KR101699179B1 - Exposing apparatus, and method of design for exposing apparatus - Google Patents

Exposing apparatus, and method of design for exposing apparatus Download PDF

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Publication number
KR101699179B1
KR101699179B1 KR1020150145945A KR20150145945A KR101699179B1 KR 101699179 B1 KR101699179 B1 KR 101699179B1 KR 1020150145945 A KR1020150145945 A KR 1020150145945A KR 20150145945 A KR20150145945 A KR 20150145945A KR 101699179 B1 KR101699179 B1 KR 101699179B1
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lamp
integrator
light
lamps
lamp group
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KR1020150145945A
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Korean (ko)
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KR20160100803A (en
Inventor
가나 와타나베
요시히코 야마다
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페닉스덴키가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

[PROBLEMS] To provide an exposure apparatus in which a plurality of lamps are optimally arranged.
An exposure apparatus (10) comprising a lamp group (11) composed of a plurality of lamps (12) and an integrator (14) for receiving light from a plurality of lamps (12) By satisfying the following conditional expressions 1 and 2, the above problems can be solved.
Conditional expression 1 a? Tan? 1 L 2
Conditional expression 2? 1 ? 2 =? 3
only,
a: the longitudinal dimension and the lateral dimension of the lamp group
L: distance from the exit position of the lamp group to the incidence position of the integrator
θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value
&thetas; 2 : opening angle of light from each lamp
θ 3 : Integrator incident angle

Description

EXPOSING APPARATUS AND METHOD OF DESIGN FOR EXPOSING APPARATUS [0002]

The present invention relates to, for example, an exposure apparatus used in semiconductor manufacturing and a method of designing the exposure apparatus.

For example, ultraviolet light is used for illumination of an exposure apparatus used for manufacturing a semiconductor or the like. For this reason, a plurality of lamps typified by a high-pressure discharge lamp are combined and used in the illumination of the exposure apparatus. In the exposure apparatus, a lens chain integrator that receives light from a plurality of lamps and increases the uniformity of the light is used.

Such a lamp adopts a capability according to the amount of light required in an exposure apparatus. If the capability is satisfied by one lamp (that is, " 1 "), If it can not be exposed, the exposure operation itself must be stopped. Therefore, it is common practice to supply a required amount of light to an exposure apparatus using a plurality of lamps having relatively small capacities (for example, Patent Document 1).

Japanese Patent Application Laid-Open No. 2010-72571

Conventionally, when a lamp group composed of a plurality of lamps is used in an exposure apparatus, the angle of the lamp is set to be larger so that the angle of the optical axis of the lamp with respect to the central axis of the integrator becomes larger as the lamps closer to the upper and lower ends or the left and right ends of the lamp group become larger. The number of lamps can be increased as much as the amount of light required for exposure. That is, it has been considered that the longitudinal dimension and the lateral dimension of the lamp group can be increased as much as possible.

However, the inventors have found that, when the angle of the optical axis of the lamp with respect to the central axis of the integrator increases, the light from the lamp located outside of any angle does not become effective light contributing to exposure. That is, although an exposure apparatus using a plurality of lamps is generally used, there is still room for improvement as to how to arrange the plurality of lamps.

Accordingly, an object of the present invention is to provide an exposure apparatus in which a plurality of lamps are optimally arranged, and a method of designing an exposure apparatus for optimally disposing a plurality of lamps.

According to an aspect of the present invention,

A lamp group including a plurality of lamps,

And an integrator that receives light from the plurality of lamps and increases the uniformity of the light,

The exposure apparatus satisfying the following conditional expressions 1 and 2 is provided.

Conditional expression 1 a? Tan? 1 L 2

Conditional expression 2? 1 ? 2 =? 3

only,

a: the longitudinal dimension and the lateral dimension of the lamp group

L: distance from the exit position of the lamp group to the incidence position of the integrator

θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value

&thetas; 2 : opening angle of light from each lamp

θ 3 : Integrator incident angle

to be.

Also, it is appropriate to use a discharge lamp for the lamp, and to set the interval of the discharge lamp between 0.8 mm and 1.5 mm.

