KR101698567B1 - Excimer lamp having uv reflecting layer having multilayer structure and manufacturing method thereof - Google Patents
Excimer lamp having uv reflecting layer having multilayer structure and manufacturing method thereof Download PDFInfo
- Publication number
- KR101698567B1 KR101698567B1 KR1020150113139A KR20150113139A KR101698567B1 KR 101698567 B1 KR101698567 B1 KR 101698567B1 KR 1020150113139 A KR1020150113139 A KR 1020150113139A KR 20150113139 A KR20150113139 A KR 20150113139A KR 101698567 B1 KR101698567 B1 KR 101698567B1
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- South Korea
- Prior art keywords
- layer
- excimer lamp
- discharge vessel
- ultraviolet
- reflective film
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K1/00—Details
- H01K1/28—Envelopes; Vessels
- H01K1/32—Envelopes; Vessels provided with coatings on the walls; Vessels or coatings thereon characterised by the material thereof
- H01K1/325—Reflecting coating
Abstract
Description
The present invention relates to an excimer lamp having an ultraviolet reflective film and a method of manufacturing the same. More particularly, the present invention relates to an excimer lamp having a multi-ultraviolet reflective film capable of preventing adhesion of a reflective film and preventing grain boundary loss, And a production method thereof.
Recently, there has been proposed a technique of irradiating vacuum ultraviolet light having a wavelength of 200 nm or less to an object to be processed made of metal, glass, or other materials to treat the object by the action of the vacuum ultraviolet light and ozone generated by the vacuum ultraviolet light, A cleaning treatment technique for removing organic contaminants adhered to the surface of the substrate and an oxide film formation treatment technique for forming an oxide film on the surface of the subject have been developed and put into practical use.
Many attempts have been made to discharge ultraviolet rays efficiently in a discharge lamp that emits ultraviolet rays. 1 is a cross-sectional view illustrating a discharge lamp according to an example of the prior art. And a
Since the ultraviolet scattering
The ultraviolet scattering reflective film is preferably composed of a material having a high ultraviolet reflectance, such as aluminum oxide particles, and a material having a high reflectance of ultraviolet light, so that a high reflection efficiency can be obtained.
However, when an ultraviolet scattering reflective film mainly composed of aluminum oxide particles is formed on the surface of a discharge vessel of silica glass having high purity of silica, there is a problem that the ultraviolet scattering reflective film tends to easily peel off. In general, it is difficult to form an ultraviolet scattering reflective film composed of particles having different expansion coefficients from the discharge vessel on the surface of the discharge vessel, and the ultraviolet scattering reflective film is easily peeled off.
On the other hand, in order to prevent the ultraviolet scattering reflective film from easily peeling off, there is a problem that a specific substance which is relatively vulnerable to plasma is excessively used in order to improve the adhesion, so that it is dissolved in a high temperature plasma in the lighting process, there was.
SUMMARY OF THE INVENTION Accordingly, the present invention has been made to solve the above-mentioned problems occurring in the prior art, and it is an object of the present invention to provide an excimer lamp having a multi-ultraviolet reflective film which is excellent in adhesion of a reflective film and can prevent grain boundary loss, The purpose of the method is to provide.
The present invention has been made in view of the above problems, and it is an object of the present invention to provide an apparatus and method for controlling the same.
According to a first aspect of the present invention, there is provided an excimer lamp discharge container made of silica glass. A pair of electrodes formed in the discharge vessel of the excimer lamp; And a multi-layered multi-UV reflective film formed on the inner surface of the excimer lamp discharge vessel for adhesion and reflection.
In the first aspect of the present invention, the multi-ultraviolet reflective film is characterized by including a MgF 2 binding layer and a reflective layer of SiO 2 .
In the first aspect of the present invention, the MgF 2 binder layer generates the etching by the HF formed in a high temperature firing after the MgF 2 coating is formed remains as the binder layer to the MgO is etched surface after HF etching, the SiO 2 reflecting layer Is characterized in that the SiO 2 solution is coated on the MgF 2 binding layer.
According to a second aspect of the present invention, there is provided a method of manufacturing an excimer lamp, the method comprising: a discharge vessel forming step of forming a discharge vessel made of silica glass; Forming a multi-ultraviolet ray reflective film on the inner surface of the discharge vessel, the multi-ultraviolet ray reflective film comprising an adhesive layer and a reflective layer; And an electrode forming step of forming a pair of electrodes in the discharge vessel.
In a second aspect of the present invention, the binding layer of the multi-ultraviolet reflective film is formed of a MgF 2 -bonded layer, and the reflective layer of the multi-UV reflective film is composed of SiO 2 .
In a second aspect of the invention, the MgF 2 binder layer generates the etching by the HF formed in a high temperature firing after the MgF 2 coating is formed remains as the binder layer to the MgO is etched surface after HF etching, the SiO 2, the reflective layer Is characterized in that the SiO 2 solution is coated on the MgF 2 binding layer.
