KR101698680B1 - High selective and high seneitive gas sensor device - Google Patents
High selective and high seneitive gas sensor device Download PDFInfo
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- KR101698680B1 KR101698680B1 KR1020150119146A KR20150119146A KR101698680B1 KR 101698680 B1 KR101698680 B1 KR 101698680B1 KR 1020150119146 A KR1020150119146 A KR 1020150119146A KR 20150119146 A KR20150119146 A KR 20150119146A KR 101698680 B1 KR101698680 B1 KR 101698680B1
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- gas
- insulating layer
- base
- sensitivity
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/406—Cells and probes with solid electrolytes
- G01N27/407—Cells and probes with solid electrolytes for investigating or analysing gases
- G01N27/4071—Cells and probes with solid electrolytes for investigating or analysing gases using sensor elements of laminated structure
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/406—Cells and probes with solid electrolytes
- G01N27/407—Cells and probes with solid electrolytes for investigating or analysing gases
- G01N27/4073—Composition or fabrication of the solid electrolyte
- G01N27/4074—Composition or fabrication of the solid electrolyte for detection of gases other than oxygen
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/406—Cells and probes with solid electrolytes
- G01N27/407—Cells and probes with solid electrolytes for investigating or analysing gases
- G01N27/4075—Composition or fabrication of the electrodes and coatings thereon, e.g. catalysts
Abstract
Description
The present invention relates to a high selectivity and high sensitivity gas sensor element, and more particularly to a high selectivity and high sensitivity gas sensor element having two sensor pairs.
Gas sensors that detect toxic and environmentally harmful gases are used in various fields and researches on them have been continuously carried out.
Particularly, in the case of a semiconductor type gas sensor using a metal oxide thin film as a gas sensitive substance, various studies are being conducted due to the development of the semiconductor industry.
The semiconductor type gas sensor includes a substrate, electrodes formed on the substrate, and a gas sensing layer formed on the electrode. The substrate is made of silicon or alumina, and the electrode is made of platinum or gold Of the noble metal, and the gas sensing layer is composed of a metal oxide thin film.
The semiconductor type gas sensor senses the kind and concentration of the gas by using the change in electrical resistance of the metal oxide thin film by the adsorption of the gas molecules and the oxidation / reduction reaction on the surface of the metal oxide thin film. At this time, In general, metal oxide semiconductor materials such as zinc oxide (ZnO), tin oxide (SnO2), tungsten oxide (WO3), titanium oxide (TiO2) and indium oxide (In2O3) are used.
In recent years, attempts have been made to improve the gas sensitivity through the increase of the specific surface area of the gas sensing layer. Typically, as a technique in which a gas sensing layer is formed of a nano-structure, Japanese Patent Application Laid-Open No. 2010-0067972 No. 11-0056694 discloses a semiconductor type gas sensor in which a gas sensing layer is made of nanofibers.
The semiconductor type gas sensor disclosed in the patent has a simple operation principle, a small volume, and a low manufacturing cost, so that it is highly expected that it can replace an existing electric chemical formula or optical gas sensor.
However, since the value output from the sensor is determined by the type and number of gas molecules adsorbed on the gas sensing layer, the two parameters are separated and analyzed It is difficult to achieve the above.
In order to overcome the above disadvantages, a pattern recognition method of using a sensor array coupled with a plurality of sensors and analyzing data to sort out gas molecules has been mainly used. However, since it is difficult to perform real-time monitoring and difficult to miniaturize, Is vulnerable.
SUMMARY OF THE INVENTION It is an object of the present invention to provide a high selectivity and high sensitivity gas sensor element having high sensitivity characteristics while improving the selectivity of adsorbed gas based on two sensor pairs, .
In order to achieve the above object, the present invention provides a high selectivity and high sensitivity gas sensor element comprising: a base; A bottom sensor formed on the base top; An insulating layer formed on the upper end of the lower sensor; And an upper sensor formed on an upper end of the insulating layer, wherein gas is detected by the reaction ratio of the upper sensor and the lower sensor.
Preferably, the bottom sensor is a two-dimensional planar form of single to several atomic layer thicknesses and the material is selected from the group consisting of graphene or MX2 (M = Ti, Zr, V, Ta, Mo, W, X = And a TMDC (transition metal dichalcogenide) having a molecular formula.
Preferably, the top sensor is formed in a two-dimensional planar form of single to several atomic layer thicknesses and the material comprises graphene or TMDC.
Preferably, the insulating layer is made of an insulating material and is composed of a two-dimensional plane having a single atomic layer thickness.
More preferably, the lower sensor and the upper sensor further include a plurality of electrodes, and the lower sensor electrode and the upper sensor electrode are disposed at 90 degrees from the base plane.
The high selectivity and high sensitivity gas sensor element according to the present invention comprises a bottom sensor located at the bottom, an insulating layer located at the top of the bottom sensor, and an upper sensor located at the top of the insulating layer, Wherein the lower sensor is configured to react with a magnetic field due to polarization or ionization of gas molecules that are reacted through the upper sensor and to detect a gas by using the reaction ratio of the upper sensor and the lower sensor In the case of sensing, the reaction according to the number of gas molecules can be canceled, so that there is an effect of providing a gas sensor element that reacts only with a gas molecule type quickly and with high sensitivity.