It is also appropriate to dispose a convex lens on the surface side facing the lamp group in the integrator.

It is also preferable to arrange a lamp front lens for reducing diffusion of light from the lamp on the surface side facing the integrator in the lamp.

According to another aspect of the present invention,

A lamp group including a plurality of lamps,

An integrator that receives light from the plurality of lamps and increases the uniformity of the light is used,

The following conditional expressions 1 and 2 are satisfied.

Conditional expression 1 a? Tan? 1 L 2

Conditional expression 2? 1 ? 2 =? 3

only,

a: the longitudinal dimension and the lateral dimension of the lamp group

L: distance from the exit position of the lamp group to the incidence position of the integrator

θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value

&thetas; 2 : opening angle of light from each lamp

θ 3 : Integrator incident angle

to be.

According to the present invention, it is possible to provide an exposure apparatus in which a plurality of lamps are optimally arranged, and a method of designing an exposure apparatus for optimally arranging a plurality of lamps.

1 is a diagram showing an exposure apparatus 10 according to one embodiment.
Fig. 2 is a view showing an example of the lamp 12. Fig.
3 is a view showing an example of the lamp body 20. As shown in Fig.
4 is a longitudinal sectional view (a) and a front view (b) showing the longitudinal dimension V and the lateral dimension H of the lamp group 11, respectively.
5 is a view for explaining the " integrator incidence angle [theta] 3 ".
Fig. 6 is a diagram showing the positional relationship between the lamp group 11 and the integrator 14. Fig.
7 is a graph showing the relationship between the angle θ formed by the central axis CL of the integrator 14 and the optical axis LCL of the lamp 12 and the amount of light contributing to exposure of the exposure target X.
8 is a diagram showing the positional relationship between the lamp group 11 and the integrator 14 according to another embodiment.
Fig. 9 is an enlarged view of the vicinity of the integrator 14 in the embodiment shown in Fig.
10 is a diagram showing the positional relationship between the lamp group 11 and the integrator 14 according to yet another embodiment.

Fig. 1 shows an exposure apparatus 10 according to one embodiment to which the present invention is applied. The exposure apparatus 10 has a lamp group 11, an integrator 14, a concave mirror 16, and an irradiation surface 18 approximately.

The lamp group 11 is composed of a plurality of lamps 12. The lamp 12 emits light including a wavelength suitable for exposure of the object X to be exposed. The type of the lamp 12 is not particularly limited, but in this specification, a case where a high-pressure discharge lamp is used as the lamp 12 will be described as an example.

Each of the lamps 12 is provided with a lamp body 20 and a reflector 22 as shown in Fig.

As described above, for example, a high-pressure discharge lamp is used for the lamp body 20. [ The lamp body 20 has a light emitting tube portion 102 and a pair of sealing portions 104 extending from the light emitting tube portion 102 as shown in Fig. The light emitting tube portion 102 and the pair of sealing portions 104 are integrally formed of quartz glass. An internal space 106 sealed by the sealing portion 104 is formed in the arc tube portion 102. A foil 108 made of molybdenum is embedded in each of the sealing portions 104.

The lamp body 20 is also provided with a pair of tungsten electrodes 110 having one end connected to one end of the foil 108 and the other end disposed in the internal space 106, 108 and a pair of lead rods 112 extending from the sealing portion 104 to the outside at the other end. A predetermined amount of mercury 114 and a halogen (for example, bromine) are sealed in the inner space 106.

When a predetermined high voltage is applied to a pair of lead rods 112 provided in the lamp body 20, the glow discharge initiated between a pair of electrodes 110 provided in the inner space 106 of the bulb 102 The arc is transferred to the arc discharge, and light (mainly ultraviolet ray in this embodiment) is emitted by the mercury 114 evaporated / excited by the arc.

