquid crystal in the state that rod-shaped liquid crystal molecules are aligned in one direction, the liquid crystal is rotated by the dielectric anisotropy of the liquid crystal. Therefore, by applying an appropriate voltage to the liquid crystal layer to arbitrarily adjust the arrangement direction of the liquid crystal molecules, the arrangement of the liquid crystal molecules is changed, and the polarized light is modulated by the optical anisotropy of the liquid crystal thereby to display a desired image, A polarizing film is required on the lower side of the liquid crystal display to form light.

Meanwhile, an organic light emitting diode display device, also referred to as an organic electroluminescence display device or organic electroluminescence display device, is a device in which electrons are injected into a light emitting layer formed between a cathode serving as an electron injection electrode and a cathode serving as a hole injection electrode, The exciton formed by the combination of the holes transmits energy to the dopant to emit light, thereby displaying an image.

In principle, an organic light emitting diode display device does not require a polarizing film unlike a liquid crystal display device, but uses a polarizing film to prevent reflection due to a high substrate reflectance.

1 is a view schematically showing a conventional polarizer structure.

As shown in Fig. 1, a conventional polarizing plate 10 includes a polarizing film 12 and first and second supporting films 14 and 16.

The polarizing film 12 is formed by stretching polyvinyl alcohol (PVA) in which iodine ions or dichroic dyes are dyed. The polarizing film 12 is formed by stretching the polarizing film 12 in a direction parallel to the absorption axis The vibrating light is absorbed and selectively transmits only light oscillating in a direction perpendicular to the absorption axis.

Each of the first and second supporting films 14 and 16 is made of triacetyl cellulose (TAC) and attached to the upper and lower surfaces of the polarizing film 12 to protect the polarizing film 12 .

However, this polarizing plate 10 is an absorption type polarizing plate and selectively transmits only light oscillating in a direction perpendicular to the absorption axis, so that the transmittance is smaller than 50%, thereby lowering the brightness of the display device. Particularly, since the liquid crystal display device uses such a polarizing plate 10 on the upper and lower sides of the liquid crystal panel, the luminance of the liquid crystal display device is further lowered.

The degree of polarization of the polarizing plate 10 depends on the degree of alignment of the iodine ion or the dichroic dye. However, since alignment of the iodine ion or the dichroic dye is not easily controlled, there is a limit to increase the degree of polarization.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to solve the problem of luminance reduction of a display device by an absorption type polarizing plate.

Further, the present invention aims to solve the problem of polarization limitation of the absorption type polarizing plate.

According to an aspect of the present invention, there is provided a polarizing plate comprising a base film, and a plurality of polarizing patterns extending in a first direction on the base film and spaced apart from each other in a second direction, And transmits linearly polarized light through the polarizing plate.

That is, in the reflection type polarizing plate of the present invention, linearly polarized light in the second direction is transmitted between adjacent polarized light patterns, each of the polarized light patterns reflects linearly polarized light in the first direction, .

The pitch of the polarizing pattern is 1 nm to 150 nm, and the pitch can be adjusted to increase the degree of polarization of the reflection type polarizing plate.

Meanwhile, the reflective polarizer of the present invention can be applied to a liquid crystal display device or an organic light emitting diode display device.

As described above, the reflection type polarizing plate according to the present invention can increase not only the light passing through the polarizing pattern but also the light passing through the polarizing pattern.

When such a reflective polarizer is applied to a liquid crystal display device and an organic light emitting diode display device, the brightness of the display device can be improved.

On the other hand, it is possible to increase the degree of polarization of the reflection type polarizing plate by adjusting the pitch of the polarizing pattern, thereby increasing the contrast ratio of the liquid crystal display.

In addition, a reflection type polarizing plate may be applied to reflect external light to be used as a mirror type display device.

1 is a view schematically showing a conventional polarizer structure.
2 is a cross-sectional view schematically showing a reflection type polarizing plate according to an embodiment of the present invention.
3 is a view schematically showing transmission and reflection of light in a reflection type polarizing plate according to an embodiment of the present invention.
FIGS. 4A to 4D are schematic views illustrating a process of manufacturing a reflective polarizer according to an exemplary embodiment of the present invention.
5 is a cross-sectional view schematically showing a reflection type polarizing plate according to another embodiment of the present invention.
6 is a schematic view illustrating a process of manufacturing a reflective polarizer according to another embodiment of the present invention.
7 is a cross-sectional view schematically showing a liquid crystal display device including a reflection type polarizing plate according to the first embodiment of the present invention.
8 is a cross-sectional view schematically showing a display panel of a liquid crystal display device including a reflection type polarizing plate according to the first embodiment of the present invention.
9 is a cross-sectional view schematically showing a liquid crystal display device including a reflection type polarizing plate according to a second embodiment of the present invention.
10 is a cross-sectional view schematically showing an organic light emitting diode display device including a reflection type polarizing plate according to a third embodiment of the present invention.
11 is a cross-sectional view schematically illustrating a display panel of an organic light emitting diode display device including a reflection type polarizing plate according to a third embodiment of the present invention.

The reflection type polarizing plate of the present invention comprises a base film and a plurality of polarization patterns extending in a first direction on the base film and spaced apart in a second direction, and linearly polarized light in the second direction between adjacent polarization patterns And each of the polarization patterns reflects linearly polarized light in the first direction and transmits linearly polarized light in the second direction.

Each of the polarization patterns includes at least one first pattern layer and at least one second pattern layer, and the refractive index of the first pattern layer is different from the refractive index of the second pattern layer.

