KR101757215B1 - Particle beam mass analyzer having a second electronic controller - Google Patents

Particle beam mass analyzer having a second electronic controller Download PDF

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Publication number
KR101757215B1
KR101757215B1 KR1020150104409A KR20150104409A KR101757215B1 KR 101757215 B1 KR101757215 B1 KR 101757215B1 KR 1020150104409 A KR1020150104409 A KR 1020150104409A KR 20150104409 A KR20150104409 A KR 20150104409A KR 101757215 B1 KR101757215 B1 KR 101757215B1
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KR
South Korea
Prior art keywords
particle beam
particle
particles
unit
secondary electrons
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KR1020150104409A
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Korean (ko)
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KR20170012746A (en
Inventor
이준희
김용주
김득현
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(주)코셈
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/004—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn
    • H01J49/0086—Accelerator mass spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/107—Arrangements for using several ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H01J49/426—Methods for controlling ions

Abstract

The present invention relates to a particle beam mass spectrometer which removes secondary electrons generated in a lower portion of a particle in a particle lower portion of a particle by an electric field application method so that secondary electrons are not introduced into the current detection portion together with a charged particle beam Wherein the particle beam mass analyzer comprises:
The particle beam mass analyzer of the present invention comprises a vacuum chamber, a particle accumulation accelerating unit for concentrating and accelerating a gas including fine particles to form a particle beam, a particle collecting unit for charging the accelerated particle beam to a positive ion, A particle beam direction switching unit for changing an advancing path of the charged particle beam by forming an electric field; and a particle beam direction switching unit disposed between the particle charging unit and the particle beam direction switching unit, And a secondary electron control unit for generating an electromagnetic force to remove secondary electrons from the particle beam traveling direction.

Description

[0001] PARTICLE BEAM MASS ANALYZER HAVING A SECOND ELECTRONIC CONTROLLER WITH A SECONDARY ELECTRONIC CONTROLLER [0002]

The present invention relates to a particle beam mass analyzer, and more particularly, to a particle beam mass spectrometer capable of improving the accuracy of particle beam mass analysis by removing secondary electrons generated when particles to be analyzed are charged with positive ions. To a particle beam mass analyzer.

In general, processes requiring high precision, such as semiconductor and LCD processes, are being carried out in clean facilities such as clean rooms where the cleanliness of the products can be maintained. In order to detect contaminating particles Various types of particle measuring devices capable of measuring particles have been used.

Such particle measuring apparatuses are classified into various types according to the size of measuring particles and the measuring method, such as particle measuring apparatus using optical measuring method, particle measuring apparatus using gas mechanical measuring method, particle measuring apparatus using electrical measuring method . Among them, the particle measuring apparatus using an electrical measuring method is mainly used because it has an advantage of measuring ultrafine particles as compared with a particle measuring apparatus using other methods.

Particle beam mass spectrometer (PBMS) is a typical technique for particle measurement using an electrical method.

1 shows a conventional PBMS apparatus including a chamber 100, an aerodynamic lens 200, an electron gun 300, an electrostatic deflector 400, a Faraday cup 500, .

When the aerosol lens 200 is introduced into the inlet, the aerodynamic lens 200 converges the particles to the central axis through the lenses of various stages, flows into the focusing and accelerating state through the last acceleration nozzle into the first vacuum chamber, Since the gas is relatively light compared to the particles, it is discharged by the turbo pump and the particles are transferred to the electron gun.

The electron gun 300 accelerates secondary electrons to ionize the particle beam to charge the particles with positive ions. The electron gun 300 includes a cylindrical inner anode electrode 310 through which the particle beam passes, And a filament 330 disposed between the anode electrode 310 and the cathode electrode 320 to generate secondary electrons.

The deflector 400 is constituted by a deflection plate composed of about three meshes, and the voltage of the anode is applied to the mesh plate disposed in the middle to form an electric field. At this time, there may be a relationship between a specific-size particle and a specific voltage. For example, when a 1,000-V power supply is applied, when a 200-nm particle is a critical-size particle, do.

The Faraday cup 500 is a simple metal substrate having an electrode connected to the rear surface. When the particles adhere to the Faraday cup, positive ions contained in the particles are transferred to the electrode, and the current value of the electrode is measured by a meter .

However, according to the constitution of a general PBMS (Particle Beam Mass Spectrometer) constructed as described above, the electron gun accelerates secondary electrons to charge particles with positive ions. Secondary electrons generated at this time and secondary electrons generated by the filament Which is a problematic factor for lowering the measurement accuracy.