Returning to Fig. 2, the reflector 22 has a main reflecting surface 24 on its inner surface. The reflecting surface 24 reflects a part of the light from the lamp body 20 arranged so that the bulb 102 is positioned inside the reflector 22. In this embodiment, the reflecting surface 24 is defined as a rotational paraboloid. The light emission point (roughly, the middle position of the pair of electrodes 110 in the inner space 106) in the lamp body 20 coincides with the focal point of the rotation parabola. The light emitted from the light emitting point of the lamp body 20 and reflected from the reflecting surface 24 and then emerging from the light exiting surface 25 of the reflector 22 becomes substantially parallel light. Of course, the shape of the reflecting surface 24 is not limited to this, and may be a paraboloid of revolution, another rotating surface, or a shape other than a rotating surface.

The light emitted from the lamp body 20 is incident on the lamp body 20 at a predetermined angle (hereinafter referred to as the " open angle? 2 ") about the optical axis LCL, The reflector 22 is moved in the forward direction.

The lamp group 11 has a longitudinal dimension V and a lateral dimension H, as shown in Fig. The longitudinal dimension V of the lamp group 11 is a distance from the center of the reflector 22 (more precisely, the reflecting surface 24 of the reflector 22) in the lamp 12 at the uppermost position in the vertical direction, Refers to the distance to the center of the reflector 22 (more precisely, the reflecting surface 24 of the reflector 22) in the lamp 12 at the lowest position in the vertical direction. The horizontal dimension H of the lamp group 11 is a dimension of the reflector 22 (more precisely, the reflecting surface 24 of the reflector 22) of the lamp 12 in the horizontal direction, Refers to the distance from the center to the center of the reflector 22 (more precisely, the reflecting surface 24 of the reflector 22) in the leftmost lamp 12 in the vertical direction.

1, the integrator 14 includes an incident surface 26 for receiving light from the plurality of lamps 12 and an exit surface 28 for increasing the uniformity of the received light and emitting the light Have. A plurality of fly-eye lenses 30 are formed on the incident surface 26 and the exit surface 28, respectively.

As shown in Fig. 5, the integrator 14 has an integrator incident angle? 3 determined based on factors such as the shape of the fly's eye lens 30. The focal point F of the fly-eye lens 30 on the center axis FCL passing through the center of the fly-eye lens 30 constituting the integrator 14 and the focal point F of the fly- Is a straight line (G). At this time, the integrator incident angle? 3 is defined as an angle formed by the straight line G and the center axis FCL. The center axis CL of the integrator 14 and the center axis FCL of the fly's eye lens 30 are generally parallel to each other.

When the angle between the light from the lamp 12 toward the entrance surface 26 of the integrator 14 and the central axis CL of the integrator 14 is within this integrator incidence angle 3 , And is emitted at a desired angle from the exit surface 28 of the projection optical system 14 to expose the object X to be exposed. In other words, light that illuminates the incident surface 26 of the integrator 14 at an angle larger than the integrator incident angle? 3 is not effectively emitted from the exit surface 28 and does not contribute to the exposure of the exposure object X Light.

Returning to Fig. 1, the concave mirror 16 has a reflective concave surface 32 formed inside thereof. The concave mirror 16 reflects the light emitted from the integrator 14 on the reflective concave surface 32 to be parallel light.

The irradiation surface 18 is a surface that receives parallel light from the concave mirror 16 and is arranged in a direction substantially perpendicular to the parallel light. On the irradiation surface 18, the object X to be exposed is placed. The surface of the object to be exposed X is coated with a photosensitive agent, for example. A desired circuit pattern or the like is formed on the surface of the object to be exposed X by irradiating a desired region of the object X with parallel light from the concave mirror 16.

In this embodiment, the positional relationship between the lamp group 11 composed of the plurality of lamps 12 and the integrator 14 is set to satisfy the following conditional expressions 1 and 2 (see FIG. 6).

Conditional expression 1 a? Tan? 1 L 2

Conditional expression 2? 1 ? 2 =? 3

here,

a: the longitudinal dimension (V) and the lateral dimension (H) of the lamp group (11)

L is the distance from the exit position S of the lamp 12 to the incidence position R of the integrator 14,

θ 1: each of the lamp 12, the optical axis (LCL) with the center axis (CL), the angle (θ) forming the integrator 14, the maximum value of

? 2 : opening angle of light from each lamp 12

θ 3 : Integrator incident angle

to be.

