KR101732260B1

KR101732260B1 - crushing apparatus

Info

Publication number: KR101732260B1
Application number: KR1020150105968A
Authority: KR
Inventors: 윤석구; 이종건; 박정재; 김도연
Original assignee: 고려대학교 산학협력단
Priority date: 2015-07-27
Filing date: 2015-07-27
Publication date: 2017-05-04
Also published as: KR20170013471A

Abstract

A supersonic jet injector which receives silicon particles from the supply hopper and injects the supernatant at supersonic speed; a collision plate which collides with supersonic jetted silicon particles positioned in front of the supersonic jet injector; A collecting unit installed at a lower portion of the collision plate for sorting and collecting silicon particles having a predetermined size crushed by the collision, and a refeeding unit connected to the collecting unit for collecting unsorted silicon particles and supplying the collected silicon particles to a supply hopper A silicon particle pulverizing apparatus is disclosed. As a result, silicon particles of a desired size can be obtained and the yield of silicon particles can be improved.

Description

A crushing apparatus comprises:

The present invention relates to a silicon particle pulverizing apparatus, and more particularly to a silicon particle pulverizing apparatus capable of pulverizing silicon particles by collision with supersonic impingement of silicon particles to obtain silicon particles of a desired size, Is recovered and then sprayed onto the impact plate is continuously performed to improve the yield of the silicon particles and to have a structure suitable for mass production at a low cost.

As a method for producing high-purity polycrystalline silicon, there is a method in which silicon produced by hydrogen reduction of trichloro-silane (SiHCl 3) in a seed type or bell-jar is precipitated on a high- The Siemens method is the most widely used method because the reaction area is limited to the silicon bar and therefore the productivity is low and the reaction vessel is cooled to prevent silicon precipitation on the surface of the quartz- And the cost of the silicon produced is high. Therefore, the research and development of a fluidized bed method capable of producing polycrystalline silicon at a lower price due to a high reaction surface area and a high yield compared with the Siemens method has been under way. Commercial production of semiconductor-grade polycrystalline silicon by a fluidized bed process using silane as raw material .

The fluidized bed process is a process in which heated silicon particles in a reactor are flowed with a silicon-containing gas such as monosilane or trichlorosilane and hydrogen, and silicon produced by pyrolysis or hydrogen reduction of the silicon-containing gas is precipitated on the surface of silicon particles to produce polycrystalline silicon .

As an example of such a fluidized bed method, as shown in U.S. Patent No. 4,900,411, silicon particles charged in a fluidized bed reactor are directly heated by a microwave while flowing silicon-containing silane gas and hydrogen, which are reaction gases, , The silane gas is pyrolyzed or reduced, and the generated silicon precipitates on the surface of the particles, and the silicon particles grow larger and larger.

In order to operate the fluidized bed reactor continuously, the amount and size of the charged silicon particles in the reactor should be kept within a certain range. To this end, the silicon particles deposited by deposition of silicon must be withdrawn from the bottom of the fluidized bed reactor and continuously supplied with fine silicon seed particles used to deposit silicon.

Conventional techniques for producing such silicon seed particles include pulverization of massive silicon of the Siemens process or granular silicon of a fluidized bed reactor by a mechanical means such as a ball mill and then classified by a metal sieve or the like There is a way.

However, the above-described method is accompanied by a separate cleaning process and a drying process due to contamination due to abrasion of the apparatus, and it is difficult to produce desired high-purity silicon seed particles.

Therefore, techniques for preventing contamination have been developed, and there are methods of Japanese Patent Application Laid-Open Nos. 58-145,611 and 4,691,866. The former method is to make silicon particles into fine particles with a roller mill composed of two high-purity silicon rods, and to separate and recover the fine particles in the particle size range required by a separate classifier, thereby producing high-purity silicon seed particles One of the disadvantages is that the abrasion of the silicon rod is severe, the loss of fine powder outside the desired particle size range is large, and the classification system is relatively complicated.

The latter method is a method of producing seed particles by causing silicon particles to accompany and accelerate in a gas flow and then colliding and grinding the silicon plate. Although this method can produce high-purity silicon seed particles, it is necessary to replace the silicon impingement plate at regular intervals due to the abrasion of the silicon impingement plate, and since the silicon particles are pulverized in one collision, .

Japanese Patent Application Laid-Open No. 58-145,611 U.S. Patent No. 4,691,866

Disclosure of the Invention The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a structure suitable for mass production at low cost by having a simple structure and high grinding efficiency, The present invention has been made in view of the above problems.