Conventionally, a method of removing secondary electrons by disposing a magnet on the outer wall of the chamber is used. As the thickness and size of the outer wall of the chamber increases, a magnet having a larger magnetic force is used, or the position of the magnet is changed The large magnetic force acts as an obstacle to the beam trajectory of charged particles.

Korean Patent No. 10-1104213 "Particle Beam Mass Spectrometer" Korean Patent No. 10-0772488 "Particle Measuring Apparatus and Method" Korean Patent Publication No. 10-2015-0034989 "Deflector Assembly Structure of Particle Measuring Apparatus"

SUMMARY OF THE INVENTION An object of the present invention to solve the drawbacks of the background art is to remove secondary electrons generated in a lower portion of a particle in a particle beam portion of a particle beam mass spectrometer by an electric field application method to generate a charged particle beam And a secondary electron controller for preventing the secondary electrons from flowing into the current detection unit together with the particle beam mass analyzer.

A particle beam mass analyzer having a secondary electron controller of the present invention for solving the problems includes a vacuum chamber, a particle collection accelerator for collecting and accelerating a gas including fine particles to form a particle beam, A particle beam direction switching unit for changing the traveling path of the charged particle beam by forming an electric field, and a particle beam direction switching unit disposed between the particle charging unit and the particle beam direction switching unit, And a secondary electron control unit for generating an electromagnetic force to remove the secondary electrons generated in the particle beam from the particle beam traveling direction.

Here, the secondary electron control section may include a metal plate disposed between the particle load section and the particle beam direction switching section, and a voltage applying device for applying a voltage to the metal plate, And a variable voltage applying device for varying a voltage applied to the metal plate according to the voltage.

The vacuum chamber may further include a magnet attached to an outer wall of the vacuum chamber to remove the secondary electrons.

According to the particle beam mass analyzer according to the embodiment of the present invention, an electric field applying device is disposed between the particle charging portion and the particle beam direction switching portion to remove secondary electrons generated in the particle charging portion, It is possible to improve the analysis accuracy of the particle beam.

In addition, according to the embodiment of the present invention, a voltage for generating an electric field for controlling secondary electrons can be varied in accordance with the kind and amount of particles, so that it can be applied to various kinds of particle beam mass analyzers. It is possible to reduce the size of the apparatus.

1 shows a conventional PBMS device.
2 is a block diagram of a particle beam mass analyzer having a secondary electronical controller according to an embodiment of the present invention.
3 is an enlarged view of a main part of Fig.
FIG. 4 is a perspective view of the particle lower portion of FIG. 2; FIG.
5 is a view for explaining a method of controlling a secondary electron generated in a positive ion lowering of a particle beam according to an embodiment of the present invention.

Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 2 is a diagram illustrating a particle beam mass analyzer having a secondary electron controller according to an embodiment of the present invention. FIG. 3 is an enlarged view of a main part of FIG. 2, and FIG. 4 is a perspective view of a particle lower part of FIG.

2 to 4, the particle beam mass spectrometer according to the present invention includes a particle accumulation accelerating unit 1, a vacuum chamber 2, a particle collecting unit 3, a magnet 4, (5), a particle beam direction switching unit (6), and a detection unit (7).

The particle accelerating unit 1 concentrates and accelerates a gas including fine particles to form a particle beam. The particle accelerating unit 1 is made up of a tube-shaped tubular body. A plurality of aerodynamic lenses 11 are arranged inside the tubular body have.

When the gas is introduced into the tubular body in which the aerodynamic lens of the particle accelerator 1 is arranged, the particles are concentrated and accelerated to the central axis while passing through the lens, and finally the shape is changed into the beam shape, And then flows into the low vacuum chamber 21.

At this time, it is preferable to accelerate the gas at a high speed since the gas progresses in the form of a narrow beam to prevent the scattering of the particles and the diffusion of the particles decreases as the gas advances at high speed.

Acceleration of the gas is achieved by the pressure difference between the gas pressure and the low vacuum chamber 21, and the gas introduced together is discharged to the outside by the turbo pump because it is relatively light as compared with the particles.

The vacuum chamber 2 is composed of a low vacuum chamber 21 supplied with the gas ejected from the particle accumulation accelerating section and a high vacuum chamber 22 connected in series to the downstream side of the low vacuum chamber, And the high vacuum chamber 22 are partitioned into a skimmer 23 having a through hole so that gas can pass therethrough.