The lamp 12 closest to the upper and lower ends or the left and right ends of the lamp group 11 has a smaller diameter than that of the lamp 12 when the lamp group 11 composed of a plurality of lamps 12 is used in the exposure apparatus 10. [ Considering the arrangement angle of the lamp 12 so that the angle? Of the central axis CL of the integrator 14 with respect to the optical axis LCL is large, the number of the lamps 12 It is thought that it can increase. That is, it has been considered that the longitudinal dimension V and the lateral dimension H of the lamp group 11 can be increased as much as possible.

However, due to the arrangement angle of the lamp 12, the angle [theta] formed by the optical axis LCL of the lamp 12 and the central axis CL of the integrator 14 becomes large and the light from the lamp 12 And the central axis CL of the integrator 14 is larger than the integrator incident angle? 3 , the light is not the effective light contributing to the exposure.

7 is a graph showing the relationship between the angle θ formed by the central axis CL of the integrator 14 and the optical axis LCL of the lamp 12 on the abscissa, Is a graph in which the amount of light that is effectively emitted from the exit surface 28 of the integrator 14 and contributes to the exposure of the exposure target X is taken along the vertical axis. In this graph, the integrator incident angle? 3 is 6 占 and the opening angle? 2 of the lamp 12 is 2 占.

Then, between the angle " 0 " and the " integrator incidence angle 3 - open angle 2 " (i.e., between 0 and 4 degrees) Almost all contribute to the exposure. However, when the angle [theta] is larger than the [integrator incident angle ([theta] 3 ) - open angle [theta] 2 (that is, larger than 4 degrees), the amount of light contributing to exposure decreases. Further, almost all the light from the lamp 12 can not contribute to exposure when the angle [theta] is larger than the " integrator incident angle [theta] 3 + open angle [theta] 2 " That is, at least a part of the light emitted from the lamp 12 contributes to the exposure of the exposure target object X when? 3 + open angle? 2 ?

On the assumption that "θ 3 = θ-θ 2" is satisfied based on the above finding, returning to Figure 6, up to the incident position (R) of the integrator 14 from the outgoing light position (S) of the lamp group 11 of the distance (L) to the box and in addition, the center axis (CL), the angle (θ) forming the optical axis (LCL) and the integrator (14) of each lamp 12, the maximum value of θ 1 (typically, the angle (θ (Hereinafter, referred to as " the best position lamp D ") arranged at a position farthest from the center of the lamp group 11 is defined as the maximum value. That is, "? 3 =? 1 - ? 2 " (conditional expression 2).

Then, the longitudinal dimension (V) and the lateral dimension (H) of the lamp group 11 are set within the dimension (a) calculated as "tan? 1占 L 占 2". That is, " a? Tan? 1 x L x 2 " (conditional expression 1). The most suitable position lamp D having the maximum value (? 1 ) out of the angle? Between the optical axis LCL of each lamp 12 and the central axis CL of the integrator 14 , At least a part of the light emitted from the light source 14 is incident on the integrator 14 within the integrator incident angle? 3 , thereby contributing to exposure. In other words, the light from the lamp 12 disposed outside the dimension (a) becomes unnecessary light that does not contribute to exposure.

The outgoing light position S of the lamp group 11 is a straight line J connecting the centers of the reflectors 22 in the pair of outermost lamps 12 constituting the lamp group 11, And the center axis CL of the integrator 14 intersect with each other. The incidence position R of the integrator 14 is a position where the plane contacting the top point of each fly's eye lens 30 constituting the integrator 14 and the center axis CL of the integrator 14 cross It says. In addition, the height A of the integrator 14 is sufficiently small (i.e., a " A " and L " A) relative to the dimension a or the distance L.

Therefore, according to the exposure apparatus 10 of this embodiment, it is possible to avoid the generation of the lamp 12, in which all the emitted light becomes unnecessary light that does not contribute to the exposure, and all the lamps 12 can contribute to the exposure have.