INDUSTRIAL APPLICABILITY According to the excimer lamp having a multi-ultraviolet reflective film and the method of producing the same according to the present invention, it is possible to improve adhesion of the reflective film and prevent grain boundary loss.
Further, according to the excimer lamp having the multi-ultraviolet reflective film according to the present invention and the manufacturing method thereof, it is possible to provide an excimer lamp having a multi-ultraviolet reflective film which is resistant to high temperature and has high reflectance.
The effects of the present invention are not limited to those mentioned above, and other solutions not mentioned may be clearly understood by those skilled in the art from the following description.
1 is a cross-sectional view illustrating a discharge lamp according to an example of the prior art;
FIG. 2 is a view showing an excimer lamp having a multi-UV reflecting film according to the present invention,
FIG. 3 is a schematic view showing an excimer lamp having a multi-UV reflecting film according to the present invention,
4 is a photograph (x10000) of an excimer lamp having a multi-ultraviolet reflective film according to the present invention, in which a surface coated with MgF2 on a discharge vessel is photographed by an electron microscope,
5 is a photograph (x300 magnification) of an etched quartz surface formed by HF formed by firing at a high temperature after application of MgF 2 in an excimer lamp having a multi-ultraviolet reflection film according to the present invention,
6 is a photograph (x2000) of an MgO coating layer photographed by an electron microscope in an excimer lamp having a multi-ultraviolet reflective film according to the present invention and a graph showing the distribution of related elements in the horizontal direction (yellow line)
7 is a photograph of the lighting state of an excimer lamp having a multi-UV reflecting film according to the present invention, and
8 is a flow chart briefly showing a method of manufacturing an excimer lamp having a multi-UV reflecting film according to the present invention.
Further objects, features and advantages of the present invention will become more apparent from the following detailed description and the accompanying drawings.
Before describing the present invention in detail, it is to be understood that the present invention is capable of various modifications and various embodiments, and the examples described below and illustrated in the drawings are intended to limit the invention to specific embodiments It is to be understood that the invention includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.
It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises" or "having" and the like refer to the presence of stated features, integers, steps, operations, elements, components, or combinations thereof, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.
In the following description of the present invention with reference to the accompanying drawings, the same components are denoted by the same reference numerals regardless of the reference numerals, and redundant explanations thereof will be omitted. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description, well-known functions or constructions are not described in detail since they would obscure the invention in unnecessary detail.
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, an excimer lamp having a multi-ultraviolet reflective coating (coating film) according to a preferred embodiment of the present invention and a method of manufacturing the same will be described in detail with reference to the accompanying drawings.
First, an excimer lamp having a multi-UV reflective film according to the present invention will be described in detail with reference to FIGS. 2 and 3. FIG. Fig. 2 shows an excimer lamp before forming a reflective film in an excimer lamp having a multi-ultraviolet reflective film according to the present invention. Fig. 3 shows an excimer lamp having a multi-ultraviolet reflective film according to the present invention. will be. FIG. 4 is a photograph (x10000) of a surface coated with MgF 2 on a discharge vessel in an excimer lamp having a multi-ultraviolet reflective film according to the present invention, and FIG. 5 is a graph (X300 times) photograph of an etched quartz surface by HF formed by calcination at a high temperature after application of MgF 2 in an excimer lamp. 6 is a graph (x2000) of an MgO coating layer photographed by an electron microscope in an excimer lamp having a multi-ultraviolet reflective film according to the present invention and a graph showing the distribution of related elements in a horizontal direction (yellow line) in the photograph , Which is a graph for moving the X-axis along the yellow line of the photograph, which element is distributed at the corresponding position, and which molecule is composed of the element.
An excimer lamp having a multi-UV reflective film according to a preferred embodiment of the present invention includes: an excimer
The multi-ultraviolet
Specifically, the bonding layer is formed by etching with HF formed by firing at a high temperature after applying MgF 2 , and allowing MgO to remain as an adhesion layer on the etched surface after HF etching. In other words,
MgF 2 + H 2 O - > 2HF + MgO (1)
4HF + SiO 2 ? SiF 4 + 2H 2 O (2)
MgF 2 is converted to MgO according to the formula (1), and SiO 2 is etched according to the formula (2). This condition occurs continuously at a constant temperature. H 2 O is continuously supplied by the formula (2) and the reaction of the formula (1) and the formula (2) is repeated until the MgF 2 completely changes to MgO.
On the other hand, since the boiling point (BP) of SiF 4 is -94.8 ° C, it is vaporized into the atmosphere under an open condition, and only MgO is left as a result.
Subsequently, the reflective layer of the multi-ultraviolet
SiO 2 , which is relatively vulnerable to plasma and melted in a high-temperature plasma during the lighting process, is secondarily coated on the first coated MgF 2 -bonded layer having a high melting point to improve the adhesion of the SiO 2 reflective layer It is possible to prevent grain boundary loss.
Specifically, in the bonding between the reflection layer and the binder layer, the binder layer has a specific surface area larger than that of silica glass as shown in Fig. 4, and when the reflection layer is formed, a mixture of reflection layers made of smaller particles between the binder layer particles is filled So that the bonding force between the binding layer and the reflecting layer is increased.