Wherein a refractive index of the first pattern layer in the first direction is different from a refractive index of the second pattern layer in the first direction and a refractive index of the first pattern layer in the second direction is different from a refractive index of the second pattern layer in the second direction, Direction.

The pitch of the polarizing pattern is 1 nm to 150 nm.

The reflective polarizer of the present invention further comprises a polymer nanopattern between the base film and the polarizing pattern.

On the other hand, the display device of the present invention includes a display panel and a reflection type polarizing plate having the above-mentioned configuration on one side of the display panel.

The display device of the present invention further includes an absorption type polarizing plate on the other side of the display panel, wherein the display panel includes a liquid crystal layer between the first and second substrates and the first and second substrates, Is parallel to the second direction.

Alternatively, the display device of the present invention may further include a sine wave plate between the display panel and the reflective polarizer, and an absorptive polarizer on the outer side of the reflective polarizer, wherein the display panel includes first and second electrodes, And an organic light emitting layer between the first and second electrodes, wherein the absorption axis of the absorption type polarizing plate is parallel to the first direction.

Hereinafter, embodiments of the present invention capable of solving the conventional problems will be described in detail with reference to the drawings.

2 is a cross-sectional view schematically showing a reflection type polarizing plate according to an embodiment of the present invention.

2, the reflective polarizer according to an exemplary embodiment of the present invention includes a base film 110, a plurality of nano patterns 120, and a plurality of polarizing patterns 130.

The base film 110 is made of a transparent material and is made of an amorphous thermoplastic resin including polymethyl methacrylate (PMMA) and polycarbonate (PC), or may be made of polyethylene terephthalate : PET). ≪ / RTI > Alternatively, the base film 110 may be an inorganic substrate such as glass.

A plurality of nano patterns 120 are formed on the base film 110. Each of the nano patterns 120 extends in a direction perpendicular to the paper surface, that is, in a first direction, and is spaced apart from each other at regular intervals along a second direction perpendicular to the first direction, Type structure. The width of the nano pattern 120 may be narrower from the lower surface contacting with the base film 110 toward the upper surface. Alternatively, the lower surface and the upper surface of the nanopattern 120 may have the same width.

The nanopattern 120 is made of a transparent polymer resin and is made of an amorphous thermoplastic resin including polymethyl methacrylate (PMMA) and polycarbonate (PC), or polyethylene terephthalate (polyethylene) terephthalate (PET). < / RTI > The nano pattern 120 may be formed integrally with the base film 110.

A polarization pattern 130 is positioned on each of the nano patterns 120. Like the nanopattern 120, each of the polarization patterns 130 may extend in a first direction perpendicular to the paper surface and may have a lattice-like structure spaced apart from each other at regular intervals along a second direction parallel to the paper surface .

The polarization pattern 130 includes at least one first pattern layer 132 and at least one second pattern layer 134 having different refractive indices. The refractive index of the first pattern layer 132 in the first direction and the refractive index of the second pattern layer 134 in the first direction are different from each other and the refractive index in the second direction of the first pattern layer 132 and the refractive index in the second direction The refractive index of the layer 134 in the second direction is the same.

The polarization pattern 130 may have a structure in which the first pattern layer 132 and the second pattern layer 134 are alternately arranged. Although the polarizing pattern 130 includes the four pattern layers 132 and 134 in the drawing, the present invention is not limited thereto.

The width of the polarization pattern 130 may be the same as the width of the top surface of the nanopattern 120. The width of the polarization pattern 130 may be greater than the width of the top surface of the nanopattern 120. In this case, the width of the polarization pattern 130 is preferably equal to or smaller than the width of the bottom surface of the nanopattern 120.

The distance between the centers of the adjacent two polarizing patterns 130 may be 1 nm to 150 nm and the thickness of the polarizing pattern 130 may be 50 nm to 500 nm, May be between 50 nm and 300 nm.

3 is a view schematically showing transmission and reflection of light in a reflection type polarizing plate according to an embodiment of the present invention.

Light L1 vibrating in a direction perpendicular to the polarizing pattern 130, that is, in the second direction, is transmitted between adjacent polarizing patterns 130, (Not shown) that vibrates in the first direction, that is, in the first direction, is reflected.

The light L2 that vibrates in a second direction having the same refractive index as that of the first pattern layer 132 and the second pattern layer 134 among lights incident on the polarizing pattern 130 transmits the polarizing pattern 130 And the light L3 vibrating in the first direction in which the refractive indexes of the first pattern layer 132 and the second pattern layer 134 are different from each other is reflected by the polarization pattern 130. [

As described above, the reflection type polarizing plate according to the embodiment of the present invention can increase the transmittance by the light L2 transmitted through the polarization pattern 130 as well as the light L1 transmitted between the polarization patterns 130. [ The transmittance of the reflection type polarizing plate according to the embodiment of the present invention can be increased by about 10% or more as compared with the transmittance by the light L1 transmitted between the polarization patterns 130. [

In addition, it is possible to increase the degree of polarization of the reflection type polarizing plate by adjusting the pitch (P1 in Fig. 2) of the polarizing pattern 130. [

A method of manufacturing a reflection type polarizing plate according to an embodiment of the present invention will be described with reference to FIGS. 4A to 4D.

FIGS. 4A to 4D are schematic views illustrating a process of manufacturing a reflective polarizer according to an exemplary embodiment of the present invention.

4A, a polymer solution is coated on the base film 110 and dried at a temperature of 40 to 100 DEG C to form a polymer layer 120a. Here, the polymer solution may be a solution containing a polymer, and may include a polymer formed by polymerizing monomers and / or oligomers. Alternatively, a solution containing a monomolecular and / or oligomer may be used instead of the polymer solution, and a polymer layer 120a may be formed by polymerizing monomers and / or oligomers in the solution.