(Modified example)

(1) The spacing distance between the pair of electrodes 110 (i.e., the " electrode interval " of the lamp 12) is preferably 0.8 mm or more and 1.5 mm or less. Further, the electrode interval is related to the opening angle? 2 of the lamp 12. When the electrode interval becomes narrow, the open angle? 2 of the lamp 12 becomes small. On the other hand, if the electrode interval is widened, the open angle? 2 of the lamp 12 becomes large. Therefore, in consideration of the arrangement state of the lamp 12 in the lamp group 11, it is preferable that the electrode intervals of the lamps 12 are changed as necessary to satisfy the conditional expressions (1) and (2) desirable.

(2) For the exposure apparatus 10 according to the above-described embodiment, as shown in Figs. 8 and 9, a convex lens 50 may be further added. The convex lens 50 is disposed on the side of the integrator 14 facing the lamp group 11, that is, on the side of the incident surface 26. [ As shown in the figure, the convex lens 50 is preferably disposed at a position where the lens center 52 is included in a plane tangent to the apex of each fly-eye lens 30, . In other words, it is appropriate to match the position of the lens center 52 with the incidence position R of the integrator 14 with each other.

By providing such a convex lens 50, the light from each lamp 12 is refracted so that the angle formed by the convex lens 50 and the central axis CL of the integrator 14 becomes small. In other words, the light contributing to the exposure of the exposure object (X), that is, light incident on the incident surface 26 of the central axis (CL) and forming an angle θ 1 integrator 14, θ 1 + α ( " alpha " is an angle determined by the convex lens 50). As a result, it becomes possible to make the value a of the longitudinal dimension V and the lateral dimension H of the lamp group 11 larger (= a +?) 11, it is possible to increase the light contributing to the exposure of the exposure target X. Therefore, it is preferable to satisfy the conditional expressions (1) and (2) by changing the curvature of the convex lens 50 as necessary in consideration of the arrangement state of the lamp 12 in the lamp group 11 Do.

(3) Apart from the modified example (2), as shown in Fig. 10, the lamp front lens 60 may be further added to the exposure apparatus 10. Fig. The lamp front lens 60 is disposed on the surface side of the lamp 12 facing the integrator 14, that is, on the light exit surface 25 side. The lamp front lens 60 has a role of reducing the diffusion of light from the lamp 12. As shown in the figure, the lamp front lens 60 may be provided for each lamp 12, or one lamp front lens 60 may be provided for one lamp group 11. [ The lamp front lens 60 can be a convex lens, a Fresnel lens, or any other type of lens as long as it can reduce the diffusion of light from the lamp 12 as described above.

By providing such a lamp front lens 60, the light from each lamp 12 in the lamp front lens 60 is refracted so that the angle formed by the central axis CL of the integrator 14 becomes small. In other words, when the value "a" of the longitudinal dimension V and the lateral dimension H of the lamp group 11 are the same, it is possible to use the lamp 12 having a larger opening angle θ 2 . Conversely, when the lamp 12 having the same open angle? 2 is used, the value a of the longitudinal dimension V and the lateral dimension H of the lamp group 11 is It is possible to increase the amount of light contributing to the exposure of the exposure object X by including a larger number of the lamps 12 in the lamp group 11 (= a +?). Therefore, in consideration of the arrangement state of the lamp 12 in the lamp group 11, it is possible to change the curvature of the lamp front lens 60 as required to satisfy the conditional expressions (1) and (2) desirable.

It is to be understood that the embodiments disclosed herein are by way of illustration and not of limitation in all respects. The scope of the present invention is not limited to the above description, but is intended to cover all modifications within the meaning and scope of equivalents to the claims of the invention, which are set forth in the appended claims.