At this time, the skimmer 23 serves to prevent the secondary electrons generated in the particle charging part 3 from flowing into the low vacuum chamber.

An electron gun (3) accelerates secondary electrons to ionize a particle beam to charge particles with positive ions. The electron gun has a cylindrical inner anode electrode (31) through which a particle beam passes, and an anode electrode And a filament 33 disposed between the anode electrode 31 and the cathode electrode 32 to generate secondary electrons.

In this case, the particle charging part 3 collides with the electrons to collide with the electrons to lose the charge of the particles, thereby charging the particles. When the electrons are generated in the filament 33, (32) accelerates.

The secondary electron control portion 5 is disposed between the particle charging portion 3 and the particle beam direction switching portion 6, and secondary electrons generated during the positive ion lowering of the particle beam in the particle charging portion are transmitted to the particle beam traveling path To prevent it from progressing together.

The secondary electron control unit 5 includes a metal plate 51 disposed on the front surface of the focusing unit 8 located between the particle charging unit 3 and the particle beam direction switching unit 6, And a variable voltage applying device 52 for applying a variable voltage to the metal plate in accordance with the kind and quantity.

The particle beam direction switching unit 6 is composed of a metal plate in the form of three mesh plates. In the middle of the three mesh metal plates, a mesh metal plate is applied with a positive voltage, and the mesh metal plates on both sides are grounded, An electric field is formed.

At this time, the reason why the particle beam direction switching unit 6 is formed of the mesh-shaped metal plate is that the particles can pass through and the gas flowing with a small amount of particles collides with each metal plate, .

The particle beam direction switching unit 6 composed of the three mesh metal plates is disposed at an angle of 45 degrees with respect to the direction of flow of the particles, and the traveling path of particles charged by the particle charging unit 3 is 90 ㅀ direction.

When the positively charged particles adhere to the metal substrate, the detection unit 7 transmits the positive ions held by the particles to the electrode, and measures the current value of the electrode using a meter.

In addition, the present invention may further include a magnet 4 attached to the outer wall of the high vacuum chamber 22 and restraining and removing secondary electrons generated during the positive ion bombardment of the particle beam at the particle charging part 3 .

Further, the present invention may further include an auxiliary sensing portion 9 for enabling the charged particle beam to be measured in the absence of the particle beam direction switching portion 6, and the auxiliary sensing portion 9 may include a sensor and an ammeter . ≪ / RTI >

FIG. 5 is a reference view for explaining a method of controlling secondary electrons generated in a positive ion exposure of a particle beam according to an embodiment of the present invention. FIG.

The operation of the particle beam mass spectrometer according to the present invention will be described with reference to FIGS. 2 to 5. The gas containing particles is introduced into the particle accelerator 1.

As described above, the gas that has accumulated in the tube body of the particle accelerator 1 is converged and accelerated through the plurality of aerodynamic lenses 11 of the particle accelerator 1, and finally converted into a beam shape, 21).

That is, since the gas containing the particles proceeds in the form of a narrow beam, the diffusion of the particles is prevented as much as possible. At this time, as the gas advances at a high speed, the diffusion of the particles decreases, so that it is preferable to advance the gas containing the particles at a high speed.

The particle beam introduced into the low vacuum chamber 21 passes through the skimmer 23 disposed between the particle accumulation accelerating part 10 and the particle charging part 30 to generate a high vacuum chamber 22 having an inetia moment, Respectively.

At this time, the skimmer 23 can block non-focused nanoparticles, and since the nanoparticles and gas thus blocked are relatively light compared to the particles, they are discharged through the pump 24 connected to the outside through the pump.

The particle beam introduced into the high vacuum chamber 22 is positively charged in the particle charging section 3 and positively charged. That is, when a voltage of several hundred volts is applied between the anode electrode 31 and the cathode electrode 32, and a current of several amperes is applied to the filament 33, the particle beam introduced into the anode electrode 31 becomes a filament 33, and is charged positively as it loses electrons.

The magnet (4) serves to attract and remove secondary electrons generated in the lower part of the particle beam in the particle lower part (3).

However, when the method of removing the secondary electrons by disposing the magnet 4 on the outer wall of the chamber is used, it is necessary to attach the magnet 4 having a larger magnetic force as the thickness and size of the outer wall of the chamber become larger. Depending on the amount, the position of the magnet must be changed. The large magnetic force may act as an obstacle to the beam trajectory of charged particles.