The polymer layer 120a may include poly (methyl methacrylate) (PMMA), polycarbonate (PC), or polyethylene terephthalate (PET).

Next, an embossing drum 150 is disposed on the polymer layer 120a. The embossing drum 150 includes a plurality of engraved patterns 152 having a width of nanometer size on the surface and spaced apart from each other.

Next, as shown in Fig. 4B, by moving the embossing drum (150 in Fig. 4A) against the polymer layer (120a in Fig. 4A) in one direction, for example, from right to left in the drawing, A plurality of nano patterns 120 are formed. The nano patterns 120 are formed corresponding to the engraved patterns 152 of the embossing drum 150 (Fig. 4A). The width of the nano pattern 120 may be narrower from the lower surface contacting with the base film 110 toward the upper surface. Alternatively, the lower surface and the upper surface of the nanopattern 120 may have the same width.

Next, the nanopattern 120 is cured. At this time, an ultraviolet curing method or a thermosetting method may be used. For example, the nanopattern 120 may be cured by irradiating ultraviolet rays having an energy density of 1 mJ / cm 2 to 500 mJ / cm 2 , or may be thermoset at a temperature of 80 ° C to 120 ° C.

Next, as shown in FIG. 4C, the reflective polarizing film 130a is disposed on the base film 110 including the nano pattern 120. [ The reflective polarizing film 130a includes a first layer 132a and a second layer 134a having different refractive indices. The reflection type polarizing film 130a may have a structure in which the first layer 132a and the second layer 134a are alternately arranged.

The refractive index of the first layer 132a in the first direction and the refractive index of the second layer 134a in the first direction are different from each other and the refractive index of the second layer 134a in the second direction of the first layer 132a, The refractive index in the second direction is the same. The first direction corresponds to the longitudinal direction of the nanopattern 120, the second direction corresponds to the direction perpendicular to the first direction, and the spacing direction of the nanopattern 120.

Next, a photosensitive layer 140 is formed by applying photoresist on the reflective polarizing film 130a. The photosensitive layer 140 is selectively irradiated with ultraviolet rays having an energy density of 10 mJ / cm 2 to 100 mJ / cm 2 , and the photosensitive layer 140 is developed to form a photosensitive pattern (not shown).

Next, as shown in FIG. 4D, the reflective pattern 130a (FIG. 4C) is selectively etched with a photosensitive pattern (not shown) using an etching mask to form a polarizing pattern 130, and the photosensitive pattern is removed .

On the other hand, a protective layer (not shown) may be further formed on the polarization pattern 130.

In the reflection type polarizing plate according to the embodiment of the present invention, a uniform polarization pattern 130 can be formed using the polymeric nanopattern 120.

5 is a cross-sectional view schematically showing a reflection type polarizing plate according to another embodiment of the present invention.

5, the reflective polarizer according to another embodiment of the present invention includes a base film 210 and a plurality of polarizing patterns 230.

The base film 210 is made of a transparent material and is made of an amorphous thermoplastic resin including polymethyl methacrylate (PMMA) and polycarbonate (PC), or may be made of polyethylene terephthalate : PET). ≪ / RTI > Alternatively, the base film 110 may be an inorganic substrate such as glass.

A plurality of polarization patterns 230 are formed on the base film 110. Each of the polarization patterns 230 extends in a direction perpendicular to the paper surface, that is, in the first direction, and is spaced apart from each other at regular intervals along a second direction perpendicular to the first direction, Type structure.

The polarization pattern 230 includes at least one first pattern layer 232 and at least one second pattern layer 234 having different refractive indices. Here, the refractive index of the first pattern layer 232 in the first direction and the refractive index of the second pattern layer 234 in the first direction are different from each other, and the refractive index in the second direction of the first pattern layer 232 and the refractive index in the second direction The refractive index of the layer 234 in the second direction is the same.

The polarization pattern 230 may have a structure in which the first pattern layer 232 and the second pattern layer 234 are alternately arranged. In the drawing, the polarizing pattern 230 includes four pattern layers 232 and 234, but the present invention is not limited thereto.

The distance between the centers of the adjacent two polarizing patterns 230 may be 1 nm to 150 nm and the thickness of the polarizing pattern 230 may be 50 nm to 500 nm, May be between 50 nm and 300 nm.

The transmission and reflection of light in the reflection type polarizing plate according to another embodiment of the present invention are the same as those of the reflection type polarizing plate shown in FIG.

Accordingly, the reflection type polarizing plate according to another embodiment of the present invention can increase not only the light transmitted between the polarization patterns 230 but also the light transmitted through the polarization pattern 230.

In addition, it is possible to increase the degree of polarization of the reflection type polarizing plate by adjusting the pitch P2 of the polarizing pattern 230.

A method of manufacturing a reflection type polarizing plate according to another embodiment of the present invention will be described with reference to FIG.

6 is a schematic view illustrating a process of manufacturing a reflective polarizer according to another embodiment of the present invention.

6, a polarizing material layer 230a is formed by extruding a reflective polarizing material on a base film (not shown) at a temperature of 100 캜 to 300 캜 using an extruder 240. Although not shown, the polarizing material layer 230a may include a first layer and a second layer alternately arranged with different refractive indexes, and may be formed by extruding a plurality of first and second layers simultaneously.

An embossing drum 250 is then placed on the polarizing material layer 230a and the embossing drum 250 is pressed against the polarizing material layer 230a in one direction, Thereby forming a polarizing material pattern 230a.