10 ... Exposure device, 11 ... Lamp group, 12 ... Lamp, 14 ... Integrator, 16 ... Vertical surface, 18 ... The survey surface, 20 ... Lamp body, 22 ... Reflector, 24 ... Reflection, 25 ... Exiting surface, 26 ... Incident side, 28 ... The exit side, 30 ... Fly eye lens, 50 ... Convex lens, 52 ... (Center of the convex lens), 60 ... Lamp front lens, 102 ... Emitting tube portion 104, The sealing portion, 106 ... Inner space, 108 ... Night, 110 ... Electrode, 112 ... Lead rods, 114 ... Mercury, X ... The object to be exposed,? 1 ... Effective angle of incidence (of integrator), CL ... (Of integrator) center axis, LCL ... (Of the lamp), V ... (Of lamp group), longitudinal dimension, ... (Of the lamp group), &thetas; The angle between the central axis of the integrator and the optical axis of the lamp, L ... The distance from the light exit surface 25 of the lamp 12 to the entrance surface 26 of the integrator 14, The focus of the integrator, G ... Straight, S ... (Of the lamp group) exit position, R ... (Of the integrator) incidence position, D ... A lamp (12) arranged at a position farthest from the center of the lamp group (11), a lamp The height of the integrator 14

Claims (8)

A lamp group including a plurality of lamps,
An integrator that receives light from the plurality of lamps and increases the uniformity of the light;
And a convex lens disposed on a surface side facing the lamp group in the integrator,
The following conditional expressions 1 and 2 are satisfied.
Conditional expression 1 a? Tan? 1 L 2
Conditional expression 2? 1 ? 2 =? 3
only,
a: the longitudinal dimension and the lateral dimension of the lamp group
L: distance from the exit position of the lamp group to the incidence position of the integrator
θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value
&thetas; 2 : opening angle of light from each lamp
θ 3 : Integrator incident angle
to be. A lamp group including a plurality of lamps,
An integrator that receives light from the plurality of lamps and increases the uniformity of the light;
And a lamp front lens disposed on a side of the lamp facing the integrator for reducing diffusion of the light from the lamp,
The following conditional expressions 1 and 2 are satisfied.
Conditional expression 1 a? Tan? 1 L 2
Conditional expression 2? 1 ? 2 =? 3
only,
a: the longitudinal dimension and the lateral dimension of the lamp group
L: distance from the exit position of the lamp group to the incidence position of the integrator
θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value
&thetas; 2 : opening angle of light from each lamp
θ 3 : Integrator incident angle
to be. The method according to claim 1 or 2,
The lamp is a discharge lamp,
And the electrode interval of the discharge lamp is 0.8 mm or more and 1.5 mm or less. A lamp group including a plurality of lamps,
An integrator that receives light from the plurality of lamps and increases the uniformity of the light;
A convex lens disposed on a surface side facing the lamp group in the integrator is used,
And satisfies the following conditional expressions (1) and (2): " (1) "
Conditional expression 1 a? Tan? 1 L 2
Conditional expression 2? 1 ? 2 =? 3
only,
a: the longitudinal dimension and the lateral dimension of the lamp group
L: distance from the exit position of the lamp group to the incidence position of the integrator
θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value
&thetas; 2 : opening angle of light from each lamp
θ 3 : Integrator incident angle
to be. A lamp group including a plurality of lamps,
An integrator that receives light from the plurality of lamps and increases the uniformity of the light;
A lamp front lens for reducing diffusion of the light from the lamp and disposed on a surface side facing the integrator is used as the lamp front lens,
And satisfies the following conditional expressions (1) and (2): " (1) "
Conditional expression 1 a? Tan? 1 L 2
Conditional expression 2? 1 ? 2 =? 3
only,
a: the longitudinal dimension and the lateral dimension of the lamp group
L: distance from the exit position of the lamp group to the incidence position of the integrator
θ 1 : Of the angles formed by the optical axis of each lamp and the central axis of the integrator, the maximum value
&thetas; 2 : opening angle of light from each lamp
θ 3 : Integrator incident angle
to be. The method according to claim 4 or 5,
The lamp is a discharge lamp,
Wherein an interval between the electrodes of the discharge lamp is 0.8 mm or more and 1.5 mm or less. delete delete
KR1020150145945A 2015-02-16 2015-10-20 Exposing apparatus, and method of design for exposing apparatus KR101699179B1 (en)

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JP2015027872A JP5756242B1 (en) 2015-02-16 2015-02-16 Method for designing exposure apparatus
JPJP-P-2015-027872 2015-02-16

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