Preferably, the material for forming the reflection layer is SiO 2 at 100%.
The excimer lamp of the present invention having the above-described structure can realize a beautiful and various lighting state as shown in FIG. 7 while having the above-described characteristics. 7 shows a state in which an excimer lamp having a multi-UV reflective film according to the present invention is lighted.
Next, a method of manufacturing an excimer lamp having a multi-UV reflective film according to the present invention will be described with reference to FIG. 8 is a flow chart briefly showing a method of manufacturing an excimer lamp having a multi-UV reflecting film according to the present invention.
A method of manufacturing an excimer lamp having a multi-ultraviolet reflective film according to the present invention includes: a discharge vessel forming step (S100) of forming a discharge vessel made of silica glass as shown in Fig. 8; A multi-ultraviolet reflective film forming step (S200) comprising an inner surface of the discharge vessel and an adhesive layer and a reflective layer; And an electrode forming step (S300) of forming a pair of electrodes in the discharge vessel.
The binder layer of the multi-ultraviolet reflective film formed in the multi-ultraviolet reflective film forming step (S200) is formed of a MgF 2 binding layer.
The binder layer is formed by etching with HF formed by calcination at a high temperature (600 ° C) after coating MgF 2 , and allowing MgO to remain as an adhesion layer on the etched surface after HF etching. In other words, the MgF 2 primary coating changes to a material that is more resistant to high temperatures by etching the quartz surface to improve the adhesion of the secondary coating material and by changing MgF 2 to MgO at high temperature.
Subsequently, the reflective layer of the ultraviolet
Here, the material for forming the reflective layer is characterized by being made of 100% SiO 2 .
According to the excimer lamp having a multi-ultraviolet reflective film according to the present invention and a method of manufacturing the same, an excimer lamp having a multi-ultraviolet reflective film capable of preventing adherence of a reflective film and preventing grain boundary loss, There is an advantage to be able to do.
The embodiments and the accompanying drawings described in the present specification are merely illustrative of some of the technical ideas included in the present invention. Accordingly, the embodiments disclosed herein are for the purpose of describing rather than limiting the technical spirit of the present invention, and it is apparent that the scope of the technical idea of the present invention is not limited by these embodiments. It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
100: Excimer lamp discharge vessel
200: a pair of electrodes
300: Multi ultraviolet ray reflective film
S100: discharge vessel forming step
S200: Multi-ultraviolet reflective film forming step
S300: Electrode formation step
Claims (6)
A pair of electrodes formed in the discharge vessel of the excimer lamp; And
Wherein the multi-ultraviolet reflective film comprises a MgF 2 -bonding layer and a reflective layer of SiO 2 , the multi-ultraviolet reflective film having a multi-structure formed for binding and reflection on the inner surface of the excimer lamp discharge vessel,
The MgF 2 -bonded layer is etched by HF formed by high-temperature baking after MgF 2 application, and MgO is left as an etchant layer on the etched surface after HF etching,
Wherein the SiO 2 reflective layer is formed by coating an SiO 2 solution on an MgF 2 binding layer.
A discharge vessel forming step of forming a discharge vessel made of silica glass;
Forming a multi-ultraviolet ray reflective film on the inner surface of the discharge vessel, the multi-ultraviolet ray reflective film comprising an adhesive layer and a reflective layer; And
And an electrode forming step of forming a pair of electrodes in the discharge vessel,
The binder layer of the multi ultraviolet reflection film is being formed by MgF 2 binder layer, the MgF 2 binder layer is MgF 2 coating after generating the etching by the HF formed in a high-temperature sintering, it remains in the binder layer on MgO is etched surface after HF etching Lt; / RTI &
Wherein the reflective layer of the multi-ultraviolet reflective film is made of SiO 2 , and the SiO 2 solution is coated on the MgF 2 binding layer.
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KR1020150113139A KR101698567B1 (en) | 2015-08-11 | 2015-08-11 | Excimer lamp having uv reflecting layer having multilayer structure and manufacturing method thereof |
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KR1020150113139A KR101698567B1 (en) | 2015-08-11 | 2015-08-11 | Excimer lamp having uv reflecting layer having multilayer structure and manufacturing method thereof |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002093377A (en) | 2000-09-19 | 2002-03-29 | Ushio Inc | Dielectric barrier discharge lamp device |
JP2010027268A (en) * | 2008-07-16 | 2010-02-04 | Ushio Inc | Excimer lamp |
KR101127747B1 (en) * | 2011-06-02 | 2012-03-22 | 주식회사 르꼬르 | The led lights |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002093377A (en) | 2000-09-19 | 2002-03-29 | Ushio Inc | Dielectric barrier discharge lamp device |
JP2010027268A (en) * | 2008-07-16 | 2010-02-04 | Ushio Inc | Excimer lamp |
KR101127747B1 (en) * | 2011-06-02 | 2012-03-22 | 주식회사 르꼬르 | The led lights |
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