Next, the polarizing material pattern 230b is stretched to form a polarizing pattern 230. [ At this time, the pitch of the polarizing pattern 230 may be 1 nm to 150 nm.

1st Example

FIG. 7 is a cross-sectional view schematically showing a liquid crystal display device including a reflective polarizer according to the first embodiment of the present invention. FIG. 8 is a schematic view of a liquid crystal display device including a reflective polarizer according to the first embodiment of the present invention. Sectional view schematically showing a display panel of one pixel region.

7, the liquid crystal display according to the first embodiment of the present invention includes a liquid crystal panel 310 as a display panel, a first polarizer 360 positioned on the first side of the liquid crystal panel 310, And a second polarizer 370 positioned on the second side of the liquid crystal panel 310. [ The first polarizing plate 360 is attached to the liquid crystal panel 310 through the first adhesive layer 382 and the second polarizing plate 370 is attached to the liquid crystal panel 310 through the second adhesive layer 384. [

Referring to FIG. 8, the liquid crystal panel 310 includes a first substrate 320, a second substrate 340, and a liquid crystal layer 350 between the first and second substrates 320 and 340.

A gate wiring (not shown) and a gate electrode 322 are formed on the inner surface of the first substrate 320. The gate wiring extends along one direction, and the gate electrode 322 is connected to the gate wiring. The gate electrode 322 may extend from the gate wiring or may be part of the gate wiring. The gate wiring and the gate electrode 322 may be made of aluminum, molybdenum, nickel, chromium, copper, or an alloy thereof, and may be a single layer or a multilayer structure. have.

A gate insulating film 324 is formed on the gate wiring and the gate electrode 322. A gate insulating film 324 may be formed of an inorganic insulating material of silicon nitride (SiNx) or silicon oxide (SiO 2).

A semiconductor layer 326 is formed on the gate insulating film 324 in correspondence with the gate electrode 322. The semiconductor layer 326 includes an active layer 326a of intrinsic amorphous silicon and an ohmic contact layer 326b of impurity-doped amorphous silicon.

Source and drain electrodes 328 and 329 are formed on the semiconductor layer 326. The source and drain electrodes 328 and 329 are spaced apart from the semiconductor layer 326 and the ohmic contact layer 326b is a source And drain electrodes 328 and 329, respectively. The active layer 326a is exposed between the source and drain electrodes 328 and 329 and the active layer 326a is formed in the same way as the source and drain electrodes 328 and 329 except between the source and drain electrodes 328 and 329 Shape. Alternatively, the source and drain electrodes 328 and 329 may partially cover the sides of the ohmic contact layer 326b and the active layer 326a.

The gate electrode 322 and the semiconductor layer 326, the source electrode 328 and the drain electrode 329 constitute the thin film transistor T and the active layer 326a exposed between the source and drain electrodes 328 and 329 Is a channel of the thin film transistor T.

The thin film transistor T has an inverted staggered structure in which the gate electrode 322 is located below the semiconductor layer 326 and the source and drain electrodes 328 and 329 are located above the semiconductor layer 326. [ ) Structure.

Alternatively, the thin film transistor may have a coplanar structure in which the gate electrode and the source and drain electrodes are located on one side of the semiconductor layer, that is, on the upper side of the semiconductor layer. In this case, the semiconductor layer may be made of polycrystalline silicon, and impurities may be doped on both sides of the semiconductor layer.

On the other hand, the semiconductor layer may be made of an oxide semiconductor, and in the case of an inversely staggered structure, the ohmic contact layer may be omitted.

Further, a data line (not shown) is formed of the same material in the same layer as the source and drain electrodes 328 and 329. The data wiring crosses the gate wiring to define the pixel region. At this time, the data line may cross the gate line at right angles, or alternatively at an angle. The data line may be connected to the source electrode 328, and a dummy semiconductor pattern having the same layer structure as the semiconductor layer 326 may be formed under the data line. Alternatively, the data line can be formed in direct contact with the gate insulating film 324 without a dummy semiconductor pattern.

A protective layer 330 is formed on the source and drain electrodes 328 and 329 and on the data line. The protective layer 330 has a flat surface and has a drain contact hole 330a exposing the drain electrode 329. [ The passivation layer 330 may be formed of an organic insulating material such as benzocyclobutene (BCB) or photo acryl.

An inorganic insulating layer made of an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiNx) may be further formed under the protective layer 330.

A pixel electrode 334 and a common electrode 336 are formed in a pixel region above the passivation layer 330. The pixel electrode 334 is in contact with the drain electrode 329 through the drain contact hole 330a and the common electrode 336 is arranged alternately away from the pixel electrode 334. [ The pixel electrode 334 and the common electrode 336 may be formed of a transparent conductive material such as indium tin oxide or indium zinc oxide.

Here, common wiring (not shown) parallel to the gate wiring may be formed of the same material in the same layer as the gate wiring. At this time, the protective layer 330 has a common contact hole (not shown) exposing the common wiring together with the gate insulating film 324, and the common electrode 336 can contact the common wiring through the common contact hole.

Alternatively, the pixel electrode 334 and the common electrode 336 may overlap each other corresponding to the pixel region, and the electrode located above the pixel electrode 334 and the common electrode 336 may have a plurality of openings .

A first alignment layer 338 is formed on the pixel electrode 334 and the common electrode 336. The first alignment layer 338 may include a polyimide-based polymer compound. The surface of the first alignment layer 338 may have a constant directionality by the rubbing alignment method or the photo alignment method.

Such a first substrate 320 is referred to as an array substrate.