5, when the charged electron beam moves in the direction of the particle beam direction switching unit 6 using the secondary electron control unit 5 as shown in FIG. 5, the secondary electron travels in the traveling direction of the charged particle beam So that it can be removed by an electric field.

That is, when a positive voltage is applied to the metal plate 51 constituting the secondary electron control unit 5, an electric field is formed, whereby the metal plate 51 attracts the secondary electrons by the generated electric field, Electrons are removed, so that only the positively charged particles penetrate through the focusing portion 8.

At this time, the secondary electron control unit 5 can control the variable voltage applying unit 52 according to the type and amount of the particles to vary the voltage applied to the metal plate 51. That is, when only the magnet is used, there is a disadvantage that the size and position of the magnet must be changed according to the kind and amount of the particles.

However, the present invention has an advantage in that secondary electrons can be simply removed during particle beam analysis having various kinds and amounts even by changing the voltage applied to the metal plate 51. [

The charged particle beam is focused on the particle beam direction switching unit 6 after being focused by the focusing unit 8 and the particle beam incident on the particle beam direction switching unit 6 is focused on the particle beam direction switching unit 6 And is then diverted between the triple mesh plates to be incident on the detection unit 7.

That is, a positive voltage is applied to the second mesh plate 62, and as the first and third mesh plates 61 and 63 located on both sides are grounded, an electric field is formed between the respective mesh plates. At this time, since the particle beam direction switching unit 6 is disposed at an angle of 45 degrees, a part of the positively charged particle beam is refracted at the front of the first mesh plate 61 and is incident on the detection unit 7, Is incident on the second mesh plate (62) through the first mesh plate (61).

The particle beam incident in the direction of the second mesh plate 62 is refracted according to the electric field formed in accordance with the voltage of the second mesh, and is incident on the detection unit 7.

When the charged particle beam is incident on the detection unit 7, positive ions held by the particles are transmitted to the electrodes of the detection unit, and the mass of the particle beam can be measured using the current value of the electrode using a meter.

Although the present invention has been described in connection with the above-mentioned preferred embodiments, it is possible to make various modifications and variations without departing from the spirit and scope of the invention. Accordingly, the appended claims are intended to cover such modifications or changes as fall within the scope of the invention.

1: particle accelerating part 11: aerodynamic lens
2: vacuum chamber 21: low vacuum chamber
22: high vacuum chamber 23: skimmer
3: Particle charge 31: Anode electrode
32: cathode electrode 33: filament
4: Magnet 5: Secondary electronic control unit
51: metal plate 52: variable voltage application unit
6: Particle beam direction switching unit 61, 62, 63: Mesh plate
7:

Claims (4)

Vacuum chamber,
A particle collecting accelerator for collecting and accelerating a gas including fine particles to form a particle beam;
A particle charge portion for charging the accelerated particle beam to positive ions;
A particle beam direction switching unit for changing an advancing path of the charged particle beam by forming an electric field;
A detector for measuring a current generated by the charged particle beam whose traveling path is changed;
And a voltage application device for applying a voltage to the metal plate , wherein a secondary electron generated by the positive ion of the particle beam in the particle charge portion is supplied to the metal plate , A secondary electron control unit for generating an electromagnetic force to be removed in the particle beam traveling direction; And
A magnet attached to an outer wall of the vacuum chamber to remove secondary electrons existing in the vicinity of the outer wall; , ≪ / RTI &
Wherein the voltage application unit varies the voltage applied to the metal plate according to the type and amount of charged particles . delete delete delete
KR1020150104409A 2015-07-23 2015-07-23 Particle beam mass analyzer having a second electronic controller KR101757215B1 (en)

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KR1020150104409A KR101757215B1 (en) 2015-07-23 2015-07-23 Particle beam mass analyzer having a second electronic controller

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CN110648898B (en) * 2019-08-16 2022-02-11 上海裕达实业有限公司 Mass spectrum device and method for detecting multi-component gas in freeze-drying process

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KR100772488B1 (en) 2006-02-28 2007-11-05 (주)에이치시티 Apparatus and method for measuring particles
KR101104213B1 (en) 2009-09-28 2012-01-09 한국표준과학연구원 Particle beam mass spectroscopy
KR101585026B1 (en) 2013-09-27 2016-01-13 주식회사 이엘 Deflector Assembly Structure of a Particle Measuring Apparatus

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