According to an aspect of the present invention, there is provided a method of manufacturing a honeycomb structured body, including: a supply hopper for storing silicon particles; a supersonic jet injector for injecting silicon particles from the supply hopper at supersonic speed; A collision plate in which supersonic injected silicon particles collide with each other, a collection unit arranged at a lower portion of the collision plate for selectively collecting silicon particles of a predetermined size crushed by the collision, and a silicon particle And a re-supply unit which recovers the waste water and supplies it to the supply hopper.

Here, the supply hopper is preferably provided with particle heating means for preheating the stored silicon particles.

The supersonic jet injector includes a jet nozzle having a jet port for receiving silicon particles from the supply hopper and formed with an jet port toward the jet plate, a supersonic jet flow channel connected to the jet nozzle, Device.

Preferably, the airflow generating device is provided with airflow heating means for heating airflow supplied to the injection nozzle.

The collecting unit includes a collecting container provided at an upper portion of the impingement plate and inclined toward the lower portion of the impingement plate and having a mesh of a predetermined size, and a collecting container installed at a lower portion of the collecting container to collect silicon particles passed through the collecting container .

It is preferable that a guide plate is provided on the upper part of the collection container to guide the silicon particles passed through the collection container to the collection container.

In addition, it is preferable that a vibrator for vibrating the teacup is installed between the collision plate and the collection unit.

In addition, it is preferable that the impingement plate and the transducer are connected by a damper to prevent the vibration of the transducer from being transmitted to the impingement plate.

The re-supply unit may include a recovery container connected to the lower end of the tray, a pipe connecting the recovery container and the supply hopper, and a negative pressure sensor installed in the pipe to allow the silicone particles of the recovery container to move to the supply hopper, And a recovery pump for generating a recovery fluid.

In addition, it is preferable to further include a chamber surrounding the supersonic jet injector, the impact plate, and the collection unit.

The silicon particle pulverizing apparatus of the present invention collides with the impingement plate at supersonic speed until the silicon particles have a desired size, and the silicon particles smaller than the mesh size of the silicon particles, And the silicon particles having a size larger than the mesh of the turntable are supplied to the supply hopper through the re-supply unit, and then are re-injected toward the impact plate, so that the silicon particles are crushed to have a desired size .

Particularly, the silicon particle pulverizing apparatus of the present invention has a simple structure and a high grinding efficiency, as well as an improved yield of silicon particles, enabling mass production of silicon particles at low cost.

1 is a block diagram showing a main configuration of a silicon particle pulverizing apparatus according to the present invention.
2 is a side view showing a silicon particle pulverizing apparatus according to the present invention.
3 is a partially enlarged view showing a supply hopper among the silicon particle pulverizing apparatuses according to the present invention.
4 is a side view showing another embodiment of the silicon particle pulverizing apparatus according to the present invention.
5 is a side view showing still another embodiment of the silicon particle pulverizing apparatus according to the present invention.

The terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary meanings and the inventor may properly define the concept of the term to describe its invention in the best possible way And should be construed in accordance with the principles and meanings and concepts consistent with the technical idea of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a block diagram showing a main configuration of a silicon particle pulverizing apparatus according to the present invention. The apparatus for grinding silicon particles according to the present invention comprises a supply hopper 100 for storing silicon particles, a supersonic jet injector 200 for supplying silicon particles from the supply hopper 100 and injecting the supersonic jet, A collision plate 300 disposed in front of the injector 200 to collide with supersonic silicon particles and a collision plate 300 installed at a lower portion of the collision plate 300 and colliding with the collision plate 300, And a re-supply unit 500 connected to the collection unit 400 for collecting unselected silicon particles and supplying the collected silicon particles to the supply hopper 100.

In the silicon particle pulverizing apparatus having such a structure, the silicon particles of the supply hopper 100 are injected at supersonic speed through the supersonic jet injector 200 toward the impact plate so that the silicon particles collide with the impact plate 300 and are crushed, When the particle diameter of the silicon particles is smaller than the mesh of the trays 410, the particles are collected in the collection unit 400, and when the particles are larger than the mesh, the circulation is re-supplied to the supply hoppers 100 through the re-supply unit 500, So that it is possible to crush it by a particle diameter.

This will be described in more detail with reference to FIG. 2 is a side view showing a silicon particle pulverizing apparatus according to the present invention.

Referring to the drawings, the supply hopper 100 is filled with silicon particles to be pulverized and is temporarily stored. The upper part of the supply hopper 100 is shaped like a container having an open upper part, and the lower part is connected to the injection nozzle 210 of the supersonic jet injector 200, To supply silicon particles.