Meanwhile, the second substrate 340 is spaced apart from the first substrate 310. A black matrix 342 is formed on the inner surface of the second substrate 340. The black matrix 342 has an opening corresponding to the pixel region and may be formed corresponding to a gate wiring (not shown), a data wiring (not shown) and a thin film transistor T. [

A color filter layer 344 is formed under the black matrix 342 to correspond to the openings of the black matrix 342. The color filter layer 344 includes red, green, and blue color filters, and one color filter is sequentially and repeatedly arranged corresponding to one pixel region.

Here, the structure in which the color filter layer 344 is formed on the second substrate 340 has been described. However, the color filter layer may be formed on the first substrate 320. That is, the liquid crystal panel 310 of the present invention may have a color filter on array structure in which a color filter layer is formed on or under the thin film transistor T on the first substrate 320.

Such a color filter-on-array structure can increase the aperture ratio by reducing the cohesion margin of the first and second substrates 320 and 340. At this time, the black matrix may be formed or omitted on the first substrate 320, in which case the aperture ratio can be further increased.

Under the color filter layer 344, an overcoat layer 346 is formed for protection and planarization of the color filter layer 344. [ The overcoat layer 346 may be made of a thermosetting epoxy material or a photocurable acrylic material.

A second alignment layer 348 is formed under the overcoat layer 346. The second alignment layer 348 may include a polyimide-based polymer compound, and the surface of the second alignment layer 348 may have a constant directionality by the rubbing alignment method or the photo alignment method.

This second substrate 340 is referred to as a color filter substrate.

A liquid crystal layer 350 is positioned between the first alignment layer 338 and the second alignment layer 348. The liquid crystal molecules of the liquid crystal layer 350 have an initial alignment state according to the alignment directions of the first and second alignment films 338 and 348.

Referring again to FIG. 7, a first polarizing plate 360, which is a lower polarizing plate, is disposed on the first surface of the liquid crystal panel 310, that is, on the lower surface of the liquid crystal panel 310, Respectively. That is, one side of the first polarizing plate 360 is bonded to the first substrate (320 of FIG. 8) of the liquid crystal panel 310 through the first adhesive layer 382. The first adhesive layer 382 may be a pressure sensitive adhesive, that is, a pressure sensitive adhesive (PSA).

The first polarizing plate 360 is a reflection type polarizing plate that reflects linearly polarized light in the first direction and transmits linearly polarized linearly polarized light. The first polarizing plate 360 may have the structure shown in FIG. 2 or FIG.

On the other hand, a second polarizing plate 370, which is an upper polarizing plate, is attached to a second surface of the liquid crystal panel 310, that is, an upper surface on which an image generated by the liquid crystal panel 310 is output, through a second adhesive layer 384. That is, one side of the second polarizing plate 370 is bonded to the second substrate 340 (FIG. 8) of the liquid crystal panel 310 through the second adhesive layer 384. The second adhesive layer 384 may be a pressure-sensitive adhesive, that is, a pressure-sensitive adhesive.

The second polarizing plate 370 is an absorption type polarizing plate, and the absorption axis of the second polarizing plate 370 is parallel to the transmission axis of the first polarizing plate 360. Therefore, the second polarizing plate 370 transmits the linearly polarized light in the first direction and absorbs the linearly polarized light in the second direction.

The second polarizing plate 370 includes a polarizing layer 372 and first and second protective films 374 and 376. The polarizing layer 372 is disposed between the first and second protective films 374 and 376 and includes a first protective film 374, a polarizing layer 372, (376).

The polarizing layer 372 may be made of polyvinyl alcohol (PVA), and each of the first and second protective films 374 and 376 may be formed of a triacetyl cellulose (TAC) or a cyclic olefin polymer cyclic olefin polymer (COP). Here, the first and second protective films 374 and 376 may be referred to as a support film.

The second polarizing plate 370 may be formed by stretching polyvinyl alcohol in which iodine ions or dichroic dyes are dyed to form a polarizing layer 372 having an absorption axis in the stretching direction, And attaching first and second protective films 374 and 376 to both sides of the polarizing layer 372 to prevent the polarizing layer 372 from shrinking.

The second polarizing plate 370 has a second adhesive layer 384 attached to the outside of the first protective film 374 and a second adhesive layer 384 attached to the outside of the second adhesive layer 384 and the second protective film 376, (release film or separatable protection film) attached thereto, and the release film may be detached and the second adhesive layer 384 may be attached to the outer surface of the second substrate 340 (FIG. 8).

The liquid crystal display according to the first embodiment of the present invention can increase the brightness of a liquid crystal display by using a reflective polarizer having a relatively high transmissivity as a lower polarizer. At this time, the light utilization efficiency can be increased through the recycling effect of light by the reflection type polarizing plate.

In addition, the contrast ratio of the liquid crystal display device can be increased by adjusting the pitch of the polarizing pattern to increase the degree of polarization of the reflection-type polarizing plate. Here, the contrast ratio can be increased up to 50%.

Second Example

9 is a cross-sectional view schematically showing a liquid crystal display device including a reflection type polarizing plate according to a second embodiment of the present invention.

9, the liquid crystal display according to the second embodiment of the present invention includes a liquid crystal panel 410 as a display panel, a first polarizer 460 disposed on the first side of the liquid crystal panel 410, And a second polarizing plate 470 disposed on the second side of the liquid crystal panel 410. The liquid crystal panel 410 may have the structure shown in FIG.