1 is a cross-sectional view of a high-sensitivity gas sensor element according to the present invention,
Fig. 2 is a perspective view of Fig. 1,
FIG. 3 is a schematic diagram for sensing the gas of FIG. 1;
Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings.
1, the high selectivity and high sensitivity
The
The
The
The
At this time, a wire to which a signal is drawn out is connected to the
On the other hand, the
The
Since the insulating
On the other hand, the
The
The
At this time, as shown in FIG. 2, the
The high selectivity and high sensitivity
The
Here, in the case of the
In the case of the
Although the reactivity is determined in proportion to the number of adsorbed molecules in both of the upper and
Therefore, when the ratio of the reactivity of the upper and
(I) when one molecule is attached to the
In the case of polar molecular adsorption (spontaneous polarization) (iii), in the case of polar molecular adsorption (iv) where the size is relatively large, when the charge transfer between adsorbed molecules and TMDC occurs (v) The degree of polarization, the charge transfer, and the like, so that the number of gas molecules is not affected.
Since the
For example, a transition metal that absorbs carbon well such as Ni, Cu, Pt and the like is prepared as a catalyst layer, and an appropriate amount of a mixed gas of CH 4 , H 2 , and Ar is introduced at a high temperature of 1,000 ° C or higher. In the mixed gas injected at high temperature, when carbon reacts with the catalyst layer and then quenched, carbon is separated from the catalyst and graphenes grow on the surface. Then, if the catalyst layer or support layer is removed by using the etching solution, graphene can be separated and transferred to a desired substrate.
Also, single-layer two-dimensional nanomaterials such as high-purity, high-performance TMDC, hBN and the like can be produced using mechanical exfoliation.
Finally, co-laminating and restacking methods are used to fabricate the heterostructure of graphene and hBN. First, hBN is transferred onto a SiO 2 substrate by mechanical peeling. Then, a water-soluble polymer is coated on another substrate, and then PMMA is coated thereon. Finally, graphene is transferred using a mechanical peeling method. The prepared substrate is placed in DI water to obtain a PMMA / Graphene layer. After transferring it onto glass, the graphene and hBN are superimposed on each other through an optical microscope, and heat is applied to the two layers. After the transcription is completed, the heterostructure of graphene and hBN is completed by removing the PMMA using acetone.
When the above method is applied, each of the
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, And all of the various forms of embodiments that can be practiced without departing from the technical spirit.
1: Base 10: Lower sensor
11: positive 12: sensing unit
20: insulation layer 30: upper sensor
31: Electrode 32:
100: Highly sensitive gas sensor element
Claims (5)
Base;
A bottom sensor formed on the base top;
An insulating layer formed on the upper end of the lower sensor; And
And an upper sensor formed on an upper end of the insulating layer,
The upper sensor reacts directly with the adsorbed gas molecules and the lower sensor does not directly contact with the gas molecules but reacts with the magnetic field due to the polarization or ionization of the gas molecules reacted through the upper sensor,
Wherein the sensor detects the gas by the ratio of the reactivity of the upper sensor and the sensor of the lower sensor.
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KR1020150119146A KR101698680B1 (en) | 2015-08-24 | 2015-08-24 | High selective and high seneitive gas sensor device |
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KR1020150119146A KR101698680B1 (en) | 2015-08-24 | 2015-08-24 | High selective and high seneitive gas sensor device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114235903A (en) * | 2020-09-09 | 2022-03-25 | 中国科学院苏州纳米技术与纳米仿生研究所 | Gas sensor and manufacturing method thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060094664A (en) * | 2005-02-25 | 2006-08-30 | 이주헌 | One chip gas sensor for detecting multi gases fabricated bridge on micro channel and fabricating method of the same |
KR20110000917A (en) * | 2009-06-29 | 2011-01-06 | 한국과학기술연구원 | Sensors for detecting temperature and multi gas and methed for manufacturing the same |
KR20110056694A (en) * | 2009-11-23 | 2011-05-31 | 한국전자통신연구원 | Environment gas sensor and method for preparing the same |
KR20140074269A (en) * | 2011-06-08 | 2014-06-17 | 알파 모스 에스.아. | Chemoresistor type gas sensor having a multi-storey architecture |
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2015
- 2015-08-24 KR KR1020150119146A patent/KR101698680B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060094664A (en) * | 2005-02-25 | 2006-08-30 | 이주헌 | One chip gas sensor for detecting multi gases fabricated bridge on micro channel and fabricating method of the same |
KR20110000917A (en) * | 2009-06-29 | 2011-01-06 | 한국과학기술연구원 | Sensors for detecting temperature and multi gas and methed for manufacturing the same |
KR20110056694A (en) * | 2009-11-23 | 2011-05-31 | 한국전자통신연구원 | Environment gas sensor and method for preparing the same |
KR20140074269A (en) * | 2011-06-08 | 2014-06-17 | 알파 모스 에스.아. | Chemoresistor type gas sensor having a multi-storey architecture |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114235903A (en) * | 2020-09-09 | 2022-03-25 | 中国科学院苏州纳米技术与纳米仿生研究所 | Gas sensor and manufacturing method thereof |
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