An upper portion of the supply hopper 100 is provided with a cover (not shown) to be opened and closed to prevent foreign matter from entering the supply hopper 100 after the silicon particles are charged into the supply hopper 100.

In order to smoothly transfer the silicon particles stored in the supply hopper 100 to the injection nozzle 210 of the supersonic jet injector 200, the supply hopper 100 is provided with the transfer screw 120 and the supply hopper 100 The particle heating means 110 is installed so that the stored silicon particles can be supplied to the injection nozzle 210 in a state where the temperature of the stored silicon particles is raised above a predetermined temperature. This will be described with reference to FIG.

The feed hopper 100 is provided with the feed screw 120 in the same direction as the direction in which the silicon particles are fed toward the injection nozzle 210. The feed screw 120 is composed of a rotating shaft 122 rotated by a driving motor and a blade 124 spirally wrapping around the outer circumference of the rotating shaft 122. The feeding screw 120 rotates the rotating shaft 122, The silicon particles stored in the spray nozzle 124 are agitated and the silicon particles are transferred toward the discharge port 130 connected to the spray nozzle 210.

At this time, a supply valve (not shown) is provided in the discharge port 130 for connecting the supply hopper 100 and the spray nozzle 210 to control the discharge of the silicon particles. The supply valve is electrically connected to a control unit (not shown) controlled by an operator so that the supply amount of the silicon particles injected to the impact plate 300 through the injection nozzle 210 is controlled.

Particle heating means 110 for preheating the stored silicon particles is provided in the supply hopper 100 to raise the temperature of the silicon particles injected through the injection nozzle 210 to a predetermined temperature and supply the impinging plate 210 300) can be smoothly pulverized.

Here, the constant temperature means a temperature at which the silicon particles stored in the supply hopper 100 are not melted. When the silicon particles are preheated by the particle heating means 110 installed in the supply hopper 100, The movement of the silicon particles in the supply hopper 100 is smoothly performed, and when the preheated silicon particles hit the impact plate, they can be easily pulverized to obtain a desired particle size.

3, the particle heating means 110, which preheats the silicon particles stored in the supply hopper 100, is composed of a hot wire wound along the inner surface of the supply hopper 100, Or the hot wire may be installed on the outer surface of the supply hopper 100 so that the silicon particles can be heated indirectly.

In some cases, the particle heating means 110 lowers the temperature of the silicon particles to a predetermined temperature or lower by lowering the temperature of the silicon particles to a predetermined temperature or more, thereby lowering the hardness of the silicon particles (breaking degree) It can be easily grinded. The particle heating means 110 for raising or lowering the temperature of the silicon particles can be selected depending on the physical properties of the silicon particles to be ground.

In some cases, the particle heating means may be provided in the vanes 124 of the transfer screw 120 to transfer the silicon particles stored in the supply hopper 100 to the discharge port 130 and to perform heat exchange .

Meanwhile, the supply hopper 100 is connected to the supersonic jet injector 200 to inject the silicon particles into the impingement plate 300. The supersonic jet injector 200 includes an injection nozzle 210 and an airflow generator 220. The injection nozzle 210 is formed with an inlet 212 for receiving silicon particles from the supply hopper 100. The injection port of the injection nozzle 210 is formed to face the collision plate 300 so that the silicon particles supplied through the injection port 212 are injected toward the impact plate 300 at the injection port.

At this time, the injection nozzle 210 is connected to the airflow generator 220 through a flow path so that the silicon particles can be injected into the impact plate 300. The air stream generator 220 supplies the working gas to the spray nozzle at a high pressure. At this time, the working gas may be an inert gas such as argon (Ar), nitrogen (N2), helium (He) This working gas is supplied to the injection nozzle 210 at a high pressure so that the working gas is injected at a supersonic velocity toward the collision plate 300.

When the working gas is injected into the injection nozzle 210, a negative pressure is generated in the injection port 212 of the injection nozzle 210 so that the silicon particles existing in the injection port 212 are naturally sucked into the injection nozzle 210 Gas is impinged toward the impact plate 300 so that the silicon particles collide with the surface of the impingement plate 300 to cause breakage of the silicon particles.