A first polarizing plate 460, which is an upper polarizing plate, is attached to the upper surface of the liquid crystal panel 410 through which the image generated by the liquid crystal panel 410 is output, through the first adhesive layer 482. That is, one side of the first polarizing plate 460 is adhered to the second substrate (340 of FIG. 8) of the liquid crystal panel 410 through the first adhesive layer 482. The first adhesive layer 482 may be a pressure sensitive adhesive, that is, a pressure sensitive adhesive (PSA).

The first polarizing plate 460 is a reflection type polarizing plate, and reflects linearly polarized light in the first direction and transmits linearly polarized linearly polarized light. The first polarizing plate 460 may have the structure shown in FIG. 2 or FIG.

On the other hand, a second polarizing plate 470, which is a lower polarizing plate, is attached to the second surface of the liquid crystal panel 410, that is, the lower surface of the liquid crystal panel 410, through the second adhesive layer 484. That is, one surface of the second polarizing plate 470 is adhered to the first substrate (320 of FIG. 8) of the liquid crystal panel 410 through the second adhesive layer 484. The second adhesive layer 484 may be a pressure-sensitive adhesive, that is, a pressure-sensitive adhesive.

The second polarizing plate 470 is an absorption type polarizing plate, and the absorption axis of the second polarizing plate 470 is parallel to the transmission axis of the first polarizing plate 460. Accordingly, the second polarizing plate 470 transmits the linearly polarized light in the first direction and absorbs the linearly polarized light in the second direction.

The second polarizing plate 470 includes a polarizing layer 472 and first and second protective films 474 and 476. The polarizing layer 472 is disposed between the first and second protective films 474 and 476 and includes a first protective film 474, a polarizing layer 472, (476).

The polarizing layer 472 may be made of polyvinyl alcohol (PVA), and the first and second protective films 474 and 476 may be formed of triacetyl cellulose (TAC) or a cyclic olefin polymer cyclic olefin polymer (COP). Here, the first and second protective films 474 and 476 may be referred to as a support film.

The second polarizing plate 470 is formed by stretching polyvinyl alcohol in which iodine ions or dichroic dyes are dyed to form a polarizing layer 472 having an absorption axis in the stretching direction, And attaching the first and second protective films 474 and 476 to both sides of the polarizing layer 472 to prevent the polarizing layer 472 from shrinking.

The second polarizing plate 470 has a second adhesive layer 484 attached to the outside of the first protective film 474 and a second adhesive layer 484 attached to the outside of the second adhesive layer 484 and the second protective film 476, (release film or separatable protection film) attached thereto, and the release film may be detached and the second adhesive layer 484 may be attached to the outer surface of the first substrate (320 of FIG. 8).

The liquid crystal display according to the second embodiment of the present invention can increase the brightness of a liquid crystal display device by using a reflection type polarizing plate having a relatively large transmissivity as an upper polarizing plate and can reflect the external light to be used as a mirror type display device .

In addition, the contrast ratio of the liquid crystal display device can be increased by adjusting the pitch of the polarizing pattern to increase the degree of polarization of the reflection-type polarizing plate.

In the first and second embodiments, the reflection type polarizing plate of the present invention is disposed on one side of the liquid crystal panel, but the reflection type polarizing plate of the present invention may be disposed on both sides of the liquid crystal panel.

Third Example

FIG. 10 is a cross-sectional view schematically showing an organic light emitting diode display device including a reflection type polarizing plate according to a third embodiment of the present invention. FIG. 11 is a cross- Sectional view schematically showing a display panel of a light emitting diode display device, and shows one pixel region.

10, the organic light emitting diode display according to the third embodiment of the present invention includes a display panel 510, a quarter wave plate (QWP) 500 disposed on the display panel 510, A first polarizing plate 570 positioned on top of the quarter wave plate 560 and a second polarizing plate 580 located on the top of the first polarizing plate 570.

The display panel 510 is an organic light emitting diode panel and includes an organic light emitting diode De including a first electrode 542 and a light emitting layer 548 and a second electrode 550 on a substrate 520.

Referring to FIG. 11, in the organic light emitting diode panel 510, a semiconductor layer 522 patterned on an insulating substrate 520 is formed. The substrate 520 may be a glass substrate or a plastic substrate. The semiconductor layer 522 may be made of an oxide semiconductor material. Alternatively, the semiconductor layer 522 may be made of polycrystalline silicon. In this case, impurities may be doped on both edges of the semiconductor layer 522.

A gate insulating layer 524 made of an insulating material is formed on the entire surface of the substrate 520 on the semiconductor layer 522. The gate insulating film 524 may be formed of an inorganic insulating material such as silicon oxide (SiO 2 ). When the semiconductor layer 522 is made of polycrystalline silicon, the gate insulating film 524 may be formed of silicon oxide (SiO 2 ) or silicon nitride (SiNx).

A gate electrode 526 made of a conductive material such as metal is formed on the gate insulating film 524 in correspondence with the center of the semiconductor layer 522. A gate wiring (not shown) and a first capacitor electrode 528 are formed on the gate insulating film 524. Although not shown, the gate wiring extends along one direction, and the first capacitor electrode 528 is connected to the gate electrode 526.

In the third embodiment of the present invention, the gate insulating film 524 is formed on the entire surface of the substrate 520, but the gate insulating film 524 may be patterned to have the same shape as the gate electrode 526.

An interlayer insulating film 530 made of an insulating material is formed on the entire surface of the substrate 520 on the gate electrode 526 and the gate wiring and the first capacitor electrode 528. An interlayer insulating film 530 may be formed or an inorganic insulating material such as silicon oxide (SiO 2) or silicon nitride (SiNx), formed of an organic insulating material such as benzocyclobutene (benzocyclobutene) or the picture acrylate (photo acryl) .

The interlayer insulating film 530 has first and second contact holes 530a and 530b exposing upper surfaces on both sides of the semiconductor layer 522. [ The first and second contact holes 530a and 530b are located apart from the gate electrode 526 on both sides of the gate electrode 526. Here, the first and second contact holes 530a and 530b are also formed in the gate insulating film 524. Alternatively, when the gate insulating film 524 is patterned in the same shape as the gate electrode 526, the first and second contact holes 530 a and 530 b are formed only in the interlayer insulating film 530.

Source and drain electrodes 532 and 534 are formed on the interlayer insulating film 530 with a conductive material such as a metal. A data line (not shown) and a second capacitor electrode 536 are formed on the interlayer insulating film 530.

The source and drain electrodes 532 and 534 are spaced about the gate electrode 526 and contact both sides of the semiconductor layer 522 through the first and second contact holes 530a and 530b, respectively. Although not shown, the data wiring extends along the direction intersecting the gate wiring and crosses the gate wiring to define the pixel region. The second capacitor electrode 536 is connected to the source electrode 532 and overlaps the first capacitor electrode 528 to form a storage capacitor with the interlayer insulating film 530 between the two.

At this time, a power wiring (not shown) may be further formed on the interlayer insulating film 530, and a power wiring for supplying a high potential voltage may be located apart from the data wiring.

On the other hand, the semiconductor layer 522, the gate electrode 526, and the source and drain electrodes 532 and 534 form a thin film transistor. Here, the thin film transistor has a coplanar structure in which the gate electrode 526 and the source and drain electrodes 532 and 534 are located on one side of the semiconductor layer 522, that is, above the semiconductor layer 522.

Alternatively, the thin film transistor may have an inverted staggered structure in which a gate electrode is positioned below the semiconductor layer and source and drain electrodes are located above the semiconductor layer. In this case, the semiconductor layer may be made of amorphous silicon.

Here, the thin film transistor corresponds to a driving thin film transistor of the organic light emitting diode panel 510, and a switching thin film transistor (not shown) having the same structure as the driving thin film transistor is further formed on the substrate 520. The gate electrode 526 of the driving thin film transistor is connected to the drain electrode (not shown) of the switching thin film transistor and the source electrode 532 of the driving thin film transistor is connected to the power supply wiring (not shown). In addition, a gate electrode (not shown) and a source electrode (not shown) of the switching thin film transistor are connected to the gate wiring and the data wiring, respectively.

A protective film 540 is formed on the entire surface of the substrate 520 as an insulating material on the source and drain electrodes 532 and 534 and the data line and on the second capacitor electrode 536. The protective film 540 has a flat upper surface and a drain contact hole 540a that exposes the drain electrode 534. Here, the drain contact hole 540a is formed directly on the second contact hole 530b, but may be formed apart from the second contact hole 530b.

The protective layer 540 may be formed of an organic insulating material such as benzocyclobutene or photoacryl.

A first electrode 542 is formed of a conductive material having a relatively high work function on the protective film 540. The first electrode 542 is formed for each pixel region and contacts the drain electrode 534 through the drain contact hole 540a. For example, the first electrode 542 may be formed of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO).

On the first electrode 542, a bank layer 546 is formed of an insulating material. The bank layer 546 covers the edge of the first electrode 542 and has a through hole 546a that exposes the first electrode 542. [

A light-emitting layer 548 is formed on the first electrode 542 exposed through the transmission hole 546a of the bank layer 546. The light emitting layer 548 includes a light-emitting material layer.

A second electrode 550 is formed on the entire surface of the substrate 520 with a conductive material having a relatively low work function above the light emitting layer 548. Here, the second electrode 550 may be formed of aluminum, magnesium, silver, or an alloy thereof.

The light emitting layer 548 further includes a hole injecting layer and a hole transporting layer sequentially stacked from the top of the first electrode 542 between the first electrode 542 and the light emitting material layer And may further include an electron transporting layer and an electron injecting layer sequentially stacked from the top of the light emitting material layer between the light emitting material layer and the second electrode 550.

The first electrode 542 and the light emitting layer 548 and the second electrode 550 form an organic light emitting diode De and the first electrode 542 serves as an anode and the second electrode 550 serves as an anode. Serves as a cathode.

An encapsulation layer 552 is formed on the entire surface of the substrate 520 and an opposing substrate 554 is disposed on the encapsulation layer 552. [

The encapsulation layer 552 may be a face seal using a sealing material or may have a structure in which several layers of an inorganic film / an organic film / an inorganic film are stacked. The encapsulation layer 552 prevents external moisture from penetrating into the organic light emitting diode De to prevent damage to the organic light emitting diode De.

The encapsulation layer 552 may be formed on the counter substrate 554 and the encapsulation layer 552 may be formed on the counter substrate 554 and the encapsulation layer 552 and the second electrode The counter substrate 554 and the substrate 520 can be bonded together.

Alternatively, the encapsulation layer 552 may be formed directly on the second electrode 550 and then the counter substrate 554 may be disposed on the encapsulation layer 552 to form the counter substrate 554 and the substrate 520 May be cemented together.

Here, the organic light emitting diode panel 510 according to the embodiment of the present invention may be a top emission type in which light emitted from the light emitting layer 548 is output to the outside through the second electrode 550. At this time, the first electrode 542 further includes a reflective layer (not shown) made of an opaque conductive material. For example, the reflective layer may be formed of an aluminum-palladium-copper (APC) alloy, and the first electrode 542 may have a triple-layer structure of ITO / APC / ITO. In addition, the second electrode 550 may have a relatively thin thickness through which light is transmitted, and the light transmittance of the second electrode 550 may be about 45-50%.