At this time, the air flow generator 220 for supplying the working gas to the injection nozzle 210 is provided with air flow heating means 230 for heating the working gas. The airflow heating means 230 may be a hot line installed along a flow path connecting the airflow generating device 220 and the injection nozzle 210 or may be heated to a high temperature and supplied to the airflow generating device 220, And may be a heat line installed in the airflow generating device 220 so as to be supplied to the injection nozzle 210 in a state of the airflow generating device 220. At this time, the working gas is heated to approximately 300 to 500 ° C by the air current heating means 230.

The working gas supplied at a high temperature and a high pressure is injected at a supersonic speed through the injection nozzle 210. The injection nozzle 210 has a structure in which the inside of the injection nozzle 210 is composed of a shrunk portion and an enlarged portion, The pressure can be maximized and the working gas can be injected at supersonic speed.

The shape of the injection nozzle 210 can be determined by the following equation (1).

Here, Ae is the jetting port area of the jetting nozzle, A * is the necking area of the jetting nozzle, Me is the Mach number of the air stream passing through the jetting port of the jetting nozzle, and r is the specific heat ratio of the working gas.

As described above, the injection nozzle 210 whose shape is determined by Equation (1) is preferably made of tungsten carbide so as to have excellent wear resistance and heat resistance, so that the heated working gas is heat transferred to the atmosphere or the outside So that the injection speed of the working gas injected into the collision plate 300 through the injection nozzle 210 is maximized.

Meanwhile, when the working gas is injected toward the impact plate 300 through the injection nozzle 210 as described above, the silicon particles in the inlet 212 are accelerated at supersonic speed by being injected into the working gas and injected into the impact plate 300 .

The silicon particles injected toward the collision plate 300 collide with the surface of the collision plate 300 to cause crushing. The collision plate 300 is preferably made of a material having excellent heat resistance and corrosion resistance such as zirconium .

The impact plate 300 has a flat surface formed on the front surface (surface where the silicon particles impinge), and its area is formed larger than the diffusion range of the silicon particles piled on the working gas injected from the injection nozzle 210, The silicon particles injected from the impeller 210 collide with the front surface of the impingement plate 300 and are crushed.

Meanwhile, a collection unit 400 for collecting and collecting silicon particles having a particle size crushed to a predetermined size by collision is installed at the lower part of the impact plate 300 as described above.

The collecting unit 400 includes a collecting container 410 having a mesh of a predetermined size and a collecting container 420 disposed below the collecting container 410 to collect the silicon particles passed through the collecting container 410.

At this time, the tray 410 is formed to be inclined from the lower end of the impact plate 300 toward the lower portion of the supersonic ejector 200, so that the silicon particles impinging on the impact plate 300 are slipped by the slope of the tray 410, The silicon particles having a size smaller than the mesh of the honeycomb 410 are collected in the collection container 420 through the sorter 410.

Preferably, the teaspoon 410, which determines the size of the ground silicon particles, is interchangeably disposed below the impact plate 300 so that the ground silicon particles can be sorted to a required size.

A vibrator 440 is provided between the impact plate 300 and the collection unit 400 to forcibly vibrate the sorter 410 so that the ground silicon particles smoothly move along the sorter 410, The silicon particles having a smaller size than the mesh are collected in the collection container 420 and the silicon particles having a size that can not pass through the mesh of the sorter 410 are slipped along the upper surface of the sorter 410, To the recovery container 510 of the recovery tank 510.

The vibrator 440 may be a device for vibrating the sorter 410 by continuously generating fine waves, for example, an ultrasonic vibration motor. In addition, the vibrator 440 may be configured to vibrate the sorter 410 up or down, or to vibrate the sorter.

The transducer 410 and the impingement plate 300 are connected to the damper 450 to prevent the vibration of the transducer 410 from being transmitted to the impingement plate 300 when the transducer 410 is vibrated by the vibrator 440. [ Lt; / RTI > The damper 450 is made of a cushioning material such as an elastic member such as a coil spring or a rubber exhibiting an elastic force so as to prevent the vibration generated when the turntable 410 vibrates from being transmitted to the impact plate 300.

The turntable 410 and the collection container 420 are connected by a guide plate 430 to prevent the crushed silicon particles from colliding with the surface of the collision plate 300 to be scattered to the outside. The guide plate 430 has a structure extending from the open top surface of the collection container 420 toward the tray 410 as shown in FIG.

That is, the guide plate 430 is preferably formed to be inclined from the open upper surface of the collection container 420 toward the lower edge of the sorter 410, so that the silicon particles passing through the sorter 410 are inclined, So as to be collected in the collection container 420. [0051] As shown in FIG.