Alternatively, the organic light emitting diode panel 510 may be a bottom emission type in which light emitted from the light emitting layer 548 is output to the outside through the first electrode 542. When the organic light emitting diode panel 510 is a bottom emission type, the positions of the substrate 520 and the organic light emitting diode De in the display panel 510 of FIG. 10 may be changed. That is, in FIG. 10, the substrate 520 of the display panel 510 is positioned between the four-sided wave plate 560 and the organic light emitting diode De.

Referring again to FIG. 10, the sine wave plate 560 has a phase delay of? / 4 to change the polarization direction of incident light by 90 degrees. Accordingly, the linearly polarized light having passed through the quarter wave plate 560 is converted into circularly polarized light, and the circularly polarized light having passed through the quarter wave plate 560 is converted into linearly polarized light.

The first polarizing plate 570 is a reflection type polarizing plate that reflects linearly polarized light in the first direction and transmits linearly polarized linearly polarized light. The first polarizing plate 570 may have the structure shown in FIG. 2 or FIG.

The second polarizing plate 580 is an absorption type polarizing plate, and the absorption axis of the second polarizing plate 580 is perpendicular to the transmission axis of the first polarizing plate 570. Accordingly, the second polarizing plate 580 absorbs the linearly polarized light in the first direction and transmits the linearly polarized light in the second direction. The second polarizing plate 580 may include a polarizing layer between the first and second protective films and the first and second protective films.

In this organic light emitting diode display device, of the light emitted from the light emitting layer 548, the linearly polarized light L1 in the second direction passes through the first and second polarizing plates 570 and 580 and is output to the outside. On the other hand, the linearly polarized light L2 in the first direction is reflected by the first polarizer 570 and then is reflected by the first electrode 542 to be changed in phase, passes through the first and second polarizers 570 and 580, do. Accordingly, the brightness is improved by the light L2 reflected by the first polarizer 570 and output.

As described above, the organic light emitting diode display device according to the third embodiment of the present invention can increase the brightness of the organic light emitting diode display device by applying the reflection type polarizing plate having a relatively high transmittance as the brightness enhancement film.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It can be understood that

110, 210: Base film 120: Nanopattern
130, 230: polarization pattern 132, 232: first pattern layer
134, 234: second pattern layer P1, P2: pitch
310, 410: liquid crystal panel 360, 460: first polarizer plate
370, 470: a second polarizer plate

Claims (12)

A base film;
A plurality of polarizing patterns extending in the first direction and spaced apart in the second direction on the base film,
/ RTI >
And transmits the first linearly polarized light in the second direction between adjacent polarization patterns,
Wherein each of the polarizing patterns reflects the linearly polarized light in the first direction and transmits the second linearly polarized light in the second direction.
The method according to claim 1,
Wherein each of the polarization patterns includes at least one first pattern layer and at least one second pattern layer,
And the refractive index of the first pattern layer is different from the refractive index of the second pattern layer.
3. The method of claim 2,
Wherein a refractive index of the first pattern layer in the first direction is different from a refractive index of the second pattern layer in the first direction and a refractive index of the first pattern layer in the second direction is different from a refractive index of the second pattern layer in the second direction, Directional refractive index.
The method according to claim 1,
And the pitch of the polarizing pattern is 1 nm to 150 nm.
The method according to claim 1,
And a nano pattern between the base film and the polarizing pattern.
6. The method of claim 5,
The nano pattern is made of any one of polymethyl methacrylate (PMMA), polycarbonate (PC), and polyethylene terephthalate (PET).
6. The method of claim 5,
Wherein the polarizing pattern is equal to or larger than an upper surface width of the nano pattern.
6. The method of claim 5,
Wherein the polarizing pattern is smaller than or equal to a lower width of the nano pattern.
A display panel;
A reflective polarizer according to any one of claims 1 to 8,
.
10. The method of claim 9,
Further comprising an absorption type polarizing plate on the other side of the display panel,
Wherein the display panel includes a liquid crystal layer between the first and second substrates and the first and second substrates,
And the absorption axis of the absorption type polarizing plate is parallel to the second direction.
10. The method of claim 9,
A quarter wave plate between the display panel and the reflective polarizer;
Further comprising an absorption type polarizing plate on the outer side of the reflection type polarizing plate,
Wherein the display panel includes an organic light emitting layer between the first and second electrodes and the first and second electrodes,
And an absorption axis of the absorption type polarizing plate is parallel to the first direction.
A base film;
A plurality of polarizing patterns extending in the first direction and spaced apart in the second direction on the base film,
/ RTI >
Reflects linearly polarized light in the first direction and transmits linearly polarized light in the second direction,
Wherein the linearly polarized light in the second direction includes a first linearly polarized light transmitted between the polarized light patterns and a second linearly polarized light transmitted through each of the polarized light patterns.
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Publication number Priority date Publication date Assignee Title
JP2011512558A (en) * 2008-05-22 2011-04-21 エルジー・ケム・リミテッド Brightness improving polarizing plate for organic light emitting devices
JP2015108845A (en) * 2015-02-09 2015-06-11 デクセリアルズ株式会社 Polarizing element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011512558A (en) * 2008-05-22 2011-04-21 エルジー・ケム・リミテッド Brightness improving polarizing plate for organic light emitting devices
JP2015108845A (en) * 2015-02-09 2015-06-11 デクセリアルズ株式会社 Polarizing element

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