The silicon particles having a size larger than the mesh of the sorter 410 are collected in a re-supply unit 500 connected to the lower end of the sorter 410, and then supplied again to the supply hopper 100. That is, the re-feed unit 500 includes a recovery container 510 connected to the lower end of the sorter 410, a channel 520 connecting the recovery container 510 and the supply hopper 100, And a recovery pump 530 for forming a negative pressure in the channel 520 so that the silicon particles in the recovery container can move to the supply hopper.

Accordingly, the silicon particles that have not passed through the mesh of the sorter 410 are gathered in the recovery container 510, and the collected silicon particles are supplied to the supply hopper 100 by the recovery pump 530, do.

The silicon particles supplied to the supply hopper 100 from the recovery container 510 are injected into the impingement plate 300 through the injection nozzle 210 of the supersonic jet injector 200, Collides with the collision plate 300 repeatedly and is crushed.

5, the silicon particle pulverizing apparatus according to the present invention may further include a supersonic jet injector 200, a collision plate 300, and a chamber 140 surrounding the collection unit 400.

The chamber 140 prevents the silicon particles injected from the injection nozzle 210 toward the impingement plate 300 from being scattered to the outside, thereby improving the yield of the pulverized silicon particles and preventing the foreign particles from being introduced from the outside So that high purity silicon particles can be obtained.

That is, the chamber 140 has a hollow box shape as shown in FIG. 5 and is formed so that the injection nozzle 210 of the supersonic jet injector 200 penetrates through the chamber 140, A plate 300 and a collection unit 400 are installed.

In this case, the re-supply unit 500 is shown as being installed outside the chamber 140 in FIG. 5, but in some cases, the re-supply unit 500 can also be installed inside the chamber 140, The installation position of the silicon particle pulverizing apparatus 500 can be flexibly varied depending on the installation place of the silicon particle pulverizing apparatus.

The silicon particle pulverizing apparatus according to the present invention as described above collides with the impact plate 300 at a supersonic speed until the silicon particles have a desired size, and is crushed by the collision plate 300. As a result, The silicon particles of the size larger than the mesh of the sorter 410 are supplied to the supply hopper 100 through the re-supply unit 500 and then transferred to the collision plate 410. [ The silicon particles can be pulverized to have a desired size, and the yield of the silicon particles can be improved.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. .

100: Feed hopper 110: Particle heating means
120: Feed screw 130:
140: chamber 200: supersonic sprayer
210: injection nozzle 212: inlet
214: jetting port 220: airflow generating device
230 air stream heating means 300 impact plate
400: Collection unit 410: Tape
420: collection container 430: guide plate
440: Vibrator 450: Damper
500: re-supply unit 510: recovery container
520: conduit 530: return pump

Claims

A supply hopper in which silicon particles are stored; A supersonic jet injector which receives silicon particles from the supply hopper and injects the supersonic jet; A collision plate positioned in front of the supersonic ejector and colliding with supersonic injected silicon particles and formed of zirconium; A collection unit installed at a lower portion of the collision plate for selectively collecting the silicon particles of a predetermined size crushed by the collision; And a re-supply unit connected to the collection unit for recovering unsorted silicon particles and supplying the recovered silicon particles to a supply hopper,
The supply hopper is provided with particle heating means for preheating the stored silicon particles,
Wherein the supersonic jet injector comprises: a jet nozzle having an injection port for receiving silicon particles from the supply hopper and an injection port formed toward the impact plate; And an airflow generator connected to the injection nozzle and connected to the flow passage to generate a supersonic airflow and supply the supersonic airflow to the injection nozzle,
Wherein the airflow generating device is provided with airflow heating means for heating airflow supplied to the injection nozzle,
The collecting unit may include a transversely inclined mesh tray disposed at a lower end of the impact plate toward the lower portion of the supersonic sprayer and having a mesh of a predetermined size; And a collection container installed at a lower portion of the tray to collect the silicon particles passed through the tray,
A guide plate is provided on the upper part of the collection container to guide the silicon particles passed through the collection container to the collection container,
A vibrator for vibrating the harvester is provided between the collision plate and the collection unit,
Wherein the impingement plate and the wick are connected by a damper to prevent vibration of the wick from being transmitted to the impact plate.

delete

The method according to claim 1,
The re-
A recovery container connected to a lower end of the tape;
A conduit connecting the recovery container and the supply hopper; And
And a recovery pump installed in the pipe to form a negative pressure in the pipe so that the silicon particles in the recovery container can be moved to the supply hopper.

The method according to claim 1,
Further comprising a chamber enclosing the supersonic ejector, the impact plate, and the collection unit.